KR102274884B1 - Roll­to­roll sputtering apparatus - Google Patents

Abstract

The present invention relates to a roll-to-roll sputtering apparatus, and in particular, by configuring to form a deposited thin film on both sides of a substrate in a series of roll-to-roll processes, time, effort and cost for thin film deposition on both sides of a substrate is minimized It relates to a roll-to-roll sputtering apparatus that can improve productivity and reduce the possibility of contamination of the substrate.
The constituent means constituting the roll-to-roll sputtering apparatus according to the present invention is, in the roll-to-roll sputtering apparatus, an unwinding roller for unwinding the substrate, and the one surface of the substrate transferred from the unwinding roller in a state in which the tension is maintained. A first sputtering module for performing a sputtering process on one surface of the substrate, moving the other surface of the substrate transferred from the first sputtering module in a state in which tension is maintained to be exposed, and performing a sputtering process on the other surface of the substrate 2 sputtering module, a rewinding roller for rewinding a substrate transferred from the second sputtering module in a state in which tension is maintained, between the unwinding roller and the first sputtering module, between the first sputtering module and the second sputtering module and a tension/guide roller disposed between the second sputtering module and the rewinding roller to maintain tension and guide the moving substrate.

Description

Roll-to-roll sputtering device {ROLLTOROLL SPUTTERING APPARATUS}

The present invention relates to a roll-to-roll sputtering apparatus, and in particular, by configuring to form a deposited thin film on both sides of a substrate in a series of roll-to-roll processes, time, effort and cost for thin film deposition on both sides of a substrate is minimized It relates to a roll-to-roll sputtering apparatus that can improve productivity and reduce the possibility of contamination of the substrate.

In general, a flexible polymer thin film is used for a substrate covering liquid crystal in liquid crystal displays, organic EL displays, and E-inks of flexible displays.

A transparent conductive film or a functional coating layer made of ITO, ZnO, SnO2, In2O3, Nb2O5, SiOx, etc. is formed on such a polymer thin film by a roll-to-roll sputtering device.

In general, flexible displays provide flexibility to fold and unfold by replacing the glass substrate covering liquid crystals with plastic films in liquid crystal displays, organic EL displays, and E-inks. Since it can be manufactured in a shape, research on it has been actively conducted in recent years.

In this flexible technology field, it is true that there is a high demand for a sputtering device capable of a roll-to-roll process as equipment for forming a thin film.

First, a brief look at sputtering equipment. Vapor Deposition can be divided into Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) depending on which process the material to be deposited is transformed from a gaseous state to a solid state on a substrate. can

Examples of physical vapor deposition methods include sputtering, E-beam evaporation, thermal evaporation, and laser molecular beam epitaxy; L-MBE) and pulsed laser deposition (PLD).

Among the physical vapor deposition methods, sputtering is widely used in that it can safely obtain a thin film with a relatively simple device without using a toxic gas with a film of any material regardless of the type of substrate material. Sputtering is a method of generating a glow discharge of an inert gas (Ar, Kr, Xe, etc.) in a vacuum to cause positive ions to collide with a negatively biased target, thereby releasing atoms of the target by momentum transfer. The emitted atoms move freely in the vacuum chamber, and the particles incident on the substrate form a thin film. When a reactive gas (O2, N2, NH3, CH4, C2H2, etc.) is introduced together with the sputtering gas, the reactive gas molecules are also ionized and activated, and react with the sputtered particles to form a compound film such as nitride or carbide. .

Efforts have been made to manufacture such sputtering equipment in a roll-to-roll manner. Republic of Korea Patent Publication No. 10-2011-0012182 (hereinafter referred to as "prior art document 1") corresponds to one example. This prior art document 1 discloses a roll-to-roll sputtering apparatus for depositing silver (Ag) as a transmission layer and a conductive layer between transparent electrode materials in a continuous film forming process by installing a plurality of sputters around the drum are doing

In addition, Korean Patent Laid-Open Publication No. 10-2013-0125900 (hereinafter referred to as "prior art document 2") discloses that in forming a deposition film by sputtering deposition, a polymer thin film and thin glass can be used as a substrate as a hybrid (hybrid) A roll-to-roll sputtering device has been proposed.

However, the roll-to-roll sputtering apparatus according to the prior art document 1 and the prior art document 2 has a structure in which a thin film is formed only on one side. Therefore, in order to deposit a thin film on both sides of a single substrate or film, after forming a thin film on one side, open a vacuum chamber, turn the substrate over and sputter on the remaining Han side to deposit both sides. It had the disadvantage of being vulnerable to contamination.

Prior Art Document 1: Republic of Korea Patent Publication No. 10-2011-0012182 (published date: February 09, 2011, title of invention: roll-to-roll sputtering apparatus and continuous sputtering method implementing continuous sputtering) Prior Art Document 2: Republic of Korea Patent Publication No. 10-2013-0125900 (published date: November 20, 2013, title of invention: roll-to-roll sputtering device)

The present invention was created to solve the problems of the prior art as described above, and by configuring to form a thin film deposited on both sides of the substrate in a series of roll-to-roll processes, the time for thin film deposition on both sides of the substrate , It is an object of the present invention to provide a roll-to-roll sputtering apparatus capable of improving productivity by minimizing effort and cost, and reducing the possibility of contamination of the substrate.

In addition, the present invention is arranged between the unwinding roller and the rewinding roller so that both ends can freely move in response to external forces in various directions generated according to the contact transfer of the flexible substrate, thereby guiding the flexible substrate in an aligned state. An object of the present invention is to provide a roll-to-roll sputtering apparatus that allows the flexible substrate to be transferred without wrinkling and the tension is maintained at the same time so that it can be transferred.

In addition, the present invention forms an elastic support module constituting the tension/guide roller in a simple structure and is assembled and detachable, so that maintenance and replacement of the elastic support module is easy, and an elastic support module capable of maintaining various elastic forces An object of the present invention is to provide a roll-to-roll sputtering device that can be easily adopted and applied as desired.

The component constituting the roll-to-roll sputtering apparatus of the present invention proposed to solve the above technical problems is, in the roll-to-roll sputtering apparatus, an unwinding roller for unwinding the substrate, and the tension is transferred from the unwinding roller in a state maintained A first sputtering module for performing a sputtering process on one surface of the substrate, the other surface of the substrate being transferred from the first sputtering module in a state in which tension is maintained is moved so that one surface of the substrate is exposed, A second sputtering module for performing a sputtering process on the other surface of the substrate, a rewinding roller for rewinding the substrate transferred from the second sputtering module in a state in which tension is maintained, between the unwinding roller and the first sputtering module, It is disposed between the first sputtering module and the second sputtering module and between the second sputtering module and the rewinding roller so as to maintain the tension of the moving substrate and to be guided by a tension/guide roller. characterized in that

Here, the rewinding roller is characterized in that it is disposed between the first sputtering module and the second sputtering module.

In addition, the first sputtering module includes a first drum rotating in one direction while in contact with the other surface of the substrate and a plurality of first sputtering performing sputtering on one surface of the substrate moving along the first drum A plurality of second sputtering modules for performing sputtering on the second drum rotating in the other direction while in contact with one surface of the substrate and the other surface of the substrate moving along the second drum It is characterized in that it is configured to include a sputter.

In addition, the first sputtering module rotates in one direction while in contact with the other surface of the substrate, and a plurality of first drum substitute rollers and a plurality of first drum substitute rollers disposed to be spaced apart from each other, one surface of the substrate moving along the first drum substitute roller A plurality of first sputters performing sputtering with respect to and a first barrier rib disposed and formed between adjacent first sputters in order to spatially separate the plurality of first sputters from each other, the second sputtering The module rotates in the other direction while in contact with one surface of the substrate, and performs sputtering on the other surface of the substrate moving along a plurality of second drum substitute rollers and a plurality of second drum substitute rollers arranged to be spaced apart from each other. a plurality of second sputters and a second barrier rib disposed and formed between adjacent second sputters to spatially separate the plurality of second sputters from each other, and each of the plurality of first drum substitute rollers is disposed and formed at a position corresponding to the first bulkhead, and each of the plurality of second drum substitute rollers is disposed and formed at a position corresponding to the second bulkhead.

According to the roll-to-roll sputtering apparatus of the present invention having the above problems and solutions, since it is configured to form a deposition thin film on both sides of the substrate in a series of roll-to-roll processes, for thin film deposition on both sides of the substrate By minimizing time, effort, and cost, productivity can be improved, and the possibility of contamination of the substrate can be reduced.

In addition, according to the present invention, it is disposed between the unwinding roller and the rewinding roller so that both ends can freely move in response to external forces in various directions generated according to the contact transfer of the flexible substrate, so that the flexible substrate is aligned. The advantage is generated so that the flexible substrate can be transferred while being guided to the state without being wrinkled and transferred in a state in which the tension is maintained.

In addition, according to the present invention, since the elastic support module constituting the tension/guide roller applied to the present invention is formed in a simple structure and configured to be assembled and detachable, maintenance and replacement of the elastic support module is easy, and various An effect of allowing the elastic support module capable of maintaining the elastic force to be easily adopted and applied as desired occurs.

1 is a schematic cross-sectional configuration diagram of a roll-to-roll sputtering apparatus according to an embodiment of the present invention.
2 is a schematic cross-sectional configuration diagram of a roll-to-roll sputtering apparatus according to another embodiment of the present invention.
3 is a perspective view of a tension/guide roller applied to a roll-to-roll sputtering apparatus according to an embodiment of the present invention.
4 is a schematic cross-sectional view at both ends of a tension/guide roller applied to a roll-to-roll sputtering apparatus according to an embodiment of the present invention.

Hereinafter, a preferred embodiment of the present invention roll-to-roll sputtering apparatus having the above problems, solutions and effects will be described in detail with reference to the accompanying drawings.

Since the present invention can apply various transformations and can have various embodiments, specific embodiments are illustrated in the drawings and described in detail in the detailed description. Effects and features of the present invention, and a method of achieving them, will become apparent with reference to the embodiments described below in detail in conjunction with the drawings. However, the present invention is not limited to the embodiments disclosed below and may be implemented in various forms.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings, and when described with reference to the drawings, the same or corresponding components are given the same reference numerals, and the overlapping description thereof will be omitted. .

In the following embodiments, terms such as include or have means that the features or components described in the specification are present, and the possibility of adding one or more other features or components is not excluded in advance.

In the drawings, the size of the components may be exaggerated or reduced for convenience of description. For example, since the size and thickness of each component shown in the drawings are arbitrarily indicated for convenience of description, the present invention is not necessarily limited to the illustrated bar.

1 is a schematic structural cross-sectional view of a roll-to-roll sputtering apparatus according to an embodiment of the present invention.

1, the roll-to-roll sputtering apparatus 100 according to an embodiment of the present invention is an unwinding roller 10, a first sputtering module 30, a second sputtering module 50, a rewinding roller ( 70) and a tension/guide roller 90 .

The unwinding roller 10 performs an operation of unwinding or rewinding the substrate s, specifically, the flexible substrate s by mutual rotation between the rewinding roller 70 and the rewinding roller 70 . Specifically, the unwinding roller 10 performs an operation to unwind the flexible substrate s, and the rewinding roller 70 will be described later, but in a state in which the tension is maintained from the second sputtering module 50 . Performs an operation of rewinding the transferred substrate (s).

The unwinding roller 10 and the rewinding roller 70 interlock with each other to wind or unwind the film-type vapor-deposited material, that is, the flexible substrate s, so that the substrate s corresponds to the deposition area, and the first sputtering module 30 ) and transported along the second sputtering module 50 . The substrate (s) wound on the unwinding roller 10 is maintained in tension and guided through a plurality of tension/guide rollers 90 to form the first sputtering module 30 and the second sputtering module 50. It passes through and is rewound on the rewinding roller (70).

A load cell (not shown) for detecting the tension of the transferred flexible substrate s may be installed on at least one of the unwinding roller 10 and the rewinding roller 70 . Since the flexible substrate (s) may be damaged when a tension of a certain size or more is applied to the flexible substrate (s), a load cell (not shown) prevents this by monitoring the tension of the flexible substrate (s). That is, the load cell is the unwinding roller 10 and the rewinding roller 70 so that when the tension applied to the flexible substrate s exceeds a certain level, the flexible substrate s can be transported below the limit tension. It provides a signal to control the speed.

The rotation directions of the unwinding roller 10 and the rewinding roller 70 may be varied. That is, when it is necessary to perform a thin film deposition process again on the flexible substrate (s) on which a thin film is deposited while being unwound from the unwinding roller 10 and wound by the rewinding roller 70, the unwinding roller 10 and the rewind The direction of rotation of the winding roller 70 is changed so that the flexible substrate s wound on the rewinding roller 70 is unwound and can be wound on the unwinding roller 10 .

The flexible substrate, which is unwound and moved by the unwinding roller 10 , is transferred to the first sputtering module 30 and undergoes a thin film deposition process. The flexible substrate (s) delivered from the unwinding roller 10 is transferred to the first sputtering module 30 while being guided in a state in which the tension is maintained, and while passing through the first sputtering module 30, one surface is A thin film is deposited by maintaining the exposed state and performing a sputtering process on the exposed one surface.

That is, the first sputtering module 30 is moved so that one surface of the substrate (s) transferred from the unwinding roller 10 in a state in which the tension is maintained is exposed, a sputtering process for one surface of the substrate (s) perform an action to perform

One surface of the substrate (s) may be a front surface or a rear surface. When one surface of the substrate is the front surface, the other surface of the substrate corresponds to the rear surface, and when the one surface of the substrate is the rear surface, the other surface of the substrate corresponds to the front surface.

Since the substrate (s) passing through the first sputtering module 30 moves with one surface exposed, the other surface of the substrate is a first drum 31 or a first drum substitute roller 33 to be described later. It is transferred in a contact state, and one surface of the substrate is transferred in an exposed state while facing a plurality of first sputters 35 to be described later. Accordingly, one surface of the substrate s may be subjected to a sputtering process on one surface while passing through the first sputtering module 30 to form a thin film.

After being subjected to a sputtering process on one surface in the first sputtering module 30 , the flexible substrate s that is moved is transferred to the second sputtering module 50 and continuously subjected to another thin film deposition process. However, the substrate passing through the second sputtering module 50 performs a thin film deposition process on the other surface of the substrate, unlike the first sputtering module 30 . The flexible substrate (s) delivered from the first sputtering module 30 is transferred to the second sputtering module 50 while being guided in a state in which the tension is maintained, and the other surface while passing through the second sputtering module 50 While maintaining this exposed state, a thin film is deposited by performing a sputtering process on the exposed other surface.

That is, the second sputtering module 50 is moved so that the other surface of the substrate (s) transferred from the first sputtering module 30 in a state in which the tension is maintained is exposed, sputtering with respect to the other surface of the substrate (s). Perform the action to perform the process. As a result, the flexible substrate (s) may be subjected to a thin film deposition process on both surfaces while passing through the first sputtering module 30 and the second sputtering module 50 .

The other surface of the substrate (s) may be a front surface or a rear surface. When the other surface of the substrate is the front surface, one surface of the substrate corresponds to the rear surface, and when the other surface of the substrate is the rear surface, one surface of the substrate corresponds to the front surface.

Since the substrate (s) passing through the second sputtering module 50 moves with the other surface exposed, one surface of the substrate is placed on a second drum 51 or a second drum substitute roller 53 to be described later. It is transferred in a contact state, and the other surface of the substrate is transferred in an exposed state while facing a plurality of second sputters 55 to be described later. Accordingly, the other surface of the substrate (s) may be subjected to a sputtering process on the other surface while passing through the second sputtering module 50 to form a thin film.

The flexible substrate (s) that has been subjected to a sputtering process on the other surface while passing through the second sputtering module 50 is rewound on the rewinding roller 70 in a state where the thin film deposition process is performed on both surfaces. Also, the flexible substrate s transferred from the second sputtering module 50 is rewound on the rewinding roller 70 in a state in which the tension is maintained. That is, the rewinding roller 70 performs an operation of rewinding the substrate transferred from the second sputtering module 50 in a state in which the tension is maintained.

The flexible substrate (s) moving from the unwinding roller 10 to the rewinding roller 70 needs to be transported in a state in which tension is maintained without wrinkling, and is guided so as not to be separated laterally. There is a need. To this end, between the unwinding roller 10 and the first sputtering module 30, between the second sputtering module 30 and the second sputtering module 50, and between the second sputtering module 50 and the Lee A plurality of tension/guide rollers 90 are respectively disposed between the winding modules 70 so that the transferred substrate can be guided while maintaining the tension.

That is, the plurality of tension / guide rollers 90 are between the unwinding roller 10 and the first sputtering module 30 , and between the first sputtering module 30 and the second sputtering module 50 . And it is disposed between the second sputtering module 50 and the rewinding roller 70 to allow the moving substrate (s) to maintain tension and to be guided.

Each of the tension/guide rollers 90 may be configured to perform both a tension maintenance operation and a guide operation, or may be configured to perform only a tension maintenance operation or only a guide operation.

According to the roll-to-roll sputtering apparatus 100 of the present invention described above, since it is configured to form a deposition thin film on both surfaces of the substrate (s) in a series of roll-to-roll processes, a thin film on both sides of the substrate (s) By minimizing the time, effort, and cost for deposition, productivity can be improved and the possibility of contamination of the substrate can be reduced. That is, if the thin film deposition on one side and the other side of the substrate is performed as a separate process, the possibility of exposure to particles or contamination is high and productivity is low, whereas the present invention performs the thin film deposition process on both sides in a series of one process. Since it can be carried out, the possibility of exposure to contamination can be minimized and productivity can be improved.

On the other hand, the roll-to-roll sputtering apparatus 100 according to an embodiment of the present invention performs a sputtering process on one surface of the substrate s in the first sputtering module 30 as described above, and the second sputtering A sputtering process is performed on the other surface of the substrate s in the module 50 .

Accordingly, the unwinding roller 10, the first sputtering module 30, the second sputtering module 50 and the rewinding roller 70 are formed in the first sputtering module 30 in the substrate (s). One side of can be exposed and it is necessary to maintain a mutually arranged relationship so that the other side of the substrate (s) can be exposed in the second sputtering module 50 .

As a method for this, the present invention does not apply a structure in which the first sputtering module 30 and the second sputtering module 50 are disposed between the unwinding roller 10 and the rewinding roller 70. A relationship in which the rewinding roller 70 is disposed between the first sputtering module 30 and the second sputtering module 50 is adopted and applied. That is, the rewinding roller 70 according to the present invention is disposed between the first sputtering module 30 and the second sputtering module 50 . Through such an arrangement structure, the flexible substrate (s) passes through the first sputtering module 30 in one direction, and passes through the second sputtering module 30 in the other direction (one direction and the opposite direction) while passing through the Li Since it can be rewound on the winding roller 70 , the substrate can maintain a state in which opposite sides are exposed while passing through the first sputtering module 30 and the second sputtering module 50 , and thereby the substrate It becomes possible to perform the sputtering process on both sides of the.

On the other hand, since the first sputtering module 30 and the second sputtering module have a structure capable of performing a sputtering process on one surface and the other surface of the substrate (s), respectively, the configuration may be the same as each other, but , the motion (eg, direction of rotation) may be somewhat different.

Specifically, as shown in Figure 1, the first sputtering module 30 applied to the roll-to-roll sputtering apparatus 100 according to the embodiment of the present invention is in contact with the other surface of the substrate (s) in one direction. A plurality of first drums 31 rotating in FIG. 1 (illustrated in a counterclockwise direction) and performing sputtering on one surface of the substrate s moving along the first drum 31 It is configured to include a sputter 35, and the second sputtering module 50 is in contact with one surface of the substrate s (a surface opposite to the one surface in contact with the first drum 31) in the other direction. A plurality of second sputters for performing sputtering on the second drum 51 rotating in a clockwise direction (illustrated in the clockwise direction in FIG. 1 ) and the other surface of the substrate s moving along the second drum 51 . (55) is included.

The first drum 31 is transferred while rotating the substrate in one direction while in contact with the other surface of the substrate s transferred from the unwinding roller 10 in a state in which the tension is maintained. Accordingly, one surface of the substrate may be exposed in a state facing the plurality of first sputters 35 , whereby the substrate s is transported while being transferred with respect to one surface by the plurality of first sputters 35 . A thin film sputtering process may be performed.

The plurality of first sputters 35 are arranged to be spaced apart from the first drum 31 by a predetermined interval along the side and the lower portion of the first drum 31, and are arranged to be spaced apart from each other by a predetermined interval to form the first drum A sputtering thin film is deposited on one surface of the substrate (s) moving along (31). As a result, predetermined thin film layers may be deposited on one surface of the substrate s passing through the first sputtering module 30 .

On the other hand, the second drum 51 moves the substrate in the other direction (the first drum 31 ) while in contact with one surface of the substrate s transferred from the first sputtering module 30 in a state in which the tension is maintained. ) to rotate in the opposite direction to the direction of rotation). Accordingly, the other surface of the substrate (s) may be exposed in a state facing the plurality of second sputters 55, whereby the substrate (s) is transferred by the plurality of second sputters 55 while being transported. It may be subjected to a thin sputtering process for the other surface.

The plurality of second sputters 55 are arranged to be spaced apart from the second drum 51 by a predetermined distance along the side and the lower portion of the second drum 51, and are arranged to be spaced apart from each other by a predetermined distance to the second drum A sputtering thin film is deposited on the other surface of the substrate (s) moving along (51). As a result, predetermined thin film layers may be deposited on the other surface of the substrate s passing through the second sputtering module 50 .

On the other hand, as shown in FIG. 1, the first sputtering module 30 is disposed and formed between adjacent first sputters 35 in order to spatially separate the plurality of first sputters 35 from each other. The first partition wall 37 may be further included, and the second sputtering module 50 is also between adjacent second sputters 55 to spatially separate the plurality of second sputters 55 from each other. It may be configured to further include a second barrier rib 57 that is disposed and formed in each.

The first partition wall 37 is adopted and applied to prevent the target material sputtered by each of the plurality of first sputters 35 from flying to another first sputter 35 (especially an adjacent first sputter). By adopting and applying the first partition wall 37, it is possible to prevent the target material sputtered by each first sputter 35 from flying to the other adjacent first sputters 35, and through this, it is possible to prevent the other adjacent first sputters 35 from flying. 1 By preventing contamination of the sputter 35, it is possible to maintain the deposition quality.

Also, in the same way, the second barrier rib 57 prevents the target material sputtered by each of the plurality of second sputters 55 from flying to another second sputter 55 (especially an adjacent second sputter). Adopt and apply to By adopting and applying the second partition wall 57, it is possible to prevent the target material sputtered by each second sputter 55 from flying to another adjacent second sputter 55, and through this, it is possible to prevent other adjacent second sputters 55 from flying. 2 By preventing contamination of the sputter 55, it is possible to maintain the deposition quality.

The sputtering process by the first sputtering module 30 and the second sputtering module 50 is performed in a chamber maintaining a vacuum state, specifically, the first process chamber 3 and the second process chamber 5, respectively. it is preferable Therefore, it is preferable that the unwinding roller 10 and the rewinding roller 70 disposed adjacent to each other are also arranged and operated in the unwinding chamber 1 and the rewinding chamber 7 that can maintain a vacuum state, respectively. .

That is, the unwinding roller 10 is disposed and operated in the unwinding chamber 1, the first sputtering module 30 is disposed and operated in the first process chamber 3, and the second sputtering module ( 50 is disposed and operated in the second process chamber 5 , and the rewinding roller 70 is disposed and operated in the rewinding chamber 7 . In addition, in the adjacent chambers, a slit through which the substrate (s) can pass is formed on the adjacent interface, but the respective chambers are operated to maintain a vacuum state as a whole.

Meanwhile, the substrate s may be subjected to a pretreatment process before being subjected to a sputtering process. The pretreatment process includes ion beam treatment and the like. The ion beam treatment cleans the surface of the substrate and improves the efficiency of thin film deposition in the sputtering process through surface treatment. The ion beam treatment is preferably performed in the unwinding chamber 1 . Accordingly, the unwinding chamber 1 preferably includes an ion beam processing module.

On the other hand, in some cases, instead of the first drum 31 and the second drum 51 respectively adopted and applied to the first sputtering module 30 and the second sputtering module 50, structurally simple, installation and replacement A plurality of easier rollers, specifically, the first drum substitute roller 33 and the second drum substitute roller 53 can be adopted and applied.

Specifically, as shown in FIG. 2, the roll-to-roll sputtering apparatus 100 according to another embodiment of the present invention is the roll-to-roll sputtering apparatus 100 according to the embodiment of the present invention described above with reference to FIG. 1 and most Although the configuration is the same, a first drum substitute roller 33 is adopted instead of only the first drum 31 of the first sputtering module 30, and the second drum 51 of the second sputtering module 50 is adopted. Instead, the only difference is that the second drum substitute roller 53 is adopted and applied. Therefore, hereinafter, only parts different from those of FIG. 1 will be described in detail and the remaining parts will be omitted. However, the omitted parts are applied in the same manner as the parts described with reference to FIG. 1 .

As shown in Figure 2, the first sputtering module 30 applied to the roll-to-roll sputtering apparatus 100 according to another embodiment of the present invention is in contact with the other surface of the substrate (s) in one direction (Fig. 2, but rotates in a counterclockwise direction), and a plurality of first drum substitute rollers 33 and a plurality of first drum substitute rollers 33 disposed to be spaced apart from each other on one surface of the substrate moving along A plurality of first sputters 35 for performing sputtering and a first partition wall 37 respectively disposed and formed between adjacent first sputters 35 to spatially separate the plurality of first sputters 35 from each other. It is configured to include, and the second sputtering module 50 rotates in the other direction (shown in the clockwise direction in FIG. 2) in a state in contact with one surface of the substrate (s), but a plurality of spaced apart from each other A second drum substitute roller 53, a plurality of second sputters 55 and the plurality of second sputtering for performing sputtering on the other surface of the substrate s moving along the plurality of second drum substitute rollers 53 In order to spatially separate the two sputters 55 from each other, it is configured to include a second partition wall 57 disposed and formed between adjacent second sputters 55, respectively, and the plurality of first drum substitute rollers 33 Each is disposed and formed at a position corresponding to the first partition wall 37 , and each of the plurality of second drum substitute rollers 53 is configured to be disposed and formed at a position corresponding to the second partition wall 57 .

The plurality of first drum substitute rollers 33 are transferred while rotating in one direction while in contact with the other surface of the substrate s transferred from the unwinding roller 10 in a state in which the tension is maintained. The plurality of first drum substitute rollers 33 are arranged to be spaced apart from each other by a predetermined distance, and are arranged to have a semicircular or oval shape as a whole. Accordingly, one surface of the substrate may be exposed in a state facing the plurality of first sputters 35 , whereby the substrate s is transported while being transferred with respect to one surface by the plurality of first sputters 35 . A thin film sputtering process may be performed.

The plurality of first sputters 35 are disposed along the side and lower portions of the plurality of first drum substitute rollers 33 and are spaced apart from the plurality of first drum substitute rollers 33 by a predetermined distance, A sputtering thin film is deposited on one surface of the substrate (s) spaced apart from each other by a predetermined distance to move along the plurality of first drum substitute rollers 33 . As a result, predetermined thin film layers may be deposited on one surface of the substrate s passing through the first sputtering module 30 .

On the other hand, the plurality of second drum substitute rollers 53 move the substrate in the other direction (the plurality of) while in contact with one surface of the substrate s transferred from the first sputtering module 30 in a state in which the tension is maintained. to be transferred while rotating in the direction opposite to the direction of rotation of the first drum substitute roller 33 of the Also, the plurality of second drum substitute rollers 53 are arranged to be spaced apart from each other by a predetermined distance, and are arranged to have a semicircular or elliptical shape as a whole. Accordingly, the other surface of the substrate (s) may be exposed in a state facing the plurality of second sputters 55, whereby the substrate (s) is transferred by the plurality of second sputters 55 while being transported. It may be subjected to a thin sputtering process for the other surface.

The plurality of second sputters 55 are disposed along the side and lower portions of the plurality of second drum substitute rollers 53 and spaced apart from the plurality of second drum substitute rollers 53 by a predetermined distance, A sputtering thin film is deposited on the other surface of the substrate (s) spaced apart from each other by a predetermined distance to move along the plurality of second drum substitute rollers 53 . As a result, predetermined thin film layers may be deposited on the other surface of the substrate s passing through the second sputtering module 50 .

On the other hand, as shown in FIG. 2, the first sputtering module 30 is disposed and formed between adjacent first sputters 35 in order to spatially separate the plurality of first sputters 35 from each other. It is configured to include a first partition wall 37, and the second sputtering module 50 is also disposed between adjacent second sputters 55 to spatially separate the plurality of second sputters 55 from each other. It is configured to include a second partition wall (57) formed.

The first partition wall 37 is adopted and applied to prevent the target material sputtered by each of the plurality of first sputters 35 from flying to another first sputter 35 (especially an adjacent first sputter). By adopting and applying the first partition wall 37, it is possible to prevent the target material sputtered by each first sputter 35 from flying to the other adjacent first sputters 35, and through this, it is possible to prevent the other adjacent first sputters 35 from flying. 1 By preventing contamination of the sputter 35, it is possible to maintain the deposition quality.

Also, in the same way, the second barrier rib 57 prevents the target material sputtered by each of the plurality of second sputters 55 from flying to another second sputter 55 (especially an adjacent second sputter). Adopt and apply to By adopting and applying the second partition wall 57, it is possible to prevent the target material sputtered by each second sputter 55 from flying to another adjacent second sputter 55, and through this, it is possible to prevent other adjacent second sputters 55 from flying. 2 By preventing contamination of the sputter 55, it is possible to maintain the deposition quality.

On the other hand, it is preferable for the deposition quality that the flexible substrate (s) transferred along the plurality of first drum substitute rollers 33 face the first sputter 35 facing each other on a flat surface rather than a curved surface. To this end, each of the plurality of first drum substitute rollers 33 is disposed and formed at a position corresponding to the first partition wall 37 .

Specifically, each of the first drum substitute rollers 33 is disposed to correspond to each of the first bulkheads 37 , and when the correspondingly disposed first bulkheads 37 extend, the corresponding first bulkheads (37) disposed in a position to coincide with the upper surface (the side corresponding to the edge opposite to the substrate (s) or the corresponding first drum substitute roller 33), or the corresponding first partition wall 37 It is arranged so that it can be positioned in contact with the upper surface or the lower surface. As a result, the flexible substrate positioned between the adjacent first partition walls 37 can be maintained in a taut state by the adjacent first drum substitute roller 33 , thereby facing each first sputter 35 . Since the flexible substrate (s) can maintain a flat state, it is possible to improve the quality of thin film deposition on one surface of the substrate.

Also, roughly the same. It is preferable for the quality of deposition that the flexible substrate s transferred along the plurality of second drum substitute rollers 53 face the second sputter 55 facing each other with a flat surface rather than a curved surface. To this end, each of the plurality of second drum substitute rollers 53 is disposed and formed at a position corresponding to the second partition wall 57 .

Specifically, each of the second drum substitute rollers 53 is disposed to correspond to each of the second bulkheads 57 , and when the correspondingly disposed second bulkheads 37 extend, the corresponding second bulkheads (37) is disposed in a position to coincide with the upper surface (the side corresponding to the edge opposite to the substrate (s) or the corresponding second drum substitute roller 53), or the corresponding second partition wall 57 It is arranged so that it can be positioned in contact with the upper surface or the lower surface. As a result, the flexible substrate positioned between the adjacent second partition walls 37 can be maintained in a taut state by the adjacent second drum substitute roller 53 , thereby facing each second sputter 35 . Since the flexible substrate (s) can maintain a flat state, it is possible to improve the quality of the thin film deposition on the other surface of the substrate.

On the other hand, the tension / guide roller 90 applied to the roll-to-roll sputtering apparatus 100 according to an embodiment of the present invention performs an operation that can be transferred in an aligned state without wrinkling the flexible substrate, as described above. . A detailed configuration and operation of the tension/guide roller 90 for this purpose will be described as follows.

The tension/guide roller 90 according to the present invention may be applied to an apparatus for performing the roll-to-roll process shown in FIGS. 1 and 2 . That is, the tension/guide roller 90 according to the embodiment of the present invention is disposed between the unwinding roller 10 and the rewinding roller 70, and the unwinding roller 10 and the rewinding roller 70 are mutually An operation is performed so that a flexible substrate such as a film transferred by rotational force can be smoothly transferred. Specifically, the tension / guide roller 90 according to the present invention allows the flexible substrate to be transported while being guided in an aligned state between the unwinding roller 10 and the rewinding roller 70, and furthermore, the main room is supported It performs an operation that allows it to be transferred in a state in which the tension is maintained.

Such a tension/guide roller 90 according to an embodiment of the present invention is shown in FIGS. 3 and 4 . 3 is a perspective view of a tension/guide roller 90 according to an embodiment of the present invention, and FIG. 4 is a schematic cross-sectional view at both ends of the tension/guide roller 90 according to an embodiment of the present invention.

3 and 4 , the tension/guide roller 90 according to an embodiment of the present invention includes a rotation shaft 91 , a bearing 93 , an elastic support module 95 and a bracket 94 . is composed

The rotating shaft 91 is disposed transverse to the moving direction of the substrate, and a rolling pad 92 contacting the moving substrate is formed on the circumferential surface. The rotation shaft 91 basically rotates the moving substrate, ie, a flexible substrate such as a film while riding it. Accordingly, both ends 91a of the rotating shaft 91 are disposed in a state of being mounted on the bearing 93 .

Since the rotation shaft 91 is mounted on the bearing 93 and operates to rotate when the flexible substrate passes, the circumferential surface of the rotation shaft 91 does not damage the flexible substrate, such as scratches, and the flexible substrate It is preferable to be configured to have a constant frictional force so that it can be transferred while maintaining this tension. To this end, a rolling pad 92 is mounted on the circumferential surface of the rotation shaft 91 so that the transported flexible substrate can come into contact and ride through.

The rolling pad 92 is preferably formed of a material that can maintain a constant frictional force between the substrate and the substrate and does not damage the substrate. The rolling pad 92 is preferably formed on a portion of the circumferential surface of the rotation shaft 91 , excluding both end portions 91a on which the bearing 93 is mounted while being wrapped around it.

Since the rotation shaft 91 is mounted to rotate while riding the substrate, it is disposed in a direction orthogonal to the transfer direction of the substrate, that is, transverse to the transfer direction of the substrate.

The bearings 93 are mounted on both ends 91a of the rotation shaft 91 so that it can be rotated according to the transfer of the substrate. That is, the bearings 93 are disposed to contact and surround the both ends 91a of the rotation shaft 91 , respectively. Therefore, when the bearing 93 is fixedly disposed, the rotation shaft 91 can rotate freely when the flexible substrate passes along the circumferential surface.

The rotating shaft 91 according to the present invention can be freely rotated by the rotational force generated while the substrate passes along the circumferential surface, and in response to external forces (force applied by the transferred substrate to the rotational shaft) generated in various directions. It is arranged so that it can move in various directions. To this end, the bearings 93 mounted to surround both ends 91a of the rotation shaft 91 need not only be fixed so as not to rotate, but also have a circumferential surface elastically supported.

In this way, the bearing 93 is arranged to be fixedly supported so that it can move in various directions, specifically, a radial direction (a direction indicated by a red dotted arrow in FIG. 4 ) without being rotated. For this purpose, in the present invention, the elastic support module (95) is adopted and applied.

The elastic support module 95 applied to the present invention supports the circumferential surface of the bearing 93 so that elastic force is maintained, and supports the bearing 95 so that it can freely move in the radial direction. The elastic support module 95 supports the circumferential surface of the bearing 93 . Therefore, basically, the bearing 93 can maintain a non-rotated state, and through this, the rotation shaft 91 mounted on the bearing 93 can freely rotate according to the contact transfer of the substrate.

In addition, the elastic support module 95 supports the circumferential surface of the bearing 93 but supports it so that the elastic force is maintained. Accordingly, when an external force is applied to the rotating shaft 91 by the transfer substrate, the bearings 93 mounted on both ends 91a of the rotating shaft 91 overcome the elastic force in response to the external force in various directions. can move with Since the elastic support module 95 elastically supports the circumferential surface of the bearing so that the bearing 93 can freely move (movable) in the radial direction, the bearing 93 is generated on the rotation shaft 91 . It can move in various radial directions in response to external forces in various directions.

The bearing 93, including the elastic support module 95, needs to be protected and blocked from the outside, and further needs to be fixedly disposed on the surrounding structure. To this end, the elastic support module 95 for elastically supporting the bearing 93 is protected by being surrounded by the bracket 94 . That is, the bracket 94 according to the present invention performs an operation of enclosing and fixing the elastic support module 95 .

Since the bracket 94 is disposed to surround the elastic support module 95 , the bearing 93 , which is wrapped while being elastically supported by the elastic support module 95 , is also surrounded by the bracket 94 . form can be protected. The bracket 94 is fixed to the surrounding structure while fixing the outside of the elastic support module 95 . The elastic support module 95 is arranged to elastically support the bearing 93 , but it is necessary to maintain a state in which the outer part is fixed inside the bracket 94 in order to elastically support it. Since the bracket 94 is stably fixed to the surrounding structure, the elastic support module 95 mounted inside the bracket 94 may also be stably disposed.

As described above, the elastic support module 95 needs to be arranged so that the bearing 93 can freely move in the radial direction. Although there are various structures capable of performing such an operation, the elastic support module 95 in the present invention The support module 95 is adopted and applied so that it can have a structure that is structurally simple and facilitates replacement and maintenance while smoothing the radial movement of the bearing 93 .

To this end, as shown in FIG. 4 , the elastic support module 95 according to the present invention is arranged at a predetermined distance along the circumferential surface of the bearing 93 and configured in plurality, and a plurality of elastic support modules 95 ) is disposed in a radial structure as a whole, and each of the elastic support modules 95 surrounds the bearing 93 in a spaced state and is fixedly disposed inside the bracket 94 , the fixed cylinder 96 and the bearing 94 . ), one end is connected to the close contact portion 97 and the other end is extended through the fixed tube 96 and the support rod 98 and the support rod 98 are wrapped It is configured to include an elastic spring 99 interposed between the contact portion 97 and the fixed tube 96 in a state of being disposed in a state with an elastic force.

Specifically, the elastic support module 95 applied to the present invention is configured in plurality to elastically support the bearing 93 to move efficiently and stably in the radial direction. To this end, the plurality of elastic support modules 95 are arranged to be spaced apart from each other by a predetermined distance along the circumferential surface of the bearing 93 to elastically support the circumferential surface of the bearing 93 at a plurality of points. As a result, the plurality of elastic support modules 95 are arranged to elastically support the bearing 93 in a radial structure as a whole, and are arranged to move in a radial direction.

Each elastic support module 95 is configured to include a fixed cylinder 96 , a contact portion 97 , a support rod 98 , and an elastic spring 99 .

The fixing cylinder 96 surrounds the bearing 93 in a spaced apart state and is fixedly disposed inside the bracket 94 . That is, the fixed cylinder 96 has a cylindrical shape as a whole and is disposed to surround the bearing 93 , and is spaced apart from the circumferential surface of the bearing 93 . Accordingly, a space is formed by being spaced apart between the circumferential surface (outer surface) of the bearing 93 and the inner surface of the fixed cylinder 96, and in this space, the contact portion 97, the support rod 98, and the An elastic spring 99 is disposed.

The fixing tube 96 is stably fixed inside the bracket 94 . That is, the fixing tube 96 is fixed to the bracket 94 to maintain a stable state. It is preferable that the fixing tube 96 is detachably fixed to the bracket 94 . Through this, the attachment and detachment, maintenance, and replacement of the elastic support module 95 can be facilitated.

The contact portion 97 is disposed in close contact with the bearing 93 . The contact portion 97 is arranged to be in close contact with the peripheral surface point portion of the bearing 93 elastically supported by each of the elastic support modules 95 . The contact surface (surface in contact with the bearing) of the contact portion 97 is preferably curved in the same shape as the circumferential surface (outer surface) of the bearing 93 . Accordingly, the contact portion 97 may be firmly and stably attached to the circumferential surface of the bearing 93 .

The support rod 98 is connected to the upper surface (opposite surface of the contact surface) of the contact part 97 to be erected and extended. Preferably, the support rod 98 is connected to the upper surface of the contact part 97 and extends in the vertical direction so as to penetrate through the fixing tube 96 and be exposed to the outside. That is, one end of the support rod 98 is connected to the contact portion 97 and the other end extends through the fixing tube 96 .

Since the other end of the support rod 98 is extended so as to be exposed to the outside through the fixing tube 96 , the contact portion 97 to which one end is connected is in close contact with the circumferential surface of the bearing 93 . If it is in the state of being in a stable state, it is possible to maintain a stable posture without being separated. However, when the bearing 93 moves in a direction away from the fixed tube 96 , the other end of the support rod 98 may move inside the fixed tube 96 , and in this case, the support rod 98 is the Since it cannot be supported by the fixed tube 96 (specifically, the through hole of the fixed tube 96), a problem of separation occurs. In order to solve this problem, the other end of the support rod 98 is exposed to the outside through the fixed tube 96 longer than the length at which the bearing 93 can move in a direction away from the fixed tube 96 . It is preferable to be

The contact portion 97 must be in close contact with the circumferential surface of the bearing 93 while maintaining an elastic force. For this, the contact portion 97 is disposed to receive the elastic force of the elastic spring 99 . The elastic spring 99 is interposed between the contact portion 97 and the fixing tube 96 in a state in which the support rod 98 is wrapped, and is disposed in a state with an elastic force. That is, the elastic spring 99 is disposed to have an elastic force in a state in which one side is in close contact with the upper surface of the contact part 97 and the other side is in contact and contact contact with the inner surface of the fixing tube 96 . As a result, the contact portion 97 may maintain a contact-contact state while pushing the circumferential surface of the bearing 93 by the elastic force of the elastic spring 99 .

Since the elastic support module 95 having such a configuration elastically supports the bearing 93 at a plurality of points along the circumferential surface of the bearing 93 , the bearing 93 is mounted on both ends 91a of the rotation shaft 91 . may be elastically supported in the radial direction, and, as a result, may freely move in the radial direction in response to external forces in various directions generated according to the transfer of the flexible substrate. Due to this, the rotation shaft 91 can freely move as if dancing, and as a result, the flexible substrate is not wrinkled and the tension is maintained and aligned and transported.

Through the plurality of elastic support modules 95, it is possible to elastically support points spaced apart by a predetermined distance along the circumferential surface of the bearing 93, and eventually the bearing 93 (specifically, both sides of the rotation shaft 91). The end portion 91a) can be freely moved (moved) in the radial direction.

The elastic springs 99 constituting the plurality of elastic support modules 95 in order to more freely and smoothly move the bearings (specifically, both ends 91a of the rotation shaft 91) in various directions. ), it is desirable to vary and apply the elastic force to each other appropriately. In particular, considering the weight of the bearing 93 supporting both ends 91a of the rotating shaft 91 and the distributed rotating shaft 91, and considering the position of the contact supporting part of the bearing 93, It is necessary to apply by varying the elastic force of each elastic spring 99 of each elastic support module 95 .

To this end, the elastic springs 99 constituting each of the elastic support modules 95 applied to the present invention have different elastic forces from each other, and the elastic support module 95, which supports the lowermost side of the bearing 93 ( In FIG. 4 , the elastic spring 99 constituting the elastic support module disposed at the lowermost center of the eight elastic support modules) has the largest elastic force, and the elastic support module supports the uppermost side of the bearing 93 . It is preferable that the elastic spring 99 constituting the (95) (in FIG. 4, the elastic support module disposed at the uppermost center among the eight elastic support modules) has the smallest elastic force.

In this way, although the elastic force of the elastic spring 99 of each elastic support module 95 is appropriately variably applied, the elastic force having different elastic forces is applied in consideration of the load of the bearing 93 and the like and the position where the elastic support is elastically supported. By adopting and applying a spring, the bearing 93 can move freely and smoothly by the plurality of elastic support modules 95 .

According to the present invention tension/guide roller 90 having the configuration and operation described above, an unwinding roller (indicated by reference numeral 10 in FIGS. 1 and 2) and a rewinding roller (reference numeral 70 in FIGS. 1 and 2) is arranged between the flexible substrates so that both ends can freely move in response to external forces in various directions generated according to the contact transfer of the flexible substrate, so that the flexible substrate can be guided and transported in an aligned state. At the same time, there is an advantage in that the flexible substrate can be transferred without wrinkling and with tension maintained.

In addition, according to the present invention, since the elastic support module 95 constituting the tension/guide roller 90 is formed in a simple structure and configured to be assembled and detachable, maintenance and replacement of the elastic support module 95 is reduced. There is an effect of allowing easy adoption and application of an elastic support module capable of maintaining an easy and various elastic force as desired.

Although the embodiments according to the present invention have been described above, these are merely exemplary, and those of ordinary skill in the art will understand that various modifications and equivalent ranges of embodiments are possible therefrom. Accordingly, the true technical protection scope of the present invention should be defined by the following claims.

s: substrate 1: unwinding chamber
3: first process chamber 5: second process chamber
7: rewinding chamber 10: unwinding roller
30: first sputtering module 31: first drum
33: first drum substitute roller 35: first sputter
37: second barrier rib 50: second sputtering module
51: second drum 53: second drum substitute roller
55: second sputter 57: second partition wall
70: rewinding roller 90: tension / guide roller
91: rotation shaft 91a: rotation shaft end
92: rolling pad 93: bearing
94: bracket 95: elastic support module
96: fixed cylinder 97: close contact
98: support bar 99: elastic spring
100: roll-to-roll sputtering device

Claims (4)

In the roll-to-roll sputtering device,
an unwinding roller for unwinding the substrate;
a first sputtering module moving one surface of the substrate transferred from the unwinding roller in a state in which tension is maintained to be exposed, and performing a sputtering process on one surface of the substrate;
a second sputtering module moving so that the other surface of the substrate transferred from the first sputtering module in a state in which the tension is maintained is exposed, and performing a sputtering process on the other surface of the substrate;
a rewinding roller for rewinding the substrate transferred from the second sputtering module in a state in which the tension is maintained;
It is disposed between the unwinding roller and the first sputtering module, between the first sputtering module and the second sputtering module, and between the second sputtering module and the rewinding roller so that the moving substrate can maintain the tension and guide it. including tension/guide rollers that allow
The tension/guide roller is
Doedoe disposed transverse to the moving direction of the substrate, a rotating shaft on which a rolling pad in contact with the moving substrate is formed on a circumferential surface, is disposed to contact and surround both ends of the rotating shaft, respectively, so that it can move in a radial direction without being rotated A bearing disposed so as to be fixedly supported by an elastic support module, an elastic support module that supports a circumferential surface of the bearing to maintain an elastic force, and supports the bearing so that it can freely move in a radial direction, and the elastic support module is wrapped and fixed including a bracket that
The elastic support module is arranged at a predetermined distance along the circumferential surface of the bearing and is configured in plurality, and the plurality of elastic support modules are disposed in a radial structure as a whole,
Each of the elastic support modules includes a fixing tube which surrounds the bearing in a spaced apart state and is detachably and fixedly disposed inside the bracket, is disposed in close contact with the bearing, and the contact surface is bent in the same shape as the circumferential surface of the bearing A support rod having one end connected to the contact part and the other end extending through the fixing tube, and an elasticity disposed between the contact portion and the fixing tube in a state of enclosing the support rod and having an elastic force includes a spring,
The elastic springs constituting the respective elastic support modules have different elastic forces, the elastic springs configuring the elastic support module supporting the lowermost side of the bearing have the largest elastic force, and the elastic springs supporting the uppermost side of the bearing The elastic spring constituting the support module has the smallest elastic force,
The other end of the support rod is a roll-to-roll sputtering apparatus, characterized in that the bearing is exposed to the outside through the fixed tube greater than the length that can move in a direction away from the fixed tube.
The method according to claim 1,
The rewinding roller is a roll-to-roll sputtering apparatus, characterized in that disposed between the first sputtering module and the second sputtering module.
The method according to claim 1,
The first sputtering module comprises a first drum rotating in one direction while in contact with the other surface of the substrate and a plurality of first sputters performing sputtering on one surface of the substrate moving along the first drum become,
The second sputtering module includes a plurality of second sputters for performing sputtering on the other surface of the substrate moving along the second drum and the second drum rotating in the other direction while in contact with one surface of the substrate. Roll-to-roll sputtering device, characterized in that it is configured.
The method according to claim 1,
The first sputtering module rotates in one direction while in contact with the other surface of the substrate, and a plurality of first drum substitute rollers arranged to be spaced apart from each other, and a plurality of first drum substitute rollers moving along the one surface of the substrate A plurality of first sputters performing sputtering and a first barrier rib disposed and formed between adjacent first sputters to spatially separate the plurality of first sputters from each other,
The second sputtering module rotates in the other direction while in contact with one surface of the substrate, and a plurality of second drum substitute rollers and a plurality of second drum substitute rollers disposed to be spaced apart from each other. On the other surface of the substrate moving along the plurality of second drum substitute rollers A plurality of second sputters for performing sputtering with respect to each other and a second barrier rib disposed and formed between adjacent second sputters in order to spatially separate the plurality of second sputters from each other;
Each of the plurality of first drum substitute rollers is disposed and formed at a position corresponding to the first bulkhead, and each of the plurality of second drum substitute rollers is disposed and formed at a position corresponding to the second bulkhead. Two-roll sputtering device.

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