KR102438543B1 - 광산 발생제 및 포토리소그래피용 수지 조성물 - Google Patents

광산 발생제 및 포토리소그래피용 수지 조성물 Download PDF

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Publication number
KR102438543B1
KR102438543B1 KR1020197006989A KR20197006989A KR102438543B1 KR 102438543 B1 KR102438543 B1 KR 102438543B1 KR 1020197006989 A KR1020197006989 A KR 1020197006989A KR 20197006989 A KR20197006989 A KR 20197006989A KR 102438543 B1 KR102438543 B1 KR 102438543B1
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KR
South Korea
Prior art keywords
group
acid
parts
resin
nonionic
Prior art date
Application number
KR1020197006989A
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English (en)
Korean (ko)
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KR20190091436A (ko
Inventor
유지 나카무라
도모유키 시바가키
Original Assignee
산아프로 가부시키가이샤
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Publication of KR20190091436A publication Critical patent/KR20190091436A/ko
Application granted granted Critical
Publication of KR102438543B1 publication Critical patent/KR102438543B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D221/00—Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00
    • C07D221/02—Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00 condensed with carbocyclic rings or ring systems
    • C07D221/04—Ortho- or peri-condensed ring systems
    • C07D221/06—Ring systems of three rings
    • C07D221/14—Aza-phenalenes, e.g. 1,8-naphthalimide

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Other In-Based Heterocyclic Compounds (AREA)
KR1020197006989A 2016-12-12 2017-12-07 광산 발생제 및 포토리소그래피용 수지 조성물 KR102438543B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016240165 2016-12-12
JPJP-P-2016-240165 2016-12-12
PCT/JP2017/043929 WO2018110399A1 (ja) 2016-12-12 2017-12-07 光酸発生剤及びフォトリソグラフィー用樹脂組成物

Publications (2)

Publication Number Publication Date
KR20190091436A KR20190091436A (ko) 2019-08-06
KR102438543B1 true KR102438543B1 (ko) 2022-08-30

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KR1020197006989A KR102438543B1 (ko) 2016-12-12 2017-12-07 광산 발생제 및 포토리소그래피용 수지 조성물

Country Status (4)

Country Link
JP (1) JP6591699B2 (zh)
KR (1) KR102438543B1 (zh)
TW (1) TWI741097B (zh)
WO (1) WO2018110399A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7116669B2 (ja) * 2018-11-22 2022-08-10 サンアプロ株式会社 光酸発生剤及びフォトリソグラフィー用樹脂組成物
TWI833210B (zh) * 2022-04-28 2024-02-21 臺灣永光化學工業股份有限公司 化學增幅型正型光阻組成物
WO2024100964A1 (ja) * 2022-11-09 2024-05-16 サンアプロ株式会社 有機金属化合物、スルホニウム塩型化合物、ノニオンオキシム型化合物、感光材、酸発生剤、及びフォトレジスト

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016043941A1 (en) * 2014-09-18 2016-03-24 Heraeus Precious Metals North America Daychem LLC Sulfonic derivative compounds as photoacid generators in resist applications

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1516512A (en) 1974-05-02 1978-07-05 Gen Electric Chalcogenium salts
JP3024621B2 (ja) 1990-01-30 2000-03-21 和光純薬工業株式会社 レジスト材料用酸発生剤
EP0571330B1 (de) 1992-05-22 1999-04-07 Ciba SC Holding AG Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
JPH09118663A (ja) 1995-08-22 1997-05-06 Nippon Soda Co Ltd 新規スルホニウム塩化合物、重合開始剤、該化合物を含有する硬化性組成物および硬化方法
JP4590821B2 (ja) * 2003-01-14 2010-12-01 コニカミノルタホールディングス株式会社 活性光線硬化型インク組成物、及びそれを用いた画像形成方法
CN102712599B (zh) * 2010-01-13 2016-08-10 株式会社Adeka 新型磺酸衍生物化合物和新型萘二甲酸衍生物化合物
JP6303549B2 (ja) * 2013-02-19 2018-04-04 Jsr株式会社 ネガ型感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
KR102138141B1 (ko) * 2013-02-19 2020-07-27 제이에스알 가부시끼가이샤 네거티브형 감방사선성 수지 조성물, 경화막, 경화막의 형성 방법 및 표시 소자
KR20160030210A (ko) * 2013-07-05 2016-03-16 산아프로 가부시키가이샤 광산 발생제 및 포토리소그래피용 수지 조성물
JP6082473B2 (ja) * 2013-09-30 2017-02-15 富士フイルム株式会社 感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置および有機ｅｌ表示装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016043941A1 (en) * 2014-09-18 2016-03-24 Heraeus Precious Metals North America Daychem LLC Sulfonic derivative compounds as photoacid generators in resist applications

Also Published As

Publication number Publication date
TWI741097B (zh) 2021-10-01
JP6591699B2 (ja) 2019-10-16
TW201835052A (zh) 2018-10-01
JPWO2018110399A1 (ja) 2019-04-04
WO2018110399A1 (ja) 2018-06-21
KR20190091436A (ko) 2019-08-06

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