KR102279611B1 - 플라즈마 분광 분석 방법 - Google Patents

플라즈마 분광 분석 방법 Download PDF

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Publication number
KR102279611B1
KR102279611B1 KR1020150024399A KR20150024399A KR102279611B1 KR 102279611 B1 KR102279611 B1 KR 102279611B1 KR 1020150024399 A KR1020150024399 A KR 1020150024399A KR 20150024399 A KR20150024399 A KR 20150024399A KR 102279611 B1 KR102279611 B1 KR 102279611B1
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KR
South Korea
Prior art keywords
plasma
detection step
voltage
generating
narrow portion
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KR1020150024399A
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English (en)
Korean (ko)
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KR20150099462A (ko
Inventor
다카시게 다나카
야스노리 시라키
아키츠구 구도
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아크레이 가부시키가이샤
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Publication of KR20150099462A publication Critical patent/KR20150099462A/ko
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Publication of KR102279611B1 publication Critical patent/KR102279611B1/ko

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
KR1020150024399A 2014-02-21 2015-02-17 플라즈마 분광 분석 방법 KR102279611B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2014-032256 2014-02-21
JP2014032256 2014-02-21

Publications (2)

Publication Number Publication Date
KR20150099462A KR20150099462A (ko) 2015-08-31
KR102279611B1 true KR102279611B1 (ko) 2021-07-19

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ID=53911222

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KR1020150024399A KR102279611B1 (ko) 2014-02-21 2015-02-17 플라즈마 분광 분석 방법

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KR (1) KR102279611B1 (zh)
CN (1) CN104865239B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6851946B2 (ja) * 2016-10-07 2021-03-31 アークレイ株式会社 プラズマ分光分析方法、及び非ターゲットに由来するプラズマ発光の抑制剤
JP2018131660A (ja) * 2017-02-16 2018-08-23 アークレイ株式会社 電気分解装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100824575B1 (ko) * 2004-03-25 2008-04-23 고쿠리츠다이가쿠호진 호쿠리쿠 센단 가가쿠 기쥬츠 다이가쿠인 다이가쿠 플라즈마 발생 장치
JP2011180045A (ja) 2010-03-02 2011-09-15 Japan Advanced Institute Of Science & Technology Hokuriku プラズマ発生手段、プラズマ発生装置及び元素分析方法
WO2013099923A1 (ja) * 2011-12-28 2013-07-04 イマジニアリング株式会社 ガス濃度推定装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5825485A (en) * 1995-11-03 1998-10-20 Cohn; Daniel R. Compact trace element sensor which utilizes microwave generated plasma and which is portable by an individual
WO2005093394A1 (ja) 2004-03-25 2005-10-06 Japan Advanced Institute Of Science And Technology プラズマ発生装置
CN100567964C (zh) * 2004-03-25 2009-12-09 国立大学法人北陆先端科学技术大学院大学 等离子体生成装置
JP5705591B2 (ja) 2011-03-07 2015-04-22 株式会社日立ハイテクノロジーズ プラズマ分光分析装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100824575B1 (ko) * 2004-03-25 2008-04-23 고쿠리츠다이가쿠호진 호쿠리쿠 센단 가가쿠 기쥬츠 다이가쿠인 다이가쿠 플라즈마 발생 장치
JP2011180045A (ja) 2010-03-02 2011-09-15 Japan Advanced Institute Of Science & Technology Hokuriku プラズマ発生手段、プラズマ発生装置及び元素分析方法
WO2013099923A1 (ja) * 2011-12-28 2013-07-04 イマジニアリング株式会社 ガス濃度推定装置

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Publication number Publication date
CN104865239B (zh) 2019-03-22
KR20150099462A (ko) 2015-08-31
CN104865239A (zh) 2015-08-26

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