KR102851778B1 - 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법 - Google Patents

판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법

Info

Publication number
KR102851778B1
KR102851778B1 KR1020257016919A KR20257016919A KR102851778B1 KR 102851778 B1 KR102851778 B1 KR 102851778B1 KR 1020257016919 A KR1020257016919 A KR 1020257016919A KR 20257016919 A KR20257016919 A KR 20257016919A KR 102851778 B1 KR102851778 B1 KR 102851778B1
Authority
KR
South Korea
Prior art keywords
workpiece
plate
cutout
hole
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020257016919A
Other languages
English (en)
Korean (ko)
Other versions
KR20250079054A (ko
Inventor
노르베르트 암브로지우스
로만 오슈트홀트
Original Assignee
엘피케이에프 레이저 앤드 일렉트로닉스 에스이
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=54072638&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR102851778(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from DE102014113339.0A external-priority patent/DE102014113339A1/de
Application filed by 엘피케이에프 레이저 앤드 일렉트로닉스 에스이 filed Critical 엘피케이에프 레이저 앤드 일렉트로닉스 에스이
Priority to KR1020257028228A priority Critical patent/KR20250133802A/ko
Publication of KR20250079054A publication Critical patent/KR20250079054A/ko
Application granted granted Critical
Publication of KR102851778B1 publication Critical patent/KR102851778B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • B23K26/382Removing material by boring or cutting by boring
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00Surface treatment of glass, not in the form of fibres or filaments, by etching
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0025Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/486Via connections through the substrate with or without pins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49827Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5384Conductive vias through the substrate with or without pins, e.g. buried coaxial conductors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0026Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0029Etching of the substrate by chemical or physical means by laser ablation of inorganic insulating material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices
    • B23K2101/40Semiconductor devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/54Glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/14Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • H01L23/15Ceramic or glass substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Laser Beam Processing (AREA)
  • Surface Treatment Of Glass (AREA)
  • Lead Frames For Integrated Circuits (AREA)
KR1020257016919A 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법 Active KR102851778B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020257028228A KR20250133802A (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
DE102014113339.0A DE102014113339A1 (de) 2014-09-16 2014-09-16 Verfahren zur Erzeugung von Ausnehmungen in einem Material
DE102014113339.0 2014-09-16
DE102014116291 2014-11-07
DE102014116291.9 2014-11-07
PCT/DE2015/100333 WO2016041544A1 (de) 2014-09-16 2015-08-07 Verfahren zum einbringen mindestens einer ausnehmung oder einer durchbrechung in ein plattenförmiges werkstück
KR1020237018486A KR102813417B1 (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020237018486A Division KR102813417B1 (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020257028228A Division KR20250133802A (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법

Publications (2)

Publication Number Publication Date
KR20250079054A KR20250079054A (ko) 2025-06-04
KR102851778B1 true KR102851778B1 (ko) 2025-09-01

Family

ID=54072638

Family Applications (6)

Application Number Title Priority Date Filing Date
KR1020257016919A Active KR102851778B1 (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법
KR1020197015976A Ceased KR20190065480A (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법
KR1020217005121A Ceased KR20210022773A (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법
KR1020257028228A Pending KR20250133802A (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법
KR1020177007041A Ceased KR20170044143A (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법
KR1020237018486A Active KR102813417B1 (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법

Family Applications After (5)

Application Number Title Priority Date Filing Date
KR1020197015976A Ceased KR20190065480A (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법
KR1020217005121A Ceased KR20210022773A (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법
KR1020257028228A Pending KR20250133802A (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법
KR1020177007041A Ceased KR20170044143A (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법
KR1020237018486A Active KR102813417B1 (ko) 2014-09-16 2015-08-07 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법

Country Status (11)

Country Link
US (2) US11610784B2 (cg-RX-API-DMAC7.html)
EP (2) EP3195706B2 (cg-RX-API-DMAC7.html)
JP (2) JP6782692B2 (cg-RX-API-DMAC7.html)
KR (6) KR102851778B1 (cg-RX-API-DMAC7.html)
CN (1) CN107006128B (cg-RX-API-DMAC7.html)
ES (1) ES2923764T5 (cg-RX-API-DMAC7.html)
LT (1) LT3195706T (cg-RX-API-DMAC7.html)
MY (1) MY196621A (cg-RX-API-DMAC7.html)
SG (2) SG10201902331XA (cg-RX-API-DMAC7.html)
TW (1) TWI616939B (cg-RX-API-DMAC7.html)
WO (1) WO2016041544A1 (cg-RX-API-DMAC7.html)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018100299A1 (de) * 2017-01-27 2018-08-02 Schott Ag Strukturiertes plattenförmiges Glaselement und Verfahren zu dessen Herstellung
EP3592500B1 (de) 2017-03-06 2023-10-11 LPKF Laser & Electronics SE Verfahren zum einbringen zumindest einer ausnehmung in ein material mittels elektromagnetischer strahlung und anschliessendem ätzprozess
US11072041B2 (en) 2017-03-06 2021-07-27 Lpkf Laser & Electronics Ag Method for producing a technical mask
DE102018110211A1 (de) * 2018-04-27 2019-10-31 Schott Ag Verfahren zum Erzeugen feiner Strukturen im Volumen eines Substrates aus sprödharten Material
TWI678342B (zh) 2018-11-09 2019-12-01 財團法人工業技術研究院 形成導角的切割方法
DE102020100848B4 (de) 2019-01-29 2023-07-27 Lpkf Laser & Electronics Aktiengesellschaft Verfahren zur Mikrostrukturierung eines Glassubstrats mittels Laserstrahlung
DE102019201347B3 (de) * 2019-02-01 2020-06-18 Lpkf Laser & Electronics Ag Herstellung von metallischen Leiterbahnen an Glas
JP2022519724A (ja) * 2019-02-08 2022-03-24 コーニング インコーポレイテッド パルスレーザビーム焦点レンズおよび蒸気エッチングを使用して透明なワークピースをレーザ加工するための方法
DE102019121827A1 (de) * 2019-08-13 2021-02-18 Trumpf Laser- Und Systemtechnik Gmbh Laserätzen mit variierender Ätzselektivität
CN113594014B (zh) * 2020-04-30 2024-04-12 中微半导体设备(上海)股份有限公司 零部件、等离子体反应装置及零部件加工方法
DE102020114195A1 (de) 2020-05-27 2021-12-02 Lpkf Laser & Electronics Aktiengesellschaft Verfahren zum Einbringen einer Ausnehmung in ein Substrat
DE102020118939A1 (de) * 2020-07-17 2022-01-20 Schott Ag Glaswafer und Glaselement für Drucksensoren
CN111799169B (zh) * 2020-07-17 2024-05-28 绍兴同芯成集成电路有限公司 一种飞秒激光结合hf湿蚀刻加工tgv的工艺
DE102020120370B3 (de) 2020-08-03 2022-02-03 Infineon Technologies Ag Mems-sensor mit partikelfilter und verfahren zu seiner herstellung
KR20220019158A (ko) 2020-08-06 2022-02-16 삼성디스플레이 주식회사 윈도우 및 이를 포함하는 표시장치
EP4011846A1 (en) 2020-12-09 2022-06-15 Schott Ag Method of structuring a glass element and structured glass element produced thereby
DE102021204675B4 (de) 2021-05-07 2023-05-17 Lpkf Laser & Electronics Se Vorrichtung und Verfahren zur Zellkultivierung
CN113510364B (zh) * 2021-07-28 2022-11-25 广东工业大学 一种基于激光辅助溶解的三维空腔结构的成型方法
EP4296244A1 (de) 2022-06-21 2023-12-27 LPKF Laser & Electronics SE Substratträger aus glas zur bearbeitung eines substrats und ein verfahren zu dessen herstellung
DE102022127259A1 (de) 2022-10-18 2024-04-18 Lpkf Laser & Electronics Aktiengesellschaft Verfahren sowie Vorrichtung zur Abbildung eines Strahls auf ein Objekt und Verfahren zum Einbringen einer Öffnung in ein Werkstück mittels dieses Verfahrens
DE102023125725A1 (de) * 2023-09-22 2025-03-27 Schott Ag Laser-strukturiertes optisches Element
DE102024105120A1 (de) * 2024-02-23 2025-08-28 Lpkf Laser & Electronics Se Verfahren zur Integration und/oder Bearbeitung wenigstens eines Substrats sowie Substratstapel

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006142342A (ja) 2004-11-22 2006-06-08 Sumitomo Electric Ind Ltd レーザ加工方法とレーザ加工装置
WO2012014720A1 (ja) 2010-07-26 2012-02-02 浜松ホトニクス株式会社 レーザ加工方法
WO2012014718A1 (ja) 2010-07-26 2012-02-02 浜松ホトニクス株式会社 インターポーザの製造方法
JP2013536081A (ja) 2010-07-12 2013-09-19 フィレイザー ユーエスエー エルエルシー レーザーフィラメント形成による材料加工方法
WO2014085663A1 (en) 2012-11-29 2014-06-05 Corning Incorporated Methods of fabricating glass articles by laser damage and etching

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001015819A1 (en) * 1999-08-30 2001-03-08 Board Of Regents University Of Nebraska-Lincoln Three-dimensional electrical interconnects
JP4880820B2 (ja) 2001-01-19 2012-02-22 株式会社レーザーシステム レーザ支援加工方法
JP4418282B2 (ja) 2004-03-31 2010-02-17 株式会社レーザーシステム レーザ加工方法
US9138913B2 (en) 2005-09-08 2015-09-22 Imra America, Inc. Transparent material processing with an ultrashort pulse laser
JP2011218398A (ja) * 2010-04-08 2011-11-04 Fujikura Ltd 微細構造の形成方法、レーザー照射装置、及び基板
DE102010025966B4 (de) 2010-07-02 2012-03-08 Schott Ag Interposer und Verfahren zum Herstellen von Löchern in einem Interposer
WO2012014710A1 (ja) * 2010-07-26 2012-02-02 浜松ホトニクス株式会社 レーザ加工方法
KR101825238B1 (ko) * 2010-07-26 2018-02-02 하마마츠 포토닉스 가부시키가이샤 광 흡수 기판의 제조 방법, 및 그것을 제조하기 위한 성형형의 제조 방법
US8933367B2 (en) 2011-02-09 2015-01-13 Sumitomo Electric Industries, Ltd. Laser processing method
EP2754524B1 (de) 2013-01-15 2015-11-25 Corning Laser Technologies GmbH Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
JP6113529B2 (ja) * 2013-03-05 2017-04-12 株式会社ディスコ ウエーハの加工方法
DE102013223637B4 (de) 2013-11-20 2018-02-01 Trumpf Laser- Und Systemtechnik Gmbh Verfahren zum Behandeln eines lasertransparenten Substrats zum anschließenden Trennen des Substrats
US10293436B2 (en) * 2013-12-17 2019-05-21 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
CN110049956A (zh) * 2016-11-04 2019-07-23 康宁公司 微穿孔板系统、应用以及制造微穿孔板系统的方法
US11344973B2 (en) * 2018-04-19 2022-05-31 Corning Incorporated Methods for forming holes in substrates

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006142342A (ja) 2004-11-22 2006-06-08 Sumitomo Electric Ind Ltd レーザ加工方法とレーザ加工装置
JP2013536081A (ja) 2010-07-12 2013-09-19 フィレイザー ユーエスエー エルエルシー レーザーフィラメント形成による材料加工方法
WO2012014720A1 (ja) 2010-07-26 2012-02-02 浜松ホトニクス株式会社 レーザ加工方法
WO2012014718A1 (ja) 2010-07-26 2012-02-02 浜松ホトニクス株式会社 インターポーザの製造方法
WO2014085663A1 (en) 2012-11-29 2014-06-05 Corning Incorporated Methods of fabricating glass articles by laser damage and etching

Also Published As

Publication number Publication date
KR20230084606A (ko) 2023-06-13
EP3195706B2 (de) 2025-05-14
LT3195706T (lt) 2022-08-10
KR20210022773A (ko) 2021-03-03
JP2020185613A (ja) 2020-11-19
TW201621986A (zh) 2016-06-16
CN107006128A (zh) 2017-08-01
KR20190065480A (ko) 2019-06-11
KR102813417B1 (ko) 2025-05-29
TWI616939B (zh) 2018-03-01
EP3195706B1 (de) 2022-06-01
US11610784B2 (en) 2023-03-21
JP2017534458A (ja) 2017-11-24
JP6782692B2 (ja) 2020-11-11
SG11201702091WA (en) 2017-04-27
EP4061101A1 (de) 2022-09-21
US20170256422A1 (en) 2017-09-07
CN107006128B (zh) 2020-05-19
JP7049404B2 (ja) 2022-04-06
KR20170044143A (ko) 2017-04-24
KR20250079054A (ko) 2025-06-04
EP3195706A1 (de) 2017-07-26
KR20250133802A (ko) 2025-09-08
US20220223434A1 (en) 2022-07-14
SG10201902331XA (en) 2019-04-29
ES2923764T5 (en) 2025-10-09
ES2923764T3 (es) 2022-09-30
MY196621A (en) 2023-04-23
WO2016041544A1 (de) 2016-03-24

Similar Documents

Publication Publication Date Title
KR102851778B1 (ko) 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법
KR101857335B1 (ko) 기판 안으로 관통 개구부들을 도입하기 위한 방법 및 장치, 그리고 이렇게 제조된 기판
CN105189024B (zh) 用于分离基板的方法和装置
US11148225B2 (en) Method for rapid laser drilling of holes in glass and products made therefrom
CN104768698B (zh) 用于通过超短聚焦脉冲激光束制造线状成列的破坏部位的方法
DE102014113339A1 (de) Verfahren zur Erzeugung von Ausnehmungen in einem Material

Legal Events

Date Code Title Description
A107 Divisional application of patent
A302 Request for accelerated examination
PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A16-div-PA0104

PA0302 Request for accelerated examination

St.27 status event code: A-1-2-D10-D16-exm-PA0302

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

A16 Divisional, continuation or continuation in part application filed

Free format text: ST27 STATUS EVENT CODE: A-0-1-A10-A16-DIV-PA0104 (AS PROVIDED BY THE NATIONAL OFFICE)

F11 Ip right granted following substantive examination

Free format text: ST27 STATUS EVENT CODE: A-2-4-F10-F11-EXM-PR0701 (AS PROVIDED BY THE NATIONAL OFFICE)

PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A16-div-PA0104

PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

U12 Designation fee paid

Free format text: ST27 STATUS EVENT CODE: A-2-2-U10-U12-OTH-PR1002 (AS PROVIDED BY THE NATIONAL OFFICE)

Year of fee payment: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

Q13 Ip right document published

Free format text: ST27 STATUS EVENT CODE: A-4-4-Q10-Q13-NAP-PG1601 (AS PROVIDED BY THE NATIONAL OFFICE)