KR102172938B1 - 광가교결합제로서의 다이아지린 화합물 및 이를 포함하는 광이미지화 가능한 조성물 - Google Patents
광가교결합제로서의 다이아지린 화합물 및 이를 포함하는 광이미지화 가능한 조성물 Download PDFInfo
- Publication number
- KR102172938B1 KR102172938B1 KR1020177007930A KR20177007930A KR102172938B1 KR 102172938 B1 KR102172938 B1 KR 102172938B1 KR 1020177007930 A KR1020177007930 A KR 1020177007930A KR 20177007930 A KR20177007930 A KR 20177007930A KR 102172938 B1 KR102172938 B1 KR 102172938B1
- Authority
- KR
- South Korea
- Prior art keywords
- hept
- trifluoromethyl
- ene
- bicyclo
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 0 *C1(*2*C2)N=N1 Chemical compound *C1(*2*C2)N=N1 0.000 description 8
- HWJAVENLAHGTKJ-UHFFFAOYSA-N O=C(c1ccc(C2(C(F)(F)F)N=N2)cc1)NCNC(c1ccc(C2(C(F)(F)F)N=N2)cc1)=O Chemical compound O=C(c1ccc(C2(C(F)(F)F)N=N2)cc1)NCNC(c1ccc(C2(C(F)(F)F)N=N2)cc1)=O HWJAVENLAHGTKJ-UHFFFAOYSA-N 0.000 description 1
- LTDCNWHBEFDXQX-UHFFFAOYSA-N O=C(c1ccc(C2(C(F)(F)F)N=N2)cc1)OCCCOC(c1ccc(C2(C(F)(F)F)N=N2)cc1)=O Chemical compound O=C(c1ccc(C2(C(F)(F)F)N=N2)cc1)OCCCOC(c1ccc(C2(C(F)(F)F)N=N2)cc1)=O LTDCNWHBEFDXQX-UHFFFAOYSA-N 0.000 description 1
- IYYWXNNUVKDQQV-UHFFFAOYSA-N O=C(c1ccc(C2(C(F)(F)F)N=N2)cc1)OCc1ccc(C2(C(F)(F)F)N=N2)cc1 Chemical compound O=C(c1ccc(C2(C(F)(F)F)N=N2)cc1)OCc1ccc(C2(C(F)(F)F)N=N2)cc1 IYYWXNNUVKDQQV-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D229/00—Heterocyclic compounds containing rings of less than five members having two nitrogen atoms as the only ring hetero atoms
- C07D229/02—Heterocyclic compounds containing rings of less than five members having two nitrogen atoms as the only ring hetero atoms containing three-membered rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/14—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/10—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a carbon chain containing aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/14—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
- C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
- C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3442—Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/20—Chemical modification of a polymer leading to a crosslinking, either explicitly or inherently
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/13—Morphological aspects
- C08G2261/135—Cross-linked structures
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/14—Side-groups
- C08G2261/141—Side-chains having aliphatic units
- C08G2261/1412—Saturated aliphatic units
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/14—Side-groups
- C08G2261/141—Side-chains having aliphatic units
- C08G2261/1414—Unsaturated aliphatic units
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/14—Side-groups
- C08G2261/142—Side-chains containing oxygen
- C08G2261/1422—Side-chains containing oxygen containing OH groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/14—Side-groups
- C08G2261/142—Side-chains containing oxygen
- C08G2261/1424—Side-chains containing oxygen containing ether groups, including alkoxy
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/14—Side-groups
- C08G2261/143—Side-chains containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/14—Side-groups
- C08G2261/144—Side-chains containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/14—Side-groups
- C08G2261/146—Side-chains containing halogens
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/33—Monomer units or repeat units incorporating structural elements in the main chain incorporating non-aromatic structural elements in the main chain
- C08G2261/332—Monomer units or repeat units incorporating structural elements in the main chain incorporating non-aromatic structural elements in the main chain containing only carbon atoms
- C08G2261/3324—Monomer units or repeat units incorporating structural elements in the main chain incorporating non-aromatic structural elements in the main chain containing only carbon atoms derived from norbornene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/40—Polymerisation processes
- C08G2261/41—Organometallic coupling reactions
- C08G2261/418—Ring opening metathesis polymerisation [ROMP]
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/70—Post-treatment
- C08G2261/76—Post-treatment crosslinking
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Electroluminescent Light Sources (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Plural Heterocyclic Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462053921P | 2014-09-23 | 2014-09-23 | |
| US62/053,921 | 2014-09-23 | ||
| PCT/US2015/051619 WO2016049123A1 (en) | 2014-09-23 | 2015-09-23 | Diazirine compounds as photocrosslinkers and photoimageable compositions comprising them |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20170058377A KR20170058377A (ko) | 2017-05-26 |
| KR102172938B1 true KR102172938B1 (ko) | 2020-11-02 |
Family
ID=54249657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020177007930A Active KR102172938B1 (ko) | 2014-09-23 | 2015-09-23 | 광가교결합제로서의 다이아지린 화합물 및 이를 포함하는 광이미지화 가능한 조성물 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US9938241B2 (enExample) |
| EP (1) | EP3197881B1 (enExample) |
| JP (1) | JP6479171B2 (enExample) |
| KR (1) | KR102172938B1 (enExample) |
| CN (1) | CN106715399B (enExample) |
| TW (1) | TWI648271B (enExample) |
| WO (1) | WO2016049123A1 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017165478A1 (en) * | 2016-03-22 | 2017-09-28 | Promerus, Llc | Diazirine containing organic electronic compositions and device thereof |
| JP6758070B2 (ja) * | 2016-03-31 | 2020-09-23 | 日鉄ケミカル&マテリアル株式会社 | 遮光膜用感光性樹脂組成物、これを硬化させた遮光膜を備えたディスプレイ用基板、及びディスプレイ用基板の製造方法 |
| EP3678713B1 (en) * | 2017-09-06 | 2023-11-08 | Nanyang Technological University | Hygroscopic, crosslinking coatings and bioadhesives |
| US11084897B2 (en) * | 2017-12-12 | 2021-08-10 | International Business Machines Corporation | Chemical compounds with perfluoroaryl groups that can facilitate post-synthesis functionalization |
| US10815335B2 (en) | 2018-07-06 | 2020-10-27 | International Business Machines Corporation | Ring-opening polymerizations using a flow reactor |
| US11118008B2 (en) | 2018-07-06 | 2021-09-14 | International Business Machines Corporation | Ring-opening polymerizations using a flow reactor |
| US10738153B2 (en) | 2018-07-06 | 2020-08-11 | International Business Machines Corporation | Ring-opening polymerizations using a flow reactor |
| FR3088322A1 (fr) | 2018-11-14 | 2020-05-15 | Universite De Rouen Normandie | Nouvelle voie de synthese de diazirines, enrichies ou non en azote-15 |
| CN109628042A (zh) * | 2018-12-26 | 2019-04-16 | 深圳日高胶带新材料有限公司 | 一种光交联胶黏剂 |
| EP3914586B1 (en) | 2019-01-25 | 2024-03-27 | Avedro Inc. | Bis(diazirine) derivatives as photo-crossslinker for treating corneal ectatic disorders |
| CN111416088B (zh) * | 2020-03-26 | 2021-11-09 | 江苏厚生新能源科技有限公司 | 一种锂电陶瓷隔膜的制备方法 |
| WO2022097644A1 (ja) * | 2020-11-05 | 2022-05-12 | 国立大学法人岩手大学 | 反応性付与化合物、反応性付与化合物の製造方法、および積層体 |
| KR102612236B1 (ko) * | 2020-12-11 | 2023-12-08 | 삼성에스디아이 주식회사 | 편광판용 점착제 조성물, 이를 포함하는 편광판 및 이를 포함하는 광학표시장치 |
| CN114790171A (zh) * | 2021-01-26 | 2022-07-26 | 中国科学院化学研究所 | 一类双吖丙啶交联剂及其制备方法与应用 |
| KR20230154882A (ko) * | 2021-03-09 | 2023-11-09 | 즐링스 머티리얼즈 인크. | 고분자 가교 및 접착에 사용하기 위한 아릴 에테르 디아지린 |
| US20220298399A1 (en) | 2021-03-19 | 2022-09-22 | Facebook Technologies, Llc | Synthesis and use of multi-functional diazirine adhesives for elastomer bonding |
| KR102896973B1 (ko) | 2022-01-10 | 2025-12-05 | 고려대학교 산학협력단 | 다이아지린 분자를 이용한 광친화성 표지 복합체 및 이의 제조방법 |
| CN114839835B (zh) * | 2022-03-18 | 2025-12-09 | 清华大学 | 量子点的无损光刻图案化方法和设备 |
| CN115312971A (zh) * | 2022-08-18 | 2022-11-08 | 江阴纳力新材料科技有限公司 | 聚合物膜及其制备方法、复合集流体 |
| WO2024113041A1 (en) * | 2022-12-02 | 2024-06-06 | Xlynx Materials Inc. | Selectively activated diazirine-containing molecules and polymers |
| CN118421316A (zh) * | 2023-01-31 | 2024-08-02 | 华为技术有限公司 | 一种纳米晶复合材料及其应用方法 |
| CN119497548B (zh) * | 2023-08-15 | 2025-10-21 | 清华大学 | 一种量子点薄膜图案化方法与应用 |
| KR102895011B1 (ko) * | 2023-12-08 | 2025-12-02 | 포항공과대학교 산학협력단 | 비스디아지린을 포함하는 광가교제, 그를 이용한 광촉매 개질 및 수소생산장치 |
| CN117924964A (zh) * | 2023-12-22 | 2024-04-26 | 山东中康国创先进印染技术研究院有限公司 | 一种含有二氮丙啶结构的卡宾染料及其制备方法 |
| CN119977887A (zh) * | 2025-02-11 | 2025-05-13 | 四川大学 | 用于有机小分子半导体光图案化的化合物及其制备方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005056582A1 (en) | 2003-12-12 | 2005-06-23 | Merck Frosst Canada Ltd. | Ptp1b photoprobes |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4571375A (en) * | 1983-10-24 | 1986-02-18 | Benedikt George M | Ring-opened polynorbornene negative photoresist with bisazide |
| US6156478A (en) * | 1998-10-30 | 2000-12-05 | 3M Innovative Properties Company | Photocurable and photopatternable hydrogel matrix based on azlactone copolymers |
| US7799883B2 (en) | 2005-02-22 | 2010-09-21 | Promerus Llc | Norbornene-type polymers, compositions thereof and lithographic process using such compositions |
| WO2006120992A1 (ja) * | 2005-05-09 | 2006-11-16 | National University Corporation University Of Toyama | フェニルジアジリジン付加核酸誘導体とその製造方法、フェニルジアジリジン付加ヌクレオチド誘導体とその製造方法、並びにタンパク質の分析方法および調製方法 |
| GB0616724D0 (en) | 2006-08-23 | 2006-10-04 | Isis Innovation | Surface adhesion using arylcarbene reactive intermediates |
| JP2010101661A (ja) * | 2008-10-21 | 2010-05-06 | Girasol Bio Kk | 物質固定化法 |
| CN102933554A (zh) * | 2010-03-02 | 2013-02-13 | 黄玉梅 | 用于研究蛋白质-蛋白质相互作用的交联试剂、方法和组合物 |
| CN103649220B (zh) * | 2011-07-14 | 2015-09-09 | 住友电木株式会社 | 在成像式曝光于光化辐射下之后形成构图层的聚合物及其组合物 |
| US9511150B2 (en) * | 2011-07-19 | 2016-12-06 | CellMosaic, Inc. | Crosslinking reagents, macromolecules, therapeutic bioconjugates, and synthetic methods thereof |
| CN104066451B (zh) * | 2011-07-19 | 2017-04-05 | 希默赛生物技术有限责任公司 | 新交联试剂、大分子、治疗用偶联物及其合成方法 |
-
2015
- 2015-09-15 TW TW104130427A patent/TWI648271B/zh active
- 2015-09-23 EP EP15774833.6A patent/EP3197881B1/en active Active
- 2015-09-23 US US14/862,418 patent/US9938241B2/en active Active
- 2015-09-23 KR KR1020177007930A patent/KR102172938B1/ko active Active
- 2015-09-23 JP JP2017515763A patent/JP6479171B2/ja active Active
- 2015-09-23 CN CN201580051531.6A patent/CN106715399B/zh active Active
- 2015-09-23 WO PCT/US2015/051619 patent/WO2016049123A1/en not_active Ceased
-
2018
- 2018-03-01 US US15/909,289 patent/US10303060B2/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005056582A1 (en) | 2003-12-12 | 2005-06-23 | Merck Frosst Canada Ltd. | Ptp1b photoprobes |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6479171B2 (ja) | 2019-03-06 |
| EP3197881B1 (en) | 2020-04-29 |
| EP3197881A1 (en) | 2017-08-02 |
| US10303060B2 (en) | 2019-05-28 |
| CN106715399A (zh) | 2017-05-24 |
| KR20170058377A (ko) | 2017-05-26 |
| CN106715399B (zh) | 2020-05-19 |
| US20160083352A1 (en) | 2016-03-24 |
| JP2017530973A (ja) | 2017-10-19 |
| WO2016049123A1 (en) | 2016-03-31 |
| US9938241B2 (en) | 2018-04-10 |
| TW201613899A (en) | 2016-04-16 |
| US20180186747A1 (en) | 2018-07-05 |
| TWI648271B (zh) | 2019-01-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102172938B1 (ko) | 광가교결합제로서의 다이아지린 화합물 및 이를 포함하는 광이미지화 가능한 조성물 | |
| TWI627217B (zh) | 經胺處理之順丁烯二酸酐聚合物、組成物及其應用 | |
| US9690196B2 (en) | Photoimageable compositions containing thermal base generators | |
| US9291901B2 (en) | Amine treated maleic anhydride polymers with pendent silyl group, compositions and applications thereof | |
| CN109313388B (zh) | 负型感光性组合物 | |
| EP2998297A1 (en) | Photo-acid generating compounds, compositions comprising said compounds, composite and process for making said composite as well as uses of said compounds | |
| JP6564065B2 (ja) | 永久的な誘電体としてのマレイミド及びシクロオレフィンモノマーのポリマー | |
| US20160147145A1 (en) | Photoimageable compositions containing oxetane functionality | |
| US9823565B2 (en) | Photoimageable compositions containing photobase generators | |
| KR20160104380A (ko) | 포지티브형 감광성 수지 조성물, 감광성 수지막 및 이를 이용한 표시 소자 | |
| CN120883138A (zh) | 光敏树脂前体组合物、光敏树脂组合物、绝缘膜和半导体器件 | |
| EP4506753A2 (en) | Photosensitive composition | |
| KR20250051573A (ko) | 감광성 수지 전구체 조성물, 감광성 수지 조성물, 절연막 및 반도체 장치 | |
| CN115521243A (zh) | 一种三官能度交联剂及其制备方法和应用 | |
| KR20250020363A (ko) | 감광성 조성물 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| PA0302 | Request for accelerated examination |
St.27 status event code: A-1-2-D10-D17-exm-PA0302 St.27 status event code: A-1-2-D10-D16-exm-PA0302 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| N231 | Notification of change of applicant | ||
| PN2301 | Change of applicant |
St.27 status event code: A-3-3-R10-R13-asn-PN2301 St.27 status event code: A-3-3-R10-R11-asn-PN2301 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U12-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 6 |
|
| U11 | Full renewal or maintenance fee paid |
Free format text: ST27 STATUS EVENT CODE: A-4-4-U10-U11-OTH-PR1001 (AS PROVIDED BY THE NATIONAL OFFICE) Year of fee payment: 6 |