DE102018132531A1 - Tintenspaltender mehrrollenreiniger für ein lithographiesystem mit variablen daten - Google Patents
Tintenspaltender mehrrollenreiniger für ein lithographiesystem mit variablen daten Download PDFInfo
- Publication number
- DE102018132531A1 DE102018132531A1 DE102018132531.2A DE102018132531A DE102018132531A1 DE 102018132531 A1 DE102018132531 A1 DE 102018132531A1 DE 102018132531 A DE102018132531 A DE 102018132531A DE 102018132531 A1 DE102018132531 A1 DE 102018132531A1
- Authority
- DE
- Germany
- Prior art keywords
- cleaning
- ink
- imaging
- subsystem
- variable data
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F7/00—Rotary lithographic machines
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F35/00—Cleaning arrangements or devices
- B41F35/002—Cleaning arrangements or devices for dampening rollers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F35/00—Cleaning arrangements or devices
- B41F35/02—Cleaning arrangements or devices for forme cylinders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F7/00—Rotary lithographic machines
- B41F7/20—Details
- B41F7/24—Damping devices
- B41F7/26—Damping devices using transfer rollers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6326—Deposition processes
- H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
- H10P14/6346—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating using printing, e.g. ink-jet printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41P—INDEXING SCHEME RELATING TO PRINTING, LINING MACHINES, TYPEWRITERS, AND TO STAMPS
- B41P2235/00—Cleaning
- B41P2235/10—Cleaning characterised by the methods or devices
- B41P2235/20—Wiping devices
- B41P2235/22—Rollers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Plasma & Fusion (AREA)
- Environmental & Geological Engineering (AREA)
- Printing Methods (AREA)
- Inking, Control Or Cleaning Of Printing Machines (AREA)
- Rotary Presses (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/847,010 | 2017-12-19 | ||
| US15/847,010 US10603897B2 (en) | 2017-12-19 | 2017-12-19 | Ink splitting multi-roll cleaner for a variable data lithography system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102018132531A1 true DE102018132531A1 (de) | 2019-06-19 |
Family
ID=66674979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102018132531.2A Ceased DE102018132531A1 (de) | 2017-12-19 | 2018-12-17 | Tintenspaltender mehrrollenreiniger für ein lithographiesystem mit variablen daten |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10603897B2 (https=) |
| JP (1) | JP7130530B2 (https=) |
| KR (1) | KR102455375B1 (https=) |
| CN (1) | CN109927411B (https=) |
| DE (1) | DE102018132531A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102018211601A1 (de) * | 2018-07-12 | 2020-01-16 | Heidelberger Druckmaschinen Ag | Verfahren zum Reinigen der Oberfläche wenigstens einer rotierbaren Komponente einer Druckmaschine von einem Druckfluid |
| CN111185414A (zh) * | 2019-12-30 | 2020-05-22 | 重庆市和鑫达电子有限公司 | 集成电路铜板除尘装置 |
| CN115431651B (zh) * | 2022-09-21 | 2023-11-28 | 卡游(上海)文化创意有限公司 | 一种可回收的绿色节约型印刷工艺 |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4718340A (en) * | 1982-08-09 | 1988-01-12 | Milliken Research Corporation | Printing method |
| US4729310A (en) * | 1982-08-09 | 1988-03-08 | Milliken Research Corporation | Printing method |
| US6318259B1 (en) | 1997-09-03 | 2001-11-20 | Graphic Systems, Inc. | Apparatus and method for lithographic printing utilizing a precision emulsion ink feeding mechanism |
| US6024017A (en) * | 1997-09-26 | 2000-02-15 | Dainippon Screen Mfg. Co., Ltd. | Printing apparatus |
| US6336404B1 (en) * | 1999-02-01 | 2002-01-08 | Dainippon Screen Mfg. Co., Ltd. | Printing apparatus, and a processing device in the printing apparatus |
| US6895861B2 (en) * | 2003-07-11 | 2005-05-24 | James F. Price | Keyless inking systems and methods using subtractive and clean-up rollers |
| US6553205B1 (en) * | 2001-12-14 | 2003-04-22 | Xerox Corporation | System for toner cleaning |
| JP2006047793A (ja) * | 2004-08-06 | 2006-02-16 | Toshiba Corp | 湿式画像形成装置及び液体現像剤クリーナ |
| US8967044B2 (en) | 2006-02-21 | 2015-03-03 | R.R. Donnelley & Sons, Inc. | Apparatus for applying gating agents to a substrate and image generation kit |
| EP2123457B1 (en) * | 2007-03-13 | 2013-07-10 | Toyo Seikan Kaisha, Ltd. | Device for trapping ink |
| WO2012030330A1 (en) * | 2010-08-31 | 2012-03-08 | Hewlett-Packard Development Company, L.P. | Vortex flow resisters |
| US20120103221A1 (en) * | 2010-10-29 | 2012-05-03 | Palo Alto Research Center Incorporated | Cleaning Method for a Variable Data Lithography System |
| US20120103217A1 (en) | 2010-10-29 | 2012-05-03 | Palo Alto Research Center Incorporated | Cleaning Subsystem for a Variable Data Lithography System |
| US20120103212A1 (en) | 2010-10-29 | 2012-05-03 | Palo Alto Research Center Incorporated | Variable Data Lithography System |
| US20120103214A1 (en) | 2010-10-29 | 2012-05-03 | Palo Alto Research Center Incorporated | Heated Inking Roller for a Variable Data Lithography System |
| EP2701913B1 (en) * | 2011-04-29 | 2019-10-30 | Hewlett-Packard Development Company, L.P. | Apparatus, printers, and methods to remove material from a printer surface |
| US8573121B2 (en) * | 2011-06-09 | 2013-11-05 | Xerox Corporation | Methods, apparatus, and systems for erasing ink history from ink transfer roll in digital offset systems |
| JP6091106B2 (ja) * | 2011-08-05 | 2017-03-08 | パロ・アルト・リサーチ・センター・インコーポレーテッドPalo Alto Research Center Incorporated | マーキング材料サブシステム |
| US8347787B1 (en) | 2011-08-05 | 2013-01-08 | Palo Alto Research Center Incorporated | Variable data lithography apparatus employing a thermal printhead subsystem |
| US8950322B2 (en) * | 2012-03-21 | 2015-02-10 | Xerox Corporation | Evaporative systems and methods for dampening fluid control in a digital lithographic system |
| US20130327237A1 (en) | 2012-06-12 | 2013-12-12 | Xerox Corportation | Systems and methods for implementing digital offset lithographic printing techniques |
| US9316994B2 (en) * | 2012-07-12 | 2016-04-19 | Xerox Corporation | Imaging system with electrophotographic patterning of an image definition material and methods therefor |
| US9529307B2 (en) * | 2012-07-12 | 2016-12-27 | Palo Alto Research Center Incorporated | Imaging system for patterning of an image definition material by electro-wetting and methods therefor |
| US20140060360A1 (en) * | 2012-08-31 | 2014-03-06 | Palo Alto Research Center Inc. | Textured imaging member |
| US9724733B2 (en) * | 2012-12-21 | 2017-08-08 | Floral Packaging Ip Holdings, Llc | Method and system for removing ink from films |
| US10022951B2 (en) | 2014-04-28 | 2018-07-17 | Xerox Corporation | Systems and methods for implementing a vapor condensation technique for delivering a uniform layer of dampening solution in an image forming device using a variable data digital lithographic printing process |
| US9507266B2 (en) * | 2014-06-29 | 2016-11-29 | Xerox Corporation | Systems and methods for implementing advanced single pass cleaning of a reimageable surface in a variable data digital lithographic printing device |
| US20170113480A1 (en) | 2015-10-24 | 2017-04-27 | Xerox Corporation | Digital lithographic image forming surface incorporating a carbon black polymeric filler |
-
2017
- 2017-12-19 US US15/847,010 patent/US10603897B2/en active Active
-
2018
- 2018-11-20 CN CN201811382351.8A patent/CN109927411B/zh not_active Expired - Fee Related
- 2018-11-22 JP JP2018218952A patent/JP7130530B2/ja active Active
- 2018-12-05 KR KR1020180154862A patent/KR102455375B1/ko active Active
- 2018-12-17 DE DE102018132531.2A patent/DE102018132531A1/de not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| US20190184698A1 (en) | 2019-06-20 |
| KR20190074216A (ko) | 2019-06-27 |
| JP7130530B2 (ja) | 2022-09-05 |
| CN109927411B (zh) | 2021-09-07 |
| CN109927411A (zh) | 2019-06-25 |
| US10603897B2 (en) | 2020-03-31 |
| KR102455375B1 (ko) | 2022-10-14 |
| JP2019107886A (ja) | 2019-07-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R082 | Change of representative |
Representative=s name: GRUENECKER PATENT- UND RECHTSANWAELTE PARTG MB, DE |
|
| R012 | Request for examination validly filed | ||
| R016 | Response to examination communication | ||
| R002 | Refusal decision in examination/registration proceedings | ||
| R003 | Refusal decision now final |