KR102618763B1 - 투영 리소그래피용 조명 광학 어셈블리 - Google Patents

투영 리소그래피용 조명 광학 어셈블리 Download PDF

Info

Publication number
KR102618763B1
KR102618763B1 KR1020177008187A KR20177008187A KR102618763B1 KR 102618763 B1 KR102618763 B1 KR 102618763B1 KR 1020177008187 A KR1020177008187 A KR 1020177008187A KR 20177008187 A KR20177008187 A KR 20177008187A KR 102618763 B1 KR102618763 B1 KR 102618763B1
Authority
KR
South Korea
Prior art keywords
illumination
pupil
facets
optical assembly
facet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020177008187A
Other languages
English (en)
Korean (ko)
Other versions
KR20170048444A (ko
Inventor
마틴 엔드레스
Original Assignee
칼 짜이스 에스엠티 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칼 짜이스 에스엠티 게엠베하 filed Critical 칼 짜이스 에스엠티 게엠베하
Publication of KR20170048444A publication Critical patent/KR20170048444A/ko
Application granted granted Critical
Publication of KR102618763B1 publication Critical patent/KR102618763B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Optical Elements Other Than Lenses (AREA)
KR1020177008187A 2014-09-03 2015-08-21 투영 리소그래피용 조명 광학 어셈블리 Active KR102618763B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014217610.7 2014-09-03
DE102014217610.7A DE102014217610A1 (de) 2014-09-03 2014-09-03 Beleuchtungsoptik für die Projektionslithografie
PCT/EP2015/069216 WO2016034436A1 (en) 2014-09-03 2015-08-21 Illumination optical assembly for projection lithography

Publications (2)

Publication Number Publication Date
KR20170048444A KR20170048444A (ko) 2017-05-08
KR102618763B1 true KR102618763B1 (ko) 2023-12-28

Family

ID=53872082

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020177008187A Active KR102618763B1 (ko) 2014-09-03 2015-08-21 투영 리소그래피용 조명 광학 어셈블리

Country Status (6)

Country Link
US (1) US9996010B2 (https=)
JP (1) JP6683688B2 (https=)
KR (1) KR102618763B1 (https=)
DE (1) DE102014217610A1 (https=)
TW (1) TWI691797B (https=)
WO (1) WO2016034436A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020116091A1 (de) * 2019-10-30 2021-05-06 Taiwan Semiconductor Manufacturing Co., Ltd. Abstimmbare beleuchtungsvorrichtung fürlithographiesysteme

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100231882A1 (en) 2007-09-21 2010-09-16 Carl Zeiss Smt Ag Bundle-guiding optical collector for collecting the emission of a radiation source
JP2017507356A (ja) 2014-02-21 2017-03-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影リソグラフィのための照明光学ユニット

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10317667A1 (de) * 2003-04-17 2004-11-18 Carl Zeiss Smt Ag Optisches Element für ein Beleuchtungssystem
JP5487118B2 (ja) * 2008-02-15 2014-05-07 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光装置に使用するファセットミラー
DE102008009600A1 (de) * 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie
DE102008002749A1 (de) * 2008-06-27 2009-12-31 Carl Zeiss Smt Ag Beleuchtungsoptik für die Mikrolithografie
CN102422225B (zh) 2009-03-06 2014-07-09 卡尔蔡司Smt有限责任公司 用于微光刻的照明光学系统与光学系统
DE102012210961A1 (de) * 2012-06-27 2013-06-06 Carl Zeiss Smt Gmbh Baugruppe für eine Projektionsbelichtungsanlage für die EUV-Projektionslithografie

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100231882A1 (en) 2007-09-21 2010-09-16 Carl Zeiss Smt Ag Bundle-guiding optical collector for collecting the emission of a radiation source
JP2010539716A (ja) * 2007-09-21 2010-12-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 放射線源の放射光を集めるための光束誘導光学集光器
JP2017507356A (ja) 2014-02-21 2017-03-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影リソグラフィのための照明光学ユニット

Also Published As

Publication number Publication date
TWI691797B (zh) 2020-04-21
US9996010B2 (en) 2018-06-12
KR20170048444A (ko) 2017-05-08
US20170160644A1 (en) 2017-06-08
WO2016034436A1 (en) 2016-03-10
DE102014217610A1 (de) 2016-03-03
TW201614381A (en) 2016-04-16
JP2017527854A (ja) 2017-09-21
JP6683688B2 (ja) 2020-04-22

Similar Documents

Publication Publication Date Title
JP6270166B2 (ja) リソグラフィ投影露光装置の照明視野にわたる照明強度を予め定めるための照明強度補正デバイス
KR20110104904A (ko) 투영 리소그라피용 조명 광학 시스템
US9977335B2 (en) Illumination optical unit for projection lithography
US9791784B2 (en) Assembly for a projection exposure apparatus for EUV projection lithography
CN102483516A (zh) 在像场中成像物场的成像光学系统和照明物场的照明光学系统
US9933704B2 (en) Microlithography illumination optical system and microlithography projection exposure apparatus including same
JP6987817B2 (ja) Ｅｕｖ投影リソグラフィのための照明系及び照明光学ユニット
US10133182B2 (en) Illumination optical assembly for a projection exposure apparatus
KR102631210B1 (ko) Euv 투영 리소그래피용 패싯 미러 및 이러한 패싯 미러를 포함하는 조명 광학 유닛
KR102343801B1 (ko) 조명 광학 유닛 및 euv 투영 리소그래피용 조명 시스템
WO2017046136A1 (en) Illumination optical unit for projection lithography
KR102618763B1 (ko) 투영 리소그래피용 조명 광학 어셈블리
WO2025073460A1 (en) Optical system for a projection exposure apparatus, and method for specifying an illumination pupil
KR102631211B1 (ko) 투영 리소그래피용 조명 광학 어셈블리
US9110378B2 (en) Illumination optical system for projection lithography
JP2017527854A5 (https=)
JP2017526969A5 (https=)

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601