KR102500973B1 - 전극구조체 - Google Patents

전극구조체 Download PDF

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Publication number
KR102500973B1
KR102500973B1 KR1020180048668A KR20180048668A KR102500973B1 KR 102500973 B1 KR102500973 B1 KR 102500973B1 KR 1020180048668 A KR1020180048668 A KR 1020180048668A KR 20180048668 A KR20180048668 A KR 20180048668A KR 102500973 B1 KR102500973 B1 KR 102500973B1
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KR
South Korea
Prior art keywords
electrode
electrode plate
feeder
electrode structure
plate
Prior art date
Application number
KR1020180048668A
Other languages
English (en)
Korean (ko)
Other versions
KR20180121397A (ko
Inventor
쯔요시 히라이시
타카유키 시마무네
Original Assignee
가부시키가이샤 오사카소다
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 가부시키가이샤 오사카소다 filed Critical 가부시키가이샤 오사카소다
Publication of KR20180121397A publication Critical patent/KR20180121397A/ko
Application granted granted Critical
Publication of KR102500973B1 publication Critical patent/KR102500973B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005—Contacting devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/007—Current directing devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/02—Heating or cooling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/22—Electroplating: Baths therefor from solutions of zinc

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
KR1020180048668A 2017-04-28 2018-04-26 전극구조체 KR102500973B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017089326A JP6911491B2 (ja) 2017-04-28 2017-04-28 電極構造体
JPJP-P-2017-089326 2017-04-28

Publications (2)

Publication Number Publication Date
KR20180121397A KR20180121397A (ko) 2018-11-07
KR102500973B1 true KR102500973B1 (ko) 2023-02-17

Family

ID=64093057

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020180048668A KR102500973B1 (ko) 2017-04-28 2018-04-26 전극구조체

Country Status (3)

Country Link
JP (1) JP6911491B2 (zh)
KR (1) KR102500973B1 (zh)
CN (1) CN108796591B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230082190A (ko) * 2021-12-01 2023-06-08 에이티엑스 주식회사 동박 제조장치
KR102532620B1 (ko) * 2023-01-10 2023-05-16 에이티엑스 주식회사 코일 강판의 고효율 도금장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3244259B2 (ja) 1996-11-28 2002-01-07 新日本製鐵株式会社 メッキ用電極

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4552638A (en) * 1984-11-13 1985-11-12 Aluminum Company Of America Electrode assembly having improved current distribution for use in an electrolytic reduction cell
JP3207909B2 (ja) * 1992-02-07 2001-09-10 ティーディーケイ株式会社 電気めっき方法および電気めっき用分割型不溶性電極
JP3468545B2 (ja) * 1993-04-30 2003-11-17 ペルメレック電極株式会社 電解用電極
JPH0762583A (ja) * 1993-08-24 1995-03-07 Permelec Electrode Ltd 電解用電極
JPH07331495A (ja) * 1994-06-13 1995-12-19 Daiso Co Ltd 不溶性電極板の取付け部
JP3606932B2 (ja) * 1994-12-30 2005-01-05 石福金属興業株式会社 電解用複合電極
JPH09279399A (ja) * 1996-04-11 1997-10-28 Nippon Steel Corp 電気めっき用分割型不溶性電極
JP2002038291A (ja) * 2001-09-03 2002-02-06 Daiso Co Ltd 金属箔製造用陽極
CN101942671A (zh) * 2010-09-07 2011-01-12 苏州卓群钛镍设备有限公司 一种氯酸钠电解槽
CN102910708B (zh) * 2012-10-31 2014-11-05 武汉玻尔科技股份有限公司 工业废水电化学联合阳极处理方法
CN103343380B (zh) * 2013-07-01 2016-03-09 南通富士通微电子股份有限公司 电镀用阳极组件和电镀装置
KR20160132550A (ko) * 2015-05-11 2016-11-21 주식회사 티티엠 전기도금용 전극
US10047453B2 (en) * 2015-05-26 2018-08-14 Applied Materials, Inc. Electroplating apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3244259B2 (ja) 1996-11-28 2002-01-07 新日本製鐵株式会社 メッキ用電極

Also Published As

Publication number Publication date
KR20180121397A (ko) 2018-11-07
CN108796591A (zh) 2018-11-13
CN108796591B (zh) 2021-10-29
JP2018188679A (ja) 2018-11-29
JP6911491B2 (ja) 2021-07-28

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