KR101663759B1 - adapter unit for align photo mask - Google Patents

adapter unit for align photo mask Download PDF

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Publication number
KR101663759B1
KR101663759B1 KR1020160057789A KR20160057789A KR101663759B1 KR 101663759 B1 KR101663759 B1 KR 101663759B1 KR 1020160057789 A KR1020160057789 A KR 1020160057789A KR 20160057789 A KR20160057789 A KR 20160057789A KR 101663759 B1 KR101663759 B1 KR 101663759B1
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KR
South Korea
Prior art keywords
photomask
adapter
seated
jig frame
front side
Prior art date
Application number
KR1020160057789A
Other languages
Korean (ko)
Inventor
김민삼
Original Assignee
주식회사 티엠씨
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Priority to KR1020160057789A priority Critical patent/KR101663759B1/en
Application granted granted Critical
Publication of KR101663759B1 publication Critical patent/KR101663759B1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment

Abstract

The present invention relates to an adapter unit for photomask alignment to check patterns, which is installed in the front and rear of a jig frame (J), on which a target substrate (not schematized) with a pattern is seated, so as to check whether the pattern formed on the target substrate is correct or not. The adapter unit for photomask alignment comprises: a first adapter (10) installed in the front of a jig frame (J) and having a pair of first legs (11, 12), which have first coupling holes (11a, 12a) through which a bolt coupled to the jig frame (J) passes (not schematized), a first table (13) connecting the first legs (11, 12), and a first seating hem (14) formed in the center of an upper side of the first table (13) and on which the underside of the front of a photomask (M) is seated; and a second adapter (20) installed in the rear of the jig frame (J) and having a second leg (21), which has a second coupling hole (21a) through which a bolt coupled to the jig frame (J) passes (not schematized), a second table (23) protruding toward one side of the flank of the second leg (21), and a second seating hem (24) formed on the upper side of the second table (23) and on which the underside of the rear of the photomask (M) is seated.

Description

[0001] The present invention relates to a photo-mask alignment adapter unit for pattern inspection,

The present invention relates to a photomask aligning adapter unit for pattern inspection, and more particularly, to a photomask aligning adapter unit for pattern inspection for inspecting whether a pattern is accurately formed on a substrate such as a wafer or a glass.

In general, a plurality of patterns are formed on a substrate such as a wafer or glass (hereinafter referred to as a substrate to be confirmed) through photolithography in order to manufacture a semiconductor device or an LCD panel. These patterns must be precisely formed since they are electrically connected to a plurality of devices. Therefore, it is necessary to confirm whether or not the patterns are accurately formed after the patterns are formed on the substrate to be inspected.

For this purpose, the photomask on which the confirmation pattern is formed must be accurately transferred to the upper side of the substrate to be identified. At this time, the apparatus for transferring the photomask to the upper portion of the substrate includes a plurality of adapters provided basically on the edge side of the jig frame on which the substrate to be inspected is placed, and a photomask for pattern inspection placed on the adapter, And an air spring for transferring to an aligned position. With this apparatus, the air spring pushes the photomask to transfer it to a specific alignment position on the upper side of the substrate to be inspected, and thereafter, the confirmation pattern formed on the photomask and the pattern formed on the confirmation target substrate are compared with each other using a camera It is confirmed whether or not the pattern is accurately formed on the target substrate.

Prior art related to this is disclosed in Japanese Patent Laid-Open No. 2001-0111048 under the names of alignment method, registration inspection method and photomask.

However, as the process of transferring the photomask is repeated to confirm the pattern, static electricity is generated between the quartz photomask and the adapter, which forms a attraction force to keep the photomask in close contact with the adapter, Even if the spring pushes the photomask, it causes the photomask to not be pressed well. In this case, the photomask is not correctly transferred to the alignment position, and as a result, it is impossible to know whether or not the pattern is accurately formed on the substrate to be checked.

On the other hand, the elastic force can be increased by the air spring in order to push the photomask, but in this case, the photomask is stopped by the static electricity, and suddenly pushed out.

SUMMARY OF THE INVENTION The present invention has been made in order to solve the above problems, and it is an object of the present invention to provide a photomask for pattern inspection which, when transferring a photomask for pattern inspection to a specific alignment position on the upper side of a substrate to be inspected, It is an object of the present invention to provide a photomask alignment adapter unit for inspection.

According to an aspect of the present invention, there is provided a photomask alignment adapter unit for pattern inspection,
As check target substrate (not shown), the pattern is formed is installed in the front and rear of the jig frame (J) that is seated to be a photomask (M) for testing the pattern is correct formed in the check target substrate mounted, the jig A pair of first leg bodies 12 (first leg body 12) provided in front of the frame J and provided with first fastening holes 11a and 12a through which bolts (not shown) fastened to the jig frame J are inserted A first table 13 for connecting the pair of first leg bodies 12 and 13 to each other and a second table 13 for connecting the pair of leg bodies 12 and 13 to each other; A first adapter (10) having a first seating end (14) on which a bottom side is seated; A second leg body 21 provided at a rear side of the jig frame J and having a second fastening hole 21a through which a bolt (not shown) is fastened to the jig frame J; A second table 23 protruding from one side of the side of the second leg body 21 and a second table 23 formed on the top surface of the second table 23, A second adapter (20) having a seating end (24); And a third leg body 31 provided on the other side of the jig frame J and having a third fastening hole 31a through which a bolt (not shown) is fastened to the jig frame J, A third table 33 formed on the front side of the third leg body 31 and another bottom side of the photomask M that is formed on the upper surface of the third table 33 And a third adapter (30) having a third seating end (34)
The first seating end 14 has a first inclined face 14b on which the front side edge of the photomask M is seated and a bottom face of the photomask M via the first inclined face 14b, Wherein the first inclined surface 14b is formed on the front side of the first table 13 facing the second and third adapter sides and the first horizontal surface 14a is formed on the front side of the first table 13, Is located on the rear side of the first table (13);
The second seating end 24 has a second inclined face 24b on which the rear edge of the photomask M is seated and a bottom face of the photomask M via the second inclined face 24b And the second horizontal surface 24a is formed on the front side of the second table 23 facing the third adapter side and the second inclined surface 24b is disposed on the second table 23b, 23);
The third seating end 34 has a third inclined face 34b on which the rear edge of the photomask M is seated and a bottom face of the photomask M via the third inclined face 34b The third horizontal surface 34a is formed on the front side of the third table 33 facing the second adapter side and the third inclined surface 34b is disposed on the third table 33b 33).

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In the present invention, the first seating end 14 is made of an engineering plastic in which static electricity is prevented.

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According to the present invention, since the first, second, and third mounting ends of the first, second, and third adapters include first, second, and third inclined surfaces that are in point contact with corner portions of the photomask, 3 adapter to minimize the generation of static electricity. Accordingly, even if the pattern inspection is repeated to transfer the photomask, static electricity is not generated between the quartz photomask and the first, second, and third adapters, so that the photomask according to the static electricity is kept in close contact with the adapter It is possible to prevent the generation of attraction force, and thus, the air spring is pushed when the photomask M is pushed, so that the photomask can be precisely transferred to a certain alignment position. As a result, whether or not the pattern is accurately formed on the substrate to be confirmed Can be inspected.

The first, second, and third rest positions include the first, second, and third inclined faces that are in point contact with the edge portions of the photomask (M), thereby minimizing the generation of static electricity between the photomask and the first, .

In addition, since the first seating end, which occupies a relatively larger area than the second and third seating ends, is an engineering plastic that prevents the generation of static electricity, the generation of static electricity is prevented during repeated contact of the quartz- As a result, the cause of interruption of the photomask due to static electricity can be eliminated.

And the second and third mounting stages include the second and third horizontal surfaces connected to the second and third inclined surfaces so that the photomask pushed by the air spring can smoothly ride on the second and third horizontal surfaces with the second and third inclined surfaces So that the photomask can be transferred to the correct alignment position.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a diagram illustrating the installation of a photomask aligning adapter unit for pattern inspection according to the present invention in a jig frame;
Fig. 2 is a perspective view illustrating the first adapter of Fig. 1,
3 is a sectional view taken along the line III-III 'of FIG. 2,
FIG. 4 is a perspective view illustrating the second adapter of FIG. 1,
5 is a sectional view taken along the line VV 'in Fig. 4,
FIG. 6 is a perspective view illustrating the third adapter of FIG. 1,
7 is a cross-sectional view taken along line VII-VII 'of FIG. 6;

Hereinafter, a photomask alignment adapter unit for pattern inspection according to the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a diagram illustrating a photomask aligning adapter unit for pattern inspection according to the present invention installed on a jig frame.

As shown in the drawing, the photomask aligning adapter unit for pattern inspection according to the present invention is provided with a front side, a rear side, and a rear side of a jig frame J on which a substrate (not shown) and a first, second and third adapter 10, 20, 30, which is a photomask (M) mounted for inspecting a pattern formed on a substrate to determine the accuracy of which is installed at the other side. That is, on the upper side of the first, second, and third adapters 10, 20, and 30, a pattern inspection photomask M for confirming whether or not an accurate pattern is formed on the substrate to be identified is seated, Is pushed by an air spring (not shown) to be transported to a specific alignment position on the upper side of the substrate to be confirmed. The first, second and third adapters 10, 20 and 30 are realized by applying an anodizing coating to the aluminum block.

FIG. 2 is a perspective view illustrating the first adapter of FIG. 1, and FIG. 3 is a cross-sectional view taken along the line III-III 'of FIG.

The first adapter 10 is provided in front of the jig frame J and has a first fastening hole 11a (not shown) through which a bolt (not shown) fastened to the jig frame J is passed A first table 13 connecting a pair of first leg bodies 11 and 12 with a pair of leg bodies 12 and 12a formed on the first leg 13 and a pair of first leg bodies 11 and 12, And a first seating end 14 on which a front side bottom surface of the photomask M is seated.

The first seating end 14 has a first inclined face 14b on which the front side edge of the photomask M is seated and a second inclined face 14b on which the bottom face of the photomask M via the first inclined face 14b is seated 1 horizontal plane 14a. At this time, the first inclined surface 14b is positioned toward the front side of the first table 13, that is, toward the side of the second and third adapters 20 and 30 as shown in Fig. 1, 1 is located on the rear side of the table 13.

When the front side of the photomask M is seated on the first inclined face 14b by the structure of the first seating end 14, only the corner portion of the photomask M is seated on the first inclined face 14b Since the other flat surface is separated from the first inclined surface 14b, generation of static electricity is suppressed between the photomask M and the first adapter 10. [ When the photomask M is further pushed toward the first horizontal surface 14a side by an air spring (not shown), the bottom surface of the corner portion of the photomask M is seated on the first horizontal surface 14a and the first inclined surface 14b, Lt; / RTI >

At this time, the inclination angle? Of the first inclined plane 14b is inclined at an angle of 1 to 10 degrees with respect to the first horizontal plane 14a, preferably at an inclination angle of 5 degrees.

Even if the edge portion of the photomask M is seated on the first inclined surface 14b when the inclination angle? Of the first inclined surface 14b is within 1 degree with respect to the first horizontal surface 14a, Static electricity may be generated since the interval between the outer edge portion of the first corner M and the first inclined face 14b is narrowed. When the inclination angle? Of the first inclined plane 14b is equal to or larger than 10 degrees with respect to the first horizontal plane 14a, the corner portion of the photomask M is relatively positioned with the first inclined plane 14b The horizontal vector force is applied to the air spring side by an excessive inclination angle, so that even if the air spring pushes the photomask M, the photomask can not be accurately transferred.

On the other hand, the first seating end 14 can be realized by processing an engineering plastic, for example, a non-conductive material, which is prevented from generating static electricity, and then attaching it to the first table 13 made of aluminum. Accordingly, the possibility of static electricity that may occur in the first seating end 14, which occupies a relatively larger area than the second and third seating ends 24 and 34 to be described later, can be further reduced.

FIG. 4 is a perspective view showing the second adapter of FIG. 1, and FIG. 5 is a cross-sectional view taken along the line V-V 'of FIG.

The second adapter 20 is provided at a rear side of the jig frame J and includes a second fastening hole 21a through which a bolt (not shown) is fastened to the jig frame J, A second table 23 protruding to one side of the side of the second leg body 21 and a second table 23 formed on the upper surface of the second table 23, And a second seating end 24 on which the rear side bottom surface of the second seating end 24 is seated.

The second seating end 24 has a second inclined face 24b on which the edge of the photomask M is seated and a second inclined face 24b on which the bottom face of the photomask M via the second inclined face 24b is seated And a horizontal plane 24a. The second horizontal surface 24a is positioned toward the front side of the second table 23, i.e., toward the side of the third adapter 30, and the second inclined surface 24b is positioned toward the second table 23 As shown in Fig.

When the side of the photomask M is seated on the second inclined surface 24b, the edge portion of the photomask M is seated on the second inclined surface 24b by the structure of the second seating end 24, Since the flat surface is separated from the second inclined surface 24b, generation of static electricity between the photomask M and the second adapter 10 is suppressed. When the photomask M is further pushed toward the second horizontal surface 24a by an air spring (not shown), the bottom surface of the edge portion of the photomask M is seated on the second horizontal surface 24a and the second inclined surface 24b, Lt; / RTI >

At this time, the inclination angle? Of the second inclined surface 24b is formed to be 1 to 10 degrees, preferably 5 degrees, on the basis of the second horizontal surface 24a.

Even if the edge portion of the photomask M is seated on the second inclined surface 24b when the inclination angle? Of the second inclined surface 24b is within 1 degree with respect to the second horizontal surface 24a, Static electricity may be generated because the distance between the outer edge portion of the first corner M and the second inclined face 24b is narrowed. When the inclination angle? Of the second inclined surface 24b is equal to or larger than 10 degrees with respect to the second horizontal surface 24a, the edge portion of the photomask M is relatively positioned in the state of being seated on the second inclined surface 24b An excessive horizontal vector force is exerted in the direction opposite to the second horizontal surface 24a due to the excessive inclination angle so that even if the air spring pushes the photomask M, the photomask rides on the second horizontal surface 24a on the second inclined surface 24b, So that it can not be precisely transported.

FIG. 6 is a perspective view illustrating the third adapter of FIG. 1, and FIG. 7 is a cross-sectional view taken along line VII-VII 'of FIG.

As shown in the figure, the third adapter 30 is provided on the other side of the jig frame J, and includes a third fastening hole 31a through which a bolt (not shown) fastened to the jig frame J passes, A third table 33 formed on the front side of the third leg body 31 and a third table 33 formed on the upper surface of the third table 33 as the photomask M, And a third resting end (34) on which the other rear bottom surface of the rear rest is seated.

The third seating end 34 has a third inclined face 34b on which the edge of the photomask M is seated and a third inclined face 34b on which the bottom face of the photomask M via the third inclined face 34b is seated And a horizontal surface 34a. The third horizontal surface 34a is positioned toward the front side of the third table 33, that is, toward the second adapter 20 side as shown in FIG. 1, and the third inclined surface 34b is positioned toward the third table 33 As shown in Fig.

When the rear of the photomask M is seated on the third inclined face 34b by the structure of the third seating end 34, only the edge portion of the photomask M is seated on the third inclined face 34b Since the other surface is separated from the third inclined surface 34b, generation of static electricity is suppressed between the photomask M and the second adapter 10. [ When the photomask M is further pushed toward the third horizontal surface 34a by an air spring (not shown), the bottom portion of the corner portion of the photomask M is seated on the third horizontal surface 34a and the third inclined surface 34b ).

At this time, the inclination angle? Of the third inclined face 34b is formed to be 1 to 10 degrees, preferably 5 degrees, on the basis of the third horizontal face 34a.

Even if the edge portion of the photomask M is seated on the third inclined surface 34b when the inclination angle? Of the third inclined surface 34b is within 1 degree with respect to the third horizontal surface 34a, Static electricity may be generated because the interval between the outer edge portion of the first corner M and the third inclined face 34b is narrowed. When the inclination angle? Of the third inclined face 34b is 10 degrees or more with respect to the third horizontal face 34a, the corner portion of the photomask M is relatively positioned in the state of being seated on the third inclined face 34b The horizontal vector force is applied to the air spring side by an excessive inclination angle so that even if the air spring pushes the photomask M, the photomask M is not precisely conveyed to the third horizontal surface 34a by the third inclined surface 34b I can not.

3, 5, and 7, first, second, and third table inclined surfaces 13a, 23a are formed on the lower sides of the first, second, and third tables 13, 23, (33a) is formed. When the substrate to be identified is positioned between the first, second, and third adapters 10, 20, 30 along the first, second, and third table inclined surfaces 13a, 23a, 33a, The positional movement is limited by the two or three inclined surfaces, and thus the accuracy of the pattern formed on the substrate to be checked can be confirmed more reliably.

As described above, according to the present invention, the first, second, and third mounting ends 14, 24, and 34 of the first, second, and third adapters 10, 20, The first, second, and third inclined surfaces 14b, 24b, and 34b in point contact with the edge portions of the photomask M and the first, second, and third adapters 10, 20, The occurrence of static electricity can be minimized. Accordingly, even if the pattern inspection is repeated to transfer the photomask, static electricity is not generated between the quartz photomask and the first, second, and third adapters, so that the photomask according to the static electricity is kept in close contact with the adapter It is possible to prevent the generation of attraction force and thus the air spring is pushed when the photomask M is pushed so that the photomask M can be accurately transferred to a specific alignment position, Or not.

The first seating end 14, which occupies a relatively larger area than the second and third seating ends 24 and 34, is an engineering plastic that prevents the generation of static electricity. Thus, the process of repeatedly contacting the photomask M The generation of static electricity is further prevented, and the cause of interruption of the photomask due to the static electricity can be more effectively removed.

And the second and third mounting ends 24 and 34 include the second and third horizontal surfaces 24a and 34a connected to the second and third inclined surfaces 24b and 34b, The photomask M can smoothly ride on the second and third horizontal surfaces 24a and 34a on the second and third inclined surfaces 24b and 34b so that the photomask can be transferred to the correct alignment position.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims.

10: first adapter 11, 12: first leg body
11a, 12a ... first fastening hole 13 ... first table
14 ... first seating end 14a ... first horizontal surface
14b ... second inclined surface 20 ... first adapter
21 ... second leg body 21a ... second fastening hole
23 ... second table 24 ... second seating stage
24a ... second horizontal surface 24b ... second inclined surface
30 ... third adapter 31 ... third leg body
31a ... third fastening hole 33 ... third table
34 ... third seating stage 34a ... third horizontal plane
34b ... third inclined surface

Claims (7)

As check target substrate (not shown), the pattern is formed is installed in the front and rear of the frame jig (J) that is seated to be a photomask (M) for checking the accuracy of the pattern is formed in the check target substrate loading,
A pair of first leg bodies 12 (12a, 12b) are provided in front of the jig frame (J) and are provided with first fastening holes (11a, 12a) through which bolts (not shown) fastened to the jig frame A first table 13 for connecting the pair of first leg bodies 12 and 13 to each other and a second table 13 for connecting the pair of first leg bodies 12 and 13 to each other; (10) having a first seating end (14) on which the front side bottom surface of the first adapter (10) is seated;
A second leg body 21 provided at a rear side of the jig frame J and having a second fastening hole 21a through which a bolt (not shown) is fastened to the jig frame J; A second table 23 protruding from one side of the side of the second leg body 21 and a second table 23 formed on the top surface of the second table 23, A second adapter (20) having a seating end (24); And
A third leg body 31 provided at a rear side of the jig frame J and having a third fastening hole 31a through which a bolt (not shown) is fastened to the jig frame J; A third table 33 formed on the front side of the third leg body 31 and a second table 33 formed on the upper surface of the third table 33 and having the other rear side bottom surface of the photomask M And a third adapter (30) having three seating ends (34)
The first seating end 14 has a first inclined face 14b on which the front side edge of the photomask M is seated and a bottom face of the photomask M via the first inclined face 14b, Wherein the first inclined surface 14b is formed on the front side of the first table 13 facing the second and third adapter sides and the first horizontal surface 14a is formed on the front side of the first table 13, Is located on the rear side of the first table (13);
The second seating end 24 has a second inclined face 24b on which the rear edge of the photomask M is seated and a bottom face of the photomask M via the second inclined face 24b And the second horizontal surface 24a is formed on the front side of the second table 23 facing the third adapter side and the second inclined surface 24b is disposed on the second table 23b, 23);
The third seating end 34 has a third inclined face 34b on which the rear edge of the photomask M is seated and a bottom face of the photomask M via the third inclined face 34b The third horizontal surface 34a is formed on the front side of the third table 33 facing the second adapter side and the third inclined surface 34b is disposed on the third table 33b 33). ≪ RTI ID = 0.0 > 11. < / RTI > delete The method according to claim 1,
Wherein the first seating end (14) is made of an engineering plastic that is prevented from generating static electricity. delete delete delete delete
KR1020160057789A 2016-05-11 2016-05-11 adapter unit for align photo mask KR101663759B1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05136233A (en) * 1991-11-12 1993-06-01 Seiko Epson Corp Photomask automatic carrier device and phtomask inspection device
JPH0545711U (en) * 1991-07-22 1993-06-18 宮城沖電気株式会社 Photomask holding jig
JP2004191661A (en) * 2002-12-11 2004-07-08 Topcon Corp Mask frame and aligner
JP2005156924A (en) * 2003-11-26 2005-06-16 Toppan Printing Co Ltd Holder for inspection apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0545711U (en) * 1991-07-22 1993-06-18 宮城沖電気株式会社 Photomask holding jig
JPH05136233A (en) * 1991-11-12 1993-06-01 Seiko Epson Corp Photomask automatic carrier device and phtomask inspection device
JP2004191661A (en) * 2002-12-11 2004-07-08 Topcon Corp Mask frame and aligner
JP2005156924A (en) * 2003-11-26 2005-06-16 Toppan Printing Co Ltd Holder for inspection apparatus

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