KR101643139B1 - A drain pocket of the exhaust pipe for semiconductor production equipment - Google Patents

Abstract

Provided is a drain pocket of an exhaust pipe for semiconductor production equipment, which collects condensate water or sludge contained in exhaust gas passing the exhaust pipe and is configured to easily discharge the collected condensate water and sludge, not making the same remain inside the exhaust pipe, thereby reliably processing the condensate water or sludge contained in the exhaust gas. The drain pocket of an exhaust pipe includes a joint pipe that is connected to the exhaust pipe configured to discharge exhaust gas produced in a semiconductor manufacturing process to the outside, and a cover that is coupled to the joint part to seal a lower part part of the joint pipe and has an outlet connected to a drain pipe in a lower part. A part of the cover between a part coupled to the joint pipe and a part where the outlet exists is formed into an inclined side descending toward the outlet, thus allows the collected matter collected via the joint pipe to fall free and be discharged through the outlet.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a drain pocket for a semiconductor manufacturing facility,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a drain pocket of an exhaust pipe for a semiconductor manufacturing facility, which is provided in an exhaust pipe for discharging exhaust gas generated in semiconductor manufacturing and collects condensed water or sludge to be discharged separately, The condensed water or the sludge contained in the exhaust gas can be collected and collected, and the condensed water and the sludge collected therein can be easily discharged without being accumulated therein, so that the condensed water or sludge contained in the exhaust gas can be stably treated. Drain pockets.

Generally, in the semiconductor manufacturing process and the LCD manufacturing process, gas piping for various gas supply facilities for supplying stable and safe various kinds of reaction gases in a certain quality state to a process chamber in a clean room section is essential Respectively.

Typically, the gas supplied through the gas supply facility of the semiconductor and LCD manufacturing processes includes a generic gas called the "bulk gas" and a special material gas called the "process gas".

For example, the bulk gas is predominantly a common gas that is consumed in a relatively large amount, such as dry air, nitrogen, oxygen, hydrogen, argon, helium, etc., and the process gas is a gas such as monosilane, phosphine, nitrogen trifluoride, Special material gas is dominant.

Particularly, in the case of the process gas, unreacted gas and subsidiary gas are discharged. Therefore, toxicity, corrosiveness and flammability are very strong, so that a harmful gas such as a vacuum pump or an exhaust gas treatment device (scrubber) It must be purified into a harmless state and released into the atmosphere.

That is, since the exhaust gas emitted from the semiconductor manufacturing and the like is toxic, explosive, and corrosive, it not only poses a risk to the human body but also causes environmental pollution when the exhaust gas is discharged to the atmosphere. It must be purified and discharged.

As described above, the gas scrubber applied to purify the exhaust gas generated during semiconductor manufacturing generally refers to an apparatus for treating gas discharged from a manufacturing process of a semiconductor or a flat panel display or a chemical treatment process. Dry gas scrubbers, flue gas scrubbers, and wet gas scrubbers. In addition, modified products such as combustion, wet or mixed combustion and dry are also produced.

A commonly used gas scrubber is a wet gas scrubber that purifies and cools by spraying water into a gas passing through a chamber. The wet gas scrubber has advantages of being simple and easy to manufacture with a simple process, and capable of increasing the capacity

In Korean Patent Laid-Open Publication No. 10-2005-0069674 (name: a gas purifier and a gas purifying method of a wet scrubber), as known in the art, a scrubber body in which a water tank is installed is provided with a gas inlet at an upper portion, A nitrogen / air inlet is installed in the water tank, and a bubble grinding screw operated by a screw spin motor is installed in the water tank to dilute the water bubbles in the water tank to dilute the water and discharge the gas to the exhaust line through the purge gas outlet A purification device is described.

In addition, as disclosed in Korean Patent Publication No. 10-2009-0131768 (name: a waste gas treatment apparatus in a semiconductor manufacturing process), there is a dry treatment section for heating the waste gas, a high-temperature treatment section provided at one side of the dry treatment section, And a scrubber comprising a main duct connected to one side of the wet treatment unit for discharging waste gas after the reaction with water, and a main duct, wherein the exhaust pipe is connected to the exhaust pipe A main body frame having an inlet port and an outlet port for connection; A moisture remover for removing corrosive water contained in the waste gas flowing through the inlet; A demister for preventing the smooth flow of the waste gas passing through the water removal unit and the inflow of water; And a chemical reaction unit for removing the corrosive noxious gas contained in the waste gas that has passed through the demister.

Further, in Korean Patent Laid-Open Publication No. 10-2014-0001333 (name: gas scrubber), as known in the art, in a gas scrubber for collecting the water-soluble gas and the particulate matter of the waste gas by bringing the waste gas into contact with water A tank for storing the wastewater into which the water-soluble gas and particulate matter have been collected; And a circulation pump for circulating the wastewater stored in the tank.

On the other hand, the exhaust gas that has been purified through the gas scrubber is discharged to the outside through the exhaust pipe.

In Korean Patent Laid-Open No. 10-2002-0006275 (entitled "Exhaust Device for Semiconductor Device Manufacturing"), as known in the art, an exhaust duct for discharging unnecessary gas generated in semiconductor device manufacturing to the outside of the process chamber is formed An exhausting device for manufacturing a semiconductor device is provided in a predetermined region inside the process chamber, and an air blowing portion that uses unnecessary gas ejected from the gas ejection port toward the exhaust duct.

Thus, the exhaust gas that has been purified through the gas scrubber is discharged to the outside through the exhaust pipe constituting the exhaust device. At this time, the condensed water or the sludge contained in the exhaust gas must be collected separately from the exhaust pipe.

In other words. It is preferable that dew condensation occurs in the exhaust pipe due to condensed water or sludge contained in the exhaust gas so that the exhaust efficiency is not lowered.

On the other hand, in Korean Patent Registration No. 10-1025881 (name: a liquid collecting apparatus), as known in the art, a corrosive liquid component or the like is generated in a fluid treated in a scrubber or the like for removing waste gas generated in a semiconductor manufacturing process or the like The present invention relates to an apparatus for collecting a liquid contained in a liquid contained in a liquid contained in a liquid contained in a liquid, And an exhaust pipe disposed in the direction opposite to the inlet pipe and discharging the fluid, wherein the collecting container is attached to the upper portion of the inlet pipe and extends to a predetermined diameter region of the inlet pipe A lower wing plate spaced apart from the upper wing plate; a collecting net connected to one end of the lower wing plate; In it made to include a contact member on the three-dimensional network formed of a.

Such a liquid collecting device is directly connected to the scrubber to collect the liquid, and there is a problem in that the condensing water or the sludge can not be collected from the exhaust gas moving through the exhaust pipe.

As shown in Figs. 1 and 2, the general configuration of the drain pocket 1, which is connected to the exhaust pipe 2 through which the exhaust gas passes and drains and discharges the condensed water or sludge generated in the exhaust pipe 2, .

The drain pocket 1 includes a connection pipe 10 which is connected at a right angle to the longitudinal direction of the exhaust pipe 2 and a cover 20 which is connected to the lower end of the connection pipe 10 and has an outlet 21 at a lower portion thereof. Shaped cylinder which includes a cylindrical body 20 and a space for collecting condensed water and sludge condensed in the exhaust gas passing through the exhaust pipe 2 and accommodating therein.

That is, the condensed water and the sludge are collected through the connection pipe 10, and then discharged to the outside through a drain pipe 3 connected to the outlet 21 of the cover 20.

In this case, the cover 20 is formed of a plate shaped plate that closes the lower portion of the connection pipe 10 and has the outlet 21 formed at the center thereof.

The connection pipe 10, the cover 20, and the drain pipe 3 are formed with flanges which are respectively screwed and screwed together.

On the other hand, the exhaust pipe (2) and the coupling pipe (10) are mainly connected by welding.

1, Korean Patent Publication No. 10-2005-0069674 2, Korean Patent Publication No. 10-2009-0131768 3, Korean Patent Publication No. 10-2014-0001333 4, Korean Patent Publication No. 10-2002-0006275 5, Korean Patent Registration No. 10-1025881

However, the above conventional drain pockets perform the function of collecting the condensed water and the sludge generated in the exhaust gas passing through the exhaust pipe, but the collected condensed water and the sludge are stuck or adhered to the bottom surface of the cover, There is a problem in that discharge to the drain pipe connected to the drain pipe is not easily performed.

Accordingly, there is a problem that dew condensation occurs due to the condensed water and the sludge collected in the drain pocket, resulting in low exhaust efficiency.

SUMMARY OF THE INVENTION It is an object of the present invention to provide an exhaust gas purifying apparatus capable of collecting condensed water or sludge contained in exhaust gas passing through an exhaust pipe without trapping collected condensed water and sludge therein So that the condensed water or the sludge contained in the exhaust gas can be stably treated.

The drain pocket of the exhaust pipe for a semiconductor manufacturing facility according to the present invention has a connection pipe connected to an exhaust pipe for discharging the exhaust gas discharged from the semiconductor manufacturing process to the outside, And a cover having an outlet connected to the drain pipe at a lower portion thereof, the drain pocket of the exhaust pipe for a semiconductor manufacturing facility comprising: Wherein a portion of the cover which is engaged with the connection pipe and a portion of the outlet where the outlet is positioned is inclined in an inclined direction in the outlet side direction so that the collected product collected through the connection pipe drops freely into the outlet, .

delete

delete

The drain pocket of the exhaust pipe for a semiconductor manufacturing facility according to the present invention as described above collects the collected water such as condensed water or sludge contained in the exhaust gas passing through the exhaust pipe through the connecting pipe, It is possible to freely fall on the inclined surface and to drain the collected collected material easily without being accumulated in the drain pipe.

Accordingly, the condensed water or the sludge contained in the exhaust gas can be collected through the connection pipe and can be stably drained, thereby improving the exhaust efficiency.

1 and 2 are schematic views showing a drain pocket of an exhaust pipe for a general semiconductor manufacturing facility;
3 to 5 are schematic views showing a drain pocket of an exhaust pipe for a semiconductor manufacturing facility according to an embodiment of the present invention;
6 is a schematic view showing another example of a cover applied to a drain pocket of an exhaust pipe for a semiconductor manufacturing facility according to the present embodiment.
7 is a schematic view showing a drain pocket of an exhaust pipe for a semiconductor manufacturing facility according to another embodiment of the present invention;
8 is a schematic view showing a drain pocket of an exhaust pipe for a semiconductor manufacturing facility according to another embodiment of the present invention.

Hereinafter, a drain pocket of an exhaust pipe for a semiconductor manufacturing facility according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings.

The embodiments of the present invention can be modified in various forms, and the scope of the present invention should not be construed as being limited to the embodiments described in detail below. This embodiment is provided to more fully describe the present invention to those skilled in the art. Therefore, the shapes and the like of the elements in the drawings can be exaggeratedly expressed to emphasize a clearer description. It should be noted that in the drawings, the same members are denoted by the same reference numerals. Detailed descriptions of well-known functions and constructions which may be unnecessarily obscured by the gist of the present invention are omitted.

3 to 5 are views showing a drain pocket of an exhaust pipe for a semiconductor manufacturing facility according to an embodiment of the present invention. In the drain pocket 1 according to the present embodiment, A cover 10 having a connection pipe 10 connected to an exhaust pipe 2 to be discharged to the outside and an outlet 21 connected to the drain pipe 3 at a lower portion while closing the lower portion of the connection pipe 10 20).

In other words, a 'barrel' shaped tubular shape is formed between the connecting pipe 10 and the cover 20 to form a space for collecting and storing condensed water and sludge condensed in the exhaust gas passing through the exhaust pipe 2 Respectively.

Accordingly, after the collected water such as condensed water, sludge and the like is collected through the connection pipe 10, the collected water is discharged to the outside through the drain pipe 3 connected to the outlet 21 of the cover 20.

In this case, it is preferable that the cover (20) is formed with the outlet (21) at the center with the lower part of the connection pipe (10) closed.

The exhaust pipe 2 and the connection pipe 10 are connected to each other by a flange formed to be screwed to the connection pipe 10 and the cover 20 and the drain pipe 3, , It is most preferable to bond them through welding, but the present invention is not limited thereto.

In the drain pocket 1 according to the present embodiment, a portion of the cover 20, which engages with the connection pipe 10, and a portion where the outlet 21 is located, As shown in Fig.

That is, collecting such as condensed water or sludge contained in the exhaust gas passing through the exhaust pipe 2 through the connection pipe 10, and collecting the collected collected matter on the inclined surface 22, So that the collected collected matter is easily discharged to the drain pipe 3 without being accumulated therein.

Accordingly, the condensed water or the sludge contained in the exhaust gas can be collected through the connection pipe 10 and can be stably drained. As a result, condensation or the like does not occur and the exhaust efficiency is increased.

The inclined surface 22 may be hemispherical as shown in FIG. 5, and may be formed in a square shape as shown in FIG. 6, and may be formed into a square hopper shape. .

FIG. 7 is a view showing a drain pocket of an exhaust pipe for a semiconductor manufacturing facility according to another embodiment of the present invention. The drain pocket 1 according to this embodiment has a lower end fixed to the bottom surface of the cover 20 And a collecting means (30) having an upper end penetrating into the exhaust pipe (2).

That is, the contact area with the exhaust gas passing through the exhaust pipe (2) is increased through the collecting means (30) to collect the condensed water and the sludge more smoothly.

The collecting means 30 includes a rod-like fixing rod (not shown) which is coupled to a fixing piece 23 whose lower end extends from the bottom surface of the cover 20 and whose upper end is inserted through the inside of the exhaust pipe 2 31 and a spiral collecting plate 32 formed of a plate-like plate provided spirally on the outer circumferential surface of the fixing rod 31.

Accordingly, the exhaust gas passing through the exhaust pipe 2 contacts the collecting plate 32 to promote the generation of condensed water and sludge, and the generated condensed water and sludge are burned on the plate surface of the helical collecting plate 32 Is led to the bottom surface of the cover (20) and then drained to the drain pipe (3) through the outlet (21).

Therefore, the condensed water, the sludge, and the like contained in the exhaust gas passing through the exhaust pipe 2 can be collected more smoothly and can be drained.

FIG. 8 is a view showing a drain pocket of an exhaust pipe for a semiconductor manufacturing facility according to another embodiment of the present invention. In the drain pocket 1 according to the present embodiment, A reservoir 43 provided with an inlet 41 for receiving a supply and a discharge port 42 for discharging to the outside and a water level sensor 43 installed inside the reservoir 43 for detecting the level of the water, (41) provided in an inlet (41) of the reservoir (43) and adapted to open and close the inlet (41) under the control of the control means (5) And a drain valve (46) provided in a discharge port (42) of the reservoir (43) for opening and closing the discharge port (42) under the control of the control means (50) 40).

That is, normally, the shutoff valve 45 is opened and the drain valve 46 is closed so that the collected water collected in the connection pipe 10 flows into the reservoir 43 via the drain pipe 3, Lt; RTI ID = 0.0 >

Therefore, while collecting the condensed water and the sludge from the exhaust gas through the connection pipe 10, the exhaust gas passing through the exhaust pipe 2 is not discharged to the outside via the connection pipe, Thereby exhausting the exhaust gas more stably.

When the water level of the primary stored in the storage container 43 reaches a predetermined water level, the water level detected by the detection sensor 44 is detected by the control unit 50, The shutoff valve 45 is closed, the drain valve 46 is opened, and the collected product stored in the storage container 43 is drained to the outside.

Accordingly, the exhaust pipe 2, the connecting pipe 10, and the drain pipe 3 are not communicated with the outside while the stored product stored in the storage container 43 is discharged to the outside, Is exhausted to the outside through the normal exhaust pipe line without being exhausted to the outside through the connection pipe 10. [

Therefore, the exhaust gas is more stably exhausted.

As described above, the drain pocket 1 of the exhaust pipe for a semiconductor manufacturing facility according to the present embodiment has the bottom surface of the cover 20 connected to the drain pipe 3 formed of the inclined surface 22, So that the condensation does not occur as the collected water drops through the drain pipe (3) without being suspended in the inside.

It will be apparent to those skilled in the art that various modifications and equivalent arrangements may be made therein without departing from the scope of the present invention as defined by the appended claims and their equivalents. . Therefore, it is to be understood that the present invention is not limited to the above-described embodiments. Accordingly, the true scope of the present invention should be determined by the technical idea of the appended claims. It is also to be understood that the invention includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention as defined by the appended claims.

1: drain pocket 2: exhaust pipe
3: Water pipe 10: Connector
20: cover 21: outlet
22: inclined surface 23:
30: Collecting means 31: Fixing rod
32: collecting plate 40: drainage means
41: inlet 42: outlet
43: reservoir 44: detection sensor
45: shutoff valve 46: drain valve
50: control means

Claims (3)

A connection pipe (10) connected to an exhaust pipe (2) for exhausting the exhaust gas discharged from a semiconductor manufacturing process to the outside; And an outlet 21 connected to the drain pipe 3 at a lower portion thereof and connected to the connecting pipe 10 and a portion between the portion where the outlet 21 is located A cover (20) comprising an inclined surface (22) inclined in the direction of the outlet (21); And a lower end connected to a fixing piece 23 extending from a bottom surface of the cover 20 and having an upper end penetrating the inside of the exhaust pipe 2, And a collecting means (30) composed of a helical collecting plate (32) composed of a plate-like plate provided spirally on an outer circumferential surface of the drain pipe (31).
(43) having an inlet (41) for receiving the collected material from the drain pipe (3) and an outlet (42) for discharging the collected material to the outside, A sensing sensor 44 for sensing the level of the collected water and applying the sensed level data of the collected water to the control means 50 and a control means 50 provided in the inlet 41 of the storage tank 43 for controlling the control means 50 A shutoff valve 45 for opening and closing the inlet 41 according to the control of the control means 50 and a shutoff valve 45 provided in the outlet 42 of the storage 43 to open and close the outlet 42, Further comprising drainage means (40) including a drain valve (46). delete delete

Images