JP6216483B2 - Mixer, vacuum processing equipment - Google Patents

Description

  The present invention relates to a technical field of a gas mixer and a vacuum processing apparatus using the mixer.

In order to mix different types of gas, different types of gas flowing in two pipes are merged and flow into one pipe having a bent portion, and when two types of gas flow in the bent portion, Two kinds of gases are mixed by the generated vortex.
This mixing method is simple in shape and low in cost, but has a large pressure loss generated at the bent portion.

  In particular, when the pressure of one gas source is high and the pressure of the other gas source is low, the amount of gas supplied from the low pressure gas source decreases due to pressure loss. The gas flow rate ratio deviates from a desired value.

  In particular, one gas is a gas at normal temperature and pressure, the gas source of the gas is a cylinder, and the other gas is a gas material generated by sublimation or evaporation by heating a solid or liquid source material. In the case where a thin film is formed by reacting two kinds of gases, the growth rate of the thin film decreases when the supply amount of the gaseous raw material decreases.

  A method of using a rectangular parallelepiped container as a mixing container, connecting pipes through which different types of gas flow to the mixing container, mixing two kinds of gas by the vortex generated in the mixing container, and taking out the mixed gas with a single pipe There is an advantage that the pressure loss is small.

  However, there is a problem that the degree of mixing is affected by the position where the pipe is connected to the mixing container, and the two types of gases are not uniformly mixed. In particular, when two types of gases with greatly different flow rates are introduced into the mixing vessel, the two types of gases are located in different regions within the mixing vessel, and when a thin film is formed with the obtained mixed gas, the film thickness Only thin films with poor distribution can be obtained.

In particular, in recent years, a plasma CVD method using TEOS as a raw material has been widely used as a material for a SiO ₂ film used for a semiconductor element. After a TEOS gas and an oxygen gas are mixed inside a mixing vessel, the plasma is converted into plasma. The
When a substance that is liquid at room temperature, such as TEOS, is gasified and transported in gas, the gas pressure is determined by the vapor pressure and temperature of the substance.

  When performing gas transportation, it is convenient in terms of device design that the pressure of the raw material gas at the evaporation site (or sublimation site) is high, but it is difficult to maintain the temperature of the device at a certain level or more. Therefore, there is an upper limit to the vapor pressure of a substance that becomes a liquid or solid at room temperature, that is, the pressure of the material gas to be transported.

In general, the vapor pressure of liquid TEOS is difficult to ensure a value of 2600 Pa or higher, so the differential pressure between the pressure at the TEOS gas generation site and the pressure in the mixing vessel is small. Although it is easy to increase the flow rate of the filled oxygen gas, it is difficult to increase the flow rate of the TEOS gas.
Prior art using a mixing vessel is described in the following document.

Japanese Patent Laid-Open No. 10-150030 JP 2001-335941 A

  The present invention was created to solve the above-described disadvantages of the prior art, and an object thereof is to provide a mixer capable of uniformly mixing two kinds of gases and a vacuum processing apparatus using the mixer. It is in.

In order to solve the above-described problems, the present invention provides a mixing container in which an internal space is separated from an external atmosphere, and a cylindrical first in which a first gas introduced to the root side flows out from a first cylinder opening on the tip side. A cylindrical main body, a cylindrical second cylindrical body through which the second gas introduced to the base side flows out from the second cylindrical opening on the tip side, and an outlet provided in the wall of the mixing container The first cylinder opening is disposed in the mixing container so as to be separated from the wall surface of the mixing container facing the first cylinder opening, and at least a part of the second cylinder main body is the second cylinder main body. The outer peripheral side surface of the first cylindrical main body is disposed in contact with the inner peripheral side surface of the first cylindrical main body, the inner peripheral side surface of the first cylindrical main body and the outer peripheral surface of the second cylindrical main body. The first gas is allowed to flow through a gap between side surfaces, and the second cylinder opening is formed inside the first cylinder body. Disposed, said first cylindrical opening, the wall of the mixing vessel the first cylindrical opening face, is positioned closer than the second cylindrical opening, and said first cylindrical body and the second tubular body Are respectively extended along straight lines parallel to each other, the first gas flowing out from the first cylinder opening into the mixing container and going straight, and the second cylinder opening into the mixing container The outflow port is disposed so that the second gas flowing out and going straight does not enter the outflow port, and the first and second gases are introduced into the mixing container from the first cylinder opening. A donut shape centered on the first cylinder main body and a virtual cylinder that is released and is virtually extended in the direction in which the first cylinder main body extends in the direction in which the first cylinder main body extends. the first formed by mixing space, are mixed in the vortex of a second gas, before First, a mixed gas the second gas is generated by mixing is a mixer for flow out of said mixing vessel from said outlet.
In the present invention, the outlet is a wall surface of a portion where a virtual cylinder obtained by virtually extending an outer peripheral side surface of the first cylinder body in a direction in which the first cylinder body extends and a wall surface of the mixing container intersect. It is a mixer provided in the said wall surface of the outer side of a crossing part.
Further, in the present invention, the outlet is at least at a position where a virtual cylinder obtained by virtually extending an outer peripheral side surface of the first cylinder main body in a direction in which the first cylinder main body extends and a wall surface of the mixing container intersect. A mixer in which a part is arranged and a baffle plate member is provided between the first cylinder opening and the outlet.
In the present invention, the mixing container is a rectangular parallelepiped, and wall surfaces of four walls among the six walls of the mixing container are arranged in parallel with the outer periphery of the first cylinder body, and the outer peripheral side surface of the first cylinder body It is a mixer faced with.
The present invention is a mixer in which the first cylinder main body and the second cylinder main body have circular inner cross-sectional shapes.
The present invention includes a gas supply device, a mixer, a gas transfer pipe, a vacuum chamber, and a gas discharge device, and the first gas and the second gas are introduced from the gas supply device into the mixer. The first gas and the second gas are mixed in the mixer to generate a mixed gas, and the generated mixed gas is transferred from the mixer to the gas discharge device by the gas transfer pipe, A vacuum processing apparatus in which an object to be processed, which is discharged from the gas releasing apparatus into the vacuum chamber and disposed inside the vacuum chamber, is vacuum-processed, and the mixer has an internal space in an external atmosphere. a first cylindrical body, said second gas introduced into the root side tip of the cylindrical shape and separated mixing vessel, said first gas introduced into the root side flows out from the first cylindrical opening in the distal end side from A cylindrical second cylinder body that flows out from the second cylinder opening on the side; An outlet port connected to the gas transfer pipe and connected to the gas transfer pipe, and the first cylinder opening is spaced apart from the wall surface of the mixing container facing the first cylinder opening. Disposed in the container, and at least a part of the second cylinder main body is configured such that the outer peripheral side surface of the second cylinder main body is not in contact with the inner peripheral side surface of the first cylinder main body. The first cylinder is disposed inside, and is configured to allow the first gas to flow through a gap between an inner peripheral side surface of the first cylinder main body and an outer peripheral side surface of the second cylinder main body, and the second cylinder opening The first cylinder opening is disposed inside the main body, the first cylinder opening is disposed at a position closer to the second cylinder opening than the wall surface of the mixing container facing the first cylinder opening, and the first cylinder main body and the first cylinder opening The two-cylinder main body is stretched along straight lines parallel to each other, and the mixing cylinder is opened from the first cylinder opening. The first gas flowing out into the container and going straight and the second gas flowing out into the mixing container and going straight from the second cylinder opening do not enter the outlet. An outlet is disposed, and the first and second gases are discharged from the first cylinder opening into the mixing container and are inside the mixing container and extend in the direction in which the first cylinder body extends. The first and second gas vortices formed in a donut-shaped mixing space centered on a virtual cylinder obtained by virtually extending the outer peripheral side surface of the cylinder main body and the first cylinder main body, The mixed gas generated by mixing the second gas is a vacuum processing apparatus that flows into the gas transfer pipe from the outlet.
In the present invention, the gas supply device includes a gas generation container in which a raw material is arranged, and a heating device that heats the raw material in the gas generation container, and the first gas or the second gas As one of the gases, the source material is heated by the heating device, the source gas generated by sublimation or evaporation is supplied to the mixing container, and the other gas is a gas that is a gas at least at normal temperature and pressure. It is a vacuum processing apparatus supplied to the said mixing container.
In the present invention, a thin film is formed on the surface of an object to be processed disposed inside the vacuum chamber by a chemical reaction between the first gas and the second gas contained in the mixed gas discharged into the vacuum chamber. Vacuum processing apparatus.
The present invention is a vacuum processing apparatus provided with a plasma apparatus for converting the mixed gas supplied from the mixer into plasma .
In the present invention, the outlet is a wall surface of a portion where a virtual cylinder obtained by virtually extending an outer peripheral side surface of the first cylinder body in a direction in which the first cylinder body extends and a wall surface of the mixing container intersect. It is the vacuum processing apparatus provided in the said wall surface outside a crossing part.
In the present invention, the outlet is a wall surface of a portion where a virtual cylinder obtained by virtually extending an outer peripheral side surface of the first cylinder body in a direction in which the first cylinder body extends and a wall surface of the mixing container intersect. The vacuum processing apparatus is arranged so that at least a part of the crossing portion overlaps, and a baffle plate member is provided between the first cylinder opening and the outlet.
In the present invention, the mixing container is a rectangular parallelepiped, and wall surfaces of four walls among the six walls of the mixing container are arranged in parallel with the outer periphery of the first cylinder body, and the outer peripheral side surface of the first cylinder body It is a vacuum processing apparatus that faces.
Furthermore, the present invention is a vacuum processing apparatus in which the first cylinder main body and the second cylinder main body have circular inner cross-sectional shapes.

  The mixer of the present invention can uniformly mix different types of first gas and second gas introduced into the mixer. In particular, the mixer of the present invention can uniformly mix the first gas and the second gas even when the flow rate difference between the first gas and the second gas is large.

Also, when the first or second gas is supplied to the mixer at a pressure close to the pressure inside the mixer, the first and second gases can be mixed uniformly.
Moreover, it can mix with a small pressure loss.
Therefore, the vacuum processing apparatus of the present invention can uniformly vacuum process the surface of the processing object.

(a): An example of the vacuum processing apparatus of the present invention (b): Another example of the vacuum processing apparatus of the present invention First embodiment of the mixer of the present invention Second embodiment of the mixer of the present invention Third embodiment of the mixer of the present invention Fourth embodiment of the mixer of the present invention Fifth embodiment of the mixer of the present invention First comparative example mixer Second comparative example mixer Third comparative example mixer (a): Mass fraction distribution of TEOS gas in the mixer of the second embodiment (Introduction example 1) (b): Diagram showing distribution boundaries and dimensions of the mixing vessel (a): TEOS gas mass fraction distribution of the mixer of the second embodiment (Introduction example 2) (b): Distribution boundary (a): Mass fraction distribution of TEOS gas in the mixer of the second embodiment in which the length of the run-up space is changed (Introduction example 1) (b): Diagram showing the distribution boundary and the dimensions of the mixing vessel (a): TEOS gas mass fraction distribution of the mixer of the second embodiment with the length of the run-up space changed (introduction example 2) (b): Distribution boundary (a): TEOS gas mass fraction distribution of the mixer of the fourth embodiment (Introduction example 1) (b): Distribution boundary (a): TEOS gas mass fraction distribution of the mixer of the first comparative example (Introduction example 1) (b): Distribution boundary (a): TEOS gas mass fraction distribution in the mixer of the second comparative example (Introduction example 1) (b): Distribution boundary (a): TEOS gas mass fraction distribution in the mixer of the third comparative example (Introduction example 1) (b): Distribution boundary (a): TEOS gas mass fraction distribution in the mixer of the third comparative example (introduction example 2) (b): Distribution boundary The figure which shows the correspondence of a pattern and the mass fraction of TEOS gas

The code | symbol 2 of Fig.1 (a) has shown the vacuum processing apparatus of this invention.
The vacuum processing apparatus 2 has a vacuum tank 24, and the vacuum tank 24 is provided with a discharge device 19, a gas supply device 4, and a mixer 3 according to the first embodiment of the present invention. Yes.

An evacuation device 33 is connected to the vacuum chamber 24, and when the inside of the vacuum chamber 24 is evacuated by the evacuation device 33, the inside of the mixer 3 is also evacuated.
The mixer 3 and the gas supply device 4 are disposed outside the vacuum chamber 24.

The gas supply device 4 includes an auxiliary raw material gas supply device 8 and a main raw material gas supply device 9.
The auxiliary raw material gas supply device 8 is a gas cylinder here, and the auxiliary raw material gas supply device 8 has a normal temperature (“normal temperature” means a temperature of 5 ° C. to 35 ° C .: Japanese Industrial Standard JIS Z 8703). An auxiliary raw material gas which is a gas at a pressure (“normal pressure” means a pressure of 1013 hPa) is filled.

  The main raw material gas supply device 9 includes a gas generation container 5, a raw material 6, and a heating device 7. The raw material 6 is disposed inside the gas generation container 5. When the gas generation container 5 is heated by the heating device 7 in a state where the inside of the gas generation container 5 is evacuated by the vacuum exhaust device 33, When the substance 6 rises in temperature and reaches a sublimation temperature or evaporation temperature, a main raw material gas that is a gas of the raw material 6 is generated by sublimation or evaporation. The source material 6 may be directly heated by the heating device 7 to generate a main source gas that is a gas of the source material 6 by sublimation or evaporation.

  One of the auxiliary source gas supply device 8 and the main source gas supply device 9 is connected to the mixer 3 by the first pipe 26, and the other device is connected to the mixer 3 by the second pipe 27. One of the auxiliary raw material gas supplied from the auxiliary raw material gas supply device 8 and the main raw material gas supplied from the main raw material gas supply device 9 serves as the first gas as the first pipe. 26 is supplied to the mixer 3, and the other gas is supplied to the mixer 3 through the second pipe 27 as the second gas.

  The inside of the vacuum chamber 24 and the inside of the mixer 3 are evacuated by the evacuation device 33, and even if the first and second gases are supplied to the mixer 3, the inside of the mixer 3 and the vacuum chamber 24 remains A vacuum atmosphere is maintained.

FIG. 2 shows the structure of the mixer 3.
The mixer 3 has a mixing container 10 in which the internal space is separated from the external atmosphere, and the internal space of the mixing container 10 has a cylindrical first cylinder body 11 that is hollow inside and circular in cross section. Is arranged. A cylindrical second cylinder body 12 that is hollow inside and circular in cross section is disposed inside the cylindrical shape of the first cylinder body 11. The mixing container 10 is a rectangular parallelepiped, and two surfaces having the maximum area and parallel to each other among the four surfaces extending in the longitudinal direction are horizontally arranged. The 1st cylinder main body 11 and the 2nd cylinder main body 12 are arrange | positioned so that a cylindrical center axis line may be horizontal. FIG. 2 is a horizontal cross-sectional view of the mixer 3, and is a view when the cross-section is viewed from above.

The mixer 3 of this embodiment has a small chamber 21, the first pipe 26 is connected to the small chamber 21, and the first gas that has passed through the first pipe 26 is introduced into the interior 22 of the small chamber 21 that has been evacuated. It has become so.
A small hole 23 is provided in the wall of the small chamber 21, and one end of the first cylinder main body 11 is fixed to the wall of the small chamber 21 so that a hollow portion of the first cylinder main body 11 is connected to the small hole 23. The other end of the first cylinder body 11 is disposed inside the mixing container 10. The inside of the small chamber 21 is connected to the inside of the mixing container 10 by the first cylinder body 11, and the first gas introduced into the small chamber 21 by the first pipe 26 passes through the first pipe 26 and is mixed. It is supplied to the inside of the container 10. The inside of the small chamber 21 is separated from the inside of the mixing container 10 in portions other than the first cylinder body 11.
Here, of the walls of the mixing container 10, the wall in contact with the atmosphere outside the mixing container 10 is the wall of the small chamber 21, and the first and second introduction ports 37 and 38 are formed on the wall of the small chamber 21. Is provided. The tip of the first pipe 26 is connected to a first inlet 37, and the first gas that has passed through the first pipe 26 is introduced into the interior 22 of the small chamber 21 from the first inlet 37.

  The small hole 23 is formed in the wall of the small chamber 21 that comes into contact with the atmosphere inside the mixing container 10.

The second cylinder main body 12 is inserted through the second introduction port 38 and the small hole 23, and at least a part of the distal end side of the second cylinder main body 12 is positioned inside the first cylinder main body 11. A gap 47 is formed between the outer peripheral side surface of the first cylinder main body 11 and the inner peripheral side surface of the second cylinder main body 12.
The space between the edge portion of the first introduction port 37 and the tip of the first pipe 26 and the space between the edge portion of the second introduction port 38 and the outer peripheral surface of the second cylinder body 12 are hermetically sealed. Air is prevented from entering the inside and the inside of the mixing container 10 from the first and second introduction ports 37 and 38.
Here, the outer peripheral side surface of the portion of the second cylinder main body 12 that is inserted into the first cylinder main body 11 and is located inside the first cylinder main body 11 is not in contact with the inner peripheral side surface of the first cylinder main body 11. ing.

  A gap 47 formed between the inner peripheral side surface of the first cylinder main body 11 and the outer peripheral side surface of the second cylinder main body 12 is connected to the inner space of the small chamber 21 at the root side, and is introduced into the small chamber 21. The first gas is introduced from the base side of the gap 47 into the gap 47 which is a portion between the outer peripheral side surface of the second cylinder main body 12 and the inner peripheral side surface of the first cylinder main body 11.

A first cylinder opening 45 is provided at the tip of the first cylinder body 11 located inside the mixing container 10, and a second cylinder opening 46 is provided at the tip of the second cylinder body 12. .
The base side of the second cylinder body 12 is connected to the second pipe 27, and the inside of the second cylinder body 12 and the inside of the second pipe 27 are connected via the second inlet 38. The second gas passing through the second pipe 27 is introduced into the second cylinder body 12 from 38.

  The second cylinder opening 46 is located in the inner hollow portion of the first cylinder body 11, and the second gas flows out from the second cylinder opening 46 into the first cylinder body 11.

  When the hollow portion inside the first cylinder body 11 and between the first cylinder opening 45 and the second cylinder opening 46 is called a running space 48, the second gas runs from the second cylinder opening 46. It flows out into the space 48.

The gap 47 is connected to the running space 48 around the second cylinder opening 46, and the first gas flowing through the gap 47 flows out from the portion of the gap 47 connected to the running space 48 into the running space 48.
The run-up space 48 is surrounded by the first cylinder body 11, and the first and second gases that have flowed into the run-up space 48 cannot spread.

  The direction in which the first gas flowing out into the run-up space 48 flows is the same direction as when flowing through the gap 47, and the direction in which the second gas flowing out into the run-up space 48 flows also inside the second cylinder body 12. The direction is the same as when you were.

  The first and second cylinder main bodies 11 and 12 are pipes having a constant thickness and are straightened, and the first gas inside the gap 47 goes straight along the direction in which the first cylinder main body 11 extends. Then, the second gas inside the second cylinder main body 12 goes straight along the direction in which the second cylinder main body 12 extends. In the approach space 48, the first and second gases flow in the same direction as immediately before flowing into the approach space 48. Since the second gas flows inside the first gas flowing in a cylindrical shape, the second gas flows inside the run-up space 48 while being surrounded by the first gas. Flows out from the first tube opening 45 into the mixing container 10 while the second gas is wrapped in the first gas.

  Since the first cylinder main body 11 is not positioned around the first and second gases flowing out from the first cylinder opening 45, the flow of the first and second gases flowing out from the first cylinder opening 45 is widened. However, since the spread is small, it can be considered that the first and second gases flowing out from the first cylinder opening 45 go straight in the same direction as when flowing in the running space 48.

The shape of the gap 47 is a donut shape, and the first gas that has flowed out of the gap 47 flows around the second gas in the running space 48, and the second gas flows in a state surrounded by the first gas. ing.
2 indicates a virtual cylinder which is a cylinder when the outer peripheral side surface of the first cylinder main body 11 is virtually extended in a direction in which the first cylinder main body 11 extends. The virtual cylinder 29 goes straight in the extending direction.

  An outlet 28 connected to one end of the gas transfer pipe 25 is provided on the wall of the mixing container 10. The other end of the gas transfer pipe 25 is connected to the discharge device 19, and the internal space of the mixing container 10 and the internal space of the discharge device 19 are connected by the outlet 28 and the gas transfer pipe 25.

  The virtual cylinder 29 intersects the wall surface of the mixing container 10 facing the first cylinder opening 45, and the outlet 28 is formed by intersecting the virtual cylinder 29 of the wall surface with the wall surface. It is provided on the wall surface of the portion located outside the crossing portion 14 which is a portion to be fixed.

  The direction in which the first cylinder main body 11 extends and the direction in which the second cylinder main body 12 extends are parallel, and the first and second gases flowing out from the first cylinder opening 45 are parallel to the direction in which the first cylinder main body 11 extends. Go straight in the direction. The straight and first gas does not flow into the outlet 28.

The second gas flowing out from the first cylinder opening 45 flows in the mixing container 10 in a state of being wrapped by the first gas and collides with the wall surface where the virtual cylinder 29 intersects. Since the second gas that collided with the wall surface flows in four directions along the wall surface, the first gas that collided with the second gas flowing in the four directions does not collide with the wall surface due to the second gas spreading along the wall surface. Also starts to flow in all directions along the wall.
As a result, both the first and second gases flowing out from the first cylinder opening 45 spread along the wall surface facing the first cylinder opening 45.

Around the virtual cylinder 29 and the first cylinder main body 11, a donut-shaped mixing space 13 centering on the virtual cylinder 29 and the first cylinder main body 11 is provided.
The first and second gases that have spread along the wall surface with which the second gas has collided collide with the other wall surface of the mixing container 10, collide with the outer peripheral surface of the first cylinder body 11, and The direction in which the gas flows changes, and the first and second gases enter the inside of the mixing space 13, and vortices of the first and second gases are formed in the mixing space 13. When this vortex is formed, the first and second gases flowing inside the mixing space 13 are uniformly mixed by forming the vortex, and a mixed gas is generated.

The generated mixed gas flows into the outlet 28 from the mixing space 13 and moves to the discharge device 19 through the gas transfer pipe 25.
The discharge device 19 has a discharge container 35 in which a cavity 39 is provided, and the mixed gas that has moved through the gas transfer pipe 25 is introduced into the cavity 39.

  A base 31 is disposed inside the vacuum chamber 24, and a processing object 30 such as a substrate is disposed on the base 31. At least one surface of the surface of the discharge container 35 is disposed inside the vacuum chamber 24, and the surface is directed in the direction in which the table 31 is located.

  A plurality of discharge ports 36 are formed on the surface of the discharge container 35 directed in the direction in which the table 31 is located, and the mixed gas introduced into the cavity 39 is vacuumed from the discharge port 36 toward the processing object 30. It is discharged into the tank 24. In this vacuum processing apparatus 2, the discharge container 35 is connected to a plasma apparatus 34 constituted by a plasma power source. When the plasma apparatus 34 applies a voltage to the discharge container 35, plasma of a mixed gas is generated, and the first When the gas and the second gas chemically react to generate a solid, a thin film made of the solid generated on the surface of the object to be processed 30 grows.

When the thin film has grown to a predetermined thickness, the voltage output of the plasma device 34 is stopped, the valves provided in the first and second pipes 26 and 27 are closed, and the supply of the mixed gas into the vacuum chamber 24 is stopped. The processing object 30 is moved to the outside of the vacuum chamber 24, the unprocessed processing object 30 is carried into the vacuum chamber 24, placed on the table 31, the valve is opened, and the discharge device 19 A mixed gas is supplied to the inside and a voltage is output from the plasma device 34 to form plasma of the mixed gas, thereby forming a thin film on the surface of the treatment object 30.
In this way, a mixed gas is generated from the first and second gases, plasma of the mixed gas is generated in a vacuum atmosphere, and thin films are formed on the plurality of objects to be processed 30.

  In the mixer 3, the outflow port 28 is provided on the wall surface directly facing the first cylinder opening 45, but the outflow port 28 is provided with first and second gases that flow out of the first cylinder opening 45 and go straight. It may be arranged at a position where it does not flow, and may be arranged on a wall surface other than the wall surface where the virtual cylinder 29 intersects.

<Vacuum processing apparatus of another example>
Reference numeral 2a in FIG. 1 (b) represents a vacuum processing apparatus of another example of the present invention.
In the mixer 3a shown in FIGS. 1B and 3, the first and second cylinder openings 45a and 46a of the first and second cylinder bodies 11a and 12a are disposed inside the mixing container 10, and the outlet 28a is provided. Is a mixer 3a of the second embodiment, which is a modification of the mixer 3 of the first embodiment, provided on the wall surface perpendicular to the wall surface where the first cylinder opening 45a directly faces.

As shown below, from the evaluation value of the TEOS gas mass fraction, a TEOS gas generated by evaporating liquid TEOS (tetraethoxysilane: molecular weight 208.37) is usually used as the first gas. As the gas, oxygen gas (O ₂ : molecular weight 31.99) filled in a cylinder is used. In the above example, the oxygen gas filled in the cylinder is used as the first gas, and the second gas is used as the second gas. A TEOS gas generated by evaporating liquid TEOS is used.

<Exchange of first and second gas>
FIG. 10 (a) shows the first and second cylinder main bodies 11a using the TEOS gas as the first gas and the oxygen gas as the second gas as an introduction example 1 to the mixer 3a of the second embodiment of FIG. , 12a, and the TEOS gas mass and the oxygen gas mass at a plurality of calculation locations inside the mixing container 10 when flowing into the outlet port 28a are calculated by distribution simulation.
TEOS gas mass fraction = TEOS gas mass / (TEOS gas mass + oxygen gas mass)
From this, the TEOS gas mass fraction at the calculation location inside the mixing vessel 10 was obtained, and the TEOS gas mass fraction distribution diagram of FIG.

And while creating a distribution map and setting the maximum value as A and the minimum value as B among the mass fraction values of the TEOS gas at the location flowing out from the inside of the mixing melter 10 to the outlet 28a, The following formula,
Evaluation value (%) = ± (A−B) / (A + B) × 100
Was used to calculate the evaluation value of the mass fraction distribution of the TEOS gas.

  In addition, an outflow port is abbreviate | omitted in Fig.10 (a) and the other figure mentioned later which shows mass fraction distribution, and each figure which shows the boundary line of the mass distribution stage mentioned later. In the figure (a) and later-described figures showing the mass fraction distribution, the TEOS gas mass fraction values are shown in four stages. The relationship between these patterns and the TEOS gas mass fraction is shown in FIG.

The mass fraction distribution diagram of FIG. 10 (a) is obtained by assuming that the oxygen gas flows into the first or second cylinder body 11a, 12a at a larger flow rate than the TEOS gas. Then, the flow rate ratio of TEOS gas and O ₂ gas is 12: 600, and the inside of the mixing container 10 is 2000 Pa, and the mass fraction distribution in the mixing container 10 is calculated.

Since the TEOS gas and oxygen gas of the following examples and comparative examples were introduced into the first and second cylinder bodies 11a and 12a at the same pressure as in FIG. Yes.
As can be seen from FIG. 10A, in this introduction example 1, the first gas and the second gas are uniformly mixed by the vortex formed in the mixing space 13.
The evaluation value of the mass fraction distribution of the TEOS gas in the mixed gas supplied from the outlet port 28a is a value of ± 0.48%.

  FIG. 10B shows the distance between the first and second cylinder main bodies 11a and 12a and the wall surface, and the boundary between the adjacent TEOS gas mass fraction values when the pattern is removed from FIG. 10A. A line is shown.

  After the first gas flows a distance of 20 mm in the gap 47, the first and second gases flow a distance of 42.5 mm in the running space 48 and flow out of the first tube opening 45a. The second gas collides with the wall surface of the mixing container 10 through a distance of 5 mm.

  FIG. 10A shows a mass fraction distribution in the case where the first gas passing through the gap 47 has a lower flow rate (lower pressure) than the second gas passing through the second cylinder body 12a. On the contrary, as an introduction example 2, oxygen gas is introduced into the first gas of the same mixer 3a, TEOS gas is introduced as the second gas, and the second gas passing through the second cylinder body 12a passes through the gap 47. The flow rate was lower (lower pressure) than the first gas passing through.

  The boundaries of the mass fraction distribution of TEOS gas in the introduction example 2 are shown in FIGS. The mass fraction distribution in FIG. 11A is the same as the mass fraction distribution in FIG. 10A and is mixed to the same degree. In the case of FIG. 11 (a), the evaluation value of the mass fraction distribution of the TEOS gas in the mixed gas supplied from the outlet 28a is a value of ± 0.42%.

  Next, the first cylinder main body 11a when measuring the mass fraction distribution of FIG. 10 (a) and FIG. 11 (a) is shortened by 20 mm. As in the introduction example 1, TEOS gas is used as the first gas, An oxygen gas was used as the second gas, and a mass fraction distribution was calculated. The mass fraction distribution is shown in FIG. 12 (a), and the boundaries and dimensions of different values are shown in FIG. 12 (b). Dimensions other than the length of the first cylinder body 11a are the same as those in FIG.

  Since the first cylinder body 11a is shortened, the distribution of the mass fraction in FIG. 12 (a) becomes non-uniform in the vicinity of the wall surface close to the first cylinder body 11a out of the two wall surfaces parallel to the first cylinder body 11a. Therefore, the uniformity is worse than the mass fraction distribution of FIG. It can be said that the first cylinder opening 45a is not arranged near the center of the mixing space 13, which is a space where vortex flow is formed.

  Appropriate positions of the first cylinder opening 45a include the wall surface of the small chamber 21 and the surface of a baffle plate member 44 described later as “wall surfaces” in addition to the wall surface of the mixing fuser 10, and the first and second cylinder bodies 11a, 12a. When the mixing space distance L, which is the distance between the two wall surfaces forming the mixing space 13 in the mixing melter 10 in the direction in which the length of the mixing fuselage 10 extends, is “1”, the root side of the first and second cylinder main bodies 11a, 12a It is located within a range of a distance of 2/5 or more and 3/5 or less from the wall surface.

  10A, the center of the mixing space 13 is a position spaced 57.5 mm from the small chamber 21, and the position corresponding to the range of 2/5 or more and 3/5 or less is the range of 46 mm or more and 69 mm or less. The first cylinder opening 45a of (a) is located within a distance range of 2/5 or more and 3/5 or less when viewed from the mixing container 10, but is outside the range when viewed from the center position of the mixing space 13. .

  However, the evaluation value of the mass fraction distribution of the TEOS gas in the mixed gas supplied from the outlet 28a is a value of ± 0.93%, and the value of the distribution is a comparison between the first gas and the second gas. Since it is a value within a range where it can be determined that the mixture is uniformly mixed, the outflow port 28a is considered to be necessary to be provided near the far wall of the two wall surfaces parallel to the first cylinder body 11a, etc. It is necessary to select an arrangement according to the degree of mass fraction distribution to be obtained. However, with the configuration of FIG.

Next, the boundary line of the mass fraction distribution when oxygen gas is used as the first gas and TEOS gas is used as the second gas (Introduction Example 2) in the mixer 3a having the dimensions shown in FIG. Shown in (a) and (b).
From FIG. 13 (a), it is understood that the outflow port 28a may be provided at the center of the wall surface facing the first cylinder opening 45a. The evaluation value of the mass fraction distribution of the TEOS gas in the mixed gas supplied from the outlet 28a is a value of ± 1.04%, and the first gas and the second gas are mixed relatively uniformly. I can judge.

<Third embodiment>
In the mixers 3 and 3a described above, the first gas is introduced into the small chamber 21 provided inside the mixing container 10, and the first gas in the small chamber 21 is moved to the gap 47, but the third gas shown in FIG. Like the mixer 3 b of the embodiment, the first chamber may be introduced outside the mixing container 10 by forming the gap 47 outside the mixing container 10 without providing the small chamber 21.

  In this case, the first and second cylinder openings 45b and 46b of the first and second cylinder bodies 11b and 12b are arranged inside the mixing container 10, but the gap 47 is also formed outside the mixing container 10. Therefore, the first and second cylinder main bodies 11b and 12b also include a portion that forms the gap 47 outside the mixing container 10.

<Fourth embodiment>
When the first and second cylinder bodies 11b and 12b are extended outside the mixing container 10 as in the mixer 3b in the third embodiment, the mixer 3c in the fourth embodiment in FIG. The first cylinder body 11c is positioned inside and outside the mixing container 10, the first cylinder opening 45c is positioned inside the mixing container 10, and the second cylinder body 12c is positioned outside the first cylinder body 11c. It is possible to insert the second cylindrical opening 46c into the portion, and to place the second cylindrical opening 46c at the same position as the wall of the mixing container 10 or outside the wall of the mixing container 10.

  The mass fraction distribution of the mixer 3c is shown in FIG. The first gas is TEOS gas, and the second gas is oxygen gas (Introduction Example 1). Since the 1st cylinder opening 45c is located in the range of 2/5 or more and 3/5 or less, favorable mixing is possible and it has become uniform mixing.

<Fifth embodiment>
In the mixers 3 and 3a to 3c of the first to fourth embodiments, the outlets 28 and 28a are provided outside the portion 14 where the virtual cylinder 29 and the wall surface of the mixing container 10 intersect. In the mixer 3d of the fifth embodiment, the outlet 28 is the mixer 3 of the first embodiment of FIG. 2, and the outer peripheral side surface of the first cylinder body 11d is virtually arranged in the direction in which the first cylinder body 11d extends. The extending virtual cylinder 29 and the mixing container 10 are arranged so that all or at least a part of the intersecting portion 14, which is a wall surface where the wall surface of the mixing container 10 intersects, overlaps.

And in the mixer 3d of 5th Example, the baffle plate member 44 is arrange | positioned between 45 d of 1st cylinder openings, and the outflow port 28. As shown in FIG.
The baffle plate member 44 is located between the first cylinder opening 45d and the outlet 28, and is located between the second cylinder opening 46d and the outlet 28, and is discharged from the second cylinder opening 46d. Then, the second gas that travels straight in a direction parallel to the direction in which the second cylinder main body 12 d extends collides with the surface of the baffle plate member 44 and spreads in a direction along the surface of the baffle plate member 44.

  The first gas discharged from the first cylinder opening 45d and going straight in the direction parallel to the direction in which the first cylinder main body 45d extends extends to the surface of the baffle plate member 44 by the second gas spreading along the surface of the baffle plate member 44. The first and second air that is discharged from the first tube opening 45d and travels straight is caused to flow along the surface of the baffle plate member 44 and collide with the surface of the baffle plate member 44. The gas does not flow into the outlet 28 but is mixed in the mixing space 13, and a mixed gas in which the first gas and the second gas are uniformly mixed flows into the outlet 28 and is supplied to the discharge device 19.

In the mixers 3, 3 a to 3 c of the first to fourth embodiments, the outlets 28 and 28 a are provided on the outer wall surface of the crossing portion 14 among the wall surfaces of the mixing container 10. The outer wall surface of the crossing portion 14 includes wall surfaces other than the wall surface of the mixing container 10 that the first cylinder opening 45 directly faces.
In the 1st cylinder opening 45 and 45a-45c, the baffle plate member 44 is not arrange | positioned between the wall surfaces of the mixing container 10 of the 1st cylinder opening 45, 45a-45c.

  When the mixing containers 10 of the mixers 3, 3 a to 3 c of the first to fourth embodiments and the mixing container 10 of the mixer 3 d of the fifth embodiment are the same size, the first to fourth embodiments The distance between the first cylinder opening 45d and the baffle plate member 44 of the fifth embodiment is larger than the distance between the first cylinder openings 45, 45a to 45c and the wall surface facing the first cylinder openings 45, 45a to 45c. The distance is shorter.

If it is attempted to increase the distance between the baffle plate member 44 and the first cylinder opening 45d of the fifth embodiment, the baffle plate member 44 approaches the outflow port 28, and the conductance near the outflow port 28 is reduced. In this case, the pressure loss increases.
Therefore, the size and position of the baffle plate member 44, the size and position of the outflow port 28, and the like may be obtained so that the pressure loss does not increase.

<First and second comparative examples>
Next, a comparative example of the present invention will be described.
Like the mixer 103a of the first comparative example in FIG. 7 and the mixer 103b of the second comparative example in FIG. 8, the first cylinder openings 145a and 145b and the second cylinder openings 146a and 146b are on the same plane. The mixers 103a and 103b that were positioned and did not have a running space were created, and the mass fraction distribution was calculated.

  In the mixer 103a of FIG. 7, the first cylinder main body 111a and the second cylinder main body 112a are not protruded into the mixing container 10, and in the mixer 103b of FIG. Although it has a different structure from the main body 112b in that it protrudes into the mixing container 10, it is the same in that it does not have a running space.

In the mixers 103a and 103b of the first and second comparative examples in FIGS. 7 and 8, TEOS gas was used as the first gas, and oxygen gas was used as the second gas.
The mass fraction distribution of TEOS gas in the mixer 103a of the first comparative example is shown in FIG. 15, and the mass fraction distribution of TEOS gas in the mixer 103b of the second comparative example is shown in FIG.
In any case, it can be seen that the first gas is not uniformly released from the entire circumference of the gap 47 and is not uniformly mixed in the mixing container 10.

  The TEOS gas in the mixed gas supplied from the mixers 103a and 103b of the first and second comparative examples to the discharge device 19 is the mass fraction of the TEOS gas in the mixed gas of the mixer 103a of the first comparative example in FIG. The evaluation value of the distribution is ± 3.36%, and the evaluation value of the mass fraction distribution of the TEOS gas in the mixer 103b of the second comparative example in FIG. 16 is ± 0.69%.

<Third comparative example>
Next, as in the mixer 103c of the third comparative example shown in FIG. 9, the first cylinder body 111c is protruded into the mixing container 10, and the first cylinder opening 145c is positioned in the mixing container 10, The two-cylinder main body 112c is protruded into the mixing container 10 from the first cylinder opening 145c of the first cylinder main body 111c, and the second cylinder opening 146c is positioned closer to the facing wall than the first cylinder opening 145c. .

FIGS. 17A and 17B are mass fraction distributions of TEOS gas when TEOS gas is used as the first gas and oxygen gas is used as the second gas in the mixer 103c of the third comparative example. .
In FIG. 17, a vortex by oxygen gas is formed between the second cylinder opening 146c and the wall surface close to the second cylinder opening 146c, and the TEOS gas supplied to the portion from the gap 47 is pushed by the vortex of oxygen gas. Thus, it is difficult to flow out from the gap 47, and it can be seen that the first and second gases are not uniformly mixed. The evaluation value of the mass fraction distribution of the TEOS gas of the mixed gas supplied to the discharge device 19 is a value of ± 2.5%.

18 (a) and 18 (b) show the mass of TEOS gas when oxygen gas is used as the first gas and TEOS gas is used as the second gas, contrary to FIGS. 17 (a) and (b). It is a fraction distribution.
A vortex of oxygen gas supplied from the tip of the gap 47 is formed between the tip of the gap 47 and the wall surface near the tip of the gap 47, and a complex mass is formed around the protruding second cylinder body 112c. A fraction distribution is formed. As a result, TEOS gas and oxygen gas are not incident so as to intersect perpendicularly to the wall surface facing the second cylinder opening 146c, but are mixed non-uniformly.
The evaluation value of the mass fraction distribution of the TEOS gas in the mixed gas is a value of ± 1.8%.

<Other examples of mixing>
From the above mass fraction distribution diagram and its evaluation value, when mixing two kinds of gases having a difference in flow rate, in the mixers 3, 3a to 3d of the present invention, a high flow rate (high pressure) gas and a low gas amount are mixed. Even if any of the gas at the flow rate (low pressure) is the first gas and the other is the second gas, they are uniformly mixed.

  Moreover, although the 1st, 2nd cylinder main body 11, 11a-11d, 12, 12a-12d of the mixer 3, 3a-3d of this invention demonstrated above was circular in cross section, a polygon may be sufficient, A regular polygon is better.

  According to the calculation results of the mass fraction distributions of Comparative Examples 1 to 3 above, the mixers 103a to 103c without the running space 48 can be used even if the first cylinder main bodies 111a to 111c and the second cylinder main bodies 112a to 112c are used. It can be seen that the second gas is not uniformly mixed, but even if the run-up space 48 is provided, it is considered that the second gas is not uniformly mixed if the distance in which the first and second gases flow in the run-up space 48 is short. The optimum length of the run-up space 48 is affected by the internal dimensions of the mixing container 10 used and the thickness and length of the first and second cylinder bodies 11, 11a to 11d, 12, and 12a to 12d. When the size or the like of the container 10 changes, the optimal length of the run-up space 48 may be calculated again.

  Further, when the mixing container 10 is a rectangular parallelepiped, the appropriate positions of the first cylinder openings 45, 45 a to 45 d are “wall surfaces” of the wall surface of the mixing fuser 10, the wall surface of the small chamber 21, and the surface of the baffle plate member 44. The mixing space distance L, which is the distance between the two wall surfaces forming the mixing space 13 in the mixing melter 10 in the direction in which the first and second cylinder bodies 11, 11a to 11d, 12, 12a to 12d extend, is “1”. ", The first and second cylinder bodies 11, 11a to 11d, 12, 12a to 12d are located within a range of a distance of not less than 2/5 and not more than 3/5 from the wall surface on the root side. A stable vortex is formed in the mixing space 13 in the mixing vessel 10 of the mixers 3, 3 a to 3 d of the first to fifth embodiments, and the distribution of the mass fraction in which the first and second gases are uniformly mixed is calculated. Is done.

  Furthermore, the length of the running space 48 in the direction in which the first and second gases flow is parallel to the direction in which the first and second cylinder bodies 11, 11 a to 11 d, 12, 12 a to 12 d of the mixing container 10 extend. When the length is longer than 1/5 of the side length, a distribution in which the first and second gases are uniformly mixed can be calculated.

  As for the distances between the first cylinder openings 45 and 45a to 45d, the optimum values are the internal dimensions of the mixing container 10, the first and second cylinder bodies 11, 11a to 11d, 12, Since the thicknesses and lengths of 12a to 12d have an effect, the optimal distance value may be recalculated if the internal dimensions of the mixing container 10 change.

  The width in the direction perpendicular to the mixing space distance L, where the distance between the outer circumference of the first cylinder main bodies 11, 11 a to 11 d and the wall surface of the mixing fuser 10 is the width of the mixing space 13. Is preferably at least twice the diameter (inner diameter) D of the first cylinder openings 45, 45a to 45d. Therefore, the minimum value of the width of the mixing space 13 can be reduced by changing the dimensions. When the diameter D is less than twice the diameter D of 45a to 45d, the dimensions may be recalculated.

In the above embodiment, the TEOS gas and the oxygen gas are mixed by the mixers 3, 3a to 3d, but other types of gases can also be mixed. In particular, one of the source gas generated by sublimation or evaporation and the gas that is a gas at normal temperature may be a first gas and the other gas may be a second gas.
Moreover, in the said vacuum processing apparatus 2, although the thin film was formed using plasma, the vacuum processing apparatus which forms a thin film without using plasma is also contained. Further, a vacuum processing apparatus that performs vacuum processing such as etching or surface treatment without forming a thin film is also included in the present invention.

  In addition, although the 1st cylinder main body 11, 11a-11d of each said Examples 1-5 and the 2nd cylinder main body 12, 12a-12d were non-contact, it does not disturb the flow of the 1st gas which flows through the clearance gap 47. Small spacers may be disposed in close contact with the inner peripheral side surfaces of the first cylinder main bodies 11 and 11a to 11d and the outer peripheral side surfaces of the second cylinder main bodies 12 and 12a to 12d.

When a thin film was formed on the substrate surface with a mixer having an evaluation value of the mass fraction distribution of TEOS gas in the mixed gas of ± 41.8%, the film thickness distribution of the formed thin film was so bad that it could not be used.
Further, in the mixer having an evaluation value of ± 7.4%, the value of the in-plane film thickness distribution according to the magnitude of the evaluation value was bad.

  On the other hand, in a mixer with an evaluation value of ± 0.5% or less, the in-plane film thickness distribution corresponding to the evaluation value is no longer in effect, and the factor that affects the film thickness distribution is not the size of the evaluation value. It is thought that it became the factor of.

3, 3a to 3d …… Mixer 5 …… Gas generating container 6 …… Raw material 7 …… Heating device 10 …… Mixing container 11, 11a to 11d …… First cylinder body 12, 12a to 12d …… Second Cylinder body 13 ... mixing space 14 ... crossover part 19 ... discharge device 24 ... vacuum chamber 25 ... gas transfer pipes 28, 28a ... outlet 29 ... virtual cylinder 30 ... treatment object 34 ... plasma Device 45, 45a-45d ...... First cylinder opening 46, 46a-46d ...... Second cylinder opening 47 ...... Gap 48 ... Running space

Claims (13)

A mixing vessel in which the internal space is separated from the external atmosphere;
A cylindrical first cylinder body in which the first gas introduced into the root side flows out from the first cylinder opening on the tip side;
A cylindrical second cylinder body in which the second gas introduced into the root side flows out from the second cylinder opening on the tip side;
An outlet provided in the wall of the mixing vessel;
Have
The first cylinder opening is disposed inside the mixing container away from the wall surface of the mixing container facing the first cylinder opening,
At least a part of the second cylinder main body is disposed inside the first cylinder main body in a state where the outer peripheral side surface of the second cylinder main body is not in contact with the inner peripheral side surface of the first cylinder main body,
The first gas flows through a gap between the inner peripheral side surface of the first cylinder body and the outer peripheral side surface of the second cylinder body;
The second cylinder opening is disposed inside the first cylinder main body,
The first cylinder opening is arranged at a position closer to the second cylinder opening from the wall surface of the mixing container facing the first cylinder opening,
The first cylinder body and the second cylinder body are respectively stretched along straight lines parallel to each other,
The first gas flowing out from the first cylinder opening into the mixing container and traveling straight and the second gas flowing out from the second cylinder opening into the mixing container and proceeding straight are the flow. The outlet is arranged so as not to enter the outlet,
Said 1st, 2nd gas is discharge | released from the said 1st cylinder opening to the inside of the said mixing container, and the outer peripheral side surface of the said 1st cylinder main body is the inside of the said mixing container, and the said 1st cylinder main body extends. The first and second gases are mixed by the vortex of the first and second gases formed in a donut-shaped mixing space centered on the virtually extended virtual cylinder and the first cylinder main body. The mixed gas thus generated flows out of the mixing container from the outlet. The outflow port is an outer side of a crossing portion that is a wall surface of a portion where a virtual tube obtained by virtually extending an outer peripheral side surface of the first tube main body in a direction in which the first tube main body extends and a wall surface of the mixing container intersect. mixer according to claim 1, wherein provided in the wall of. The outlet is at least partially arranged at a position where a virtual cylinder obtained by virtually extending an outer peripheral side surface of the first cylinder main body in a direction in which the first cylinder main body extends and a wall surface of the mixing container intersect.
Mixer according to claim 1, wherein the baffle member is provided between said first cylindrical opening and the outlet. The mixing container is a rectangular parallelepiped, and wall surfaces of four walls among the six walls of the mixing container are arranged in parallel with the outer periphery of the first cylinder main body and face the outer peripheral side surface of the first cylinder main body. mixer according to claim 1 Symbol placement. The mixer of claim 1 Symbol placing the cross-sectional shape of the inner peripheral surface is circular and the first cylindrical body and the second tubular body. A gas supply device;
A mixer;
A gas transfer pipe;
A vacuum chamber;
A gas release device;
Have
The first gas and the second gas are introduced into the mixer from the gas supply device, the first gas and the second gas are mixed in the mixer to generate a mixed gas, and the generated mixed gas Is transferred from the mixer to the gas discharge device by the gas transfer pipe, discharged from the gas discharge device to the inside of the vacuum chamber, and a processing object disposed inside the vacuum chamber is vacuum processed. A vacuum processing apparatus,
The mixer is
A mixing vessel in which the internal space is separated from the external atmosphere;
A first cylindrical body of the cylindrical shape the first gas introduced into the base side flows out from the first cylindrical opening in the distal end side,
A second cylindrical body of the cylindrical shape the second gas introduced into the base side flows out from the second cylindrical opening in the distal end side,
An outlet provided on the wall of the mixing vessel to which the gas transfer pipe is connected;
Have
The first cylinder opening is disposed inside the mixing container apart from the wall surface of the mixing container facing the first cylinder opening,
At least a part of the second cylinder main body is disposed inside the first cylinder main body in a state where the outer peripheral side surface of the second cylinder main body is not in contact with the inner peripheral side surface of the first cylinder main body.
The first gas flows through a gap between the inner peripheral side surface of the first cylinder body and the outer peripheral side surface of the second cylinder body;
The second cylinder opening is disposed inside the first cylinder main body,
The first cylinder opening is arranged at a position closer to the second cylinder opening from the wall surface of the mixing container facing the first cylinder opening,
The first cylinder body and the second cylinder body are respectively stretched along straight lines parallel to each other,
The first gas flowing out from the first cylinder opening into the mixing container and traveling straight and the second gas flowing out from the second cylinder opening into the mixing container and proceeding straight are the flow. The outlet is arranged so as not to enter the outlet,
Said 1st, 2nd gas is discharge | released from the said 1st cylinder opening to the inside of the said mixing container, and the outer peripheral side surface of the said 1st cylinder main body is the inside of the said mixing container, and the said 1st cylinder main body extends. The first and second gases are mixed by the vortex of the first and second gases formed in a donut-shaped mixing space centered on the virtually extended virtual cylinder and the first cylinder main body. The mixed gas thus generated flows into the gas transfer pipe from the outflow port. The gas supply device includes:
A gas generating container in which the raw material is disposed;
A heating device for heating the source material in the gas generation container,
As the first gas or the second gas, the raw material is heated by the heating device, and the raw material gas generated by sublimation or evaporation is supplied to the mixing container,
The vacuum processing apparatus according to claim 6 , wherein a gas that is a gas at least at normal temperature and pressure is supplied to the mixing container as the other gas. A thin film is formed on the surface of a processing object disposed inside the vacuum chamber by a chemical reaction between the first gas and the second gas contained in the mixed gas released into the vacuum chamber. 8. The vacuum processing apparatus according to 7 . The vacuum processing apparatus according to claim 8 , further comprising a plasma apparatus that converts the mixed gas supplied from the mixer into plasma. The outflow port is an outer side of a crossing portion that is a wall surface of a portion where a virtual tube obtained by virtually extending an outer peripheral side surface of the first tube main body in a direction in which the first tube main body extends and a wall surface of the mixing container intersect. The vacuum processing apparatus of Claim 6 provided in the said wall surface. The outlet port includes at least a crossover portion that is a wall surface of a portion where a virtual tube obtained by virtually extending an outer peripheral side surface of the first tube body in a direction in which the first tube body extends and a wall surface of the mixing container intersect. It is arranged so that a part overlaps,
The vacuum processing apparatus according to claim 6 , wherein a baffle plate member is provided between the first cylinder opening and the outlet. The mixing container is a rectangular parallelepiped, and wall surfaces of four walls among the six walls of the mixing container are arranged in parallel with the outer periphery of the first cylinder main body and face the outer peripheral side surface of the first cylinder main body. The vacuum processing apparatus according to claim 6 . The vacuum processing apparatus according to claim 6, wherein the first cylinder main body and the second cylinder main body have circular inner cross-sectional shapes.

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