KR102161231B1 - 이온 장치와 함께 사용하기 위한 자석 및 이온 장치 - Google Patents

이온 장치와 함께 사용하기 위한 자석 및 이온 장치 Download PDF

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Publication number
KR102161231B1
KR102161231B1 KR1020167000777A KR20167000777A KR102161231B1 KR 102161231 B1 KR102161231 B1 KR 102161231B1 KR 1020167000777 A KR1020167000777 A KR 1020167000777A KR 20167000777 A KR20167000777 A KR 20167000777A KR 102161231 B1 KR102161231 B1 KR 102161231B1
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South Korea
Prior art keywords
coolant fluid
magnet
annular
core element
diameter
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KR1020167000777A
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English (en)
Korean (ko)
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KR20160021204A (ko
Inventor
스캇 배러클러프
제임스 에스. 버프
Original Assignee
베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크.
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Publication of KR20160021204A publication Critical patent/KR20160021204A/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00—Magnets
    • H01F7/06—Electromagnets; Actuators including electromagnets
    • H01F7/20—Electromagnets; Actuators including electromagnets without armatures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K7/00—Constructional details common to different types of electric apparatus
    • H05K7/20—Modifications to facilitate cooling, ventilating, or heating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00—Details of transformers or inductances, in general
    • H01F27/08—Cooling; Ventilating
    • H01F27/10—Liquid cooling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/152—Magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/152—Magnetic means
    • H01J2237/1526—For X-Y scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/303—Electron or ion optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Thermal Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Particle Accelerators (AREA)
  • Physical Vapour Deposition (AREA)
  • Hall/Mr Elements (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
KR1020167000777A 2013-06-14 2014-06-13 이온 장치와 함께 사용하기 위한 자석 및 이온 장치 Active KR102161231B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361835089P 2013-06-14 2013-06-14
US61/835,089 2013-06-14
US13/966,611 US9177708B2 (en) 2013-06-14 2013-08-14 Annular cooling fluid passage for magnets
US13/966,611 2013-08-14
PCT/US2014/042321 WO2014201363A1 (en) 2013-06-14 2014-06-13 Annular cooling fluid passage for magnets

Publications (2)

Publication Number Publication Date
KR20160021204A KR20160021204A (ko) 2016-02-24
KR102161231B1 true KR102161231B1 (ko) 2020-10-05

Family

ID=52018423

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167000777A Active KR102161231B1 (ko) 2013-06-14 2014-06-13 이온 장치와 함께 사용하기 위한 자석 및 이온 장치

Country Status (6)

Country Link
US (2) US9177708B2 (enExample)
JP (1) JP6429407B2 (enExample)
KR (1) KR102161231B1 (enExample)
CN (1) CN105283975B (enExample)
TW (1) TWI624856B (enExample)
WO (1) WO2014201363A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9177708B2 (en) * 2013-06-14 2015-11-03 Varian Semiconductor Equipment Associates, Inc. Annular cooling fluid passage for magnets
US10486232B2 (en) * 2015-04-21 2019-11-26 Varian Semiconductor Equipment Associates, Inc. Semiconductor manufacturing device with embedded fluid conduits
EP3707756B1 (en) 2017-11-07 2022-08-24 Gallium Enterprises Pty Ltd Buried activated p-(al,in)gan layers
CN110300487A (zh) * 2019-07-12 2019-10-01 兰州科近泰基新技术有限责任公司 一种多通道冷却真空四极磁铁装置
US10971327B1 (en) * 2019-12-06 2021-04-06 Applied Materials, Inc. Cryogenic heat transfer system
CN111601449B (zh) * 2020-05-28 2023-01-10 兰州科近泰基新技术有限责任公司 真空内超大型四极透镜的制造方法
US12100541B2 (en) * 2020-09-14 2024-09-24 Intel Corporation Embedded cooling channel in magnetics

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JP2005533353A (ja) * 2002-07-17 2005-11-04 バリアン・セミコンダクター・イクイップメント・アソシエーツ・インコーポレーテッド 注入装置のリボン形状イオンビームの特性制御
JP2009164326A (ja) * 2008-01-07 2009-07-23 Fuji Electric Systems Co Ltd 磁気コア
US20100237725A1 (en) * 2007-11-09 2010-09-23 Kazutaka Tatematsu Rotating electric machine and drive device

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JP2005533353A (ja) * 2002-07-17 2005-11-04 バリアン・セミコンダクター・イクイップメント・アソシエーツ・インコーポレーテッド 注入装置のリボン形状イオンビームの特性制御
US20100237725A1 (en) * 2007-11-09 2010-09-23 Kazutaka Tatematsu Rotating electric machine and drive device
JP2009164326A (ja) * 2008-01-07 2009-07-23 Fuji Electric Systems Co Ltd 磁気コア

Also Published As

Publication number Publication date
US9177708B2 (en) 2015-11-03
TW201506979A (zh) 2015-02-16
CN105283975B (zh) 2018-05-04
JP2016521913A (ja) 2016-07-25
US9852882B2 (en) 2017-12-26
US20160027610A1 (en) 2016-01-28
KR20160021204A (ko) 2016-02-24
TWI624856B (zh) 2018-05-21
US20140367583A1 (en) 2014-12-18
CN105283975A (zh) 2016-01-27
JP6429407B2 (ja) 2018-11-28
WO2014201363A1 (en) 2014-12-18

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