KR102603098B1 - 포토마스크의 제조 방법 - Google Patents
포토마스크의 제조 방법 Download PDFInfo
- Publication number
- KR102603098B1 KR102603098B1 KR1020210052072A KR20210052072A KR102603098B1 KR 102603098 B1 KR102603098 B1 KR 102603098B1 KR 1020210052072 A KR1020210052072 A KR 1020210052072A KR 20210052072 A KR20210052072 A KR 20210052072A KR 102603098 B1 KR102603098 B1 KR 102603098B1
- Authority
- KR
- South Korea
- Prior art keywords
- film
- area
- region
- etching
- exposure
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 190
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 59
- 239000000758 substrate Substances 0.000 claims abstract description 32
- 230000008569 process Effects 0.000 claims description 138
- 238000005530 etching Methods 0.000 claims description 108
- 230000010363 phase shift Effects 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 22
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 20
- 230000003287 optical effect Effects 0.000 abstract description 11
- 239000010408 film Substances 0.000 description 474
- 239000010410 layer Substances 0.000 description 120
- 230000018109 developmental process Effects 0.000 description 37
- 238000002834 transmittance Methods 0.000 description 32
- 239000002184 metal Substances 0.000 description 21
- 238000001039 wet etching Methods 0.000 description 19
- 238000004090 dissolution Methods 0.000 description 18
- 238000001312 dry etching Methods 0.000 description 13
- 150000002736 metal compounds Chemical class 0.000 description 13
- 239000000126 substance Substances 0.000 description 13
- 150000001875 compounds Chemical class 0.000 description 12
- 239000007789 gas Substances 0.000 description 10
- 238000004544 sputter deposition Methods 0.000 description 8
- 238000007740 vapor deposition Methods 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 230000003667 anti-reflective effect Effects 0.000 description 6
- 230000000903 blocking effect Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 238000001459 lithography Methods 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 238000010422 painting Methods 0.000 description 4
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000007261 regionalization Effects 0.000 description 3
- 238000004904 shortening Methods 0.000 description 3
- 229910021332 silicide Inorganic materials 0.000 description 3
- -1 silicide compound Chemical class 0.000 description 3
- 239000002210 silicon-based material Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000004380 ashing Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020230155668A KR20230160757A (ko) | 2020-04-28 | 2023-11-10 | 포토마스크의 제조 방법 |
| KR1020230155666A KR20230161386A (ko) | 2020-04-28 | 2023-11-10 | 포토마스크의 제조 방법 |
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2020-079752 | 2020-04-28 | ||
| JP2020079752 | 2020-04-28 | ||
| JPJP-P-2020-079753 | 2020-04-28 | ||
| JP2020079753A JP7489821B2 (ja) | 2020-04-28 | 2020-04-28 | フォトマスクの製造方法 |
| JP2020173464A JP2021176002A (ja) | 2020-04-28 | 2020-10-14 | フォトマスクの製造方法 |
| JPJP-P-2020-173464 | 2020-10-14 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020230155666A Division KR20230161386A (ko) | 2020-04-28 | 2023-11-10 | 포토마스크의 제조 방법 |
| KR1020230155668A Division KR20230160757A (ko) | 2020-04-28 | 2023-11-10 | 포토마스크의 제조 방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20210133152A KR20210133152A (ko) | 2021-11-05 |
| KR102603098B1 true KR102603098B1 (ko) | 2023-11-16 |
Family
ID=78508023
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020210052072A KR102603098B1 (ko) | 2020-04-28 | 2021-04-22 | 포토마스크의 제조 방법 |
| KR1020230155668A KR20230160757A (ko) | 2020-04-28 | 2023-11-10 | 포토마스크의 제조 방법 |
| KR1020230155666A KR20230161386A (ko) | 2020-04-28 | 2023-11-10 | 포토마스크의 제조 방법 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020230155668A KR20230160757A (ko) | 2020-04-28 | 2023-11-10 | 포토마스크의 제조 방법 |
| KR1020230155666A KR20230161386A (ko) | 2020-04-28 | 2023-11-10 | 포토마스크의 제조 방법 |
Country Status (2)
| Country | Link |
|---|---|
| KR (3) | KR102603098B1 (zh) |
| TW (2) | TWI785552B (zh) |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1287221C (zh) * | 2002-06-18 | 2006-11-29 | Hoya株式会社 | 灰调掩模及其制造方法 |
| JP2011081326A (ja) * | 2009-10-10 | 2011-04-21 | Hoya Corp | 多階調フォトマスクの製造方法及び多階調フォトマスク用ブランク、並びに電子デバイスの製造方法 |
| TWI461833B (zh) * | 2010-03-15 | 2014-11-21 | Hoya Corp | 多調式光罩、多調式光罩之製造方法及圖案轉印方法 |
| JP5605917B2 (ja) | 2011-12-27 | 2014-10-15 | Ｈｏｙａ株式会社 | フォトマスクの製造方法、パターン転写方法及びフラットパネルディスプレイの製造方法 |
| JP2015102608A (ja) * | 2013-11-22 | 2015-06-04 | Hoya株式会社 | フォトマスクの製造方法、フォトマスク、パターン転写方法及び表示装置の製造方法 |
| JP2015106001A (ja) * | 2013-11-29 | 2015-06-08 | Hoya株式会社 | フォトマスクの製造方法、パターン転写方法及び表示装置の製造方法 |
| JP6514143B2 (ja) * | 2016-05-18 | 2019-05-15 | Hoya株式会社 | フォトマスクの製造方法、フォトマスク、及び表示装置の製造方法 |
| JP2017076146A (ja) | 2016-12-26 | 2017-04-20 | Hoya株式会社 | フォトマスクの製造方法、フォトマスク、パターン転写方法及び表示装置の製造方法 |
| JP6259509B1 (ja) * | 2016-12-28 | 2018-01-10 | 株式会社エスケーエレクトロニクス | ハーフトーンマスク、フォトマスクブランクス及びハーフトーンマスクの製造方法 |
| JP6756796B2 (ja) * | 2018-10-09 | 2020-09-16 | アルバック成膜株式会社 | マスクブランクス、ハーフトーンマスク、製造方法 |
-
2021
- 2021-03-31 TW TW110111724A patent/TWI785552B/zh active
- 2021-03-31 TW TW111143494A patent/TW202314374A/zh unknown
- 2021-04-22 KR KR1020210052072A patent/KR102603098B1/ko active IP Right Grant
-
2023
- 2023-11-10 KR KR1020230155668A patent/KR20230160757A/ko not_active Application Discontinuation
- 2023-11-10 KR KR1020230155666A patent/KR20230161386A/ko not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| TWI785552B (zh) | 2022-12-01 |
| KR20230160757A (ko) | 2023-11-24 |
| TW202314374A (zh) | 2023-04-01 |
| TW202142951A (zh) | 2021-11-16 |
| KR20230161386A (ko) | 2023-11-27 |
| KR20210133152A (ko) | 2021-11-05 |
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