KR102733553B1 - 감압성 접착제 조성물 및 이를 제조하는 방법 - Google Patents

감압성 접착제 조성물 및 이를 제조하는 방법 Download PDF

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KR102733553B1
KR102733553B1 KR1020197021619A KR20197021619A KR102733553B1 KR 102733553 B1 KR102733553 B1 KR 102733553B1 KR 1020197021619 A KR1020197021619 A KR 1020197021619A KR 20197021619 A KR20197021619 A KR 20197021619A KR 102733553 B1 KR102733553 B1 KR 102733553B1
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sensitive adhesive
adhesive composition
pressure
monomer
ethyl
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KR20190107037A (ko
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제이 이
종. 에스. 구오
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신쏘머 유에스에이 엘엘씨
신쏘머 (유케이) 리미티드
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1808—C8-(meth)acrylate, e.g. isooctyl (meth)acrylate or 2-ethylhexyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/062—Copolymers with monomers not covered by C09J133/06
    • C09J133/066—Copolymers with monomers not covered by C09J133/06 containing -OH groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C09J133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385—Acrylic polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1806—C6-(meth)acrylate, e.g. (cyclo)hexyl (meth)acrylate or phenyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2433/00—Presence of (meth)acrylic polymer

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Adhesive Tapes (AREA)
KR1020197021619A 2017-02-03 2017-02-03 감압성 접착제 조성물 및 이를 제조하는 방법 Active KR102733553B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2017/052367 WO2018141399A1 (en) 2017-02-03 2017-02-03 Pressure sensitive adhesive compositions and methods for preparing same

Publications (2)

Publication Number Publication Date
KR20190107037A KR20190107037A (ko) 2019-09-18
KR102733553B1 true KR102733553B1 (ko) 2024-11-25

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Country Status (6)

Country Link
US (1) US20200017725A1 (enExample)
EP (1) EP3577181B1 (enExample)
JP (1) JP6868112B2 (enExample)
KR (1) KR102733553B1 (enExample)
CN (1) CN110199001B (enExample)
WO (1) WO2018141399A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102267592B1 (ko) * 2018-11-02 2021-06-21 주식회사 엘지화학 의류용 수성 점착제 조성물의 제조 방법
KR102524479B1 (ko) * 2018-11-29 2023-04-20 주식회사 엘지화학 아크릴계 에멀젼 점착제 조성물
KR102743847B1 (ko) * 2020-05-25 2024-12-16 주식회사 엘지화학 아크릴계 점착제 조성물
CN112940167A (zh) * 2021-02-02 2021-06-11 上海保立佳新材料有限公司 一种超疏水丙烯酸乳液的制备方法
EP4148041B1 (en) 2021-09-10 2023-11-01 Evonik Operations GmbH Spacered urea (meth)acrylates
EP4148040B1 (en) 2021-09-10 2023-11-01 Evonik Operations GmbH One pot synthesis of urea (meth)acrylates
EP4408946B1 (en) 2021-09-29 2025-09-17 Basf Se Pressure-sensitive adhesive composition comprising a dispersed pressure-sensitive adhesive polymer formed by emulsion polymerization of isobutyl acrylate, 2-ethylhexyl acrylate and/or 1-octyl acrylate, styrene and monomers having at least one acid group and optionally further monomers
EP4155330A1 (en) 2022-09-13 2023-03-29 Basf Se Pressure-sensitive adhesive composition comprising a dispersed pressure-sensitive adhesive polymer formed by emulsion polymerization of 2-octyl acrylate, styrene, hydroxyalkyl acrylate, monomers having at least one acid group in specific amounts and optionally further monomers
KR20240057893A (ko) * 2022-10-25 2024-05-03 엘지디스플레이 주식회사 표시 장치

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120263950A1 (en) * 2011-04-15 2012-10-18 Basf Se Pressure-sensitive adhesive dispersion comprising polymers with ureido groups or ureido-analogous groups and with glycidyl groups
CN103476886A (zh) 2011-04-15 2013-12-25 巴斯夫欧洲公司 包含具有脲基或脲基类似基团且由阶段聚合制备的聚合物的接触型粘合剂分散体
US20140142238A1 (en) 2012-11-19 2014-05-22 Momentive Specialty Chemicals Inc. Pressure sensitive adhesive compositons

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FR2751974B1 (fr) * 1996-07-31 1998-09-18 Atochem Elf Sa Polymeres adhesifs sensibles a la pression
DE19818394A1 (de) * 1998-04-24 1999-10-28 Basf Ag Haftklebestoffe
DE19920807A1 (de) * 1999-05-06 2000-11-09 Basf Ag Haftklebstoffe
JP2002182614A (ja) 2000-12-11 2002-06-26 Seiko Epson Corp 半導体装置
DE102008037845A1 (de) * 2008-08-15 2010-02-18 Tesa Se Haftklebemasse
KR101969733B1 (ko) * 2009-02-13 2019-04-17 애버리 데니슨 코포레이션 접착제 화합물
ATE529487T1 (de) * 2009-12-18 2011-11-15 Basf Se Polymerdispersionen
KR20150033596A (ko) * 2012-02-06 2015-04-01 바스프 에스이 접착제용 점착제로서 사용될 수 있고 탄소 원자 1 내지 20개의 알킬 (메트)아크릴레이트를 기제로 하는 유화 중합에 의해 생성될 수 있는 수성 중합체 분산액
US9605188B2 (en) * 2012-02-06 2017-03-28 Basf Se Aqueous polymer dispersion suitable for application as tackifier for adhesives and preparable by emulsion polymerization based on C1 to C20 alkyl (meth)acrylates
EP2978818B1 (de) * 2013-03-26 2017-05-10 Basf Se Verwendung einer polymerdispersion zum kaltsiegeln
US20160122597A1 (en) * 2013-05-21 2016-05-05 Basf Se Preparation of pressure sensitive adhesive dispersions from multi-stage emulsion polymerization for applications of protective films

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120263950A1 (en) * 2011-04-15 2012-10-18 Basf Se Pressure-sensitive adhesive dispersion comprising polymers with ureido groups or ureido-analogous groups and with glycidyl groups
CN103476886A (zh) 2011-04-15 2013-12-25 巴斯夫欧洲公司 包含具有脲基或脲基类似基团且由阶段聚合制备的聚合物的接触型粘合剂分散体
US20140142238A1 (en) 2012-11-19 2014-05-22 Momentive Specialty Chemicals Inc. Pressure sensitive adhesive compositons

Also Published As

Publication number Publication date
JP6868112B2 (ja) 2021-05-12
JP2020506271A (ja) 2020-02-27
CN110199001A (zh) 2019-09-03
WO2018141399A1 (en) 2018-08-09
US20200017725A1 (en) 2020-01-16
KR20190107037A (ko) 2019-09-18
EP3577181B1 (en) 2022-07-13
EP3577181A1 (en) 2019-12-11
CN110199001B (zh) 2021-11-30

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