KR20130125900A - Roll-to-roll sputtering apparatus - Google Patents

Roll-to-roll sputtering apparatus Download PDF

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Publication number
KR20130125900A
KR20130125900A KR1020120049518A KR20120049518A KR20130125900A KR 20130125900 A KR20130125900 A KR 20130125900A KR 1020120049518 A KR1020120049518 A KR 1020120049518A KR 20120049518 A KR20120049518 A KR 20120049518A KR 20130125900 A KR20130125900 A KR 20130125900A
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KR
South Korea
Prior art keywords
roll
rollers
flexible substrate
sputtering apparatus
sputter
Prior art date
Application number
KR1020120049518A
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Korean (ko)
Inventor
오정홍
Original Assignee
삼성코닝정밀소재 주식회사
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Priority to KR1020120049518A priority Critical patent/KR20130125900A/en
Publication of KR20130125900A publication Critical patent/KR20130125900A/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Abstract

The present invention relates to a roll-to-roll sputtering apparatus, and more particularly, to a roll-to-roll sputtering apparatus for forming a vapor-deposited film on a flexible substrate by a sputtering deposition method.
To this end, the present invention is a roll-to-roll sputtering apparatus for forming a deposition film on a flexible substrate, the cooling drum or a plurality of rollers (roller) is selectively mounted detachably Transfer unit; And a sputter disposed around the conveying part to sputter a target material onto one surface of the flexible substrate conveyed by the conveying part.

Description

[0001] ROLL-TO-ROLL SPUTTERING APPARATUS [0002]

The present invention relates to a roll-to-roll sputtering apparatus, and more particularly, to a roll-to-roll sputtering apparatus for forming a vapor-deposited film on a flexible substrate by a sputtering deposition method.

In general, a liquid crystal display of a flexible display, an organic EL display, an E-ink, and the like are used as a substrate that surrounds a liquid crystal, and a polymer thin film having good flexibility is used.

A transparent conductive film or a functional coating layer made of ITO, ZnO, SnO 2 , In 2 O 3 , Nb 2 O 5 , SiO x , or the like is formed on the polymer thin film by a roll-to-roll sputtering apparatus .

Conventional roll-to-roll sputtering apparatus has a cooling drum to prevent the polymer thin film from melting or deformation due to heat during the deposition film formation process by the sputtering deposition method due to the poor heat resistance of the polymer thin film used as a substrate have.

Meanwhile, with the recent development of displays and related IT industries, various devices have been developed. Accordingly, technology for manufacturing substrates using thin glass instead of polymer plastic films has been developed.

However, when a conventional roll-to-roll sputtering apparatus is used to coat a transparent conductive film or a functional layer on such thin glass, the resistivity or permeation of the deposited film formed on the thin glass substrate by cooling the thin glass by a cooling drum There arises a problem that the characteristics are deteriorated.

The present invention has been made to solve the problems of the prior art as described above, an object of the present invention in forming a deposition film by the sputtering deposition method, a hybrid type that can use a polymer thin film and thin glass as a substrate It is to provide a roll-to-roll sputtering apparatus.

To this end, the present invention is a roll-to-roll sputtering apparatus for forming a deposition film on a flexible substrate, the cooling drum or a plurality of rollers (roller) is selectively mounted detachably Transfer unit; And a sputter disposed around the conveying part to sputter a target material onto one surface of the flexible substrate conveyed by the conveying part.

The transfer unit may include a heater mounted on the other surface of the flexible substrate, on which the plurality of rollers are mounted, being transferred by the plurality of rollers, and having a deposition film formed on one surface thereof.

The plurality of rollers may be disposed in a circular shape, and preferably, the plurality of rollers may be disposed in a circular shape having an outer diameter equal to an outer diameter of the cooling drum.

 In addition, the flexible substrate may be a thin glass or a polymer thin film, the polymer thin film is PET (Polyethylene Terephthalate), PES (Polyether Sulfone), PI (Polyimide), PEN (Polyethylene Naphthalate), PAR (Polyarylate), PC (polycarbonate) can be made of any one.

In addition, the plurality of sputters may be provided, wherein the transfer unit is mounted on the other surface side of the flexible substrate on which the plurality of rollers are mounted and is transported by the plurality of rollers and a deposition film is formed on one surface thereof. And a gas separation block that prevents the target material sputtered by each of the four sputters from flying to another sputter.

Here, the gas separation block may be disposed between the rollers, it may be made of a heater.

In addition, the cooling drum may have a flow path through which cooling water flows to maintain the flexible substrate on which the deposition film is formed at a predetermined temperature.

In addition, the roll-to-roll sputtering apparatus, the transfer unit and the sputter may be made of a plurality of pairs.

According to the present invention, the transfer unit is configured to selectively mount a cooling drum or a plurality of rollers according to the type of the flexible substrate on which the deposition film is to be formed, so that one roll-to-roll sputtering device has excellent physical / A vapor deposition film having chemical properties can be formed.

In addition, according to the present invention, it is possible to operate the equipment according to the market situation of the flexible substrate (glass or polymer film), it is possible to reduce the equipment investment and ensure process diversity.

1 to 3 is a schematic view showing a roll-to-roll sputtering apparatus according to an embodiment of the present invention.

Hereinafter, a roll-to-roll sputtering apparatus according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

In the following description of the present invention, detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

1 and 2 is a schematic view showing a roll-to-roll sputtering apparatus according to an embodiment of the present invention.

1 and 2, the roll-to-roll sputtering apparatus according to the present invention includes an unwinder roll 10, a winder roll 20, a plurality of guide rollers 10a and 20a, It may include a transfer unit 100, and the spur 200.

The unwinder roll 10 and the winder roll 20 unwind or wind the flexible substrate by mutual rotational movements.

The plurality of guide rollers 10a and 20a are arranged at regular intervals so that the tension control is desired when the flexible substrate is rolled. In this case, a tension adjusting device and a tension control sensor may be attached to the guide roller so that the flexible substrate is rolled with a constant tension.

The flexible substrate is continuously conveyed to the transfer part 100 by the mutual mechanical operation of the unwinder roll 10, the winder roll 20, and the plurality of guide rollers 10a and 20a.

The flexible substrate to be transferred may be thin glass or a polymer thin film, and the polymer thin film may be a polyethylene terephthalate (PET), a polyether sulfate (PES), a polyimide (PI), a polyethylene naphthalate (PEN), a polylate (PAR), or a PC ( polycarbonate).

The cooling drum 110 or the plurality of rollers 120 are selectively mounted on the transfer unit 100 so as to be detachably attached to and transferred from the flexible substrate. Here, the plurality of rollers 120 may be formed by arranging a plurality of rollers 120a, 120b, 120c, 120d, 120e, and 120f at regular intervals, and the number of rollers is not particularly limited.

In the transfer unit 100, a target material discharged by the sputter 200 to be described later on one surface of the flexible substrate transferred by the cooling drum 110 or the plurality of rollers 120 selectively mounted on the transfer unit 100. A deposition process is performed in which constituent atoms are deposited.

Preferably, when the flexible substrate on which the deposition film is to be formed is a polymer thin film, the cooling drum 110 is mounted on the transfer part 100, and when the flexible substrate on which the deposition film is to be formed is thin glass, a plurality of rollers ( 120 will be mounted.

As such, the transfer unit 100 may be configured to selectively mount the cooling drum 110 or the plurality of rollers 120 according to the type of the flexible substrate on which the deposition film is to be formed. And a deposition film having excellent thin film characteristics on the thin glass. That is, when the deposition film is formed on the polymer film having low heat resistance, the cooling drum 110 is mounted to prevent the polymer film from being melted or thermally deformed by heat during the sputter deposition process, and the deposition film is formed on the thin glass having excellent heat resistance. In this case, by mounting the plurality of rollers 120 to prevent the thin glass from cooling, the crystallinity of the deposited film deposited on the thin glass may be increased, thereby improving the resistivity and transmission characteristics of the deposited film.

The cooling drum 100 or the plurality of rollers 120 may be smoothly polished to prevent scratches on the flexible substrate due to contact with the flexible substrate. In addition, the transfer speed of the flexible substrate and the rotation speed of the cooling drum 110 or the plurality of rollers 120 may be controlled to match.

On the other hand, the cooling drum 110 has a flow path (not shown) through which cooling water can flow to maintain or maintain a flexible substrate, preferably a polymer thin film, by dispersing or removing thermal energy generated in a deposition process. Can be formed.

In addition, the plurality of rollers 120 mounted on the transfer part 100 may be disposed in a circular shape, and preferably, the rollers 120 may be disposed in a circular shape having the same outer diameter as the outer diameter of the cooling drum 110. As such, the plurality of rollers 120 are disposed in a circular shape having the same outer diameter as that of the cooling drum 110, thereby providing other units (eg, guide rollers 10a and 20a and sputters) installed in the roll-to-roll sputtering apparatus. By selectively mounting only the cooling drum 110 or the plurality of rollers 120 without changing the installation of the 200, etc., the roll-to-roll sputtering device can be operated quickly and simply.

In addition, when the plurality of rollers 120 are mounted on the transfer unit 100, the transfer unit 100 may be transferred by the plurality of rollers 120, and a sputtered film 200 may be formed on one surface by a sputter 200 to be described later. A heater (not shown) may be provided on the other surface side. When the plurality of rollers 120 are arranged in a circle, a heater (not shown) may be provided in a circle formed by the plurality of rollers 120.

That is, the transfer unit 100 may further include a heater (not shown) for heating the opposite side of the flexible substrate, preferably thin glass, which is transferred by the plurality of rollers 120 and has a deposition film formed on one surface thereof. have. In this way, the heater (not shown) heats the opposite side of the deposition film formation of the thin glass on which the deposition film is formed, thereby increasing the crystallinity of the deposition film, thereby improving the resistivity and transmission characteristics of the deposition film.

The sputter 200 includes a target, which is a material for forming a deposition film, and a cathode, which is a power source for releasing constituent atoms of the target, and is disposed around the transfer unit 100 and is transferred by the transfer unit 100. Sputtering the target material on one side of the substrate.

The target may be made of any one material of indium tin oxide (ITO), SnO 2 , ZnO, CdSnO 4 , indium zinc oxide (IZO), Si, SiO 2 , and NbO x .

The sputter 200 may sputter the target material by various methods such as DC sputtering, MF sputtering, RF sputtering, magnetron sputtering, and the like.

In addition, the sputter 200 according to the present invention may be a plurality. That is, the plurality of sputters 210, 220, 230, 240, and 250 may be disposed around the transfer part 100 to form a deposition film continuously and rapidly on one surface of the flexible substrate transferred by the transfer part 100.

However, when the plurality of sputters (210, 220, 230, 240, 250) in this way, when the plurality of rollers 120 is mounted in the transfer unit, sputtered in each sputter (210, 220, 230, 240, 250) The target material may fly to another sputter, thereby affecting the sputtering by the other sputter. In general, since the target constituting the sputter is wider than the flexible substrate on which the deposition film is formed, some target materials emitted from the target will pass through the flexible substrate and fly toward the other sputter. However, in the case where the cooling drum is attached to the transfer section, the width of the cooling drum is generally wider than the width of the target, so this problem does not occur.

Thus, the transfer unit 100 according to an embodiment of the present invention, when a plurality of rollers 120 is mounted on the transfer unit 100, the plurality of sputters 210, 220, 230, 240, 250, a plurality of rollers It is disposed on the other side of the flexible substrate which is transported by the 120 and the deposition film is formed on one surface, to prevent the target material sputtered by each sputter 210, 220, 230, 240, 250 from flying to another sputter. It may further comprise a gas separation block (gas separation block) (300).

As such, the gas separation block 300 prevents the target material sputtered by each sputter 210, 220, 230, 240, 250 from flying to another sputter, thereby preventing each sputter 210, 220, 230, 240, 250. Sputter deposition process by) will be able to be made smoothly.

Herein, the gas separation block 300 includes a plurality of gas separation blocks 301, 302, 303, 304, and 305 between the rollers 120a, 120b, 120c, 120d, 120e, and 120f as shown in FIG. 3. May be arranged respectively.

In addition, the gas separation block 300 may be made of a heater.

In addition, in the roll-to-roll sputtering apparatus according to the present invention, the transfer unit 100 and the sputter 200 may be formed in a plurality of pairs.

While the invention has been shown and described with reference to certain preferred embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims. This is possible.

Therefore, the scope of the present invention should not be limited by the described embodiments, but should be determined by the scope of the appended claims as well as the appended claims.

10: unwinder roll 20: winder roll
10a, 20a: guide roller 100: transfer section
110: cooling drum 120: a plurality of rollers
200: sputter 300: gas separation block

Claims (12)

In a roll-to-roll sputtering apparatus for forming a deposition film on a flexible substrate,
The roll-to-roll sputtering device,
A conveying unit to which a cooling drum or a plurality of rollers are selectively detachably mounted; And
And a sputter disposed around the conveying portion to sputter the target material onto one surface of the flexible substrate conveyed by the conveying portion.
The method of claim 1,
The transfer unit
The plurality of rollers are mounted,
Roll-to-roll sputtering apparatus, characterized in that it comprises a heater which is transferred by the plurality of rollers, and provided on the other surface side of the flexible substrate having a deposition film formed on one surface.
The method of claim 1,
Roll to roll sputtering device, characterized in that the plurality of rollers are arranged in a circular shape.
The method of claim 3,
Roll to roll sputtering apparatus, characterized in that the plurality of rollers are arranged in a circular shape having an outer diameter equal to the outer diameter of the cooling drum.
The method of claim 1,
The flexible substrate is a roll-to-roll sputtering apparatus, characterized in that the thin glass or polymer thin film.
The method of claim 5,
The polymer thin film is a PET (Polyethylene Terephthalate), PES (Polyether Sulfone), PI (Polyimide), PEN (Polyethylene Naphthalate), PAR (Polyarylate), PC (polycarbonate) roll-to-roll sputtering device, characterized in that made of any one.
The method of claim 1,
Roll-to-roll sputtering apparatus characterized in that the plurality of sputters.
The method of claim 7, wherein
The transfer unit
The plurality of rollers are mounted,
A gas separation block which is transported by the plurality of rollers and disposed on the other side of the flexible substrate having a deposition film formed on one surface thereof, to prevent the target material sputtered by each of the plurality of sputters from flying to another sputter; Roll to roll sputtering device characterized in that.
9. The method of claim 8,
Roll to roll sputtering device, characterized in that the gas separation block is disposed between each roller.
9. The method of claim 8,
Roll to roll sputtering apparatus, characterized in that the gas separation block is a heater.
The method of claim 1,
Wherein the cooling drum has a flow path through which cooling water flows in order to maintain a flexible substrate on which a vapor deposition film is formed at a predetermined temperature.
The method of claim 1,
The roll-to-roll sputtering device,
Roll-to-roll sputtering apparatus, characterized in that the transfer portion and the sputter is composed of a plurality of pairs.
KR1020120049518A 2012-05-10 2012-05-10 Roll-to-roll sputtering apparatus KR20130125900A (en)

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017051935A1 (en) * 2015-09-21 2017-03-30 (주)브이앤아이솔루션 Web substrate treating system
KR102136701B1 (en) 2019-02-18 2020-07-22 주식회사 테토스 Auxiliary rollers for roll―to―roll processes
KR20200100288A (en) 2019-02-18 2020-08-26 주식회사 테토스 Roll­to­roll sputtering apparatus
CN111607778A (en) * 2020-07-09 2020-09-01 北京载诚科技有限公司 Cooling equipment for coating, coating equipment and method and roll-to-roll film
CN112126905A (en) * 2020-09-25 2020-12-25 桂林电子科技大学 Multi-source magnetron sputtering deposition system
KR20220057710A (en) 2020-10-30 2022-05-09 (주)제이비에이치 Roll-to-roll vacuum evaporation device with optical inspection module
KR20220057711A (en) 2020-10-30 2022-05-09 (주)제이비에이치 Roll-to-roll vacuum deposition monitoring system using optical inspection module
KR20230031509A (en) 2021-08-27 2023-03-07 (주)제이비에이치 Roll-to-roll vacuum deposition device equipped with artificial intelligence-based optical inspection module
KR20230031510A (en) 2021-08-27 2023-03-07 (주)제이비에이치 Roll-to-roll vacuum deposition monitoring system using optical inspection module

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017051935A1 (en) * 2015-09-21 2017-03-30 (주)브이앤아이솔루션 Web substrate treating system
KR102136701B1 (en) 2019-02-18 2020-07-22 주식회사 테토스 Auxiliary rollers for roll―to―roll processes
KR20200100288A (en) 2019-02-18 2020-08-26 주식회사 테토스 Roll­to­roll sputtering apparatus
CN111607778A (en) * 2020-07-09 2020-09-01 北京载诚科技有限公司 Cooling equipment for coating, coating equipment and method and roll-to-roll film
CN111607778B (en) * 2020-07-09 2023-11-03 北京载诚科技有限公司 Cooling equipment for coating, coating equipment, method and roll-to-roll film
CN112126905A (en) * 2020-09-25 2020-12-25 桂林电子科技大学 Multi-source magnetron sputtering deposition system
KR20220057710A (en) 2020-10-30 2022-05-09 (주)제이비에이치 Roll-to-roll vacuum evaporation device with optical inspection module
KR20220057711A (en) 2020-10-30 2022-05-09 (주)제이비에이치 Roll-to-roll vacuum deposition monitoring system using optical inspection module
KR20230031509A (en) 2021-08-27 2023-03-07 (주)제이비에이치 Roll-to-roll vacuum deposition device equipped with artificial intelligence-based optical inspection module
KR20230031510A (en) 2021-08-27 2023-03-07 (주)제이비에이치 Roll-to-roll vacuum deposition monitoring system using optical inspection module

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