KR102698578B1 - 회절 광학 소자를 위한 다층 박막 스택 - Google Patents
회절 광학 소자를 위한 다층 박막 스택 Download PDFInfo
- Publication number
- KR102698578B1 KR102698578B1 KR1020180095147A KR20180095147A KR102698578B1 KR 102698578 B1 KR102698578 B1 KR 102698578B1 KR 1020180095147 A KR1020180095147 A KR 1020180095147A KR 20180095147 A KR20180095147 A KR 20180095147A KR 102698578 B1 KR102698578 B1 KR 102698578B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- reflection structure
- optical element
- layers
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 59
- 239000010409 thin film Substances 0.000 title description 19
- 239000000758 substrate Substances 0.000 claims abstract description 51
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 90
- 238000000034 method Methods 0.000 claims description 67
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 49
- 239000010703 silicon Substances 0.000 claims description 49
- 229910052710 silicon Inorganic materials 0.000 claims description 47
- 239000000377 silicon dioxide Substances 0.000 claims description 43
- 235000012239 silicon dioxide Nutrition 0.000 claims description 42
- 239000000463 material Substances 0.000 claims description 32
- 238000005530 etching Methods 0.000 claims description 20
- 239000011248 coating agent Substances 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 14
- 238000000151 deposition Methods 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 150000003376 silicon Chemical class 0.000 claims description 4
- 238000007788 roughening Methods 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 125000006850 spacer group Chemical group 0.000 claims 4
- 238000000427 thin-film deposition Methods 0.000 claims 1
- 230000008569 process Effects 0.000 description 31
- 230000003746 surface roughness Effects 0.000 description 18
- 230000006870 function Effects 0.000 description 15
- 238000005457 optimization Methods 0.000 description 15
- 238000002310 reflectometry Methods 0.000 description 11
- 230000007704 transition Effects 0.000 description 10
- 239000010408 film Substances 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 8
- 230000003667 anti-reflective effect Effects 0.000 description 6
- 238000013461 design Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 239000005350 fused silica glass Substances 0.000 description 4
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 4
- 238000007736 thin film deposition technique Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000010187 selection method Methods 0.000 description 2
- 238000002922 simulated annealing Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- -1 e.g. Substances 0.000 description 1
- 231100000040 eye damage Toxicity 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1086—Beam splitting or combining systems operating by diffraction only
- G02B27/1093—Beam splitting or combining systems operating by diffraction only for use with monochromatic radiation only, e.g. devices for splitting a single laser source
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/44—Grating systems; Zone plate systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
- G02B5/1819—Plural gratings positioned on the same surface, e.g. array of gratings
- G02B5/1823—Plural gratings positioned on the same surface, e.g. array of gratings in an overlapping or superposed manner
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
- G02B5/1871—Transmissive phase gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4272—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having plural diffractive elements positioned sequentially along the optical path
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/067—Construction details
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Optical Integrated Circuits (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762546174P | 2017-08-16 | 2017-08-16 | |
| US62/546,174 | 2017-08-16 | ||
| US15/837,990 | 2017-12-11 | ||
| US15/837,990 US10712475B2 (en) | 2017-08-16 | 2017-12-11 | Multi-layer thin film stack for diffractive optical elements |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20190019025A KR20190019025A (ko) | 2019-02-26 |
| KR102698578B1 true KR102698578B1 (ko) | 2024-08-23 |
Family
ID=63209238
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020180095147A Active KR102698578B1 (ko) | 2017-08-16 | 2018-08-14 | 회절 광학 소자를 위한 다층 박막 스택 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US10712475B2 (enExample) |
| EP (1) | EP3444642B1 (enExample) |
| JP (1) | JP7383372B2 (enExample) |
| KR (1) | KR102698578B1 (enExample) |
| CN (2) | CN109407190B (enExample) |
| IL (1) | IL260918B2 (enExample) |
| TW (1) | TWI791557B (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10802185B2 (en) | 2017-08-16 | 2020-10-13 | Lumentum Operations Llc | Multi-level diffractive optical element thin film coating |
| US10712475B2 (en) | 2017-08-16 | 2020-07-14 | Lumentum Operations Llc | Multi-layer thin film stack for diffractive optical elements |
| US11001535B2 (en) * | 2019-04-26 | 2021-05-11 | Applied Materials, Inc. | Transferring nanostructures from wafers to transparent substrates |
| US11782195B2 (en) | 2019-09-30 | 2023-10-10 | Himax Technologies Limited | Diffractive optical element and method for fabricating the diffractive optical element |
| FR3102565B1 (fr) * | 2019-10-24 | 2024-01-05 | Hydromecanique & Frottement | Dispositif optique avec une texturation de surface |
| US11644683B2 (en) | 2020-06-17 | 2023-05-09 | Himax Technologies Limited | Optical element including at least two diffractive layers |
| CN113805333A (zh) * | 2021-08-23 | 2021-12-17 | 中山大学 | 一种用于双重图案加密的光栅结构设计方法 |
| KR20230114096A (ko) * | 2022-01-24 | 2023-08-01 | 삼성전자주식회사 | 메타 광학 소자 및 이를 포함하는 전자 장치 |
| CN119856102A (zh) * | 2022-10-17 | 2025-04-18 | 依视路国际公司 | 被适配成矫正视力障碍并且减缓其进展的眼科镜片 |
| US20240151875A1 (en) * | 2022-11-07 | 2024-05-09 | Visera Technologies Company Limited | Optical device |
| KR102799251B1 (ko) * | 2022-11-11 | 2025-04-25 | (주)옵토닉스 | 넓은 파장 대역에서 높은 회절 효율을 갖는 2층 격자구조 투과형 회절 격자 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004062200A (ja) * | 2002-07-30 | 2004-02-26 | Agilent Technol Inc | 回折光学素子及びその製作方法 |
| KR100697614B1 (ko) * | 2006-01-31 | 2007-03-22 | 주식회사 엘지에스 | 회절격자 및 그 제조 방법 |
| JP2011187139A (ja) * | 2010-03-10 | 2011-09-22 | Hitachi Maxell Ltd | グレーティング素子及びその製造方法、並びに、そのグレーティング素子を用いた光ピックアップ装置 |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4895790A (en) | 1987-09-21 | 1990-01-23 | Massachusetts Institute Of Technology | High-efficiency, multilevel, diffractive optical elements |
| US5161059A (en) | 1987-09-21 | 1992-11-03 | Massachusetts Institute Of Technology | High-efficiency, multilevel, diffractive optical elements |
| US5245468A (en) | 1990-12-14 | 1993-09-14 | Ford Motor Company | Anti-reflective transparent coating |
| JPH0643311A (ja) | 1992-07-22 | 1994-02-18 | Nippon Telegr & Teleph Corp <Ntt> | 回折光学素子及びその製造方法 |
| US5606434A (en) | 1994-06-30 | 1997-02-25 | University Of North Carolina | Achromatic optical system including diffractive optical element |
| US6829091B2 (en) | 1997-02-07 | 2004-12-07 | Canon Kabushiki Kaisha | Optical system and optical instrument with diffractive optical element |
| US6055262A (en) | 1997-06-11 | 2000-04-25 | Honeywell Inc. | Resonant reflector for improved optoelectronic device performance and enhanced applicability |
| JPH11174217A (ja) | 1997-12-16 | 1999-07-02 | Canon Inc | 回折光学素子及びその製造方法 |
| TW519574B (en) * | 2000-10-20 | 2003-02-01 | Nikon Corp | Multilayer mirror and method for making the same, and EUV optical system comprising the same, and EUV microlithography system comprising the same |
| TW531780B (en) * | 2001-09-07 | 2003-05-11 | Promos Technologies Inc | Method for forming uniform anti-reflection layer |
| JP2004028862A (ja) | 2002-06-27 | 2004-01-29 | Harmonic Drive Syst Ind Co Ltd | 投影型エンコーダ |
| EP1602947A4 (en) | 2003-03-13 | 2007-03-28 | Asahi Glass Co Ltd | Diffraction element and optical device |
| US20040263981A1 (en) | 2003-06-27 | 2004-12-30 | Coleman Christopher L. | Diffractive optical element with anti-reflection coating |
| JP2005084485A (ja) * | 2003-09-10 | 2005-03-31 | Nikon Corp | 回折光学素子 |
| US6947224B2 (en) * | 2003-09-19 | 2005-09-20 | Agilent Technologies, Inc. | Methods to make diffractive optical elements |
| FR2861183B1 (fr) | 2003-10-15 | 2006-01-21 | Thales Sa | Elements d'optique diffractive de type binaire pour une utilisation sur une large bande spectrale |
| DE202005021868U1 (de) * | 2004-05-04 | 2010-09-23 | Friedrich-Schiller-Universität Jena | Diffraktive Elemente mit Antireflex-Eigenschaften |
| US7879209B2 (en) | 2004-08-20 | 2011-02-01 | Jds Uniphase Corporation | Cathode for sputter coating |
| JP2007234094A (ja) * | 2006-02-28 | 2007-09-13 | Epson Toyocom Corp | 回折格子体、これを用いた光ヘッド装置及び回折格子体の製造方法 |
| EP1855127A1 (en) | 2006-05-12 | 2007-11-14 | Rolic AG | Optically effective surface relief microstructures and method of making them |
| US7848020B2 (en) * | 2006-06-02 | 2010-12-07 | Jds Uniphase Corporation | Thin-film design for positive and/or negative C-plate |
| CA2600900A1 (en) * | 2006-09-21 | 2008-03-21 | Nippon Sheet Glass Company, Limited | Transmissive diffraction grating, and spectral separation element and spectroscope using the same |
| JP5280654B2 (ja) * | 2006-09-21 | 2013-09-04 | 日本板硝子株式会社 | 透過型回折格子、並びに、それを用いた分光素子及び分光器 |
| CN101140400A (zh) * | 2007-10-19 | 2008-03-12 | 中国科学院上海光学精密机械研究所 | 脉冲压缩光栅用多层介质膜的优化设计方法 |
| US8384997B2 (en) | 2008-01-21 | 2013-02-26 | Primesense Ltd | Optical pattern projection |
| JP2012039042A (ja) | 2010-08-11 | 2012-02-23 | Sony Corp | メモリ素子 |
| TWI855290B (zh) | 2012-07-16 | 2024-09-11 | 美商唯亞威方案公司 | 光學濾波器及感測器系統 |
| CN103424995B (zh) | 2013-06-05 | 2015-02-11 | 上海理工大学 | 导模共振滤光片光刻胶层的优化方法 |
| DE102015218702A1 (de) | 2015-09-29 | 2017-03-30 | Dr. Johannes Heidenhain Gmbh | Optisches Schichtsystem |
| US9960199B2 (en) | 2015-12-29 | 2018-05-01 | Viavi Solutions Inc. | Dielectric mirror based multispectral filter array |
| FR3047810B1 (fr) | 2016-02-12 | 2018-05-25 | Thales | Composant diffractif sub longueur d'onde large bande spectracle |
| CN106654858B (zh) * | 2017-03-08 | 2021-03-19 | 长春理工大学 | 具有双层亚波长光栅反射镜的垂直腔面发射半导体激光器 |
| JP6981074B2 (ja) | 2017-07-25 | 2021-12-15 | Ａｇｃ株式会社 | 光学素子 |
| DE102017213330A1 (de) | 2017-08-02 | 2019-02-07 | Dr. Johannes Heidenhain Gmbh | Abtastplatte für eine optische Positionsmesseinrichtung |
| US10712475B2 (en) | 2017-08-16 | 2020-07-14 | Lumentum Operations Llc | Multi-layer thin film stack for diffractive optical elements |
| US10802185B2 (en) | 2017-08-16 | 2020-10-13 | Lumentum Operations Llc | Multi-level diffractive optical element thin film coating |
-
2017
- 2017-12-11 US US15/837,990 patent/US10712475B2/en active Active
-
2018
- 2018-07-17 TW TW107124667A patent/TWI791557B/zh active
- 2018-07-18 JP JP2018135183A patent/JP7383372B2/ja active Active
- 2018-07-31 IL IL260918A patent/IL260918B2/en unknown
- 2018-08-10 EP EP18188407.3A patent/EP3444642B1/en active Active
- 2018-08-14 KR KR1020180095147A patent/KR102698578B1/ko active Active
- 2018-08-15 CN CN201810926942.0A patent/CN109407190B/zh active Active
- 2018-08-15 CN CN202210050543.9A patent/CN114509829A/zh active Pending
-
2020
- 2020-06-30 US US16/946,636 patent/US11543562B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004062200A (ja) * | 2002-07-30 | 2004-02-26 | Agilent Technol Inc | 回折光学素子及びその製作方法 |
| KR100697614B1 (ko) * | 2006-01-31 | 2007-03-22 | 주식회사 엘지에스 | 회절격자 및 그 제조 방법 |
| JP2011187139A (ja) * | 2010-03-10 | 2011-09-22 | Hitachi Maxell Ltd | グレーティング素子及びその製造方法、並びに、そのグレーティング素子を用いた光ピックアップ装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109407190B (zh) | 2022-02-01 |
| US11543562B2 (en) | 2023-01-03 |
| CN114509829A (zh) | 2022-05-17 |
| EP3444642A1 (en) | 2019-02-20 |
| EP3444642B1 (en) | 2024-06-26 |
| IL260918B2 (en) | 2023-06-01 |
| JP2019035947A (ja) | 2019-03-07 |
| IL260918A (en) | 2019-01-31 |
| KR20190019025A (ko) | 2019-02-26 |
| TWI791557B (zh) | 2023-02-11 |
| JP7383372B2 (ja) | 2023-11-20 |
| TW201910816A (zh) | 2019-03-16 |
| CN109407190A (zh) | 2019-03-01 |
| US20190056531A1 (en) | 2019-02-21 |
| US10712475B2 (en) | 2020-07-14 |
| US20200400861A1 (en) | 2020-12-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102698578B1 (ko) | 회절 광학 소자를 위한 다층 박막 스택 | |
| JP7348991B2 (ja) | 多レベル回折光学素子の薄膜コーティング | |
| US11762134B2 (en) | Diffractive optical element | |
| KR102766473B1 (ko) | 그레이톤 리소그래피 및 경사 에칭을 사용하여 깊이 조절된 경사 격자들 | |
| JP2019035947A5 (enExample) | ||
| US20150362641A1 (en) | High Index Contrast Grating Structure for Light Manipulation and Related Method | |
| JP7533222B2 (ja) | 回折光学素子および照明光学系 | |
| JP2019035954A5 (enExample) | ||
| TWI477810B (zh) | 基於非週期性次波長光柵之光學裝置 | |
| US20240201426A1 (en) | Multi-layer high-efficiency dielectric grating with improved manufacturability | |
| Hobbs et al. | Pulsed laser damage resistance of nano-structured polarizers for 1064nm | |
| Lin et al. | Dual-wavelength membrane-based diffractive optical element with extended depth-of-focus for optical pickup head | |
| Lee | Design and Fabrication of Diffractive Light‐Collecting Microoptical Device with 1D and 2D Lamellar Grating Structures |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20180814 |
|
| PG1501 | Laying open of application | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20210806 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20180814 Comment text: Patent Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20230515 Patent event code: PE09021S01D |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20231113 Patent event code: PE09021S01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20240614 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20240821 Patent event code: PR07011E01D |
|
| PR1002 | Payment of registration fee |
Payment date: 20240821 End annual number: 3 Start annual number: 1 |
|
| PG1601 | Publication of registration |