JP6725631B2 - カルバゾールオキシムエステル誘導体化合物、それを含む光重合開始剤及び感光性組成物 - Google Patents

カルバゾールオキシムエステル誘導体化合物、それを含む光重合開始剤及び感光性組成物 Download PDF

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Publication number
JP6725631B2
JP6725631B2 JP2018230255A JP2018230255A JP6725631B2 JP 6725631 B2 JP6725631 B2 JP 6725631B2 JP 2018230255 A JP2018230255 A JP 2018230255A JP 2018230255 A JP2018230255 A JP 2018230255A JP 6725631 B2 JP6725631 B2 JP 6725631B2
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butyl
photosensitive composition
alkyl
hydroxy
oxime ester
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Japanese (ja)
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JP2019099582A (ja
Inventor
イ,ウォンジュン
オ,チョンリム
イ,ドゥクラク
シン,スンリム
チョン,グン
シン,ジョンイル
アン,ギョンリョン
パク,ファルギ
オ,ユジン
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Korea Research Institute of Chemical Technology KRICT
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Korea Research Institute of Chemical Technology KRICT
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56Ring systems containing three or more rings
    • C07D209/80[b, c]- or [b, d]-condensed
    • C07D209/82Carbazoles; Hydrogenated carbazoles
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Indole Compounds (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
JP2018230255A 2017-12-07 2018-12-07 カルバゾールオキシムエステル誘導体化合物、それを含む光重合開始剤及び感光性組成物 Active JP6725631B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020170167709A KR101991903B1 (ko) 2017-12-07 2017-12-07 카바졸 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 감광성 조성물
KR10-2017-0167709 2017-12-07

Publications (2)

Publication Number Publication Date
JP2019099582A JP2019099582A (ja) 2019-06-24
JP6725631B2 true JP6725631B2 (ja) 2020-07-22

Family

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JP2018230255A Active JP6725631B2 (ja) 2017-12-07 2018-12-07 カルバゾールオキシムエステル誘導体化合物、それを含む光重合開始剤及び感光性組成物

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JP (1) JP6725631B2 (zh)
KR (1) KR101991903B1 (zh)
CN (1) CN109896990B (zh)
TW (1) TWI703129B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7175168B2 (ja) * 2018-11-29 2022-11-18 東京応化工業株式会社 感光性樹脂組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100801457B1 (ko) 2001-06-11 2008-02-11 시바 스페셜티 케미칼스 홀딩 인크. 결합된 구조를 가지는 옥심 에스테르 광개시제
TW200714651A (en) 2002-10-28 2007-04-16 Mitsubishi Chem Corp Photopolymerization composition and color filter using the same
US8586268B2 (en) 2005-12-20 2013-11-19 Basf Se Oxime ester photoinitiators
JP2007219362A (ja) * 2006-02-20 2007-08-30 Toyo Ink Mfg Co Ltd 重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法。
KR101471644B1 (ko) * 2006-12-27 2014-12-10 가부시키가이샤 아데카 옥심에스테르화합물 및 상기 화합물을 함유하는 광중합 개시제
JP5481856B2 (ja) * 2008-12-26 2014-04-23 東洋インキScホールディングス株式会社 光重合開始剤、重合性組成物、および重合物の製造方法
JP5359354B2 (ja) * 2009-02-20 2013-12-04 東洋インキScホールディングス株式会社 光重合開始剤、重合性組成物、および重合物の製造方法
JP2010215575A (ja) * 2009-03-18 2010-09-30 Toyo Ink Mfg Co Ltd 新規オキシムエステル化合物およびそれを含んでなるラジカル重合開始剤および重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法
WO2010146883A1 (ja) * 2009-06-17 2010-12-23 東洋インキ製造株式会社 オキシムエステル化合物、ラジカル重合開始剤、重合性組成物、ネガ型レジストおよび画像パターン
TWI438570B (zh) * 2010-03-11 2014-05-21 Toyo Ink Mfg Co 感光性著色組合物及濾色器
CA2804548C (en) 2010-07-08 2016-06-21 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Coder using forward aliasing cancellation
RS62993B1 (sr) 2011-10-03 2022-03-31 Modernatx Inc Modifikovani nukleozidi, nukleotidi, i nukleinske kiseline, i njihove upotrebe
KR101225695B1 (ko) * 2012-01-20 2013-02-05 (주)휴넷플러스 신규한 고감도 알파키토옥심에스테르 광중합개시제 및 이 화합물을 포함하는 광중합 조성물
JP2014164021A (ja) * 2013-02-22 2014-09-08 Toyo Ink Sc Holdings Co Ltd 感光性着色組成物およびカラーフィルタ

Also Published As

Publication number Publication date
CN109896990B (zh) 2023-04-21
KR101991903B1 (ko) 2019-10-01
KR20190067602A (ko) 2019-06-17
JP2019099582A (ja) 2019-06-24
TWI703129B (zh) 2020-09-01
CN109896990A (zh) 2019-06-18
TW201927752A (zh) 2019-07-16

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