KR101885748B1 - 광원 초점의 정렬 - Google Patents

광원 초점의 정렬 Download PDF

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Publication number
KR101885748B1
KR101885748B1 KR1020137001480A KR20137001480A KR101885748B1 KR 101885748 B1 KR101885748 B1 KR 101885748B1 KR 1020137001480 A KR1020137001480 A KR 1020137001480A KR 20137001480 A KR20137001480 A KR 20137001480A KR 101885748 B1 KR101885748 B1 KR 101885748B1
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South Korea
Prior art keywords
focal plane
amplified
target material
target
wavefront
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KR1020137001480A
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Korean (ko)
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KR20130129351A (ko
Inventor
매튜 알. 그라함
윌리엄 엔. 파틀로
스티븐 창
로버트 에이. 벅스테트
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에이에스엠엘 네델란즈 비.브이.
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)
KR1020137001480A 2010-07-22 2011-07-14 광원 초점의 정렬 Active KR101885748B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/841,728 2010-07-22
US12/841,728 US8648999B2 (en) 2010-07-22 2010-07-22 Alignment of light source focus
PCT/US2011/044058 WO2012012267A1 (en) 2010-07-22 2011-07-14 Alignment of light source focus

Publications (2)

Publication Number Publication Date
KR20130129351A KR20130129351A (ko) 2013-11-28
KR101885748B1 true KR101885748B1 (ko) 2018-09-10

Family

ID=45493359

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137001480A Active KR101885748B1 (ko) 2010-07-22 2011-07-14 광원 초점의 정렬

Country Status (6)

Country Link
US (2) US8648999B2 (https=)
EP (1) EP2595702A4 (https=)
JP (1) JP5952274B2 (https=)
KR (1) KR101885748B1 (https=)
TW (1) TWI519209B (https=)
WO (1) WO2012012267A1 (https=)

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US8138487B2 (en) * 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8648999B2 (en) 2010-07-22 2014-02-11 Cymer, Llc Alignment of light source focus
JP5846572B2 (ja) * 2011-07-27 2016-01-20 ギガフォトン株式会社 チャンバ装置、極端紫外光生成装置および極端紫外光生成装置の制御方法
US8681427B2 (en) * 2012-05-31 2014-03-25 Cymer, Inc. System and method for separating a main pulse and a pre-pulse beam from a laser source
US8598552B1 (en) * 2012-05-31 2013-12-03 Cymer, Inc. System and method to optimize extreme ultraviolet light generation
WO2014006193A1 (en) 2012-07-06 2014-01-09 ETH Zürich Method for controlling an interaction between droplet targets and a laser and apparatus for conducting said method
DE102012217120A1 (de) 2012-09-24 2014-03-27 Trumpf Laser- Und Systemtechnik Gmbh EUV-Strahlungserzeugungsvorrichtung und Betriebsverfahren dafür
DE102012217520A1 (de) 2012-09-27 2014-03-27 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und Verfahren zum Einstellen des Öffnungswinkels eines Laserstrahls
TWI611731B (zh) 2012-12-21 2018-01-11 Gigaphoton Inc 雷射束控制裝置及極端紫外光產生裝置
US8872144B1 (en) * 2013-09-24 2014-10-28 Asml Netherlands B.V. System and method for laser beam focus control for extreme ultraviolet laser produced plasma source
KR102214861B1 (ko) * 2013-03-15 2021-02-10 에이에스엠엘 네델란즈 비.브이. 극자외 광원을 위한 빔 위치 제어
US9000405B2 (en) * 2013-03-15 2015-04-07 Asml Netherlands B.V. Beam position control for an extreme ultraviolet light source
US9232623B2 (en) * 2014-01-22 2016-01-05 Asml Netherlands B.V. Extreme ultraviolet light source
US9209595B2 (en) 2014-01-31 2015-12-08 Asml Netherlands B.V. Catalytic conversion of an optical amplifier gas medium
WO2015118687A1 (ja) 2014-02-10 2015-08-13 ギガフォトン株式会社 レーザ装置及び極端紫外光生成システム
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
KR102422784B1 (ko) 2015-08-03 2022-07-19 엘지이노텍 주식회사 광파 탐지 및 거리 측정 장치
US9820368B2 (en) 2015-08-12 2017-11-14 Asml Netherlands B.V. Target expansion rate control in an extreme ultraviolet light source
US9713240B2 (en) 2015-08-12 2017-07-18 Asml Netherlands B.V. Stabilizing EUV light power in an extreme ultraviolet light source
JPWO2017090167A1 (ja) * 2015-11-26 2018-09-13 ギガフォトン株式会社 極端紫外光生成装置
KR101897869B1 (ko) 2016-07-07 2018-10-04 고려대학교 산학협력단 비구면거울이 내장된 레이저수술장치
JP6278427B1 (ja) * 2017-01-05 2018-02-14 レーザーテック株式会社 光学装置、及び除振方法
EP3370486A1 (en) * 2017-03-02 2018-09-05 ASML Netherlands B.V. Radiation source
US10048199B1 (en) 2017-03-20 2018-08-14 Asml Netherlands B.V. Metrology system for an extreme ultraviolet light source
US10969690B2 (en) 2017-09-29 2021-04-06 Taiwan Semiconductor Manufacturing Co., Ltd. Extreme ultraviolet control system for adjusting droplet illumination parameters
US11013097B2 (en) 2017-11-15 2021-05-18 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for generating extreme ultraviolet radiation
US11588293B2 (en) * 2017-11-21 2023-02-21 Taiwan Semiconductor Manufacturing Co., Ltd. Methods and systems for aligning master oscillator power amplifier systems
KR102675689B1 (ko) * 2018-05-14 2024-06-14 트럼프 레이저시스템즈 포 세미컨덕터 매뉴팩처링 게엠베하 초점 조정 장치 및 이를 구비한 euv 방사선 발생 장치
CN120669483A (zh) 2019-04-04 2025-09-19 Asml荷兰有限公司 辐射系统
US11340531B2 (en) 2020-07-10 2022-05-24 Taiwan Semiconductor Manufacturing Company, Ltd. Target control in extreme ultraviolet lithography systems using aberration of reflection image
US11852978B2 (en) 2022-03-07 2023-12-26 Taiwan Semiconductor Manufacturing Company, Ltd. EUV lithography system with 3D sensing and tunning modules

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090046273A1 (en) 2007-08-16 2009-02-19 Vivek Bakshi Systems and Methods for Monitoring and Controlling the Operation of Extreme Ultraviolet (EUV) Light Sources Used in Semiconductor Fabrication
JP2010123942A (ja) * 2008-10-24 2010-06-03 Komatsu Ltd 極端紫外光源装置

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JPS60185230A (ja) * 1984-03-02 1985-09-20 Pioneer Electronic Corp 焦点誤差検出装置
JPS6310326A (ja) 1986-07-01 1988-01-16 Sanyo Electric Co Ltd 光ピツクアツプ装置
JP3626003B2 (ja) 1997-10-06 2005-03-02 富士通株式会社 光学的情報記憶装置
EP1184727A1 (en) 2000-09-01 2002-03-06 Asm Lithography B.V. Lithographic apparatus
US6710856B2 (en) 2000-09-01 2004-03-23 Asml Netherlands B.V. Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby
US7897947B2 (en) 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US7491954B2 (en) 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US7598509B2 (en) 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7170587B2 (en) 2002-03-18 2007-01-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7534552B2 (en) 2004-12-23 2009-05-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7453077B2 (en) * 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
NL2003310A1 (nl) 2008-08-14 2010-02-16 Asml Netherlands Bv Radiation source, lithographic apparatus and device manufacturing method.
JP5368261B2 (ja) 2008-11-06 2013-12-18 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置の制御方法
US8283643B2 (en) 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
US8138487B2 (en) 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8173985B2 (en) 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
US8648999B2 (en) 2010-07-22 2014-02-11 Cymer, Llc Alignment of light source focus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090046273A1 (en) 2007-08-16 2009-02-19 Vivek Bakshi Systems and Methods for Monitoring and Controlling the Operation of Extreme Ultraviolet (EUV) Light Sources Used in Semiconductor Fabrication
JP2010123942A (ja) * 2008-10-24 2010-06-03 Komatsu Ltd 極端紫外光源装置

Also Published As

Publication number Publication date
US8648999B2 (en) 2014-02-11
US9832853B2 (en) 2017-11-28
WO2012012267A1 (en) 2012-01-26
TWI519209B (zh) 2016-01-21
EP2595702A1 (en) 2013-05-29
KR20130129351A (ko) 2013-11-28
EP2595702A4 (en) 2016-03-16
JP2013535824A (ja) 2013-09-12
TW201215245A (en) 2012-04-01
US20120019826A1 (en) 2012-01-26
JP5952274B2 (ja) 2016-07-13
US20140151583A1 (en) 2014-06-05

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