KR102236810B1 - 크로매틱 공초점 계측의 속도 향상 장치 및 방법 - Google Patents

크로매틱 공초점 계측의 속도 향상 장치 및 방법 Download PDF

Info

Publication number
KR102236810B1
KR102236810B1 KR1020197009858A KR20197009858A KR102236810B1 KR 102236810 B1 KR102236810 B1 KR 102236810B1 KR 1020197009858 A KR1020197009858 A KR 1020197009858A KR 20197009858 A KR20197009858 A KR 20197009858A KR 102236810 B1 KR102236810 B1 KR 102236810B1
Authority
KR
South Korea
Prior art keywords
white light
wafer
sensors
sensor body
rows
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020197009858A
Other languages
English (en)
Korean (ko)
Other versions
KR20190040356A (ko
Inventor
폴 혼
Original Assignee
케이엘에이 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 케이엘에이 코포레이션 filed Critical 케이엘에이 코포레이션
Publication of KR20190040356A publication Critical patent/KR20190040356A/ko
Application granted granted Critical
Publication of KR102236810B1 publication Critical patent/KR102236810B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G01J2003/282—Modified CCD or like
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources
    • G01N2201/06113—Coherent sources; lasers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts
    • G01N2201/0638—Refractive parts
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/068—Optics, miscellaneous
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/08—Optical fibres; light guides
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Polarising Elements (AREA)
KR1020197009858A 2016-09-07 2017-09-06 크로매틱 공초점 계측의 속도 향상 장치 및 방법 Active KR102236810B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201662384324P 2016-09-07 2016-09-07
US62/384,324 2016-09-07
US15/690,969 2017-08-30
US15/690,969 US10317344B2 (en) 2016-09-07 2017-08-30 Speed enhancement of chromatic confocal metrology
PCT/US2017/050326 WO2018048938A1 (en) 2016-09-07 2017-09-06 Speed enhancement of chromatic confocal metrology

Publications (2)

Publication Number Publication Date
KR20190040356A KR20190040356A (ko) 2019-04-17
KR102236810B1 true KR102236810B1 (ko) 2021-04-08

Family

ID=61282067

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020197009858A Active KR102236810B1 (ko) 2016-09-07 2017-09-06 크로매틱 공초점 계측의 속도 향상 장치 및 방법

Country Status (6)

Country Link
US (1) US10317344B2 (https=)
EP (1) EP3510350A4 (https=)
JP (2) JP2019529895A (https=)
KR (1) KR102236810B1 (https=)
CN (1) CN109690238B (https=)
WO (1) WO2018048938A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11441893B2 (en) 2018-04-27 2022-09-13 Kla Corporation Multi-spot analysis system with multiple optical probes
USD923121S1 (en) * 2019-08-23 2021-06-22 Air Box Co., Ltd. Exercise mat combined hammock
US11768431B2 (en) * 2019-12-31 2023-09-26 Taiwan Semiconductor Manufacturing Co., Ltd. Method of fast surface particle and scratch detection for EUV mask backside
EP4211726A4 (en) * 2020-09-08 2024-11-27 Massachusetts Institute Of Technology PREDICTION OF SEMICONDUCTOR DEVICE PERFORMANCE
US11899375B2 (en) 2020-11-20 2024-02-13 Kla Corporation Massive overlay metrology sampling with multiple measurement columns
FR3118175B1 (fr) * 2020-12-18 2025-05-30 Unity Semiconductor Procede d’inspection d’une surface d’un objet
JP7532288B2 (ja) * 2021-03-04 2024-08-13 キオクシア株式会社 検査結果分析装置および検査結果分析プログラム

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0240000A2 (en) 1986-04-02 1987-10-07 Hewlett-Packard Company Apparatus for separating electromagnetic waves
CN101588209A (zh) 2008-05-23 2009-11-25 中兴通讯股份有限公司 一种自适应色散补偿方法
CN106931911A (zh) 2017-04-01 2017-07-07 浙江协同光电科技有限公司 白光光谱共焦线扫描装置

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4689491A (en) * 1985-04-19 1987-08-25 Datasonics Corp. Semiconductor wafer scanning system
US4844617A (en) * 1988-01-20 1989-07-04 Tencor Instruments Confocal measuring microscope with automatic focusing
US6552803B1 (en) 1998-02-24 2003-04-22 Kla-Tencor Corporation Detection of film thickness through induced acoustic pulse-echos
US6248988B1 (en) * 1998-05-05 2001-06-19 Kla-Tencor Corporation Conventional and confocal multi-spot scanning optical microscope
US6636310B1 (en) * 1998-05-12 2003-10-21 Metroptic Technologies, Ltd. Wavelength-dependent surface contour measurement system and method
AU2421101A (en) * 1999-11-16 2001-05-30 Agilent Technologies Inc. Confocal imaging
JP3726028B2 (ja) * 2001-03-30 2005-12-14 住友重機械工業株式会社 ３次元形状計測装置
JP3210654B1 (ja) 2001-05-02 2001-09-17 レーザーテック株式会社 光学式走査装置及び欠陥検出装置
US6917421B1 (en) 2001-10-12 2005-07-12 Kla-Tencor Technologies Corp. Systems and methods for multi-dimensional inspection and/or metrology of a specimen
IL146174A (en) 2001-10-25 2007-08-19 Camtek Ltd Confocal system for testing woofers
US7633616B2 (en) 2003-06-02 2009-12-15 Sensovation Ag Apparatus and method for photo-electric measurement
DE102005023351A1 (de) * 2005-05-17 2006-11-30 Micro-Epsilon Messtechnik Gmbh & Co Kg Vorrichtung und Verfahren zum Vermessen von Oberflächen
US8319978B2 (en) 2006-07-11 2012-11-27 Camtek Ltd. System and method for probe mark analysis
DE102006036504A1 (de) 2006-08-04 2008-02-07 Vistec Semiconductor Systems Gmbh Vorrichtung und Verfahren zur Messung des Höhenprofils eines strukturierten Substrats
KR100807218B1 (ko) * 2007-02-02 2008-02-28 삼성전자주식회사 웨이퍼 검사 장치 및 방법
US7791712B2 (en) * 2007-03-27 2010-09-07 Mitutoyo Corporation Chromatic confocal sensor fiber interface
US8194301B2 (en) * 2008-03-04 2012-06-05 Kla-Tencor Corporation Multi-spot scanning system and method
DE102008062879B4 (de) * 2008-10-10 2010-10-28 Universität Stuttgart Verfahren und Anordnung zur skalierbaren Interferometrie
US7876456B2 (en) * 2009-05-11 2011-01-25 Mitutoyo Corporation Intensity compensation for interchangeable chromatic point sensor components
DE102009025815A1 (de) 2009-05-15 2010-11-25 Degudent Gmbh Messanordnung sowie Verfahren zum dreidimensionalen Messen eines Objektes
JP2011017552A (ja) * 2009-07-07 2011-01-27 Oputouea Kk 多点変位検出装置
FR2950441B1 (fr) 2009-09-23 2012-05-18 Sabban Youssef Cohen Capteur optique dote de champ lateral pour la numerisation 3d
TWI414817B (zh) * 2010-07-23 2013-11-11 Univ Nat Taipei Technology 線型彩色共焦顯微系統
JP5790178B2 (ja) * 2011-03-14 2015-10-07 オムロン株式会社 共焦点計測装置
JP2013061185A (ja) * 2011-09-12 2013-04-04 Toshiba Corp パターン検査装置およびパターン検査方法
CN102506754B (zh) * 2011-11-09 2013-11-06 西安工业大学 物体表面形貌与颜色同时测量的共聚焦测量装置及其使用方法
JP5834979B2 (ja) * 2012-02-03 2015-12-24 オムロン株式会社 共焦点計測装置
US8817240B2 (en) * 2012-05-25 2014-08-26 Mitutoyo Corporation Interchangeable optics configuration for a chromatic range sensor optical pen
DE102014008584B4 (de) * 2013-06-17 2021-05-27 Precitec Optronik Gmbh Optische Messvorrichtung zum Erfassen von Abstandsdifferenzen und optisches Messverfahren
JP2016024009A (ja) * 2014-07-18 2016-02-08 株式会社ミツトヨ 厚さ測定装置及び厚さ測定方法
EP3222964B1 (en) * 2016-03-25 2020-01-15 Fogale Nanotech Chromatic confocal device and method for 2d/3d inspection of an object such as a wafer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0240000A2 (en) 1986-04-02 1987-10-07 Hewlett-Packard Company Apparatus for separating electromagnetic waves
CN101588209A (zh) 2008-05-23 2009-11-25 中兴通讯股份有限公司 一种自适应色散补偿方法
CN106931911A (zh) 2017-04-01 2017-07-07 浙江协同光电科技有限公司 白光光谱共焦线扫描装置

Also Published As

Publication number Publication date
JP2019529895A (ja) 2019-10-17
EP3510350A4 (en) 2020-03-18
JP2022081498A (ja) 2022-05-31
US20180067058A1 (en) 2018-03-08
CN109690238B (zh) 2020-11-06
US10317344B2 (en) 2019-06-11
KR20190040356A (ko) 2019-04-17
EP3510350A1 (en) 2019-07-17
WO2018048938A1 (en) 2018-03-15
CN109690238A (zh) 2019-04-26

Similar Documents

Publication Publication Date Title
KR102236810B1 (ko) 크로매틱 공초점 계측의 속도 향상 장치 및 방법
US7126699B1 (en) Systems and methods for multi-dimensional metrology and/or inspection of a specimen
CN107683400B (zh) 用于测量在半导体晶片上的高度的方法及设备
US9305341B2 (en) System and method for measurement of through silicon structures
US6917421B1 (en) Systems and methods for multi-dimensional inspection and/or metrology of a specimen
US20180144995A1 (en) Optical inspection apparatus and method and method of fabricating semiconductor device using the apparatus
KR20100083743A (ko) 웨이퍼 검사 시스템 및 방법
US9885656B2 (en) Line scan knife edge height sensor for semiconductor inspection and metrology
US20250076216A1 (en) Method and apparatus for detecting defects in a package
US12372345B2 (en) 3D profilometry with a Linnik interferometer
US20240003826A1 (en) Semiconductor inspection tool system and method for wafer edge inspection
CN106772923A (zh) 基于倾斜狭缝的自动对焦方法和系统
JP6684992B2 (ja) 突起検査装置及びバンプ検査装置
JP7373644B2 (ja) 透過及び反射光を組み合わせた半導体素子の内部クラックの撮像
JP2013015428A (ja) 検査装置、検査方法及び半導体装置の製造方法
TWI878427B (zh) 用於在後端及晶圓級封裝中半導體檢測的高解析度檢查之系統和方法
US9423359B2 (en) Wafer charging electromagnetic inspection tool and method of using
US20210270750A1 (en) Measurement apparatus and method
CN113176076A (zh) 光学检测系统及光学检测方法
KR20260057330A (ko) 패키지 내의 결함들을 검출하기 위한 방법 및 장치
US12105027B2 (en) Apparatus for inspecting substrate and method for fabricating semiconductor device using the same
CN111855662A (zh) 一种晶圆缺陷检测装置及方法
KR20260057332A (ko) 패키징 응용에서의 결함 검출

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

A201 Request for examination
A302 Request for accelerated examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PA0302 Request for accelerated examination

St.27 status event code: A-1-2-D10-D17-exm-PA0302

St.27 status event code: A-1-2-D10-D16-exm-PA0302

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

U11 Full renewal or maintenance fee paid

Free format text: ST27 STATUS EVENT CODE: A-4-4-U10-U11-OTH-PR1001 (AS PROVIDED BY THE NATIONAL OFFICE)

Year of fee payment: 6