KR102208278B1 - 연성이고 컨디셔닝가능한 연마층을 갖는 다층의 화학 기계적 연마 패드 적층물 - Google Patents

연성이고 컨디셔닝가능한 연마층을 갖는 다층의 화학 기계적 연마 패드 적층물 Download PDF

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Publication number
KR102208278B1
KR102208278B1 KR1020140064225A KR20140064225A KR102208278B1 KR 102208278 B1 KR102208278 B1 KR 102208278B1 KR 1020140064225 A KR1020140064225 A KR 1020140064225A KR 20140064225 A KR20140064225 A KR 20140064225A KR 102208278 B1 KR102208278 B1 KR 102208278B1
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South Korea
Prior art keywords
polishing
layer
curing agent
laminate
chemical mechanical
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Korean (ko)
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KR20140141492A (ko
Inventor
제임스 머네인
배이니언 콰이언
존 지 나울랜드
미쉘 케이 젠슨
제프리 제임스 헨드런
마티 더블유 디그룻
데이빗 비 제임스
펑지 예
Original Assignee
롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스, 인코포레이티드
다우 글로벌 테크놀로지스 엘엘씨
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Publication of KR20140141492A publication Critical patent/KR20140141492A/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B24B37/245—Pads with fixed abrasives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001—Manufacture of flexible abrasive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/32—Polyhydroxy compounds; Polyamines; Hydroxyamines
    • C08G18/3271—Hydroxyamines
    • C08G18/3278—Hydroxyamines containing at least three hydroxy groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/65—Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
    • C08G18/66—Compounds of groups C08G18/42, C08G18/48, or C08G18/52
    • C08G18/6633—Compounds of group C08G18/42
    • C08G18/6637—Compounds of group C08G18/42 with compounds of group C08G18/32 or polyamines of C08G18/38
    • C08G18/664—Compounds of group C08G18/42 with compounds of group C08G18/32 or polyamines of C08G18/38 with compounds of group C08G18/3203
    • C08G18/6644—Compounds of group C08G18/42 with compounds of group C08G18/32 or polyamines of C08G18/38 with compounds of group C08G18/3203 having at least three hydroxy groups

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
KR1020140064225A 2013-05-31 2014-05-28 연성이고 컨디셔닝가능한 연마층을 갖는 다층의 화학 기계적 연마 패드 적층물 Active KR102208278B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/906,825 US9238296B2 (en) 2013-05-31 2013-05-31 Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layer
US13/906,825 2013-05-31

Publications (2)

Publication Number Publication Date
KR20140141492A KR20140141492A (ko) 2014-12-10
KR102208278B1 true KR102208278B1 (ko) 2021-01-27

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KR1020140064225A Active KR102208278B1 (ko) 2013-05-31 2014-05-28 연성이고 컨디셔닝가능한 연마층을 갖는 다층의 화학 기계적 연마 패드 적층물

Country Status (7)

Country Link
US (1) US9238296B2 (enExample)
JP (1) JP6367611B2 (enExample)
KR (1) KR102208278B1 (enExample)
CN (1) CN104209874B (enExample)
DE (1) DE102014007002A1 (enExample)
FR (1) FR3006220B1 (enExample)
TW (1) TWI560070B (enExample)

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TWI556910B (zh) * 2013-10-01 2016-11-11 三芳化學工業股份有限公司 複合硏磨墊及其製造方法
US9259820B2 (en) * 2014-03-28 2016-02-16 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with polishing layer and window
US9216489B2 (en) * 2014-03-28 2015-12-22 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with endpoint detection window
US9238294B2 (en) * 2014-06-18 2016-01-19 Nexplanar Corporation Polishing pad having porogens with liquid filler
USD785339S1 (en) * 2014-10-23 2017-05-02 Griot's Garage, Inc. Hand applicator buffing pad
US20160144477A1 (en) * 2014-11-21 2016-05-26 Diane Scott Coated compressive subpad for chemical mechanical polishing
US9481070B2 (en) * 2014-12-19 2016-11-01 Rohm And Haas Electronic Materials Cmp Holdings, Inc. High-stability polyurethane polishing pad
KR102640690B1 (ko) * 2015-09-25 2024-02-23 씨엠씨 머티리얼즈 엘엘씨 높은 탄성률 비를 갖는 폴리우레탄 화학 기계적 연마 패드
US9484212B1 (en) * 2015-10-30 2016-11-01 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing method
US20180085888A1 (en) * 2016-09-29 2018-03-29 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pads having a consistent pad surface microtexture
CN108453970A (zh) * 2018-03-27 2018-08-28 成都时代立夫科技有限公司 一种化学机械抛光垫的制造方法及其产品和模具
KR102526513B1 (ko) * 2021-05-26 2023-04-26 에스케이엔펄스 주식회사 연마패드 접착필름, 이를 포함하는 연마패드 적층체 및 웨이퍼의 연마방법
KR102572960B1 (ko) * 2021-06-10 2023-09-01 에프엔에스테크 주식회사 복수의 패턴 구조체를 포함하는 연마 패드
CN116890492A (zh) * 2023-07-10 2023-10-17 安徽禾臣新材料有限公司 一种防褶皱断裂的复合型阻尼布及其生产工艺
CN119795025B (zh) * 2024-10-31 2025-11-04 比亚迪股份有限公司 复合抛光层、抛光垫及其制备方法

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Also Published As

Publication number Publication date
US20140357163A1 (en) 2014-12-04
FR3006220A1 (fr) 2014-12-05
TWI560070B (en) 2016-12-01
CN104209874A (zh) 2014-12-17
JP2014233835A (ja) 2014-12-15
KR20140141492A (ko) 2014-12-10
JP6367611B2 (ja) 2018-08-01
US9238296B2 (en) 2016-01-19
TW201511964A (zh) 2015-04-01
DE102014007002A1 (de) 2014-12-04
FR3006220B1 (fr) 2016-09-23
CN104209874B (zh) 2017-09-08

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