KR102485991B1 - Solvent-free curable composition, cured layer using the composition and color filter including the cured layer - Google Patents

Abstract

(상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)Provided are a solvent-free curable composition comprising a quantum dot surface-modified with a compound represented by Formula 1 and a polymerizable monomer having a carbon-carbon double bond at the terminal, a cured film and a color filter prepared using the same.
[Formula 1]

(In Formula 1, each substituent is as defined in the specification.)

Description

Solvent-free curable composition, a cured film prepared using the composition, and a color filter and display device including the cured film

The present disclosure relates to a solvent-free curable composition, a cured film prepared using the composition, and a color filter including the cured film.

In the case of general quantum dots, the solvent to be dispersed is limited due to their hydrophobic surface characteristics, and as a result, it is true that they are difficult to introduce into polar systems such as binders or curable monomers.

For example, even in the case of a quantum dot ink composition that has been actively studied, in its initial stage, it was at a level of being dispersed in a solvent used for a curable composition having a relatively low polarity and high hydrophobicity. Because of this, it was difficult to include 20% by weight or more of quantum dots relative to the total amount of the total composition, so that the light efficiency of the ink could not be increased beyond a certain level, and even if quantum dots were forcibly added and dispersed to increase light efficiency, ink-jetting This range of viscosity (12 cPs) was exceeded, and fairness could not be satisfied.

In addition, in order to implement a viscosity range in which jetting is possible, a method of lowering the ink solid content by including 50% by weight or more of a solvent based on the total amount of the total composition has been used. This method also provides somewhat satisfactory results in terms of viscosity, During jetting, problems such as nozzle drying due to solvent volatilization, nozzle clogging, and single film reduction over time after jetting, and thickness deviation after curing become severe, making it difficult to apply to actual processes.

Therefore, the solvent-free type of quantum dot ink is the most preferable form for application to actual processes, and it is evaluated that the current technology of applying quantum dots themselves to solvent-type compositions has reached a certain limit.

As reported so far, in the case of solvent-type compositions, quantum dots that are not surface-modified such as ligand substitution are included in an amount of about 20% to 25% by weight relative to the total amount of solvent-type compositions, and therefore, light efficiency is limited due to viscosity. And it is difficult to increase the absorption rate. On the other hand, a method of lowering the quantum dot content and increasing the content of the light diffusing agent (scattering body) has been tried as another improvement direction, but this also fails to improve the sedimentation problem or the low light efficiency problem.

One embodiment is to provide a solvent-free curable composition including quantum dots surface-modified with a compound having both a polar part and a non-polar part.

Another embodiment is to provide a cured film prepared using the solvent-free curable composition.

Another embodiment is to provide a color filter including the cured film.

One embodiment provides a solvent-free curable composition comprising a quantum dot surface-modified with a compound represented by Formula 1 below and a polymerizable monomer having a carbon-carbon double bond at the terminal.

[Formula 1]

In Formula 1,

L ¹ , L ³ and L ⁵ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted Or an unsubstituted C2 to C20 heteroarylene group,

L ² and L ⁴ are each independently a single bond, *-O-*, *-S-*, *-C(=O)O-* or *-OC(=O)-*;

R ¹ is a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group;

n is an integer from 6 to 15;

m is an integer from 1 to 10;

Chemical Formula 1 may be represented by any one of Chemical Formulas 1-1 to 1-3 below.

[Formula 1-1]

[Formula 1-2]

[Formula 1-3]

In Formula 1-1 to Formula 1-3,

L ¹ , L ³ and L ⁵ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted Or an unsubstituted C2 to C20 heteroarylene group,

R ¹ and R ² are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group,

n is an integer from 6 to 15;

m is an integer from 1 to 10;

p is 0 to 4;

Formula 1 may be represented by any one of Formulas 2 to 5 below.

[Formula 2]

[Formula 3]

[Formula 4]

[Formula 5]

The quantum dots may have a maximum fluorescence emission wavelength at 500 nm to 680 nm.

The polymerizable monomer may have a molecular weight of 220 g/mol to 1,000 g/mol.

The polymerizable monomer may be represented by Formula 6 below.

[Formula 6]

In Formula 6,

R ³ and R ⁴ are each independently a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group;

L ⁶ and L ⁸ are each independently a substituted or unsubstituted C1 to C10 alkylene group;

L ⁷ is a substituted or unsubstituted C1 to C10 alkylene group or an ether group (*-O-*).

The solvent-free curable composition may include 1 wt % to 60 wt % of the quantum dots and 40 wt % to 99 wt % of the polymerizable monomer.

The solvent-free curable composition may further include a polymerization initiator, a light diffusing agent, or a combination thereof.

The light diffusing agent may include barium sulfate, calcium carbonate, titanium dioxide, zirconia, or a combination thereof.

The solvent-free curable composition may include a polymerization inhibitor; malonic acid; 3-amino-1,2-propanediol; silane-based coupling agents; leveling agent; fluorine-based surfactants; or a combination thereof.

Another embodiment provides a cured film prepared using the solvent-free curable composition.

The cured film may have an emission wavelength of 540 nm or less.

Another embodiment provides a color filter including the cured film.

Another embodiment provides a display device including the color filter.

The specific details of other aspects of the present invention are included in the detailed description below.

One embodiment provides a solvent-free curable composition including quantum dots surface-modified with a compound having both a polar part and a non-polar part, and the surface-modifying compound helps to form a constant gap between the quantum dots, thereby forming the solvent-free curable composition. It is possible to implement high color reproducibility by lowering the light emission wavelength of the cured film prepared using the cured film, and at the same time, it is possible to prevent the cured film from deteriorating physical properties such as light resistance and heat resistance.

1 is a figure in which quantum dots surface-modified with a compound having both a polar part and a non-polar part exist in a monodispersed form in a solvent-free curable composition, and quantum dots surface-modified with a compound having only a polar part are present in an aggregate form in a solvent-free curable composition. This is a comparison of existing pictures.

Hereinafter, embodiments of the present invention will be described in detail. However, this is presented as an example, and the present invention is not limited thereby, and the present invention is only defined by the scope of the claims to be described later.

Unless otherwise specified herein, "alkyl group" means a C1 to C20 alkyl group, "alkenyl group" means a C2 to C20 alkenyl group, "cycloalkenyl group" means a C3 to C20 cycloalkenyl group, , "Heterocycloalkenyl group" means a C3 to C20 heterocycloalkenyl group, "aryl group" means a C6 to C20 aryl group, "arylalkyl group" means a C6 to C20 arylalkyl group, "alkylene group" means a C1 to C20 alkylene group, "arylene group" means a C6 to C20 arylene group, "alkylarylene group" means a C6 to C20 alkylarylene group, and "heteroarylene group" means a C3 to C20 hetero It means an arylene group, and "alkoxyylene group" means a C1 to C20 alkoxyylene group.

Unless otherwise specified herein, "substitution" means that at least one hydrogen atom is a halogen atom (F, Cl, Br, I), a hydroxy group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amine group, an imino group, Azido group, amidino group, hydrazino group, hydrazono group, carbonyl group, carbamyl group, thiol group, ester group, ether group, carboxyl group or its salt, sulfonic acid group or its salt, phosphoric acid or its salt, C1 to C20 alkyl group, C2 to C20 alkenyl group, C2 to C20 alkynyl group, C6 to C20 aryl group, C3 to C20 cycloalkyl group, C3 to C20 cycloalkenyl group, C3 to C20 cycloalkynyl group, C2 to C20 heterocycloalkyl group, C2 to C20 heterocycloalkenyl group, C2 to C20 heterocycloalkynyl group, C3 to C20 heteroaryl group, or a substituent of a combination thereof.

In addition, unless otherwise specified herein, "hetero" means that at least one heteroatom of N, O, S, and P is included in the chemical formula.

In addition, unless otherwise specified herein, "(meth)acrylate" means that both "acrylate" and "methacrylate" are possible, and "(meth)acrylic acid" means "acrylic acid" and "methacrylic acid". "That means both are possible.

In this specification, unless otherwise specified, "combination" means mixing or copolymerization.

Unless otherwise defined in the chemical formula within this specification, if a chemical bond is not drawn at a position where a chemical bond is to be drawn, it means that a hydrogen atom is bonded to the position.

In addition, unless otherwise specified in this specification, "*" means a portion connected to the same or different atoms or chemical formulas.

The biggest advantage of quantum dot display products currently under active development is the achievement of a high color gamut (high color reproducibility) of close to 100%, as well as a wide viewing angle. To do so, the coated quantum dot single film (cured film cured with the quantum dot curable composition) must have a light emission wavelength region within a range capable of achieving a high color gamut at a certain thickness, that is, a light emission wavelength (short wavelength) region of 540 nm or less. However, in terms of the direction of general quantum dot synthesis, the emission wavelength of the quantum dot single film tends to have a long wavelength, and the shorter the emission wavelength of the quantum dot single film, the higher the blue light conversion rate and the higher the heat resistance stability. The longer the wavelength, the lower the light conversion rate and the weaker the heat resistance. In the following, it is true that the quantum dot single film up to now has an emission wavelength in the long wavelength region and has not been able to achieve high color reproducibility.

In one embodiment, even if the quantum dot has a long wavelength emission characteristic, the surface is modified through the change of the synthesized quantum dot ligand structure (quantum dot surface modification) to change the emission wavelength of the quantum dot to a short wavelength, so that the cured film emits light in the short wavelength region Provided is a solvent-free curable composition that can realize high color reproducibility by having a wavelength and at the same time maintain excellent physical properties such as heat resistance and light resistance.

Specifically, the solvent-free curable composition according to one embodiment is surface-modified with a compound represented by Formula 1 below.

[Formula 1]

In Formula 1,

L ¹ , L ³ and L ⁵ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted Or an unsubstituted C2 to C20 heteroarylene group,

L ² and L ⁴ are each independently a single bond, *-O-*, *-S-*, *-C(=O)O-* or *-OC(=O)-*;

R ¹ is a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group;

n is an integer from 6 to 15;

m is an integer from 1 to 10;

The compound represented by Chemical Formula 1 is mixed with a polar part and a non-polar part in an appropriate ratio, so that the dispersibility and degree of aggregation of quantum dots in the entire composition can be improved (see FIG. 1). The lower the dispersibility and the greater the degree of aggregation, the greater the emission characteristics at long wavelengths. there is.

In addition, the surface-modified quantum dots with the compound represented by Formula 1 have high affinity with a ligand having a polar group, that is, a polymerizable monomer having a carbon-carbon double bond at the terminal, so it is very easy to prepare a high-concentration or highly-concentrated quantum dot dispersion. (Improve dispersibility of quantum dots to monomers), so it can have a very positive effect on implementing solvent-free curable compositions and improving light efficiency.

On the other hand, conventionally, there has been an effort to move the emission wavelength of the quantum dot-containing cured film toward a shorter wavelength by making the size of the core constituting the quantum dots smaller during the synthesis of quantum dots. However, in this case, although the light emission wavelength of the quantum dot-containing cured film can be shifted toward a shorter wavelength, there is a problem in that physical properties such as light resistance and heat resistance are greatly deteriorated, so that the conventional physical properties (light resistance, heat resistance, etc.) Research on a sustainable method has continued, and one embodiment provides a solvent-free curable composition that can prevent degradation of conventional physical properties (light resistance, heat resistance) as well as implement high color reproducibility as a result of the above research.

More specifically, the solvent-free curable composition according to one embodiment includes a quantum dot surface-modified with the compound represented by Formula 1 and a polymerizable monomer having a carbon-carbon double bond at the terminal.

The compound represented by Formula 1 has an alkyl chain with strong hydrophobicity introduced into the structure adjacent to the thiol group and an alkylene glycol chain with strong hydrophilicity introduced at the opposite end, so the compound represented by Formula 1 is amphiphilic as a whole. (amphiphilic), and quantum dots used in single films showing emission wavelengths in long wavelengths can also be surface-modified to lower the emission wavelength and improve heat resistance.

In Chemical Formula 1, when n is an integer of 5 or less, it is difficult to lower the emission wavelength of a quantum dot-containing cured film, and it is not easy to implement high color reproducibility. In addition, it may be disadvantageous in terms of heat resistance and the like.

For example, Chemical Formula 1 may be represented by any one of Chemical Formulas 1-1 to 1-3 below.

[Formula 1-1]

[Formula 1-2]

[Formula 1-3]

In Formula 1-1 to Formula 1-3,

L ¹ , L ³ and L ⁵ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted Or an unsubstituted C2 to C20 heteroarylene group,

R ¹ and R ² are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group,

n is an integer from 6 to 15;

m is an integer from 1 to 10;

p is 0 to 4;

For example, in Chemical Formula 1, n may be an integer of 6 to 11.

For example, in Formula 1, R ¹ may be represented by any one of Formulas R-1 to Formula R-4, but is not necessarily limited thereto.

[Formula R-1]

[Formula R-2]

[Formula R-3]

[Formula R-4]

For example, Chemical Formula 1 may be represented by any one of Chemical Formulas 2 to 5 below.

[Formula 2]

[Formula 3]

[Formula 4]

[Formula 5]

Until now, quantum dot-containing curable compositions (inks) have been developed to specialize monomers that have good compatibility with quantum dots, and are even being commercialized.

On the other hand, -ene-based monomers (including vinyl-based monomers, acrylate-based monomers, methacrylate-based monomers, etc., including monofunctional to multifunctional), which are common and universally used polymerizable monomers, are quantum dots and It is true that various developments for useful application to quantum dot-containing curable compositions are difficult due to low compatibility and limitations in dispersibility of quantum dots. Above all, since the -ene-based monomer does not exhibit high concentration quantum dot dispersibility, it is difficult to apply it to a quantum dot-containing curable composition.

Due to these disadvantages, quantum dot-containing curable compositions have been developed with compositions containing a significant amount (50% by weight or more) of a solvent, but when the solvent content is high, ink jetting processability deteriorates. Therefore, the demand for a solvent-free curable composition is increasing more and more in order to satisfy ink jetting processability.

The present application provides a solvent-free curable composition, which is increasingly in demand, by using a polymerizable monomer containing a compound having a carbon-carbon double bond at the terminal together with quantum dots surface-modified with the compound represented by Formula 1, By improving the affinity of the quantum dots to the curable composition, it is possible to provide high concentration dispersibility of the quantum dots even in a solvent-free system, and to achieve a passivation effect that does not impair the original optical properties of the quantum dots. .

Hereinafter, each component constituting the solvent-free curable composition will be specifically described.

quantum dot

Quantum dots included in the solvent-free curable composition are quantum dots surface-modified with the compound represented by Formula 1 above.

For example, the quantum dots absorb light in a wavelength range of 360 nm to 780 nm, for example, 400 nm to 780 nm, and emit fluorescence in a wavelength range of 500 nm to 700 nm, for example, 500 nm to 580 nm, or emit fluorescence in a wavelength range of 600 nm to 680 nm. can That is, the quantum dots may have a maximum fluorescence emission wavelength (fluorescence λ _em ) at 500 nm to 680 nm.

Each of the quantum dots may independently have a full width at half maximum (FWHM) of 20 nm to 100 nm, for example, 20 nm to 50 nm. When the quantum dots have a full width at half maximum in the above range, the color reproduction rate is increased when used as a color material in a color filter according to high color purity.

Each of the quantum dots may independently be an organic material, an inorganic material, or a hybrid (composite) of an organic material and an inorganic material.

The quantum dots may each independently consist of a core and a shell surrounding the core, and the core and shell may each independently consist of a core, a core/shell, a core/first shell/ It may have a structure of a second shell, alloy, alloy/shell, etc., but is not limited thereto.

For example, the core may include at least one material selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs, and alloys thereof. , but is not necessarily limited thereto. The shell surrounding the core may include at least one material selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, HgSe, and alloys thereof, but is not necessarily limited thereto.

In one embodiment, since interest in the environment has greatly increased worldwide in recent years and regulations on toxic substances have been strengthened, instead of light emitting materials having a cadmium-based core, the quantum yield is rather low, but environmentally friendly Non-cadmium-based light emitting materials (InP/ZnS, InP/ZnSe/ZnS, etc.) were used, but are not necessarily limited thereto.

In the case of the quantum dots having the core/shell structure, the size (average particle diameter) of each quantum dot including the shell may be 1 nm to 15 nm, for example, 5 nm to 15 nm.

For example, each of the quantum dots may independently include a red quantum dot, a green quantum dot, or a combination thereof. The red quantum dots may each independently have an average particle diameter of 10 nm to 15 nm. The green quantum dots may each independently have an average particle diameter of 5 nm to 8 nm.

Meanwhile, for dispersion stability of the quantum dots, the solvent-free curable composition according to an embodiment may further include a dispersant. The dispersant helps to uniformly disperse the light conversion material such as quantum dots in the solvent-free curable composition, and all of nonionic, anionic, or cationic dispersants may be used. Specifically, polyalkylene glycol or esters thereof, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonic acid salt, carboxylic acid ester, carboxylic acid salt, alkyl amide alkylene oxide Adducts, alkyl amines, and the like may be used, and these may be used alone or in combination of two or more. The dispersant may be used in an amount of 0.1 wt % to 100 wt %, for example, 10 wt % to 20 wt %, based on the solid content of light conversion materials such as quantum dots.

Quantum dots surface-modified by Chemical Formula 1 may be included in an amount of 1 wt% to 60 wt%, for example, 3 wt% to 50 wt%, based on the total amount of the solvent-free curable composition. When the surface-modified quantum dots are included within the above range, the light conversion rate is excellent and the pattern characteristics and development characteristics are not impaired, so that excellent fairness may be obtained.

A polymerizable monomer having a carbon-carbon double bond at the terminal

The monomer having a carbon-carbon double bond at the terminal may be included in an amount of 40 wt % to 99 wt %, for example, 50 wt % to 97 wt %, based on the total amount of the solvent-free curable composition. When the content of the monomer having a carbon-carbon double bond at the terminal is within the above range, it is possible to prepare a solventless curable composition having a viscosity capable of ink jetting, and also have excellent dispersibility of quantum dots in the prepared solventless curable composition Therefore, the optical properties can also be improved.

For example, the monomer having a carbon-carbon double bond at the terminal may have a molecular weight of 220 g/mol to 1,000 g/mol. When the molecular weight of the monomer having a carbon-carbon double bond at the terminal is within the above range, the optical properties of the quantum dot are not impaired and the viscosity of the composition is not increased, which is advantageous for ink-jetting.

For example, the monomer having a carbon-carbon double bond at the terminal may be represented by Formula 6 below, but is not necessarily limited thereto.

[Formula 6]

In Formula 6,

R ³ and R ⁴ are each independently a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group;

L ⁶ and L ⁸ are each independently a substituted or unsubstituted C1 to C10 alkylene group;

L ⁷ is a substituted or unsubstituted C1 to C10 alkylene group or an ether group (*-O-*).

For example, the monomer having a carbon-carbon double bond at the terminal may be represented by Chemical Formula 6-1 or 6-2, but is not necessarily limited thereto.

[Formula 6-1]

[Formula 6-2]

For example, the monomer having a carbon-carbon double bond at the terminal may be ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol diacrylate, in addition to the compound represented by Formula 6-1 or Formula 6-2. rate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, di Pentaerythritol pentaacrylate, pentaerythritol hexaacrylate, bisphenol A diacrylate, trimethylolpropane triacrylate, novolak epoxy acrylate, ethylene glycol dimethacrylate, triethylene glycol dimethacrylate, propylene glycol Dimethacrylate, 1,4-butanediol dimethacrylate, 1,6-hexanediol dimethacrylate, or a combination thereof may be further included.

In addition, in addition to the monomer having a carbon-carbon double bond at the terminal, a monomer commonly used in conventional thermosetting or photocurable compositions may be further included, for example, the monomer is bis[1-ethyl(3-oxetanyl) )] may further include an oxetane-based compound such as methyl ether.

polymerization initiator

The solvent-free curable composition according to one embodiment may further include a polymerization initiator, for example, a photopolymerization initiator, a thermal polymerization initiator, or a combination thereof.

The photopolymerization initiator is an initiator generally used in a photosensitive resin composition, for example, an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound, an oxime-based compound, an amino ketone-based compound etc. can be used, but is not necessarily limited thereto.

Examples of the acetophenone-based compound include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, p-t-butyltrichloro acetophenone, p-t-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropane- 1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc. are mentioned.

Examples of the benzophenone-based compound include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4 '-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.

Examples of the thioxanthone-based compound include thioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2- Chlorothioxanthone etc. are mentioned.

Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyldimethylketal.

Examples of the triazine-based compound include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4' -Dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine , 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine , 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho-1-yl)- 4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4 -Bis(trichloromethyl)-6-piperonyl-s-triazine, 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine, etc. are mentioned. .

Examples of the oxime-based compound include O-acyloxime-based compounds, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(O-acetyloxime) -1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, etc. can be used. Specific examples of the O-acyloxime compound include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butane- 1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione -2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octan-1-one oxime-O-acetate and 1-(4-phenylsulfanylphenyl)-butan-1-one oxime- O-acetate 　 etc. are mentioned.

An example of the amino ketone compound is 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1 (2-Benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone -1), etc.

As the photopolymerization initiator, a carbazole-based compound, a diketone compound, a sulfonium borate-based compound, a diazo-based compound, an imidazole-based compound, or a biimidazole-based compound may be used in addition to the above compounds.

The photopolymerization initiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light, becoming excited, and then transferring the energy thereto.

Examples of the photosensitizer include tetraethylene glycol bis-3-mercapto propionate, pentaerythritol tetrakis-3-mercapto propionate, dipentaerythritol tetrakis-3-mercapto propionate, and the like. can be heard

Examples of the thermal polymerization initiator include peroxides, specifically benzoyl peroxide, dibenzoyl peroxide, lauryl peroxide, dilauryl peroxide, di-tert-butyl peroxide, cyclohexane peroxide, and methyl ethyl ketone peroxide. oxides, hydroperoxides (eg tert-butyl hydroperoxide, cumene hydroperoxide), dicyclohexyl peroxydicarbonate, 2,2-azo-bis(isobutyronitrile), t-butyl perbenzo ate, etc., and 2,2'-azobis-2-methylpropionitrile, etc. may be mentioned, but it is not necessarily limited thereto, and any one widely known in the art may be used.

The polymerization initiator may be included in an amount of 0.1 wt % to 5 wt %, for example, 1 wt % to 4 wt %, based on the total amount of the solvent-free curable composition. When the polymerization initiator is included within the above range, curing sufficiently occurs during exposure or thermal curing to obtain excellent reliability, and it is possible to prevent a decrease in transmittance due to an unreacted initiator, thereby preventing a decrease in optical properties of the quantum dots.

Light diffuser (or light diffuser dispersion)

The solvent-free curable composition according to one embodiment may further include a light diffusing agent.

For example, the light diffusing agent may include barium sulfate (BaSO ₄ ), calcium carbonate (CaCO ₃ ), titanium dioxide (TiO ₂ ), zirconia (ZrO ₂ ), or a combination thereof.

The light diffusing agent reflects light that is not absorbed by the above-described quantum dots, and allows the quantum dots to absorb the reflected light again. That is, the light diffusing agent may increase the light conversion efficiency of the curable composition by increasing the amount of light absorbed by the quantum dots.

The light diffusing agent may have an average particle diameter (D ₅₀ ) of 150 nm to 250 nm, specifically 180 nm to 230 nm. When the average particle diameter of the light diffusing agent is within the above range, a superior light diffusing effect may be obtained and light conversion efficiency may be increased.

The light diffuser may be included in an amount of 1 wt % to 20 wt %, for example, 5 wt % to 10 wt %, based on the total amount of the solvent-free curable composition. When the light diffusing agent is included in an amount of less than 1% by weight based on the total amount of the solvent-free curable composition, it is difficult to expect an effect of improving light conversion efficiency by using the light diffusing agent, and when the light diffusing agent is included in an amount exceeding 20% by weight, quantum dot precipitation occurs. A problem may arise.

Other Additives

To improve the stability and dispersibility of the quantum dots, the solvent-free curable composition according to an embodiment may further include a polymerization inhibitor.

The polymerization inhibitor may include a hydroquinone-based compound, a catechol-based compound, or a combination thereof, but is not necessarily limited thereto. As the solvent-free curable composition according to an embodiment further includes the hydroquinone-based compound, the catechol-based compound, or a combination thereof, crosslinking at room temperature can be prevented during exposure after printing (coating) the solvent-free curable composition. .

For example, the hydroquinone-based compound, the catechol-based compound, or a combination thereof is hydroquinone, methyl hydroquinone, methoxyhydroquinone, t-butyl hydroquinone, 2,5-di- t -butyl hydroquinone, 2,5- Bis(1,1-dimethylbutyl) hydroquinone, 2,5-bis(1,1,3,3-tetramethylbutyl) hydroquinone, catechol, t-butyl catechol, 4-methoxyphenol, pyroga Lol, 2,6-di- t -butyl-4-methylphenol, 2-naphthol, tris(N-hydroxy-N-nitrosophenylaminato-O,O') aluminum (Tris(N-hydroxy-N -nitrosophenylaminato-O, O')aluminium) or a combination thereof, but is not necessarily limited thereto.

The hydroquinone-based compound, the catechol-based compound, or a combination thereof may be used in the form of a dispersion, and the polymerization inhibitor in the form of the dispersion is present in an amount of 0.001% to 3% by weight, for example, 0.1% to 3% by weight based on the total amount of the solvent-free curable composition. 2% by weight. When the polymerization inhibitor is included within the above range, it is possible to solve the problem of aging at room temperature and to prevent sensitivity deterioration and surface peeling.

In addition, in order to improve heat resistance and reliability, the solvent-free curable composition according to one embodiment includes malonic acid; 3-amino-1,2-propanediol; silane-based coupling agents; leveling agent; fluorine-based surfactants; or a combination thereof.

For example, the solvent-free curable composition according to one embodiment may further include a silane-based coupling agent having a reactive substituent such as a vinyl group, a carboxyl group, a methacryloxy group, an isocyanate group, an epoxy group, etc. to improve adhesion to a substrate. there is.

Examples of the silane-based coupling agent include trimethoxysilyl benzoic acid, γ methacryloxypropyl trimethoxysilane, vinyl triacetoxysilane, vinyl trimethoxysilane, γ isocyanate propyl triethoxysilane, γ glycidoxy propyl trimethoxysilane, β-epoxycyclohexyl)ethyltrimethoxysilane, and the like, and these may be used alone or in combination of two or more.

The silane-based coupling agent may be included in an amount of 0.01 part by weight to 10 parts by weight based on 100 parts by weight of the solvent-free curable composition. When the silane-based coupling agent is included within the above range, adhesion, storability, and the like are excellent.

In addition, the solvent-free curable composition may further contain a surfactant, such as a fluorine-based surfactant, to improve coating properties and prevent defect formation, that is, to improve leveling performance, if necessary.

The fluorine-based surfactant may have a low weight average molecular weight of 4,000 g/mol to 10,000 g/mol, specifically, a weight average molecular weight of 6,000 g/mol to 10,000 g/mol. In addition, the fluorine-based surfactant may have a surface tension of 18 mN/m to 23 mN/m (measured in a 0.1% propylene glycol monomethyl ether acetate (PGMEA) solution). When the weight average molecular weight and surface tension of the fluorine-based surfactant are within the above ranges, leveling performance can be further improved, stains can be prevented during high speed coating, and film defects are reduced due to low bubble generation. , giving excellent properties to slit coating, a high-speed coating method.

As the fluorine-based surfactant, BM Chemie's BM-1000 ^® , BM-1100 ^® , etc.; Mecha Pack F 142D ^® , F 172 ^® , F 173 ^® , F 183 ^® and the like of Dainippon Inki Kagaku Kogyo Co., Ltd.; Sumitomo 3M Co., Ltd.'s Prorad FC-135 ^® , the same FC-170C ^® , the same FC-430 ^® , the same FC-431 ^® , etc.; Saffron S-112 ^® , S-113 ^® , S-131 ^® , S-141 ^® , S-145 ^® and the like of Asahi Grass Co., Ltd.; SH-28PA ^® , Copper-190 ^® , Copper-193 ^® , SZ-6032 ^® , SF-8428 ^® and the like from Toray Silicone Co., Ltd.; Fluorine-based surfactants commercially available under names such as F-482, F-484, F-478, and F-554 from DIC Co., Ltd. may be used.

In addition, the solvent-free curable composition according to one embodiment may use a silicon-based surfactant together with the above-described fluorine-based surfactant. Specific examples of the silicone-based surfactant include TSF400, TSF401, TSF410, and TSF4440 manufactured by Toshiba Silicone, but are not limited thereto.

The surfactant including the fluorine-based surfactant may be included in an amount of 0.01 part by weight to 5 parts by weight, for example, 0.1 part by weight to 2 parts by weight, based on 100 parts by weight of the solvent-free curable composition. When the surfactant is included within the above range, the occurrence of foreign substances in the sprayed composition is reduced.

In addition, a certain amount of other additives such as antioxidants may be further added to the solvent-free curable composition according to one embodiment within a range that does not impair physical properties.

Another embodiment provides a cured film prepared using the above-described solvent-free curable composition.

Since the cured film is prepared by curing the solvent-free curable composition according to an embodiment, it may have a light emission wavelength of 540 nm or less, thereby ultimately achieving high color reproducibility and maintaining excellent physical properties such as heat resistance and light resistance. there is.

One of the methods for producing the cured film includes forming a pattern by applying the above-described solvent-free curable composition on a substrate by an inkjet spraying method (S1); and curing the pattern (S2).

(S1) forming a pattern

The solvent-free curable composition is preferably applied on a substrate in a thickness of 0.5 to 20 μm by an inkjet dispersion method. In the inkjet jetting, a pattern can be formed by repeatedly jetting a single color per nozzle and repeatedly jetting according to the number of colors required. can also be formed.

(S2) curing step

A pixel may be obtained by curing the obtained pattern. At this time, as a method of curing, both a thermal curing process and a photocuring process may be applied. The thermal curing process is preferably cured by heating to a temperature of 100 ° C or higher, more preferably cured by heating to 100 ° C to 300 ° C, and more preferably cured by heating to 160 ° C to 250 ° C. can In the photocuring process, active rays such as UV rays of 190 nm to 450 nm, for example, 200 nm to 500 nm are irradiated. As a light source used for irradiation, a low pressure mercury lamp, a high pressure mercury lamp, an ultra high pressure mercury lamp, a metal halide lamp, an argon gas laser, etc. may be used, and in some cases, X-rays, electron beams, etc. may be used.

Another method of producing the cured film is to prepare a cured film using a lithography method using the above-described solvent-free curable composition, and the manufacturing method is as follows.

(1) coating and film formation step

Apply the curable composition described above to a desired thickness, for example, 2 μm to 10 μm, by using a spin or slit coating method, a roll coating method, a screen printing method, an applicator method, or the like, on a substrate subjected to a predetermined pretreatment. After that, the solvent is removed by heating at a temperature of 70° C. to 90° C. for 1 minute to 10 minutes to form a coating film.

(2) exposure step

After passing through a mask of a predetermined shape to form a pattern necessary for the obtained coating film, actinic rays such as UV rays of 190 nm to 450 nm, for example, 200 nm to 500 nm are irradiated. As a light source used for irradiation, a low pressure mercury lamp, a high pressure mercury lamp, an ultra high pressure mercury lamp, a metal halide lamp, an argon gas laser, etc. may be used, and in some cases, X-rays, electron beams, etc. may be used.

The exposure amount varies depending on the type, compounding amount, and dry film thickness of each component of the curable composition, but is, for example, 500 mJ/cm ² or less (by a 365 nm sensor) when a high-pressure mercury lamp is used.

(3) Development stage

Following the exposure step, an alkaline aqueous solution is used as a developing solution to dissolve and remove unnecessary portions, thereby leaving only the exposed portion to form an image pattern. That is, when developing with an alkaline developer, the unexposed portion is dissolved and an image color filter pattern is formed.

(4) post-processing step

The image pattern obtained by the above development can be cured by further heating or irradiation with actinic rays in order to obtain a pattern excellent in terms of heat resistance, light resistance, adhesion, crack resistance, chemical resistance, high strength, storage stability, and the like.

Another embodiment provides a color filter including the cured film and a display device including the color filter.

Hereinafter, preferred embodiments of the present invention will be described. However, the following examples are only preferred examples of the present invention, and the present invention is not limited by the following examples.

(ligand compound synthesis)

Synthesis Example 1

Put 30g of 6-mercapto-1-hexanol, 40g of [2-(2-methoxyethoxy)ethoxy]acetic acid, and 6.4g of p-toluenesulfonic acid in a reaction flask, and disperse in 300mL of cyclohexane. Install a dean stark condensor in the reaction flask and reflux and stir. When the theoretical H ₂ O yield is confirmed, the reaction is terminated after 1 hour and the temperature is lowered to room temperature. After adding excess water to quench the reaction, ethyle acetate (EA) solvent is added to purify in the order of extraction, neutralization, and concentration. The concentrated product is vacuum dried to obtain a compound represented by Formula 2 below.

[Formula 2]

Synthesis Example 2

A compound represented by Formula 3 was obtained in the same manner as in Synthesis Example 1, except that 11-mercapto-1-undecanol was used instead of 6-mercapto-1-hexanol.

[Formula 3]

Synthesis Example 3

Prepare a carboxylic acid compound by mixing 30 g of p-toluenesulfonic (p-Ts), poly(ethylene glycol) _n methyl ether (n=9 ; PEG9ME, Hannong Chemical) and 7.5 g of 3-mercaptopropionic acid and stirring for 5 hours. Add 9.4 g of 6-mercapto-1-hexanol and 2 g of p-toluenesulfonic acid and disperse in 300 mL of cyclohexane. After this, synthesis is performed in the same manner as in Synthesis Example 1 to obtain a compound represented by Formula 4 below.

[Formula 4]

Synthesis Example 4

20 g of phthalic anhydride and 115.7 g of (Ethylene oxide) _n methyl ether (n=9; EO9-ME, Hannong Chemical) were mixed under a nitrogen atmosphere and stirred for 5 hours to obtain a compound represented by Formula 5 below.

[Formula 5]

Comparative Synthesis Example 1

100 g of PH-4 (Han Nong Chemical) and 22 g of NaOH are sufficiently dispersed in 500 mL of THF and 100 mL of H ₂ O under a nitrogen atmosphere. The temperature of the dispersion was lowered to 0 ° C, and a THF solution in which p-toluenesulfonic acid (15 g) was dissolved was added dropwise. After the addition, it is stirred at room temperature for 15 hours. Add an excess of water to terminate the reaction, add ethyl acetate (EA), go through extraction, neutralization, and concentration, then purify and dry in vacuum. After dissolving 50 g of this obtained product in 300 mL of ethyl acohol, 12.5 g of thiourea was added, followed by reflux stirring for 15 hours. Add NaOH solution to this and further stir for 5 hours. After completion of the reaction, it is purified through extraction, neutralization, and concentration. After drying in a vacuum oven for 24 hours, a compound represented by Formula C-1 is obtained.

[Formula C-1]

Comparative Synthesis Example 2

Put 5.82 g of 2-mercapto-1-ethanol, 13.3 g of 2-2-(2-methoxyethoxy)ethoxy acetic acid, and 2.1 g of p-toluenesulfonic acid monohydrate in a two-necked round bottom flask, respectively, and dissolve in 300 mL of cyclohexane. Connect the dean stark to the inlet and connect the condensor to it. The reaction was terminated after reflux for 8 hours. (Check the final yield of water collected in dean stark). The reactants are transferred to a separating funnel, the solvent is removed through extraction and neutralization steps, and then dried in a vacuum oven to obtain a compound represented by Formula C-2 below.

[Formula C-2]

Comparative Synthesis Example 3

A compound represented by Formula C-3 was obtained in the same manner as in Synthesis Example 1, except that 5-mercapto-1-pentanol was used instead of 6-mercapto-1-hexanol.

[Formula C-3]

Comparative Synthesis Example 4

A compound represented by Formula C-4 was obtained in the same manner as in Synthesis Example 1 except that 16-mercapto-1-hexanol was used instead of 6-mercapto-1-hexanol.

[Formula C-4]

(Manufacture of quantum dot dispersion surface-modified with ligand)

Preparation Example 1

A magnetic bar is put into a three-necked round bottom flask, and a quantum dot-CHA (cyclohexyl acetate) solution (solid content: 26wt%) is metered. Here, the compound represented by Formula 2 is introduced.

After mixing well for about 1 minute, the mixture was stirred at 80°C in a nitrogen atmosphere. After completion of the reaction, cool to room temperature, and then add the quantum dot reaction solution to cyclohexane to catch the precipitate. The precipitated quantum dot powder and the solvent are separated through centrifugation. The solvent is decanted and discarded, and the precipitate is sufficiently dried in a vacuum oven for one day to obtain surface-modified quantum dots.

40 g of the surface-modified quantum dots were stirred with 52.999 g of a monomer (1,6-hexanediol diacrylate; Miwon Corporation) represented by Formula 6-2 for 12 hours to obtain a surface-modified quantum dot dispersion.

[Formula 6-2]

Preparation Example 2

It was the same as in Preparation Example 1 except that the compound represented by Formula 3 was used instead of the compound represented by Formula 2.

Preparation Example 3

It was the same as in Preparation Example 1, except that the compound represented by Formula 4 was used instead of the compound represented by Formula 2.

Production Example 4

It was the same as in Preparation Example 1 except that the compound represented by Formula 5 was used instead of the compound represented by Formula 2.

Comparative Preparation Example 1

It was the same as in Preparation Example 1 except for using the compound represented by Formula C-1 instead of the compound represented by Formula 2.

Comparative Preparation Example 2

It was the same as in Preparation Example 1, except that the compound represented by Formula C-2 was used instead of the compound represented by Formula 2.

Comparative Preparation Example 3

It was the same as in Preparation Example 1 except for using the compound represented by Formula C-3 instead of the compound represented by Formula 2.

Comparative Preparation Example 4

It was the same as in Preparation Example 1, except that the compound represented by Formula C-4 was used instead of the compound represented by Formula 2.

(Preparation of solvent-free curable composition)

Example 1

0.001 g of a polymerization inhibitor (methylhydroquinone, manufactured by TOKYO CHEMICAL Co.) was added to 92.999 g of the dispersion obtained in Preparation Example 1 and stirred for 5 minutes. Subsequently, after adding 3 g of a photoinitiator (TPO-L, Polynetron Co.), 4 g of a light diffusing agent (TiO ₂ ; SDT89, Iridos Co.) was added. The entire dispersion is stirred for 1 hour to prepare a solvent-free curable composition.

Example 2

It was the same as in Example 1 except that the dispersion obtained in Preparation Example 2 was used instead of the dispersion obtained in Preparation Example 1.

Example 3

It was the same as Example 1 except that the dispersion obtained in Preparation Example 3 was used instead of the dispersion obtained in Preparation Example 1.

Example 4

It was the same as in Example 1 except that the dispersion obtained in Preparation Example 4 was used instead of the dispersion obtained in Preparation Example 1.

Comparative Example 1

It was the same as Example 1 except that the dispersion obtained in Comparative Preparation Example 1 was used instead of the dispersion obtained in Preparation Example 1.

Comparative Example 2

It was the same as in Example 1 except that the dispersion obtained in Comparative Preparation Example 2 was used instead of the dispersion obtained in Preparation Example 1.

Comparative Example 3

It was the same as in Example 1 except that the dispersion obtained in Comparative Preparation Example 3 was used instead of the dispersion obtained in Preparation Example 1.

Comparative Example 4

It was the same as in Example 1 except that the dispersion obtained in Comparative Preparation Example 4 was used instead of the dispersion obtained in Preparation Example 1.

Rating 1

Viscosity measured after measuring the solvent-free curable compositions prepared in Examples 1 to 4 and Comparative Examples 1 to 4 using a viscometer (RheoStress 6000, HAAKE Co.) at room temperature (25° C.) at 100 rpm for 2 minutes Values are shown in Table 1 below.

(Unit: cPs) viscosity Example 1 28 Example 2 24.4 Example 3 34.8 Example 4 33.5 Comparative Example 1 24.9 Comparative Example 2 29.8 Comparative Example 3 35.4 Comparative Example 4 64.1

From Table 1, it can be seen that the solvent-free curable composition including the quantum dots surface-modified with the compound represented by Formula 1 has an advantageous viscosity for inkjetting. (In general, when the viscosity of the composition is 10 cPs to 35 cPs, it is advantageous for inkjetting.) Specifically, when n in Formula 1 has an integer value of 5 or less or an integer value of 16 or more, the viscosity of the composition becomes too high. It can be confirmed that fairness is lowered due to disadvantages such as ink-jetting.

rating 2

The solvent-free curable compositions prepared in Examples 1 to 4 and Comparative Examples 1 to 4 were respectively applied on yellow photoresist (YPR) using a spin coater (Mikasa, Opticoat MS-A150, 800 rpm, 5 seconds) It was applied to a thickness of 15 μm and exposed to 5000 mJ (83° C., 10 seconds) with a 395 nm UV exposure machine under a nitrogen atmosphere. Thereafter, a 2 cm x 2 cm single film specimen was loaded into an integrating sphere equipment (QE-2100, otsuka electronics), and the light conversion rate was measured. Thereafter, the loaded single-film specimen was dried for 2 hours at 180° C. in a nitrogen atmosphere drying furnace, and then the light retention from exposure to drying was measured. In addition, the maximum emission wavelength of each of the single films was measured at 300 nm to 800 nm, and the measurement results are shown in Table 2 below.

Mineral retention rate (%) Maximum emission wavelength (nm) Example 1 90 538.7 Example 2 95 539.9 Example 3 97 540.0 Example 4 92 539.7 Comparative Example 1 85 542.0 Comparative Example 2 88 543.1 Comparative Example 3 91 539.2 Comparative Example 4 94 538.5

From Table 2, the cured film prepared using the solvent-free curable composition according to one embodiment can realize high color reproducibility by having a maximum emission wavelength of 540 nm or less, and at the same time, the light retention is also very excellent, such as heat resistance and light resistance. It can be confirmed that no degradation of .

The present invention is not limited to the above embodiments, but can be manufactured in a variety of different forms, and those skilled in the art to which the present invention pertains may take other specific forms without changing the technical spirit or essential features of the present invention. It will be understood that it can be implemented with Therefore, the embodiments described above should be understood as illustrative in all respects and not limiting.

Claims (13)

Quantum dots surface-modified with a compound represented by Formula 1 below, and
A polymerizable monomer having a carbon-carbon double bond at the terminal
A solvent-free curable composition comprising:
[Formula 1]

In Formula 1,
L ¹ , L ³ and L ⁵ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted Or an unsubstituted C2 to C20 heteroarylene group,
L ² and L ⁴ are each independently a single bond, *-O-*, *-S-*, *-C(=O)O-* or *-OC(=O)-*;
R ¹ is a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group;
n is an integer from 6 to 15;
m is an integer from 1 to 10;
According to claim 1,
Chemical Formula 1 is a solvent-free curable composition represented by any one of the following Chemical Formulas 1-1 to 1-3:
[Formula 1-1]

[Formula 1-2]

[Formula 1-3]

In Formula 1-1 to Formula 1-3,
L ¹ , L ³ and L ⁵ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted Or an unsubstituted C2 to C20 heteroarylene group,
R ¹ and R ² are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group,
n is an integer from 6 to 15;
m is an integer from 1 to 10;
p is 0 to 4;
According to claim 1,
Formula 1 is a solvent-free curable composition represented by any one of Formulas 2 to 5 below.
[Formula 2]

[Formula 3]

[Formula 4]

[Formula 5]

According to claim 1,
The quantum dot is a solvent-free curable composition having a maximum fluorescence emission wavelength at 500 nm to 680 nm.
According to claim 1,
The polymerizable monomer is a solvent-free curable composition having a molecular weight of 220 g / mol to 1,000 g / mol.
According to claim 1,
The polymerizable monomer is a solvent-free curable composition represented by Formula 6:
[Formula 6]

In Formula 6,
R ³ and R ⁴ are each independently a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group;
L ⁶ and L ⁸ are each independently a substituted or unsubstituted C1 to C10 alkylene group;
L ⁷ is a substituted or unsubstituted C1 to C10 alkylene group or an ether group (*-O-*).
According to claim 1,
The solvent-free curable composition,
1% to 60% by weight of the quantum dots and
40% to 99% by weight of the polymerizable monomer
Solvent-free curable composition comprising a.
According to claim 1,
The solvent-free curable composition further comprises a polymerization initiator, a light diffusing agent, or a combination thereof.
According to claim 8,
The light diffuser is a solvent-free curable composition comprising barium sulfate, calcium carbonate, titanium dioxide, zirconia, or a combination thereof.
According to claim 1,
The solvent-free curable composition may include a polymerization inhibitor; malonic acid; 3-amino-1,2-propanediol; silane-based coupling agents; leveling agent; fluorine-based surfactants; Or a solvent-free curable composition further comprising a combination thereof.
A cured film prepared using the composition according to any one of claims 1 to 10.
According to claim 11,
The cured film is a cured film having an emission wavelength of 540 nm or less.
A color filter comprising the cured film of claim 11.

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