KR102415297B9 - 기판 코팅 장치 - Google Patents
기판 코팅 장치Info
- Publication number
- KR102415297B9 KR102415297B9 KR1020170114919A KR20170114919A KR102415297B9 KR 102415297 B9 KR102415297 B9 KR 102415297B9 KR 1020170114919 A KR1020170114919 A KR 1020170114919A KR 20170114919 A KR20170114919 A KR 20170114919A KR 102415297 B9 KR102415297 B9 KR 102415297B9
- Authority
- KR
- South Korea
- Prior art keywords
- coating apparatus
- substrate coating
- substrate
- coating
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020170114919A KR102415297B1 (ko) | 2017-09-08 | 2017-09-08 | 기판 코팅 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020170114919A KR102415297B1 (ko) | 2017-09-08 | 2017-09-08 | 기판 코팅 장치 |
Publications (3)
Publication Number | Publication Date |
---|---|
KR20190028029A KR20190028029A (ko) | 2019-03-18 |
KR102415297B1 KR102415297B1 (ko) | 2022-06-30 |
KR102415297B9 true KR102415297B9 (ko) | 2023-09-07 |
Family
ID=65949174
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020170114919A KR102415297B1 (ko) | 2017-09-08 | 2017-09-08 | 기판 코팅 장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR102415297B1 (ko) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101206933B1 (ko) * | 2006-05-02 | 2012-11-30 | 주식회사 케이씨텍 | 노즐용 세정기재 |
JP4972504B2 (ja) * | 2007-09-12 | 2012-07-11 | 大日本スクリーン製造株式会社 | 塗布装置 |
JP2010034309A (ja) * | 2008-07-29 | 2010-02-12 | Dainippon Screen Mfg Co Ltd | 塗布装置および基板処理システム |
KR101078310B1 (ko) * | 2009-07-21 | 2011-10-31 | 주식회사 케이씨텍 | 부상식 기판 코터 장치 |
KR101097234B1 (ko) * | 2009-08-21 | 2011-12-21 | 주식회사 케이씨텍 | 부상식 기판 코터 장치 |
KR101097236B1 (ko) * | 2009-08-21 | 2011-12-21 | 주식회사 케이씨텍 | 부상식 기판 코터 장치 |
KR101975278B1 (ko) * | 2013-10-15 | 2019-05-07 | 주식회사 케이씨텍 | 기판 처리 장치 |
-
2017
- 2017-09-08 KR KR1020170114919A patent/KR102415297B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20190028029A (ko) | 2019-03-18 |
KR102415297B1 (ko) | 2022-06-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
N231 | Notification of change of applicant | ||
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
G170 | Re-publication after modification of scope of protection [patent] |