KR101991903B1 - 카바졸 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 감광성 조성물 - Google Patents
카바졸 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 감광성 조성물 Download PDFInfo
- Publication number
- KR101991903B1 KR101991903B1 KR1020170167709A KR20170167709A KR101991903B1 KR 101991903 B1 KR101991903 B1 KR 101991903B1 KR 1020170167709 A KR1020170167709 A KR 1020170167709A KR 20170167709 A KR20170167709 A KR 20170167709A KR 101991903 B1 KR101991903 B1 KR 101991903B1
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- KR
- South Korea
- Prior art keywords
- photosensitive composition
- butyl
- alkyl
- hydroxy
- compound
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Indole Compounds (AREA)
- Optical Filters (AREA)
- Polymerisation Methods In General (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020170167709A KR101991903B1 (ko) | 2017-12-07 | 2017-12-07 | 카바졸 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 감광성 조성물 |
| TW107144135A TWI703129B (zh) | 2017-12-07 | 2018-12-07 | 咔唑肟酯衍生化合物以及含有其的光聚合起始劑及感光性組成物 |
| JP2018230255A JP6725631B2 (ja) | 2017-12-07 | 2018-12-07 | カルバゾールオキシムエステル誘導体化合物、それを含む光重合開始剤及び感光性組成物 |
| CN201811494814.XA CN109896990B (zh) | 2017-12-07 | 2018-12-07 | 咔唑肟酯衍生化合物以及含有该化合物的光聚合引发剂和光敏组合物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020170167709A KR101991903B1 (ko) | 2017-12-07 | 2017-12-07 | 카바졸 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 감광성 조성물 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20190067602A KR20190067602A (ko) | 2019-06-17 |
| KR101991903B1 true KR101991903B1 (ko) | 2019-10-01 |
Family
ID=66943379
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020170167709A KR101991903B1 (ko) | 2017-12-07 | 2017-12-07 | 카바졸 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 감광성 조성물 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6725631B2 (zh) |
| KR (1) | KR101991903B1 (zh) |
| CN (1) | CN109896990B (zh) |
| TW (1) | TWI703129B (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7175168B2 (ja) * | 2018-11-29 | 2022-11-18 | 東京応化工業株式会社 | 感光性樹脂組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7189489B2 (en) | 2001-06-11 | 2007-03-13 | Ciba Specialty Chemicals Corporation | Oxime ester photoiniators having a combined structure |
| TW200714651A (en) | 2002-10-28 | 2007-04-16 | Mitsubishi Chem Corp | Photopolymerization composition and color filter using the same |
| ATE458010T1 (de) | 2005-12-20 | 2010-03-15 | Basf Se | Oximester-photoinitiatoren |
| JP2007219362A (ja) * | 2006-02-20 | 2007-08-30 | Toyo Ink Mfg Co Ltd | 重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法。 |
| CN101528682B (zh) * | 2006-12-27 | 2012-08-08 | 株式会社艾迪科 | 肟酯化合物和含有该化合物的光聚合引发剂 |
| JP5481856B2 (ja) * | 2008-12-26 | 2014-04-23 | 東洋インキＳｃホールディングス株式会社 | 光重合開始剤、重合性組成物、および重合物の製造方法 |
| JP5359354B2 (ja) * | 2009-02-20 | 2013-12-04 | 東洋インキＳｃホールディングス株式会社 | 光重合開始剤、重合性組成物、および重合物の製造方法 |
| JP2010215575A (ja) * | 2009-03-18 | 2010-09-30 | Toyo Ink Mfg Co Ltd | 新規オキシムエステル化合物およびそれを含んでなるラジカル重合開始剤および重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法 |
| WO2010146883A1 (ja) * | 2009-06-17 | 2010-12-23 | 東洋インキ製造株式会社 | オキシムエステル化合物、ラジカル重合開始剤、重合性組成物、ネガ型レジストおよび画像パターン |
| TWI438570B (zh) * | 2010-03-11 | 2014-05-21 | Toyo Ink Mfg Co | 感光性著色組合物及濾色器 |
| PL4120248T3 (pl) | 2010-07-08 | 2024-05-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Dekoder wykorzystujący kasowanie aliasingu w przód |
| WO2013052523A1 (en) | 2011-10-03 | 2013-04-11 | modeRNA Therapeutics | Modified nucleosides, nucleotides, and nucleic acids, and uses thereof |
| KR101225695B1 (ko) * | 2012-01-20 | 2013-02-05 | (주)휴넷플러스 | 신규한 고감도 알파키토옥심에스테르 광중합개시제 및 이 화합물을 포함하는 광중합 조성물 |
| JP2014164021A (ja) * | 2013-02-22 | 2014-09-08 | Toyo Ink Sc Holdings Co Ltd | 感光性着色組成物およびカラーフィルタ |
-
2017
- 2017-12-07 KR KR1020170167709A patent/KR101991903B1/ko active IP Right Grant
-
2018
- 2018-12-07 TW TW107144135A patent/TWI703129B/zh active
- 2018-12-07 CN CN201811494814.XA patent/CN109896990B/zh active Active
- 2018-12-07 JP JP2018230255A patent/JP6725631B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TW201927752A (zh) | 2019-07-16 |
| CN109896990B (zh) | 2023-04-21 |
| JP6725631B2 (ja) | 2020-07-22 |
| JP2019099582A (ja) | 2019-06-24 |
| TWI703129B (zh) | 2020-09-01 |
| KR20190067602A (ko) | 2019-06-17 |
| CN109896990A (zh) | 2019-06-18 |
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