KR102159868B1 - Mixer, vacuum processing unit - Google Patents

Abstract

A mixer for uniformly mixing a first gas and a second gas, and a vacuum processing apparatus using the mixer are provided. The second cylinder main body 12 is disposed in non-contact with each other inside the first cylinder main body 11 so that the second cylinder opening 46 is located in the first cylinder main body 11, and the first cylinder main body 11 ) Forming a running space 48 between the inner first cylinder opening 45 and the second cylinder opening 46, and allowing a second gas to flow out from the second cylinder opening 46 to the running space 48, The first gas is discharged into the running space 48 from the gap 47 formed between the first and second cylinder bodies 11 and 12, and the first and second gases are supplied to the first gas. It flows into the pouring space 48 in the enclosed state, and flows out into the mixing container 10 from the 1st cylinder opening 45. The first and second gases go straight through the inside of the mixing container 10, collide with the wall surface facing the first cylinder opening 45 of the mixing container 10, and a vortex of the first and second gases is formed, Even if the difference between the flow rates of the first and second gases supplied to the mixing vessel 10 is large, they are uniformly mixed.

Description

Mixer, vacuum processing unit

The present invention relates to the technical field of a gas mixer and a vacuum processing apparatus using the mixer.

In order to mix different kinds of gases, different kinds of gases flowing through two pipes are merged and flowed into one pipe having a bent part, and when two types of gases flow through the bent part, two types of gas are generated by the eddy current generated in the bent part. The gases are mixed.

This mixing method may have a simple shape and low cost, but the pressure loss generated in the bent portion is large.

In particular, when the pressure of one gas source is high and the pressure of the other gas source is low among the two types of gases, due to pressure loss, the amount of gas supplied from the low pressure gas source decreases, and the gas flow ratio decreases. It deviates from the desired value.

In particular, one gas is a gas at room temperature and pressure, the gas source of the gas is Bombay, and the other gas is a raw material of gas generated by heating and sublimating or evaporating a solid or liquid raw material. In the case of forming a thin film by reacting a gas, the growth rate of the thin film decreases when the supply amount of the gaseous raw material decreases.

A rectangular parallelepiped container is used as a mixing container, a pipe through which different types of gases flow is connected to the mixing container, two types of gases are mixed by a vortex generated in the mixing container, and the mixed gas is taken out through one pipe. There is a method, and there is an advantage that the pressure loss is small.

However, there is a problem that the degree of mixing is affected by the position where the pipe is connected to the mixing container, and the two types of gases are not uniformly mixed. In particular, when two types of gases with greatly different flow rates are introduced into the mixing container, inside the mixing container, when the two types of gases are located in different regions, and forming a thin film with the obtained mixed gas, only a thin film having a poor film thickness distribution is obtained. Does not.

In particular, recently, a plasma CVD method using TEOS as a raw material is widely used as a material for the SiO ₂ film used in a semiconductor device, and after the TEOS gas and oxygen gas are mixed inside a mixing vessel, plasma is formed.

When a substance such as TEOS, which becomes a liquid at room temperature, is gasified and gas is transported, the gas pressure is determined by the vapor pressure and temperature of the substance.

In the case of carrying out gas transport, the situation is good for the device design that the pressure of the source gas at the evaporation site (or the sublimation site) is high, but it is difficult to maintain the temperature of the device above a certain level due to the device configuration. Therefore, there is an upper limit on the vapor pressure of a substance that becomes a liquid or solid at room temperature, that is, the pressure of the transporting raw material gas.

In general, the vapor pressure of the liquid TEOS is difficult to secure a value of 2600 Pa or more, so the differential pressure between the pressure at the place where the TEOS gas is generated and the pressure in the mixing vessel becomes small, so oxygen gas filled with high pressure in the gas cylinder It is simple to increase the flow rate of the TEOS gas, but it is difficult to increase the flow rate of the TEOS gas.

The prior art using a mixing vessel is described in the following literature.

Japanese Laid-Open Patent Publication No. Hei 10-150030 Japanese Patent Laid-Open Publication No. 2001-335941

The present invention was created to solve the problems of the prior art, and an object thereof is to provide a mixer capable of uniformly mixing two types of gases, and a vacuum processing apparatus using the mixer.

In order to solve the above problems, the present invention provides a mixing vessel in which the internal space is separated from the external atmosphere, and a first cylinder in the shape of a cylinder through which the first gas introduced to the root side flows out from the opening of the first cylinder at the front end A main body, a second cylinder body in the shape of a cylinder through which the second gas introduced to the root side flows out from the second cylinder opening on the front end side, and an outlet formed on the wall of the mixing vessel, wherein the first cylinder opening comprises: The first barrel opening is spaced apart from the wall surface of the mixing container facing and disposed inside the mixing container, and at least a part of the second barrel body has an outer peripheral side surface of the second barrel body that is an inner circumference of the first barrel body. The first gas flows through a gap between the inner circumferential side of the first cylinder body and the outer circumferential side of the second cylinder body, and is disposed inside the first cylinder body in a non-contact state with the side surface. The second barrel opening is disposed inside the first barrel main body, and the first barrel opening is disposed at a position closer than the second barrel opening from the wall surface of the mixing container to which the first barrel opening faces, , The first and second gases are discharged from the opening of the first cylinder to the inside of the mixing container and are mixed in the mixing container, and the mixed gas generated by mixing the first and second gases, It is a mixer that flows out from the outlet to the outside of the mixing container.

In the present invention, the first cylinder body and the second cylinder body each extend along a straight line parallel to each other, the first gas flowing out of the first cylinder opening into the mixing container and going straight, the It is a mixer in which the outlet is arranged so that the second gas flowing out of the opening of the second cylinder and moving straight forward does not enter the outlet.

In the present invention, the outlet is an outer side of the crossing portion, which is a wall surface of a portion where the wall surface of the mixing container and the virtual cylinder virtually extending the outer circumferential side of the first cylinder body in the direction in which the first cylinder body is extended It is a mixer formed on the wall.

In the present invention, the outlet port is at least partially disposed at a position where the wall surface of the mixing container and the virtual cylinder virtually extending the outer circumferential side of the first cylinder body in the extending direction And a mixer having a baffle plate member formed between the first barrel opening and the outlet.

In the present invention, the mixing vessel is a rectangular parallelepiped, and four of the six walls of the mixing vessel are arranged parallel to the outer periphery of the first tubular body to face the outer periphery of the first tubular body. .

In the present invention, the first cylinder body and the second cylinder body are mixers having a circular cross-sectional shape on an inner peripheral side.

The present invention has a gas supply device, a mixer, a gas transfer pipe, a vacuum chamber, and a gas discharge device, wherein a first gas and a second gas are introduced from the gas supply device to the mixer, and the first gas and The second gas is mixed in the mixer to generate a mixed gas, and the generated mixed gas is transferred from the mixer to the gas discharge device by the gas transfer pipe, and discharged from the gas discharge device to the inside of the vacuum tank. And, a vacuum processing apparatus in which an object to be treated disposed inside the vacuum chamber is vacuum-treated, wherein the mixer includes a mixing container in which an internal space is separated from an external atmosphere, and a first gas introduced to the root side is A cylindrical first cylindrical body flowing out from the first tubular opening, a second tubular second gas introduced to the root side flowing out from the second tubular opening at the front end, and on the wall of the mixing container It is formed and has an outlet to which the gas transfer pipe is connected, and the first cylinder opening is disposed inside the mixing vessel by being spaced apart from the wall surface of the mixing vessel facing the first cylinder opening, and the second cylinder At least a part of the main body is disposed inside the first cylinder body in a state in which an outer peripheral side surface of the second cylinder body is non-contact with the inner peripheral side surface of the first cylinder body, and the inner peripheral side surface of the first cylinder body and the The first gas flows through a gap between the outer peripheral side surfaces of the second cylinder body, the second cylinder opening is disposed inside the first cylinder body, and the first cylinder opening is the first cylinder opening Is disposed at a position closer to the opening of the second cylinder from the wall surface of the mixing container facing each other, and the first and second gases are discharged from the opening of the first cylinder into the inside of the mixing container to be inside the mixing container The mixed gas produced by mixing the first and second gases is a vacuum processing apparatus that is introduced into the gas transfer pipe from the outlet.

In the present invention, the gas supply device includes a gas generation container in which a raw material is disposed, and a heating device that heats the raw material in the gas generation container, and one of the first gas or the second gas As the raw material is heated by the heating device, a raw material gas generated by sublimation or evaporation is supplied to the mixing container, and as the other gas, a gas that is a gas at least at room temperature and pressure is supplied to the mixing container. It is a vacuum processing device.

The present invention is a vacuum processing apparatus in which a thin film is formed on the surface of an object to be treated disposed inside the vacuum chamber by a chemical reaction of the first gas and the second gas contained in the mixed gas discharged into the vacuum chamber. .

The present invention is a vacuum processing apparatus provided with a plasma apparatus for converting the mixed gas supplied from the mixer into plasma.

In the present invention, the first cylinder body and the second cylinder body each extend along a straight line parallel to each other, the first gas flowing out of the first cylinder opening into the mixing container and going straight, the This is a vacuum processing apparatus in which the outlet is disposed so that the second gas flowing out of the opening of the second cylinder and moving straight forward does not enter the outlet.

In the present invention, the outlet is an outer side of the crossing portion, which is a wall surface of a portion where the wall surface of the mixing container and the virtual cylinder virtually extending the outer circumferential side of the first cylinder body in the direction in which the first cylinder body is extended It is a vacuum processing device formed on the wall surface.

In the present invention, the outlet port is at least a part of the crossing portion, which is a wall surface of a portion where the wall surface of the mixing container and the virtual cylinder virtually extending the outer circumferential side of the first cylinder body in the direction in which the first cylinder body is extended Is disposed so as to overlap, and a baffle plate member is formed between the opening of the first cylinder and the outlet.

In the present invention, the mixing vessel is a rectangular parallelepiped, and four of the six walls of the mixing vessel are disposed parallel to the outer periphery of the first tubular body to face the outer peripheral side of the first tubular body. Device.

In addition, the present invention is a vacuum processing apparatus in which the first cylinder body and the second cylinder body have a circular cross-sectional shape on an inner peripheral side.

The mixer of the present invention can uniformly mix different types of first gas and second gas introduced into the mixer. In particular, the mixer of the present invention can uniformly mix the first gas and the second gas even when the flow rate difference between the first gas and the second gas is large.

Further, even when the first or second gas is supplied to the mixer at a pressure close to the pressure inside the mixer, the first and second gases can be uniformly mixed.

It can also be mixed with a small pressure loss.

Therefore, the vacuum processing apparatus of the present invention can uniformly vacuum the surface of the object to be treated.

1(a) is an example of the vacuum processing apparatus of the present invention, and FIG. 1(b) is another example of the vacuum processing apparatus of the present invention.
Fig. 2 is a first embodiment of the mixer of the present invention.
3 is a second embodiment of the mixer of the present invention.
4 is a third embodiment of the mixer of the present invention.
5 is a fourth embodiment of the mixer of the present invention.
6 is a fifth embodiment of the mixer of the present invention.
7 is a mixer that is a first comparative example.
8 is a second comparative example, a mixer.
9 is a mixer which is a third comparative example.
Fig. 10(a) is a mass fraction distribution (introduction example 1) of the TEOS gas in the mixer of the second embodiment, and Fig. 10(b) is a view showing the boundary line of the distribution and the dimensions of the mixing container.
Fig. 11(a) is a mass fraction distribution (introduction example 2) of the TEOS gas in the mixer of the second embodiment, and Fig. 11(b) is a boundary line of the distribution.
Fig. 12(a) is a mass fraction distribution (introduction example 1) of the TEOS gas of the mixer of the second embodiment in which the length of the tanking space is changed, and Fig. 12(b) shows the boundary line of the distribution and the dimensions of the mixing container. It is a drawing.
Fig. 13(a) is a mass fraction distribution (introduction example 2) of the TEOS gas in the mixer of the second embodiment in which the length of the running space is changed, and Fig. 13(b) is a boundary line of the distribution.
Fig. 14(a) is a mass fraction distribution (introduction example 1) of the TEOS gas in the mixer of the fourth embodiment, and Fig. 14(b) is a boundary line of the distribution.
Fig. 15(a) is a mass fraction distribution of TEOS gas in the mixer of Comparative Example 1 (Introduction Example 1), and Fig. 15(b) is a boundary line of the distribution.
Fig. 16(a) is a mass fraction distribution (introduction example 1) of TEOS gas in the mixer of Comparative Example 2, and Fig. 16(b) is a boundary line of the distribution.
Fig. 17(a) is a mass fraction distribution (introduction example 1) of the TEOS gas in the mixer of Comparative Example 3, and Fig. 17(b) is a boundary line of the distribution.
Fig. 18(a) is a mass fraction distribution of TEOS gas in the mixer of Comparative Example 3 (Introduction Example 2), and Fig. 18(b) is a boundary line of the distribution.
19 is a diagram showing a correspondence relationship between a pattern and a mass fraction of TEOS gas.

Reference numeral 2 in Fig. 1(a) denotes a vacuum processing apparatus of the present invention.

This vacuum processing apparatus 2 has a vacuum chamber 24, and in the vacuum chamber 24, a discharge apparatus 19, a gas supply apparatus 4, and a mixer 3 as a first embodiment of the present invention ) Is formed.

A vacuum evacuation device 33 is connected to the vacuum chamber 24, and when the inside of the vacuum chamber 24 is evacuated by the vacuum evacuation device 33, the inside of the mixer 3 is also evacuated. .

The mixer 3 and the gas supply device 4 are arranged outside the vacuum tank 24.

The gas supply device 4 has an auxiliary raw material gas supply device 8 and a main raw material gas supply device 9.

The auxiliary raw material gas supply device 8 is a gas bomber here, and the auxiliary raw material gas supply device 8 is at room temperature ("normal temperature" means a temperature of 5°C to 35°C: Japanese Industrial Standard JIS Z 8703). At normal pressure ("normal pressure" means a pressure of 1013 hPa), the auxiliary raw material gas, which is a gas, is filled.

The main raw material gas supply device 9 has a gas generation container 5, a raw material 6, and a heating device 7. The raw material 6 is disposed inside the gas generation container 5, and the inside of the gas generation container 5 is evacuated by the vacuum exhaust device 33, and the gas is generated by the heating device 7 When the production container 5 is heated, the raw material 6 is heated, and when the sublimation temperature or evaporation temperature is reached, the main raw material gas which is the gas of the raw material 6 is generated by sublimation or evaporation. The raw material 6 may be directly heated by the heating device 7 to generate the main raw material gas which is the gas of the raw material 6 by sublimation or evaporation.

Of the auxiliary raw material gas supply device 8 and the main raw material gas supply device 9, one of the devices is connected to the mixer 3 through the first pipe 26, and the other device is connected to the second pipe 27. As a first gas, one of the auxiliary raw material gas supplied from the auxiliary raw material gas supply device 8 and the main raw material gas supplied from the main raw material gas supply device 9 connected to the mixer 3 is It is supplied to the mixer 3 through the first pipe 26, and the other gas is supplied as the second gas to the mixer 3 through the second pipe 27.

The inside of the vacuum chamber 24 and the inside of the mixer 3 are evacuated by the vacuum exhaust device 33, and even if the first and second gases are supplied to the mixer 3, the mixer 3 and the vacuum chamber (24) Inside the vacuum atmosphere is maintained.

2 shows the structure of the mixer 3.

The mixer 3 has a mixing container 10 in which the internal space is separated from the external atmosphere, and in the internal space of the mixing container 10, a first cylindrical cylinder having a hollow inside and a circular cross section. The main body 11 is arranged. A cylindrical second cylindrical body 12 having a hollow inside and a circular cross section is disposed inside the first cylindrical body 11. The mixing container 10 is a rectangular parallelepiped, and of the four surfaces extending in the longitudinal direction, two surfaces parallel to each other as the largest area are arranged horizontally. The first cylindrical body 11 and the second cylindrical body 12 are arranged so that the central axis of the cylindrical shape is horizontal. FIG. 2 is a horizontal cross-sectional view of the mixer 3 and is a view when viewed from above.

The mixer 3 of this embodiment has a vanishing chamber 21, the first pipe 26 is connected to the vanishing chamber 21, and the first gas passing through the first piping 26 is evacuated by vacuum. It is introduced into the interior 22 of the vanishing chamber 21.

A small hole 23 is formed in the wall of the vanishing chamber 21, and in the wall of the vanishing chamber 21, one end of the first cylinder body 11 and a hollow portion of the first cylinder body 11 It is fixed so that it may be connected to the small hole 23, and the other end of the 1st cylinder main body 11 is arrange|positioned inside the mixing container 10. The interior of the chamber 21 is connected to the interior of the mixing vessel 10 by the first cylinder body 11, and the first gas introduced into the interior of the chamber 21 by the first pipe 26, It passes through the first pipe 26 and is supplied into the mixing container 10. The inside of the vanishing chamber 21 is separated from the inside of the mixing container 10 in a portion other than the first cylinder body 11.

Here, among the walls of the mixing container 10, the wall in contact with the external atmosphere of the mixing container 10 is the wall of the discharging chamber 21, and the walls of the discharging chamber 21 have first and second inlet ports. (37, 38) is formed. The front end of the first pipe 26 is connected to the first inlet 37, and the first gas passing through the first pipe 26 is dissipated from the first inlet 37 and the inside of the chamber 21 22 It is supposed to be introduced in.

The small hole 23 is formed in the wall of the wall of the vanishing chamber 21 that contacts the atmosphere inside the mixing container 10.

The second cylinder body 12 is inserted through the second inlet 38 and the small hole 23, and at least a part of the front end side of the second cylinder body 12 is inside the first cylinder body 11 The gap 47 is formed between the outer peripheral side surface of the first cylinder body 11 and the inner peripheral side surface of the second cylinder body 12.

Between the edge portion of the first inlet 37 and the tip end of the first pipe 26, and between the edge portion of the second inlet 38 and the outer circumferential surface of the second cylinder body 12, it becomes airtight and disappears. In the interior of (21) or the interior of the mixing container 10, the atmosphere is prevented from entering from the 1st and 2nd introduction ports 37, 38.

Here, of the second cylinder body 12, the outer peripheral side surface of the portion inserted into the first cylinder body 11 and positioned inside the first cylinder body 11 is the inner peripheral side surface of the first cylinder body 11 And non-contact.

The gap 47 formed between the inner circumferential side surface of the first cylinder body 11 and the outer circumferential side surface of the second cylinder body 12 is connected to the inner space of the vanishing chamber 21 with a portion on the root side, and the vanishing 21 ), the first gas introduced into the gap 47 is introduced into the gap 47 that is a portion between the outer peripheral side surface of the second cylinder body 12 and the inner peripheral side surface of the first cylinder body 11 from the root side of the gap 47.

A first cylinder opening 45 is formed at the tip of the first cylinder body 11 located inside the mixing container 10, and at the tip side of the second cylinder body 12, a second cylinder opening 46 ) Is formed.

The base side of the second cylinder body 12 is connected to the second pipe 27, and the inside of the second cylinder body 12 and the inside of the second pipe 27 are connected through the second inlet 38, In addition, the second gas that has passed through the second pipe 27 is introduced into the second cylinder main body 12 through the second inlet 38.

The 2nd cylinder opening 46 is located in the inner hollow part of the 1st cylinder main body 11, From the 2nd cylinder opening 46, the 2nd gas flows into the inside of the 1st cylinder main body 11 .

As the hollow portion inside the first cylinder body 11, when the portion between the first cylinder opening 45 and the second cylinder opening 46 is referred to as the pouring space 48, the second gas is the second cylinder opening It flows out from 46 to the running space 48.

The gap 47 is connected to the running space 48 around the second cylinder opening 46, and the first gas flowing through the gap 47 is connected to the running space 48 of the gap 47. It flows out from the part into the running space 48.

The pouring space 48 is surrounded by the first cylinder body 11, so that the first and second gases flowing out to the pouring space 48 cannot be diffused.

The flow direction of the first gas flowing out into the running space 48 is the same direction as when flowing through the gap 47, and the direction in which the second gas flowing out into the running space 48 flows is also indicated by the second cylinder body ( 12) It is the same direction as when it was flowing inside.

The first and second cylinder bodies 11 and 12 are tubes having a constant thickness and are extended in a straight line, and the first gas inside the gap 47 is in the direction in which the first cylinder body 11 is extended. It goes straight along, and the 2nd gas inside the 2nd cylinder main body 12 goes straight along the direction in which the 2nd cylinder main body 12 extends. In the running space 48, the first and second gases flow in the same direction as just before flowing out into the running space 48. Since the second gas flows inside the first gas that normally flows, in the inside of the driving space 48, the second gas flows in a state surrounded by the first gas, and the first , The second gas flows out into the mixing container 10 from the first cylinder opening 45 while the second gas is surrounded by the first gas.

Since the first cylinder body 11 is not located around the first and second gases that have flowed out from the first cylinder opening 45, therefore, the first and second gases that have flowed out from the first cylinder opening 45 The flow of is diffused, but the diffusion is small, so the first and second gases that have flowed out from the first cylinder opening 45 can be regarded as going straight in the same direction as when flowing through the running space 48 .

The shape of the gap 47 is a donut shape, and in the pouring space 48, the first gas flowing out from the gap 47 flows around the second gas, and the second gas is surrounded by the first gas. It is flowing in the state.

Reference numeral 29 in FIG. 2 denotes a virtual cylinder that is a cylinder when the outer peripheral side surface of the first cylinder body 11 is virtually extended in the direction in which the first cylinder body 11 is extended, and the first and second gases Is, goes straight in the direction in which this virtual cylinder 29 is extended.

In the wall of the mixing container 10, an outlet 28 connected to one end of the gas transfer pipe 25 is formed. The other end of the gas transfer pipe 25 is connected to the discharge device 19, and the inner space of the mixing container 10 and the inner space of the discharge device 19 are connected to the outlet 28 and the gas transfer pipe 25. It is connected by

The virtual cylinder 29 intersects with the wall surface facing the first cylinder opening 45 in the wall surface of the mixing container 10, and the outlet 28 is in the wall surface, and the virtual cylinder 29 is on the wall surface. It is formed on the wall surface of a portion located outside the intersection portion 14, which is a portion formed to intersect.

The direction in which the first cylinder body 11 is extended and the direction in which the second cylinder body 12 is extended are parallel, and the first and second gases flowing out from the first cylinder opening 45 are the first cylinder body ( 11) Go straight in the direction parallel to the direction of elongation. There is no case that the first and second gases that have gone straight are introduced into the outlet 28.

The second gas flowing out from the first cylinder opening 45 flows through the mixing vessel 10 in a state surrounded by the first gas and collides with the wall surface where the virtual cylinder 29 intersects. Since the second gas impinging on the wall flows in all directions along the wall, the first gas that collides with the second gas flowing in all directions does not collide with the wall by the second gas that diffuses along the wall. It flows in all directions.

As a result, both of the first and second gases that have flowed out from the first cylinder opening 45 diffuse along the wall surface facing the first cylinder opening 45.

A donut-shaped mixing space 13 centered around the virtual cylinder 29 and the first cylinder body 11 is formed around the virtual cylinder 29 and the first cylinder body 11.

The first and second gases diffused along the wall surface where the second gas collided collides with the other wall surface of the mixing container 10, and also collides with the outer peripheral surface of the first cylinder body 11, and the first, The direction in which the second gas flows is changed, and the first and second gases enter the interior of the mixing space 13, and a vortex of the first and second gases is formed in the mixing space 13. When this vortex is formed, the first and second gases flowing through the interior of the mixing space 13 are uniformly mixed by forming a vortex to generate a mixed gas.

The generated mixed gas flows into the outlet 28 from the mixing space 13, passes through the gas transfer pipe 25, and moves to the discharge device 19.

The discharge device 19 has a discharge container 35 in which a cavity 39 is formed, and the mixed gas that has moved inside the gas transfer pipe 25 is introduced into the cavity 39.

Inside the vacuum chamber 24, a stand 31 is arranged, and on the stand 31, a processing object 30 such as a substrate is arranged. Of the surfaces of the discharge container 35, at least one surface is disposed inside the vacuum chamber 24, and the surface is directed in the direction in which the base 31 is located.

A plurality of discharge ports 36 are formed on the surface of the discharge container 35 directed in the direction in which the base 31 is located, and the mixed gas introduced into the cavity 39 is the object to be treated from the discharge port 36 It is discharged into the interior of the vacuum tank 24 toward 30. In this vacuum processing apparatus 2, the discharge vessel 35 is connected to a plasma apparatus 34 constituted by a plasma power supply, and when the plasma apparatus 34 applies a voltage to the discharge vessel 35, the mixed gas is When plasma is generated, the first gas and the second gas are chemically reacted to generate a solid, a thin film made of the generated solid is grown on the surface of the object to be treated 30.

When the thin film has grown to a predetermined film thickness, the voltage output of the plasma device 34 is stopped, the valves formed in the first and second pipes 26 and 27 are closed to supply the mixed gas into the vacuum tank 24 Is stopped, the object to be treated 30 is moved to the outside of the vacuum tank 24, and the object to be treated 30 is carried into the inside of the vacuum tank 24, placed on the stand 31, and the valve is By opening, the mixed gas is supplied to the inside of the vacuum chamber 24 by the discharge device 19, and a voltage is output from the plasma device 34 to form a plasma of the mixed gas, thereby forming a plasma on the surface of the object 30 to be treated. To form a thin film.

In this way, a mixed gas is generated from the first and second gases, plasma of the mixed gas is generated in a vacuum atmosphere, and a thin film is formed on the plurality of objects to be processed 30.

In the mixer 3, the outlet 28 was formed on the wall surface where the first cylinder opening 45 faces directly, but the outlet 28 flows out from the first cylinder opening 45 and goes straight ahead. It may be arranged at a position where the second gas does not flow, and may be arranged on a wall surface other than the wall surface where the virtual cylinder 29 intersects.

<Vacuum treatment apparatus of another example>

Reference numeral 2a in Fig. 1(b) denotes a vacuum processing apparatus according to another example of the present invention.

In the mixer 3a of FIGS. 1(b) and 3, the first and second cylinder openings 45a, 46a of the first and second cylinder bodies 11a, 12a are disposed inside the mixing vessel 10 The outlet 28a is formed on the wall surface perpendicular to the wall surface where the first cylinder opening 45a directly faces, and is a mixer 3a of the second embodiment in which the mixer 3 of the first embodiment is modified. .

As shown below, from the evaluation value of the TEOS gas mass fraction, TEOS gas produced by evaporating liquid TEOS (tetraethoxysilane: molecular weight 208.37) is usually used as the first gas, and the second gas is used as the second gas. , Oxygen gas (O ₂ : molecular weight 31.99) filled in the cylinder is used, but in the above example, oxygen gas filled in the cylinder is used for the first gas, and TEOS of the liquid is evaporated for the second gas. TEOS gas is being used.

<Exchange of first and second gas>

Fig. 10(a) shows the first and second cylinder bodies using TEOS gas as the first gas and oxygen gas as the second gas as an introduction example 1 to the mixer 3a of the second embodiment of Fig. 3 The mass of the TEOS gas and the mass of the oxygen gas at a plurality of calculation locations inside the mixing vessel 10 when introduced into (11a, 12a), respectively, and flowed out to the outlet (28a) are calculated by distribution simulation, and the following expression,

TEOS gas mass fraction = TEOS gas mass/ (TEOS gas mass + oxygen gas mass)

From, the TEOS gas mass fraction at the calculation location inside the mixing vessel 10 was obtained, and the mass fraction distribution diagram of the TEOS gas in Fig. 10A was created.

And while creating a distribution diagram, when the maximum value of the values of the mass fraction of the TEOS gas at the place flowing out from the inside of the mixing container 10 to the outlet 28a is set to A and the minimum value to B, the following equation:

Evaluation value (%) = ± (A-B)/(A + B) × 100

The evaluation value of the mass fraction distribution of the TEOS gas was calculated by.

In addition, in Fig. 10(a) and other drawings to be described later showing the mass fraction distribution, and each drawing showing the boundary line of the mass distribution step to be described later, the outlet is omitted. In Fig. 10(a) and each of the drawings to be described later showing the mass fraction distribution, the value of the TEOS gas mass fraction is divided into four steps, and the display pattern is changed. The relationship between these patterns and the mass fraction of TEOS gas is shown in FIG. 19.

In the mass fraction distribution diagram of Fig. 10(a), the mass fraction distribution chart is obtained by assuming that the oxygen gas flowed through the first or second cylinder bodies 11a, 12a at a flow rate greater than that of the TEOS gas, and here, TEOS gas and O The flow rate ratio of the ₂ gas is 12:600, and the inside of the mixing container 10 is 2000 Pa, and the mass fraction distribution in the mixing container 10 is calculated.

The TEOS gas and oxygen gas of the following examples and comparative examples were introduced into the first and second cylinder bodies 11a and 12a at the same pressure as in Fig. 10A, and the distribution of mass fractions was obtained.

As can be seen from FIG. 10A, in this introduction example 1, the first gas and the second gas are uniformly mixed by the vortex formed in the mixing space 13.

The evaluation value of the mass fraction distribution of the TEOS gas in the mixed gas supplied from the outlet 28a is a value of ±0.48%.

Fig. 10(b) shows the steps of the distances between the first and second cylinder bodies 11a and 12a and the wall surface, and the values of the adjacent TEOS gas mass fraction when the display pattern is removed from Fig. 10(a). It shows the indicated boundary line.

After the first gas flows a distance of 20 mm in the gap 47, the first and second gas flows a distance of 42.5 mm in the running space 48, and flows out from the first cylinder opening 45a to 52.5 mm. The second gas is colliding with the wall surface of the mixing container 10 while passing through the distance.

Fig. 10(a) shows the mass fraction distribution when the first gas passing through the gap 47 has a lower flow rate (low pressure) than the second gas passing through the second cylinder body 12a, Contrary to the introduction example 2, oxygen gas was introduced into the first gas of the same mixer 3a, TEOS gas was introduced as the second gas, and the second gas passing through the second cylinder body 12a, The flow rate (low pressure) was made lower than that of the first gas passing through the gap 47.

The boundary of the mass fraction distribution of the TEOS gas of the introduction example 2 is shown in Figs. 11(a) and (b). The mass fraction distribution of Fig. 11(a) is a distribution of the same degree as the mass fraction distribution of Fig. 10(a), and is mixed to the same degree. In the case of Fig. 11(a), the evaluation value of the mass fraction distribution of the TEOS gas in the mixed gas supplied from the outlet 28a is a value of ±0.42%.

Next, the first cylinder body 11a when measuring the mass fraction distribution in Figs. 10 (a) and 11 (a) is shortened by 20 mm, and in the same manner as in Introduction Example 1, TEOS gas is used as the first gas. It was used, and the mass fraction distribution was calculated using oxygen gas as the second gas. The mass fraction distribution is shown in Fig. 12(a), and the boundaries and dimensions of different values are shown in Fig. 12(b). Dimensions other than the length of the first cylinder body 11a are the same as in Fig. 10B.

Since the first cylinder body 11a is shortened, the distribution of the mass fraction in Fig. 12(a) is in the vicinity of the wall surface close to the first cylinder body 11a among the two wall surfaces parallel to the first cylinder body 11a. It becomes non-uniform, and the uniformity is worse than the distribution of the mass fraction in FIG. 10(a). It can be said that this is because the first cylinder opening 45a is not disposed in the vicinity of the center of the mixing space 13, which is a space in which a vortex is formed.

In addition to the wall surface of the mixing container 10, the appropriate position of the first cylinder opening 45a is the wall surface of the chamber 21 and the surface of the baffle plate member 44 to be described later as a "wall surface", and the first, When the mixing space distance L, which is the distance between the two wall surfaces forming the mixing space 13 in the mixing container 10 in the direction in which the second cylinder main bodies 11a and 12a extend, is "1", the first, It is located within the range of a distance of 2/5 or more and 3/5 or less from the wall surface on the root side of the second cylinder main bodies 11a and 12a.

From Fig. 10(a), the center of the mixing space 13 is a position 57.5 mm away from the chamber 21, and the position corresponding to the range of 2/5 or more and 3/5 is the range of 46 mm or more and 69 mm or less. Therefore, the first cylinder opening 45a in Fig. 10(a) is located within the range of a distance of 2/5 or more and 3/5 or less when viewed from the mixing container 10, but the center position of the mixing space 13 When viewed from, it is out of range.

However, the evaluation value of the mass fraction distribution of the TEOS gas in the mixed gas supplied from the outlet 28a is a value of ± 0.93%, and the value of the distribution is relatively uniformly mixed with the first gas and the second gas. Since it is a value within the range that can be judged, the degree of mass fraction distribution to be determined, such as taking into account the necessity of forming the outlet 28a close to the wall surface on the far side of the two wall surfaces parallel to the first cylinder body 11a. There is a need to choose the layout according to the. However, if it is the configuration of Fig. 10, there is no need to pay such attention.

Next, the boundary line of the mass fraction distribution in the case where oxygen gas is used for the first gas and TEOS gas is used for the second gas (Introduction Example 2) in the mixer 3a having the dimensions of FIG. 12 is shown in FIG. 13(a). and (b).

From Fig. 13(a), it can be seen that the outlet 28a may be formed in the center of the wall surface facing the first cylinder opening 45a. The evaluation value of the mass fraction distribution of the TEOS gas in the mixed gas supplied from the outlet 28a is a value of ±1.04%, and it can be determined that the first gas and the second gas are relatively uniformly mixed.

<Third Example>

In the mixers 3 and 3a described above, the first gas was introduced into the chamber 21 formed inside the mixing container 10, and the first gas in the chamber 21 was moved to the gap 47, but FIG. Like the mixer 3b of the third embodiment shown in 4, a gap 47 is also formed outside the mixing container 10 without forming the vanishing chamber 21 to allow the first gas to be removed from the outside of the mixing container 10. You may introduce it into the gap 47.

The first and second cylinder openings 45b and 46b of the first and second cylinder bodies 11b and 12b in this case are disposed inside the mixing vessel 10, but the gap 47 is the mixing vessel 10 ), the first and second cylinder bodies 11b and 12b also include portions that form the gap 47 outside the mixing container 10.

<Fourth Example>

When the first and second cylinder bodies 11b and 12b are extended outside the mixing container 10 like the mixer 3b of the third embodiment, the mixer 3c of the fourth embodiment of FIG. Similarly, the first cylinder body 11c is positioned inside and outside the mixing vessel 10, the first cylinder opening 45c is positioned inside the mixing vessel 10, while the second cylinder body 12c ) Is inserted into the outer portion of the first cylinder body 11c, and the second cylinder opening 46c is positioned at the same position as the wall of the mixing vessel 10 or outside the wall of the mixing vessel 10. have.

The mass fraction distribution of this mixer 3c is shown in FIG. The first gas is TEOS gas, and the second gas is oxygen gas (Introduction example 1). Since the first cylinder opening 45c is located in the range of 2/5 or more and 3/5 or less, good mixing is possible and uniform mixing is achieved.

<Fifth Example>

In the mixers 3, 3a to 3c of the first to fourth embodiments, the outlets 28, 28a are formed outside the portion 14 where the virtual cylinder 29 and the wall surface of the mixing vessel 10 intersect. However, in the mixer 3d of the fifth embodiment of Fig. 6, the outlet 28 is the first cylinder body in the direction in which the first cylinder body 11d extends in the mixer 3 of the first embodiment of Fig. 2 It is arrange|positioned so that the virtual cylinder 29 which extended the outer peripheral side of (11d) virtually, and the intersection part 14 which is the wall surface of the wall surface of the wall surface of the mixing container 10 may all or at least partially overlap.

And in the mixer 3d of the fifth embodiment, the baffle plate member 44 is disposed between the first cylinder opening 45d and the outlet 28.

The baffle plate member 44 is positioned between the first cylinder opening 45d and the outlet 28, and is positioned between the second cylinder opening 46d and the outlet 28, and the second cylinder opening 46d The second gas discharged from and going straight in a direction parallel to the direction in which the second cylinder body 12d is elongated, collides with the surface of the baffle plate member 44 and moves in a direction along the surface of the baffle plate member 44. Spreads.

The first gas discharged from the first cylinder opening 45d and traveling straight in a direction parallel to the direction in which the first cylinder body 45d extends is caused by a second gas that diffuses along the surface of the baffle plate member 44. Since it flows in a direction along the surface of the baffle plate member 44 or collides with the surface of the baffle plate member 44 and flows in a direction along the surface of the baffle plate member 44, from the first cylinder opening 45d The first and second gases that are discharged and go straight are mixed in the mixing space 13 without flowing into the outlet 28, and a mixed gas in which the first gas and the second gas are uniformly mixed is introduced into the outlet 28. It is supplied to the discharge device 19.

In the mixers 3, 3a to 3c of the first to fourth embodiments, the outlet ports 28 and 28a are formed on the outer wall surface of the cross section 14 among the wall surfaces of the mixing container 10. Among the wall surfaces of the mixing container 10, wall surfaces other than the wall surface to which the first cylinder opening 45 directly faces are included in the wall surface outside the intersection portion 14.

In the first cylinder openings 45, 45a to 45c, the baffle plate member 44 is not disposed between the wall surface of the mixing container 10 of the first cylinder openings 45, 45a to 45c.

When the mixing vessel 10 of the mixers 3, 3a to 3c of the first to fourth embodiments and the mixing vessel 10 of the mixer 3d of the fifth embodiment are the same size, the first to fourth embodiments The first cylinder opening 45d and the baffle plate member 44 of the fifth embodiment are less than the distance between the first cylinder openings 45, 45a to 45c of the example and the wall surface facing the first cylinder openings 45, 45a to 45c. ), the distance between them becomes shorter.

If the distance between the baffle plate member 44 and the first cylinder opening 45d of the fifth embodiment is to be increased, the baffle plate member 44 becomes close to the outlet 28, and the conductance near the outlet 28 is small. Therefore, the pressure loss at the time of discharge becomes large.

Therefore, the size and position of the baffle plate member 44, and the size and position of the outlet 28 may be obtained so as not to increase the pressure loss.

<Comparative Examples 1 and 2>

Next, a comparative example of the present invention will be described.

Like the mixer 103a of the first comparative example of FIG. 7 and the mixer 103b of the second comparative example of FIG. 8, the first barrel openings 145a and 145b and the second barrel openings 146a and 146b are on the same plane. It was positioned, and the mixers 103a and 103b having no space for pouring were produced, and the mass fraction distribution was calculated.

In the mixer 103a of FIG. 7, the first cylinder body 111a and the second cylinder body 112a do not protrude into the mixing container 10, and in the mixer 103b of FIG. 8, the first cylinder body Although the structure 111b and the second cylinder body 112b have a different structure in that they protrude into the mixing container 10, they are the same in that they do not have a pouring space.

In the mixers 103a and 103b of the first and second comparative examples in FIGS. 7 and 8, TEOS gas is used for the first gas, and oxygen gas is used for the second gas.

The mass fraction distribution of the TEOS gas of the mixer 103a of the first comparative example is shown in FIG. 15, and the mass fraction distribution of the TEOS gas of the mixer 103b of the second comparative example is shown in FIG.

In either case, it can be seen that the first gas is not uniformly discharged from the entire circumference of the gap 47 and is not uniformly mixed in the mixing container 10.

The TEOS gas in the mixed gas supplied to the discharge device 19 from the mixers 103a and 103b of the first and second comparative examples is the mass fraction distribution of the TEOS gas of the mixed gas of the mixer 103a of the first comparative example in FIG. The evaluation value of is ±3.36%, and the evaluation value of the mass fraction distribution of the TEOS gas in the mixer 103b of the second comparative example in Fig. 16 is a value of ±0.69%.

<3rd comparative example>

Next, like the mixer 103c of the third comparative example shown in FIG. 9, the first cylinder body 111c is protruded into the mixing vessel 10, and the first cylinder opening 145c is opened in the mixing vessel 10. It is located inside, the second cylinder body 112c protrudes from the first cylinder opening 145c of the first cylinder body 111c into the interior of the mixing vessel 10, and the second cylinder opening 146c is first It was located closer to the wall surface facing the cylinder opening 145c.

17(a) and (b) show the mass fraction distribution of the TEOS gas when TEOS gas is used as the first gas and oxygen gas is used as the second gas in the mixer 103c of the third comparative example.

In Fig. 17, a vortex is formed by oxygen gas between the second cylinder opening 146c and the wall surface close to the second cylinder opening 146c, and the TEOS gas supplied to the portion from the gap 47 is It becomes difficult to flow out from the gap 47 due to being pushed by the vortex, and it can be seen that the first and second gases are not uniformly mixed. The evaluation value of the mass fraction distribution of the TEOS gas of the mixed gas supplied to the discharge device 19 is a value of ±2.5%.

18(a) and (b) show the mass fraction distribution of TEOS gas when oxygen gas is used as the first gas and TEOS gas is used as the second gas, contrary to FIGS. 17(a) and (b). to be.

Between the tip of the gap 47 and the wall surface close to the tip of the gap 47, a vortex of oxygen gas supplied from the tip of the gap 47 is formed, and around the protruding second cylinder body 112c, a complex A mass fraction distribution is formed. As a result, the TEOS gas and the oxygen gas are not incident so as to perpendicularly cross the wall surface opposite to the second cylinder opening 146c, and are mixed unevenly.

In addition, the evaluation value of the mass fraction distribution of the TEOS gas in the mixed gas is a value of ±1.8%.

<Another example of mixing>

In the case of mixing two types of gas having a difference in flow rate from the above mass fraction distribution and its evaluation value, in the mixers (3, 3a to 3d) of the present invention, a gas having a high flow rate (high pressure) and a low flow rate (low pressure) Even if any of the gases is used as the first gas and the other is used as the second gas, they are uniformly mixed.

In addition, the first and second cylinder bodies 11, 11a to 11d, 12, 12a to 12d of the mixers 3, 3a to 3d of the present invention described above were circular in cross section, but may be polygonal or even regular polygons.

According to the calculation result of the mass fraction distribution of Comparative Examples 1 to 3 above, in the mixers 103a to 103c without the pouring space 48, the first cylinder bodies 111a to 111c and the second cylinder bodies 112a to 112c were Even if it is used, it can be seen that the first and second gases are not uniformly mixed, but even if the pouring space 48 is formed, it is uniform when the distance through which the first and second gases flow through the pouring space 48 is short. It does not seem to mix well. The length of the optimal pouring space 48 is influenced by the dimensions of the interior of the mixing vessel 10 to be used, and the thickness or length of the first and second cylinder bodies 11, 11a to 11d, 12, 12a to 12d. Therefore, when the size of the mixing container 10 or the like is changed, the length of the optimum running space 48 may be calculated again.

In addition, when the mixing container 10 is a rectangular shape, the appropriate positions of the first cylinder openings 45, 45a to 45d are the wall surface of the mixing container 10, the wall surface of the chamber 21, and the baffle plate member 44 ) To form a "wall surface" and to form a mixing space 13 in the mixing container 10 in the direction in which the first and second cylinder bodies 11, 11a to 11d, 12, 12a to 12d are extended When the mixing space distance (L), which is the distance between the wall surfaces, is set to "1", 2/5 or more from the wall surface on the base side of the first and second cylinder bodies 11, 11a to 11d, 12, 12a to 12d 3/ It is located within a range of 5 or less distances. Distribution of mass fractions in which the first and second gases are uniformly mixed by generating a stable vortex in the mixing space 13 in the mixing vessel 10 of the mixers 3, 3a to 3d of the first to fifth embodiments Is calculated.

In addition, the length in the direction in which the first and second gas flows of the pouring space 48 is extended to the first and second cylinder bodies 11, 11a to 11d, 12, 12a to 12d of the mixing container 10 When the length of the side parallel to the direction is 1/5 or more, a distribution in which the first and second gases are uniformly mixed can be calculated.

Even with respect to the distance between the first cylinder openings 45, 45a to 45d with the wall surface facing, the optimum value is the inner dimension of the mixing vessel 10 or the first and second cylinder bodies 11 , 11a to 11d, 12, 12a to 12d) has an influence on the thickness and length, so when the dimensions of the inside of the mixing vessel 10 are changed, the value of the optimum distance may be calculated again.

As the length in the direction perpendicular to the mixing space distance L, if the distance between the outer periphery of the first cylinder body 11, 11a to 11d and the wall surface of the mixing container 10 is the width of the mixing space 13, the Since the minimum value of the width is preferably at least twice the diameter (inner diameter) D of the first cylinder openings 45, 45a to 45d, the minimum value of the width of the mixing space 13 is determined by changing the dimensions. When it becomes less than twice the diameter (D) of the one cylinder opening 45, 45a-45d, what is necessary is just to calculate the size again.

Further, in the above embodiment, the TEOS gas and the oxygen gas are mixed in the mixers 3, 3a to 3d, but other types of gases can also be mixed. Particularly, of the source gas generated by sublimation or evaporation and the gas that is a gas at room temperature, one gas may be the first gas and the other gas may be the second gas.

Further, in the vacuum processing apparatus 2, a thin film is formed using plasma, but a vacuum processing apparatus that forms a thin film without using plasma is also included. Moreover, a vacuum processing apparatus which performs vacuum processing such as etching or surface treatment without forming a thin film is also included in the present invention.

In addition, although the first cylinder bodies 11, 11a to 11d and the second cylinder bodies 12, 12a to 12d of each of the above Examples 1 to 5 were not in contact, the flow of the first gas flowing through the gap 47 A spacer small enough not to be disturbed may be placed in close contact with the inner circumferential side surfaces of the first cylinder main bodies 11, 11a to 11d and the outer peripheral side surfaces of the second cylinder main bodies 12, 12a to 12d.

As a result of forming a thin film on the substrate surface with a mixer having an evaluation value of the mass fraction distribution of TEOS gas in the mixed gas of ±41.8%, the film thickness distribution of the formed thin film was so bad that it was not usable.

In addition, in the mixer having an evaluation value of ±7.4%, the value of the in-plane film thickness distribution according to the size of the evaluation value was poor.

On the other hand, in a mixer having an evaluation value of ±0.5% or less, the in-plane film thickness distribution does not depend on the size of the evaluation value, and it is considered that a factor affecting the film thickness distribution becomes a factor other than the size of the evaluation value.

3, 3a-3d: mixer
5: gas generating vessel
6: raw material
7: heating device
10: mixing container
11, 11a to 11d: 1st cylinder body
12, 12a-12d: 2nd cylinder body
13: mixing space
14: cross section
19: ejection device
24: vacuum tank
25: gas transfer pipe
28, 28a: outlet
29: virtual barrel
30: object to be treated
34: plasma device
45, 45a to 45d: first cylinder opening
46, 46a-46d: 2nd cylinder opening
47: gap
48: chaozhou space

Claims (15)

A mixing container in which the internal space is separated from the external atmosphere,
A first cylinder body in the shape of a cylinder through which the first gas introduced to the root side flows out from the first cylinder opening on the front end side,
A second cylinder body in the shape of a cylinder through which the second gas introduced to the root side flows out from the opening of the second cylinder on the front end side;
Having an outlet formed on the wall of the mixing vessel,
The first barrel opening is spaced apart from a wall surface of the mixing container facing the first barrel opening and is disposed inside the mixing container,
At least a portion of the second cylinder body is disposed inside the first cylinder body in a state in which an outer peripheral side surface of the second cylinder body is non-contact with the inner peripheral side surface of the first cylinder body,
The first gas flows through a gap between the inner circumferential side of the first cylinder body and the outer circumferential side of the second cylinder body,
The second cylinder opening is disposed inside the first cylinder body,
The first barrel opening is disposed at a position closer than the second barrel opening from the wall surface of the mixing container to which the first barrel opening faces,
The first cylinder body and the second cylinder body each extend along a straight line parallel to each other,
The outlet port so that the first gas flowing out of the first cylinder opening into the mixing container and going straight, and the second gas flowing out of the second cylinder opening into the mixing container and going straight ahead do not enter the outlet. Is placed,
The first and second gases are discharged from the opening of the first cylinder to the inside of the mixing container and are mixed inside the mixing container, and the mixed gas generated by mixing the first and second gases is discharged from the outlet. A mixer that flows out of the mixing container. delete The method of claim 1,
The outlet is formed on the wall surface outside of the crossing portion, which is a wall surface of a portion where the wall surface of the mixing container and the virtual cylinder virtually extending the outer circumferential side of the first cylinder body in a direction in which the first cylinder body is extended , Mixer. The method of claim 1,
The outlet port is at least partially disposed at a position where a wall surface of the mixing container and a virtual cylinder virtually extending an outer circumferential side surface of the first cylinder body in a direction in which the first cylinder body extends, and
A mixer, wherein a baffle plate member is formed between the first barrel opening and the outlet. The method of claim 1,
The mixing vessel is a rectangular parallelepiped, and four of the six walls of the mixing vessel are disposed parallel to the outer periphery of the first tubular body to face the outer periphery of the first tubular body. The method of claim 1,
The first cylinder body and the second cylinder body is a mixer in which the cross-sectional shape of the inner peripheral side is circular. A gas supply device,
Mixer,
A gas transfer pipe,
With a vacuum bath,
Have a gas release device,
A first gas and a second gas are introduced into the mixer from the gas supply device, the first gas and the second gas are mixed in the mixer to generate a mixed gas, and the generated mixed gas is the gas transfer pipe A vacuum processing apparatus in which an object to be treated, which is transferred from the mixer to the gas discharge device by means of the gas discharge device, is discharged from the gas discharge device to the interior of the vacuum bath, and vacuum-treated an object to be treated disposed inside the vacuum bath,
The mixer,
A mixing container in which the internal space is separated from the external atmosphere,
A first cylinder body in the shape of a cylinder through which the first gas introduced to the root side flows out from the first cylinder opening on the front end side,
A second cylinder body in the shape of a cylinder through which the second gas introduced to the root side flows out from the opening of the second cylinder on the front end side;
It is formed on the wall of the mixing container and has an outlet to which the gas transfer pipe is connected,
The first cylinder opening is disposed inside the mixing vessel by being spaced apart from a wall surface of the mixing vessel facing the first cylinder opening,
At least a portion of the second cylinder body is disposed inside the first cylinder body in a state in which an outer peripheral side surface of the second cylinder body is non-contact with the inner peripheral side surface of the first cylinder body,
The first gas flows through a gap between the inner circumferential side of the first cylinder body and the outer circumferential side of the second cylinder body,
The second cylinder opening is disposed inside the first cylinder body,
The first barrel opening is disposed at a position closer than the second barrel opening from the wall surface of the mixing container to which the first barrel opening faces,
The first and second gases are discharged from the opening of the first cylinder to the inside of the mixing container and are mixed inside the mixing container, and the mixed gas generated by mixing the first and second gases is discharged from the outlet. A vacuum processing device introduced into the inside of the gas transfer pipe. The method of claim 7,
The gas supply device,
A gas generating container in which raw materials are disposed,
It has a heating device for heating the raw material in the gas generating container,
As either the first gas or the second gas, the raw material is heated by the heating device, and the raw material gas generated by sublimation or evaporation is supplied to the mixing container,
As the other gas, a gas that is a gas at least at room temperature and pressure is supplied to the mixing container. The method of claim 8,
A vacuum processing apparatus, wherein a thin film is formed on a surface of an object to be treated disposed inside the vacuum chamber by a chemical reaction between the first gas and the second gas contained in the mixed gas discharged into the vacuum chamber. The method of claim 9,
A vacuum processing apparatus comprising a plasma apparatus for converting the mixed gas supplied from the mixer into plasma. The method of claim 8,
The first cylinder body and the second cylinder body each extend along a straight line parallel to each other,
The outlet port so that the first gas flowing out of the first cylinder opening into the mixing container and going straight, and the second gas flowing out of the second cylinder opening into the mixing container and going straight ahead do not enter the outlet. Placed, vacuum processing device. The method of claim 11,
The outlet is formed on the wall surface outside of the crossing portion, which is a wall surface of a portion where the wall surface of the mixing container and the virtual cylinder virtually extending the outer circumferential side of the first cylinder body in a direction in which the first cylinder body is extended , Vacuum processing device. The method of claim 11,
The outlet is arranged so that at least a part of the crossing portion, which is a wall surface of a portion where the wall surface of the mixing container and the virtual cylinder virtually extending the outer circumferential side of the first cylinder body in the extending direction, overlaps Become,
A baffle plate member is formed between the opening of the first cylinder and the outlet. The method of claim 11,
The mixing vessel is a rectangular parallelepiped, and four of the six walls of the mixing vessel are disposed parallel to the outer periphery of the first tubular body to face the outer peripheral side of the first tubular body. The method of claim 11,
The vacuum processing apparatus, wherein the first cylinder body and the second cylinder body have a circular cross-sectional shape of an inner peripheral side surface.

Images