KR102619228B1 - 가변 연마제 분포를 갖는 바닥 패드 - Google Patents

가변 연마제 분포를 갖는 바닥 패드 Download PDF

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Publication number
KR102619228B1
KR102619228B1 KR1020207005879A KR20207005879A KR102619228B1 KR 102619228 B1 KR102619228 B1 KR 102619228B1 KR 1020207005879 A KR1020207005879 A KR 1020207005879A KR 20207005879 A KR20207005879 A KR 20207005879A KR 102619228 B1 KR102619228 B1 KR 102619228B1
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South Korea
Prior art keywords
concentration
abrasive
radius
delete delete
treated article
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Korean (ko)
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KR20200036911A (ko
Inventor
리쥔 주
앤드류 씨 앤더슨
사라 엘 하겐
제시 디 룬드
치홍 니에
데이비드 씨 레이첼
킴 씨 이세 작스
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쓰리엠 이노베이티브 프로퍼티즈 캄파니
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Publication of KR20200036911A publication Critical patent/KR20200036911A/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/04—Zonally-graded surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/06—Connecting the ends of materials, e.g. for making abrasive belts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28—Resins or natural or synthetic macromolecular compounds

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Cleaning Implements For Floors, Carpets, Furniture, Walls, And The Like (AREA)
KR1020207005879A 2017-07-31 2018-07-09 가변 연마제 분포를 갖는 바닥 패드 Active KR102619228B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762539120P 2017-07-31 2017-07-31
US62/539,120 2017-07-31
PCT/IB2018/055037 WO2019025883A1 (en) 2017-07-31 2018-07-09 VARIABLE ABRASIVE DISTRIBUTION FLOOR MAT

Publications (2)

Publication Number Publication Date
KR20200036911A KR20200036911A (ko) 2020-04-07
KR102619228B1 true KR102619228B1 (ko) 2024-01-02

Family

ID=63143295

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020207005879A Active KR102619228B1 (ko) 2017-07-31 2018-07-09 가변 연마제 분포를 갖는 바닥 패드

Country Status (8)

Country Link
US (1) US11806838B2 (enExample)
EP (1) EP3661697B1 (enExample)
JP (1) JP7262439B2 (enExample)
KR (1) KR102619228B1 (enExample)
CA (1) CA3071501A1 (enExample)
MX (1) MX2020001195A (enExample)
TW (1) TWI826383B (enExample)
WO (1) WO2019025883A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115515752A (zh) * 2020-04-07 2022-12-23 圣戈班磨料磨具有限公司 固结磨料抛光轮
CN114378715B (zh) * 2020-10-16 2023-05-30 万华化学集团电子材料有限公司 一种化学机械抛光垫及抛光方法
US20240316724A1 (en) * 2023-03-21 2024-09-26 Taiwan Semiconductor Manufacturing Company, Ltd. Multi-pattern in-pad surface for polish rate control

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050095959A1 (en) * 1999-11-22 2005-05-05 Chien-Min Sung Contoured CMP pad dresser and associated methods
JP2008532781A (ja) * 2005-03-15 2008-08-21 エイチティーシー スウェーデン エービー 硬い表面を維持するための方法及び工具、及びかかる工具の製造方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1694594C3 (de) 1960-01-11 1975-05-28 Minnesota Mining And Manufacturing Co., Saint Paul, Minn. (V.St.A.) Reinigungs- und Polierkörper
US6062958A (en) 1997-04-04 2000-05-16 Micron Technology, Inc. Variable abrasive polishing pad for mechanical and chemical-mechanical planarization
ES2174590T3 (es) * 1998-03-27 2002-11-01 Norton Co Herramientas abrasivas.
US20060059785A1 (en) * 2002-09-24 2006-03-23 Chien-Min Sung Methods of maximizing retention of superabrasive particles in a metal matrix
TWI238753B (en) * 2002-12-19 2005-09-01 Miyanaga Kk Diamond disk for grinding
US20050076577A1 (en) 2003-10-10 2005-04-14 Hall Richard W.J. Abrasive tools made with a self-avoiding abrasive grain array
US10065283B2 (en) * 2005-03-15 2018-09-04 Twister Cleaning Technology Ab Method and tool for maintenance of hard surfaces, and a method for manufacturing such a tool
ES2286730T3 (es) * 2005-03-15 2007-12-01 Htc Sweden Ab Procedimiento para el mantenimiento de superficies duras.
JP5680621B2 (ja) 2009-04-17 2015-03-04 スリーエム イノベイティブ プロパティズ カンパニー 転写物品を使用して作製される平面状の研磨物品及びその作製方法
EP2490066A4 (en) 2009-10-15 2013-04-17 Sharp Kk LIQUID CRYSTAL DISPLAY PANEL, METHOD FOR PRODUCING THE SAME, AND LIQUID CRYSTAL DISPLAY DEVICE
ITMI20110850A1 (it) 2011-05-16 2012-11-17 Nicola Fiore Utensile multi-abrasivo
WO2013181582A1 (en) 2012-05-31 2013-12-05 Ryan Webster Diamond impregnated polishing pad with diamond pucks
TWI589404B (zh) 2013-06-28 2017-07-01 聖高拜磨料有限公司 基於向日葵圖案之經塗佈的研磨製品
KR102591496B1 (ko) 2015-09-08 2023-10-18 쓰리엠 이노베이티브 프로퍼티즈 컴파니 연마 응집체를 가진 연마 회전 공구
USD843672S1 (en) 2017-07-31 2019-03-19 3M Innovative Properties Company Floor pad
USD844272S1 (en) 2017-08-09 2019-03-26 3M Innovative Properties Company Floor pad
USD843673S1 (en) 2017-08-09 2019-03-19 3M Innovtive Properties Company Floor pad

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050095959A1 (en) * 1999-11-22 2005-05-05 Chien-Min Sung Contoured CMP pad dresser and associated methods
JP2008532781A (ja) * 2005-03-15 2008-08-21 エイチティーシー スウェーデン エービー 硬い表面を維持するための方法及び工具、及びかかる工具の製造方法

Also Published As

Publication number Publication date
BR112020002026A2 (pt) 2020-10-06
JP2020529329A (ja) 2020-10-08
TW201909828A (zh) 2019-03-16
US11806838B2 (en) 2023-11-07
EP3661697B1 (en) 2025-02-19
EP3661697A1 (en) 2020-06-10
KR20200036911A (ko) 2020-04-07
TWI826383B (zh) 2023-12-21
US20200156216A1 (en) 2020-05-21
WO2019025883A1 (en) 2019-02-07
JP7262439B2 (ja) 2023-04-21
MX2020001195A (es) 2020-03-20
CA3071501A1 (en) 2019-02-07

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