DE102014217610A1 - Beleuchtungsoptik für die Projektionslithografie - Google Patents
Beleuchtungsoptik für die Projektionslithografie Download PDFInfo
- Publication number
- DE102014217610A1 DE102014217610A1 DE102014217610.7A DE102014217610A DE102014217610A1 DE 102014217610 A1 DE102014217610 A1 DE 102014217610A1 DE 102014217610 A DE102014217610 A DE 102014217610A DE 102014217610 A1 DE102014217610 A1 DE 102014217610A1
- Authority
- DE
- Germany
- Prior art keywords
- illumination
- facets
- pupil
- facet mirror
- object field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000005286 illumination Methods 0.000 title claims abstract description 215
- 238000001459 lithography Methods 0.000 title claims abstract description 5
- 210000001747 pupil Anatomy 0.000 claims abstract description 146
- 230000003287 optical effect Effects 0.000 claims abstract description 24
- 238000006073 displacement reaction Methods 0.000 claims abstract description 17
- 230000001179 pupillary effect Effects 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000013507 mapping Methods 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 description 62
- 238000013508 migration Methods 0.000 description 10
- 230000005012 migration Effects 0.000 description 9
- 238000000265 homogenisation Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 2
- 238000001393 microlithography Methods 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 101000683591 Homo sapiens Ras-responsive element-binding protein 1 Proteins 0.000 description 1
- 102100023544 Ras-responsive element-binding protein 1 Human genes 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Microscoopes, Condenser (AREA)
- Optical Elements Other Than Lenses (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014217610.7A DE102014217610A1 (de) | 2014-09-03 | 2014-09-03 | Beleuchtungsoptik für die Projektionslithografie |
| KR1020177008187A KR102618763B1 (ko) | 2014-09-03 | 2015-08-21 | 투영 리소그래피용 조명 광학 어셈블리 |
| PCT/EP2015/069216 WO2016034436A1 (en) | 2014-09-03 | 2015-08-21 | Illumination optical assembly for projection lithography |
| JP2017512828A JP6683688B2 (ja) | 2014-09-03 | 2015-08-21 | 投影リソグラフィのための照明光学アセンブリ |
| TW104127656A TWI691797B (zh) | 2014-09-03 | 2015-08-25 | 投影微影的照明光學裝置 |
| US15/439,020 US9996010B2 (en) | 2014-09-03 | 2017-02-22 | Illumination optical assembly for projection lithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014217610.7A DE102014217610A1 (de) | 2014-09-03 | 2014-09-03 | Beleuchtungsoptik für die Projektionslithografie |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102014217610A1 true DE102014217610A1 (de) | 2016-03-03 |
Family
ID=53872082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102014217610.7A Ceased DE102014217610A1 (de) | 2014-09-03 | 2014-09-03 | Beleuchtungsoptik für die Projektionslithografie |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9996010B2 (https=) |
| JP (1) | JP6683688B2 (https=) |
| KR (1) | KR102618763B1 (https=) |
| DE (1) | DE102014217610A1 (https=) |
| TW (1) | TWI691797B (https=) |
| WO (1) | WO2016034436A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102020116091A1 (de) * | 2019-10-30 | 2021-05-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Abstimmbare beleuchtungsvorrichtung fürlithographiesysteme |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10317667A1 (de) * | 2003-04-17 | 2004-11-18 | Carl Zeiss Smt Ag | Optisches Element für ein Beleuchtungssystem |
| DE102008009600A1 (de) * | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
| WO2010099807A1 (de) | 2009-03-06 | 2010-09-10 | Carl Zeiss Smt Ag | Beleuchtungsoptik sowie optische systeme für die mikrolithographie |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007045396A1 (de) * | 2007-09-21 | 2009-04-23 | Carl Zeiss Smt Ag | Bündelführender optischer Kollektor zur Erfassung der Emission einer Strahlungsquelle |
| JP5487118B2 (ja) * | 2008-02-15 | 2014-05-07 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィのための投影露光装置に使用するファセットミラー |
| DE102008002749A1 (de) * | 2008-06-27 | 2009-12-31 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die Mikrolithografie |
| DE102012210961A1 (de) * | 2012-06-27 | 2013-06-06 | Carl Zeiss Smt Gmbh | Baugruppe für eine Projektionsbelichtungsanlage für die EUV-Projektionslithografie |
| DE102014203187A1 (de) * | 2014-02-21 | 2015-08-27 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithografie |
-
2014
- 2014-09-03 DE DE102014217610.7A patent/DE102014217610A1/de not_active Ceased
-
2015
- 2015-08-21 JP JP2017512828A patent/JP6683688B2/ja active Active
- 2015-08-21 WO PCT/EP2015/069216 patent/WO2016034436A1/en not_active Ceased
- 2015-08-21 KR KR1020177008187A patent/KR102618763B1/ko active Active
- 2015-08-25 TW TW104127656A patent/TWI691797B/zh active
-
2017
- 2017-02-22 US US15/439,020 patent/US9996010B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10317667A1 (de) * | 2003-04-17 | 2004-11-18 | Carl Zeiss Smt Ag | Optisches Element für ein Beleuchtungssystem |
| US20060132747A1 (en) | 2003-04-17 | 2006-06-22 | Carl Zeiss Smt Ag | Optical element for an illumination system |
| DE102008009600A1 (de) * | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
| WO2010099807A1 (de) | 2009-03-06 | 2010-09-10 | Carl Zeiss Smt Ag | Beleuchtungsoptik sowie optische systeme für die mikrolithographie |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI691797B (zh) | 2020-04-21 |
| US9996010B2 (en) | 2018-06-12 |
| KR102618763B1 (ko) | 2023-12-28 |
| KR20170048444A (ko) | 2017-05-08 |
| US20170160644A1 (en) | 2017-06-08 |
| WO2016034436A1 (en) | 2016-03-10 |
| TW201614381A (en) | 2016-04-16 |
| JP2017527854A (ja) | 2017-09-21 |
| JP6683688B2 (ja) | 2020-04-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R002 | Refusal decision in examination/registration proceedings | ||
| R003 | Refusal decision now final |