KR102295833B9 - 복합 나노패턴 임프린트 템플레이트 제조방법 및 이에 의해 제조된 복합 나노패턴 임프린트 템플레이트 - Google Patents

복합 나노패턴 임프린트 템플레이트 제조방법 및 이에 의해 제조된 복합 나노패턴 임프린트 템플레이트

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Publication number
KR102295833B9
KR102295833B9 KR1020200093305A KR20200093305A KR102295833B9 KR 102295833 B9 KR102295833 B9 KR 102295833B9 KR 1020200093305 A KR1020200093305 A KR 1020200093305A KR 20200093305 A KR20200093305 A KR 20200093305A KR 102295833 B9 KR102295833 B9 KR 102295833B9
Authority
KR
South Korea
Prior art keywords
imprint template
pattern imprint
nano
multi nano
pattern
Prior art date
Application number
KR1020200093305A
Other languages
English (en)
Other versions
KR102295833B1 (ko
Inventor
최준혁
이지혜
최대근
이승현
김광영
김경록
박평원
조정대
Original Assignee
한국기계연구원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 한국기계연구원 filed Critical 한국기계연구원
Priority to KR1020200093305A priority Critical patent/KR102295833B1/ko
Application granted granted Critical
Publication of KR102295833B1 publication Critical patent/KR102295833B1/ko
Publication of KR102295833B9 publication Critical patent/KR102295833B9/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
KR1020200093305A 2020-07-27 2020-07-27 복합 나노패턴 임프린트 템플레이트 제조방법 및 이에 의해 제조된 복합 나노패턴 임프린트 템플레이트 KR102295833B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020200093305A KR102295833B1 (ko) 2020-07-27 2020-07-27 복합 나노패턴 임프린트 템플레이트 제조방법 및 이에 의해 제조된 복합 나노패턴 임프린트 템플레이트

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020200093305A KR102295833B1 (ko) 2020-07-27 2020-07-27 복합 나노패턴 임프린트 템플레이트 제조방법 및 이에 의해 제조된 복합 나노패턴 임프린트 템플레이트

Publications (2)

Publication Number Publication Date
KR102295833B1 KR102295833B1 (ko) 2021-09-01
KR102295833B9 true KR102295833B9 (ko) 2022-04-11

Family

ID=77779719

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200093305A KR102295833B1 (ko) 2020-07-27 2020-07-27 복합 나노패턴 임프린트 템플레이트 제조방법 및 이에 의해 제조된 복합 나노패턴 임프린트 템플레이트

Country Status (1)

Country Link
KR (1) KR102295833B1 (ko)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012190986A (ja) * 2011-03-10 2012-10-04 Fujifilm Corp ナノインプリント用のモールド
KR101623000B1 (ko) * 2015-02-12 2016-05-20 이은상 임프린트용 금형의 가공방법
JP6583713B2 (ja) * 2015-04-16 2019-10-02 大日本印刷株式会社 インプリント用マスターモールド及びその製造方法、インプリント用フィルムモールド及びその製造方法、並びにワイヤーグリッド偏光子の製造方法
KR101730037B1 (ko) * 2015-09-10 2017-04-26 한국과학기술원 스템프 몰드의 제작방법
JP2017212263A (ja) * 2016-05-23 2017-11-30 大日本印刷株式会社 インプリント用モールド、及び、該モールドを用いたパターン形成方法
JP2018022850A (ja) * 2016-08-05 2018-02-08 大日本印刷株式会社 インプリント用モールド、及び、該モールドを用いたパターン形成方法
KR20180022269A (ko) 2016-08-24 2018-03-06 (주)쓰리에스엠케이 입체 필름 및 이의 제조 방법
JP2019080019A (ja) * 2017-10-27 2019-05-23 大日本印刷株式会社 インプリント用モールド、該モールドを用いたパターン形成方法、及び、パターン形成装置

Also Published As

Publication number Publication date
KR102295833B1 (ko) 2021-09-01

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