KR102605453B1 - 저 기생 용량 저잡음 증폭기 - Google Patents
저 기생 용량 저잡음 증폭기 Download PDFInfo
- Publication number
- KR102605453B1 KR102605453B1 KR1020207008405A KR20207008405A KR102605453B1 KR 102605453 B1 KR102605453 B1 KR 102605453B1 KR 1020207008405 A KR1020207008405 A KR 1020207008405A KR 20207008405 A KR20207008405 A KR 20207008405A KR 102605453 B1 KR102605453 B1 KR 102605453B1
- Authority
- KR
- South Korea
- Prior art keywords
- contact
- lna
- transistor
- layer
- noise amplifier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H01L27/1203—
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/201—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates the substrates comprising an insulating layer on a semiconductor body, e.g. SOI
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- H01L21/84—
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- H01L27/088—
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/189—High-frequency amplifiers, e.g. radio frequency amplifiers
- H03F3/19—High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only
- H03F3/193—High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only with field-effect devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/189—High-frequency amplifiers, e.g. radio frequency amplifiers
- H03F3/19—High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only
- H03F3/195—High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only in integrated circuits
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/20—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers
- H03F3/21—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/20—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers
- H03F3/24—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers of transmitter output stages
- H03F3/245—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers of transmitter output stages with semiconductor devices only
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/68—Combinations of amplifiers, e.g. multi-channel amplifiers for stereophonics
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B1/00—Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission
- H04B1/005—Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission adapting radio receivers, transmitters andtransceivers for operation on two or more bands, i.e. frequency ranges
- H04B1/0053—Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission adapting radio receivers, transmitters andtransceivers for operation on two or more bands, i.e. frequency ranges with common antenna for more than one band
- H04B1/006—Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission adapting radio receivers, transmitters andtransceivers for operation on two or more bands, i.e. frequency ranges with common antenna for more than one band using switches for selecting the desired band
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B1/00—Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission
- H04B1/005—Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission adapting radio receivers, transmitters andtransceivers for operation on two or more bands, i.e. frequency ranges
- H04B1/0064—Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission adapting radio receivers, transmitters andtransceivers for operation on two or more bands, i.e. frequency ranges with separate antennas for the more than one band
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B1/00—Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission
- H04B1/02—Transmitters
- H04B1/04—Circuits
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B1/00—Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission
- H04B1/38—Transceivers, i.e. devices in which transmitter and receiver form a structural unit and in which at least one part is used for functions of transmitting and receiving
- H04B1/40—Circuits
- H04B1/50—Circuits using different frequencies for the two directions of communication
- H04B1/52—Hybrid arrangements, i.e. arrangements for transition from single-path two-direction transmission to single-direction transmission on each of two paths or vice versa
- H04B1/525—Hybrid arrangements, i.e. arrangements for transition from single-path two-direction transmission to single-direction transmission on each of two paths or vice versa with means for reducing leakage of transmitter signal into the receiver
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B15/00—Suppression or limitation of noise or interference
- H04B15/005—Reducing noise, e.g. humm, from the supply
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/01—Manufacture or treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F2200/00—Indexing scheme relating to amplifiers
- H03F2200/294—Indexing scheme relating to amplifiers the amplifier being a low noise amplifier [LNA]
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Networks & Wireless Communication (AREA)
- Signal Processing (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Thin Film Transistor (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
- Amplifiers (AREA)
- Transceivers (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762564155P | 2017-09-27 | 2017-09-27 | |
| US62/564,155 | 2017-09-27 | ||
| US15/976,710 | 2018-05-10 | ||
| US15/976,710 US10439565B2 (en) | 2017-09-27 | 2018-05-10 | Low parasitic capacitance low noise amplifier |
| PCT/US2018/048128 WO2019067130A1 (en) | 2017-09-27 | 2018-08-27 | LOW NOISE AMPLIFIER WITH LOW PARASITE CAPACITY |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20200060380A KR20200060380A (ko) | 2020-05-29 |
| KR102605453B1 true KR102605453B1 (ko) | 2023-11-22 |
Family
ID=65809274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020207008405A Active KR102605453B1 (ko) | 2017-09-27 | 2018-08-27 | 저 기생 용량 저잡음 증폭기 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10439565B2 (enExample) |
| EP (1) | EP3688806A1 (enExample) |
| JP (1) | JP7364557B2 (enExample) |
| KR (1) | KR102605453B1 (enExample) |
| CN (1) | CN111164757A (enExample) |
| BR (1) | BR112020005696B1 (enExample) |
| CA (1) | CA3073501C (enExample) |
| WO (1) | WO2019067130A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11239325B2 (en) * | 2020-04-28 | 2022-02-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor device having backside via and method of fabricating thereof |
| US11450600B2 (en) | 2020-05-12 | 2022-09-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor devices including decoupling capacitors |
| DE102020122823B4 (de) | 2020-05-12 | 2022-06-02 | Taiwan Semiconductor Manufacturing Co., Ltd. | Halbleitervorrichtungen mit entkopplungskondensatoren |
| US11626494B2 (en) * | 2020-06-17 | 2023-04-11 | Taiwan Semiconductor Manufacturing Co., Ltd. | Epitaxial backside contact |
| JP7542338B2 (ja) * | 2020-07-02 | 2024-08-30 | 株式会社東芝 | 電子回路、電流計測装置、電圧計測装置、電力変換器、およびインバータ |
| US11355487B2 (en) * | 2020-07-20 | 2022-06-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Layout designs of integrated circuits having backside routing tracks |
| JP2022025995A (ja) * | 2020-07-30 | 2022-02-10 | 株式会社東芝 | 半導体装置 |
| US11393831B2 (en) * | 2020-07-31 | 2022-07-19 | Taiwan Semiconductor Manufacturing Company Limited | Optimized static random access memory |
| US11437379B2 (en) | 2020-09-18 | 2022-09-06 | Qualcomm Incorporated | Field-effect transistors (FET) circuits employing topside and backside contacts for topside and backside routing of FET power and logic signals, and related complementary metal oxide semiconductor (CMOS) circuits |
| US11404374B2 (en) | 2020-09-30 | 2022-08-02 | Qualcomm Incorporated | Circuits employing a back side-front side connection structure for coupling back side routing to front side routing, and related complementary metal oxide semiconductor (CMOS) circuits and methods |
| US12218664B2 (en) | 2020-10-21 | 2025-02-04 | Arm Limited | Backside power supply techniques |
| US12266601B2 (en) * | 2021-03-30 | 2025-04-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device structure with backside contact |
| US20220352256A1 (en) * | 2021-04-28 | 2022-11-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Backside memory integration |
| US12224286B2 (en) | 2021-09-22 | 2025-02-11 | Qualcomm Incorporated | Symmetric dual-sided MOS IC |
| CN116032221A (zh) * | 2023-03-29 | 2023-04-28 | 成都明夷电子科技有限公司 | 一种低噪声共源共栅放大器及微波系统 |
| US20250185292A1 (en) * | 2023-12-04 | 2025-06-05 | International Business Machines Corporation | Extra gate device integration with semiconductor device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150357477A1 (en) * | 2014-06-06 | 2015-12-10 | Stmicroelectronics, Inc. | Backside source-drain contact for integrated circuit transistor devices and method of making same |
| JP5917681B2 (ja) * | 2011-03-30 | 2016-05-18 | クアルコム,インコーポレイテッド | ダイオード、それを使用する回路、および製造方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5917681B2 (ja) * | 1978-10-18 | 1984-04-23 | 日立金属株式会社 | エレベ−タベルトの緊張方法及び装置 |
| US5541442A (en) * | 1994-08-31 | 1996-07-30 | International Business Machines Corporation | Integrated compact capacitor-resistor/inductor configuration |
| US7402866B2 (en) | 2006-06-27 | 2008-07-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Backside contacts for MOS devices |
| US7666723B2 (en) | 2007-02-22 | 2010-02-23 | International Business Machines Corporation | Methods of forming wiring to transistor and related transistor |
| US8716091B2 (en) | 2010-03-30 | 2014-05-06 | International Business Machines Corporation | Structure for self-aligned silicide contacts to an upside-down FET by epitaxial source and drain |
| US9219129B2 (en) | 2012-05-10 | 2015-12-22 | International Business Machines Corporation | Inverted thin channel mosfet with self-aligned expanded source/drain |
| US8748245B1 (en) | 2013-03-27 | 2014-06-10 | Io Semiconductor, Inc. | Semiconductor-on-insulator integrated circuit with interconnect below the insulator |
| CN104241357A (zh) * | 2013-06-18 | 2014-12-24 | 中芯国际集成电路制造(上海)有限公司 | 一种晶体管、集成电路以及集成电路的制造方法 |
| US9165926B2 (en) * | 2013-10-02 | 2015-10-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Dynamic threshold MOS and methods of forming the same |
| WO2017052667A1 (en) | 2015-09-27 | 2017-03-30 | Intel Corporation | Metal on both sides of the transistor integrated with magnetic inductors |
| US9755030B2 (en) | 2015-12-17 | 2017-09-05 | International Business Machines Corporation | Method for reduced source and drain contact to gate stack capacitance |
| US9755029B1 (en) | 2016-06-22 | 2017-09-05 | Qualcomm Incorporated | Switch device performance improvement through multisided biased shielding |
| US9780210B1 (en) | 2016-08-11 | 2017-10-03 | Qualcomm Incorporated | Backside semiconductor growth |
| US10420171B2 (en) | 2016-08-26 | 2019-09-17 | Qualcomm Incorporated | Semiconductor devices on two sides of an isolation layer |
-
2018
- 2018-05-10 US US15/976,710 patent/US10439565B2/en active Active
- 2018-08-27 WO PCT/US2018/048128 patent/WO2019067130A1/en not_active Ceased
- 2018-08-27 CA CA3073501A patent/CA3073501C/en active Active
- 2018-08-27 JP JP2020516404A patent/JP7364557B2/ja active Active
- 2018-08-27 BR BR112020005696-0A patent/BR112020005696B1/pt active IP Right Grant
- 2018-08-27 CN CN201880062330.XA patent/CN111164757A/zh active Pending
- 2018-08-27 EP EP18769006.0A patent/EP3688806A1/en active Pending
- 2018-08-27 KR KR1020207008405A patent/KR102605453B1/ko active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5917681B2 (ja) * | 2011-03-30 | 2016-05-18 | クアルコム,インコーポレイテッド | ダイオード、それを使用する回路、および製造方法 |
| US20150357477A1 (en) * | 2014-06-06 | 2015-12-10 | Stmicroelectronics, Inc. | Backside source-drain contact for integrated circuit transistor devices and method of making same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7364557B2 (ja) | 2023-10-18 |
| KR20200060380A (ko) | 2020-05-29 |
| BR112020005696B1 (pt) | 2023-11-21 |
| BR112020005696A2 (pt) | 2020-10-20 |
| CA3073501A1 (en) | 2019-04-04 |
| EP3688806A1 (en) | 2020-08-05 |
| US20190097592A1 (en) | 2019-03-28 |
| CA3073501C (en) | 2024-11-12 |
| CN111164757A (zh) | 2020-05-15 |
| WO2019067130A1 (en) | 2019-04-04 |
| JP2020535697A (ja) | 2020-12-03 |
| US10439565B2 (en) | 2019-10-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20200323 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20210803 Comment text: Request for Examination of Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20230821 Patent event code: PE09021S01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20231106 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20231120 Patent event code: PR07011E01D |
|
| PR1002 | Payment of registration fee |
Payment date: 20231120 End annual number: 3 Start annual number: 1 |
|
| PG1601 | Publication of registration |