KR20140001333A - Gas scrubber - Google Patents

Gas scrubber Download PDF

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Publication number
KR20140001333A
KR20140001333A KR1020120068346A KR20120068346A KR20140001333A KR 20140001333 A KR20140001333 A KR 20140001333A KR 1020120068346 A KR1020120068346 A KR 1020120068346A KR 20120068346 A KR20120068346 A KR 20120068346A KR 20140001333 A KR20140001333 A KR 20140001333A
Authority
KR
South Korea
Prior art keywords
gas
water
tank
waste
wastewater
Prior art date
Application number
KR1020120068346A
Other languages
Korean (ko)
Inventor
신종섭
Original Assignee
주식회사 티씨케이
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 티씨케이 filed Critical 주식회사 티씨케이
Priority to KR1020120068346A priority Critical patent/KR20140001333A/en
Publication of KR20140001333A publication Critical patent/KR20140001333A/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • C02F1/5209—Regulation methods for flocculation or precipitation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F2001/007—Processes including a sedimentation step
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/22—Eliminating or preventing deposits, scale removal, scale prevention

Abstract

The present invention relates to a gas scrubber, comprising: a gas scrubber in which waste gas is brought into contact with water to collect water-soluble gas and particulate matter of the waste gas, the tank for storing waste water in which the water-soluble gas and particulate matter are collected; It includes a circulation pump for circulating the waste water stored in the tank. The present invention prevents the formation of sediment by adding a circulating pump to the sump collecting the wastewater, thereby reducing the amount of the neutralizing solution for neutralizing the wastewater and reducing the neutralization time.

Description

Gas scrubber

The present invention relates to a gas scrubber, and more particularly, to a gas scrubber capable of reducing the amount of neutralizing agent used and preventing deposits from remaining.

In general, waste gases emitted from chemical processes or semiconductor manufacturing are highly toxic, explosive, and corrosive, which not only harms the human body, but also causes pollution when waste gases are released into the atmosphere. Purify and discharge.

Gas scrubber generally refers to a device for treating gases emitted from semiconductor or flat panel display manufacturing and chemical treatment processes. The gas scrubber is classified into a dry gas scrubber, a combustible gas scrubber, and a wet gas scrubber. Modified products are also produced, such as wet or combustible and dry blends.

In general, a widely used gas scrubber is a wet gas scrubber that purifies and cools by spraying water on a gas passing through the chamber, and a wet gas scrubber has an advantage of being easy to manufacture and large-capacity with a simple process and a simple structure.

The structure of such a gas scrubber is described in detail in Patent No. 10-1064661. However, the conventional wet gas scrubber has a problem in that the waste gas is sprayed with water to obtain wastewater, and in the process of discharging the wastewater by neutralization and purification, sediment is generated in the wastewater and neutralization and purification are not easy.

Waste gas dissolved in water injected into the first tank 119 shown in FIG. 3 of FIG. 10 is stored, which is described as being discharged through the drain pipe 114. However, the wastewater that substantially dissolved the waste gas containing acid has a very high acidity, and since a large amount of sediment is generated, it needs to be treated again after draining.

However, when the precipitate remains in the form of sludge, it is difficult to drain all of the precipitate, it is difficult to neutralize according to the solidification of the drained sediment, and thus there is a problem in that the consumption of the neutralizing agent is large, and the neutralization treatment takes a long time.

SUMMARY OF THE INVENTION An object of the present invention for solving the above problems is to provide a gas scrubber which is easier to treat wastewater treated with waste gas.

In addition, another object of the present invention is to provide a gas scrubber that can reduce the time and cost required for neutralization.

The gas scrubber of the present invention for achieving the above object is a gas scrubber in which the waste gas is brought into contact with water to collect the water-soluble gas and particulate matter of the waste gas, and the waste water collected by collecting the water-soluble gas and particulate matter is stored. And a circulation pump for circulating the wastewater stored in the tank.

The present invention, by adding a circulating pump to the sump collecting the waste water to prevent the formation of sediment, it is possible to reduce the amount of the neutralizing liquid for neutralizing the waste water, and to shorten the neutralization treatment time.

1 is a block diagram of a gas scrubber according to a preferred embodiment of the present invention.
2 is an exemplary view showing an example in which wastewater rotates in one direction in a tank by using a circulation pump.

Hereinafter, the configuration and operation of the gas scrubber according to the preferred embodiment of the present invention will be described in detail.

1 is a block diagram of a gas scrubber according to a preferred embodiment of the present invention.

Referring to FIG. 1, a gas scrubber according to an exemplary embodiment of the present invention includes an injection space part 10 having an injection nozzle 11 for injecting water supplied through a water supply pipe 13, and a waste gas inflow pipe ( 31, a dust collecting part 20 for collecting the waste gas introduced through the injection nozzle 11 in contact with the water sprayed from the injection nozzle 11 and a waste water 32 in which the acid or base components of the waste gas are collected by the dust collecting part 20. The tank 30 and the circulation pump 40 for circulating the waste water 32 stored in the tank 30.

Hereinafter, the configuration and operation of the gas scrubber according to the preferred embodiment of the present invention configured as described above will be described in more detail.

First, the waste gas is introduced into the upper side of the tank 30 through the waste gas inlet pipe 31 connected to the side of the lower tank 30 of the dust collector 20. At this time, the injection nozzle 11 is supplied with water such as groundwater through the water supply pipe 13 is injected toward the upper part of the dust collecting unit 20.

The gas introduced into the upper side of the tank 30 is supplied to the upper dust collecting unit 20, wherein water-soluble gas containing acid or base and other particulate matter are collected in the water sprayed from the injection nozzle 11 do.

The dust collecting unit 20 is to increase the contact area and time of the waste gas and water, so that dust collection can occur more easily, is usually filled with particulate polling.

As described above, the gas in which the water-soluble gas and the particulate matter are collected is exhausted through the exhaust pipe 12, and various purification treatments may be performed as necessary.

Waste water, which is water containing the water-soluble gas and particulate matter, is stored in the tank 30. At this time, the wastewater stored in the tank 30 shows a strong base or strong acidity according to the type of the water-soluble gas, and precipitates may be generated by the reaction of the particulate matter and the water-soluble gas.

In order to prevent the occurrence of such deposits, the wastewater 32 is rapidly circulated in the tank 30 by the circulation pump 40.

2 shows an example in which the wastewater 32 rotates in one direction in the tank 30 by the use of the circulation pump 40. As such, while the wastewater 32 is continuously circulated, no sediment is deposited at the bottom of the tank 30.

In addition, the wastewater 32 exhibits strong acidity or strong basicity and needs to be neutralized. The tank 30 is provided with a neutralizing agent inlet tube 34 through which a neutralizing agent can be introduced, and neutralizes the wastewater 32 by adding the neutralizing agent.

At this time, the wastewater 32 is rotated by the circulation pump 40 so that the neutralizing agent can be evenly mixed with the whole wastewater. As described above, since there is no sediment, the wastewater 32 is relatively treated under the same conditions. The amount of neutralizing agent can be reduced.

In addition, since the wastewater 32 to which the neutralizing agent is introduced is circulated, the time required for neutralization can be shortened.

The neutralized wastewater 32 is supplied to the injection nozzle 11 through the pump 33 or discharged through the drain pipe 35.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, And this also belongs to the present invention.

10: spray nozzle unit 11: spray nozzle
12: Exhaust pipe 13: Water supply pipe
20: dust collecting part 30: tank
31: waste gas inlet pipe 32: waste water
33: pump 34: neutralizer input pipe
35: drain pipe 40: circulation pump

Claims (2)

In the gas scrubber which collects the water-soluble gas and particulate matter of the waste gas by contacting the waste gas in water,
A tank for storing wastewater collected by collecting the water-soluble gas and particulate matter; And
Gas scrubber comprising a circulation pump for circulating the waste water stored in the tank.
The method of claim 1,
Gas scrubber further comprises a neutralizing agent supply pipe for introducing a neutralizing agent into the tank.

KR1020120068346A 2012-06-26 2012-06-26 Gas scrubber KR20140001333A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020120068346A KR20140001333A (en) 2012-06-26 2012-06-26 Gas scrubber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020120068346A KR20140001333A (en) 2012-06-26 2012-06-26 Gas scrubber

Publications (1)

Publication Number Publication Date
KR20140001333A true KR20140001333A (en) 2014-01-07

Family

ID=50138868

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120068346A KR20140001333A (en) 2012-06-26 2012-06-26 Gas scrubber

Country Status (1)

Country Link
KR (1) KR20140001333A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101643139B1 (en) 2015-12-28 2016-07-27 주식회사 우진아이엔에스 A drain pocket of the exhaust pipe for semiconductor production equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101643139B1 (en) 2015-12-28 2016-07-27 주식회사 우진아이엔에스 A drain pocket of the exhaust pipe for semiconductor production equipment

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E902 Notification of reason for refusal
E601 Decision to refuse application