KR102531345B1 - Silver carbon plating agent having excellent discoloration resistance, abrasion resistance, heat resistance, electro-conductive property and lubricant property and Plating method using the same - Google Patents
Silver carbon plating agent having excellent discoloration resistance, abrasion resistance, heat resistance, electro-conductive property and lubricant property and Plating method using the same Download PDFInfo
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- KR102531345B1 KR102531345B1 KR1020220145151A KR20220145151A KR102531345B1 KR 102531345 B1 KR102531345 B1 KR 102531345B1 KR 1020220145151 A KR1020220145151 A KR 1020220145151A KR 20220145151 A KR20220145151 A KR 20220145151A KR 102531345 B1 KR102531345 B1 KR 102531345B1
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- silver
- plating
- resistance
- silver carbon
- carbon
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- 238000007747 plating Methods 0.000 title claims abstract description 165
- RRKGBEPNZRCDAP-UHFFFAOYSA-N [C].[Ag] Chemical compound [C].[Ag] RRKGBEPNZRCDAP-UHFFFAOYSA-N 0.000 title claims abstract description 86
- 238000002845 discoloration Methods 0.000 title claims abstract description 32
- 238000000034 method Methods 0.000 title claims abstract description 21
- 238000005299 abrasion Methods 0.000 title claims description 6
- 239000003795 chemical substances by application Substances 0.000 title description 7
- 239000000314 lubricant Substances 0.000 title 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 62
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 32
- 229910052709 silver Inorganic materials 0.000 claims abstract description 32
- 239000004332 silver Substances 0.000 claims abstract description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 25
- 239000010439 graphite Substances 0.000 claims abstract description 25
- 239000000725 suspension Substances 0.000 claims abstract description 22
- 229910052751 metal Inorganic materials 0.000 claims abstract description 20
- 239000002184 metal Substances 0.000 claims abstract description 20
- 239000010949 copper Substances 0.000 claims abstract description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052802 copper Inorganic materials 0.000 claims abstract description 16
- 239000002736 nonionic surfactant Substances 0.000 claims abstract description 12
- 239000002904 solvent Substances 0.000 claims abstract description 7
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 16
- 239000006185 dispersion Substances 0.000 claims description 14
- 239000002245 particle Substances 0.000 claims description 12
- -1 glycol ethers Chemical class 0.000 claims description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 6
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 claims description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 4
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 claims description 4
- 230000002209 hydrophobic effect Effects 0.000 claims description 4
- 238000013507 mapping Methods 0.000 claims description 4
- 229950008882 polysorbate Drugs 0.000 claims description 4
- 229920000136 polysorbate Polymers 0.000 claims description 4
- 239000011734 sodium Substances 0.000 claims description 4
- 239000000080 wetting agent Substances 0.000 claims description 4
- 239000007800 oxidant agent Substances 0.000 claims description 3
- MLIWQXBKMZNZNF-KUHOPJCQSA-N (2e)-2,6-bis[(4-azidophenyl)methylidene]-4-methylcyclohexan-1-one Chemical compound O=C1\C(=C\C=2C=CC(=CC=2)N=[N+]=[N-])CC(C)CC1=CC1=CC=C(N=[N+]=[N-])C=C1 MLIWQXBKMZNZNF-KUHOPJCQSA-N 0.000 claims description 2
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 claims description 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- 229910001870 ammonium persulfate Inorganic materials 0.000 claims description 2
- 229910000379 antimony sulfate Inorganic materials 0.000 claims description 2
- MVMLTMBYNXHXFI-UHFFFAOYSA-H antimony(3+);trisulfate Chemical compound [Sb+3].[Sb+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O MVMLTMBYNXHXFI-UHFFFAOYSA-H 0.000 claims description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- 239000011368 organic material Substances 0.000 claims description 2
- 239000012286 potassium permanganate Substances 0.000 claims description 2
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 claims description 2
- 229910052711 selenium Inorganic materials 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 claims description 2
- 238000009713 electroplating Methods 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- 230000007797 corrosion Effects 0.000 abstract description 9
- 238000005260 corrosion Methods 0.000 abstract description 9
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 239000000243 solution Substances 0.000 description 69
- 239000010410 layer Substances 0.000 description 58
- 230000000052 comparative effect Effects 0.000 description 33
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 11
- 238000005259 measurement Methods 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Substances [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 238000005406 washing Methods 0.000 description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000005238 degreasing Methods 0.000 description 5
- 238000007429 general method Methods 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 4
- 238000010306 acid treatment Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- MNWBNISUBARLIT-UHFFFAOYSA-N sodium cyanide Chemical compound [Na+].N#[C-] MNWBNISUBARLIT-UHFFFAOYSA-N 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000013527 degreasing agent Substances 0.000 description 3
- 238000005237 degreasing agent Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 2
- 102000001554 Hemoglobins Human genes 0.000 description 2
- 108010054147 Hemoglobins Proteins 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000002048 multi walled nanotube Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 239000000276 potassium ferrocyanide Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- LFAGQMCIGQNPJG-UHFFFAOYSA-N silver cyanide Chemical compound [Ag+].N#[C-] LFAGQMCIGQNPJG-UHFFFAOYSA-N 0.000 description 2
- 239000002109 single walled nanotube Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- XOGGUFAVLNCTRS-UHFFFAOYSA-N tetrapotassium;iron(2+);hexacyanide Chemical compound [K+].[K+].[K+].[K+].[Fe+2].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-] XOGGUFAVLNCTRS-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical class CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 206010003497 Asphyxia Diseases 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 206010010904 Convulsion Diseases 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- 102000000634 Cytochrome c oxidase subunit IV Human genes 0.000 description 1
- 108050008072 Cytochrome c oxidase subunit IV Proteins 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 206010019233 Headaches Diseases 0.000 description 1
- 206010033799 Paralysis Diseases 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 208000005374 Poisoning Diseases 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 206010038669 Respiratory arrest Diseases 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 208000003443 Unconsciousness Diseases 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 125000000218 acetic acid group Chemical class C(C)(=O)* 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 230000036461 convulsion Effects 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 description 1
- 150000001913 cyanates Chemical class 0.000 description 1
- 238000004925 denaturation Methods 0.000 description 1
- 230000036425 denaturation Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 208000002173 dizziness Diseases 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011790 ferrous sulphate Substances 0.000 description 1
- 235000003891 ferrous sulphate Nutrition 0.000 description 1
- 239000002783 friction material Substances 0.000 description 1
- 210000004211 gastric acid Anatomy 0.000 description 1
- 231100000869 headache Toxicity 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 1
- 229940116357 potassium thiocyanate Drugs 0.000 description 1
- KYEKHFSRAXRJBR-UHFFFAOYSA-M potassium;selenocyanate Chemical compound [K+].[Se-]C#N KYEKHFSRAXRJBR-UHFFFAOYSA-M 0.000 description 1
- 210000001034 respiratory center Anatomy 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 231100001229 severe poisoning Toxicity 0.000 description 1
- YPNVIBVEFVRZPJ-UHFFFAOYSA-L silver sulfate Chemical compound [Ag+].[Ag+].[O-]S([O-])(=O)=O YPNVIBVEFVRZPJ-UHFFFAOYSA-L 0.000 description 1
- 229910000367 silver sulfate Inorganic materials 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 208000024891 symptom Diseases 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/46—Electroplating: Baths therefor from solutions of silver
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
본 발명은 도금전해액으로부터 불활성입자를 공석시키는 복합도금방법(COMPOSITE PLATING METHOD)으로 종래의 스위치접점이나 커넥터 등의 접동접점부품 재료로 구리나 구리합금이 산화를 방지하기 위해 은도금을 하여 사용하였으나, 은도금피막은 연질로 내마모성이 약하고 마찰계수가 높아 슬라이딩에 따른 마모가 쉽게되는 문제점을 개선하기 위해 카본입자를 Ag 매트릭스에 분산시켜 내열성, 내마모성, 윤활성, 내변색성이 뛰어난 은탄소 도금피막을 형성하는 방법이다.The present invention is a composite plating method (COMPOSITE PLATING METHOD) in which inert particles are deposited from a plating electrolyte. In order to prevent oxidation of copper or copper alloy as a material for conventional sliding contact parts such as switch contacts or connectors, silver plating was used. A method of forming a silver carbon plating film with excellent heat resistance, wear resistance, lubrication, and discoloration resistance by dispersing carbon particles in an Ag matrix to improve the problem of easy wear due to sliding because the film is soft and has low wear resistance and high friction coefficient. am.
접동접촉자는 회로차단기, 단로접촉기, 부하 개폐기 또는 커넥트(Connect)등, 기계적으로 동작하는 도전부를 가진 전기기기에서 가동부와 고정부 사이에 사용된다.A sliding contact is used between a moving part and a fixed part in an electric device having a mechanically operated conductive part, such as a circuit breaker, disconnection contactor, load switch or connect.
그리고, 상기 접동접촉자는 구리 및/또는 구리 합금으로 제조되는데, 산화현상으로 인해 수명이 짧은 문제가 있었다. 이러한 산화현상을 방지하고자, 전류의 저항이 작으며 산화현상이 발생하지 않는 접동접촉자에 도금하였으며, 도금으로는 보통 은 도금을 하였다.In addition, the sliding contact is made of copper and/or copper alloy, but has a short lifespan due to oxidation. In order to prevent this oxidation phenomenon, the sliding contact with low current resistance and no oxidation phenomenon was plated, and silver plating was usually used for plating.
종래의 은 도금 방법으로는 보통 시안화합물이 들어있는 조성물을 사용하였으나 시안화합물은 인체에 치명적인 영향을 미치는 것으로, 최근에는 사용을 점차 줄여가고 있는 실정이며, 시안화합물의 처리방법 또한 여러 가지의 방법들이 제안되고 있다. 시안화합물은 KCN, NaCN 등의 HCN의 금속염과 폐리시안화카륨, 페로시안화 칼륨등의 시안착염이 있다. 또한, 상기 HCN의 금속염은 물속에서 시안이온을 쉽게 유리하는 것으로 독성이 매우 강하고 심한 중독현상을 일으켜 치사율도 매우 높다. 시안착염은 금속착제를 형성한 것으로 비교적 해리하기 쉬운 아연이나 카드뮴 등의 착염이 있는 반면, 동, 코발트, 철 등의 착제는 매우 안정되어 있으므로 독성이 매우 약하다. 시안화합물인 KCN이나NaCN이 경구를 통하여 체내에 들어가면 위산에 의해 HCN을 유리하고, 이것이 체내에서 흡수되어 주로 시트크롬 옥시다제(cytochrome oxidase) 구성성분의 철과 결합하여 안전한 착염제를 형성하여 시아노헤모글로빈이 되며, 상기에 의하여 헤모글로빈의 효소운반기능을 저해하여 생체내에 산소를 공급할 수 없게 됨으로써 질식상태가 된다. 또한, 중독증상으로는 현기증, 두통, 의식상실, 경련 등이 있으며 고농도의 경우에는 호흡중추마비에 의한 호흡정지를 일으켜 사망하게 된다.In the conventional silver plating method, a composition containing a cyanide compound was usually used, but the cyanide compound has a fatal effect on the human body, and its use has been gradually reduced in recent years. is being proposed The cyanide compounds include metal salts of HCN, such as KCN and NaCN, and complex cyanates such as potassium ferrocyanide and potassium ferrocyanide. In addition, the metal salt of HCN easily liberates cyan ions in water and is highly toxic and causes severe poisoning, resulting in a very high mortality rate. Cyan complex salts are formed of metal complexes, and there are complex salts such as zinc or cadmium, which are relatively easy to dissociate, whereas complex salts such as copper, cobalt, and iron are very stable and have very low toxicity. When KCN or NaCN, a cyanide compound, enters the body through the oral route, HCN is released by gastric acid, which is absorbed in the body and combines with iron, a component of cytochrome oxidase, to form a safe complexing agent, It becomes hemoglobin, and by the above, the enzyme transport function of hemoglobin is inhibited, and oxygen cannot be supplied to the living body, resulting in asphyxiation. In addition, symptoms of poisoning include dizziness, headache, loss of consciousness, and convulsions, and in the case of high concentrations, respiratory arrest due to paralysis of the respiratory center causes death.
이에 시안화합물을 사용하지 않는 친환경적인 은 도금 방법이 개발, 적용되고 있는데, 일례를 들면, 대한민국 공개번호 10-2006-0127340호에 황산은, 황산암모늄, 구연산, 황산 제1철, 암모니아수, 입자탄소, 루테늄, 테프론 및 PTFE 등을 포함하는 도금액을 이용하여 구리 또는 구리합금 접촉단자를 은도금 형성시키는 기술이 게재되어 있는데, 이러한 조성의 은도금액은 시안화합물을 사용하지 않는다는 점에서 친환경적인 측면이 있으나, 도금액의 제조비용 단가가 너무 높아지는 등의 문제점이 있다.Accordingly, an environmentally friendly silver plating method that does not use cyanide is developed and applied. For example, in Korean Publication No. 10-2006-0127340, silver sulfate, ammonium sulfate, citric acid, ferrous sulfate, ammonia water, particle carbon , Ruthenium, Teflon, and PTFE using a plating solution to form a copper or copper alloy contact terminal silver plating technology has been disclosed, the silver plating solution of this composition is environmentally friendly in that it does not use a cyanide compound, but, There is a problem such as an excessively high manufacturing cost of the plating solution.
본 발명자들은 은탄소 도금액에 사용되는 카본분말인 그라파이트 분말을 분산처리된 그라파이트 현탁액으로 도입하면 그라파이트 분말 표면의 소수성 유기물질이 제거되어 큰 표면저항을 가지는 그라파이트 분말이 도금액 내 균질성 및 분산성이 향상되어, 균일하게 탄소 성분이 분포된 은탄소 도금층을 형성시켜서 우수한 내식성, 내변색성을 가지는 은탄소 도금층을 형성시킬 수 있음을 알게 되어 본 발명을 완성하게 되었다. 즉, 본 발명은 은탄소 도금액 및 이를 이용한 은탄소 도금처리방법을 제공하고자 한다.The present inventors have found that when graphite powder, which is a carbon powder used in a silver carbon plating solution, is introduced into a graphite suspension subjected to dispersion treatment, hydrophobic organic substances on the surface of the graphite powder are removed, and the graphite powder having a high surface resistance improves the homogeneity and dispersibility of the graphite powder in the plating solution. , it was found that a silver carbon plating layer having excellent corrosion resistance and discoloration resistance could be formed by forming a silver carbon plating layer in which the carbon component was uniformly distributed, and the present invention was completed. That is, the present invention is to provide a silver carbon plating solution and a silver carbon plating treatment method using the same.
상기 과제를 해결하기 위한 본 발명은 은탄소 도금액에 관한 것으로서, KAg(CN)2, KCN, K2CO3, KOH, 금속광택제, 비이온성 계면활성제, 분산처리된 그라파이트 현탁액 및 용매를 포함한다.The present invention for solving the above problems relates to a silver carbon plating solution, and includes KAg(CN) 2 , KCN, K 2 CO 3 , KOH, a metal polishing agent, a nonionic surfactant, a dispersion-treated graphite suspension, and a solvent.
또한, 본 발명은 은탄소 도금액을 이용한 도금 처리방법에 관한 것으로서, 은(Ag) 도금층이 형성된 구리계 또는 구리합금계 부품을 준비하는 1단계; 및 상기 은 도금층 표면을 제1항 내지 제7항 중에서 선택된 어느 한 항의 상기 은탄소 도금액으로 도금시켜서 은탄소(Ag-C) 도금층을 형성시키는 2단계;를 포함한다.In addition, the present invention relates to a plating treatment method using a silver carbon plating solution, comprising the steps of preparing a copper-based or copper-alloy-based component having a silver (Ag) plating layer formed thereon; and a second step of forming a silver carbon (Ag-C) plating layer by plating the surface of the silver plating layer with the silver carbon plating solution of any one of claims 1 to 7.
본 발명의 은탄소 도금액으로 도금처리된 은탄소 도금층은 도금층 내 탄소 성분(C)이 균일하게 분포되어 내식성, 내변색성이 우수할 뿐만 아니라, 내열성, 내마모성 및 전기적 특성도 우수하다.The silver carbon plating layer plated with the silver carbon plating solution of the present invention has excellent corrosion resistance and discoloration resistance as the carbon component (C) is uniformly distributed in the plating layer, as well as excellent heat resistance, wear resistance and electrical properties.
도 1은 실험예 1에서 실시한 실시예 1 ~ 3 및 비교예 1 ~ 3의 EDS 측정 이미지이다.
도 2는 실험예 2에서 실시한 실시예 1 ~ 3 및 비교예 1 ~ 3의 내변색성 측정 후 찍은 사진이다.
도 3은 실험예 2에서 실시한 실시예 1 ~ 3 및 비교예 1 ~ 3의 내열성 측정 후 찍은 사진이다.1 is an EDS measurement image of Examples 1 to 3 and Comparative Examples 1 to 3 conducted in Experimental Example 1.
Figure 2 is a photograph taken after measuring the discoloration resistance of Examples 1 to 3 and Comparative Examples 1 to 3 conducted in Experimental Example 2.
3 is a photograph taken after measuring the heat resistance of Examples 1 to 3 and Comparative Examples 1 to 3 conducted in Experimental Example 2.
이하, 본 발명에 대하여 더욱 자세하게 설명을 하겠다.Hereinafter, the present invention will be described in more detail.
본 발명의 은탄소 도금액은 KAg(CN)2, KCN, K2CO3, KOH, 금속광택제, 비이온성 계면활성제, 분산처리된 그라파이트 현탁액 및 용매를 포함한다.The silver carbon plating solution of the present invention includes KAg(CN) 2 , KCN, K 2 CO 3 , KOH, a metal polishing agent, a nonionic surfactant, a graphite suspension subjected to dispersion treatment, and a solvent.
상기 KAg(CN)2은 은탄소 도금층이 형성되는 은(Ag)이온의 주요공급원으로서 은농도를 증대시키는 역할을 하며, KCN은 KAg(CN)2이 용매에 잘 용해되고, 양극 용해를 하는 역할을 한다.KAg(CN) 2 serves to increase the silver concentration as a main source of silver (Ag) ions forming a silver carbon plating layer, and KCN dissolves KAg(CN) 2 well in a solvent and serves to dissolve the anode do
은탄소 도금액 내 상기 KAg(CN)2의 적정 농도는 20 ~ 50g/L, 바람직하게는 30 ~ 45g/L, 더욱 바람직하게는 35 ~ 43g/L이며, 이때, 도금액 내 KAg(CN)2의 농도가 20g/L 미만이면 은도금층과 은탄소 도금층과의 결합력이 좋지 못하여 내식성, 내마모성이 부족할 수 있고, 50g/L을 초과하면 Drug out시 Ag소모량이 커 원가 Cost가 증가하는 문제가 있을 수 있다. 그리고, 은탄소 도금액 내 KCN의 적정 농도는 80 ~ 150g/L, 바람직하게는 80 ~ 135g/L, 더욱 바람직하게는 90 ~ 120g/L이며, 이때, KCN 농도가 80g/L 미만이면 KAg(CN)2의 용매 내 용해성이 부족할 수 있고, 탄소공석률이 저하되고, Ag농도가 지속적으로 감소되는 문제가 있을 수 있으며, KCN 농도가 150g/L을 초과하면 과량 사용으로 인해 양극용해 과다로 Ag농도가 지속적으로 증가하는 문제가 있을 수 있다.The appropriate concentration of KAg(CN) 2 in the silver carbon plating solution is 20 to 50 g/L, preferably 30 to 45 g/L, and more preferably 35 to 43 g/L. At this time, the concentration of KAg(CN) 2 in the plating solution If the concentration is less than 20g/L, the bonding strength between the silver plating layer and the silver carbon plating layer may be poor, resulting in poor corrosion resistance and wear resistance. . In addition, the appropriate concentration of KCN in the silver carbon plating solution is 80 to 150 g/L, preferably 80 to 135 g/L, and more preferably 90 to 120 g/L. At this time, when the KCN concentration is less than 80 g/L, KAg (CN ) 2 may have insufficient solubility in the solvent, decrease in carbon vacancy rate, and continuous decrease in Ag concentration. There may be a problem in which is continuously increasing.
은탄소 도금액 성분 중 상기 K2CO3는 은탄소 도금층이 표면 균일성 향상 역할 및 전기전도도를 향상시키는 역할을 하는 것으로서, 은탄소 도금액 내 K2CO3 적정 농도는 1 ~ 50g/L, 바람직하게는 5 ~ 40g/L, 더욱 바람직하게는 8 ~ 20g/L이다. 이때, 은탄소 도금액 K2CO3 농도가 1g/L 미만이면 그 사용량이 너무 적어서 도금층의 표면 균일성 하는 효과가 미비할 수 있고, K2CO3 농도가 50g/L을 초과하면 도금층 색상이 좋지 않게 형성되는 문제가 있을 수 있으므로 상기 범위 내로 사용하는 것이 좋다.Among the components of the silver carbon plating solution, the K 2 CO 3 serves to improve surface uniformity and electrical conductivity of the silver carbon plating layer, and the appropriate concentration of K 2 CO 3 in the silver carbon plating solution is 1 to 50 g/L, preferably is 5 to 40 g/L, more preferably 8 to 20 g/L. At this time, if the K 2 CO 3 concentration of the silver carbon plating solution is less than 1 g/L, the amount used is too small and the effect of improving the surface uniformity of the plating layer may be insignificant. It is good to use it within the above range because there may be a problem that is not formed.
또한, 은탄소 도금액 성분 중 상기 KOH는 pH를 조절하는 역할을 하는 것으로서, 은탄소 도금액 내 KOH 적정 농도는 1 ~ 20g/L, 바람직하게는 2 ~ 15g/L, 더욱 바람직하게는 3 ~ 10g/L이다. 이때, 은탄소 도금액 내 KOH 농도가 1g/L 미만이면 그 사용량이 너무 적어서 pH를 보정하는 효과가 미비할 수 있고, KOH 농도가 20g/L을 초과하면 pH가 관리범위를 초과하는 문제가 있을 수 있으므로 상기 범위 내로 사용하는 것이 좋다.In addition, the KOH among the components of the silver carbon plating solution serves to adjust the pH, and the appropriate concentration of KOH in the silver carbon plating solution is 1 to 20 g/L, preferably 2 to 15 g/L, and more preferably 3 to 10 g/L. is L. At this time, if the KOH concentration in the silver carbon plating solution is less than 1 g / L, the amount used is too small, and the effect of correcting the pH may be insufficient. Therefore, it is recommended to use it within the above range.
그리고, 은탄소 도금액 성분 중 상기 금속광택제는 은탄소 도금층의 광택을 증대와 도금피막 경도를 증가시키는 역할을 하는 것으로서, KSeCN, Na2Se, Na2SeO4중에서 선택된 1종 이상을 포함하는 Se계 화합물; K2Sb2C8H4O12, O12S3Sb2(Antimony sulfate), Sb2O3, Sb2S5중에서 선택된 1종 이상을 포함하는 Sb계 화합물; Bi2O3, BiCl2, NaBiO3 중에서 선택된 1종 이상을 포함하는 Bi계 화합물; 중에서 선택된 1종 이상을 사용할 수 있다. 그리고, 상기 금속광택제의 도금액 내 적정 농도는 0.5 ~ 50mg/L, 바람직하게는 1 ~ 20mg/L, 더욱 바람직하게는 1 ~ 10mg/L이며, 이때, 금속광택제 농도가 1mg/L 미만이면 그 사용량이 너무 적어서 은탄소 도금층의 표면이 거칠고 레벨링 효과가 미비하고, 10mg/L를 초과하여 사용하면 탄소공석이 저하하는 문제가 있을 수 있으므로 상기 범위 내로 사용하는 것이 좋다.In addition, among the components of the silver carbon plating solution, the metal brightener serves to increase the gloss of the silver carbon plating layer and increase the hardness of the plating film, and includes at least one selected from KSeCN, Na 2 Se, and Na 2 SeO 4 Se-based compound; K 2 Sb 2 C 8 H 4 O 12, O 12 S 3 Sb 2 (Antimony sulfate), Sb 2 O 3 , Sb 2 S 5 Sb-based compound containing at least one selected from; Bi 2 O 3 , BiCl 2 , Bi-based compound containing at least one selected from NaBiO 3 ; One or more selected from among may be used. In addition, the proper concentration of the metal polishing agent in the plating solution is 0.5 to 50mg/L, preferably 1 to 20mg/L, and more preferably 1 to 10mg/L. At this time, if the concentration of the metal polishing agent is less than 1mg/L, the usage amount If it is too small, the surface of the silver carbon plating layer is rough and the leveling effect is insufficient, and if it is used in excess of 10 mg/L, there may be a problem of reducing carbon vacancies, so it is good to use it within the above range.
그리고, 은탄소 도금액 성분 중 상기 비이온성 계면활성제는 은탄소도금 코팅액의 표면 장력을 감소시켜서 고른 코팅층을 형성할 수 있도록 친수성 역할을 하는 것으로서, 폴리소르베이트(polysorbate), 옥틸도데세스 및 폴리옥시에틸렌알킬에테르 중에서 선택된 1종 이상을, 바람직하게는 폴리소르베이트를 사용하는 것이 좋다. 그리고, 상기 비이온성 계면활성제의 도금액 내 적정 농도는 1 ~ 10ml/L, 바람직하게는 1.0 ~ 7.0ml/L, 더욱 바람직하게는 1.5 ~ 4.5ml/L이며, 이때, 비이온성 계면활성제 농도가 1ml/L 미만이면 그 사용량이 너무 적어서 은탄소 도금층의 표면이 거칠게 형성될 수 있고, 10ml/L를 초과하여 사용하면 은도금층과의 결합력이 떨어져서 오히려 은탄소 도금층의 내식성, 내마모성이 떨어지는 문제가 있을 수 있으므로 상기 범위 내로 사용하는 것이 좋다.In addition, the nonionic surfactant among the components of the silver carbon plating solution acts as a hydrophilic agent to form an even coating layer by reducing the surface tension of the silver carbon plating solution, and polysorbate, octyldodeches and polyoxyethylene It is good to use at least one selected from among alkyl ethers, preferably polysorbate. In addition, the appropriate concentration of the nonionic surfactant in the plating solution is 1 to 10 ml / L, preferably 1.0 to 7.0 ml / L, more preferably 1.5 to 4.5 ml / L, and at this time, the nonionic surfactant concentration is 1 ml If it is less than /L, the surface of the silver carbon plating layer may be formed rough because the amount is too small, and if it is used in excess of 10 ml / L, the bonding strength with the silver plating layer is deteriorated, and the corrosion resistance and wear resistance of the silver carbon plating layer may deteriorate. Therefore, it is recommended to use it within the above range.
또한, 은탄소 도금액 성분 중 분산처리된 그라파이트 현탁액은 황산, 질산, 과산화수소, 과황산칼륨, 과황산나트륨, 과황산암모늄, 과망간산칼륨 및 과요오드산칼륨 중에서 선택된 1종 이상을 포함하는 산화제로 그라파이트 분말의 표면을 산화처리하여 소수성 유기물질이 제거된 그라파이트 분말; 및 분산습윤제;를 포함한다.In addition, the graphite suspension dispersed among the components of the silver carbon plating solution is an oxidizing agent containing at least one selected from sulfuric acid, nitric acid, hydrogen peroxide, potassium persulfate, sodium persulfate, ammonium persulfate, potassium permanganate and potassium periodate, Graphite powder whose surface is oxidized to remove hydrophobic organic materials; and a dispersion wetting agent.
상기 분산습윤제는 글리콜 에테르류 및 라우릴알코올 에톡실레이트(Lauryl alcohol ethoxylate) 중에서 선택된 1종 이상을 포함할 수 있고, 바람직하게는 라우릴알코올 에톡실레이트, 에틸렌글리콜 모노에틸에테르(thylene Glycol Monoethyl Ether), 및 에틸렌글리콜 모노에틸에테르의 아세트염, 에틸렌글리콜 모노부틸에테르(Ethylene Glycol Monobutyl ether) 중에서 선택된 1종 내지 3종을 포함할 수 있다.The dispersion wetting agent may include at least one selected from glycol ethers and lauryl alcohol ethoxylate, preferably lauryl alcohol ethoxylate and ethylene glycol monoethyl ether. ), and one to three selected from acetic acid salts of ethylene glycol monoethyl ether and ethylene glycol monobutyl ether.
상기 분산처리된 그라파이트 현탁액 제조공정은 먼저, 그라파이트분말 표면에 존재하는 소수성 유기물질제거를 위한 산화처리를 진행하고 산화처리에 의해 내균질성과 분산성이 향상되는 큰 표면저항을 갖는 탄소소재의 그라파이트 분말이 균일하게 도금액내에 현탁 분산되어서 은탄소 도금내의 탄소분포율이 균일한 도금층을 형성할 수 있다.In the dispersion-treated graphite suspension manufacturing process, first, oxidation treatment is performed to remove hydrophobic organic substances present on the surface of the graphite powder, and graphite powder of carbon material having a large surface resistance that improves homogeneity and dispersibility by oxidation treatment This is uniformly suspended and dispersed in the plating solution, so that a plating layer having a uniform carbon distribution rate in the silver carbon plating can be formed.
분산처리된 그라파이트 현탁액 제조방법의 바람직한 일구현예를 들면, 비이커에 그라파이트 분말 200g과 순수한 물 1L를 첨가하여 50℃까지 가열해주면서 2시간 동안 임펠러 교반기(impeller agitator)을 사용 100 rpm으로 교반시킨다. 이와 별도 용기에 과황산염 0.2 ~ 0.5M을 순수한 물 500ml에 50℃로 가온하면서 용해시켜준다. 2시간 교반이 끝난 후 그라파이트 용액에 용해된 과황산염 용액을 천천히 첨가한다. 첨가 후 5시간 동안 임펠러 교반기를 사용하여 100~120 rpm으로 교반시킨다. 교반이 완료되었으면 그라파이트 용액을 여과한다. 여과시 여과된 물이 pH가 7이 될 때까지 순수한 물로 세척해준다. 여과된 그라파이트 분말에 순수 200g과 비이온계면활성제로서, 라우릴알코올 에톡실레이트 8 ~ 12g, 에틸렌글리콜 모노에틸 에테르 8 ~ 10g을 넣고, 임펠러 교반기를 사용하여 50 rpm으로 2시간 교반하여 분산처리된 그라파이트 현탁액을 제조할 수 있다.As a preferred embodiment of a method for preparing a dispersion-treated graphite suspension, 200 g of graphite powder and 1 L of pure water are added to a beaker, heated to 50 ° C, and stirred at 100 rpm using an impeller agitator for 2 hours. In a separate container, 0.2 ~ 0.5M of persulfate is dissolved in 500ml of pure water while heating to 50℃. After 2 hours of stirring, a persulfate solution dissolved in the graphite solution was slowly added. After addition, the mixture is stirred at 100 to 120 rpm using an impeller stirrer for 5 hours. When stirring is completed, the graphite solution is filtered. When filtering, wash with pure water until the filtered water has a pH of 7. To the filtered graphite powder, 200 g of pure water and 8 to 12 g of lauryl alcohol ethoxylate and 8 to 10 g of ethylene glycol monoethyl ether were added as nonionic surfactants, and stirred for 2 hours at 50 rpm using an impeller stirrer to obtain a dispersion treatment. A graphite suspension can be prepared.
상기 그라파이트 분말은 입경 1 ~ 10㎛인 것을, 바람직하게는 입경 1 ~ 7㎛인 것을, 더욱 바람직하게는 입경 2 ~ 5㎛인 것을 본 발명 도금액 소재로 사용하며, 이때, 산화 처리한 그라파이트 분말의 입경이 1㎛ 미만인 것을 사용하면 은탄소 도금층의 전기저항률이 증가하고 윤활성이 감소하는 문제가 있을 수 있고, 입경이 10㎛ 초과하는 것을 사용하면 은탄소 도금층이 고르게 형성되지 않아 탄소공석률에 문제가 있을 수 있으므로, 상기 범위의 입경을 가지는 것을 사용하는 것이 좋다.The graphite powder having a particle size of 1 to 10 μm, preferably a particle size of 1 to 7 μm, and more preferably a particle size of 2 to 5 μm is used as a material for the plating solution of the present invention. At this time, the oxidized graphite powder If the particle diameter is less than 1㎛, there may be a problem that the electrical resistivity of the silver carbon plating layer increases and the lubricity decreases. Since there may be, it is preferable to use one having a particle diameter in the above range.
그리고, 도금액 내 분산처리된 그라파이트 현탁액의 적정 농도는 50 ~ 200g/L로, 바람직하게는 100 ~ 180g/L로, 더욱 바람직하게는 140 ~ 160g/L로 포함하도록 사용하는 것이 좋으며, 이때, 농도가 50g/L 미만이면 그 사용량이 너무 적어서 탄소 공석이 저하하는 문제가 있을 수 있고, 200g/L를 초과하여 사용하는 것은 과량 사용으로서, 오히려 욕전압이 도금속도가 저하하고 욕전압이 상승하는 문제가 있을 수 있으므로 상기 범위 내로 사용하는 것이 좋다.In addition, the appropriate concentration of the graphite suspension dispersed in the plating solution is 50 to 200 g/L, preferably 100 to 180 g/L, and more preferably 140 to 160 g/L. At this time, the concentration If it is less than 50 g/L, the amount used is too small and there may be a problem of reducing carbon vacancies, and if it is used in excess of 200 g/L, it is excessive use, and the bath voltage decreases the plating rate and increases the bath voltage. There may be, so it is good to use it within the above range.
앞서 설명한 본 발명의 은탄소 도금액으로 도금처리된 도금층은 EDS 맵핑(Energy dispersive X-ray spectrometry mapping) 분석시 탄소 공석량이 1 ~ 10%일 수 있고, 바람직하게는 3 ~ 10%, 더욱 바람직하게는 7 ~ 9%일 수 있다.The plating layer plated with the silver carbon plating solution of the present invention described above may have a carbon vacancy amount of 1 to 10%, preferably 3 to 10%, more preferably, when analyzed by EDS mapping (Energy dispersive X-ray spectrometry mapping). It may be 7-9%.
앞서 설명한 본 발명의 은탄소 도금액을 이용하여 은도금층이 형성된 피도금체에 상기 은탄소 도금층을 형성시키는 방법에 대하여 설명한다.A method of forming the silver carbon plating layer on a body to be plated on which the silver plating layer is formed using the silver carbon plating solution of the present invention described above will be described.
본 발명의 은탄소 도금층을 형성하는 방법은 은 도금층이 형성된 피도금체를 준비하는 단계; 및 상기 은 도금층 표면에 앞서 설명한 다양한 형태의 상기 은탄소 도금액을 코팅시켜서 은탄소 도금층을 형성시키는 단계;를 포함할 수 있으며, 은탄소 도금층의 표면에 변색방지액으로 코팅처리하여 변색방지층을 더 형성시키는 단계;를 더 포함할 수도 있다.A method of forming a silver carbon plating layer of the present invention includes preparing a body to be plated on which a silver plating layer is formed; and forming a silver carbon plating layer by coating the surface of the silver plating layer with the silver carbon plating solution in various forms described above, and further forming an anti-discoloration layer by coating the surface of the silver carbon plating layer with an anti-discoloration liquid. It may further include;
우선, 은도금층이 형성된 피도금체를 준비하는 단계에 대하여 구체적으로 설명한다.First, the step of preparing a body to be plated on which a silver-plated layer is formed will be described in detail.
상기 피도금체는 구리(Cu) 및 그합금소재, 철(Fe), 알루미늄(Al), 스테인레스 스틸 등의 금속 또는 이들의 합금성분을 포함하는 전기적, 전자적 부품을 사용할 수 있다.The object to be plated may be an electrical or electronic component including metals such as copper (Cu) and its alloys, iron (Fe), aluminum (Al), and stainless steel, or alloy components thereof.
그리고, 상기 은 도금층이 형성된 피도금체를 탈지시키는 1단계; 탈지시킨 피도금체를 수세하는 2단계; 상기 수세한 피도금체를 산처리 후, 재수세하는 3단계; 재수세한 피도금체를 동도금시키는 4단계; 동도금시킨 피도금체를 수세한 후, Ag 스트라이크 처리한 다음, 재수세하는 5단계; 5단계의 재수세한 피도금체의 표면에 상기 은 도금액으로 도금시켜 은 도금층을 형성시킨 후, 수세 및 건조시키는 6단계;를 포함하는 공정을 수행하여 제조할 수 있다.Then, a first step of degreasing the object to be plated on which the silver plating layer is formed; A second step of washing the degreased object to be plated with water; a third step of washing the washed object to be plated with water again after acid treatment; 4th step of copper-plating the again-washed object to be plated; Step 5 of washing the copper-plated object to be plated with water, then Ag strike treatment, and then washing again with water; It can be manufactured by performing a process including: forming a silver plating layer by plating the surface of the object to be plated with the silver plating solution washed again in step 5, then washing with water and drying.
상기 1단계의 탈지는 금속접촉단자의 표면의 기름 또는 기타 이물질을 제거하기 위한 것으로서, 피도금체를 탈지제, NaCN 및 NaOH를 포함하는 탈지액으로 탈지시켜서 수행할 수 있다. 이때, 상기 탈지제는 당업계에서 사용하는 일반적인 탈지제를 사용할 수 있다. 그리고, 탈지를 수행한 후, 수세는 2 ~ 4회, 바람직하게는 3 ~ 4회 당업계에서 사용하는 일반적인 방법으로 수행할 수 있다.The first step of degreasing is to remove oil or other foreign substances on the surface of the metal contact terminal, and can be performed by degreasing the plated body with a degreasing agent, a degreasing solution containing NaCN and NaOH. At this time, as the degreasing agent, a general degreasing agent used in the art may be used. And, after performing the degreasing, water washing may be performed 2 to 4 times, preferably 3 to 4 times by a general method used in the art.
상기 3단계의 산처리는 20 ~ 40℃ 하에서, 5 ~ 20분 정도 산성용액으로 탈지처리한 피도금체를 산처리함으로써, 금속접촉단자의 금속 표면의 산화 및 제거를 위한 것으로서, 표면외관과 도금 밀착성을 향상하기 위한 것이다. 특히, 피도금체가 비철(구리, 황동,인청동 등)인 경우, 상기 산처리에 사용되는 산성용액은 황산 10 ~ 30 부피% 또는 염산 10 ~ 30 부피%을 포함하는 것을 사용하는 것이 좋다. 그리고, 산처리 온도는 20 ~ 40℃ 하에서 수행하는 것이 원소재 표면에 있는 불순물 제거 및 소재의 표면을 일정하고, 균일하게, 깨끗하게 제거시킬 수 있다. 그리고, 상기 산처리한 피도금체를 수세를 수행하며, 수세는 2 ~ 4회, 바람직하게는 3 ~ 4회 당업계에서 사용하는 일반적인 방법으로 수행할 수 있다.The acid treatment in the third step is to oxidize and remove the metal surface of the metal contact terminal by acid treating the plated body degreased with an acid solution for 5 to 20 minutes at 20 to 40 ° C. This is to improve adhesion. In particular, when the object to be plated is non-ferrous (copper, brass, phosphor bronze, etc.), the acidic solution used for the acid treatment is preferably one containing 10 to 30 vol% of sulfuric acid or 10 to 30 vol% of hydrochloric acid. In addition, acid treatment at a temperature of 20 to 40 ° C can remove impurities on the surface of the raw material and remove the surface of the material uniformly, cleanly and uniformly. Then, the acid-treated object to be plated is washed with water, and the washing with water can be performed 2 to 4 times, preferably 3 to 4 times, by a general method used in the art.
상기 4단계의 동도금은 40 ~ 60℃ 및 전류밀도 1 ~ 2A/dm2 하에서 동도금액을 사용하여 수행할 수 있는데, 이때, 동도금 수행시 온도가 40℃ 미만이면 원소재 표면이 어둡고, 검붉은색으로 나오는 문제가 있을 수 있고, 60℃를 초과하면 전류가 세게 통하면서 제품의 표면이 거칠게 나오는 문제가 발생할 수 있으므로 상기 온도 내에서 동도금을 수행하는 것이 좋다. 그리고, 동도금액은 pH가 12.0 ~ 13.0인 것이 좋은데, 이때, 동도금액의 pH가 12.0 미만이면 제품의 표면에 도막 두께가 늦게 전착되는 문제가 있을 수 있고, pH가 13.0을 초과하면 제품의 표면에 도막이 거칠게 형성되는 문제가 있을 수 있으므로, 상기 pH 범위를 갖는 것이 좋다.The copper plating in step 4 may be performed using a copper plating solution at 40 to 60°C and a current density of 1 to 2A/dm 2 . At this time, if the temperature is less than 40°C during copper plating, the surface of the raw material is dark and has a dark red color. There may be a problem of coming out, and if the temperature exceeds 60 ° C, a problem may occur that the surface of the product comes out rough while the current flows strongly, so it is good to perform copper plating within the above temperature. In addition, it is preferable that the copper plating solution has a pH of 12.0 to 13.0. At this time, if the pH of the copper plating solution is less than 12.0, there may be a problem in that the thickness of the coating film is deposited on the surface of the product late. Since there may be a problem in that the coating film is formed roughly, it is preferable to have the above pH range.
그리고, 상기 동도금액은 NaCN, 청화제1동, NaOH,롯셀염(rochelle salt) 및 티오시안산칼륨을 포함할 수 있다.In addition, the copper plating solution may include NaCN, cuprous cyanide, NaOH, rochelle salt, and potassium thiocyanate.
그리고, 상기 동도금한 금속접촉단자를 수세를 수행하며, 수세는 2 ~ 4회, 바람직하게는 3 ~ 4회 당업계에서 사용하는 일반적인 방법으로 수행할 수 있다.Then, the copper-plated metal contact terminal is washed with water, and the water washing may be performed 2 to 4 times, preferably 3 to 4 times, by a general method used in the art.
상기 5단계의 Ag 스트라이크는 상온인 20 ~ 35℃ 하에서, Ag 스트라이크액으로 동도금한 피도금체를 처리할 수 있으며, 상기 Ag 스트라이크액은 KAg(CN)2 또는 AgCN, KCN 및 탄산칼륨을 포함할 수 있다.The Ag strike in the 5th step can treat copper-plated objects with Ag strike liquid at room temperature of 20 to 35 ° C, and the Ag strike liquid may contain KAg(CN) 2 or AgCN, KCN and potassium carbonate. can
그리고, 상기 6단계의 은도금액은 당업계에서 사용하는 은도금액 및 일반적인 은도금방법을 사용하여 수있으며, 바람직하게는 KAg(CN)2 또는 AgCN, KCN, 탄산칼륨, KOH 및 광택제를 포함하는 은도금액을 사용하여 피도금체 표면에 은도금층을 형성시키는 것이 좋다.In addition, the silver plating solution in step 6 may be a silver plating solution used in the art and a general silver plating method, preferably a silver plating solution containing KAg(CN) 2 or AgCN, KCN, potassium carbonate, KOH, and a brightener It is preferable to form a silver plating layer on the surface of the object to be plated by using.
그리고, 은도금층이 형성된 금속접착단자의 수세는 2 ~ 4회, 바람직하게는 3 ~ 4회 당업계에서 사용하는 일반적인 방법으로 수행할 수 있다.In addition, the metal bonding terminal having the silver-plated layer may be washed with water 2 to 4 times, preferably 3 to 4 times, by a general method used in the art.
다음으로, 본 발명의 본 발명의 은탄소 도금층을 형성하는 방법에 있어서, 은탄소 도금층을 형성시키는 단계에 대하여 구체적으로 설명하면, 은도금층이 형성된 피도금체의 은 도금층의 표면에 본 발명의 은탄소 도금액으로 도금하여 은탄소 도금층을 형성시킬 수 있다.Next, in the method of forming the silver carbon plating layer of the present invention, the step of forming the silver carbon plating layer will be described in detail. A silver carbon plating layer may be formed by plating with a carbon plating solution.
이때, 상기 은탄소 도금액의 조성, 조성비 특징은 앞서 설명한 바와 동일하다. 그리고, 도금시 상기 은탄소 도금액은 온도는 18 ~ 30℃인 것이, 바람직하게는 18 ~ 25℃, 더욱 바람직하게는 18 ~ 23℃인 것이 좋은데, 이때, 탄소코팅액의 온도가 18℃ 미만이면 도금 성형성이 떨어지는 문제가 있을 수 있고, 30℃를 초과하면 은도금층 표면 또는 은도금층에 형성된 변색방지층의 표면에 변성을 가져올 수 있는 문제가 있을 수 있으므로, 은탄소 도금액이 상기 범위내의 온도를 갖는 상태에서 도금 처리하는 것이 좋다. 그리고, 은탄소 도금액을 도금 방법은 당업계에서 사용하는 일반적인 방법을 사용할 수 있다.In this case, the characteristics of the composition and composition ratio of the silver-carbon plating solution are the same as those described above. In addition, during plating, the temperature of the silver carbon plating solution is preferably 18 to 30 ° C, preferably 18 to 25 ° C, more preferably 18 to 23 ° C. At this time, if the temperature of the carbon coating solution is less than 18 ° C, plating There may be a problem of poor moldability, and if the temperature exceeds 30 ° C, there may be a problem of causing denaturation to the surface of the silver plating layer or the surface of the anti-discoloration layer formed on the silver plating layer. A state in which the silver carbon plating solution has a temperature within the above range Plating treatment is good. In addition, as a method of plating the silver carbon plating solution, a general method used in the art may be used.
또한, 상기 은탄소 도금액의 pH는 11 ~ 13, 바람직하게는 11.5 ~ 13.0, 더욱 바람직하게는 12.0 ~ 13.0인 것이 좋으며, 이때, 은탄소 도금액의 pH가 11 미만이면 광택이 저하하는 문제가 있을 수 있고, 은탄소 도금액의 pH가 13을 초과하면 도금피막이 거칠어지는 문제가 있을 수 있다.In addition, the pH of the silver carbon plating solution is preferably 11 to 13, preferably 11.5 to 13.0, and more preferably 12.0 to 13.0. At this time, if the pH of the silver carbon plating solution is less than 11, there may be a problem of deterioration in gloss. In addition, if the pH of the silver carbon plating solution exceeds 13, there may be a problem that the plating film becomes rough.
또한, 은탄소 도금층의 두께는 평균두께 3 ~ 12㎛로, 바람직하게는 평균두께 6 ~ 10㎛로 형성시키는 것이 좋으며, 이때, 은탄소 도금층의 평균두께가 4㎛ 미만이면 충분한 내마모성, 내식성을 확보할 수 없을 수 있고, 은탄소 도금층의 평균두께가 12㎛를 초과하면 통전율이 떨어지고, 가격면에서 생산성이 떨어지는 문제가 있을 수 있으므로 상기 범위 내의 평균두께를 갖도록 은탄소 도금층을 형성시키는 것이 좋다.In addition, the thickness of the silver carbon plating layer is preferably formed to an average thickness of 3 to 12㎛, preferably an average thickness of 6 to 10㎛. At this time, if the average thickness of the silver carbon plating layer is less than 4㎛, sufficient wear resistance and corrosion resistance are secured. If the average thickness of the silver carbon plating layer exceeds 12 μm, there may be a problem in that the current rate is lowered and productivity is lowered in terms of price. Therefore, it is preferable to form the silver carbon plating layer to have an average thickness within the above range.
그리고, 도금 후 내식성 및 내변색성 강화를 위해 후처리를 실시한다. 일반적인 도금처리 후 내식성 또는 내변색성을 강화하기 위해 후처리를 실시하는데 대부분 업계에서는 유기계화합물이나 6가크롬을 사용하여 후처리를 하지만 친환경적인 3가크롬베이스로 한 전해방식 후처리제(상품명: FC-400EP 제조사: ㈜영인플라켐)을 사용하여 뛰어난 내변색성을 나타낸다.After plating, post-treatment is performed to enhance corrosion resistance and discoloration resistance. After general plating treatment, post-treatment is performed to enhance corrosion resistance or discoloration resistance. Most industries use organic compounds or hexavalent chromium for post-treatment. -400EP Manufacturer: Youngin Plachem Co., Ltd.) is used to show excellent discoloration resistance.
이하, 실시예에 의거하여 본 발명을 더욱 자세하게 설명을 한다. 그러나, 하기 실시예에 의해 본 발명의 권리범위를 한정하여 해석해서는 안된다.Hereinafter, the present invention will be described in more detail based on examples. However, the scope of the present invention should not be limited and interpreted by the following examples.
[실시예][Example]
준비예 1 : 분산처리된 그라파이트 현탁액 제조Preparation Example 1: Preparation of dispersed graphite suspension
입경 2.2 ~ 5.5㎛인 그라파이트 분말을 준비하였다.Graphite powder having a particle size of 2.2 to 5.5 μm was prepared.
비이커에 그라파이트 분말 200g과 순수한 물 1L를 첨가하여 50℃까지 가열해주면서 2시간 동안 임펠러 교반기(impeller agitator)을 사용 100 rpm으로 교반시킨다. 이와 별도 용기에 과황산염 0.2 ~ 0.5M을 순수한 물 500ml에 50℃로 가온하면서 용해시켜준다.200 g of graphite powder and 1 L of pure water were added to a beaker, heated to 50° C., and stirred at 100 rpm using an impeller agitator for 2 hours. In a separate container, 0.2 ~ 0.5M of persulfate is dissolved in 500ml of pure water while heating to 50℃.
다음으로, 2시간 교반이 끝난 후 그라파이트 용액에 용해된 과황산염 용액을 천천히 첨가했다.Next, after 2 hours of stirring, a persulfate solution dissolved in the graphite solution was slowly added.
다음으로, 첨가 후 5시간 동안 임펠러 교반기를 사용하여 100~120 rpm으로 교반시켰다. 교반이 완료되었으면 그라파이트 용액을 여과했다. 여과시 여과된 물이 pH가 7이 될 때까지 순수한 물로 세척해준다.Next, the mixture was stirred at 100 to 120 rpm using an impeller stirrer for 5 hours after addition. When stirring was completed, the graphite solution was filtered. When filtering, wash with pure water until the filtered water has a pH of 7.
다음으로, 여과된 그라파이트 분말에 순수 200g과 비이온계면활성제로서, 라우릴알코올 에톡실레이트 10g, 에틸렌글리콜 모노에틸 에테르 9g을 넣고, 임펠러 교반기를 사용하여 50 rpm으로 2시간 교반하여 분산처리된 그라파이트 현탁액을 제조하였으며, 현탁액 내 그래파이트 분말은 입경 2.2 ~ 5.5㎛(평균입경 약 3.0㎛)이였다.Next, 200 g of pure water and nonionic surfactants, 10 g of lauryl alcohol ethoxylate and 9 g of ethylene glycol monoethyl ether were added to the filtered graphite powder, and stirred for 2 hours at 50 rpm using an impeller stirrer to disperse graphite A suspension was prepared, and the graphite powder in the suspension had a particle diameter of 2.2 to 5.5 μm (average particle diameter of about 3.0 μm).
실시예 1 : 은탄소 도금층의 제조 및 도금 처리Example 1: Manufacturing and Plating Treatment of Silver Carbon Plating Layer
(1)은탄소 도금액의 제조(1) Manufacture of silver carbon plating solution
용매인 물에 KAg(CN)2 40g/L, KCN 100g/L, K2CO3 10g/L, KOH 5g/L, 금속광택제로서 Se 4mg/L 비이온성 계면활성제인 폴리소르베이트를 2ml/L, 준비예 1에서 제조한 분산처리된 그라파이트 현탁액 80g/L를 첨가하여 pH 12.5인 은탄소 도금액을 제조하였다.KAg(CN) 2 40g/L, KCN 100g/L, K 2 CO 3 10g/L, KOH 5g/L, Se 4mg/L as a metal brightener, polysorbate as a nonionic surfactant, 2ml/L in water as a solvent , 80 g/L of the dispersion-treated graphite suspension prepared in Preparation Example 1 was added to prepare a silver carbon plating solution having a pH of 12.5.
(2)은탄소 도금액으로 피도금체 도금(2) Plating the object to be plated with a silver carbon plating solution
피도금체로서 0.3dm2 의 면적을 가지는 황동 소재 시편을 준비하였다.A specimen of brass material having an area of 0.3 dm2 was prepared as an object to be plated.
상기 피도금체를 상기 pH 12.5인 은탄소 도금액(20℃)을 전류밀도 1A/dm2 하에서 도금 공정을 수행하였다. 다음으로, 이를 5회 정도 충분히 수세시켜서 전착되지 않은 흑연분말을 제거한 후, 건조시켜서 은탄소 도금층(두께 8㎛)이 표면에 도금된 은탄소 도금 시편 제조하였다.A plating process was performed on the object to be plated with the silver carbon plating solution (20° C.) having a pH of 12.5 under a current density of 1 A/dm 2 . Next, it was sufficiently washed with water about 5 times to remove non-electrodeposited graphite powder, and then dried to prepare a silver carbon plated specimen having a silver carbon plated layer (8 μm in thickness) on the surface.
실시예 2Example 2
상기 실시예1 과 동일한 방법으로 실시하되, 준비예 1에서 제조한 분산처리된 그라파이트 현탁액 120g/L를 첨가하여 은탄소 도금액을 제조하였다.A silver carbon plating solution was prepared in the same manner as in Example 1, except that 120 g/L of the graphite suspension prepared in Preparation Example 1 was added to the dispersion treatment.
실시예 3Example 3
상기 실시예1 과 동일한 방법으로 실시하되, 준비예 1에서 제조한 분산처리된 그라파이트 현탁액 160g/L를 첨가하여 은탄소 도금액을 제조하였다.A silver carbon plating solution was prepared in the same manner as in Example 1, except that 160 g/L of the dispersion-treated graphite suspension prepared in Preparation Example 1 was added.
비교예 1Comparative Example 1
상기 실시예1 과 동일한 방법으로 실시하되, 그라파이트 현탁액을 첨가하지 않고 은도금액하고, 후처리는 시판 중인 유기물타입의 후처리제를 사용하였다.It was carried out in the same manner as in Example 1, but silver plating was performed without adding a graphite suspension, and a commercially available organic type post-treatment agent was used for post-treatment.
비교예 2Comparative Example 2
상기 실시예1 과 동일한 방법으로 실시하되, 그라파이트 현탁액을 첨가하지 않고, CNT(MWNT,Multi walled nanotube) 16g/L를 첨가하여 은탄소 도금액을 제조하였다Carried out in the same way as in Example 1, A silver carbon plating solution was prepared by adding 16 g/L of CNT (MWNT, Multi walled nanotube) without adding graphite suspension.
비교예 3Comparative Example 3
상기 실시예1 과 동일한 방법으로 실시하되, 그라파이트 현탁액을 첨가하지 않고 CNT(SWNT,Single walled nanotube) 16g/L를 첨가하여 은탄소 도금액을 제조하였다.In the same manner as in Example 1, a silver carbon plating solution was prepared by adding 16 g/L of CNT (SWNT, Single walled nanotube) without adding a graphite suspension.
(ml/L)nonionic surfactant
(ml/L)
그라파이트 현탁액(g/L)Distributed
Graphite suspension (g/L)
실험예 1 : 은탄소 도금층의 카본 공석율Experimental Example 1: Carbon Vacancy Rate of Silver Carbon Plating Layer
상기 실시예 및 비교예에서 제조한 금속접촉단자의 카본 공석율을 측정하여 하기 표 2에 그 결과를 나타내었다. 그리고, 측정 방법은 OXFORD사의 X-MAX20를 이용하여 EDS(Energy Dispersive X-Ray Spectrometer)으로 측정하였고, 실시예, 비교예에 대한 맵핑 이미지를 도 1에 나타내었다.Carbon vacancies of the metal contact terminals prepared in Examples and Comparative Examples were measured, and the results are shown in Table 2 below. In addition, the measurement method was measured with an Energy Dispersive X-Ray Spectrometer (EDS) using OXFORD's X-MAX20, and mapping images for Examples and Comparative Examples are shown in FIG.
실험예 2 : 은탄소 도금층의 내변색성, 내마모성, 통전성, 내열성, 윤활성 측정Experimental Example 2: Measurement of discoloration resistance, abrasion resistance, conductivity, heat resistance, and lubricity of silver carbon plating layer
(1) 내변색성 측정(1) Measurement of discoloration resistance
실시예 및 비교예에서 제조한 은탄소 도금층에 대한 내변색성을 K2S 변색테스트를 수행하여 평가하였으며, 변색테스트는 1% K2S 수용액에서 변색되는 시간을 측정 평가하였다. 3시간 동안 담근 후, 변색 여부를 평가하였다.(KSM ISO2812-4)Discoloration resistance of the silver carbon plating layers prepared in Examples and Comparative Examples was evaluated by performing a K 2 S discoloration test, and the discoloration test was evaluated by measuring the discoloration time in a 1% K 2 S aqueous solution. After soaking for 3 hours, discoloration was evaluated. (KSM ISO2812-4)
실시예 1에 대한 내변색성 측정 후의 표면 이미지를 도 2에 나타내었다. 그리고, 침적 시간은 하기 표 3에 나타내었다.The surface image after measuring the discoloration resistance for Example 1 is shown in FIG. 2 . And, the immersion time is shown in Table 3 below.
(2) 내마모성 측정(2) wear resistance measurement
실시예 및 비교예의 은탄소 도금층에 대한 내마모성을 슬라이딩 마모시험기 (Abrasion tester)를 사용 일정한 하중 2N으로 접동거리 10mm, 슬라이딩 속도 3mm/sec로 왕복운동을 1,000회 실시하였을 때 도금층의 박리 여부를 보고 판단한다.The abrasion resistance of the silver carbon plating layer of Examples and Comparative Examples was judged by looking at whether the plating layer was peeled off when reciprocating 1,000 times at a sliding distance of 10 mm and a sliding speed of 3 mm/sec with a constant load of 2N using an abrasion tester do.
(3) 통전성 측정(3) Conductivity measurement
실시예 및 비교예에서 제조한 은탄소 도금층에 대한 통전성은 은탄소 도금층 형성부위와 은탄소 도금층이 형성되지 않는 부분의 접촉저항을 측정하여 비교예 1의 은탄소도금 코팅층을 형성시키지 않은 도금층의 측정값을 100% 기준으로 하여 측정하였다. 접촉저항은 ASTM-B667에 근거하여 제작된 전기접점 시뮬레이터(CRS-1, Yamasaki)를 사용하여 하중변화에 따른 접촉저항의 변화를 측정하였다. 한 개의 시편 당 접촉저항을 5회 측정하여 그 평균치를 표 4에 나타내었다.The conductivity of the silver carbon plating layer prepared in Examples and Comparative Examples was measured by measuring the contact resistance of the silver carbon plating layer formed portion and the silver carbon plating layer not formed portion of Comparative Example 1 Measurement of the plating layer without the silver carbon plating coating layer formed Values were determined on a 100% basis. For contact resistance, the change in contact resistance according to the load change was measured using an electrical contact simulator (CRS-1, Yamasaki) manufactured based on ASTM-B667. The contact resistance per specimen was measured 5 times and the average value is shown in Table 4.
(4) 내열성(4) heat resistance
실시예 및 비교예에서 제조한 은탄소 도금층에 대한 내열성이 은도금층이 350℃에서 급격히 산화가 진행되므로, 질소분위기 속에서 450℃에서 10분간 열처리를 시행하여 표면산화 여부로 내열성을 평가하였다.(제조사:대흥과학, 상품명 : DF-333GFS). 그리고, 고온 열처리후 사진을 도 3에 나타내었다.As for the heat resistance of the silver carbon plating layers prepared in Examples and Comparative Examples, since the silver plating layer is rapidly oxidized at 350 ° C, heat treatment was performed at 450 ° C for 10 minutes in a nitrogen atmosphere to evaluate the heat resistance by checking whether the surface was oxidized. ( Manufacturer: Daeheung Science, product name: DF-333GFS). And, a photograph after high-temperature heat treatment is shown in FIG. 3 .
(5) 윤활성(5) Lubricity
실시예 및 비교예에서 제조한 은탄소 도금층에 대해 UTM(Universal Testing Machine)으로 로드셀: 29N , 속도: 150mm/min , 수직하중:2.09N(분동의 무게200g(1.96N)과 시료의 무게를 합한 값), 피마찰재(STS)로 마찰계수를 측정하여 윤활성을 평가하였고, 그 결과를 하기 표 5에 나타내었다.Load cell: 29N, speed: 150mm/min, vertical load: 2.09N (the sum of the weight of the weight 200g (1.96N) and the weight of the sample) value), the friction coefficient was measured with the friction material (STS) to evaluate the lubricity, and the results are shown in Table 5 below.
마찰계수는 마찰력을 수직접촉력으로 나눈 상대적인 비율로 정지마찰계수(static friction coefficient)와 동마찰계수(dynamic friction coefficient)로 구분되고 정지마찰계수는 정지하고 있는 두물체사이의 값이고 동마찰계수는 상대적인 운동을 하고있는 값으로, 마찰계수는 윤활성이 존재하는 경우보다 그렇지 않은 경우가 마찰계수가 높게 나타난다.The friction coefficient is the relative ratio of the frictional force divided by the vertical contact force, and is divided into static friction coefficient and dynamic friction coefficient. The static friction coefficient is the value between two objects at rest, and the dynamic friction coefficient is the relative As a value that is in motion, the friction coefficient appears higher in the case where lubricity is not present than in the case where lubricity exists.
그리고, 앞서 수행한 내변색성, 내마모성, 통전성 내열성 및 윤활성 측정 결과를 하기 표 6에 나타내었다.In addition, the results of discoloration resistance, abrasion resistance, conductivity, heat resistance, and lubricity measurements previously performed are shown in Table 6 below.
(박리 발생)wear resistance
(peeling occurs)
(%)continuity measurement
(%)
(동마찰계수 평균)lubricity
(average of dynamic friction coefficient)
물성 측정 결과를 정리한 표 6을 통해서 확인할 수 있듯이, 실시예 1 ~ 3의 은탄소 도금 시편은 내변색성, 내마모성 통전성, 내열성 및 윤활성이 우수함을 확인할 수 있었다.As can be confirmed through Table 6, which summarizes the physical property measurement results, it was confirmed that the silver carbon-coated specimens of Examples 1 to 3 had excellent discoloration resistance, wear resistance, electrical conductivity, heat resistance, and lubricity.
이에 반해, 그라파이트 현탁액을 첨가하지 않고 은도금액으로 도금 처리한 비교예 1은 전반적인 물성이 크게 저조함을 확인할 수 있었다.On the other hand, Comparative Example 1 in which the plating process was performed with a silver plating solution without adding the graphite suspension was found to have significantly poor overall physical properties.
또한, MW-CNT 또는 SW-CNT를 첨가한 은도금액으로 도금 처리한 비교예 2 및 비교예 3은 내변색성 및 통전성 측면에서 실시예 1 ~ 3 보다 저조한 결과를 보였다.In addition, Comparative Examples 2 and 3, which were plated with a silver plating solution containing MW-CNT or SW-CNT, showed poorer results than Examples 1 to 3 in terms of discoloration resistance and conductivity.
상기 실시예 및 실험예를 통하여, 본 발명의 은탄소 도금액으로 도금처리된 은탄소 도금층은 도금층 내 탄소 성분(C)이 균일하게 분포되어 내식성, 내변색성이 우수할 뿐만 아니라, 내열성, 내마모성 및 전기적 특성도 우수함을 확인할 수 있었다.Through the above examples and experimental examples, the silver carbon plating layer plated with the silver carbon plating solution of the present invention has excellent corrosion resistance and discoloration resistance because the carbon component (C) is uniformly distributed in the plating layer, as well as heat resistance, wear resistance and It was confirmed that the electrical characteristics were also excellent.
Claims (10)
상기 금속광택제는 Na2Se 및 Na2SeO4 중에서 선택된 1종 이상을 포함하는 Se계 화합물; K2Sb2C8H4O12, O12S3Sb2(Antimony sulfate), Sb2O3 및 Sb2S5 중에서 선택된 1종 이상을 포함하는 Sb계 화합물; 및 Bi2O3, BiCl2 및 NaBiO3 중에서 선택된 1종 이상을 포함하는 Bi계 화합물; 중에서 선택된 1종 이상을 포함하고,
상기 비이온성 계면활성제는 폴리소르베이트 및 옥틸도데세스 중에서 선택된 1종 이상을 포함하며,
상기 분산처리된 그라파이트 현탁액은 산화제로 입경 1 ~ 10㎛인 그라파이트 분말의 표면을 산화처리하여 소수성 유기물질이 제거된 그라파이트 분말; 및 분산습윤제;를 포함하고,
상기 산화제는 황산, 질산, 과산화수소, 과황산칼륨, 과황산나트륨, 과황산암모늄, 과망간산칼륨 및 과요오드산칼륨 중에서 선택된 1종 이상을 포함하며,
상기 분산습윤제는 글리콜 에테르류 및 라우릴알코올 에톡실레이트(Lauryl alcohol ethoxylate) 중에서 선택된 1종 이상을 포함하는 것을 특징으로 하는 내변색성, 내마모성, 통전성, 내열성, 윤활성이 뛰어난 은탄소 도금액.KAg(CN) 2 30 ~ 45g/L, KCN 80 ~ 135g/L, K 2 CO 3 5 ~ 40g/L, KOH 2 ~ 15g/L, metal polish 2 ~ 8 mg/L, nonionic surfactant 1 ~ 7 ml / L, including 50 ~ 200 g / L of the graphite suspension dispersed and water as a solvent,
The metal brightener is a Se-based compound containing at least one selected from Na 2 Se and Na 2 SeO 4 ; a Sb-based compound including at least one selected from K 2 Sb 2 C 8 H 4 O 12, O 12 S 3 Sb 2 (Antimony sulfate), Sb 2 O 3 and Sb 2 S 5 ; and Bi 2 O 3 , BiCl 2 and NaBiO 3 Bi-based compound containing at least one selected from; Including one or more selected from among,
The nonionic surfactant includes at least one selected from polysorbate and octyldodeceth,
The dispersion-treated graphite suspension includes graphite powder from which hydrophobic organic materials are removed by oxidizing the surface of graphite powder having a particle size of 1 to 10 μm with an oxidizing agent; And a dispersion wetting agent; including,
The oxidizing agent includes at least one selected from sulfuric acid, nitric acid, hydrogen peroxide, potassium persulfate, sodium persulfate, ammonium persulfate, potassium permanganate and potassium periodate,
The dispersion wetting agent is silver carbon plating solution with excellent discoloration resistance, abrasion resistance, conductivity, heat resistance and lubricity, characterized in that it comprises at least one selected from glycol ethers and lauryl alcohol ethoxylate.
상기 은 도금층 표면을 제3항의 상기 은탄소 도금액으로 도금시켜서 은탄소(Ag-C) 도금층을 형성시키는 2단계;를 포함하는 것을 특징으로 하는 은탄소 도금액의 도금 처리방법.A first step of preparing a copper-based or copper-alloy-based component on which a silver (Ag) plating layer is formed; and
The plating treatment method of the silver carbon plating solution comprising a second step of plating the surface of the silver plating layer with the silver carbon plating solution of claim 3 to form a silver carbon (Ag-C) plating layer.
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JP2022157257A (en) * | 2021-03-31 | 2022-10-14 | 大阪瓦斯株式会社 | Plating solution additive |
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