KR102357303B1 - 대전 입자 다중-빔릿 장치 - Google Patents

대전 입자 다중-빔릿 장치 Download PDF

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Publication number
KR102357303B1
KR102357303B1 KR1020207020901A KR20207020901A KR102357303B1 KR 102357303 B1 KR102357303 B1 KR 102357303B1 KR 1020207020901 A KR1020207020901 A KR 1020207020901A KR 20207020901 A KR20207020901 A KR 20207020901A KR 102357303 B1 KR102357303 B1 KR 102357303B1
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electrodes
manipulator device
opening
openings
charged particle
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Korean (ko)
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KR20200091490A (ko
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애어노우트 크리스티아안 존네빌레
피에터 크루이트
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에이에스엠엘 네델란즈 비.브이.
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/043—Beam blanking
    • H01J2237/0435—Multi-aperture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04924—Lens systems electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/1205—Microlenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1532—Astigmatism
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
KR1020207020901A 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치 Active KR102357303B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020227002799A KR102553059B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
NL2006868A NL2006868C2 (en) 2011-05-30 2011-05-30 Charged particle multi-beamlet apparatus.
NL2006868 2011-05-30
US201161491865P 2011-05-31 2011-05-31
US61/491,865 2011-05-31
KR1020207005591A KR102137169B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치
PCT/NL2012/050376 WO2012165955A2 (en) 2011-05-30 2012-05-30 Charged particle multi-beamlet apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020207005591A Division KR102137169B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020227002799A Division KR102553059B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치

Publications (2)

Publication Number Publication Date
KR20200091490A KR20200091490A (ko) 2020-07-30
KR102357303B1 true KR102357303B1 (ko) 2022-02-08

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KR1020207020901A Active KR102357303B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치
KR1020207005591A Active KR102137169B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치
KR1020227002799A Active KR102553059B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치
KR1020137034251A Active KR101842710B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중 빔릿 장치
KR1020237022503A Active KR102780450B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치
KR1020197026754A Active KR102084040B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치
KR1020187008117A Active KR102023054B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치

Family Applications After (6)

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KR1020207005591A Active KR102137169B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치
KR1020227002799A Active KR102553059B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치
KR1020137034251A Active KR101842710B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중 빔릿 장치
KR1020237022503A Active KR102780450B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치
KR1020197026754A Active KR102084040B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치
KR1020187008117A Active KR102023054B1 (ko) 2011-05-30 2012-05-30 대전 입자 다중-빔릿 장치

Country Status (9)

Country Link
US (1) US9607806B2 (https=)
EP (2) EP3660883B1 (https=)
JP (1) JP6141276B2 (https=)
KR (7) KR102357303B1 (https=)
CN (1) CN103650097B (https=)
NL (1) NL2006868C2 (https=)
RU (1) RU2632937C2 (https=)
TW (1) TWI582816B (https=)
WO (1) WO2012165955A2 (https=)

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