KR101806599B1 - 가요성 커플링을 구비한 투사 시스템 - Google Patents

가요성 커플링을 구비한 투사 시스템 Download PDF

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Publication number
KR101806599B1
KR101806599B1 KR1020147009264A KR20147009264A KR101806599B1 KR 101806599 B1 KR101806599 B1 KR 101806599B1 KR 1020147009264 A KR1020147009264 A KR 1020147009264A KR 20147009264 A KR20147009264 A KR 20147009264A KR 101806599 B1 KR101806599 B1 KR 101806599B1
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South Korea
Prior art keywords
projection
target
module
frame
projection system
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KR1020147009264A
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English (en)
Korean (ko)
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KR20140078654A (ko
Inventor
예리 요하네스 마르티누스 파이스터
미켈 피터 단스베르그
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마퍼 리쏘그라피 아이피 비.브이.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0216—Means for avoiding or correcting vibration effects

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Vibration Prevention Devices (AREA)
  • Electron Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020147009264A 2011-09-09 2012-09-07 가요성 커플링을 구비한 투사 시스템 Active KR101806599B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161532636P 2011-09-09 2011-09-09
US61/532,636 2011-09-09
PCT/NL2012/050627 WO2013036125A1 (en) 2011-09-09 2012-09-07 Projection system with flexible coupling

Publications (2)

Publication Number Publication Date
KR20140078654A KR20140078654A (ko) 2014-06-25
KR101806599B1 true KR101806599B1 (ko) 2017-12-07

Family

ID=47003169

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147009264A Active KR101806599B1 (ko) 2011-09-09 2012-09-07 가요성 커플링을 구비한 투사 시스템

Country Status (5)

Country Link
US (1) US9268216B2 (enExample)
JP (1) JP5905581B2 (enExample)
KR (1) KR101806599B1 (enExample)
TW (1) TWI572897B (enExample)
WO (1) WO2013036125A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9536699B2 (en) 2013-07-08 2017-01-03 Carl Zeiss Microscopy, Llc Charged particle beam system and method of operating a charged particle beam system
US9823466B2 (en) * 2015-07-03 2017-11-21 Panasonic Intellectual Property Management Co., Ltd. Optical path changing device and projection image display apparatus
WO2019211123A1 (en) 2018-05-02 2019-11-07 Asml Netherlands B.V. E-beam apparatus
EP3853023A4 (en) 2018-09-18 2022-06-22 Skyphos Industries, Inc. SUSPENSION SYSTEM TO ADJUST PROJECTED LIGHT IMAGERY
CN110955136A (zh) * 2019-12-16 2020-04-03 珠海莱坦科技有限公司 一种高度可调的激光投影钟
CN120928653A (zh) * 2020-04-29 2025-11-11 应用材料公司 用于数字光刻的图像稳定化
KR102735589B1 (ko) 2022-03-03 2024-11-27 국립공주대학교 산학협력단 양액 절약이 가능한 양액 재배용 베드

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060110665A1 (en) 2004-11-22 2006-05-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus
JP2006344685A (ja) 2005-06-07 2006-12-21 Canon Inc 露光装置
JP2009016412A (ja) 2007-07-02 2009-01-22 Nikon Corp 計測方法、設定方法及びパターン形成方法、並びに移動体駆動システム及びパターン形成装置
US20110032496A1 (en) 2009-08-07 2011-02-10 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4194160B2 (ja) 1998-02-19 2008-12-10 キヤノン株式会社 投影露光装置
EP1143492A4 (en) 1998-09-03 2004-06-02 Nikon Corp EXPOSURE APPARATUS AND METHOD, DEVICE AND METHOD FOR PRODUCING SAID APPARATUS
JP3862639B2 (ja) 2002-08-30 2006-12-27 キヤノン株式会社 露光装置
EP1469348B1 (en) * 2003-04-14 2012-01-18 ASML Netherlands B.V. Projection system and method of use thereof
JP2005268268A (ja) 2004-03-16 2005-09-29 Canon Inc 電子ビーム露光装置
CN101052916B (zh) * 2004-09-30 2010-05-12 株式会社尼康 投影光学设备和曝光装置
US8953148B2 (en) * 2005-12-28 2015-02-10 Nikon Corporation Exposure apparatus and making method thereof
JP5169221B2 (ja) 2005-12-28 2013-03-27 株式会社ニコン 露光装置及びその製造方法
US20090033895A1 (en) * 2007-07-30 2009-02-05 Nikon Corporation Lithography apparatus with flexibly supported optical system
US8421994B2 (en) 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
NL1036860A1 (nl) * 2008-04-23 2009-10-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL1037639C2 (en) 2010-01-21 2011-07-25 Mapper Lithography Ip Bv Lithography system with lens rotation.

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060110665A1 (en) 2004-11-22 2006-05-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus
JP2006344685A (ja) 2005-06-07 2006-12-21 Canon Inc 露光装置
JP2009016412A (ja) 2007-07-02 2009-01-22 Nikon Corp 計測方法、設定方法及びパターン形成方法、並びに移動体駆動システム及びパターン形成装置
US20110032496A1 (en) 2009-08-07 2011-02-10 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method

Also Published As

Publication number Publication date
WO2013036125A1 (en) 2013-03-14
JP2014534607A (ja) 2014-12-18
KR20140078654A (ko) 2014-06-25
US20130070223A1 (en) 2013-03-21
JP5905581B2 (ja) 2016-04-20
TWI572897B (zh) 2017-03-01
TW201312158A (zh) 2013-03-16
US9268216B2 (en) 2016-02-23

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