KR101862310B1 - 얼룩결함 검사장치 및 얼룩결함 검사방법 - Google Patents

얼룩결함 검사장치 및 얼룩결함 검사방법 Download PDF

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Publication number
KR101862310B1
KR101862310B1 KR1020150173514A KR20150173514A KR101862310B1 KR 101862310 B1 KR101862310 B1 KR 101862310B1 KR 1020150173514 A KR1020150173514 A KR 1020150173514A KR 20150173514 A KR20150173514 A KR 20150173514A KR 101862310 B1 KR101862310 B1 KR 101862310B1
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KR
South Korea
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image
profile
defect
display panel
vertical
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KR1020150173514A
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English (en)
Korean (ko)
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KR20170067079A (ko
Inventor
조상희
장성욱
원상운
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에이피시스템 주식회사
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Priority to KR1020150173514A priority Critical patent/KR101862310B1/ko
Priority to CN201610952450.XA priority patent/CN107037053B/zh
Publication of KR20170067079A publication Critical patent/KR20170067079A/ko
Application granted granted Critical
Publication of KR101862310B1 publication Critical patent/KR101862310B1/ko

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/12—Circuits of general importance; Signal processing
    • G01N2201/126—Microprocessor processing
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30121—CRT, LCD or plasma display

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Signal Processing (AREA)
  • Quality & Reliability (AREA)
  • Theoretical Computer Science (AREA)
  • Image Processing (AREA)
  • Liquid Crystal (AREA)
KR1020150173514A 2015-12-07 2015-12-07 얼룩결함 검사장치 및 얼룩결함 검사방법 KR101862310B1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020150173514A KR101862310B1 (ko) 2015-12-07 2015-12-07 얼룩결함 검사장치 및 얼룩결함 검사방법
CN201610952450.XA CN107037053B (zh) 2015-12-07 2016-11-02 用于检测斑缺陷的设备和方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020150173514A KR101862310B1 (ko) 2015-12-07 2015-12-07 얼룩결함 검사장치 및 얼룩결함 검사방법

Publications (2)

Publication Number Publication Date
KR20170067079A KR20170067079A (ko) 2017-06-15
KR101862310B1 true KR101862310B1 (ko) 2018-05-29

Family

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Family Applications (1)

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KR1020150173514A KR101862310B1 (ko) 2015-12-07 2015-12-07 얼룩결함 검사장치 및 얼룩결함 검사방법

Country Status (2)

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KR (1) KR101862310B1 (zh)
CN (1) CN107037053B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107911602B (zh) * 2017-11-23 2020-05-05 武汉华星光电半导体显示技术有限公司 显示面板Mura的检测方法、检测装置及计算机可读存储介质
CN108387587B (zh) * 2018-01-22 2020-07-31 京东方科技集团股份有限公司 缺陷检测方法及缺陷检测设备
CN110987945B (zh) * 2019-12-24 2023-03-28 合肥维信诺科技有限公司 缺陷检测方法、检测装置及触控显示面板的检测方法
US11797557B2 (en) 2020-12-03 2023-10-24 Boe Technology Group Co., Ltd. Data management platform, intelligent defect analysis system, intelligent defect analysis method, computer-program product, and method for defect analysis

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1318839C (zh) * 2002-11-28 2007-05-30 威光机械工程股份有限公司 印刷电路板上瑕疵组件的自动光学检测方法
CN102487026B (zh) * 2010-12-02 2014-12-03 中芯国际集成电路制造(北京)有限公司 检测通孔缺陷的方法
CN103514841A (zh) * 2012-06-15 2014-01-15 宏碁股份有限公司 透明显示装置及其透明度调整方法
KR101958634B1 (ko) * 2012-12-13 2019-03-15 엘지디스플레이 주식회사 디스플레이 장치의 무라 검출 장치 및 방법
KR20140121068A (ko) * 2013-04-05 2014-10-15 엘지디스플레이 주식회사 평판디스플레이의 얼룩 검사 방법 및 장치
CN104374551B (zh) * 2014-11-24 2017-05-10 深圳科瑞技术股份有限公司 一种led发光均匀性检测方法及其系统

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CN107037053A (zh) 2017-08-11
CN107037053B (zh) 2021-06-01
KR20170067079A (ko) 2017-06-15

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