KR102605453B1 - 저 기생 용량 저잡음 증폭기 - Google Patents

저 기생 용량 저잡음 증폭기 Download PDF

Info

Publication number
KR102605453B1
KR102605453B1 KR1020207008405A KR20207008405A KR102605453B1 KR 102605453 B1 KR102605453 B1 KR 102605453B1 KR 1020207008405 A KR1020207008405 A KR 1020207008405A KR 20207008405 A KR20207008405 A KR 20207008405A KR 102605453 B1 KR102605453 B1 KR 102605453B1
Authority
KR
South Korea
Prior art keywords
contact
lna
transistor
layer
noise amplifier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020207008405A
Other languages
English (en)
Korean (ko)
Other versions
KR20200060380A (ko
Inventor
시난 곡테펠리
Original Assignee
퀄컴 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 퀄컴 인코포레이티드 filed Critical 퀄컴 인코포레이티드
Publication of KR20200060380A publication Critical patent/KR20200060380A/ko
Application granted granted Critical
Publication of KR102605453B1 publication Critical patent/KR102605453B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H01L27/1203
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/201Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates the substrates comprising an insulating layer on a semiconductor body, e.g. SOI
    • H01L21/84
    • H01L27/088
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/189High-frequency amplifiers, e.g. radio frequency amplifiers
    • H03F3/19High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only
    • H03F3/193High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only with field-effect devices
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/189High-frequency amplifiers, e.g. radio frequency amplifiers
    • H03F3/19High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only
    • H03F3/195High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only in integrated circuits
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/20Power amplifiers, e.g. Class B amplifiers, Class C amplifiers
    • H03F3/21Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/20Power amplifiers, e.g. Class B amplifiers, Class C amplifiers
    • H03F3/24Power amplifiers, e.g. Class B amplifiers, Class C amplifiers of transmitter output stages
    • H03F3/245Power amplifiers, e.g. Class B amplifiers, Class C amplifiers of transmitter output stages with semiconductor devices only
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/68Combinations of amplifiers, e.g. multi-channel amplifiers for stereophonics
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04BTRANSMISSION
    • H04B1/00Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission
    • H04B1/005Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission adapting radio receivers, transmitters andtransceivers for operation on two or more bands, i.e. frequency ranges
    • H04B1/0053Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission adapting radio receivers, transmitters andtransceivers for operation on two or more bands, i.e. frequency ranges with common antenna for more than one band
    • H04B1/006Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission adapting radio receivers, transmitters andtransceivers for operation on two or more bands, i.e. frequency ranges with common antenna for more than one band using switches for selecting the desired band
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04BTRANSMISSION
    • H04B1/00Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission
    • H04B1/005Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission adapting radio receivers, transmitters andtransceivers for operation on two or more bands, i.e. frequency ranges
    • H04B1/0064Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission adapting radio receivers, transmitters andtransceivers for operation on two or more bands, i.e. frequency ranges with separate antennas for the more than one band
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04BTRANSMISSION
    • H04B1/00Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission
    • H04B1/02Transmitters
    • H04B1/04Circuits
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04BTRANSMISSION
    • H04B1/00Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission
    • H04B1/38Transceivers, i.e. devices in which transmitter and receiver form a structural unit and in which at least one part is used for functions of transmitting and receiving
    • H04B1/40Circuits
    • H04B1/50Circuits using different frequencies for the two directions of communication
    • H04B1/52Hybrid arrangements, i.e. arrangements for transition from single-path two-direction transmission to single-direction transmission on each of two paths or vice versa
    • H04B1/525Hybrid arrangements, i.e. arrangements for transition from single-path two-direction transmission to single-direction transmission on each of two paths or vice versa with means for reducing leakage of transmitter signal into the receiver
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04BTRANSMISSION
    • H04B15/00Suppression or limitation of noise or interference
    • H04B15/005Reducing noise, e.g. humm, from the supply
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01Manufacture or treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/481Internal lead connections, e.g. via connections, feedthrough structures
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F2200/00Indexing scheme relating to amplifiers
    • H03F2200/294Indexing scheme relating to amplifiers the amplifier being a low noise amplifier [LNA]

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Signal Processing (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Thin Film Transistor (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Amplifiers (AREA)
  • Transceivers (AREA)
KR1020207008405A 2017-09-27 2018-08-27 저 기생 용량 저잡음 증폭기 Active KR102605453B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201762564155P 2017-09-27 2017-09-27
US62/564,155 2017-09-27
US15/976,710 2018-05-10
US15/976,710 US10439565B2 (en) 2017-09-27 2018-05-10 Low parasitic capacitance low noise amplifier
PCT/US2018/048128 WO2019067130A1 (en) 2017-09-27 2018-08-27 LOW NOISE AMPLIFIER WITH LOW PARASITE CAPACITY

Publications (2)

Publication Number Publication Date
KR20200060380A KR20200060380A (ko) 2020-05-29
KR102605453B1 true KR102605453B1 (ko) 2023-11-22

Family

ID=65809274

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020207008405A Active KR102605453B1 (ko) 2017-09-27 2018-08-27 저 기생 용량 저잡음 증폭기

Country Status (8)

Country Link
US (1) US10439565B2 (enExample)
EP (1) EP3688806A1 (enExample)
JP (1) JP7364557B2 (enExample)
KR (1) KR102605453B1 (enExample)
CN (1) CN111164757A (enExample)
BR (1) BR112020005696B1 (enExample)
CA (1) CA3073501C (enExample)
WO (1) WO2019067130A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11239325B2 (en) * 2020-04-28 2022-02-01 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor device having backside via and method of fabricating thereof
US11450600B2 (en) 2020-05-12 2022-09-20 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor devices including decoupling capacitors
DE102020122823B4 (de) 2020-05-12 2022-06-02 Taiwan Semiconductor Manufacturing Co., Ltd. Halbleitervorrichtungen mit entkopplungskondensatoren
US11626494B2 (en) * 2020-06-17 2023-04-11 Taiwan Semiconductor Manufacturing Co., Ltd. Epitaxial backside contact
JP7542338B2 (ja) * 2020-07-02 2024-08-30 株式会社東芝 電子回路、電流計測装置、電圧計測装置、電力変換器、およびインバータ
US11355487B2 (en) * 2020-07-20 2022-06-07 Taiwan Semiconductor Manufacturing Co., Ltd. Layout designs of integrated circuits having backside routing tracks
JP2022025995A (ja) * 2020-07-30 2022-02-10 株式会社東芝 半導体装置
US11393831B2 (en) * 2020-07-31 2022-07-19 Taiwan Semiconductor Manufacturing Company Limited Optimized static random access memory
US11437379B2 (en) 2020-09-18 2022-09-06 Qualcomm Incorporated Field-effect transistors (FET) circuits employing topside and backside contacts for topside and backside routing of FET power and logic signals, and related complementary metal oxide semiconductor (CMOS) circuits
US11404374B2 (en) 2020-09-30 2022-08-02 Qualcomm Incorporated Circuits employing a back side-front side connection structure for coupling back side routing to front side routing, and related complementary metal oxide semiconductor (CMOS) circuits and methods
US12218664B2 (en) 2020-10-21 2025-02-04 Arm Limited Backside power supply techniques
US12266601B2 (en) * 2021-03-30 2025-04-01 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device structure with backside contact
US20220352256A1 (en) * 2021-04-28 2022-11-03 Taiwan Semiconductor Manufacturing Company, Ltd. Backside memory integration
US12224286B2 (en) 2021-09-22 2025-02-11 Qualcomm Incorporated Symmetric dual-sided MOS IC
CN116032221A (zh) * 2023-03-29 2023-04-28 成都明夷电子科技有限公司 一种低噪声共源共栅放大器及微波系统
US20250185292A1 (en) * 2023-12-04 2025-06-05 International Business Machines Corporation Extra gate device integration with semiconductor device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150357477A1 (en) * 2014-06-06 2015-12-10 Stmicroelectronics, Inc. Backside source-drain contact for integrated circuit transistor devices and method of making same
JP5917681B2 (ja) * 2011-03-30 2016-05-18 クアルコム,インコーポレイテッド ダイオード、それを使用する回路、および製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5917681B2 (ja) * 1978-10-18 1984-04-23 日立金属株式会社 エレベ−タベルトの緊張方法及び装置
US5541442A (en) * 1994-08-31 1996-07-30 International Business Machines Corporation Integrated compact capacitor-resistor/inductor configuration
US7402866B2 (en) 2006-06-27 2008-07-22 Taiwan Semiconductor Manufacturing Company, Ltd. Backside contacts for MOS devices
US7666723B2 (en) 2007-02-22 2010-02-23 International Business Machines Corporation Methods of forming wiring to transistor and related transistor
US8716091B2 (en) 2010-03-30 2014-05-06 International Business Machines Corporation Structure for self-aligned silicide contacts to an upside-down FET by epitaxial source and drain
US9219129B2 (en) 2012-05-10 2015-12-22 International Business Machines Corporation Inverted thin channel mosfet with self-aligned expanded source/drain
US8748245B1 (en) 2013-03-27 2014-06-10 Io Semiconductor, Inc. Semiconductor-on-insulator integrated circuit with interconnect below the insulator
CN104241357A (zh) * 2013-06-18 2014-12-24 中芯国际集成电路制造(上海)有限公司 一种晶体管、集成电路以及集成电路的制造方法
US9165926B2 (en) * 2013-10-02 2015-10-20 Taiwan Semiconductor Manufacturing Company, Ltd. Dynamic threshold MOS and methods of forming the same
WO2017052667A1 (en) 2015-09-27 2017-03-30 Intel Corporation Metal on both sides of the transistor integrated with magnetic inductors
US9755030B2 (en) 2015-12-17 2017-09-05 International Business Machines Corporation Method for reduced source and drain contact to gate stack capacitance
US9755029B1 (en) 2016-06-22 2017-09-05 Qualcomm Incorporated Switch device performance improvement through multisided biased shielding
US9780210B1 (en) 2016-08-11 2017-10-03 Qualcomm Incorporated Backside semiconductor growth
US10420171B2 (en) 2016-08-26 2019-09-17 Qualcomm Incorporated Semiconductor devices on two sides of an isolation layer

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5917681B2 (ja) * 2011-03-30 2016-05-18 クアルコム,インコーポレイテッド ダイオード、それを使用する回路、および製造方法
US20150357477A1 (en) * 2014-06-06 2015-12-10 Stmicroelectronics, Inc. Backside source-drain contact for integrated circuit transistor devices and method of making same

Also Published As

Publication number Publication date
JP7364557B2 (ja) 2023-10-18
KR20200060380A (ko) 2020-05-29
BR112020005696B1 (pt) 2023-11-21
BR112020005696A2 (pt) 2020-10-20
CA3073501A1 (en) 2019-04-04
EP3688806A1 (en) 2020-08-05
US20190097592A1 (en) 2019-03-28
CA3073501C (en) 2024-11-12
CN111164757A (zh) 2020-05-15
WO2019067130A1 (en) 2019-04-04
JP2020535697A (ja) 2020-12-03
US10439565B2 (en) 2019-10-08

Similar Documents

Publication Publication Date Title
KR102605453B1 (ko) 저 기생 용량 저잡음 증폭기
KR102054924B1 (ko) 듀얼-사이디드 프로세싱을 갖는 로직 회로 블록 레이아웃들
CN109314097B (zh) 用于反向偏置开关晶体管的方法和装置
EP3443592B1 (en) Switch device performance improvement through multisided biased shielding
US9812580B1 (en) Deep trench active device with backside body contact
EP3688795A1 (en) Bulk layer transfer processing with backside silicidation
KR102816437B1 (ko) 듀얼 사이드 콘택 스위치에서의 커패시턴스 밸런스
US10043752B2 (en) Substrate contact using dual sided silicidation
US10483392B2 (en) Capacitive tuning using backside gate
US20250072059A1 (en) Enhanced body tied to source low noise amplifier device
US20250046736A1 (en) Waffle-shaped radio frequency (rf) switch

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20200323

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20210803

Comment text: Request for Examination of Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20230821

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20231106

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20231120

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20231120

End annual number: 3

Start annual number: 1

PG1601 Publication of registration