KR101801101B1 - 위상반전 블랭크 마스크 및 포토 마스크 - Google Patents

위상반전 블랭크 마스크 및 포토 마스크 Download PDF

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Publication number
KR101801101B1
KR101801101B1 KR1020160107117A KR20160107117A KR101801101B1 KR 101801101 B1 KR101801101 B1 KR 101801101B1 KR 1020160107117 A KR1020160107117 A KR 1020160107117A KR 20160107117 A KR20160107117 A KR 20160107117A KR 101801101 B1 KR101801101 B1 KR 101801101B1
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South Korea
Prior art keywords
film
phase reversal
reversal film
phase
pattern
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KR1020160107117A
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Korean (ko)
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KR20170116926A (ko
Inventor
남기수
신철
이종화
서성민
김세민
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주식회사 에스앤에스텍
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Priority to JP2016224972A priority Critical patent/JP6626813B2/ja
Priority to TW105142272A priority patent/TWI637231B/zh
Priority to CN201710066943.8A priority patent/CN107203091B/zh
Publication of KR20170116926A publication Critical patent/KR20170116926A/ko
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Publication of KR101801101B1 publication Critical patent/KR101801101B1/ko
Priority to JP2019053222A priority patent/JP6876737B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/0046—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
    • H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020160107117A 2016-03-16 2016-08-23 위상반전 블랭크 마스크 및 포토 마스크 Active KR101801101B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2016224972A JP6626813B2 (ja) 2016-03-16 2016-11-18 位相反転ブランクマスク及びフォトマスク
TW105142272A TWI637231B (zh) 2016-03-16 2016-12-20 相移底板掩模和光掩模
CN201710066943.8A CN107203091B (zh) 2016-03-16 2017-02-07 相移底板掩模和光掩模
JP2019053222A JP6876737B2 (ja) 2016-03-16 2019-03-20 位相反転ブランクマスク及びフォトマスク

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20160031239 2016-03-16
KR1020160031239 2016-03-16

Related Child Applications (1)

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KR1020170111732A Division KR20180022620A (ko) 2017-09-01 2017-09-01 위상반전 블랭크 마스크 및 포토 마스크

Publications (2)

Publication Number Publication Date
KR20170116926A KR20170116926A (ko) 2017-10-20
KR101801101B1 true KR101801101B1 (ko) 2017-11-27

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KR1020160107117A Active KR101801101B1 (ko) 2016-03-16 2016-08-23 위상반전 블랭크 마스크 및 포토 마스크

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JP (1) JP6876737B2 (enExample)
KR (1) KR101801101B1 (enExample)
TW (1) TWI637231B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200066178A (ko) 2018-11-30 2020-06-09 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크 블랭크의 제조 방법, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20210116244A (ko) 2020-03-12 2021-09-27 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크 블랭크의 제조 방법, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20210116264A (ko) 2020-03-17 2021-09-27 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크의 제조 방법 및 표시 장치의 제조 방법

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6557381B1 (ja) * 2018-05-08 2019-08-07 エスアンドエス テック カンパニー リミテッド 位相反転ブランクマスク及びフォトマスク
KR102511751B1 (ko) * 2019-11-05 2023-03-21 주식회사 에스앤에스텍 극자외선 리소그래피용 블랭크마스크 및 포토마스크
KR102209617B1 (ko) * 2020-08-26 2021-01-28 에스케이씨 주식회사 블랭크 마스크 및 포토마스크
KR102229123B1 (ko) * 2020-08-31 2021-03-18 에스케이씨솔믹스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR102587396B1 (ko) * 2022-08-18 2023-10-10 에스케이엔펄스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR20250053862A (ko) * 2022-08-30 2025-04-22 호야 가부시키가이샤 반사형 마스크 블랭크, 반사형 마스크 및 그 제조 방법, 그리고 반도체 장치의 제조 방법
JP2025037316A (ja) * 2023-09-06 2025-03-18 東京エレクトロン株式会社 半導体装置の製造方法、及び基板

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5175932B2 (ja) 2008-06-25 2013-04-03 Ｈｏｙａ株式会社 位相シフトマスクブランクおよび位相シフトマスク
KR101282040B1 (ko) * 2012-07-26 2013-07-04 주식회사 에스앤에스텍 플랫 패널 디스플레이용 위상반전 블랭크 마스크 및 포토 마스크

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4525893B2 (ja) * 2003-10-24 2010-08-18 信越化学工業株式会社 位相シフトマスクブランク、位相シフトマスク及びパターン転写方法
KR102071721B1 (ko) * 2010-04-09 2020-01-30 호야 가부시키가이샤 위상 시프트 마스크 블랭크 및 그 제조 방법, 및 위상 시프트 마스크
JP6101646B2 (ja) * 2013-02-26 2017-03-22 Hoya株式会社 位相シフトマスクブランク及びその製造方法、位相シフトマスク及びその製造方法、並びに表示装置の製造方法
JP6396118B2 (ja) * 2014-08-20 2018-09-26 Hoya株式会社 位相シフトマスクブランク及びその製造方法、並びに位相シフトマスクの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5175932B2 (ja) 2008-06-25 2013-04-03 Ｈｏｙａ株式会社 位相シフトマスクブランクおよび位相シフトマスク
KR101282040B1 (ko) * 2012-07-26 2013-07-04 주식회사 에스앤에스텍 플랫 패널 디스플레이용 위상반전 블랭크 마스크 및 포토 마스크

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200066178A (ko) 2018-11-30 2020-06-09 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크 블랭크의 제조 방법, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20230065208A (ko) 2018-11-30 2023-05-11 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20240017031A (ko) 2018-11-30 2024-02-06 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20240165301A (ko) 2018-11-30 2024-11-22 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20210116244A (ko) 2020-03-12 2021-09-27 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크 블랭크의 제조 방법, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20210116264A (ko) 2020-03-17 2021-09-27 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크의 제조 방법 및 표시 장치의 제조 방법

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Publication number Publication date
KR20170116926A (ko) 2017-10-20
TWI637231B (zh) 2018-10-01
JP2019091097A (ja) 2019-06-13
TW201802572A (zh) 2018-01-16
JP6876737B2 (ja) 2021-05-26

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