KR102805203B1 - 임프린트 방법, 임프린트 장치 및 물품의 제조 방법 - Google Patents

임프린트 방법, 임프린트 장치 및 물품의 제조 방법 Download PDF

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Publication number
KR102805203B1
KR102805203B1 KR1020210002296A KR20210002296A KR102805203B1 KR 102805203 B1 KR102805203 B1 KR 102805203B1 KR 1020210002296 A KR1020210002296 A KR 1020210002296A KR 20210002296 A KR20210002296 A KR 20210002296A KR 102805203 B1 KR102805203 B1 KR 102805203B1
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South Korea
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light
imprint material
imprint
substrate
mold
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Korean (ko)
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KR20210093755A (ko
Inventor
다츠야 아라카와
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020210002296A 2020-01-20 2021-01-08 임프린트 방법, 임프린트 장치 및 물품의 제조 방법 Active KR102805203B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020007019A JP7403325B2 (ja) 2020-01-20 2020-01-20 インプリント方法、インプリント装置、および物品の製造方法
JPJP-P-2020-007019 2020-01-20

Publications (2)

Publication Number Publication Date
KR20210093755A KR20210093755A (ko) 2021-07-28
KR102805203B1 true KR102805203B1 (ko) 2025-05-12

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KR1020210002296A Active KR102805203B1 (ko) 2020-01-20 2021-01-08 임프린트 방법, 임프린트 장치 및 물품의 제조 방법

Country Status (3)

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US (1) US11442361B2 (enExample)
JP (1) JP7403325B2 (enExample)
KR (1) KR102805203B1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI771623B (zh) * 2018-11-08 2022-07-21 日商佳能股份有限公司 壓印裝置和產品製造方法
JP7749443B2 (ja) * 2021-12-16 2025-10-06 キヤノン株式会社 運動制御装置、リソグラフィー装置、平坦化装置、処理装置および物品製造方法
JP7716343B2 (ja) * 2022-01-06 2025-07-31 キヤノン株式会社 インプリント装置、インプリント方法、および物品製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130207288A1 (en) * 2012-02-15 2013-08-15 Kabushiki Kaisha Toshiba Imprinting apparatus and imprinting method
JP2014241396A (ja) 2013-05-14 2014-12-25 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP2016058735A (ja) * 2014-09-08 2016-04-21 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
US20180074419A1 (en) 2016-09-12 2018-03-15 SK Hynix Inc. Methods of forming patterns using nanoimprint lithography
JP2019021749A (ja) 2017-07-14 2019-02-07 キヤノン株式会社 インプリント方法、インプリント装置および物品の製造方法
JP2019212690A (ja) 2018-05-31 2019-12-12 キヤノン株式会社 成形装置、成形方法及び物品の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7030533B2 (ja) * 2018-01-15 2022-03-07 キオクシア株式会社 インプリント装置、インプリント方法、及び半導体装置の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130207288A1 (en) * 2012-02-15 2013-08-15 Kabushiki Kaisha Toshiba Imprinting apparatus and imprinting method
JP2014241396A (ja) 2013-05-14 2014-12-25 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP2016058735A (ja) * 2014-09-08 2016-04-21 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
US20180074419A1 (en) 2016-09-12 2018-03-15 SK Hynix Inc. Methods of forming patterns using nanoimprint lithography
JP2019021749A (ja) 2017-07-14 2019-02-07 キヤノン株式会社 インプリント方法、インプリント装置および物品の製造方法
JP2019212690A (ja) 2018-05-31 2019-12-12 キヤノン株式会社 成形装置、成形方法及び物品の製造方法

Also Published As

Publication number Publication date
KR20210093755A (ko) 2021-07-28
JP7403325B2 (ja) 2023-12-22
JP2021114561A (ja) 2021-08-05
US20210223689A1 (en) 2021-07-22
US11442361B2 (en) 2022-09-13

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