KR102178869B1 - Apparatus and method for inspecting substrates, and apparatus for treating substrates using the same - Google Patents

Abstract

The present invention relates to a substrate inspection apparatus and method, and a substrate processing apparatus using the same. A substrate inspection apparatus according to an embodiment of the present invention includes an image collection unit for collecting an image of a substrate; A processing unit processing the image to inspect the substrate; An output unit outputting inspection data of the substrate obtained by processing the image; And a storage unit for storing data related to the image.

Description

A substrate inspection apparatus and method, and a substrate processing apparatus using the same TECHNICAL FIELD [APPARATUS AND METHOD FOR INSPECTING SUBSTRATES, AND APPARATUS FOR TREATING SUBSTRATES USING THE SAME}

The present invention relates to a substrate inspection apparatus and method, and a substrate processing apparatus using the same.

Particles, organic contaminants, metal contaminants, etc. remaining on the substrate surface have a great influence on the operating characteristics and production yield of semiconductor devices. For this reason, a cleaning process for removing various contaminants adhering to the substrate surface is carried out before and after each unit process of manufacturing a semiconductor.

In general, cleaning of the substrate is a chemical treatment process that removes metallic foreign substances, organic substances, particles, etc. remaining on the substrate using a chemical liquid, a rinse process that removes the chemical liquid remaining on the substrate using pure water, and an organic solvent. , A drying process of drying the substrate using a supercritical fluid, nitrogen gas, or the like.

An object of the present invention is to provide a substrate inspection apparatus and method for photographing and recording a substrate processing process and inspecting a substrate using the photographed image, and a substrate processing apparatus including the same.

A substrate inspection apparatus according to an embodiment of the present invention includes an image collection unit for collecting an image of a substrate; A processing unit processing the image to inspect the substrate; An output unit outputting inspection data of the substrate obtained by processing the image; And a storage unit for storing data related to the image.

The image collection unit: may include a camera that photographs the substrate.

The image collection unit: a first camera for collecting a first image for vision inspection of the substrate; And a second camera that collects a second image for recording the processing process of the substrate.

The processing unit: may analyze the image and calculate an area of the processing liquid discharged to the substrate.

The output unit: may include a display device that displays the test data on a screen.

The output unit: may display a change in the inspection data with respect to the number of inspection times of the substrate in a graph.

The output unit: When the inspection data is smaller than a preset allowable value, an error message indicating that the substrate is defective may be output.

The storage unit: along with image data obtained by photographing the substrate, may store identification data for identifying the photographed substrate as metadata.

The storage unit: may further store inspection data of the photographed substrate.

The substrate inspection apparatus further includes an input unit receiving a confirmation input for confirming a processing process of the substrate determined to be defective, and the output unit may display an image of the substrate determined as defective in response to the confirmation input. I can.

A method for inspecting a substrate according to an embodiment of the present invention includes: photographing a processing process of a substrate; Storing image data obtained by photographing the substrate; Processing the image of the substrate to obtain inspection data of the substrate; And outputting the test data.

The storing of the image data may include: storing identification data for identifying a photographed substrate together with the image data as metadata.

The obtaining of the inspection data of the substrate may include: capturing a frame of the image at a point in time when the processing liquid is discharged to the substrate; And calculating an area of the processing liquid discharged to the substrate by analyzing the frame.

The outputting of the inspection data may include: displaying a change in the inspection data with respect to the number of inspections of the substrate in a graph.

The outputting of the inspection data may include: when the inspection data is smaller than a preset allowable value, outputting an error message indicating that the substrate is defective.

The substrate inspection method includes the steps of: receiving a confirmation input for confirming a processing process of a substrate determined to be defective; And outputting an image of the substrate determined to be defective in response to the confirmation input.

A substrate inspection method according to an embodiment of the present invention may be implemented as a program that can be executed by a computer and recorded on a computer-readable recording medium.

A substrate processing apparatus according to an embodiment of the present invention includes a spin head supporting and rotating a substrate; A spray member for supplying a processing liquid to the substrate; A collection container for recovering the treatment liquid; And an inspector for inspecting the substrate, wherein the inspector comprises: an image collection unit for collecting an image of the substrate; A processing unit processing the image to inspect the substrate; An output unit outputting inspection data of the substrate obtained by processing the image; And a storage unit for storing data related to the image.

The processing unit may capture a frame of the image at a point in time when the processing liquid is discharged to the substrate, analyze the frame, and calculate an area of the processing liquid discharged to the substrate.

The output unit: may display a graph of a change in area of the processing liquid with respect to the number of times the substrate is inspected.

The output unit: When the area of the processing liquid is smaller than a preset allowable value, an error message indicating that the substrate is defective may be output.

The inspector may further include an input unit receiving a confirmation input for confirming a processing process of the substrate determined to be defective, and the output unit may display an image of the substrate determined as defective in response to the confirmation input. .

According to an embodiment of the present invention, a defective substrate may be screened out by identifying an abnormally processed substrate.

According to an exemplary embodiment of the present invention, since an image of an abnormally processed substrate can be easily searched, the cause of providing a defective substrate can be easily analyzed.

1 is a plan view schematically showing a substrate processing facility according to an embodiment of the present invention.
2 is a cross-sectional view illustrating an example of a substrate processing apparatus.
3 is a block diagram illustrating a substrate inspection apparatus according to an exemplary embodiment of the present invention.
4 is a perspective view illustrating an exemplary camera installed in a process chamber according to an embodiment of the present invention.
5 is a perspective view illustrating exemplary cameras mounted in a process chamber according to another embodiment of the present invention.
6 is a diagram illustrating a state of a substrate from which a processing liquid is discharged according to an embodiment of the present invention.
7 is a graph of a treatment liquid area versus the number of inspections displayed according to an embodiment of the present invention.
8 is a diagram exemplarily showing a graph of a processing liquid area and an error message with respect to the number of inspections displayed according to another embodiment of the present invention.
9 is a flowchart illustrating a method of inspecting a substrate according to an embodiment of the present invention.
10 is a flowchart illustrating a method of inspecting a substrate according to another embodiment of the present invention.

Other advantages and features of the present invention, and a method of achieving them will become apparent with reference to embodiments to be described later in detail together with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but may be implemented in various different forms, and only this embodiment is intended to complete the disclosure of the present invention, and to provide ordinary knowledge in the technical field to which the present invention pertains. It is provided to completely inform the scope of the invention to those who have it, and the invention is only defined by the scope of the claims.

Even if not defined, all terms (including technical or scientific terms) used herein have the same meaning as commonly accepted by universal technology in the prior art to which this invention belongs. Terms defined by general dictionaries may be construed as having the same meaning as the related description and/or the text of this application, and not conceptualized or excessively formalized, even if not clearly defined herein. Won't.

The terms used in the present specification are for describing exemplary embodiments and are not intended to limit the present invention. In this specification, the singular form also includes the plural form unless specifically stated in the phrase. As used in the specification,'includes' and/or various conjugated forms of this verb, for example,'includes','includes','includes','includes', etc. Steps, operations and/or elements do not preclude the presence or addition of one or more other compositions, components, components, steps, operations and/or elements. In the present specification, the term'and/or' refers to each of the listed components or various combinations thereof.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a plan view schematically showing a substrate processing facility 1 according to an embodiment of the present invention.

Referring to FIG. 1, the substrate processing facility 1 may include an index module 10 and a process processing module 20, and the index module 10 includes a load port 120 and a transfer frame 140. Can include. The load port 120, the transfer frame 140, and the process processing module 20 may be sequentially arranged in a line. Hereinafter, the direction in which the load port 120, the transfer frame 140, and the process processing module 20 are arranged is referred to as a first direction 12. And, when viewed from above, the direction perpendicular to the first direction 12 is referred to as the second direction 14, and the direction perpendicular to the plane including the first direction 12 and the second direction 14 is referred to as a third direction. It is called direction (16).

A carrier in which a substrate is accommodated may be mounted in the load port 120. A plurality of load ports 120 are provided and these may be arranged in a line along the second direction 14. In FIG. 1, it is shown that four load ports 120 are provided. However, the number of load ports 120 may increase or decrease according to conditions such as process efficiency and footprint of the process processing module 20. The carrier may be provided with a slot provided to support the edge of the substrate. A plurality of slots may be provided in the third direction 16 and the substrates may be positioned in the carrier so as to be stacked in a state spaced apart from each other along the third direction 16. The carrier may use a front opening integrated pod (FOUP).

The process processing module 20 may include a buffer unit 220, a transfer chamber 240, and a process chamber 260. The transfer chamber 240 may be disposed in a longitudinal direction parallel to the first direction 12. Process chambers 260 may be disposed on one side and the other side of the transfer chamber 240 along the second direction 14, respectively. The process chambers 260 located on one side of the transfer chamber 240 and the process chambers 260 located on the other side of the transfer chamber 240 may be provided to be symmetrical to each other with respect to the transfer chamber 240. Some of the process chambers 260 may be disposed along the length direction of the transfer chamber 240. In addition, some of the process chambers 260 may be disposed to be stacked on each other. That is, on one side of the transfer chamber 240, the process chambers 260 may be arranged in an array of N X M (N and M are each a natural number of 1 or more). Here, N is the number of process chambers 260 provided in a row along the first direction 12, and M is the number of process chambers 260 provided in a row along the third direction 16. When four or six process chambers 260 are provided on one side of the transfer chamber 240, the process chambers 260 may be arranged in an arrangement of 2 X 2 or 3 X 2. The number of process chambers 260 may increase or decrease. Unlike the above, the process chamber 260 may be provided only on one side of the transfer chamber 240. In addition, unlike the above, the process chamber 260 may be provided in a single layer on one side and both sides of the transfer chamber 240.

The buffer unit 220 may be disposed between the transfer frame 140 and the transfer chamber 240. The buffer unit 220 may provide a space in which the substrate stays between the transfer chamber 240 and the transfer frame 140 before the substrate is transferred. The buffer unit 220 is provided with a slot in which the substrate is placed, and a plurality of slots may be provided so as to be spaced apart from each other along the third direction 16. In the buffer unit 220, a surface facing the transfer frame 140 and a surface facing the transfer chamber 240 may be opened.

The transfer frame 140 may transfer a substrate between the carrier mounted on the load port 120 and the buffer unit 220. The transfer frame 140 may be provided with an index rail 142 and an index robot 144. The index rail 142 may be provided in a longitudinal direction parallel to the second direction 14. The index robot 144 is installed on the index rail 142 and may be linearly moved in the second direction 14 along the index rail 142. The index robot 144 may have a base 144a, a body 144b, and an index arm 144c. The base 144a may be installed to be movable along the index rail 142. The body 144b may be coupled to the base 144a. The body 144b may be provided to be movable along the third direction 16 on the base 144a. In addition, the body 144b may be provided to be rotatable on the base 144a. The index arm 144c is coupled to the body 144b, and may be provided to move forward and backward with respect to the body 144b. A plurality of index arms 144c may be provided to be individually driven. The index arms 144c may be arranged to be stacked apart from each other along the third direction 16. Some of the index arms 144c are used when transferring a substrate from the process processing module 20 to the carrier, and others may be used when transferring the substrate from the carrier to the process processing module 20. This may prevent particles generated from the substrate before the process treatment from adhering to the substrate after the process treatment during the process of the index robot 144 carrying in and carrying out the substrate.

The transfer chamber 240 may transfer a substrate between the buffer unit 220 and the process chamber 260 and between the process chambers 260. A guide rail 242 and a main robot 244 may be provided in the transfer chamber 240. The guide rail 242 may be disposed such that its longitudinal direction is parallel to the first direction 12. The main robot 244 is installed on the guide rail 242 and may be linearly moved along the first direction 12 on the guide rail 242. The main robot 244 may have a base 244a, a body 244b, and a main arm 244c. The base 244a may be installed to be movable along the guide rail 242. The body 244b may be coupled to the base 244a. The body 244b may be provided to be movable along the third direction 16 on the base 244a. In addition, the body 244b may be provided to be rotatable on the base 244a. The main arm 244c is coupled to the body 244b, which may be provided to be movable forward and backward with respect to the body 244b. A plurality of main arms 244c may be provided to be individually driven. The main arms 244c may be disposed to be stacked apart from each other along the third direction 16. The main arm 244c used when transferring the substrate from the buffer unit 220 to the process chamber 260 and the main arm 244c used when transferring the substrate from the process chamber 260 to the buffer unit 220 are They can be different.

A substrate processing apparatus 300 for performing a cleaning process on a substrate may be provided in the process chamber 260. The substrate processing apparatus 300 provided in each process chamber 260 may have a different structure depending on the type of cleaning process to be performed. Optionally, the substrate processing apparatus 300 in each process chamber 260 may have the same structure. Optionally, the process chambers 260 are divided into a plurality of groups, and the substrate processing apparatuses 300 provided in the process chambers 260 belonging to the same group have the same structure and process chambers 260 belonging to different groups. The substrate processing apparatuses 300 provided in) may have different structures. For example, when the process chamber 260 is divided into two groups, a first group of process chambers 260 is provided on one side of the transfer chamber 240 and a second group of process chambers 260 is provided on the other side of the transfer chamber 240. Process chambers 260 may be provided. Optionally, a first group of process chambers 260 may be provided on a lower layer on one side and the other side of the transfer chamber 240, and a second group of process chambers 260 may be provided on an upper layer. The process chamber 260 of the first group and the process chamber 260 of the second group may be classified according to the type of chemical liquid used or the type of cleaning method, respectively.

Hereinafter, an example of the substrate processing apparatus 300 for cleaning a substrate using a processing liquid will be described. 2 is a cross-sectional view illustrating an example of the substrate processing apparatus 300. Referring to FIG. 2, the substrate processing apparatus 300 may include a housing 320, a spin head 340, an elevating unit 360, and an injection member 380. The housing 320 may include an internal recovery container 322, an intermediate recovery container 324 and an external recovery container 326, and the upper part thereof may be opened. Each of the recovery vessels 322, 324, and 326 may recover treatment liquids different from each other among treatment liquids used in the process. The inner recovery bin 322 is provided in an annular ring shape surrounding the spin head 340, the intermediate recovery bin 324 is provided in an annular ring shape surrounding the inner recovery bin 322, and the outer recovery bin 326 ) May be provided in an annular ring shape surrounding the intermediate recovery container 324. The inner space 322a of the internal recovery container 322, the space 324a between the internal recovery container 322 and the intermediate recovery container 324, and the space between the intermediate recovery container 324 and the external recovery container 326 The 326a may function as an inlet through which the treatment liquid is introduced into the internal recovery container 322, the intermediate recovery container 324, and the external recovery container 326, respectively. Recovery lines 322b, 324b, 326b extending vertically in a direction below the bottom surface may be connected to each of the recovery bins 322, 324, 326. Each of the recovery lines 322b, 324b, and 326b may discharge the treatment liquid introduced through the respective recovery bins 322, 324, and 326. The discharged treatment liquid may be reused through an external treatment liquid regeneration system (not shown).

The spin head 340 may be disposed within the housing 320. The spin head 340 may support the substrate and rotate the substrate during the process. The spin head 340 may include a body 342, a support pin 334, a chuck pin 346, and a support shaft 348. The body 342 may have an upper surface provided in a generally circular shape when viewed from the top. A support shaft 348 rotatable by a motor 349 may be fixedly coupled to the bottom of the body 342. A plurality of support pins 334 may be provided. The support pins 334 are disposed to be spaced apart at predetermined intervals at an edge portion of the upper surface of the body 342, and may protrude upward from the body 342. The support pins 334 may be arranged to have an annular ring shape as a whole by combination with each other. The support pin 334 may support the rear edge of the substrate so that the substrate is spaced a predetermined distance from the upper surface of the body 342. A plurality of chuck pins 346 may be provided. The chuck pin 346 may be disposed farther away from the center of the body 342 than the support pin 334. The chuck pin 346 may be provided to protrude upward from the body 342. When the spin head 340 is rotated, the chuck pin 346 may support the side portion of the substrate so that the substrate is not separated from the original position in the lateral direction. The chuck pin 346 may be provided to be linearly movable between the standby position and the support position along the radial direction of the body 342. The standby position is a position farther from the center of the body 342 compared to the support position. When the substrate is loaded or unloaded on the spin head 340, the chuck pin 346 may be positioned at a standby position, and when a process is performed on the substrate, the chuck pin 346 may be positioned at a support position. In the supporting position, the chuck pin 346 may contact the side of the substrate.

The lifting unit 360 may linearly move the housing 320 in the vertical direction. As the housing 320 is moved up and down, the relative height of the housing 320 with respect to the spin head 340 may be changed. The lifting unit 360 may include a bracket 362, a moving shaft 364, and a driver 366. The bracket 362 is fixedly installed on the outer wall of the housing 320, and a moving shaft 364 that is moved in the vertical direction by the actuator 366 may be fixedly coupled to the bracket 362. When the substrate W is placed on the spin head 340 or is lifted from the spin head 340, the housing 320 may be lowered so that the spin head 340 protrudes from the top of the housing 320. In addition, when the process is in progress, the height of the housing 320 may be adjusted so that the treatment liquid can flow into the preset collection container 360 according to the type of treatment liquid supplied to the substrate W. For example, while the substrate is being processed with the first treatment liquid, the substrate may be positioned at a height corresponding to the inner space 322a of the internal recovery container 322. In addition, during the processing of the substrates with the second processing liquid and the third processing liquid, each of the substrates is a space 324a between the internal recovery container 322 and the intermediate recovery container 324, and the intermediate recovery container 324 and the external recovery container. It may be located at a height corresponding to the space 326a between the 326. Unlike the above, the lifting unit 360 may move the spin head 340 in the vertical direction instead of the housing 320.

The spray member 380 may supply a processing liquid to the substrate W during a substrate processing process. The injection member 380 may include a nozzle support 382, a nozzle 384, a support shaft 386, and a driver 388. The support shaft 386 is provided in its longitudinal direction along the third direction 16, and a driver 388 may be coupled to a lower end of the support shaft 386. The driver 388 may rotate and lift the support shaft 386. The nozzle support 382 may be vertically coupled to the opposite end of the support shaft 386 coupled to the actuator 388. The nozzle 384 may be installed on the bottom of the end of the nozzle support 382. The nozzle 384 may be moved to the process position and the standby position by the actuator 388. The process position is a position where the nozzle 384 is disposed vertically above the housing 320, and the standby position is a position where the nozzle 384 is deviated from the vertical upper portion of the housing 320. One or a plurality of injection members 380 may be provided. When a plurality of injection members 380 are provided, a chemical solution, a rinse solution, or an organic solvent may be provided through different injection members 380. The rinse liquid may be pure water, and the organic solvent may be a mixture of isopropyl alcohol vapor and an inert gas, or an isopropyl alcohol liquid.

According to an embodiment of the present invention, the substrate processing apparatus 300 may include a substrate inspection apparatus that photographs and records a substrate processing process, and inspects whether the process is normally performed using the photographed image.

3 is a block diagram illustrating a substrate inspection apparatus according to an exemplary embodiment of the present invention.

As shown in FIG. 3, the substrate inspection apparatus 400 may include an image collection unit 410, a processing unit 420, an output unit 430, and a storage unit 440. The image collection unit 410 may collect an image of the substrate W. The processing unit 420 may process the image to inspect the substrate W. The output unit 430 may output inspection data of the substrate W obtained by processing the image. The storage unit 440 may store data related to an image.

The image collection unit 410 may include a camera installed in the process chamber 260 to photograph the substrate W.

4 is a perspective view illustrating an exemplary camera mounted in a process chamber 260 according to an embodiment of the present invention.

As shown in FIG. 4, the image collection unit 410 may include a camera 411 to take a picture of a processing process of the substrate W. In FIG. 4, the camera 411 is installed at an upper corner of the process chamber 260, but may be disposed at any position in the process chamber as long as the surface of the substrate W can be photographed according to the embodiment.

5 is a perspective view illustrating exemplary cameras mounted in the process chamber 260 according to another embodiment of the present invention.

Unlike the embodiment of FIG. 4 in which only one camera 411 is provided, the image collection unit 410 may include two or more cameras 411 and 412.

For example, as shown in FIG. 5, the image collection unit 410 includes a first camera 411 collecting a first image for vision inspection of the substrate W, and a processing process of the substrate W It may include a second camera 412 that collects a second image for recording.

The first camera 411 for vision inspection may collect an image at a higher resolution than the second camera 412 for recording, but is not limited thereto, and both the first and second cameras 411 and 412 are Images can also be collected at the same resolution.

In FIG. 5, the first camera 411 for vision inspection is installed at an upper corner of the process chamber 260, but may be installed directly above the substrate so as to look down on the upper surface of the substrate W according to an exemplary embodiment.

The processing unit 420 may inspect the substrate W by processing the image collected by the image collection unit 410.

According to an embodiment of the present invention, the processing unit 420 may analyze the image and calculate an area of a processing liquid (eg, a chemical liquid) discharged to the substrate W. In this case, the inspection data of the substrate W may be the area of the processing liquid.

6 is a diagram illustrating a state of a substrate W from which a processing liquid is discharged according to an embodiment of the present invention.

When the substrate W is cleaned with the processing liquid in the process chamber 260, the normal or abnormal performance of the cleaning process may be determined by the amount of the processing liquid discharged to the substrate W. According to an embodiment of the present invention, the processing unit 420 analyzes an image captured of the substrate W and calculates the area of the processing liquid discharged to the substrate, so that a substrate processing process (eg, a cleaning process) is normally performed. You can check if it has been done.

According to an embodiment, the processing unit 420 captures an image frame at a time when the processing liquid is discharged from the nozzle 384 among images obtained by photographing a substrate processing process, analyzes the captured image frame, and analyzes the captured image frame. ), the area (A _c ) of the treatment liquid discharged can be calculated.

The output unit 430 may output inspection data of the substrate W. The output unit 430 may include a display device such as an LCD or a PDP, and may display the test data on a screen and provide it to a user.

According to an embodiment, the output unit 430 may display a change in inspection data with respect to the number of inspections of the substrate W in a graph.

7 is an example of a graph of a treatment liquid area versus the number of inspections displayed according to an embodiment of the present invention.

According to this embodiment, the processing unit 420 may generate a graph of a change trend of the processing liquid area as the inspection proceeds based on inspection data for a plurality of substrates W, and the output unit 430 Can be provided to the user by displaying the generated graph on the screen.

The user can confirm the presence of a defective substrate for which cleaning has not been normally performed because the processing liquid is not properly discharged through the graph.

According to another embodiment of the present invention, when the inspection data of the substrate W is smaller than a preset allowable value, the output unit 430 may output an error message indicating that the substrate is defective.

8 is a diagram exemplarily showing a graph of a processing liquid area and an error message with respect to the number of inspections displayed according to another embodiment of the present invention.

The processing unit 420 may compare the area A _c of the processing liquid calculated through image processing with a preset allowable value, and control an error message to be output when the area of the processing liquid is smaller than the allowable value.

In addition, as shown in FIG. 8, the output unit 430 further displays a line (dotted line) corresponding to the allowable value on the graph of the treatment liquid area versus the number of inspections, and the area of the treatment liquid is smaller than the allowable value as a result of the inspection. In this case, error messages 431 and 432 indicating abnormal discharge of the processing liquid may be displayed.

The storage unit 440 may store data related to an image.

According to an embodiment, the storage unit 440 may store identification data for identifying the photographed substrate W together with image data obtained by photographing the substrate W.

The identification data includes a carrier ID, a recipe name, a port ID, a slot ID, a process ID, a control ID, and a lot ( lot) information may be included, but is not limited thereto.

According to this embodiment, the substrate inspection apparatus 400 may further include a communication unit 460 connected to a host, and the communication unit 460 may receive the identification data from the host through a network. The identification data is stored as metadata of the image data, and can be used for searching and indexing images photographed on the substrate.

According to an embodiment, the storage unit 440 may further store inspection data (eg, processing liquid area) of the substrate.

Referring back to FIG. 1, the substrate inspection apparatus 400 may further include an input unit 450. The input unit 450 may receive a confirmation input for confirming the processing process of the substrate determined to be defective. For example, the input unit 450 may include an input device such as a mouse or a keyboard.

When a confirmation input is received from the user through the input unit 450, the processing unit 420 may load the image of the substrate determined as defective from the storage unit 440 in response to the confirmation input. Then, the image of the substrate may be displayed through the output unit 430 and provided to the user.

According to an embodiment, the processing unit 420 may load an image for a predetermined time from the storage unit 440 before and after a time when the processing liquid is discharged to the substrate determined as defective, and the output unit 430 Can output the imported image. For example, the processing unit 420 may retrieve and reproduce an image from 10 seconds before discharging the treatment liquid to 10 seconds after discharging the treatment liquid, but the time may be set differently.

For example, referring to FIG. 8, the user may click the error message 431 displayed on the output unit 430 using a mouse to check the process of processing the defective substrate. In response to a click of the error message, the processing unit 420 may retrieve an image of the substrate in which an error has occurred from the storage unit 440 and reproduce the image for a predetermined time before and after discharging the processing liquid.

Identification data stored in the storage unit 440 may be used to load the image of the substrate determined to be defective. For example, the processing unit 420 may accurately reproduce a desired image by searching for image data having the same identification data as the identification data of the substrate determined as defective as metadata.

Depending on the embodiment, in addition to the identification data, a processing liquid discharge time point for each substrate W may also be stored in the storage unit 440 as metadata.

9 is a flowchart illustrating a method of inspecting a substrate according to an embodiment of the present invention.

As shown in FIG. 9, the substrate inspection method 500 includes a step of photographing a processing process of the substrate W (S510), and a step of storing image data obtained by photographing the substrate W (S520). , Processing the image of the substrate W to obtain inspection data (S530), and outputting the inspection data (S540).

According to an embodiment, the storing of the image data (S520) may include storing identification data for identifying the photographed substrate W together with the image data. The identification data may include at least one of carrier ID, recipe name, port ID, slot ID, process ID, control ID, and lot information, but is not limited thereto. The identification data may be received from a host through a network.

According to an embodiment, the step of obtaining the inspection data (S530) may include calculating an area (A _c ) of the processing liquid discharged to the substrate (W) by analyzing an image of the substrate (W). I can.

According to this embodiment, the outputting the inspection data (S540) may include displaying an area A _c of the processing liquid discharged to the substrate W.

According to another embodiment, the step of outputting the inspection data (S540) may include displaying a change in inspection data (eg, a processing liquid area) with respect to the number of inspections of the substrate in a graph.

10 is a flowchart illustrating a substrate inspection method 500 according to another embodiment of the present invention.

Referring to FIG. 10, the step of obtaining the inspection data (S530) includes capturing a frame at a point in time when the processing liquid is discharged to the substrate W among the images obtained by photographing the substrate W (S531), and Analyzing the frame may include calculating an area A _c of the processing liquid discharged to the substrate W (S532).

Then, in the step of outputting the inspection data (S541), when the area (A _c ) of the processing liquid is smaller than a preset allowable value (YES in (S533)), outputting an error message indicating that the substrate is defective ( S541) may be included.

According to an embodiment, the substrate inspection method 500 includes receiving a confirmation input for confirming a processing process of a substrate determined as defective (S550), and in response to the confirmation input, The step of outputting an image (S560) may be further included.

In this case, the step of outputting the image of the substrate determined to be defective (S560) includes the steps of loading an image for a predetermined time before and after the time when the processing liquid was discharged to the corresponding substrate, and outputting the loaded image. It may include.

The substrate inspection method 500 according to the embodiment of the present invention described above may be manufactured as a program to be executed on a computer and stored in a computer-readable recording medium. The computer-readable recording medium includes all types of storage devices storing data that can be read by a computer system. Examples of computer-readable recording media include ROM, RAM, CD-ROM, magnetic tapes, floppy disks, and optical data storage devices.

100: substrate processing equipment
300: substrate processing apparatus
400: board inspection device
410: image collection unit
420: processing unit
430: output
440: storage
450: input
460: Ministry of Communications

Claims (21)

An image collection unit for collecting an image of the substrate;
A processing unit processing the image to inspect the substrate;
An output unit outputting inspection data of the substrate obtained by processing the image; And
A storage unit for storing data related to the image;
Including,
The storage unit:
In addition to the image data obtained by photographing the substrate, identification data for identifying the photographed substrate is stored as metadata,
The image collection unit:
A first camera collecting a first image for vision inspection of the substrate; And
A second camera collecting a second image for recording the processing of the substrate;
Board inspection apparatus comprising a. delete delete The method of claim 1,
The processing unit:
A substrate inspection apparatus that analyzes the image and calculates an area of the processing liquid discharged to the substrate. The method of claim 1,
The output unit:
A substrate inspection apparatus comprising a display device that displays the inspection data on a screen. The method of claim 1,
The output unit:
A substrate inspection apparatus for displaying a change in the inspection data with respect to the number of inspections of the substrate in a graph. The method of claim 1,
The output unit:
When the inspection data is smaller than a preset allowable value, an error message indicating that the substrate is defective is output. delete The method of claim 1,
The storage unit:
A substrate inspection apparatus further storing inspection data of the photographed substrate. The method of claim 7,
The substrate inspection apparatus further includes an input unit for receiving a confirmation input for confirming a processing process of the substrate determined to be defective,
The output unit displays an image of the substrate determined to be defective in response to the confirmation input. Photographing the processing process of the substrate;
Storing image data obtained by photographing the substrate;
Processing the image of the substrate to obtain inspection data of the substrate; And
Including; outputting the test data;
The storing of the image data includes:
And storing identification data for identifying the photographed substrate as metadata together with the image data,
Photographing the processing process of the substrate;
A substrate inspection method for photographing by using a first camera for collecting a first image for vision inspection of the substrate and a second camera for collecting a second image for recording a processing process of the substrate. delete The method of claim 11,
The step of obtaining the inspection data of the substrate includes:
Capturing a frame of the image at a point in time when the processing liquid is discharged to the substrate; And
Analyzing the frame and calculating an area of the processing liquid discharged to the substrate;
Board inspection method comprising a. The method of claim 11,
The step of outputting the test data includes:
And displaying a change in the inspection data with respect to the number of inspection times of the substrate in a graph. The method of claim 11,
The step of outputting the test data includes:
And outputting an error message notifying that the substrate is defective if the inspection data is smaller than a preset tolerance. The method of claim 15,
Receiving a confirmation input for confirming a processing process of the substrate determined to be defective; And
Outputting an image of the substrate determined to be defective in response to the confirmation input;
Substrate inspection method further comprising a. A spin head supporting and rotating the substrate;
A spray member for supplying a processing liquid to the substrate;
A collection container for recovering the treatment liquid; And
Including an inspector for inspecting the substrate, the inspector:
An image collection unit collecting an image of the substrate;
A processing unit processing the image to inspect the substrate;
An output unit outputting inspection data of the substrate obtained by processing the image; And
A storage unit for storing data related to the image;
Including,
The storage unit:
In addition to the image data obtained by photographing the substrate, identification data for identifying the photographed substrate is stored as metadata,
The image collection unit:
A first camera collecting a first image for vision inspection of the substrate; And
And a second camera collecting a second image for recording the processing process of the substrate. The method of claim 17,
The processing unit:
A substrate processing apparatus configured to capture a frame of the image at a time point at which the processing liquid is discharged to the substrate, analyze the frame, and calculate an area of the processing liquid discharged to the substrate. The method of claim 18,
The output unit:
A substrate processing apparatus for displaying a graph of the area change of the processing liquid with respect to the number of times of inspection of the substrate. The method of claim 18,
The output unit:
When the area of the processing liquid is smaller than a preset allowable value, an error message indicating that the substrate is defective is output. The method of claim 20,
The inspection device further includes an input unit for receiving a confirmation input for confirming a processing process of the substrate determined to be defective,
The output unit displays an image of the substrate determined to be defective in response to the confirmation input.

Images