KR102259340B1 - Display device, display panel and fabricating method thereof - Google Patents

Abstract

In order to achieve the above object, the present invention relates to a display device, a display panel, and a method of manufacturing the same. In one aspect, the present invention provides a pixel electrode including a cutout pattern and connected to a thin film transistor and a pixel formed on the cutout pattern A display device including an organic light emitting layer in a single bank hole is provided.

Description

A display device, a display panel, and a method of manufacturing the same {DISPLAY DEVICE, DISPLAY PANEL AND FABRICATING METHOD THEREOF}

The present invention relates to a display device including a pixel having a repair structure, a display panel, and a method of manufacturing the same.

As the information society develops, the demand for a display device for displaying an image is increasing in various forms, and in recent years, a liquid crystal display (LCD), a plasma display device (PDP), and an organic light emitting diode (PDP) display device. Various display devices such as an organic light emitting display device (OLED) are being used. Such various display devices include a display panel suitable therefor.

In the display panel, thin film transistors are formed in each pixel region, and a specific pixel region in the display panel is controlled through the flow of current in the thin film transistor. A thin film transistor is composed of a gate and source/drain electrodes. During the process, a material for forming the gate and source/drain electrodes is used to form wirings (lines) constituting a circuit in the same process. Meanwhile, a structure in which a pixel electrode that controls a pixel area is repaired so that the corresponding pixel area can be used even when a defect occurs has been proposed. However, when the repair structure is applied, a portion of the pixel electrode is designed for repair, and thus there is a problem in that the aperture ratio is reduced. Therefore, there is a need for a technique for maintaining an aperture ratio while applying a repair structure.

Against this background, it is an object of the present invention to provide a display panel including a single bank hole, a display device, and a method for manufacturing the same so that an organic light emitting layer is formed on a cut pattern for a repair structure in order to increase an aperture ratio in a pixel of a repair structure. is to provide

In order to achieve the above object, in one aspect, the present invention provides a display device including a cut pattern, a pixel electrode connected to a thin film transistor, and an organic light emitting layer in a single bank hole for each pixel formed on the cut pattern.

In another aspect, the present invention provides a display panel including a circuit unit and a light emitting unit electrically connected to the circuit unit, wherein the light emitting unit is formed on a cut pattern and includes an organic light emitting layer in a single bank hole in the light emitting unit.

In another aspect, the present invention provides a method for manufacturing a display panel comprising forming a first electrode including a cut pattern and forming a bank insulating film exposing the cut pattern of the first electrode to form a single bank hole on the first electrode do.

As described above, according to the present invention, the pixel electrode is divided into two or more regions, and when a defect occurs in some of these regions, the cut pattern connected to the partial region is removed to remove the other partial region of the pixel electrode. As silver emits light as it is, the organic light emitting layer increases the overall luminous efficiency of the panel.

According to the present invention, a single bank hole is formed on a pixel electrode having a repair structure including a cut pattern to allow the organic light emitting layer to emit light from the pixel electrode, thereby increasing luminous efficiency.

According to the present invention, since a bank hole is formed on the cut pattern for repair and the organic light emitting layer is positioned, the organic light emitting layer emits light when the cut pattern is maintained, thereby increasing the luminous efficiency of the entire panel.

1 is a diagram schematically illustrating a display device according to example embodiments.
2 is a diagram illustrating a basic pixel structure of an organic light emitting diode display according to example embodiments.
3 is a diagram illustrating a process of performing repair when a defect occurs in a light emitting part of a light emitting area by applying an embodiment of the present invention.
4 is a view illustrating various shapes of a pixel electrode for repair to which an embodiment of the present invention is applied.
5 is a diagram illustrating a pixel having a repair structure. 591 is a diagram in which the pixel electrode is formed in a repair structure.
6 is a view showing the loss of the aperture ratio.
7 and 8 are diagrams of one bank open area according to an embodiment of the present invention.
8 is a view showing a configuration when a single bank hole is formed on a cut pattern for repair according to an embodiment of the present invention.
9 is a view showing a cross-section taken along line I-I' of FIG. 8 according to an embodiment of the present invention.
FIG. 10 is a view showing a cross-section taken along line II-II′ of FIG. 8 according to an embodiment of the present invention.
11 is a diagram illustrating a case in which an organic light emitting layer emits light when a cut pattern is maintained in a repair structure.
12 is a diagram illustrating a region in which an organic light emitting layer emits light when a cut pattern is removed from a repair structure.
13 to 15 are diagrams illustrating an exemplary embodiment in which a single bank hole is formed on the pixel electrode having various repair structures as shown in FIG. 4 .
16 is a flowchart illustrating a process of manufacturing a display panel according to an exemplary embodiment of the present invention.

Hereinafter, some embodiments of the present invention will be described in detail with reference to exemplary drawings. In adding reference numerals to elements of each drawing, the same elements may have the same numerals as possible even if they are indicated on different drawings. In addition, in describing the present invention, when it is determined that a detailed description of a related known configuration or function may obscure the subject matter of the present invention, the detailed description may be omitted.

In addition, in describing the constituent elements of the present invention, terms such as first, second, A, B, (a) and (b) may be used. These terms are only for distinguishing the component from other components, and the nature, order, order, or number of the component is not limited by the term. When a component is described as being "connected", "coupled" or "connected" to another component, the component may be directly connected or connected to that other component, but other components between each component It should be understood that "interposed" or that each component may be "connected", "coupled" or "connected" through other components.

1 is a diagram schematically illustrating a display device according to example embodiments.

Referring to FIG. 1 , in the display device 100 according to the embodiments, a plurality of first lines VL1 to VLm are formed in a first direction (eg, a vertical direction), and a second direction (eg, a horizontal direction) is formed. ), a display panel 110 having a plurality of second lines HL1 to HLn formed therein, a first driver 120 supplying a first signal to a plurality of first lines VL1 to VLm, and a plurality of second lines. It includes a second driver 130 for supplying a second signal to the two lines HL1 to HLn, and a timing controller 140 for controlling the first driver 120 and the second driver 130 .

The display panel 110 includes a plurality of first lines VL1 to VLm formed in a first direction (eg, a vertical direction) and a plurality of second lines HL1 to HLn formed in a second direction (eg, a horizontal direction). A plurality of pixels (P: Pixel) are defined according to the intersection of .

Each of the first and second drivers 120 and 130 described above may include at least one driver IC that outputs a signal for displaying an image.

The plurality of first lines VL1 to VLm formed in the first direction on the display panel 110 are, for example, formed in a vertical direction (first direction) to transmit data voltages (first signals) to pixel columns in the vertical direction. may be a data line, and the first driver 120 may be a data driver that supplies a data voltage to the data line.

In addition, the plurality of second lines HL1 to HLn formed in the second direction on the display panel 110 are formed in the horizontal direction (second direction) to transmit the scan signal (first signal) to the pixel column in the horizontal direction. It may be a wire, and the second driver 130 may be a gate driver that supplies a scan signal to the gate wire.

In addition, a pad part is configured in the display panel 110 to connect to the first driving part 120 and the second driving part 130 . When a first signal is supplied from the first driver 120 to the plurality of first lines VL1 to VLm, the pad unit transmits it to the display panel 110 , and similarly, the second driver 130 provides a plurality of second lines ( When the second signal is supplied to HL1 to HLn), it is transmitted to the display panel 110 .

Each pixel includes one or more subpixels. A sub-pixel is a unit in which a specific type of color filter is formed or a color filter is not formed, and includes red (R), green (G), blue (B) and optionally white (W). The present invention is not limited thereto. Since each sub-pixel includes an independent furnace unit and a pixel electrode, the sub-pixels constituting the pixel are also referred to as one pixel area hereinafter.

Repair referred to in this specification refers to any process of controlling a partial area of a pixel without replacing the entire panel in order to solve a defect in the pixel. In an embodiment, when a specific electrode formed in the pixel area does not work, removing a portion of the corresponding electrode is referred to as repair. Alternatively, when a defect occurs in a specific area of a pixel electrode by including a cut pattern in one pixel electrode, a process of cutting or removing the cut pattern so that the pixel electrode can operate also corresponds to repair in the present specification. Repair may be performed during the panel manufacturing process before product shipment, or may be performed according to a customer's after-sales service request after product shipment.

2 is a diagram illustrating a basic pixel structure of an organic light emitting diode display according to example embodiments.

Referring to FIG. 2 , a pixel area (PA) of each of the plurality of pixels P defined in the display panel 110 of the organic light emitting diode display 100 according to the embodiments is an organic light emitting diode (OLED). ) may include an emission area (EA) in which light is emitted, and a circuit area (CA) in which a driving circuit (DRC) for driving an organic light emitting diode (OELD) is disposed.

In the light emitting area EA, a light emitting part including an organic light emitting diode OLED is disposed.

The circuit area CA includes a circuit portion including a driving circuit DRC for driving the organic light emitting diode OLED, and corresponds to a non-emission area.

Meanwhile, in FIG. 2 , the light emitting area EA and the circuit area CA are illustrated as separate areas, but this is only for convenience of explanation, and in some cases, the light emitting area EA and the circuit area CA ) may be nested. For example, in the case of the top emission type, the circuit portion may be disposed and formed under the emission portion so that the emission area EA and the circuit area CA may overlap.

As described above, the driving circuit DRC disposed in each circuit area CA includes, for example, a driving transistor DT for supplying current to the organic light emitting diode OLED, and a driving transistor DT. A transistor such as a switching transistor (hereinafter referred to as a second transistor T2) that applies a data voltage to the gate node of , a sensing transistor (hereinafter, referred to as a first transistor T1) for applying a reference voltage (Vref) to a source node (or drain node) of the driving transistor DT, and the like.

3 is a diagram illustrating a process of performing repair when a defect occurs in a light emitting part of a light emitting area by applying an embodiment of the present invention. Both 301 and 302 show a case where the light emitting part is defective. The light emitting part defect is the cause of the pixel defect, and the anode (anode, cathode) of the organic light emitting diode (OLED) disposed in the light emitting area EA is shorted due to a foreign material in the process, or organic light emitting diodes. It may be caused by a defect in one or more of the positive poles (anode, cathode) of the diode (OLED). In addition, the light emitting part defect may occur for any reason that is not mentioned.

Any state in which the organic light emitting diode (OLED) does not normally emit light may be regarded as a light emitting part defective state.

When such a light emitting part defect occurs, an excessive amount of current flows through the organic light emitting diode (OLED), either not, or weakly, and the pixel becomes bright, dark, or weakly illuminated, and becomes a bad pixel.

Therefore, when a defect occurs in the light emitting area, the corresponding pixel does not operate. When the defective portion is a part of the light emitting area, when another light emitting area within the pixel is used, the defect rate may be lowered and visibility may be improved. That is, the light emitting area EA of 301 is cut so that the first light emitting area EA1 connected to the circuit area CA in which the driving circuit DRC is disposed operates as it is, and the second light emitting area 302 in which the defect occurs is It is electrically insulated from the circuit part.

As shown in 302 of FIG. 3 , an electrode connected to a driving circuit to control each pixel for repairing a pixel area is referred to as a pixel electrode. The pixel electrode may be an anode electrode, but is not limited thereto, and may be configured as a cathode electrode. Hereinafter, description will be focused on a case in which the pixel electrode is an anode electrode and an electrode positioned opposite the pixel electrode is a cathode electrode, but the present invention is not limited thereto. It can be configured to be an electrode. In addition, according to an embodiment of the present invention, the first electrode indicates a pixel electrode formed for each pixel, and the second electrode indicates an electrode formed to face the first electrode.

Hereinafter, as shown in 302 of FIG. 3 , an embodiment in which a bank hole is formed singly in order to increase an aperture ratio centering on a pixel electrode having a repair structure having a cut pattern capable of electrically removing some pixel electrodes from a circuit unit will be described. . Since the cut pattern is electrically connected to the circuit unit and operates as a pixel electrode when electricity is applied, when the organic emission layer is formed on the cut pattern, the aperture ratio can be increased. However, since the width of the cut pattern is limited for ease of repair, forming a separate bank hole for the cut pattern may affect the aperture ratio of other pixel electrodes. Accordingly, in the single bank hole proposed in the embodiment of the present invention, since one bank hole is formed on the pixel electrode including the cut pattern, the aperture ratio can be increased by using the cut pattern as the pixel electrode.

4 is a view illustrating various shapes of a pixel electrode for repair to which an embodiment of the present invention is applied. Although the rectangular shape is mainly described to conceptually represent the pixel electrode, when it is implemented in an actual display panel, the pixel electrode can be configured in various shapes in consideration of the relationship with wiring and relationships with other layers.

Reference numeral 410 denotes an exemplary embodiment in which the center of the pixel electrode is constricted. Similarly, the first region 411 of the pixel electrode is a region connected to the driving circuit. The second region 412 of the pixel electrode is electrically connected to the cut pattern 413 . The first region 411 , the second region 412 , and the cut pattern 413 may be formed by one pattern. When a defect occurs in the second region 412 , the cut pattern 413 is removed or cut so that only the first region 411 operates as a pixel electrode.

Reference numeral 420 denotes an embodiment in which one side of the pixel electrode is constricted.

The first region 421 is a region connected to the driving circuit. The first region 421 of the pixel electrode is a region connected to the driving circuit. The second region 422 of the pixel electrode is electrically connected to the cut pattern 423 . The first region 421 , the second region 422 , and the cut pattern 423 may be formed by one pattern. When a defect occurs in the second region 422 , the cut pattern 423 is removed or cut so that only the first region 421 operates as a pixel electrode.

Reference numeral 430 is an exemplary embodiment showing a case in which there are two cut patterns constituting the pixel electrode. The first region 431 of the pixel electrode is a region connected to the driving circuit. The second region 432 of the pixel electrode is electrically connected to the cut patterns 433a and 433b. The first region 431 and the second region 432 , and the cut patterns 433a and 433b may be formed by one pattern. When a defect occurs in the second region 432 , the cut patterns 433a and 433b are removed or cut so that only the first region 431 operates as a pixel electrode.

Reference numeral 440 denotes an embodiment in which the pixel electrode is vertically divided. The first region 441 of the pixel electrode is a region connected to the driving circuit. The second region 442 of the pixel electrode is electrically connected to the cut pattern 443 . The first region 441 , the second region 442 , and the cut pattern 443 may be formed by one pattern. When a defect occurs in the second region 442 , the cut pattern 443 is removed or cut so that only the first region 441 operates as a pixel electrode. Compared to 410 and 420 , 440 includes a first region 441 and a second region 442 that are vertically long. A pixel structure in which a bank insulating layer having a single bank hole is formed around a pixel electrode including a repair structure according to various embodiments of FIG. 4 will be described. For convenience of description, the pixel electrode having the same structure as 410 will be mainly described, but the present invention is not limited thereto.

4 shows that the pixel electrode is divided into two or more regions, and when a defect occurs in some of these regions, the cut pattern connected to the partial region is removed so that the other partial region of the pixel electrode operates as a pixel electrode as it is. make it possible

5 is a diagram illustrating a pixel having a repair structure. 591 is a diagram in which the pixel electrode is formed in a repair structure. It has the same structure as 410 of FIG. 4 . 530a and 530b are wirings to which data signals are supplied, and 590 are wirings to which a reference voltage (Vref) is supplied. The pixel electrode 550 includes a cut pattern 555 . A portion 520 of the driving transistor for controlling the pixel electrode 550 is shown.

592 is a diagram in which a bank insulating film is formed on the repair structure of 591 . A bank insulating layer 570 covers the pixel electrode and wiring of 591 , and the bank hole, which is a space not covered by the bank insulating layer 570 , is divided by the cut pattern 555 in the first region 552 and the second pixel electrode. With two regions 552, an organic light emitting layer is formed in the bank hole.

When realizing the pixels of the organic light emitting display device including the organic light emitting layer, each pixel electrode is sufficiently covered by the bank insulating layer so that the organic light emitting layer on the pixel electrode can emit light. This has a problem in that if the pixel electrode does not overlap the bank hole, the area does not emit light. Meanwhile, when the repair structure is applied as shown in FIG. 5 , two bank holes are formed in the bank insulating layer 551 and 552 . However, if the bankhole is divided into two, it leads to a decrease in the aperture ratio. That is, when a bank is designed for each pixel in implementing an OLED display panel, the pixel electrode of the opening is designed to sufficiently cover the bank insulating layer, and in this case, the aperture ratio is lost.

Accordingly, in the present invention, in implementing a display panel including a repair structure, when a bank insulating layer is formed, one bank hole is formed on the pixel electrode so that the bank part is fully open to increase the aperture ratio. That is, an embodiment in which a bank hole is formed including a region in which a cut pattern for a repair structure is formed will be described.

6 is a view showing the loss of the aperture ratio. Bank holes 551 and 552 are formed at the boundary of the region where the bank insulating layer 570 is formed. When the repair portion 599 including the cut pattern is enlarged, a cut pattern is formed in the portion 610 between the two regions 551 and 552 where the bank hole is formed, and when a current flows through the thin film transistor, the cut pattern is also converted to the pixel electrode. It works. However, the bank insulating layer 570 is formed in the portion 610 . That is, the portion 610 covered by the bank insulating layer 570 is not formed with an organic light emitting layer, which leads to a decrease in the aperture ratio. For repair, since two bank holes with open banks are separated and formed in a region except for the cut pattern, an aperture ratio is reduced in a portion that does not overlap the pixel electrode.

Accordingly, it is attempted to remove the separation of the bank holes from the openings by forming a single bank hole in the pixel electrode having a repair structure. As a result, it is possible to increase the aperture ratio by reducing the area in which the pixel electrode covers the bank open region.

7 and 8 are diagrams of one bank open area according to an embodiment of the present invention. A plurality of pixels formed as shown in FIG. 7 are formed on a substrate, and each pixel is connected to a thin film transistor. There may be one or more thin film transistors for controlling the pixel, and the pixel electrode is electrically connected to the thin film transistor.

In reference to 701, components such as the pixel electrode 550 and wiring on which the cut pattern is formed are the same as described above, and a description thereof will be omitted. A boundary line of a bank hole in which an organic light emitting layer is formed among the bank insulating layers to be formed on the pixel electrode 550 is 760 . Reference numeral 702 is a plan view in which the bank insulating film 770 is formed with reference to 760 . Among the open bank hole regions, regions 771 and 772 that do not overlap the pixel electrode are 771 and 772, but the bank is also opened on the cut pattern 555 as described above, so that an organic light emitting layer can be formed and the aperture ratio is increased. In the configuration of FIG. 7 , an organic light emitting layer is formed within the boundary line 760 where the bank insulating film 770 is formed, and a single bank hole is formed so that the organic light emitting layer is also formed in the regions 771 and 772 where the pixel electrode is not formed. is formed in the pixel of , and as a result, the area where the organic light emitting layer emits light corresponds to the entire area of the pixel electrode to increase the light emitting efficiency. In FIG. 7 , a bank insulating layer is deposited to partially overlap the boundary line of the pixel electrode. However, depending on the pixel electrode etching method and the thickness of the pixel electrode, the bank insulating layer may be configured not to overlap the boundary line of the pixel electrode.

8 is a view showing a configuration when a single bank hole is formed on a cut pattern for repair according to an embodiment of the present invention.

The pixel electrode is positioned to overlap a color filter (not shown), and each of the pixel electrodes 550a and 550b includes cut patterns 555a and 555b, respectively, and the boundary of the open region of the bank insulating layer 870 is are 861 and 862 , and the bank insulating layer 870 is opened at the center overlapping the pixel electrode based on the boundary of the bank insulating layer 870 to form a bank hole. A bank insulating layer 870 is also opened on each of the cut patterns 555a and 555b to overlap the bank holes.

In more detail, looking at the cross-sectional views (I-I' and II-II') of the bank hole in which the bank is opened with respect to 862 as a boundary, FIGS.

9 is a view showing a cross-section taken along line I-I' of FIG. 8 according to an embodiment of the present invention. 9 includes a color filter 808 not shown in FIG. A buffer layer 802 is formed on the substrate 801 . Since it is a wiring region, a thin film transistor is not formed, an interlayer dielectric (ILD, InterLayer dielectric, 804) is formed on the buffer layer 802 , 530a and 530b are wirings to which data signals are supplied, and 590b is where a reference voltage is supplied. it is wiring A passivation layer 806 is formed on the wirings, and the color filter 808 is selectively formed according to a color to be realized by a pixel. In an embodiment, a color filter may not be formed in the white pixel area. An overcoat 810 is formed on the color filter 808 or the passivation layer 806 , and respective pixel electrodes 550a and 550b are formed. In addition, an organic light emitting layer (not shown) is formed in the boundary lines 861 and 862 of the bank hole in which the bank insulating layer 870 partially overlaps with the edge region of the pixel electrode is not formed. According to another embodiment of the present invention, the edge region of the pixel electrode and the bank insulating layer 870 may be formed so as not to overlap.

FIG. 10 is a view showing a cross-section taken along line II-II′ of FIG. 8 according to an embodiment of the present invention. FIG. 10 includes a color filter 808 not shown in FIG. 8 . A buffer layer 802 is formed on the substrate 801 . Since it is a wiring region, a thin film transistor is not formed and an interlayer insulating layer 804 is formed on the buffer layer 802 , 530a and 530b are wirings to which data signals are supplied, and 590b are wirings to which a reference voltage is supplied. It has been described above that a passivation layer 806 is formed on the wirings, and the color filter 808 is selectively formed according to a color to be realized by a pixel. An overcoat 810 is formed on the color filter 808 or the passivation layer 806 , and respective pixel electrodes 550a and 550b are formed. Unlike FIG. 9 , FIG. 10 is a cross-sectional view of cut patterns 555a and 555b among the pixel electrodes, and the cut patterns 555a and 555b and the bank insulating layer 870 do not overlap each other. That is, the bank hole on which the bank insulating film 870 is not formed overlaps the cut patterns 555a and 555b, and an organic light emitting layer (not shown) is also formed in the area where the cut patterns 555a and 555b are formed and in the adjacent area. is formed Since the bank holes are located on the cut patterns 555a and 555b, an organic light emitting layer may be formed. As a result, when the cut patterns 555a and 555b are maintained without being cut, the cut patterns 555a and 555b are also used as pixel electrodes. As it operates, the organic light emitting layer emits light to increase the aperture ratio.

8 to 10 , when the present invention is applied, since one bank hole is formed in the repair structure, the organic light emitting layer is also present on the cut pattern to increase the aperture ratio.

Comparing the example of FIG. 6 in which two bank holes are formed in the repair structure and FIGS. 7 to 10 in which one bank hole is formed, the opening ratio can be increased by unifying the bank holes, and visibility can be improved.

11 is a diagram illustrating a region in which an organic light emitting layer emits light when a cut pattern is maintained in a repair structure.

As shown in FIG. 6 , reference numeral 1101 denotes a region where the organic light emitting layer emits light when two bank holes are respectively formed in the first and second regions of the pixel electrode having a repair structure. 1111 and 1112 indicate a boundary line of a bank hole, which is two separate bank open regions, and an organic light emitting layer is formed in the bank hole to emit light as shown. The organic light emitting layer is not formed in the region where the cut pattern indicated by 1151 is formed, and the organic light emitting layer is not formed in a portion of the first and second regions of the pixel electrode adjacent to the cut pattern.

As shown in FIG. 8 , reference numeral 1102 shows a region where the organic light emitting layer emits light when one bank hole is formed on the first and second regions of the pixel electrode having a repair structure and the cut pattern. 1121 indicates a boundary line of a bank hole that is one bank open area. An organic light emitting layer is formed in the bank hole, and light is emitted from a region overlapping the pixel electrode as shown. As shown in 1152, the organic light emitting layer is formed on the cut pattern to emit light, and the organic light emitting layer is also formed on a portion of the first and second regions of the pixel electrode adjacent to the cut pattern to emit light.

12 is a diagram illustrating a region in which an organic light emitting layer emits light when a cut pattern is removed from a repair structure.

Referring to FIG. 6 , reference numeral 1201 shows a region where the organic light emitting layer emits light when two bank holes are formed in the pixel electrode having a repair structure. 1111 and 1112 indicate the boundary line between the two separated bank holes, and the middle portion of the cut pattern 550 is cut, so that only the organic light emitting layer of the bank hole 1112 connected to the thin film transistor 220 emits light in the portion 1251 .

Meanwhile, as shown in FIG. 8 , reference numeral 1202 shows a region where the organic light emitting layer emits light when one bank hole is formed on the first and second regions of the pixel electrode having a repair structure and on the cut pattern. 1121 indicates the boundary line of one bank hole. The middle part of the cut pattern 550 is cut, and one side of the cut part is insulated so that electricity is not applied. Accordingly, only the organic light emitting layer in the area 1252 of the bank hole emits light. In addition, since the organic light emitting layer emits light at the boundary of the first region of the pixel electrode included in 1252 and separated by the cut pattern 550, even when a part of the pixel electrode is insulated by repair measures, one bank hole is formed. The 1202 used shows a higher aperture ratio and luminous efficiency than the 1102 using two bank holes.

11 and 12, in the case of 1101 and 1201 constituting the two bank holes, there is a disadvantage in that the aperture ratio decreases according to the separation distance between the pixel electrode and the bank. That is, when the conventional pixel electrode layout is designed, the margin between the pixel electrode and the bank is reflected, and a loss in the aperture ratio occurs in the repair area.

When the embodiment of the present invention is applied, the bank can be opened without a margin between the bank and the pixel electrode composed of the first and second regions to which the repair structure is applied and the cut pattern as in 1202, so the aperture ratio is improved, which increases the OLED lifespan make it This was confirmed in both the case of maintaining the repair area ( 1102 ) and the case of using only half of the pixel electrode by removing the cut pattern ( 1202 ).

When the technology proposed in the present invention is applied, it is possible to design a product with an excellently advanced pixel layout compared to the prior art.

Looking at the 1102 and 1202 embodiments of FIGS. 11 and 12 in which the bank is opened on the cut pattern according to the embodiment of the present invention, the upper, lower, left, and right portions of the pixel electrode are all designed to cover the bank, so that the bank and the pixel electrode overlap. The aperture ratio does not change. However, by forming the bank to be opened in the portion where the cut pattern is formed in the middle region of the pixel electrode, even if the region is slightly misaligned during the formation of the pixel electrode and the bank, variations in the aperture ratio can be offset from each other, so that the aperture ratio can be maintained. have. In addition, since the aperture ratio increases even in the repair area, the aperture ratio as a whole can be increased.

In order to apply an embodiment of the present invention, when forming a bank, a dry etching process may be applied to gently form a boundary portion of the bank to gently form a taper.

13 to 15 are diagrams illustrating an embodiment in which a single bank hole is formed on the pixel electrode having the various repair structures shown in FIG. 4 according to the present invention.

13 is a view illustrating a bank hole formed in the structure of 410 of FIG. 4 . As a result of the bank insulating layer 1370 being formed to overlap some edges of the pixel electrode, one bank hole is positioned on the pixel electrode. Here, when the bank insulating layers 1371 and 1372 are formed in the region where the pixel electrode is not formed, the bank hole has a constricted shape similar to that of the pixel electrode. When the bank hole as shown in FIG. 13 is formed, the bank is opened on the cut pattern 413 to form the organic light emitting layer, so the aperture ratio can be maintained. Also, the pixel electrode and the cathode electrode are separated by the bank insulating films 1371 and 1372. It prevents short circuit. The width 1391 of the bank insulating film such as 1371 and 1372 may be formed to be smaller than the gap 1392 between the first region 411 and the second region 412 of the pixel electrode, and may be formed to be larger as shown in the drawings. have. This may be determined depending on the mask forming the bank insulating film and the minimum thickness of the bank insulating film. In the present invention, the width 1391 of the bank insulating film is greater than the gap 1392 between the first region 411 and the second region 412 . Examples of both cases and small cases are included.

FIG. 14 is a view showing a bank hole formed in the structure of 420 of FIG. 4 . A bank insulating layer 1470 is formed to overlap some edges of the pixel electrode so that one bank hole is positioned on the pixel electrode. Here, when the bank insulating film is formed in the region where the pixel electrode is not formed as shown in 1471, the bank hole has a constricted shape similar to that of the pixel electrode. When the bank hole as shown in FIG. 14 is formed, the bank is opened on the cut pattern 423 to form the organic light emitting layer, so the aperture ratio can be maintained, and the short circuit between the pixel electrode and the cathode electrode can be prevented by the bank insulating film as shown in 1471. has a preventive effect. The width of the bank insulating layer 1471 may be formed to gradually decrease between the first region 421 and the second region 422 of the pixel electrode. Of course, as shown in FIG. 13 , it may be formed to overlap some regions of the first region 421 and the second region 422 of the pixel electrode, and the width of the bank insulating layer is determined by the mask forming the bank insulating layer and the bank insulating layer. may be determined according to the minimum thickness of

15 is a view illustrating a bank hole formed in the structure of 430 of FIG. 4 . A bank insulating layer 1570 is formed to overlap some edges of the pixel electrode so that one bank hole is positioned on the pixel electrode. In addition, a bank insulating layer 1571 is formed between the two cut patterns 433a and 433b to prevent a short circuit between the pixel electrode and the cathode electrode. When the bank hole as shown in FIG. 15 is formed, the bank is opened on the cut patterns 433a and 433b to form the organic light emitting layer, so the aperture ratio can be maintained. Also, the pixel electrode and the cathode electrode are separated by the bank insulating film as shown in 1571. It prevents short circuit. The vertical width of the bank insulating layer 1571 may be formed based on the interval between the first region 431 and the second region 432 of the pixel electrode, and the horizontal width of the bank insulating layer 1571 is the cut pattern 433a. It may be formed based on the interval between the cut pattern 433b. Even when a portion of the bank insulating layer 1571 overlaps the first region 431 and the second region 432 of the pixel electrode, the opening ratio is higher than when two bank holes are formed, so that the opening ratio is maintained and the gap between the electrodes is maintained. It is effective in preventing short circuit. The width of the bank insulating layer 1571 may be set according to a mask forming the bank insulating layer and a minimum thickness of the bank insulating layer.

13 to 15 show an embodiment in which a bank insulating layer partially overlaps between the first region and the second region of the pixel electrode, but still forms one bank hole. This has the effect of preventing a short circuit between the electrodes by forming an insulating layer in a region where the pixel electrode is not generated while maintaining one bank hole to increase the aperture ratio.

16 is a flowchart illustrating a process of manufacturing a display panel according to an exemplary embodiment of the present invention.

First, a thin film transistor and a protective layer are formed on a substrate (S1610). The thin film transistor serves to allow current to flow through the first electrode, such as a pixel electrode, or to block the flow of current. Then, a color filter and an overcoat layer are formed on the protective layer (S1620). 9 and 10 , it has been seen that the color filter is selectively formed. Then, a portion of the protective layer and the overcoat layer is etched to form a contact hole exposing the source or drain of the thin film transistor (S1630). This allows a first electrode, such as a pixel electrode, to contact, so that a current flows through the first electrode by the thin film transistor. Then, the first electrode is connected to the source or drain through the contact hole and has a shape including a cut pattern (S1640). The shape including the cut pattern includes the pixel electrodes of various shapes as described above with reference to FIG. 4 , and may be formed using a single mask. In more detail, in the forming of the first electrode, a first region electrically connected to the thin film transistor and a second region connected to the first region in a cutting pattern may be formed using a single mask. Meanwhile, in the process of etching the pixel electrode, a dry etch process may be applied to gently form the slope. In another embodiment, when the pixel electrode is sufficiently thinly deposited, a dry etching process is unnecessary, or a wet etching process may be applied depending on the material of the pixel electrode.

When the dry etching process is applied, the taper of the pixel electrode, which is the first electrode, may be gently formed to facilitate deposition of the organic material on the step portion of the pixel electrode. In addition, a short circuit with the cathode electrode, which is the second electrode, can be prevented by applying a dry etching process. On the other hand, various cutting patterns can be configured when the first electrode is formed, which was described in FIG. 4 .

A single bank hole is formed on the first electrode by forming a bank insulating film exposing the cut pattern of the first electrode (S1650). In the process of forming the bank hole, a short circuit between the first electrode and the second electrode may be prevented by forming the bank insulating layers 1371, 1372, 1471, and 1571 of FIGS. 13 to 15 .

Thereafter, an organic light emitting layer is formed in the bank hole (S1660). When the bank insulating layer is formed and the minimum width of the bank insulating layer is smaller than the distance between the pixel electrode and another pixel electrode, the overlapping area between the bank insulating layer and the pixel electrode may be reduced or removed.

When the process of FIG. 16 is applied, the bank hole formed in the opening of the pixel electrode is uniformly formed. As a result, compared to the case where two bank holes are formed by forming a bank insulating film in the region where the cut pattern for repair is located in the existing repair structure, the pixel electrode area adjacent to the conventional cut pattern in which the aperture ratio loss occurred also has a bank hole. It can be used as an opening by forming it, and as a result, the opening ratio is increased. In particular, when applied to a high-resolution display panel, the increase or decrease of the aperture ratio greatly affects the overall visibility and increases the product lifespan.

The description above and the accompanying drawings are merely illustrative of the technical idea of the present invention, and those of ordinary skill in the technical field to which the present invention pertains, combinations of configurations within the scope not departing from the essential characteristics of the present invention. Various modifications and variations, such as separation, substitution, and alteration, will be possible. Accordingly, the embodiments disclosed in the present invention are not intended to limit the technical idea of the present invention, but to explain the technical idea, and the scope of the technical idea of the present invention is not limited by these embodiments. The scope of protection of the present invention should be construed by the following claims, and all technical ideas within the scope equivalent thereto should be construed as being included in the scope of the present invention.

100: display device 110: display panel
120: first driving unit 130: second driving unit
140: timing controller 530: data wiring
590: reference voltage supply wiring
570, 770, 870, 1370,1371, 1372, 1470, 1471, 1570, 1571: bank insulating film
413, 423, 433, 443, 555: cut pattern

Claims (16)

a substrate on which a plurality of pixels are positioned;
a thin film transistor positioned in each of the pixels on the substrate;
a pixel electrode positioned in each of the pixels, the pixel electrode including a cut pattern and electrically connected to the thin film transistor;
a bank insulating layer partially overlapping the boundary line of the pixel electrode and deposited such that a single bank hole is positioned on the pixel electrode; and
and an organic light emitting layer located in the bank hole,
The bank hole is located on the cut pattern,
the pixel electrode includes a first region electrically connected to the thin film transistor and a second region connected to the first region by the cutting pattern;
the bank insulating layer partially overlaps the boundary line between the first region and the second region;
The bank hole has a constricted shape.
An organic light emitting display device including a second region connected in a short pattern.
delete delete The method of claim 1,
and the cut pattern is cut so that the second region is insulated from the first region.
delete In the plurality of pixels formed on the display panel,
a circuit unit positioned in a non-emission area of the pixel; and
A pixel electrode positioned in the light emitting region of the pixel and connected to the thin film transistor of the circuit unit, the pixel electrode including a cut pattern, a bank insulating film deposited on the pixel electrode to have a bank hole, and an organic light emitting layer positioned in the bank hole It includes a light emitting unit comprising a,
The bank hole is located on the cut pattern,
The pixel electrode includes a first region electrically connected to the thin film transistor of the circuit unit and a second region connected to the first region by the cutting pattern,
the bank insulating layer partially overlaps the boundary line between the first region and the second region;
The bank hole has a constricted shape,
The cut pattern is in a connected or cut state.
delete delete The method of claim 6,
The cut pattern is cut so that the second area is insulated from the first area.
delete forming a thin film transistor and a protective layer on a substrate;
forming a color filter and an overcoat layer on the protective layer;
forming a contact hole exposing the source or drain of the thin film transistor by etching a portion of the passivation layer and the overcoat layer;
forming a first electrode connected to a source or drain through the contact hole and having a shape including a cut pattern;
forming a single bank hole positioned on the cut pattern on the first electrode by forming a bank insulating layer exposing the cut pattern of the first electrode;
Forming an organic light emitting layer in the bank hole,
The forming of the first electrode includes forming a first region electrically connected to the thin film transistor and a second region connected to the first region in a cut pattern using a single mask,
The forming of the bank hole includes forming a bank insulating layer partially overlapping a boundary line between the first region and the second region to form a bank hole having a constricted shape.
delete The method of claim 11,
The step of forming the first electrode
and dry etching the first electrode.
delete The method of claim 1,
The organic light emitting display device, characterized in that the narrow shape of the bank hole corresponds to the cut pattern of the pixel electrode.
The method of claim 1,
and the pixel electrode includes the first region, the second region, and one cutting pattern connecting the first region and the second region in each pixel region.

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