KR102214861B1 - 극자외 광원을 위한 빔 위치 제어 - Google Patents

극자외 광원을 위한 빔 위치 제어 Download PDF

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KR102214861B1
KR102214861B1 KR1020157028292A KR20157028292A KR102214861B1 KR 102214861 B1 KR102214861 B1 KR 102214861B1 KR 1020157028292 A KR1020157028292 A KR 1020157028292A KR 20157028292 A KR20157028292 A KR 20157028292A KR 102214861 B1 KR102214861 B1 KR 102214861B1
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Prior art keywords
light beam
amplified light
irradiation
target material
point
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Korean (ko)
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KR20150130440A (ko
Inventor
블라디미르 비. 플루로브
이고르 브이. 포멘코브
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에이에스엠엘 네델란즈 비.브이.
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Priority claimed from US14/035,847 external-priority patent/US8872144B1/en
Priority claimed from US14/184,777 external-priority patent/US9000405B2/en
Application filed by 에이에스엠엘 네델란즈 비.브이. filed Critical 에이에스엠엘 네델란즈 비.브이.
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020157028292A 2013-03-15 2014-02-25 극자외 광원을 위한 빔 위치 제어 Active KR102214861B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201361787228P 2013-03-15 2013-03-15
US61/787,228 2013-03-15
US14/035,847 US8872144B1 (en) 2013-09-24 2013-09-24 System and method for laser beam focus control for extreme ultraviolet laser produced plasma source
US14/035,847 2013-09-24
US14/184,777 US9000405B2 (en) 2013-03-15 2014-02-20 Beam position control for an extreme ultraviolet light source
US14/184,777 2014-02-20
PCT/US2014/018419 WO2014149435A1 (en) 2013-03-15 2014-02-25 Beam position control for an extreme ultraviolet light source

Publications (2)

Publication Number Publication Date
KR20150130440A KR20150130440A (ko) 2015-11-23
KR102214861B1 true KR102214861B1 (ko) 2021-02-10

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KR1020157028292A Active KR102214861B1 (ko) 2013-03-15 2014-02-25 극자외 광원을 위한 빔 위치 제어

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Country Link
JP (1) JP6374481B2 (https=)
KR (1) KR102214861B1 (https=)
TW (1) TWI612851B (https=)
WO (1) WO2014149435A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI788998B (zh) * 2015-08-12 2023-01-01 荷蘭商Ａｓｍｌ荷蘭公司 極紫外線光源中之目標擴張率控制
US9820368B2 (en) 2015-08-12 2017-11-14 Asml Netherlands B.V. Target expansion rate control in an extreme ultraviolet light source
US10663866B2 (en) * 2016-09-20 2020-05-26 Asml Netherlands B.V. Wavelength-based optical filtering
US10935720B2 (en) * 2019-04-29 2021-03-02 Ii-Vi Delaware, Inc. Laser beam product parameter adjustments
WO2021122341A1 (en) 2019-12-20 2021-06-24 Asml Netherlands B.V. Calibration system for an extreme ultraviolet light source
CN115669232A (zh) * 2020-05-28 2023-01-31 Asml荷兰有限公司 极紫外光源的对准
KR102901435B1 (ko) 2020-06-09 2025-12-18 삼성전자주식회사 반도체 제조 장치 및 그의 동작 방법
WO2022023201A1 (en) * 2020-07-30 2022-02-03 Asml Netherlands B.V. Euv light source target metrology
WO2022228807A1 (en) * 2021-04-29 2022-11-03 Asml Netherlands B.V. Laser beam metrology system, laser beam system, euv radiation source, and lithographic apparatus

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120019826A1 (en) 2010-07-22 2012-01-26 Cymer, Inc. Alignment of light source focus
KR101118995B1 (ko) * 2004-03-17 2012-03-12 사이머 인코포레이티드 고 반복율 레이저 발생 플라즈마 ｅｕｖ 광원
JP2012099791A (ja) * 2010-10-08 2012-05-24 Komatsu Ltd ミラー、ミラー装置、レーザ装置および極端紫外光生成装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3256984B2 (ja) * 1991-06-13 2002-02-18 ソニー・プレシジョン・テクノロジー株式会社 変位検出装置
US7598509B2 (en) * 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
JP5368261B2 (ja) * 2008-11-06 2013-12-18 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置の制御方法
US8283643B2 (en) * 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
US8173985B2 (en) * 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
US8000212B2 (en) * 2009-12-15 2011-08-16 Cymer, Inc. Metrology for extreme ultraviolet light source

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101118995B1 (ko) * 2004-03-17 2012-03-12 사이머 인코포레이티드 고 반복율 레이저 발생 플라즈마 ｅｕｖ 광원
US20120019826A1 (en) 2010-07-22 2012-01-26 Cymer, Inc. Alignment of light source focus
JP2012099791A (ja) * 2010-10-08 2012-05-24 Komatsu Ltd ミラー、ミラー装置、レーザ装置および極端紫外光生成装置

Also Published As

Publication number Publication date
JP2016512383A (ja) 2016-04-25
KR20150130440A (ko) 2015-11-23
WO2014149435A1 (en) 2014-09-25
TWI612851B (zh) 2018-01-21
JP6374481B2 (ja) 2018-08-15
TW201444418A (zh) 2014-11-16

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