KR102455375B1 - 가변 데이터 리소그래피 시스템용 잉크 분할 멀티-롤 클리너 - Google Patents

가변 데이터 리소그래피 시스템용 잉크 분할 멀티-롤 클리너 Download PDF

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KR102455375B1
KR102455375B1 KR1020180154862A KR20180154862A KR102455375B1 KR 102455375 B1 KR102455375 B1 KR 102455375B1 KR 1020180154862 A KR1020180154862 A KR 1020180154862A KR 20180154862 A KR20180154862 A KR 20180154862A KR 102455375 B1 KR102455375 B1 KR 102455375B1
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South Korea
Prior art keywords
ink
cleaning
subsystem
variable data
imaging
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KR1020180154862A
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English (en)
Korean (ko)
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KR20190074216A (ko
Inventor
리우 츄-헹
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제록스 코포레이션
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F7/00—Rotary lithographic machines
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F35/00—Cleaning arrangements or devices
    • B41F35/002—Cleaning arrangements or devices for dampening rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F35/00—Cleaning arrangements or devices
    • B41F35/02—Cleaning arrangements or devices for forme cylinders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F7/00—Rotary lithographic machines
    • B41F7/20—Details
    • B41F7/24—Damping devices
    • B41F7/26—Damping devices using transfer rollers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • H01L21/02288—
    • H01L21/027—
    • H01L21/6715—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
    • H10P14/6346—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating using printing, e.g. ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41P—INDEXING SCHEME RELATING TO PRINTING, LINING MACHINES, TYPEWRITERS, AND TO STAMPS
    • B41P2235/00—Cleaning
    • B41P2235/10—Cleaning characterised by the methods or devices
    • B41P2235/20—Wiping devices
    • B41P2235/22—Rollers

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Environmental & Geological Engineering (AREA)
  • Printing Methods (AREA)
  • Inking, Control Or Cleaning Of Printing Machines (AREA)
  • Rotary Presses (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
KR1020180154862A 2017-12-19 2018-12-05 가변 데이터 리소그래피 시스템용 잉크 분할 멀티-롤 클리너 Active KR102455375B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/847,010 2017-12-19
US15/847,010 US10603897B2 (en) 2017-12-19 2017-12-19 Ink splitting multi-roll cleaner for a variable data lithography system

Publications (2)

Publication Number Publication Date
KR20190074216A KR20190074216A (ko) 2019-06-27
KR102455375B1 true KR102455375B1 (ko) 2022-10-14

Family

ID=66674979

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020180154862A Active KR102455375B1 (ko) 2017-12-19 2018-12-05 가변 데이터 리소그래피 시스템용 잉크 분할 멀티-롤 클리너

Country Status (5)

Country Link
US (1) US10603897B2 (https=)
JP (1) JP7130530B2 (https=)
KR (1) KR102455375B1 (https=)
CN (1) CN109927411B (https=)
DE (1) DE102018132531A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018211601A1 (de) * 2018-07-12 2020-01-16 Heidelberger Druckmaschinen Ag Verfahren zum Reinigen der Oberfläche wenigstens einer rotierbaren Komponente einer Druckmaschine von einem Druckfluid
CN111185414A (zh) * 2019-12-30 2020-05-22 重庆市和鑫达电子有限公司 集成电路铜板除尘装置
CN115431651B (zh) * 2022-09-21 2023-11-28 卡游(上海)文化创意有限公司 一种可回收的绿色节约型印刷工艺

Citations (2)

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US20120103221A1 (en) 2010-10-29 2012-05-03 Palo Alto Research Center Incorporated Cleaning Method for a Variable Data Lithography System
JP2013035280A (ja) 2011-08-05 2013-02-21 Xerox Corp サーマルプリントヘッドサブシステムを用いる、可変データリソグラフ印刷装置

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US4718340A (en) * 1982-08-09 1988-01-12 Milliken Research Corporation Printing method
US4729310A (en) * 1982-08-09 1988-03-08 Milliken Research Corporation Printing method
US6318259B1 (en) 1997-09-03 2001-11-20 Graphic Systems, Inc. Apparatus and method for lithographic printing utilizing a precision emulsion ink feeding mechanism
US6024017A (en) * 1997-09-26 2000-02-15 Dainippon Screen Mfg. Co., Ltd. Printing apparatus
US6336404B1 (en) * 1999-02-01 2002-01-08 Dainippon Screen Mfg. Co., Ltd. Printing apparatus, and a processing device in the printing apparatus
US6895861B2 (en) * 2003-07-11 2005-05-24 James F. Price Keyless inking systems and methods using subtractive and clean-up rollers
US6553205B1 (en) * 2001-12-14 2003-04-22 Xerox Corporation System for toner cleaning
JP2006047793A (ja) * 2004-08-06 2006-02-16 Toshiba Corp 湿式画像形成装置及び液体現像剤クリーナ
US8967044B2 (en) 2006-02-21 2015-03-03 R.R. Donnelley & Sons, Inc. Apparatus for applying gating agents to a substrate and image generation kit
EP2123457B1 (en) * 2007-03-13 2013-07-10 Toyo Seikan Kaisha, Ltd. Device for trapping ink
WO2012030330A1 (en) * 2010-08-31 2012-03-08 Hewlett-Packard Development Company, L.P. Vortex flow resisters
US20120103217A1 (en) 2010-10-29 2012-05-03 Palo Alto Research Center Incorporated Cleaning Subsystem for a Variable Data Lithography System
US20120103212A1 (en) 2010-10-29 2012-05-03 Palo Alto Research Center Incorporated Variable Data Lithography System
US20120103214A1 (en) 2010-10-29 2012-05-03 Palo Alto Research Center Incorporated Heated Inking Roller for a Variable Data Lithography System
EP2701913B1 (en) * 2011-04-29 2019-10-30 Hewlett-Packard Development Company, L.P. Apparatus, printers, and methods to remove material from a printer surface
US8573121B2 (en) * 2011-06-09 2013-11-05 Xerox Corporation Methods, apparatus, and systems for erasing ink history from ink transfer roll in digital offset systems
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US8950322B2 (en) * 2012-03-21 2015-02-10 Xerox Corporation Evaporative systems and methods for dampening fluid control in a digital lithographic system
US20130327237A1 (en) 2012-06-12 2013-12-12 Xerox Corportation Systems and methods for implementing digital offset lithographic printing techniques
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US9529307B2 (en) * 2012-07-12 2016-12-27 Palo Alto Research Center Incorporated Imaging system for patterning of an image definition material by electro-wetting and methods therefor
US20140060360A1 (en) * 2012-08-31 2014-03-06 Palo Alto Research Center Inc. Textured imaging member
US9724733B2 (en) * 2012-12-21 2017-08-08 Floral Packaging Ip Holdings, Llc Method and system for removing ink from films
US10022951B2 (en) 2014-04-28 2018-07-17 Xerox Corporation Systems and methods for implementing a vapor condensation technique for delivering a uniform layer of dampening solution in an image forming device using a variable data digital lithographic printing process
US9507266B2 (en) * 2014-06-29 2016-11-29 Xerox Corporation Systems and methods for implementing advanced single pass cleaning of a reimageable surface in a variable data digital lithographic printing device
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Publication number Priority date Publication date Assignee Title
US20120103221A1 (en) 2010-10-29 2012-05-03 Palo Alto Research Center Incorporated Cleaning Method for a Variable Data Lithography System
JP2013035280A (ja) 2011-08-05 2013-02-21 Xerox Corp サーマルプリントヘッドサブシステムを用いる、可変データリソグラフ印刷装置

Also Published As

Publication number Publication date
US20190184698A1 (en) 2019-06-20
KR20190074216A (ko) 2019-06-27
JP7130530B2 (ja) 2022-09-05
CN109927411B (zh) 2021-09-07
CN109927411A (zh) 2019-06-25
US10603897B2 (en) 2020-03-31
DE102018132531A1 (de) 2019-06-19
JP2019107886A (ja) 2019-07-04

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