KR102079778B1 - Sputtering Jig - Google Patents

Abstract

The present invention relates to a sputtering jig, and more particularly to a sputtering jig having a structure that can reduce the area of the jig and increase the self bias voltage when the bias is applied.

Description

Sputtering Jig

The present invention relates to a sputtering jig, and more particularly to a sputtering jig having a structure that can reduce the area of the jig and increase the self bias voltage when the bias is applied.

Generally, in the sputter apparatus used, it is comprised so that sputter | spatter electric power may be applied to each of the board | substrate side and target which were arrange | positioned facing in the vacuum container, and generate a plasma between a board | substrate and a target, A thin film can be formed while sputtering a target film-forming material with ions.

In the bias sputtering apparatus, various countermeasures have been taken to improve the quality and yield of thin film devices such as optical devices and semiconductor devices. For example, as an attempt to reduce manufacturing cost, by providing an anti-stick plate, the time (chamber maintenance time) required for removal of the thin film material accumulated in the vacuum container is shortened, and the facility operation rate is improved. In addition, a method of forming a film while rotating and revolving a substrate holder, ie, a jig, has also been attempted.

Conventional substrate holders, i.e., spheroid sputtering apparatuses which are formed while rotating and revolving sputtering jigs not only have a very complicated structure as shown in FIGS. Too little was applied, making it difficult to improve adhesion and ion bombardment effects. In addition, when a heavy mold is placed on the jig, not only the pulling phenomenon occurs but there is no means for fixing, and there is also a difficult problem in controlling the distance from the target. In other words, there is a difficulty in applying a product or a sample to be coated to a specific shape and size. In a jig having a conventional structure, a relatively small object having a similar shape and a similar size was mainly used.

Therefore, a need exists for the development of a sputtering jig having a new structure in which this problem is solved.

As a result of research efforts to solve the above problems, the present inventors completed the present invention by developing a structure in which the area of the sputtering jig is reduced.

Accordingly, an object of the present invention is to provide a sputtering jig having a structure capable of maximizing a self bias voltage applied to a jig and a specimen when an RF bias is applied.

It is another object of the present invention to provide a sputtering jig having a structure that can stably mount a large mold.

Still another object of the present invention is to provide a sputtering jig having a structure capable of adjusting a distance to a target.

The object of the present invention is not limited to the above-mentioned objects, and other objects that are not mentioned will be clearly understood by those skilled in the art from the following description.

In order to achieve the object of the present invention described above, one end of the present invention is fixed on the first plane perpendicular to the central axis of rotation and extends a certain length from the one end to form the other end, the middle and the other end of the one end Provides a sputtering jig comprising a; support portion having a structure in which a second plane in which a straight line connecting the midpoint is located is parallel to the central axis of rotation or the first plane or positioned between the center axis of rotation and the first plane.

In a preferred embodiment, the support is any one of a straight band, an L-shaped band, a straight band bent at an acute angle or an obtuse angle or a cylindrical shape having an upper surface opened.

In a preferred embodiment, two or more of the supports are included.

In a preferred embodiment, it further comprises one or more of the specimen mounting portion formed on the other end of the support portion and the expansion mounting portion attached to the specimen mounting portion.

In a preferred embodiment, when the overall shape of the support is a straight band and the second plane is parallel to the central axis of rotation, the specimen mounting portion is formed parallel to the second plane toward the other end of the support.

In a preferred embodiment, when the overall shape of the support is a straight band and the second plane is parallel to the first plane, the specimen mounting portion is formed perpendicular to the second plane toward the other end of the support.

In a preferred embodiment, the specimen mounting portion is a flat plate structure parallel to the central axis.

In a preferred embodiment, when the entire support portion is an L-shaped band, the support portion is a horizontal member having one end fixed to the center axis of rotation and located on the first plane to extend a predetermined length from the center axis of rotation; And a vertical member extending vertically from the other end of the horizontal member vertically, and the specimen mounting portion is formed in a direction parallel to the vertical member.

In a preferred embodiment, the specimen mounting portion is formed in a flat structure formed integrally with the upper end of the vertical member or a pocket structure having an upper surface fixedly coupled to the rear side of the upper end of the vertical member.

In a preferred embodiment, further comprising at least one auxiliary support formed between the horizontal member and the vertical member perpendicular to the second plane.

In a preferred embodiment, the distance (L) between the center axis of rotation and the vertical member is equal to the length of the distance (R) between the target and the center axis of rotation minus the distance (S) between the target and the back surface of the specimen mounting portion.

In a preferred embodiment, L is the same as or different from the length of the horizontal member.

In a preferred embodiment, when L is different from the length of the horizontal member, the length adjustment fixture is further formed toward one end of the horizontal member.

In a preferred embodiment, the expansion mounting portion includes any one or more of an adapter, a flat plate, a block specimen jig.

In addition, the present invention is a rotation support portion rotatably coupled to the central axis of rotation on a first plane perpendicular to the central axis of rotation; And a horizontal member having one end fixed to the rotation support part and extending a predetermined length from the center rotation shaft so as to be positioned on the first plane, and a vertical member extending vertically from the other end of the horizontal member. It provides a sputtering jig comprising a; support portion formed with one or more L-shaped support member.

In a preferred embodiment, it further comprises one or more of the specimen mounting portion formed on the upper end of the vertical member of the support portion and the expansion mounting portion attached to the specimen mounting portion.

In a preferred embodiment, the specimen mounting portion is formed in a flat structure formed integrally with the upper end of the vertical member or a pocket structure having an upper surface fixedly coupled to the rear side of the upper end of the vertical member.

In a preferred embodiment, between the horizontal member and the vertical member further comprises at least one auxiliary support is formed perpendicular to the second plane where a straight line connecting the midpoint of one end of the horizontal member and the midpoint of the other end of the vertical member is further located. Include.

In a preferred embodiment, the distance (L) between the center axis of rotation and the vertical member is equal to the length of the distance (R) between the target and the center axis of rotation minus the distance (S) between the target and the back surface of the specimen mounting portion.

In a preferred embodiment, the length adjustment fixture is further formed on one end side of the horizontal member.

In a preferred embodiment, the expansion mounting portion includes any one or more of an adapter, a flat plate, a block specimen jig.

The present invention has the following excellent effects.

First, the sputtering jig of the present invention can maximize the self bias voltage applied to the jig and the specimen when the RF bias is applied.

In addition, the sputtering jig of the present invention can also stably mount a large mold.

In addition, the sputtering jig of the present invention can adjust the distance to the target.

1A and 1B are perspective views illustrating a conventional sputtering jig.
Figure 2a is a perspective view showing a sputtering jig according to an embodiment of the present invention, Figure 2b is a perspective view showing a state in which the sputtering jig shown in Figure 2a is fixed to the central axis of rotation.
Figure 3a is a perspective view showing a sputtering jig according to another embodiment of the present invention, Figure 3b is a perspective view showing a state in which the sputtering jig shown in Figure 3a is fixed to the central axis of rotation.
Figure 4a is a perspective view showing a sputtering jig according to another embodiment of the present invention, Figure 4b is a perspective view showing a state in which the sputtering jig shown in Figure 4a is fixed to the central axis of rotation.
Figure 5a is a perspective view showing a sputtering jig according to another embodiment of the present invention, Figure 5b is a perspective view showing that the sputtering jig shown in Figure 5a can adjust the length of the horizontal member when fixed on the central axis of rotation.
Figure 6a is a perspective view showing a sputtering jig according to another embodiment of the present invention, Figure 6b is a perspective view showing a state in which the sputtering jig shown in Figure 6a is fixed on the central axis of rotation.
Figure 7a is a perspective view showing an embodiment of a specimen mounting portion included in the sputtering jig of the present invention, Figure 7b is a perspective view showing a state in which the specimen is fixed to the specimen mounting portion shown in 7a, Figure 7c is a specimen mounting 7D is a perspective view illustrating another embodiment of the part, and FIG. 7D is a perspective view illustrating a state in which the specimen is fixed to the specimen mounting portion illustrated in 7c.
Figure 8a is a perspective view showing an embodiment of the expansion mounting portion included in the sputtering jig of the present invention, Figures 8b to 8h is a perspective view showing another embodiment of the expansion mounting portion.
Figure 9a is a perspective view showing an embodiment of a height adjusting mounting block with a target included in the sputtering jig of the present invention, Figure 9b is a perspective view showing a state in which the sputtering jig fixed using the height adjusting mounting block.
It is a schematic diagram which shows the arrangement structure of the sputtering jig and a target of this invention.
11A and 11B illustrate a result of sputtering a mold structure using the sputtering jig of the present invention.

The terms used in the present invention are selected as general terms as widely used as possible, but in some cases, the terms arbitrarily selected by the applicant, in which case, the meanings described or used in the detailed description of the present invention, rather than simply the names of the terms, are considered. The meaning should be grasped.

Hereinafter, with reference to the accompanying drawings and preferred embodiments will be described in detail the technical configuration of the present invention.

However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. Like reference numerals used to describe the present invention throughout the specification denote like elements.

Technical characteristics of the present invention, unlike the conventionally used revolving jig to minimize the area by expanding the magnitude of the bias voltage inversely proportional to the n power of the jig area, the change in the properties of the deposited material is observed, so that the self bias voltage when applying the bias It is located in the sputtering jig of the structure that can maximize the size, stably mount the large mold, and make the long throw sputtering by adjusting the distance to the target.

Accordingly, one end of the sputtering jig of the present invention is fixed on a first plane perpendicular to the central axis of rotation and extends a predetermined length from the one end to form the other end. And a support having a structure in which two planes are parallel to the central rotation axis or the first plane or positioned between the central rotation axis and the first plane. If necessary, it may further include one or more of the specimen mounting portion formed on the other end of the support portion and the expansion mounting portion attached to the specimen mounting portion.

Here, the support is any one of the form of a straight band, an L-shaped band, a straight band is bent at an acute angle or an obtuse angle, or a cylindrical shape of the upper surface is opened, the whole shape may be included one or two or more. According to the overall shape of the specimen mounting portion and the expansion mounting portion structure or installation location may be changed.

In addition, the sputtering jig of the present invention includes a rotation support portion rotatably coupled to the central axis of rotation on a first plane perpendicular to the central axis of rotation; And a horizontal member having one end fixed to the rotation support part and extending a predetermined length from the center rotation shaft so as to be positioned on the first plane, and a vertical member extending vertically from the other end of the horizontal member. It may include; a support portion formed with one or more L-shaped support member. If necessary, it may further include one or more of the specimen mounting portion formed on the other end of the support portion and the expansion mounting portion attached to the specimen mounting portion. In particular, the expansion mounting portion may not be attached to only one specimen mounting portion, but may be formed in a form in which a plurality of attachments are attached in different directions or successively overlapped. For example, a plurality of expansion mounting portions of the round plate-shaped structure may be prepared on the upper portion of the round plate-shaped specimen mounting portion 120 shown in FIG.

With reference to the drawings shown in various embodiments of the sputtering jig of the present invention will be described in more detail.

As shown, the sputtering jig 100 of the present invention includes a support 110, and if necessary, may further include one or more of the specimen mounting part 120 and the expansion mounting part. In some cases, the rotary support 140 and the height adjusting mounting block 150 may be further included.

2A and 2B showing the overall structure of the sputtering jig 100 and the state in which the jig 100 is fixed to the central rotation shaft according to the first embodiment of the present invention, included in the sputtering jig 100. It can be seen that the overall shape of the support 110 is a straight band and the second plane is formed parallel to the central axis of rotation. As shown in FIG. 2A, when the entire shape is a straight band 111 and the second plane is formed to be parallel to the central axis of rotation, the specimen mounting part 120 has a second side toward the other end of the support part 110. It may be formed parallel to the plane. Here, the second plane is a plane in which a straight line connecting the midpoint of the one end and the other end of the support 110 is located.

As shown, the support 110 is a plate-like structure having a certain thickness, width and a certain length as an embodiment, the specimen mounting portion 120 may be a circular plate integrally formed on the support 110, the specimen mounting portion ( The specimen may be fixed to a plurality of holes formed in the 120. The shape and size of the support 110 and the specimen mounting portion 120 may be changed as desired by the user within the scope of achieving the object and effect of the present invention. In particular, when the support 110 of the sputtering jig 100 is implemented as shown in Figure 2a, as shown in Figure 2b is a straight band-shaped support 110 is mounted on the central tab of the central axis of rotation to bolt or other known fastening It can be fixed by means, in this state, the distance between the center of the rotation axis and the specimen mounting portion 120 formed on the support 110 becomes 0, so the distance to the target can be the longest form, the specimen mounting portion 120 It may be advantageous for sputtering that the center and the center of the target are installed to coincide. If necessary, more than one expansion mounting unit 130 having various shapes shown in FIGS. 8A to 8H may be formed to fix more specimens to the specimen mounting unit 120 or various specimens. to be.

Although not shown in detail, when the overall shape of the support included in the sputtering jig according to the second embodiment of the present invention is a straight band and the second plane is parallel to the first plane, that is, the horizontal member ( A structure in which only 113a) is formed can be presented. In this structure, the specimen mounting portion 120 may be formed perpendicular to the first plane and the second plane toward the other end of the support portion. In this case, the specimen mounting portion 120 is a flat plate structure parallel to the central rotation axis. The unit 120 may have a form similar to the expansion mounting unit 130 shown in FIG. 8E.

In addition, referring to Figures 3a and 3b showing the overall structure of the sputtering jig 100 according to the third embodiment of the present invention and the jig 100 is fixed to the central axis of rotation, to the sputtering jig 100 The overall shape of the included support 110 may be implemented as a cylindrical 112 having an upper surface opened. As illustrated, when the entire shape of the support 110 is implemented as a cylindrical 112 having an upper surface opened, the central portion of the support 110 may be directly fixed by a bolt or other known fastening means on the central rotation shaft. In this case, when the distance between the specimen and the target mounted on the support 110 is necessary, the height adjustment mounting block 150 shown in FIG. 9A is used as shown in FIG. 9A between the central rotating shaft and the support 110. The height of the sputtering jig 100 may be adjusted so that the mounting block 150 is located.

4A and 4B showing the overall structure of the sputtering jig 100 and the state in which the jig 100 is fixed to the central rotation shaft according to the fourth embodiment of the present invention, the sputtering jig 100 is included in the The overall shape of the support 110 may be implemented with an L-shaped band 113. In this case, the L-shaped band may have a shape in which the straight band is bent at a right angle based on a predetermined point. When implemented as an L-shaped band 113, the support 110 may be composed of a horizontal member 113a and a vertical member 113b as shown. The horizontal member 113a has one end fixed on the central rotating shaft and is formed to extend a predetermined length from the central rotating shaft, and the vertical member 113b is vertically vertically fixed at the other end of the horizontal member 113a. It may be extended. The horizontal member 113a and the vertical member 113b are plate-like structures having a predetermined width, thickness, and length, which may be implemented in a band shape because the width thereof is narrower than the total length, within the range capable of achieving the object and effect of the present invention. Of course, it can be changed in. At this time, the specimen mounting portion 120 may be formed in a direction parallel to the vertical member 113b, as shown in Figure 4a may be a flat plate structure 121 formed integrally with the upper end of the vertical member 113b. As shown in FIG. 5A, the upper surface fixedly coupled to the rear side of the upper end of the vertical member 113b may be formed as an open pocket structure 122. Sputtering jig used in the present invention may be advantageous to sputtering to match the center of the target of any type of structure, in particular, the plate-like structure 120 is formed integrally with the upper end of the vertical member (113b) If it is 121, it may be advantageous for sputtering that the center of the specimen mounting unit 120 and the center of the target coincide with each other.

Although not shown in detail, the overall shape of the support 110 included in the sputtering jig 100 may be implemented in a shape where the straight band is bent at an acute or obtuse angle based on a predetermined point, in this case, with the target. The type of specimen mounting and / or extension mounting may be adjusted in the required manner for the zeroing of.

5A and 5B showing the overall structure of the sputtering jig 100 and the state in which the jig 100 is fixed to the central rotation shaft according to the fifth embodiment of the present invention, included in the sputtering jig 100 The overall shape of the support 110 is implemented in the L-shaped band 113 is the same as the structure shown in Figures 4a and 4b, the specimen mounting portion 120 is fixedly coupled to the rear side of the upper end of the vertical member (113a) When the upper surface is formed as an open pocket structure 122, when the specimen mounting portion 120 is formed as a forge structure 122, a heavy material can be mounted so that the horizontal member (113a) and the vertical member (113b) At least one auxiliary support 113c may be formed to stably support the support. At least one auxiliary support 113c may be formed at each end of the auxiliary support 113c to be fixed to the horizontal member 113a and the vertical member 113b to be perpendicular to the second plane between the horizontal member 113a and the vertical member 113b. .

When the overall shape of the sputtering jig is L-shaped band as in the fourth and fifth embodiments, as shown in FIG. 10, the distance L between the center rotation axis and the vertical member 113b is the distance between the target and the center rotation axis. In (R) may be equal to the length minus the distance (S) between the target and the back surface mounting portion 120. Here, the L may be the same as or different from the length of the horizontal member 113a, when L is different from the length of the horizontal member 113a, the length adjustment fixture may be further formed on one end side of the horizontal member 113a. have. As an embodiment of the length adjustment fixture, as shown in Figures 5a and 5b to form a plurality of grooves in the longitudinal direction and fastened along the groove by a bolt or other known fastening means to adjust the length of the horizontal member 113a while the center The sputtering jig 100 may be fixed to the rotation shaft.

2A to 5B, only one sputtering jig is fixed to a central portion of the central rotating shaft by bolts or other known fastening means. However, as in the second embodiment, the sputtering jig is a straight band or parallel to the ground. When the overall shape of the sputtering jig is the L-shaped band as in the fourth embodiment and the fifth embodiment, two or more sputtering jigs 100 are fixed to the central rotation shaft to fix the height of the specimen mounting portion 120 as well as the distance from the target. You can also adjust.

6A and 6B showing the overall structure of the sputtering jig 100 and the state in which the jig 100 is fixed to the central rotation shaft according to the sixth embodiment of the present invention, the sputtering jig 100 is a rotational support part. 140 and one or more supports 110 may be implemented.

Rotation support 140 is a component coupled to the central axis of rotation and the rotational bolt or other known fastening means on a first plane perpendicular to the central axis of rotation, may be a flat plate-like structure suitable for the center of rotation is shown as an example It may be embodied in disk form.

The support part 110 includes a horizontal member which is formed by extending a predetermined length from the central rotation shaft so that one end thereof is fixed to the rotation support part and positioned on the first plane, and a vertical member extending vertically by a predetermined length from the other end of the horizontal member. As a structure in which at least one L-shaped support member is formed, and may be the same as the sputtering jig shown in FIGS. 4A and 5A except that the L-shaped support member is fixed to the rotation support part 140 instead of the central rotation shaft, the fourth embodiment and the second embodiment Since the technical contents described in the fifth embodiment can be borrowed as is, detailed description thereof will be omitted. However, although the four support 110 is formed integrally at regular intervals in the rotary support 140, but is not limited to be implemented detachable by a bolt or other known fastening means. In addition, although not shown, the four support parts 110 may be implemented to have different lengths, sizes, and shapes, as required, rather than the same shape.

Looking at the embodiments of the specimen mounting portion 120 included in the sputtering jig of the present invention with reference to Figures 7a to 7d, the specimen mounting portion 120 is largely formed integrally with the upper end of the support 110 as shown in Figure 7a The upper surface that is fixedly coupled to the rear surface side of the upper end of the support 110, as shown in FIG. 7C or a flat structure 121 may be formed as an open pocket structure 122. In this case, the pocket structure 122 may be formed of a detachable structure. As shown in FIG. 7A, when the specimen mounting part 120 is a flat plate structure 121, the specimen may be fixed to a plurality of holes formed on the flat plate as shown in FIG. 7B. As described above, a large specimen, such as a mold, may be seated and mounted therein.

Looking at various embodiments of the expansion mounting portion 130 included in the sputtering jig of the present invention with reference to Figures 8a to 8h, the expansion mounting portion 130 is attached to the specimen mounting portion 120 to attach more specimens As a structure that can be made may be implemented in the form of an adapter as shown in Figures 8a and 8b, or may be implemented in the form of a flat plate such as 8c, 8e to 8h, or may be implemented in various shapes such as block specimen jig as shown in FIG. . In the case of FIG. 8A, as shown in FIG. 8A, an expansion mounting part 130 is formed at a rear side of the heat sink to position the heat sink between the specimen mounting part 120 and the expansion mounting part 130. An adapter for fixing was used, and in the case of FIG. 8B, an expansion mounting part 130 is formed in an L-shape at the upper end of the specimen mounting part 120 to show a state in which the specimen condenser is fixed.

In addition, Figure 8c is an expansion mounting unit 130 that can be used when the sputtering gun 2 inches or 4 inches or more is fixed as shown in the mounting can be mounted on the specimen mounting unit 120, and can be utilized in various ways, Figure 8d and As shown in the drawing, the block specimen mini jig fixing various types of samples as shown in the drawing can be simply attached to enable coating. In addition, as shown in FIGS. 8E and 8F, the flat mounting jig may be attached to the support 110 or the specimen mounting part 120 using the expansion mounting unit 130, and the perforated rectangular aluminum plate may be attached to the flat jig, FIGS. 8G and 8H. The large structure also shows that the coating can be easily attached to the expansion mounting portion 130 as shown.

9 shows an embodiment of the height adjusting mounting block 150, but in addition to the illustrated structure, as long as the structure can increase the height of the support 110, a mounting block of various shapes may be used.

Referring to FIG. 10, the arrangement structure of the sputtering jig and the target according to the fourth to sixth embodiments of the present invention having an L-shaped support portion includes a distance L between the central rotating shaft and the vertical member 113b and a target. And a distance R between the center axis of rotation and the distance S between the target and the rear surface of the specimen mounting part 120 are established.

If the width of the target is W, S / W <1: short throw, S / W> 1: long throw can be established (general definition is long throw if S / W> 1). When the horizontal distance L is determined based on the point where S / W = 1, the middle distance of L / 2 is thrown middle, and the short throw is farther away from the central axis of rotation than L / 2. Also called throw for convenience.

Long throw deposition is a method of using distance to remove oblique incidence atoms except sputtered particles incident in the vertical direction. In other words, unlike the method of removing oblique incidence atoms in a physical manner, the distance is increased so that the elements incident in the vertical direction are deposited on the substrate. If the substrate is spaced apart by the distance of the target size or diameter, and the distance from the target is increased, the elements incident in the vertical direction are almost perpendicular to the substrate when there is no particle scattering, so that the excess of the upper portion of the via or trench This facilitates deposition into the underlying layer deep into the vias while preventing deposition.

Long throw sputtering also favors low pressure wherever possible to prevent interparticle scattering so that sputtering atoms that enter at long distances minimize particle collisions and reach the substrate. Normal sputtering pressure is about 5 mTorr, but in the case of using the sputtering jig of the present invention, sputtering of normal Mo and Cu was possible at 1 mTorr even when using a general type sputtering chamber.

Particularly, referring to FIGS. 11A and 11B of FIG. 11A and 11B, which show a process and a result of coating TiN a large mold by sputtering using a sputtering jig having a structure according to a fifth embodiment of the present invention, the coating is smoothly performed. It can be seen that.

Looking at the mold after repeated interval sputtering for the coating on the side as shown in Figure 11a is the most important coating area where the aluminum is hardly touched during the actual extrusion, when using the sputtering jig of the present invention so protruding or entering It can be seen that the maximum effect can be obtained by using the interval repetition when applied to the shape. That is, when the aspect ratio of the portion protruding forward of the mold is 4.5 using the sputtering jig of the present invention, the interval repetition is repeated interval sputtering at a speed of 0.1 RPM between 90 degrees and 96 degrees when the center is 93 degrees in front of the target. Since the coating is uniformly carried out, even in the case of a large mold as shown in FIG.

Although the present invention has been shown and described with reference to preferred embodiments as described above, it is not limited to the above-described embodiments and those skilled in the art without departing from the spirit of the present invention. Various changes and modifications will be possible.

100: sputtering jig 110: support
111: straight band support 112: cylindrical support
113: L-shaped band support portion 113a: horizontal member
113b: vertical member 113c: auxiliary support
113d: length adjustment fixture 120: specimen mounting portion
121: plate structure 122: pocket structure
130: expansion mounting portion 140: rotation support portion
150: height adjusting mounting block

Claims (23)

A vertical member having one end fixed to the central rotating shaft and positioned on a first plane perpendicular to the central rotating shaft, the horizontal member being formed to extend a predetermined length from the central rotating shaft and a vertical length extending vertically from the other end of the horizontal member; An L-shaped band structure supporting member including a member; And
It is formed in the direction parallel to the vertical member on the other end of the support portion, the specimen mounting portion of the cylindrical pocket structure of one side is detachably fixed to the rear side of the upper end of the vertical member and the upper surface is opened;
A sputtering jig, which can be mounted stably even when the specimen is a heavy object.
delete delete delete delete delete delete delete delete The method of claim 1,
Sputtering jig further comprises at least one auxiliary support is formed between the horizontal member and the vertical member perpendicular to the second plane.
The method according to claim 1 or 10,
Sputtering jig, characterized in that the distance (L) between the central axis of rotation and the vertical member is equal to the length (R) minus the distance (S) between the target and the specimen mounting portion back from the distance (R) between the target and the center axis of rotation.
The method of claim 11,
The sputtering jig, wherein L is equal to or different from the length of the horizontal member.
The method of claim 12,
If the L is different from the length of the horizontal member, the sputtering jig, characterized in that the length adjustment fixture is further formed toward one end of the horizontal member.
And a support portion of a cylindrical pocket structure whose central surface is mounted and fixed on the central rotation shaft in parallel with a first plane perpendicular to a first plane perpendicular to the central rotation shaft, and having an upper surface open at the other end thereof.
A sputtering jig, which can be mounted stably even when the specimen is a heavy object.
The method of claim 14,
Sputtering jig further comprises a; height adjustment mounting block is formed between the central rotation shaft and the support portion to adjust the height of the support portion. delete delete delete delete delete delete delete delete

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