KR102122897B1 - Apparatus for Defoamation - Google Patents

Abstract

The present invention relates to a defoaming device including: a shutter unit providing a defoaming space for defoaming a substrate on which a film is attached; a lower frame disposed below the shutter unit and configured to support the shutter unit; an upper frame disposed above the shutter unit and configured to support the shutter unit; an elevating unit for moving the shutter unit vertically so that the shutter unit moves between a closed position wherein the defoaming space is closed and an open position wherein the defoaming space is opened; a restriction unit moving between a restriction position which restricts the movement of the shutter unit in the closed position as being supported by the upper frame and an allowable position which allows the movement of the shutter unit as support for the upper frame is released; and a moving unit coupled to the restriction unit and moving the restriction unit between the restriction position and the allowable position in a direction perpendicular to the vertical direction. Therefore, in the closed position, it is possible to improve the holding force to withstand the internal pressure acting on the defoaming space.

Description

Defoaming device {Apparatus for Defoamation}

The present invention relates to a defoaming device for removing air bubbles between a substrate and a film.

In general, displays such as liquid crystal displays (LCDs), organic light emitting diodes (OLEDs), plasma display panels (PDPs), electrophoretic displays (EPDs), etc. Devices and solar cells are manufactured through various processes. The manufacturing process includes a film attaching process for attaching a film to a substrate. For example, a liquid crystal display device may be manufactured through a film attaching process of attaching a polarizing film to a substrate.

When the film attaching process is completed, a degassing process is performed to remove air bubbles present between the substrate and the film. In performing this defoaming process, a defoaming device is used. The defoaming device removes air bubbles between the substrate and the film by maintaining the substrate to which the film is attached at a high temperature and high pressure for a predetermined time through a film attaching process.

The defoaming device according to the prior art includes a shutter portion and a lifting portion.

The shutter portion is to provide a defoaming space for degassing the substrate to which the film is attached. The shutter unit may support a substrate to which a film is attached. The shutter unit may include a plurality of shutters. In this case, the defoaming space may be disposed between each of the shutters.

The lifting portion is for moving the shutter portion. The lifting portion may move the shutter portion up and down so that the shutter portion moves between a closed position where the defoaming space is closed and an open position where the defoaming space is opened. In the open position, an unloading process of unloading a substrate on which a film is attached from the defoaming space, and a loading process of loading a substrate on which the film is attached to the defoaming space may be performed.

Here, the internal pressure of the defoaming space increases during the defoaming process, and the internal pressure acts in the vertical direction. When the shutter portion moves up and down in the closed position due to the internal pressure, the sealing of the defoaming space is released, and thus the quality of the degassed substrate is deteriorated.

To prevent this, the defoaming device according to the prior art requires a separate component to limit the movement of the shutter portion in order to withstand the internal pressure acting on the defoaming space in the closed position. However, the defoaming device according to the prior art has a problem in that it is difficult to implement a stable process environment for the defoaming process because a separate component has a low holding force to withstand the internal pressure. In addition, the defoaming device according to the prior art is configured to move a separate component to move in the vertical direction, which is the same direction as the direction in which the shutter moves, thereby limiting movement of the shutter. Therefore, the defoaming device according to the prior art has a problem in that it is difficult to realize miniaturization since the overall size is increased based on the vertical direction.

The present invention has been devised to solve the problems as described above, and is to provide a defoaming device capable of improving a bracing force withstanding an internal pressure acting on a defoaming space in a closed position.

The present invention is to provide a degassing device that can improve the ease of miniaturization.

In order to solve the above problems, the present invention may include the following configuration.

The defoaming apparatus according to the present invention includes a shutter unit providing a defoaming space for defoaming a substrate to which a film is attached; A lower frame disposed below the shutter portion and supporting the shutter portion; An upper frame disposed above the shutter portion and supporting the shutter portion; An elevation unit for moving the shutter unit up and down so that the shutter unit moves between a closed position in which the defoaming space is closed and an open position in which the defoaming space is opened; A limiting part moving between a limiting position limiting movement of the shutter part in the closed position as it is supported by the upper frame and an allowable position allowing movement of the shutter part as support for the upper frame is released; And a moving portion coupled to the restriction portion and moving the restriction portion between the restriction position and the allowable location in a direction perpendicular to the vertical direction.

According to the present invention, the following effects can be achieved.

The present invention can realize a stable process environment for the degassing process by improving the bracing force to withstand the internal pressure of the degassing space.

The present invention can reduce the maintenance cost of the limiting part by reducing the possibility of damage or breakage of the limiting part, as well as increase the operation rate of the limiting part.

The present invention can improve the ease of miniaturization by reducing the overall size based on the vertical direction.

1 is a schematic perspective view showing a closed position of the shutter unit in the defoaming device according to the present invention
Figure 2 is a schematic perspective view showing the allowable position of the limiting portion in the degassing device according to the present invention
Figure 3 is a schematic perspective view showing the opening position of the shutter in the defoaming device according to the present invention
4 is a schematic side cross-sectional view conceptually showing the closed position of the shutter unit based on the II section line of FIG. 1;
5 is a schematic side cross-sectional view conceptually showing the opening position of the shutter unit based on the II-II section line of FIG. 3;
Figure 6 is a schematic perspective view of the limiting portion in the degassing device according to the present invention
Figure 7 is a schematic side cross-sectional view conceptually showing the limiting position of the limiting portion in the degassing device according to the present invention
Figure 8 is a schematic side cross-sectional view conceptually showing the allowable position of the limiting portion in the degassing device according to the present invention
Figure 9 is a side view of the defoaming device according to the present invention with reference to Figure 1 from the side
10 is a side view of the defoaming device according to the present invention as viewed from the side of FIG.
Figure 11 is a side view of the defoaming device according to the present invention with reference to Figure 3 from the side
12 is a schematic perspective view showing a link portion in the degassing device according to the present invention
13 is a schematic side cross-sectional view showing an insertion portion in the degassing device according to the present invention
Figure 14 is a schematic side cross-sectional view showing a state in which the link portion is inserted into the insertion portion in the defoaming device according to the present invention based on the closed position
15 is a schematic side cross-sectional view showing a state in which the link portion is inserted into the insertion portion based on the open position in the defoaming device according to the present invention in the defoaming device according to the present invention
16 is a front sectional view schematically showing a connection structure between a lower shutter member and the lower plate in an embodiment in which a shutter portion includes a lower plate.
17 is a schematic perspective view showing a state in which the shutter moving member moves in the forward direction in the defoaming device according to the present invention
18 is a schematic partial perspective view of a guide member in the defoaming device according to the present invention
19 is a schematic front cross-sectional view taken on the basis of section III-III of FIG. 3;
20 is a view omitting the guide member based on FIG. 19
21 is an enlarged view showing an enlarged portion A of FIG. 17 to explain the clamping mechanism.

Hereinafter, embodiments of the defoaming apparatus according to the present invention will be described in detail with reference to the accompanying drawings.

1 to 3, the defoaming device 1 according to the present invention includes a liquid crystal display (LCD), an organic light emitting display (OLED), a plasma display panel (PDP), an electrophoretic display (EPD), etc. It is used in the manufacturing process for manufacturing display devices, solar cells, lighting devices, and the like. The defoaming device 1 according to the present invention performs a defoaming process for removing air bubbles present between the substrate and the film attached to each other in the manufacturing process. For example, in the case of a manufacturing process for manufacturing a liquid crystal display device, the defoaming device 1 according to the present invention can remove bubbles existing between the substrate and the polarizing film attached to each other.

To this end, the defoaming device 1 according to the present invention is a shutter that provides a defoaming space (shown in FIGS. 10, 4 and 17) for defoaming the substrate 200 (shown in FIG. 17) to which the film is attached. A part (2), disposed below the shutter part (2), a lower frame (1B) for supporting the shutter part (2), and disposed above the shutter part (2), the shutter part (2) ) To support the upper frame (1A), the shutter portion (2) so that the defoaming space (10) is sealed between the closed position (CP) and the defoaming space (10) is opened to move between (OP) The lifting part 3 for moving the shutter part 2 in the vertical direction, and the limited position LP limiting the movement of the shutter part 2 in the closed position CP as supported by the upper frame 1A ) And the limiting part (4) moving between the allowable positions (AP) allowing the movement of the shutter part (2) as the support for the upper frame (1A) is released, and in the vertical direction (Z-axis direction) And a moving part 5 which moves the limiting part 4 in the direction perpendicular to the limiting position LP and the allowable position AP.

The defoaming space 10 is provided in the shutter part 2. When the shutter unit 2 includes one upper plate 21 and a plurality of shutter members 22a and 22b as shown in FIGS. 1 to 5, the defoaming space 10 is in the vertical direction ( Z-axis direction), the space between the upper plate 21 and the upper shutter member 22b disposed at the top of the shutter members 22, and between the shutter members 22a, 22b It can be arranged in each space. As shown in FIG. 1, when the shutter unit 2 is located in the closed position CP, the shutter unit 2 may seal the defoaming space 10. As illustrated in FIG. 3, when the shutter unit 2 is located in the open position OP, the shutter unit 2 may open the defoaming space 10. In the open position (OP), the unloading process of unloading the substrate 200 to which the film is attached from the defoaming space 10, and loading to load the substrate to which the film is attached to the defoaming space 10 The process takes place. As illustrated in FIG. 3, one or more substrates 200 to which the film is attached may be accommodated in one defoaming space 10. The upper shutter member 22b may be a shutter member disposed adjacent to the upper plate 21 among the shutter members 22. The upper shutter member 22b may be embodied to have the same configuration as all configurations of each of the shutter members 22.

The defoaming device 1 according to the present invention is implemented such that the limiting part 4 moves between the limiting position LP and the allowable position AP in a direction perpendicular to the vertical direction (Z-axis direction). . Accordingly, the defoaming device 1 according to the present invention can achieve the following operational effects.

First, in the defoaming device 1 according to the present invention, even if the internal pressure of the defoaming space 10 increases during the defoaming process, the limiting part 4 is supported by the upper frame 1A, It is implemented in a structure that withstands the internal pressure of the defoaming space (10). Therefore, in the defoaming device 1 according to the present invention, the defoaming space 10 is compared with the prior art, in which the limiting part 4 is implemented in a structure that directly withstands the internal pressure of the defoaming space 10. By improving the bracing force to withstand the internal pressure of, it is possible to implement a stable process environment for the degassing process in the closed position (CP). In addition, the defoaming device 1 according to the present invention reduces the possibility of damage or breakage of the limiting part 4 as the limiting part 4 directly withstands the internal pressure of the defoaming space 10. Not only can the maintenance cost of the limiting part 4 be reduced, but also the operation rate of the limiting part 4 can be increased.

Second, the defoaming device 1 according to the present invention is implemented such that the limiting part 4 moves in a direction perpendicular to the moving direction of the shutter part 2. For example, when the shutter part 2 moves in the vertical direction (Z-axis direction) in the process of moving between the closed position CP and the open position OP, the limiting part 4 is the vertical direction ( Z-axis direction), and can be moved in the vertical direction (X-axis direction). Accordingly, the degassing device 1 according to the present invention is reduced in overall size based on the vertical direction (Z-axis direction), thereby improving the ease of miniaturization.

Hereinafter, the accompanying drawings of the upper frame (1A), the lower frame (1B), the shutter portion (2), the lifting portion (3), the limiting portion (4), and the moving portion (5) It will be described in detail with reference. On the other hand, the terms "up and down", "left and right", and "before and after" described in this specification do not refer to a specific direction, but an example of a direction in which the components of the defoaming device 1 according to the present invention move You should keep in mind that.

The upper frame (1A, shown in FIGS. 9 to 11) is disposed above the shutter unit 2. The upper frame 1A may support the shutter portion 2 in a downward direction (DD arrow direction). The lower direction (DD arrow direction) is a direction in which the overall height of the defoaming device 1 according to the present invention decreases, and may be a direction from the upper frame 1A toward the lower frame 1B. The upper frame 1A may be coupled to the lifting part 3.

The lower frame 1B (shown in FIGS. 9 to 11) is disposed below the shutter unit 2. The lower frame 1B may support the shutter unit 2 in an upward direction (UD arrow direction). The upper direction (UD arrow direction) is a direction in which the overall height of the defoaming device 1 according to the present invention increases, and may be opposite to the lower direction (DD arrow direction). The lower frame 1B may be disposed on the lower side of the lower shutter member 22a disposed on the lower side of the shutter members 22. The lower shutter member 22a may be implemented to have the same configuration as all configurations of each of the shutter members 22.

A lower link plate 1B0 (shown in FIGS. 1 to 3) may be coupled to the lower frame 1B. The lower link plate 1B0 may be coupled to the lower frame 1B so as to protrude from the lower frame 1B. The lower link plate 1B0 may be disposed under the lower shutter member 22a. The lower link plate 1B0 may be integrally formed with the lower frame 1B.

Although not shown, the degassing device 1 according to the present invention may include a side frame. The side frame is disposed on the side with respect to the shutter portion (2). The upper frame 2A and the lower frame 1B may be connected to each other by the side frame. The side frame may be disposed between the upper frame 2A and the lower frame 1B based on the vertical direction (Z-axis direction).

1 to 5, the shutter unit 2 is to provide a defoaming space 10 for degassing the substrate 200 to which the film is attached. The defoaming space 10 may be formed through a process of processing a predetermined depth groove from the upper surface of each of the shutter members 22. The shutter part 2 may be disposed between the upper frame 1A and the lower frame 1B. The shutter part 2 may be disposed in the lower direction (DD arrow direction) with respect to the upper frame 1A, and may be disposed in the upper direction (UD arrow direction) with respect to the lower frame 1B.

Although not shown, a heating member may be installed in the shutter unit 2. The heating member may heat the substrate 200 to which the film is attached while generating heat as power is supplied. The heating member may heat the defoaming space 10 to heat the substrate 200 to which the film is attached. When the shutter unit 2 includes a plurality of shutter members 22, the heating member may be installed in each of the shutter members 22.

Although not shown, an injection unit may be installed in the shutter unit 2. The injection unit is for injecting air or the like into the defoaming space 10. When the injection part injects air into the defoaming space 10, the internal pressure of the defoaming space 10 may be increased. The injection unit may be installed on each of the shutter members 22.

Referring to FIGS. 1 to 16, the shutter unit 2 may include an upper plate 21 and a plurality of shutter members 22.

The upper plate 21 is disposed in the upper direction (in the direction of the UD arrow) with respect to the shutter members 22. The upper plate 21 may be positioned in the closed position CP by moving toward the lower direction (in the direction of the DD arrow) and may be located in the open position OP by moving toward the upper direction (in the direction of the UD arrow). have. The upper frame 1A may be formed in the form of a rectangular plate as a whole, but this is exemplary, and may be formed in another form as long as the defoaming space 10 can be provided.

1 to 3, an upper link plate 211 may be coupled to the upper plate 21. The upper link plate 211 may be coupled to the upper plate 21 to protrude from the upper plate 21. The upper link plate 211 may be formed in a cuboid shape as a whole. The upper link plate 211 may be integrally formed with the upper plate 21.

The shutter members 22 are spaced apart from each other to form a plurality of defoaming spaces 10. The shutter members 22 may be spaced apart from each other based on the vertical direction (Z-axis direction). The shutter members 22 may be disposed in the lower direction (DD arrow direction) with respect to the upper plate 21. Each of the shutter members 22 may be formed in a square plate shape as a whole, but this is exemplary, and may be formed in another shape as long as the defoaming space 10 can be provided. Hereinafter, a description will be given based on an embodiment in which the shutter portion 2 includes two shutter members 22a and 22b, from which the shutter portion 2 includes three or more shutter members 22. It will be apparent to those of ordinary skill in the art to which the present invention pertains. When the shutter unit 2 includes three or more shutter members 22, the shutter unit 2 includes one upper shutter member 22b, one lower shutter member 22a, and the upper shutter member One or more intermediate shutter members (not shown) disposed between 22b and the lower shutter member 22a may be included.

In the defoaming device 1 according to the present invention, the upper shutter member 22b moves to the lower direction (DD arrow direction) and is located in the closed position CP, and the upper shutter member 22b is the It may be implemented to move toward the upward direction (in the direction of the UD arrow) to be located in the open position OP. The upper shutter member 22b may be a shutter member 22 having a shortest distance from the upper plate 21 among the shutter members 22. The upper shutter member 22b may be spaced apart from each of the upper plate 21 and the lower shutter member 22a in the open position OP. The upper shutter member 22b is spaced apart from the lower shutter member 22a so as to have a first gap (L1, shown in FIG. 15) with the lower shutter member 22a in the open position OP and the opening. It may be spaced apart from the upper plate 21 to have a second gap (L2, shown in FIG. 15) with the upper plate 21 at a position OP. The first interval L1 and the second interval L2 may be lengths based on the vertical direction (Z-axis direction).

1 to 5, the lifting part 3 moves the shutter part 2 in the vertical direction (so that the shutter part 2 moves between the closed position CP and the open position OP). Z-axis direction). The lifting part 3 may be coupled to the upper plate 21. The lifting part 3 may be coupled to each of the upper plate 21 and the upper frame 1A. The lifting unit 3 may move the upper plate 21 only toward the lower direction (DD arrow direction) to position the shutter unit 2 in the closed position CP. The lifting unit 3 may move the upper plate 21 only toward the upper direction (in the direction of the UD arrow) to position the shutter unit 2 in the open position OP. This is because the upper plate 21 and the upper shutter member 22b, and the upper shutter member 22b and the lower shutter member 22a are connected by a link portion 7 to be described later. . The lifting unit 3 moves the upper plate 21 and the upper shutter member 22b to the lower direction (DD arrow direction) and the upper direction (UD arrow direction), respectively, to move the shutter unit 2. It may be located in the closed position (CP) and the open position (OP).

The lifting unit 3 may move the shutter unit 2 in a manner using a hydraulic cylinder or a pneumatic cylinder, or a method using an electric motor. The lifting part 3 is a ball screw method using a ball screw and a ball nut, a rack pinion method using a rack gear or a pinion gear, and a pulley ) And a belt method using a belt, a linear motor method using a coil and a permanent magnet, and a cam method using a cam or the like may move the shutter unit 2.

1 to 3, and 6 to 11, the limiting part 4 is a limiting position LP and the shuttering part limiting the movement of the shutter part 2 in the closed position CP. (2) It is to move between the allowable positions (AP) to allow the movement. The limiting part 4 may limit the movement of the shutter part 2 as it is supported by the upper frame 1A at the limiting position LP as shown in FIG. 7. The limiting part 4 may allow movement of the shutter part 2 as the support for the upper frame 1A is released from the allowable position AP, as shown in FIG. 8. The limiting part 4 may be disposed toward the upper direction (UD arrow direction) with respect to the upper plate 21. The limiting part 4 may move in a direction perpendicular to the vertical direction (Z-axis direction). For example, the limiting part 4 may move in the front-rear direction (X-axis direction).

6 to 11, the limiting part 4 may include a limiting member 41.

The limiting member 41 is moved between the limiting position LP and the allowable position AP. The limiting member 41 may be movably disposed on the upper plate 21 to move the upper surface 21a (shown in FIGS. 7 and 8) of the upper plate 21. The upper surface of the limiting member 41 may correspond to a surface facing the upper direction (UD arrow direction). The limiting member 41 may function as a main body of the limiting part 4.

The limiting member 41 may be supported on the upper frame 1A at the limiting position LP as shown in FIG. 7. Accordingly, the shutter members 22 may be restricted in the vertical direction (Z-axis direction) from the closed position CP. Therefore, the defoaming space 10 can be kept closed.

8, the support for the upper frame 1A may be released from the limiting member 41 at the allowable position AP. The limiting member 41 is spaced from the upper frame 1A based on the front-rear direction (X-axis direction), so that support for the upper frame 1A can be released. Accordingly, the shutter members 22 may move to the open position OP. Therefore, the defoaming space 10 can be opened.

8 and 11, the upper surface of the limiting member 41 may be located above the lower surface of the upper frame 1A in the allowable position AP. Accordingly, the degassing device 1 according to the present invention is based on the vertical direction (Z-axis direction) in the process of moving the limiting member 41 from the limiting position LP to the allowable position AP. It can be implemented to reduce the overall size. Therefore, the degassing device 1 according to the present invention can improve the ease of miniaturization. The upper surface of the limiting member 41 may correspond to the surface of the limiting member 41 facing the upper direction (in the direction of the UD arrow). The lower surface of the upper frame 1A may correspond to a surface of the upper frame 1A facing the lower direction (DD arrow direction).

6 to 8, the restriction part 4 may include a restriction surface 42.

The restriction surface 42 may be arranged to face the upper frame 1A at the restriction position LP. The restriction surface 42 may face the lower surface of the upper frame 1A at the restriction position LP. The restriction surface 42 may correspond to the same surface as the upper surface of the restriction member 41.

7 and 8, the restriction surface 42 may be formed parallel to the lower surface of the upper frame 1A. Accordingly, the defoaming device 1 according to the present invention, when compared with the comparative example in which the restriction surface 42 is formed to be inclined with the lower surface of the upper frame 1A, the internal pressure of the defoaming space 10 It can be implemented to withstand a more stable. The comparative example in which the limiting surface 42 is formed to be inclined with the lower surface of the upper frame 1A is because the limiting member 41 can move along the inclined surface at the limiting position LP. Therefore, the defoaming device 1 according to the present invention can improve the ease of the defoaming process. The restriction surface 42 may be formed to have a plane perpendicular to the vertical direction (Z-axis direction).

6 to 8, the limiting part 4 may include a first rotating member 43 and a second rotating member 44.

The first rotating member 43 is rotatably coupled to one side of the limiting member 41. The first rotating member 43 may rotate by contacting the shutter unit 2 as the limiting member 41 moves. Accordingly, the defoaming device 1 according to the present invention reduces the frictional force generated between the limiting member 41 and the shutter part 2, thereby causing wear of the limiting member 41 and the shutter part 2 Therefore, it is possible to reduce the possibility of damage or damage. Accordingly, the defoaming device 1 according to the present invention can increase mass productivity for the substrate on which the defoaming process is completed by increasing the operation rates of the limiting part 4 and the shutter part 2. In addition, the defoaming device 1 according to the present invention can reduce maintenance costs by increasing the use cycle of the limiting part 4 and the shutter part 2. The first rotating member 43 may rotate by contacting the upper surface 21a of the upper plate 21 as the limiting member 41 moves. One side of the limiting member 41 may be a part of the limiting member 41 facing the upper plate 21. The first rotating member 43 may be formed in a cylindrical shape as a whole.

A plurality of the first rotating member 43 may be coupled to one side of the limiting member 41. 6 to 11 show that the two first rotating members 43 are coupled to one side of the limiting member 41. In this case, the first rotating members 43 may be coupled to one side of the limiting member 41 so as to be arranged at the same height based on the vertical direction (Z-axis direction).

The second rotating member 44 is rotatably coupled to the other side of the limiting member 41. The second rotating member 44 may rotate by contacting the upper frame 1A as the limiting member 41 moves. Accordingly, the defoaming device 1 according to the present invention reduces the frictional force generated between the limiting member 41 and the upper frame 1A, thereby causing wear of the limiting member 41 and the upper frame 1A. Therefore, it is possible to reduce the possibility of damage or damage. Therefore, the defoaming device 1 according to the present invention can increase mass productivity for the substrate on which the defoaming process is completed by increasing the operation rate of the limiting part 4 and the upper frame 1A. In addition, the defoaming device 1 according to the present invention can reduce maintenance costs by increasing the use cycle of the limiting part 4 and the upper frame 1A. The second rotating member 44 may rotate as it contacts the lower surface of the upper frame 1A as the limiting member 41 moves. The other side of the limiting member 41 may be the other part of the limiting member 41 facing the upper frame 1A. The restriction surface 42 may be located on the other side of the restriction member 41. The second rotating member 44 may be formed in a cylindrical shape as a whole. The second rotating member 44 may be formed to have the same size as the first rotating member 43.

A plurality of the second rotating member 44 may be coupled to the other side of the limiting member 41. 6 to 11 show that the two second rotating members 44 are coupled to the other side of the limiting member 41. In this case, the second rotating members 44 may be coupled to the other side of the limiting member 41 so as to be disposed at the same height as each other based on the vertical direction (Z-axis direction).

As described above, since the rotating members 43 and 44 are coupled to different parts of the limiting member 41, the degassing device 1 according to the present invention is configured to move with respect to the limiting member 41. In addition to being able to increase ease, it is possible to reduce the possibility of damage or damage due to wear of the upper frame 1A, the upper plate 21, and the limiting part 4.

The limiting part 4 may include a plurality of limiting members 41 as shown in FIGS. 1 to 3. In this case, the limiting members 41 are arranged to be spaced apart from each other, and may be supported at different parts of the upper frame 1A at the limiting position LP. Accordingly, the defoaming device 1 according to the present invention can improve the bracing force to withstand the internal pressure of the defoaming space 10. The limiting members 41 may be arranged to be spaced apart from each other along a direction in which the lower surface of the upper frame 1A is formed. For example, the limiting members 41 may be arranged to be spaced apart from each other along the left and right directions (Y-axis direction). Each of the limiting members 41 may include rotating members 43 and 44.

The limiting members 41 may be arranged in a plurality of rows. Here, the column may correspond to a direction parallel to the left-right direction (Y-axis direction). The limiting members 41 arranged in a plurality of rows may be supported on different parts of the upper frame 1A. The plurality of rows may be arranged to be spaced apart from each other based on the front-rear direction (X-axis direction).

1 to 11, the moving part 5 moves the limiting part 4 in the direction perpendicular to the vertical direction (Z-axis direction), the limiting position LP and the allowable position AP. It is to move the liver. For example, the moving part 5 may move the limiting part 4 in the front-rear direction (X-axis direction). The moving part 5 may move the limiting part 4 toward the upper frame 1A in the closed position CP, thereby placing the limiting part 4 in the limiting position LP. Accordingly, since the movement of the shutter unit 2 in the closed position CP is limited, the defoaming space 10 may be sealed. The moving part 5 may also place the limiting part 4 in the allowable position AP by separating the limiting part 4 from the upper frame 1A. Accordingly, since the shutter unit 2 is allowed to move from the closed position CP to the open position OP, the defoaming space 10 may be opened. The moving part 5 may be coupled to the limiting part 4. The moving part 5 may be coupled to each of the limiting part 4 and the upper plate 21.

The moving part 5 may move the limiting part 4 in a method using a hydraulic cylinder or a pneumatic cylinder, or a method using an electric motor. The moving part 5 is a ball screw method using a ball screw (Ball Screw) and a ball nut (Ball Nut), a rack gear (Rack Gear) and a pinion gear (Pinion Gear) using a rack pinion method, pulley (Pulley) ) And a belt method using a belt, a linear motor method using a coil and a permanent magnet, and a cam method using a cam or the like to move the restriction part 4.

4 and 17, the degassing device 1 according to the present invention may include a sealing part 6.

The sealing part 6 is for sealing the defoaming space 10. The sealing part 6 may seal the defoaming space 10 at the sealing position CP. Therefore, the defoaming device 1 according to the present invention improves the completeness of the defoaming process by improving the sealing force for the defoaming space 10 when the shutter part 2 is located in the closed position CP. Can be increased. The sealing part 6 may be coupled to the upper surface of the shutter member 22 to cover the side of the defoaming space 10. The sealing part 6 may be formed of a stretchable material. For example, the sealing portion 6 may be formed of rubber or the like. The sealing part 6 may be implemented as an O-ring.

1 to 3 and FIGS. 12 to 16, the defoaming device 1 according to the present invention may include a link portion 7 and an insertion portion 8.

The link part 7 guides the shutter part 2 so that the shutter part 2 moves between the open position OP and the closed position CP. The link portion 7 may be coupled to the shutter portion 2.

In the insertion portion 8, the link portion 7 is inserted. The insertion portion 8 may be formed in the shutter portion 2. The defoaming device 1 according to the present invention is implemented such that the link portion 7 is inserted into the insertion portion 8 to guide the movement of the shutter portion 2. Accordingly, in the defoaming device 1 according to the present invention, even if vibration or shaking occurs in the process of performing the defoaming process, the shutter part 2 is stably positioned in the open position OP and the closed position CP ). Therefore, the defoaming device 1 according to the present invention can improve stability for a moving operation of moving the shutter unit 2.

12 to 16, the link portion 7 may include a first link member 71 and a second link member 72.

The first link member 71 guides the shutter members 22 to move in the vertical direction (Z-axis direction). The first link member 71 is disposed between the shutter members 22 to connect the shutter members 22. When the shutter unit 2 includes two shutter members 22a and 22b, the first link member 71 may be disposed between the upper shutter member 22b and the lower shutter member 22a. have. The first link member 71 is coupled to each of the upper shutter member 22b and the lower shutter member 22a to connect the upper shutter member 22b and the lower shutter member 22a to each other. A plurality of first link members 71 may be disposed between the upper shutter member 22b and the lower shutter member 22a. In this case, the first link members 71 may be disposed at positions spaced apart from each other. The first link member 71 may be formed in a cylindrical shape as a whole.

The second link member 72 guides the upper shutter member 22b to move in the vertical direction (Z-axis direction). The second link member 72 may be disposed between the upper plate 21 and the upper shutter member 22b. The second link member 72 is coupled to each of the upper plate 21 and the upper shutter member 22b to connect the upper plate 21 and the upper shutter member 22b to each other. The second link member 72 may be coupled to each of the upper link plate 211 and the upper shutter member 22b to connect the upper plate 21 and the upper shutter member 22b to each other. A plurality of second link members 72 may be disposed between the upper plate 21 and the upper shutter member 22b. In this case, the second link members 72 may be disposed at positions spaced apart from each other. The second link member 72 may be formed in a cylindrical shape as a whole.

The second link member 72 and the first link member 71 may be formed to have the same length based on the vertical direction (Z-axis direction). Accordingly, the degassing device 1 according to the present invention may be implemented such that the first interval L1 and the second interval L2 have the same size in the open position OP. The second link member 72 and the first link member 71 may have different lengths based on the vertical direction (Z-axis direction).

Referring to FIG. 13, the insertion part 8 may include a first link insertion hole 81 and a second link insertion hole 82.

The first link insertion hole 81 is formed to penetrate the shutter member 22 based on the vertical direction (Z-axis direction) so that the first link member 71 is inserted. The first link insertion hole 81 may be formed in each of the upper shutter member 22b and the lower shutter member 22a. The first link insertion hole 81 may be formed to have a shape and size corresponding to the first link member 71 so that the first link member 71 can be inserted. When the link portion 7 includes a plurality of first link members 71, the insertion portion 8 may include a plurality of first link insertion holes 81.

The second link insertion hole 82 is formed to penetrate each of the upper plate 21 and the upper shutter member 22b, so that the second link member 72 is inserted. The second link insertion hole 82 may be formed in the upper link plate 211. The second link insertion hole 82 may be formed at a position spaced apart from the first link insertion hole 81 and the front-rear direction (X-axis direction). The second link insertion hole 82 may be formed to have a shape and size corresponding to the second link member 72 so that the second link member 72 can be inserted. When the link portion 7 includes a plurality of second link members 72, the insertion portion 8 may include a plurality of second link insertion holes 82.

The defoaming device 1 according to the present invention may be implemented such that the first interval L1 and the second interval L2 are limited to a certain size or less at the open position OP. To this end, the link portion 7 and the insertion portion 8 may include the following configuration.

12 to 15, the link portion 7 may include a first support member 73 and a second support member 74.

The first support member 73 protrudes from the first link member 71. The first support member 73 may be coupled to the first link member 71. The first support member 73 may be coupled to one side and the other side of the first link member 71, respectively. The first support member 73 may be formed integrally with the first link member 71. The first support member 73 may be formed in a circular ring shape as a whole.

The second support member 74 protrudes from the second link member 72. The second support member 74 may be coupled to the second link member 72. The second support member 74 may be coupled to one side and the other side of the second link member 72, respectively. The second support member 74 may be integrally formed with the second link member 72. The second support member 74 may be formed in a circular ring shape as a whole. The second support member 74 may be formed to have the same size as the first support member 73.

Referring to FIG. 13, the insertion part 8 may include a first link support groove 83 and a first link support surface 84.

The first link support groove 83 is one in which the first support member 73 is inserted. The first link support groove 83 may be inserted into one side and the other side of the first support member 73, respectively. Each of the one side and the other side of the first supporting member 73 may be a part of the first supporting member 73 facing the upper direction (UD arrow direction) and the lower direction (DD arrow direction). The first link support groove 83 may communicate with the first link insertion hole 81. The first link support groove 83 is formed through a process of processing a predetermined depth groove from the upper surface of the upper shutter member 22b, and a process of processing a predetermined depth groove from the lower surface of the lower shutter member 22a. Can be formed through.

The first link support surface 84 is disposed to face the first link support groove 83. The first support member 73, as shown in Figure 15, the first link L so that the first gap (L1) between the shutter member (22a, 22b) is limited in the open position (OP) (84). The first link support surface 84 may support one side and the other side of the first support member 73, respectively. The first link support surface 84 may be formed in a direction perpendicular to the vertical direction (Z-axis direction).

Referring to FIG. 13, a second link support groove 85 and a second link support surface 86 may be included.

The second link support groove 85 is one in which the second support member 74 is inserted. The second link supporting groove 85 may be inserted into one side and the other side of the second supporting member 74, respectively. Each of the one side and the other side of the second supporting member 74 may be a part of the second supporting member 74 facing the upper direction (UD arrow direction) and the lower direction (DD arrow direction). The second link support groove 85 may be in communication with the second link insertion hole 82. The second link support groove 85 is formed through a process of processing a predetermined depth groove from the upper surface 21a of the upper plate 21 and also processes a predetermined depth groove from the lower surface of the upper shutter member 22b. It can be formed through work.

The second link support surface 86 is disposed to face the second link support groove 85. The second support member 74, as shown in Figure 15, the second gap (L2) between the upper plate 21 and the upper shutter member (22b) is limited so that it is limited in the open position (OP) It can be supported on the second link support (86). The second link support surface 86 may support one side and the other side of the second support member 74, respectively. The second link support surface 86 may be formed in a direction perpendicular to the vertical direction (Z-axis direction).

Referring back to FIGS. 1 to 3, the defoaming device 1 according to an embodiment of the present invention may be implemented such that the shutter part 2 further includes a lower plate 24.

The lower plate 24 is disposed between the shutter members 22 and the lower frame 1B. The lower plate 24 may be coupled to each of the lower shutter member 22a and the lower frame 1B in the closed position CP. The lower plate 24 may be spaced apart from the lower shutter member 22a in the open position OP. The lower link plate 1B0 described above may be coupled to the lower plate 24. In this case, the lower link plate 1B0 may protrude from the lower plate 24. The lower link plate 1B0 may be formed integrally with the lower plate 24.

In the above, the connection structure between the upper plate 21 and the upper shutter member 22b and between the shutter members 22a and 22b has been described, but hereinafter, the lower shutter member 22a and the lower plate are described. The connection structure between (24) or between the lower shutter member (22a) and the lower frame (1B) will be sequentially described.

First, an embodiment in which the shutter portion 2 includes the lower plate 24 will be described. 16 is a front cross-sectional view schematically showing a connection structure between the lower shutter member 22a and the lower plate 24 in the embodiment in which the shutter portion 2 includes the lower plate 24.

In this embodiment, the link portion 7 may include a lower link member 75 for guiding the lower shutter member 22a to move in the vertical direction (Z-axis direction). The lower link member 75 may be coupled to each of the lower shutter member 22a and the lower plate 24. The lower link member 75 may be coupled to the lower shutter member 22a and the lower link plate 1B0 coupled to the lower plate 24, respectively. The lower link member 75 may be substantially implemented in the same manner as the first link member 71.

In this embodiment, the insertion portion 8 may include a lower link hole (not shown) for the lower link member 75 to be inserted. The lower link hole may be formed in each of the lower shutter member 22a and the lower plate 24. The lower link hole may be formed in each of the lower link plate 1B0 coupled to the lower shutter member 22a and the lower plate 24. The lower link hole may be formed at a position spaced apart from the first link insertion hole 81 based on the front-rear direction (X-axis direction). The lower link hole may be substantially the same as the first link insertion hole 81.

In this embodiment, in order to limit the distance between the lower shutter member 22a and the lower plate 24, the link portion 7 and the insertion portion 8 may each include the following configuration. The link portion 7 may include a lower support member (not shown) protruding from the lower link member 75. The lower support member may be implemented in substantially the same manner as the first support member 73. The insertion portion 8 may include a lower link support groove (not shown) and a lower link support surface (not shown). The lower link supporting groove is one in which the lower supporting member is inserted. The lower link support groove may be formed through a process of processing a groove from the upper surface of the lower shutter member 22a and may also be formed through a process of processing a groove from the lower surface of the lower plate 24. The lower link support groove is formed through a process of processing a groove from the upper surface of the lower shutter member 22a, and a process of processing a groove from the lower surface of the lower link plate 1B0 coupled to the lower plate 24 It may be formed through. The lower link support groove may be substantially the same as the first link support groove 83. The lower link supporting surface is arranged to face the lower link supporting groove. The lower support member may be supported on the lower link support surface so that the distance between the lower shutter member 22a and the lower plate 24 is limited. The lower link support surface may be substantially the same as the first link support surface 84.

Next, an embodiment in which the shutter portion 2 does not include the lower plate 24 will be described. In this embodiment, the above-described shutter portion (except for the arrangement position of the lower link member 75, the location where the lower link hole is formed, the location where the lower link support groove is formed, and the location where the lower link support surface is formed) 2) may be implemented substantially the same as the embodiment including the lower plate (24). Differences are mainly described below.

In this embodiment, the lower link member 75 may be coupled to each of the lower shutter member 22a and the lower frame 1B. The lower link member 75 may be coupled to each of the lower link plate 1B0 coupled to the lower shutter member 22a and the lower frame 1B. The lower link hole may be formed in each of the lower shutter member 22a and the lower frame 1B. The lower link hole may be formed in each of the lower link plate 1B0 coupled to the lower shutter member 22a and the lower frame 1B.

The lower link supporting groove may be formed through a process of processing a groove from the upper surface of the lower shutter member 22a, and may also be formed through a process of processing a groove from the lower surface of the lower frame 1B. The lower link supporting groove is formed through a process of processing a groove from the upper surface of the lower shutter member 22a, and a process of processing a groove from the lower surface of the lower link plate 1B0 coupled to the lower frame 1B. It may be formed through. The lower link supporting surface is arranged to face the lower link supporting groove. The lower support member may be supported on the lower link support surface so that the distance between the lower shutter member 22a and the lower frame 1B is limited.

In the above, it has been described on the basis that the shutter part 2 moves in the vertical direction (Z-axis direction), but in the defoaming device 1 according to the present invention, the shutter part 2 has the front-rear direction X Axial direction). To this end, each of the shutter members 22a and 22b may include the following configuration.

Referring to FIGS. 17 to 21, each of the shutter members 22 may include a shutter body 221, a shutter moving member 222, and a guide member 223.

The shutter body 221 is connected to the link portion (7). The shutter body 221 may be connected to the link portion 7 so as to be movable in the vertical direction (Z-axis direction). The shutter body 221 of the upper shutter member 22b may be connected to the upper plate 21 by the second link member 72. The shutter body 221 may be disposed to be positioned outside each of the shutter moving member 222 and the guide member 223.

The insertion unit 8 described above may be formed on the shutter body 221. Hereinafter, the insertion portion 8 formed in the shutter body 221 will be sequentially described. The first link insertion hole 81 may be formed to penetrate through the shutter body 221 of the lower shutter member 22a and the shutter body 221 of the upper shutter member 22b. The second link insertion hole 82 may be formed to penetrate each of the shutter body 221 and the upper plate 21 of the upper shutter member 22b. The first link support groove 83 is formed through a process of processing a groove at a predetermined depth from an upper surface of the shutter body 221 of the upper shutter member 22b, and a shutter body of the lower shutter member 22a. It may be formed through the operation of processing a predetermined depth groove from the lower surface of 221. In this case, the first link supporting surface 84 is disposed to face the first link supporting groove 83 formed in the shutter body 221 of the upper shutter member 22b, and the lower shutter member 22a. It may be disposed to face the first link support groove 83 formed in the shutter body 221 has. The second link support groove 85 is formed through a process of processing a groove at a predetermined depth from the lower surface of the shutter body 221 of the upper shutter member 22b, and a predetermined depth from the upper surface of the upper plate 21 It can be formed through the operation of processing the groove. In this case, the second link support surface 86 is disposed to face the second link support groove 85 formed in the shutter body 221 of the upper shutter member 22b, as well as the upper plate 21 It may be arranged to face the formed second link support groove (85).

The shutter moving member 222 is disposed to be movable in the front-rear direction (X-axis direction). The shutter moving member 222 may be disposed inside the shutter body 221 to be movable in the front-rear direction (X-axis direction). A substrate 200 to which the film is attached may be mounted on the shutter moving member 222 as shown in FIG. 17. The shutter moving member 222 may move in each of the forward direction (FD arrow direction) and the reverse direction (BD arrow direction). The forward direction (FD arrow direction) may be a direction of moving the shutter moving member 222 to be spaced apart from the upper plate 21 based on the front-rear direction (X-axis direction). The backward direction (BD arrow direction) may be a direction of moving the shutter moving member 222 so as to overlap with the upper plate 21 based on the front-rear direction (X-axis direction). As the shutter moving member 222 moves in the forward direction (FD arrow direction) as shown in FIG. 17, maintenance work is performed on the shutter member 22 or the shutter moving member 222 A substrate loading or unloading operation may be performed. The defoaming process may be performed as the shutter moving member 222 moves in the reverse direction (BD arrow direction) as illustrated in FIGS. 1 to 3. The shutter moving member 222 may be formed in the form of a square plate as a whole, but this is exemplary, and may be formed in another shape as long as it can be disposed to be movable in the front-rear direction (X-axis direction). The sealing portion 6 may be coupled to the upper surface of the shutter moving member 222.

The guide member 223 guides the shutter moving member 222 to move in the front-rear direction (X-axis direction). The guide member 223 may move together as the shutter moving member 222 moves in the front-rear direction (X-axis direction). The guide member 223 may be disposed between the shutter moving member 222 and the shutter body 221. The guide member 223 may be movably coupled to each of the shutter moving member 222 and the shutter body 221. The guide member 223 may be disposed on both sides of the shutter moving member 222 one by one. Although not shown, the guide member 223 may be accommodated in an accommodation portion formed between the shutter moving member 222 and the shutter body 221. The accommodating portion may be implemented as a groove for accommodating the guide member 223, and thus may be formed in a shape corresponding to the guide member 223.

Referring to FIGS. 18 and 19, the guide member 223 may include a first guide body 2231 and a first guide roller 2232.

The first guide body 2231 is disposed between the shutter body 221 and the shutter moving member 222. The first guide body 2231 may function as a main body of the guide member 223. The first guide body 2231 may move together as the shutter moving member 222 moves in the front-rear direction (X-axis direction). The first guide body 2231 may be formed in a quadrangular column shape extending along the front-rear direction (X-axis direction) as a whole.

The first guide roller 2232 is rotatably coupled to the first guide body 2231. The first guide roller 2232 may rotate as the shutter moving member 222 moves in the front-rear direction (X-axis direction). The first guide roller 2232 may be coupled to one surface and the other surface of the first guide body 2231, respectively. One surface of the first guide body 2231 may be a surface of the first guide body 2221 facing the shutter body 221. The other surface of the first guide body 2231 may be a surface of the first guide body 2231 facing the shutter moving member 222. A plurality of first guide rollers 2232 may be coupled to the first guide body 2231. In this case, the first guide rollers 2232 may be coupled to one surface and the other surface of the first guide body 2231 so as to be spaced apart from each other along the front-rear direction (X-axis direction).

18 and 19, the guide member 223 may include a second guide body 2233 and a second guide roller 2234.

The second guide body 2233 is coupled to the first guide body 2231. The second guide body 2233 may be coupled from the upper side of the first guide body 2231. The second guide body 2233 may be coupled to the lower side of the first guide body 2231. The second guide body 2233 may move together as the shutter moving member 222 moves in the front-rear direction (X-axis direction). The second guide body 2233 may be formed in a quadrangular column shape extending along the front-rear direction (X-axis direction) as a whole. The second guide body 2233 may be integrally formed with the first guide body 2231.

The second guide roller 2234 is rotatably coupled to the second guide body 2233. The second guide roller 2234 may rotate as the shutter moving member 222 moves in the front-rear direction (X-axis direction). The rotation axis in which the second guide roller 2234 rotates may be formed in a different direction from the rotation axis in which the first guide roller 2232 rotates. For example, when the first guide roller 2232 rotates around a rotation axis formed in a direction parallel to the left-right direction (Y-axis direction), the second guide roller 2234 is the vertical direction (Z-axis direction) It can rotate about the axis of rotation formed in a direction parallel to the. The left-right direction (Y-axis direction) may correspond to a direction perpendicular to each of the front-back direction (X-axis direction) and the vertical direction (Z-axis direction).

The second guide roller 2234 may be coupled to one side and the other side of the second guide body 2233 respectively. One side of the second guide body 2233 may be a part of the second guide body 2233 facing the shutter body 221. The other side of the second guide body 2233 may be a part of the second guide body 2233 facing the shutter moving member 222. A plurality of second guide rollers 2234 may be coupled to the second guide body 2233. In this case, the second guide rollers 2234 may be coupled to each of one side and the other side of the second guide body 2233 so as to be spaced apart from each other along the front-rear direction (X-axis direction).

19 and 20, each of the shutter members 22 may include a shutter guide groove 224 and a shutter guide surface 225.

The shutter guide groove 224 accommodates the first guide roller 2232. The shutter guide groove 224 is formed in each of the shutter body 221 and the shutter moving member 222. The shutter guide groove 224 formed in the shutter body 221 may accommodate a first guide roller 2232 rotatably coupled to one surface of the first guide body 2231. The shutter guide groove 224 formed in the shutter moving member 222 may accommodate the first guide roller 2232 rotatably coupled to the other surface of the first guide body 2231. The shutter guide groove 224 may be formed to have the same size as the first guide roller 2232 based on the vertical direction (Z-axis direction). The shutter guide grooves 224 may be formed one by one on both sides around the shutter moving member 222.

The shutter guide surface 225 is disposed toward the shutter guide groove 224 so that the first guide roller 2232 contacts and rotates. The shutter guide surface 225 may be formed to extend along the front-rear direction (X-axis direction). In this case, the first guide roller 2232 may guide the shutter moving member 222 such that the shutter moving member 222 moves linearly along the front-rear direction (X-axis direction). The first guide roller 2232 may rotate while being supported by the shutter guide surface 225. The shutter guide surface 225 may be formed parallel to the left-right direction (Y-axis direction). As the shutter guide surface 225 supports the first guide roller 2232, the shutter moving member 222 may be supported by the shutter body 221.

19 and 20, each of the shutter members may include a shutter support groove 226 and a shutter support surface 227.

The shutter support groove 226 accommodates the second guide roller 2234. The shutter support groove 226 is formed in each of the shutter body 221 and the shutter moving member 222. The shutter support groove 226 may be formed through a process of processing a predetermined depth groove from each of the upper surface of the shutter body 221 and the upper surface of the shutter moving member 222. The shutter support groove 226 formed in the shutter body 221 may accommodate a second guide roller 2234 rotatably coupled to one side of the second guide body 2233. The shutter support groove 226 formed in the shutter moving member 222 may accommodate a second guide roller 2234 rotatably coupled to the other side of the second guide body 2233. The shutter support groove 226 may be formed to have the same size as the second guide roller 2234 based on the left-right direction (Y-axis direction). The shutter support grooves 226 may be formed one by one on both sides around the shutter moving member 222.

The shutter support surface 227 is disposed to face the shutter support groove 226 so that the second guide roller 2234 contacts and rotates. In this case, the second guide roller 2234 may rotate while being supported by the shutter support surface 227. Accordingly, the defoaming device 1 according to the present invention may rotate the left and right directions (Y-axis direction) even if vibration or shaking occurs in the process of moving the shutter moving member 222 in the front-rear direction (X-axis direction). As a reference, the movement of the shutter moving member 222 may be restricted. Therefore, the defoaming device 1 according to the present invention can improve the ease of the operation of moving the shutter moving member 222 based on the front-rear direction (X-axis direction). The shutter support surface 227 may be formed to extend along the front-rear direction (X-axis direction). The shutter support surface 227 may be formed parallel to the vertical direction (Z-axis direction).

In FIG. 19, the guide member 223 is formed to have a larger size than the shutter member 22 based on the vertical direction (Z-axis direction), so that it protrudes from the shutter member 22. As an example, the guide member 223 may be formed to have the same size as the shutter member 22 or a smaller size than the shutter member 22 based on the vertical direction (Z-axis direction). Accordingly, the guide member 223 may be implemented to be formed smaller than the thickness of each of the shutter body 221 and the shutter moving member 222.

Although not illustrated, each of the shutter members 22 may include a grooved portion.

The groove portion is formed in the shutter moving member 222. The groove portion may be formed by processing a groove at a predetermined depth from a lower surface of the shutter moving member 222. The defoaming device 1 according to the present invention may be implemented to reduce the weight of the shutter moving member 222 by including the groove digging portion. Accordingly, the defoaming device 1 according to the present invention can achieve weight reduction for the shutter members 22.

Referring to FIG. 21, each of the shutter members 22 may include a clamping mechanism 23.

The clamping mechanism 23 is intended to limit movement of the shutter moving member 222 in the front-rear direction (X-axis direction). The clamping mechanism 23 may be coupled to the shutter body 221.

The clamping mechanism 23 may include a coupling member 231 and a movement limiting member 232.

The coupling member 231 is coupled to the shutter body 221. The coupling member 231 may protrude from the shutter body 221 toward the forward direction (FD arrow direction). The coupling member 231 may be integrally formed with the shutter body 221.

The movement limiting member 232 is coupled to the coupling member 231. The movement limiting member 232 may support the front surface of the shutter movement member 222 so that movement of the shutter movement member 222 is restricted. The movement limiting member 232 may be coupled to the coupling member 231 and supported by the shutter body 221.

The clamping mechanism 23 may include an operation member 233.

The operation member 233 is for receiving the operation force of the movement limiting member 232. The operation member 233 may be coupled to each of the coupling member 231 and the movement limiting member 232. The manipulation member 233 may be provided with an operation force such that the movement limiting member 232 supports the front surface of the shutter movement member 222 or the support for the front surface of the shutter movement member 222 is released. The operation member 233 may be coupled to the coupling member 231 to protrude outside the shutter body 221. The operation member 233 may be connected to an operation driving unit (not shown). The operation driving unit is to provide an operation force so that the operation member 233 is driven.

The present invention described above is not limited to the above-described embodiments and the accompanying drawings, and it is common in the technical field to which the present invention pertains that various substitutions, modifications and changes are possible without departing from the technical spirit of the present invention. It will be clear to those who have the knowledge of

1: Defoaming device 2: Shutter part
21: upper plate 22: shutter member
221: shutter body 222: shutter moving member
223: guide member 2231: first guide body
2232: 1st guide roller 2233: 2nd guide body
2234: Second guide roller 224: Shutter guide groove
225: shutter guide surface 226: shutter support groove
227: shutter support 23: clamping mechanism
24: lower plate 3: elevation
4: Restriction section 41: Restriction member
42: restriction surface 43: first rotating member
44: second rotating member 5: moving part
6: sealing portion 7: link portion
71: first link member 72: second link member
73: first support member 74: second support member
8: Insertion section 81: First link insertion hole
82: second link insertion hole 83: first link support groove
84: first link support 85: second link support groove
86: second link support

Claims (14)

A shutter unit providing a defoaming space for degassing the substrate to which the film is attached;
A lower frame disposed below the shutter portion and supporting the shutter portion;
An upper frame disposed above the shutter portion and supporting the shutter portion;
An elevation unit for moving the shutter unit up and down so that the shutter unit moves between a closed position in which the defoaming space is closed and an open position in which the defoaming space is opened;
A limiting part moving between a limiting position limiting movement of the shutter part in the closed position as it is supported by the upper frame and an allowable position allowing movement of the shutter part as support for the upper frame is released; And
It is coupled to the restriction portion, and includes a moving portion for moving the restriction portion between the restriction position and the allowable position in a direction perpendicular to the vertical direction,
The defoaming device, characterized in that the upper surface of the restriction portion is located above the lower surface of the upper frame in the allowable position. According to claim 1,
The limiting part includes a limiting member movably disposed on an upper surface of the upper plate of the shutter part, and a first rotating member rotatably coupled to one side of the limiting member,
The first rotating member is a degassing device, characterized in that rotating as it contacts the upper surface of the upper plate as the limiting member moves. According to claim 2,
The restriction portion further includes a second rotation member rotatably coupled to the other side of the restriction member,
The second rotating member is a degassing device, characterized in that rotating as the limiting member moves in contact with the upper frame. According to claim 1,
The restriction portion includes a restriction member movably disposed on an upper surface of the upper plate of the shutter portion, and a restriction surface facing the lower surface of the upper frame in the restriction position,
The limiting surface is a degassing device, characterized in that formed in parallel with the lower surface of the upper frame. According to claim 1,
The restriction portion is disposed to be spaced apart from each other, and includes a plurality of restriction members supported on the upper frame at the restriction position,
The defoaming device, characterized in that the limiting members are supported on different parts of the upper frame in the limiting position. delete According to claim 1,
Further comprising a link portion for guiding the shutter portion so that the shutter portion moves between the open position and the closed position,
The shutter portion includes a plurality of shutter members spaced apart from each other to form a plurality of defoaming spaces, and an upper plate disposed above the shutter members,
The link portion connects the upper shutter members disposed adjacent to the upper plate among the upper plate and the shutter members, and also connects the plurality of shutter members to each other,
The lifting unit moves the upper plate in the downward direction to position the shutter in the closed position, and also moves the upper plate in the upward direction to place the shutter in the open position. According to claim 1,
Further comprising a link portion for guiding the shutter portion so that the shutter portion moves between the open position and the closed position,
The shutter portion includes a plurality of shutter members spaced apart from each other to form a plurality of defoaming spaces,
Each of the shutter members is a shutter body connected to the link unit, a shutter moving member disposed to be movable in a front-rear direction perpendicular to the vertical direction, and a shutter moving member disposed between the shutter body and the shutter moving member Defoaming device comprising a guide member for guiding the movement in the front-rear direction. The method of claim 8,
The guide member includes a first guide body disposed between the shutter body and the shutter moving member, and a first guide roller rotatably coupled to the first guide body,
Each of the shutter members is a shutter guide groove formed on the shutter body and the shutter moving member to accommodate the first guide roller, and a shutter guide disposed toward the shutter guide groove so that the first guide roller contacts and rotates. Contains cotton,
The shutter guide surface is formed to extend along the front-rear direction,
The first guide roller is a defoaming device, characterized in that to guide the shutter moving member so that the shutter moving member moves linearly along the front-rear direction. The method of claim 8,
The guide member is a first guide body disposed between the shutter body and the shutter moving member, a second guide body coupled to the first guide body, and a second guide roller rotatably coupled to the second guide body Including,
Each of the shutter members is formed on the shutter body and the shutter moving member, a shutter support groove for receiving the second guide roller, and a shutter support disposed toward the shutter support groove so that the second guide roller contacts and rotates. Contains cotton,
The second guide roller rotates in a state supported by the shutter support surface to limit the movement of the shutter moving member based on the left and right directions perpendicular to each of the up and down directions and the front and rear directions. . The method of claim 8,
The shutter portion further includes a clamping mechanism for limiting the movement of the shutter moving member,
The clamping mechanism is depackaged, characterized in that it comprises a coupling member coupled to the shutter body, and a movement limiting member coupled to the coupling member and supporting a front surface of the shutter moving member so that movement of the shutter moving member is limited. Chi. According to claim 1,
A link portion for guiding the shutter portion so that the shutter portion moves between the open position and the closed position; And
It is formed on the shutter portion and includes an insertion portion for inserting the link portion,
The defoaming device, characterized in that the link portion is inserted into the insertion portion to guide the movement of the shutter portion. The method of claim 12,
The shutter portion includes a plurality of shutter members spaced apart from each other to form a plurality of defoaming spaces, and an upper plate disposed above the shutter members,
The link portion is disposed between the shutter members, and a first link member that guides the shutter members to move in the vertical direction, and an upper shutter member disposed on the top of the shutter members and the upper plate. It comprises a second link member to guide the upper plate to move in the vertical direction,
The insertion portion is formed to penetrate each of the shutter members so that the first link member is inserted into the first link insertion hole, and the upper shutter member and the upper plate are formed to pass through each of the second link member. Defoaming device comprising a second link insertion hole. The method of claim 13,
The link portion further includes a first support member protruding from the first link member, and a second support member protruding from the second link member,
The insertion unit is a first link support groove communicating with the first link insertion hole, the first link support groove being inserted into one side and the other side of the first support member, and the first link support groove disposed toward the first link support groove, the first It includes a second link support groove which is in communication with the 2 link insertion hole and into which the one side and the other side of the second support member are respectively inserted, and a second link support surface disposed to face the second link support groove,
The first support member is supported on the first link support so that the distance between the shutter members is limited in the open position,
The second support member is a defoaming device, characterized in that supported on the second link support surface so that the gap between the upper plate and the upper shutter member is limited in the open position.

Images