KR102552738B1 - Alignment device including rotatable magnet member and control method thereof - Google Patents

Abstract

Embodiments of the present invention provide an aligning device and an aligning method capable of more accurately aligning a mask and a magnet member. In a substrate processing facility according to an embodiment of the present invention, the substrate aligning device includes a base plate coupled to a lower portion of a mask holder on which a patterned mask is seated, coupled to the base plate, and moving or rotating in a horizontal direction. A horizontal drive stage, a substrate elevating plate that is coupled to the horizontal drive stage to elevate or lower the substrate holder supporting the substrate, and a magnet member for adhering the mask to the lower portion of the substrate. includes a magnet driven plate. According to an embodiment of the present invention, the magnet driving plate for driving the magnet member is configured to rotationally drive the magnet member, so that the mask for processing the substrate and the magnet member can be prevented from being distorted.

Description

Alignment device including a rotatable magnet member and control method thereof

The present invention relates to an aligning device and method for aligning a substrate in a substrate processing facility, and more particularly, to an aligning device including a rotatable magnet member and a control method thereof.

As a display panel that is a means of conveying visual information to users, such as Liquid Crystal Display (LCD), Plasma Display Panel (PDP), and Organic Light Emitting Display (OLED) A display panel is being used. Such a display panel is manufactured through a series of processes such as a deposition process of depositing a metal thin film or an organic thin film in a predetermined pattern on an organic substrate (glass).

As an example of a substrate processing facility, a deposition facility includes a vacuum chamber in which the inside is maintained in a vacuum state during the deposition process, an aligning device disposed on the inside of the vacuum chamber and aligning and bonding the substrate and the mask, and a vacuum chamber inside the vacuum chamber. It may be composed of an evaporation source for spraying an evaporation material toward the substrate at the bottom.

The deposition process of the metal thin film or the organic thin film may be performed by a vacuum thermal deposition method. In the vacuum thermal deposition method, a substrate is placed in a vacuum chamber and a mask having a predetermined pattern is aligned using a magnet member. ) and bonding, and then applying heat to the evaporation source containing the evaporation material to deposit the evaporation material sublimated in the evaporation source on the substrate.

Meanwhile, as the generation progresses and the size of the substrate increases, the mask for processing each substrate also tends to increase in size. As the size of the mask increases, precise alignment between the mask and the magnet member for adsorbing the mask and the substrate is required.

Accordingly, an embodiment of the present invention provides an aligning device including a rotatable magnet member capable of more accurately aligning a mask and a magnet member, and a control method thereof.

The problems of the present invention are not limited to those mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the description below.

An apparatus for aligning a substrate including a rotatable magnet member in a substrate processing facility according to an embodiment of the present invention includes a base plate coupled to a lower portion of a mask holder on which a patterned mask is seated, and coupled to the base plate, A horizontal driving stage that moves or rotates in a horizontal direction, a substrate lifting plate coupled to be fixed to the horizontal driving stage and lifting or lowering a substrate holder supporting the substrate, and a substrate for adhering the mask to the lower portion of the substrate. It may include a magnet driving plate that lifts or lowers the magnet member. The magnet member may be provided to be rotated by a magnet driving plate based on a rotation angle of the horizontal driving stage.

In one embodiment, the aligning device includes a substrate horizontal driving source for driving the horizontal driving stage; a substrate lifting driving source for lifting and driving the substrate holder; a magnet lift driving source for driving the magnet member up and down; And it may further include a magnet rotation driving source for driving the rotation of the magnet member.

In one embodiment, the aligning device further includes a control unit controlling driving for aligning the substrate, and the control unit includes: a horizontal driving controller controlling the substrate horizontal driving source; a substrate elevation controller controlling the substrate elevation driving source; a magnet lift controller controlling the magnet lift driving source; and a magnet rotation controller controlling the magnet rotation driving source.

In one embodiment, the aligning device may further include an inspecting unit that inspects a seating state of the substrate with respect to the substrate holder and provides a twisted direction and a twisted angle of the substrate to the control unit.

In one embodiment, the horizontal driving controller may control the substrate horizontal driving source to rotate the horizontal driving stage by the warping angle in a direction opposite to the warping direction of the substrate.

In one embodiment, the magnet rotation controller may control the magnet rotation driving source. Specifically, the magnet rotation controller may control the magnet rotation driving source to rotate the magnet member in a direction opposite to the rotation direction of the horizontal driving stage. In this case, a rotation angle of the magnet member rotated in a direction opposite to that of the horizontal drive stage may be the same as an angle at which the horizontal drive stage is rotated.

In one embodiment, the horizontal driving stage and the substrate lifting plate are coupled to be fixed to each other, and the substrate lifting plate can be horizontally driven together by horizontal driving of the horizontal driving stage.

In a substrate processing facility according to an embodiment of the present invention, a base plate coupled to a lower portion of a mask holder on which a patterned mask is seated, a horizontal driving stage coupled to the base plate and moving or rotating in a horizontal direction; A substrate lifting plate coupled to be fixed to the horizontal driving stage to raise or lower the substrate holder supporting the substrate, and a magnet driving plate that raises, lowers, or rotates a magnet member for adhering the mask to the lower portion of the substrate. A control method of an aligning device comprising the steps of: acquiring information on a seated state of the substrate; rotating the horizontal driving stage based on the seated state of the substrate; rotating the magnet member based on the rotational angle of the horizontal drive stage; lowering the substrate onto a mask mounted on the mask holder; and lowering the magnet member to an upper portion of the substrate seated in the substrate holder.

In one embodiment, the information on the seating state of the substrate may include a twist direction and a twist angle of the substrate with respect to the substrate holder.

In one embodiment, rotating the horizontal drive stage may include rotating the horizontal drive stage by the twist angle in a direction opposite to the twist direction of the substrate.

In an embodiment, rotating the magnet member may include rotating the magnet member by a rotation angle of the horizontal drive stage in a direction opposite to the rotation of the horizontal drive stage.

In one embodiment, the control method may further include adhering the mask to the lower portion of the substrate by the magnet member.

A substrate processing facility according to an embodiment of the present invention includes a chamber forming a space in which the substrate is processed; an alignment device disposed inside the chamber and including a rotatable magnet member for aligning the substrate with respect to a mask for processing the substrate; and an evaporation source positioned below the aligning device to inject a deposition material onto the substrate. The alignment device including the rotatable magnet member includes a base plate coupled to a lower portion of a mask holder on which a patterned mask is seated; a horizontal driving stage coupled to the base plate and moving or rotating in a horizontal direction; a substrate elevating plate fixedly coupled to the horizontal drive stage to elevate or lower a substrate holder supporting the substrate; and a magnet drive plate which lifts, lowers, or rotates a magnet member for adhering the mask to the lower portion of the substrate. And, the magnet member may include a rotatable magnet member that is rotated by the magnet driving plate based on a rotation angle of the horizontal driving plate.

According to an embodiment of the present invention, the magnet driving plate for driving the magnet member is configured to lift and rotate the magnet member, so that the mask for processing the substrate and the magnet member can be prevented from being distorted.

The effects of the present invention are not limited to those mentioned above, and other effects not mentioned will be clearly understood by those skilled in the art from the description below.

1 shows an example of a substrate processing facility.
FIG. 2 illustrates an example of a case in which distortion between a magnet member and a mask occurs in a process of correcting distortion of a substrate in a substrate processing facility.
3 to 6 show examples of a process of aligning a substrate, a mask, and a magnet in a substrate processing facility according to an embodiment of the present invention.
7 is a flowchart illustrating a control method of an aligning device in a substrate processing facility according to an embodiment of the present invention.
8 shows examples of devices for aligning a substrate according to an embodiment of the present invention.

Hereinafter, with reference to the accompanying drawings, embodiments of the present invention will be described in detail so that those skilled in the art can easily carry out the present invention. This invention may be embodied in many different forms and is not limited to the embodiments set forth herein.

In order to clearly describe the present invention, parts irrelevant to the description are omitted, and the same reference numerals are assigned to the same or similar components throughout the specification.

In addition, in various embodiments, components having the same configuration will be described only in representative embodiments using the same reference numerals, and in other embodiments, only configurations different from the representative embodiments will be described.

Throughout the specification, when a part is said to be "connected (or coupled)" to another part, this is not only the case where it is "directly connected (or coupled)", but also "indirectly connected (or coupled)" through another member. Combined)" is also included. In addition, when a part "includes" a certain component, it means that it may further include other components without excluding other components unless otherwise stated.

Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which the present invention belongs. Terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with the meaning in the context of the related art, and unless explicitly defined in the present application, they should not be interpreted in an ideal or excessively formal meaning. don't

1 shows an example of a substrate processing facility. 1 shows an example of a deposition facility for forming a metal thin film or an organic thin film on a substrate as an example of a substrate processing facility.

Referring to FIG. 1 , a substrate processing facility includes a chamber 1000 forming a space in which a substrate 1 is processed, and a mask 2 disposed inside the chamber 1000 and for processing the substrate 1 An aligning device 2000 for aligning the substrate 1 and an evaporation source 3000 located under the aligning device 2000 and injecting a deposition material onto the substrate 1 may be included.

The alignment device 2000 is coupled to a base plate 100 coupled to a lower portion of a mask holder 30 on which a patterned mask 2 for processing a substrate 1 is seated, and to the base plate 100 and a horizontal drive stage 200 that moves or rotates in a horizontal direction, and a substrate lifting plate 300 that is coupled to be fixed to the horizontal drive stage 200 and lifts or lowers the substrate holder 10 supporting the substrate 1. ), and a magnet drive plate 400 that lifts, lowers, or rotates the magnet member 20 for adhering the mask 2 to the lower portion of the substrate.

Here, the horizontal driving stage 200 and the substrate lifting plate 300 are coupled so as to be fixed to each other, and the substrate lifting plate 300 is moved by horizontal driving (X-axis movement, Y-axis movement, rotation) of the horizontal driving stage 200. Together, they can be driven horizontally (X-axis movement, Y-axis movement, rotation).

In addition, although not shown in FIG. 1, the control unit 600 for controlling the driving of the horizontal driving stage 200, the substrate lifting plate 300, and the magnet driving plate 400 detects the seating state of the substrate 1. The alignment device 2000 may include an inspection unit 500 that provides information on the direction and angle of the misalignment.

The horizontal driving stage 200, the substrate lifting plate 300, and the magnet driving plate 400 are constrained to each other and driven. That is, when the horizontal driving stage 200 rotates, the substrate lifting plate 300 and the magnet driving plate 400 may rotate together with the horizontal driving stage 200 .

When the substrate 1 is seated on the substrate holder 10 in a distorted state and the horizontal driving stage 200 rotates to compensate for the distortion, the magnet driving plate 400 also rotates. In this case, the magnet member 20 coupled to the magnet driving plate 400 also rotates, and distortion between the magnet member 20 and the mask 2 may occur due to the rotation of the magnet member 20 . This will be described with reference to FIG. 2 .

FIG. 2 shows an example of a case in which distortion between the magnet member 20 and the mask 2 occurs in a process of correcting distortion of a substrate in a substrate processing facility. 2(a) shows a case where the substrate 1 is normally seated, FIG. 2(b) shows a case where the substrate 1 is abnormally seated, and FIG. It shows an example of the case where the horizontal drive stage 200 is rotated to align the substrate 1 and the mask 2.

First, as shown in (a) of FIG. 2, when the substrate 1 is normally seated on the substrate holder 10 (within the standard alignment range), the substrate holder 10 is moved by the substrate lifting plate 300 without a separate alignment process. ) to position the substrate 1 above the mask 2, and by lowering the magnet member 20 by the magnet driving plate 400, the mask 2 can be brought into close contact with the lower portion of the substrate 1. there is.

On the other hand, as shown in (b) of FIG. 2 , when the substrate 1 is abnormally seated on the substrate holder 10 (in a state distorted above a certain level), the substrate 1 is moved through the horizontal drive stage 200. and the mask 2 can be aligned.

When the substrate 1 and the mask 2 are aligned as shown in (c) of FIG. 2, the horizontal drive stage 200 and the magnet drive plate 400 are constrained to each other so that the magnet drive plate 400 rotates together By this, the magnet member 20 also rotates together. At this time, as shown in (c) of FIG. 2 , distortion between the mask 2 and the magnet member 20 may occur. Due to the distortion between the mask 2 and the magnet member 20 , a region of the mask 2 that does not match the magnet member 20 does not receive the magnetic force of the magnet member 20 . In this case, a region of the mask 2 that is inconsistent with the magnet member 20 may not be attracted by the magnetic field, so that it may not come into close contact with the substrate 1 and may be spaced apart or warped.

Thus, an embodiment of the present invention described below provides a method for removing a region where the mask 2 and the magnet member 20 do not match during the alignment process of the substrate 1 .

3 to 6 show examples of a process of aligning a substrate, a mask, and a magnet in a substrate processing facility according to an embodiment of the present invention.

As shown in (b) of FIG. 3 , the control unit 600 moves the substrate 1 and the mask ( 2) can be aligned. Specifically, the controller 600 may rotate the horizontal driving stage 200 by an angle of warping in a direction opposite to the warping of the substrate 1 as shown in (b) of FIG. 4 . As the horizontal driving stage 200 rotates, the substrate lifting plate 300 and the magnet driving plate 400 rotate together, so that the substrate holder 10 and the magnet member 20 can rotate together. At this time, as shown in (b) of FIG. 4 , distortion between the mask 2 and the magnet member 20 may occur.

When the mask 2 and the magnet member 20 are distorted by rotation of the horizontal drive stage 200, the control unit 600 controls the horizontal drive stage so that the magnet member 20 can be rearranged with the mask 2. It is possible to rotate the magnet member 20 by the rotation angle in the opposite direction to which 200 is rotated. Accordingly, as shown in (b) of FIG. 5 , the substrate 1 , the mask 2 , and the magnet member 20 may all be aligned.

When the substrate 1, the mask 2, and the magnet member 20 are all aligned, the controller 600 lowers the substrate holder 10 to remove the substrate 1 as shown in FIG. 6(a). By positioning the upper part of the mask 2 and lowering the magnet member 20 , the mask 2 can be brought into close contact with the lower part of the substrate 1 .

7 is a flowchart illustrating a control method of an aligning device 2000 in a substrate processing facility according to an embodiment of the present invention. The operation of FIG. 7 may be performed by each module of the aligning device 2000 under the control of the control unit 600 of FIG. 8 to be described below.

A control method of an aligning device according to an embodiment of the present invention includes obtaining information on a seating state of a substrate 1 seated on a substrate holder 10 (S505), and determining the seating state of the substrate 1 Rotating the horizontal driving stage 200 based on information about (S510), rotating the magnet member 20 based on the rotation of the horizontal driving stage 200 (S515), and substrate holder 10 It may include a step of lowering the substrate 1 to the top of the mask 2 by lowering (S520) and a step of lowering the magnet member 20 to the top of the substrate 1 (S525).

In one embodiment, the information on the seated state of the substrate 1 includes the twist direction and twist angle of the substrate 1 relative to the substrate holder 10, and the twist direction and twist angle of the substrate 1 are inspected. It may be provided from the inspection unit 500 .

Rotating the horizontal driving stage 200 ( S510 ) may include rotating the horizontal driving stage 200 by an angle of warping in a direction opposite to the warping of the substrate 1 .

Rotating the magnet member 20 ( S515 ) may include rotating the magnet member 20 by a rotational angle in a direction opposite to the rotation of the horizontal drive stage 200 .

The step of lowering the magnet member 20 to the top of the substrate 1 ( S525 ) may include a step of bringing the mask 2 into close contact with the bottom of the substrate 1 by the magnet member 20 .

8 shows examples of devices for aligning the substrate 1 according to an embodiment of the present invention. Hereinafter, embodiments of the present invention will be described in detail with reference to FIG. 8 .

According to one embodiment of the present invention, the aligning device 2000 is a substrate horizontal driving source 250 for driving (horizontal movement or rotation) of the horizontal driving stage 200 and lifting and driving the substrate holder 10 A lifting driving source 350 , a magnet lifting driving source 450 for driving the magnet member 20 up and down, and a magnet rotation driving source 455 for driving the rotation of the magnet member 20 may be further included. As the substrate horizontal drive source 250, a rotation motor for rotation drive and a linear motion (LM) actuator for drive in horizontal directions (X, Y directions) may be used.

In order to lift and drive the substrate holder 10 , a substrate lifting and driving source 350 for lifting and driving the substrate holder 10 may be provided on the substrate lifting plate 300 . In addition, the substrate lifting plate 300 may be lifted by itself in order to lift and drive the substrate holder 10. In this case, a substrate lifting driving source 350 for lifting and driving the substrate lifting plate 300 may be provided. .

In order to drive the magnet member 20 up and down, a magnet driving source 450 for driving the magnet member 20 up and down may be provided in the magnet driving plate 400 . In addition, the magnet drive plate 400 may lift by itself to drive the magnet member 20 up and down. In this case, a magnet drive source 450 for driving the magnet drive plate 400 up and down may be provided. . As the substrate lifting driving source and the magnet lifting driving source, a pneumatic cylinder, an LM actuator, or a ball-screw type lifting driving source may be used.

For rotational driving of the magnet member 20 , a magnet rotational driving source 455 for rotational driving of the magnet member 20 may be provided in the magnet driving plate 400 . The magnet rotation drive source 455 may be braked in a form included in the magnet lift drive source 450 . As a magnet rotation drive source, a rotation motor can be used.

Also, according to an embodiment of the present invention, the aligning device 2000 may further include a controller 600 that controls driving for aligning the substrate 1 . The controller 600 includes a horizontal drive controller 610 that controls the substrate horizontal drive source 250, a substrate lift controller 620 that controls the substrate lift drive source 350, and a magnet that controls the magnet lift drive source 450. A lift controller 630 and a magnet rotation controller 640 controlling the magnet rotation driving source 455 may be further included. The controller 600 (horizontal drive controller 610, substrate lift controller 620, magnet lift controller 630, and magnet rotation controller 640) may be composed of one or more processors (processing circuits). In addition, the controller 600 may include a central processor for controlling the overall operation of the substrate processing facility and a memory for storing various types of information for controlling the substrate processing facility.

In addition, according to an embodiment of the present invention, the aligning device 2000 may further include an inspection unit 500 that inspects a seated state of the substrate 1 with respect to the substrate holder 10 . Although not shown, the inspection unit 500 may include a storage unit for storing inspection data, and the horizontal driving controller 610 may operate based on information about the seating state of the substrate 1 provided from the inspection unit 500. The substrate horizontal driving source 250 may be controlled. For example, the inspection unit 500 may include a vision unit (camera) that photographs the substrate 1 and provides information on a seating state, or a touch installed in the substrate holder 10 to measure the seating position of the substrate 1. It can be implemented by a sensor or a distance sensor.

In an embodiment of the present invention, the information on the seated state of the substrate 1 may include a twisting direction and a twisting angle of the substrate 1 with respect to the substrate holder 10 . The horizontal driving controller 610 may control the substrate horizontal driving source 250 to rotate the horizontal driving stage 200 by a warping angle in a direction opposite to the warping direction of the substrate 1 .

After the horizontal drive stage 200 rotates, the magnet rotation controller 640 rotates the magnet member 20 by a rotation angle in the opposite direction to the direction in which the horizontal drive stage 200 rotates. can control.

In the embodiment of the present invention, the horizontal driving stage 200 and the substrate lifting plate 300 are coupled to be fixed to each other, and the substrate lifting plate 300 is horizontally driven together in response to the horizontal driving of the horizontal driving stage 200. can

The present embodiment and the drawings accompanying this specification clearly represent only a part of the technical idea included in the present invention, and can be easily inferred by those skilled in the art within the scope of the technical idea included in the specification and drawings of the present invention. It will be apparent that all possible modifications and specific embodiments are included in the scope of the present invention.

Therefore, the spirit of the present invention should not be limited to the described embodiments and should not be defined, and it will be said that not only the claims described below but also all modifications equivalent or equivalent to these claims belong to the scope of the present invention. .

1: substrate
2: mask
10: substrate holder
20: no magnet
30: mask holder
100: base plate
200: horizontal drive stage
250: substrate horizontal driving source
300: substrate lifting plate
350: substrate lifting drive source
400: magnet drive plate
450: magnet lift drive source
455: magnet rotation drive source
500: inspection unit
510: storage unit
600: control unit
610: horizontal drive controller
620: substrate lift controller
630: magnet lift controller
640: magnet rotation controller

Claims (18)

a base plate coupled to a lower portion of a mask holder on which a patterned mask is seated;
a horizontal driving stage coupled to the base plate and moving or rotating in a horizontal direction;
a substrate elevating plate fixedly coupled to the horizontal drive stage and elevating or lowering a substrate holder supporting a substrate; and
A magnet drive plate for lifting or lowering a magnet member for adhering the mask to the lower portion of the substrate;
The magnet member is rotated by the magnet driving plate based on the rotation angle of the horizontal driving stage,
Alignment device including a rotatable magnet member comprising a magnet rotation driving source for rotating the magnet member independently of the horizontal driving stage.
According to claim 1,
a substrate horizontal driving source for driving the horizontal driving stage;
a substrate lifting driving source for lifting and driving the substrate holder; and
Alignment device including a rotatable magnet member, characterized in that it further comprises a magnet lift drive source for the lift drive of the magnet member.
According to claim 2,
Further comprising a control unit for controlling driving for aligning the substrate;
The control unit,
a horizontal driving controller controlling the substrate horizontal driving source;
a substrate elevation controller controlling the substrate elevation driving source;
a magnet lift controller controlling the magnet lift driving source; and
Alignment device including a rotatable magnet member comprising a magnet rotation controller for controlling the magnet rotation driving source.
According to claim 3,
The aligning device including a rotatable magnet member, characterized in that it further comprises an inspection unit for inspecting the seated state of the substrate with respect to the substrate holder and providing a twisted direction and a twisted angle of the substrate to the control unit.
According to claim 4,
The horizontal drive controller,
Alignment device including a rotatable magnet member, characterized in that for controlling the substrate horizontal drive source to rotate the horizontal drive stage by the twist angle in a direction opposite to the twist direction of the substrate.
According to claim 5,
The magnet rotation controller,
The alignment device including a rotatable magnet member, characterized in that for controlling the magnet rotation drive source to rotate the magnet member by a rotation angle of the horizontal drive stage in a direction opposite to the rotation direction of the horizontal drive stage.
According to claim 1,
The horizontal driving stage and the substrate lifting plate are coupled to be fixed to each other,
The aligning device including a rotatable magnet member, characterized in that the substrate lifting plate is horizontally driven together by the horizontal driving of the horizontal driving stage.
In a substrate processing facility, a mask holder on which a patterned mask is seated is coupled to a base plate coupled to a lower portion, a horizontal driving stage coupled to the base plate and moving or rotating in a horizontal direction, and coupled to be fixed to the horizontal driving stage a substrate elevating plate for elevating or lowering the substrate holder supporting the substrate, and a magnet drive plate for elevating, lowering or rotating a magnet member for adhering the mask to the lower portion of the substrate; and a magnet rotation drive source for rotating the magnet member independently of the horizontal drive stage.
acquiring information about a seating state of the substrate;
rotating the horizontal driving stage based on the seated state of the substrate;
rotating the magnet member based on the rotational angle of the horizontal drive stage;
lowering the substrate onto a mask mounted on the mask holder; and
and lowering the magnet member to an upper portion of the substrate seated in the substrate holder.
According to claim 8,
Information on the seating state of the substrate,
A control method of an aligning device comprising a twisting direction and a twisting angle of the substrate with respect to the substrate holder.
According to claim 9,
Rotating the horizontal driving stage,
and rotating the horizontal drive stage by the warp angle in a direction opposite to the warp direction of the substrate.
According to claim 10,
Rotating the magnet member,
and rotating the magnet member by a rotation angle of the horizontal drive stage in a direction opposite to the rotation of the horizontal drive stage.
In the substrate processing facility,
a chamber forming a space in which the substrate is processed;
an alignment device disposed inside the chamber and including a rotatable magnet member for aligning the substrate with respect to a mask for processing the substrate; and
An evaporation source located below the aligning device and spraying a deposition material to the substrate;
The alignment device including the rotatable magnet member,
a base plate coupled to a lower portion of a mask holder on which a patterned mask is seated;
a horizontal driving stage coupled to the base plate and moving or rotating in a horizontal direction;
a substrate elevating plate fixedly coupled to the horizontal drive stage to elevate or lower a substrate holder supporting the substrate;
a magnet drive plate that lifts, lowers, or rotates a magnet member for adhering the mask to the lower portion of the substrate; and
Includes a magnet rotation drive source for independent rotation drive of the magnet member,
The substrate processing equipment including a magnet member, characterized in that the magnet member is rotated by the magnet driving plate based on the rotation angle of the horizontal driving plate.
According to claim 12,
The alignment device including the rotatable magnet member,
a substrate horizontal driving source for driving the horizontal driving stage;
A substrate lifting drive source for lifting and lowering the substrate holder; and
A substrate processing facility further comprising a magnet lifting driving source for lifting and driving the magnet member.
According to claim 13,
The alignment device including the rotatable magnet member,
Further comprising a control unit for controlling driving for aligning the substrate;
The control unit,
a horizontal driving controller controlling the substrate horizontal driving source;
a substrate elevation controller controlling the substrate elevation driving source;
a magnet lift controller controlling the magnet lift driving source; and
A substrate processing facility comprising a magnet rotation controller for controlling the magnet rotation driving source.
According to claim 14,
The alignment device including the rotatable magnet member,
The substrate processing equipment further comprising an inspection unit for inspecting a seating state of the substrate on the substrate holder and providing a warped direction and a warped angle of the substrate to the control unit.
According to claim 15,
The horizontal drive controller,
and controlling a substrate horizontal driving source to rotate the horizontal driving stage by the warping angle in a direction opposite to the warping direction of the substrate.
According to claim 16,
The magnet rotation controller,
The substrate processing equipment characterized in that the magnet rotation drive source is controlled to rotate the magnet member by the rotation angle of the horizontal drive stage in a direction opposite to the rotation direction of the horizontal drive stage.
According to claim 12,
The horizontal driving stage and the substrate lifting plate are coupled to be fixed to each other,
The substrate processing equipment, characterized in that the substrate lifting plate is horizontally driven together by the horizontal driving of the horizontal driving stage.

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