KR101642898B1 - Photo-Aligment processing Device - Google Patents

Photo-Aligment processing Device Download PDF

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KR101642898B1
KR101642898B1 KR1020140137520A KR20140137520A KR101642898B1 KR 101642898 B1 KR101642898 B1 KR 101642898B1 KR 1020140137520 A KR1020140137520 A KR 1020140137520A KR 20140137520 A KR20140137520 A KR 20140137520A KR 101642898 B1 KR101642898 B1 KR 101642898B1
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substrate
traveling
substrate support
alignment treatment
photo
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KR20150137951A (en
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키요시 미즈노야
신이치로 우노
타카히로 후쿠나가
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가부시키가이샤이이누마게이지세이사쿠쇼
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67715—Changing the direction of the conveying path

Abstract

본 발명은 기판(S)에 형성되어 있는 배향막에 자외선을 조사함으로써, 배향막을 배향처리하는 광배향 처리장치(1)에 관한 것이다. 광배향 처리장치는, 기판을 지지하는 복수의 기판지지체(7)와, 각각의 기판지지체를 동일한 주행경로(RR)를 따라서 주행시키는 주행기구(5)와, 주행경로를 따라서 주행하는 기판지지체에 의하여 지지되어 있는 기판에 대하여 자외선을 조사하는 자외선 조사장치(9)와, 주행하고 있는 기판지지체끼리가 충돌하지 않도록, 기판지지체를 상기 주행경로로부터 퇴피시키는 퇴피기구(11)를 구비한다.The present invention relates to an optical alignment processing apparatus (1) for aligning an alignment film by irradiating an alignment film formed on a substrate (S) with ultraviolet rays. The optical alignment treatment apparatus comprises a plurality of substrate supports 7 for supporting a substrate, a traveling mechanism 5 for traveling the respective substrate supports along the same traveling route RR, And a retraction mechanism (11) for retracting the substrate support from the traveling path so that the traveling substrate supports do not collide with each other. The ultraviolet ray irradiation device (9) irradiates ultraviolet rays to the substrate supported by the substrate support.

Description

광배향 처리장치{Photo-Aligment processing Device}[0002] Photo-Alignment Processing Device [0003]

본 발명은 액정표시소자의 제조에 이용하는 광배향 처리장치, 또한 상세하게는, 자외선 조사에 의한 배향막의 광배향 처리에 이용하는 광배향 처리장치에 관한 것이다.The present invention relates to an optical alignment processing apparatus used for manufacturing a liquid crystal display element, and more particularly to an optical alignment processing apparatus used for optical alignment processing of an alignment film by ultraviolet irradiation.

종래, 액정표시소자에서는, 전기장 등의 작용에 의하여 액정의 분자배열의 상태를 변화시키고, 이러한 변화를 광학적으로 이용함으로써 표시에 활용하고 있다. 액정을 특정 방향으로 배열시키기 위하여 배향처리가 실시되는데, 근래 편광자외선을 배향막에 조사하여 배향처리를 행하는 광배향 처리가 행해지고 있다.Heretofore, liquid crystal display devices have been used for display by changing the state of the molecular arrangement of the liquid crystal due to the action of an electric field or the like, and making such changes optically. An alignment treatment is performed in order to arrange the liquid crystal in a specific direction. Recently, a photo alignment treatment has been carried out in which an alignment film is irradiated with polarized ultraviolet rays to perform alignment treatment.

종래의 광배향 처리장치(1)는, 도 5에 나타내는 바와 같이, 그 표면에 배향막이 형성되어 있는 기판(S)을 재치한 기판지지체(7)를, 기초대(3) 상에 있어서, 기초대(3)에 고정된 광원과 편광판으로 구성되는 자외선 조사장치(9)의 아래를, 예를 들어 리니어 모터 등에 의한 공지의 구동기구에 의하여 화살표(MD) 방향으로 주행시킨다. 그 결과, 자외선 조사장치(9)의 아래를 반송하는 기판(S)이 자외선을 조사 받음으로써 배향처리된다.5, the conventional photo-alignment processing apparatus 1 includes a substrate support 7 on which a substrate S having an alignment film formed on its surface is placed on a foundation table 3, The lower part of the ultraviolet irradiating device 9 composed of the light source fixed to the table 3 and the polarizing plate is caused to run in the direction of the arrow MD by a known driving mechanism such as a linear motor. As a result, the substrate S carrying the lower part of the ultraviolet irradiator 9 is subjected to the alignment treatment by being irradiated with ultraviolet rays.

종래의 광배향 처리장치에서는, 기판을 연속적으로 배향처리할 수 없으므로, 1개의 기판을 배향처리하는 데에 필요한 시간인 택트타임이 길기 때문에, 생산성이 낮다는 문제가 있다.In the conventional photo-alignment processing apparatus, since the substrate can not be continuously aligned, there is a problem that the productivity is low because the tact time, which is a time required for aligning one substrate, is long.

그래서, 2개의 기판지지체(스테이지)를 구비하는 광배향 처리장치가 제안되어 있다(예를 들어, 특허문헌 1을 참조). 이러한 광배향 처리장치는, 도 5에 나타낸 1개뿐인 기판지지체를 가지는 광배향 처리장치와 비교하여, 한쪽 기판지지체 상에서 기판을 광배향 처리하면서, 다른 쪽 기판지지체 상에서 기판의 교체 작업을 할 수 있으므로, 택트타임은 단축된다.Therefore, an optical alignment treatment apparatus having two substrate supports (stages) has been proposed (see, for example, Patent Document 1). Such a photo-alignment processing apparatus can perform a substrate replacement operation on the other substrate support while performing photo-alignment processing on the substrate on one substrate support, as compared with the photo-alignment treatment apparatus having only one substrate support shown in Fig. 5 , The tact time is shortened.

하지만, 이와 같은 2개의 기판지지체를 구비하는 광배향 처리장치에는, 특허문헌 1의 도 6에 나타나는 바와 같이, 적어도 5개의 스테이지 포지션이 필요하게 된다. 그 결과, 자외선 조사장치(조사유닛)를 사이에 둔 광배향 처리장치의 양측에 기판지지체 2개만큼의 공간이 필요하게 된다. 그 때문에, 특허문헌 1에 개시된 광배향 처리장치는 매우 기다란 장치로 되어 있다.However, as shown in Fig. 6 of Patent Document 1, at least five stage positions are required in the photo-alignment processing apparatus having such two substrate supports. As a result, as much space as two substrate supports is required on both sides of the photo-alignment treatment apparatus sandwiched between the ultraviolet irradiation units (irradiation units). For this reason, the optical alignment processing apparatus disclosed in Patent Document 1 is a very long apparatus.

선행기술문헌Prior art literature

(특허문헌)(Patent Literature)

특허문헌 1: 일본특허공보 제5344105호Patent Document 1: Japanese Patent Publication No. 5344105

그래서, 본 발명의 목적은, 광배향 처리장치에 있어서, 장치의 설치면적을 축소하면서 택트타임을 더욱 단축시킴으로써, 스루풋(생산성)을 향상시킨 광배향 처리장치를 제공하는 데에 있다.SUMMARY OF THE INVENTION It is therefore an object of the present invention to provide a photo-alignment processing apparatus in which the throughput (productivity) is improved by shortening the tact time while reducing the installation area of the apparatus.

상기 목적을 달성하기 위하여, 본 발명은,In order to achieve the above object,

액정표시소자를 구성하는 기판에 형성되어 있는 배향막에 자외선을 조사함으로써, 상기 배향막을 배향처리하는 광배향 처리장치로서,An optical alignment treatment apparatus for aligning an alignment film formed on a substrate constituting a liquid crystal display element by irradiating ultraviolet rays onto the alignment film,

상기 기판을 지지하는 복수의 기판지지체와,A plurality of substrate supports for supporting the substrate,

각각의 상기 기판지지체를 동일한 주행경로를 따라서 주행시키는 주행기구와,A traveling mechanism for traveling each of the substrate supports along the same traveling path;

상기 주행경로를 따라서 주행하는 상기 기판지지체에 의하여 지지되고 있는 상기 기판에 대하여 자외선을 조사하는 자외선 조사장치와,An ultraviolet irradiator for irradiating ultraviolet rays to the substrate supported by the substrate support running along the traveling path;

주행하고 있는 상기 기판지지체끼리가 충돌하지 않도록, 상기 기판지지체를 상기 주행경로로부터 퇴피시키는 퇴피기구를 구비하는 광배향 처리장치를 제공한다.And a retracting mechanism for retracting the substrate support from the traveling path so that the traveling substrate supports do not collide with each other.

본 발명에 따르면, 상기 퇴피기구에 의하여, 기판을 거의 연속적으로 광배향 처리할 수 있으므로, 장치의 설치면적을 축소하면서, 스루풋을 향상시킨 광배향 처리장치를 제공할 수 있다.According to the present invention, since the substrate can be photo-aligned almost continuously by the retracting mechanism, it is possible to provide an optical alignment processing apparatus with improved throughput while reducing the installation area of the apparatus.

도 1은 본 발명의 실시형태에 따른 광배향 처리장치의 사시도이다.
도 2는 도 1의 광배향 처리장치의 측면도이다.
도 3은 도 1의 광배향 처리장치에 의한 배향처리의 순서를 설명하는 개략 정면(頂面)도이다.
도 4는 도 1의 광배향 처리장치에 의한 배향처리의 순서를 설명하는 개략 종단면도이다.
도 5는 종래의 광배향 처리장치의 사시도이다.1 is a perspective view of an optical alignment processing apparatus according to an embodiment of the present invention.
2 is a side view of the optical alignment treatment apparatus of FIG.
Fig. 3 is a schematic top view for explaining the sequence of alignment treatment by the optical alignment treatment apparatus of Fig. 1; Fig.
Fig. 4 is a schematic longitudinal sectional view for explaining the order of alignment treatment by the optical alignment treatment apparatus of Fig. 1;
5 is a perspective view of a conventional photo-alignment processing apparatus.

지금부터 도 1 및 도 2를 참조하면서, 본 발명의 실시형태에 따른 광배향 처리장치의 구성에 대하여 설명한다. 도 1 및 도 2를 참조하면, 광배향 처리장치(1)는, 각각 대략 동일한 방향으로 연장되도록 설치된 2개의 기초대(3)와, 기초대(3)의 서로에 대향하는 측면(3S)에, 예를 들어 리니어 모터 등의 공지의 구동기구에 의하여 광배향 처리장치(1)의 길이방향(DL)으로 주행할 수 있도록 장착된 주행기구(5)를 구비한다.Now, the structure of the photo-alignment treatment apparatus according to the embodiment of the present invention will be described with reference to Figs. 1 and 2. Fig. 1 and 2, the photo-alignment treatment apparatus 1 includes two base blocks 3 provided so as to extend in substantially the same direction and a pair of side walls 3B provided on the side walls 3S opposite to each other of the base block 3 And a traveling mechanism 5 mounted so as to be able to travel in the longitudinal direction DL of the optical alignment processing apparatus 1 by a known driving mechanism such as a linear motor.

구체적으로는, 주행기구(5)는, 측면(3S)으로부터 돌출되며, 또한 광배향 처리장치(1)의 길이방향(DL)을 따라서 연장되는 각각 2개의 돌출부(3P)에 슬라이딩 이동 가능하게 장착되어 있다.Specifically, the traveling mechanism 5 is mounted slidably on two projections 3P each projecting from the side surface 3S and extending along the longitudinal direction DL of the optical alignment treatment apparatus 1 .

광배향 처리장치(1)는 더욱이, 기초대(3)끼리의 사이에 있어서 기판(S)을 지지하는 2개의 기판지지체(7)를 구비한다. 기판지지체(7)는 각각의 주행기구(5)와 접속하고 있는 바닥부(7B)와, 바닥부(7B) 상에 장착되어 있고, 상면이 대략 수평방향으로 확산되어 있는 스테이지(7S)로 구성되어 있다.The photo-alignment processing apparatus 1 further includes two substrate supports 7 for supporting the substrate S between the base bars 3. The substrate support 7 includes a bottom portion 7B connected to each of the traveling mechanisms 5 and a stage 7S mounted on the bottom portion 7B and having an upper surface diffused in a substantially horizontal direction .

본 실시형태에서는, 스테이지(7S)는 핀형의 기판지지기구를 가지고 있고, 기판(S)을 지지하기 위한 다수의 핀(7SP)이 스테이지(7S)의 상면으로부터 돌출되어 있다. 또한, 일부의 핀(7SP)의 선단에, 진공 펌프 등에 의하여 진공 제거되어 있는 진공 라인(미도시)과 연통하고 있는 개구(미도시)가 형성되어 있으며, 핀(7SP) 상에 재치되는 기판(S)을 진공 흡착하여 지지할 수 있으면 바람직하다.In this embodiment, the stage 7S has a fin-shaped substrate supporting mechanism, and a plurality of pins 7SP for supporting the substrate S are projected from the upper surface of the stage 7S. An opening (not shown) communicating with a vacuum line (not shown) vacuum-removed by a vacuum pump or the like is formed at the tip of a part of the pins 7SP, S can be supported by vacuum adsorption.

광배향 처리장치(1)는 더욱이, 광배향 처리장치(1)의 길이방향(DL)의 대략 중앙부분에 있어서, 2개의 기초대(3) 상에 걸쳐져 있는 자외선 조사장치(9)를 구비하고 있다. 자외선 조사장치(9)는 1 또는 복수의 적어도 광원(미도시)과 편광판(미도시)을 포함하는 자외선 조사유닛으로 이루어지는 장치이다. 본 실시형태에서는, 자외선 조사장치(9)는 편광된 자외선을 하향으로 조사한다.The optical alignment processing apparatus 1 further includes an ultraviolet irradiator 9 which is disposed on the two base rods 3 in a substantially central portion of the longitudinal direction DL of the optical alignment processor 1 have. The ultraviolet irradiator 9 is an apparatus comprising at least one ultraviolet irradiator unit including at least a light source (not shown) and a polarizer (not shown). In the present embodiment, the ultraviolet irradiator 9 irradiates the polarized ultraviolet rays downward.

광배향 재료가 그 표면에 도포됨으로써 배향막이 형성되어 있는 기판(S)은, 자외선 조사장치(9)의 아래를 주행하면서 편광된 자외선이 조사됨으로써, 배향처리된다. 여기에서, 본 발명에서는, '배향처리된다'란, 구체적으로는 기판(S)에 도포된, 예를 들어 등방성의 폴리머로 구성되는 광배향 재료에 편광된 자외선을 조사하여, 편광방향으로 배향되어 있는 폴리머가 분해됨으로써, 편광방향과 직교하는 방향으로만 폴리머 사슬이 형성되는 것을 의미한다.The substrate S on which the alignment layer is formed by applying the photo-alignment material to the surface thereof is subjected to alignment treatment by irradiating the polarized ultraviolet ray while traveling under the ultraviolet irradiation device 9. [ Herein, in the present invention, the term " subjected to alignment treatment " specifically means irradiating polarized ultraviolet rays to a photo-alignment material composed of, for example, an isotropic polymer applied to the substrate S, Means that the polymer chain is formed only in a direction perpendicular to the polarization direction.

본 실시형태의 광배향 처리장치(1)는 더욱이, 본 발명의 퇴피기구로서, 기판지지체(7)를, 예를 들어 볼나사 구동기구 등의 공지의 구동기구에 의하여, 대략 연직방향으로 승강시킬 수 있는 승강장치(11)를 구비한다.The optical alignment treatment apparatus 1 of the present embodiment further includes a substrate support 7 as a retraction mechanism of the present invention which is moved up and down in a substantially vertical direction by a known drive mechanism such as a ball screw drive mechanism And a lifting device (11) capable of lifting and lowering the lifting device.

이제부터 실시형태에 따른 광배향 처리장치(1)에 의하여 기판(S)에 형성되어 있는 배향막을 배향처리하는 순서에 대하여, 도 3 및 도 4를 참조하면서 설명한다. 도 3의 (a) 내지 (h) 및 도 4의 (a) 내지 (e)는 각각, 시계열을 따라서 기재되어 있다. 한편, 도 3 및 도 4 그리고 다음 순서의 설명에서는, 2개의 기판지지체(7)에 대하여 제1 기판지지체(7') 및 제2 기판지지체(7")로 식별하고 있다는 점에 유의바란다.A description will now be given, with reference to FIG. 3 and FIG. 4, of a procedure for aligning the alignment film formed on the substrate S by the photo alignment processor 1 according to the embodiment. Figures 3 (a) to 3 (h) and 4 (a) to 4 (e) are described in time series. It should be noted that the two substrate supports 7 are identified as the first substrate support 7 'and the second substrate support 7' in FIGS. 3 and 4 and in the following description of the sequence.

우선, 도 3의 (a) 및 도 4의 (a)에 나타내는 바와 같이, 제1 기판지지체(7')를 광배향 처리장치(1)의 길이방향(DL)의 한쪽 단부측에 있어서 배향처리 전의 기판(S)을 수취하는 위치인 수취위치(PR)에 배치한다.First, as shown in Figs. 3A and 4A, the first substrate supporting body 7 'is subjected to an alignment treatment at one end side in the longitudinal direction DL of the optical alignment treatment apparatus 1 And is placed at the receiving position PR, which is a position for receiving the previous substrate S.

이어서, 도 3의 (b) 및 도 4의 (b)에 나타내는 바와 같이, 상류공정에 있어서 광배향 재료가 표면에 도포됨으로써 배향막이 형성되어 있는 기판(S)이, 예를 들어 로봇암 등에 의하여 수취위치(PR)에 위치하는 제1 기판지지체(7') 상에 재치된다. 구체적으로는, 본 실시형태에서는, 기판(S)은 제1 기판지지체(7')의 스테이지(7S) 상에 설치되어 있는 핀(7PS)의 선단 상에 재치되고, 진공 라인(미도시)과 연통하는 일부의 핀(7SP)의 선단부에 설치된 개구(미도시)를 통하여 흡인 고정된다. 이때, 제1 기판지지체(7')는 자외선 조사장치(9)와 기판(S)과의 거리가 배향처리에 적합하도록 승강장치(11)에 의하여 그 높이 위치가 조절되고 있다.Subsequently, as shown in Figs. 3 (b) and 4 (b), the substrate S on which the alignment layer is formed by applying the photo-alignment material to the surface in the upstream process is, for example, Is placed on the first substrate support 7 'located at the reception position PR. Specifically, in the present embodiment, the substrate S is placed on the tip of the fin 7PS provided on the stage 7S of the first substrate support 7 ', and a vacuum line (not shown) (Not shown) provided at the distal end portion of a part of the pins 7SP that communicate with each other. At this time, the height position of the first substrate supporter 7 'is adjusted by the elevating device 11 so that the distance between the ultraviolet irradiator 9 and the substrate S is suitable for alignment processing.

이어서, 도 3의 (c)에 나타내는 바와 같이, 기판(S)이 원하는 편광각도를 취할 수 있도록, 예를 들어 서보모터 등의 공지의 회전구동기구(미도시)에 의하여, 스테이지(7S)를 바닥부(7B)에 대하여 회전시킨다. 이때, 카메라 등에 의하여 기판(S)의 회전각도를 검출하고, 기판(S)의 회전각도의 얼라이먼트(미조정)를 하여도 좋다.Subsequently, as shown in Fig. 3C, the stage 7S is rotated by a known rotary drive mechanism (not shown) such as a servo motor so that the substrate S can take a desired polarization angle And is rotated with respect to the bottom portion 7B. At this time, the rotation angle of the substrate S may be detected by a camera or the like, and the rotation angle of the substrate S may be aligned (fine adjustment).

이어서, 도 3의 (d) 내지 (f) 및 도 4의 (c)에 나타내는 바와 같이, 주행기구(5)에 의하여 제1 기판지지체(7')를 광배향 처리장치(1)의 길이방향(DL)의 다른 쪽 단부측에 있어서 배향처리 후의 기판(S)을 배출하는 배출위치(PD)를 향하여, 기판지지체의 주행경로(RR)를 따라서 주행시킨다. 그에 따라, 제1 기판지지체(7') 상의 기판(S)은, 자외선 조사장치(9)의 아래를 통과할 때에 자외선 조사장치(9)에 의하여 자외선이 조사됨으로써 배향처리된다.Subsequently, as shown in FIGS. 3 (d) to 3 (f) and 4 (c), the first substrate supporting body 7 'is moved by the driving mechanism 5 in the longitudinal direction of the optical alignment processing apparatus 1 (RR) of the substrate support toward the discharge position (PD) for discharging the substrate (S) after the alignment treatment at the other end side of the substrate support (DL). Thereby, the substrate S on the first substrate support 7 'is subjected to alignment treatment by being irradiated with ultraviolet rays by the ultraviolet irradiator 9 when passing under the ultraviolet irradiator 9.

그리고, 도 3의 (g)에 나타내는 바와 같이, 기판(S)의 배향처리가 종료되고, 제1 기판지지체(7')가 배출위치(PD)에 도달하면, 도 3의 (h) 및 도 4의 (d)에 나타내는 바와 같이, 스테이지(7S)가 원래의 각도위치로 되돌아가도록 회전구동하며, 예를 들어 로봇암 등에 의하여 배향처리 후의 기판(S)이 하류공정으로 배출된다.3 (g), when the alignment treatment of the substrate S is completed and the first substrate support 7 'reaches the discharge position PD, as shown in FIGS. 3 (h) and 3 4 (d), the stage 7S is rotationally driven so as to return to the original angular position, and the substrate S subjected to the orientation treatment, for example, by a robot arm or the like is discharged in the downstream process.

이어서, 이대로 제1 기판지지체(7')를 배출위치(PD)에서 수취위치(PR)를 향하여 주행경로(RR)를 따라서 주행시키면, 제1 기판지지체(7')가 후술하는 후속의 제2 기판지지체(7")와 충돌해버린다. 그래서, 제1 기판지지체(7')를 도 4의 (e)에 나타내는 바와 같이 승강장치(11)에 의하여 하강시키고, 주행경로(RR)로부터 퇴피시킨다. 그 후, 제1 기판지지체(7')는 주행기구(5)에 의하여 광배향 처리장치(1)의 길이방향(DL)을 따라서 수취위치(PR)를 향하여 기판지지체의 퇴피경로(RE)를 따라서 주행한다.Subsequently, when the first substrate supporting body 7 'is caused to travel along the traveling path RR from the discharge position PD toward the receiving position PR, the first substrate supporting body 7' The first substrate supporting body 7 'is lowered by the elevating device 11 as shown in FIG. 4 (e), and retracted from the traveling route RR The first substrate supporting body 7 'is moved along the retreat path RE of the substrate support toward the receiving position PR along the longitudinal direction DL of the optical alignment processing apparatus 1 by the traveling mechanism 5, .

이어서, 제1 기판지지체(7')는, 도 4의 (a)에 나타내는 바와 같이 승강장치(11)에 의하여 상승함으로써 원래의 높이 위치로 되돌아가, 다시 수취위치(PR)에 배치된다.4 (a), the first substrate support 7 'is returned to the original height position by the elevation device 11, and is again placed at the reception position PR.

제1 기판지지(7')가 상기 행정으로 주행하여, 그 위에 재치된 기판(S)이 배향처리되는 한편으로, 본 실시형태에 따른 배향처리장치(1)에서는, 제2 기판지지체(7")도 제1 기판지지체(7')와 동일한 주행경로(RR)를 주행하게 된다. 제2 기판지지체(7")는 제1 기판지지체(7') 상에 재치되어 있는 기판(S)의 배향처리 종료 후에 바로 제2 기판지지체(7") 상에 재치시킨 기판(S)의 배향처리를 개시할 수 있도록, 제1 기판지지체(7') 상에 재치되어 있는 기판(S)이 배향처리되고 있는 동안에, 제1 기판지지체(7')와 마찬가지로, 수취위치(PR)까지 주행하며(도 3의 (a) 내지 (e)), 기판(S)을 제2 기판지지체(7") 상에 재치하고(도 3의 (e)), 스테이지(7S)를 원하는 각도위치로 회전구동시킨다(도 3의 (f)).The first substrate support 7 'runs on the abovementioned route and the substrate S placed thereon is subjected to the alignment treatment while in the alignment treatment apparatus 1 according to the present embodiment the second substrate support 7' Also runs on the same travel path RR as the first substrate supporter 7 '. The second substrate supporter 7' 'is arranged on the first substrate supporter 7' so that the orientation of the substrate S placed on the first substrate supporter 7 ' The substrate S placed on the first substrate supporter 7 'is subjected to the alignment treatment so that the alignment treatment of the substrate S placed on the second substrate supporter 7 " (Fig. 3 (a) to Fig. 3 (e)), the substrate S is held on the second substrate supporting body 7 ", as in the case of the first substrate supporting body 7 ' (Fig. 3 (e)) and rotates the stage 7S to a desired angular position (Fig. 3 (f)).

이상에 의하여, 본 실시형태에 따른 배향처리장치(1)는 거의 연속적으로 기판(S)을 배향처리할 수 있으므로, 대폭적으로 택트타임을 감소시켜, 그 스루풋을 개선할 수 있다.As described above, since the substrate processing apparatus 1 according to the present embodiment can almost continuously align the substrate S, the tact time can be greatly reduced, and the throughput thereof can be improved.

더욱이, 본 실시형태의 광배향 처리장치(1)에서는, 승강장치(11)에 의하여 수취위치(PR)에서 배출위치(PD)를 향하여 주행하는 기판지지체(7', 7")와, 배출위치(PD)에서 수취위치(PR)를 향하여 주행하는 기판지지체(7", 7')가 충돌하지 않도록, 이들 기판지지체(7, 7')의 높이 위치를 어긋나게 할 수 있다. 즉, 본 발명의 퇴피기구인 승강장치(11)에 의하여 기판지지체(7', 7")를 기판지지체의 주행경로(RR)로부터 퇴피경로(RE)로 퇴피시킬 수 있다. 그 결과, 주행하고 있는 기판지지체(7', 7")끼리가 엇갈려 지날 수 있으므로, 자외선 조사장치를 사이에 두고 양측에 기판지지체 2개만큼의 공간이 필요하게 되는 상술의 특허문헌 1에 개시된 광배향 처리장치에 대하여, 장치의 설치면적을 삭감할 수 있다.The optical alignment treatment apparatus 1 of the present embodiment further includes a substrate support 7 ', 7' 'which travels from the reception position PR to the discharge position PD by the elevation device 11, The height positions of the substrate supporters 7 and 7 'can be shifted so that the substrate supporters 7' and 7 'running from the PD to the reception position PR do not collide with each other. That is, the substrate support 7 ', 7' 'can be retracted from the travel route RR of the substrate support to the retreat route RE by the lifting device 11 which is the retraction mechanism of the present invention. As a result, The substrate supporting bodies 7 'and 7 "may be staggered, so that a space for two substrate supporting bodies is required on both sides of the ultraviolet ray irradiating apparatus, with respect to the optical alignment processing apparatus disclosed in Patent Document 1 , The installation area of the apparatus can be reduced.

또한, 본 실시형태에 따른 광배향 처리장치는, 종래의 배향처리장치로서 사용되어 온 러빙 장치와 비교하여, 택트타임과 장치의 크기가 거의 동등하다. 따라서, 종래의 러빙 장치로부터 본 실시형태에 따른 광배향 처리장치로 변경하는 데에 있어서, 생산라인 전체를 변경할 필요가 없고, 이들 장치의 교환만으로 되어, 설비변경에 관한 비용을 삭감할 수 있다.Further, the optical alignment processing apparatus according to the present embodiment is substantially equivalent to the tact time and the device size as compared with the rubbing apparatus used as the conventional alignment processing apparatus. Therefore, in changing from the conventional rubbing apparatus to the optical alignment processing apparatus according to the present embodiment, it is not necessary to change the entire production line, and only the replacement of these apparatuses can be performed, thereby reducing the cost of facility change.

실시예Example

본 실시예에서는, 상술한 실시형태에 따른 광배향 처리장치, 도 5에 기재된 종래의 광배향 처리장치 및 특허문헌 1에 개시된 타입의 2개의 기판지지체를 구비하는 광배향 처리장치와의 택트타임을 측정한 결과를 나타낸다.In this embodiment, the tact time with the photo-alignment treatment apparatus according to the above-described embodiment, the conventional photo-alignment treatment apparatus described in Fig. 5, and the photo-alignment treatment apparatus having two substrate supports of the type disclosed in Patent Document 1 Measurement results are shown.

본 실시예에서의 시험조건은 다음과 같다. 사용한 기판의 사이즈는 1300mm×1500mm×0.5mm이고, 당해 기판의 표면에 광배향 재료로서 PhotoAL-1(JSR사 제품, 상표)을 도포하여 배향막을 형성하였다. 자외선 조사장치에 의하여 기판에 대하여 파장이 313nm의 자외선을 조사하고, 자외선의 필요 적산 광량을 2000mJ/cm2로 설정하였다. 자외선 조사장치에 3개의 광조사 유닛을 사용하고, 기판을 자외선 조사장치의 아래에서 통과시키는 속도를 21.8mm/sec로 하였다. 기판의 회전각도(α)(도 3의 (c))를 105°로 하였다.The test conditions in this embodiment are as follows. The size of the substrate used was 1300 mm x 1500 mm x 0.5 mm, and PhotoAL-1 (manufactured by JSR Corporation) was applied as a photo alignment material to the surface of the substrate to form an alignment film. The substrate was irradiated with ultraviolet rays having a wavelength of 313 nm by the ultraviolet ray irradiation apparatus, and the required accumulated light quantity of ultraviolet ray was set to 2000 mJ / cm 2 . Three irradiation units were used for the ultraviolet irradiation device, and the rate at which the substrate was passed under the ultraviolet irradiation device was set at 21.8 mm / sec. The rotation angle [alpha] of the substrate (Fig. 3 (c)) was set to 105 [deg.].

한편, 상술한 실시형태에 따른 광배향 처리장치의 기판지지체에서의 배출위치로부터 수취위치로의 주행속도를 800mm/sec로 하였다.On the other hand, the traveling speed from the discharge position to the receiving position in the substrate support of the photo-alignment treatment apparatus according to the above-described embodiment was 800 mm / sec.

이상의 조건으로, 각 광배향 처리장치의 택트타임을 계측하였다. 그 결과, 택트타임은 본 실시형태에 따른 광배향 처리장치에서는 87초이고, 도 5에 기재된 종래의 광배향 처리장치에서는 141초이며, 특허문헌 1에 기재된 타입의 광배향 처리장치에서는 107초이었다. 따라서, 본 실시형태에 따른 광배향 처리장치는, 다른 광배향 처리장치에 대하여 대폭적으로 택트타임을 감소시켜, 스루풋을 개선할 수 있다고 할 수 있다.Under the above conditions, the tact time of each photo-alignment processor was measured. As a result, the tact time was 87 seconds in the optical alignment treatment apparatus according to the present embodiment, 141 seconds in the conventional optical alignment treatment apparatus described in Fig. 5, and 107 seconds in the optical alignment treatment apparatus of the type described in Patent Document 1 . Therefore, the optical alignment processing apparatus according to the present embodiment can significantly reduce the tact time and improve the throughput for other optical alignment processing apparatuses.

또한, 상술한 실시형태에 따른 광배향 처리장치의 길이방향 치수가 7400mm이었던 것에 대하여, 특허문헌 1에 개시된 타입의 광배향 처리장치의 길이방향 치수는 11400mm이었다. 따라서, 본 실시형태에 따른 광배향 처리장치는, 특허문헌 1에 개시된 타입의 광배향 처리장치에 대하여 설치면적을 삭감할 수 있다고 할 수 있다.In addition, while the longitudinal direction dimension of the photo-alignment treatment apparatus according to the above-described embodiment was 7400 mm, the longitudinal direction dimension of the photo-alignment treatment apparatus of the type disclosed in Patent Document 1 was 11400 mm. Therefore, it can be said that the optical alignment treatment apparatus according to the present embodiment can reduce the installation area for the optical alignment treatment apparatus of the type disclosed in Patent Document 1. [

상술한 실시형태에 따른 광배향 처리장치(1)는, 본 발명의 퇴피기구로서 승강장치(11)를 구비하고 있다. 하지만, 퇴피기구는, 주행하고 있는 기판지지체(7)끼리가 충돌하지 않는 기구라면 어떠한 것이어도 좋다. 예를 들어, 승강장치(11) 대신에 주행기구(5)와 기판지지체(7)를 경첩을 통하여 접속하고, 주행하는 기판지지체(7)끼리가 엇갈려 지날 때에 한쪽 기판지지체(7)를 하향으로 넘어뜨림으로써, 기판지지체(7)끼리가 충돌하지 않도록 할 수도 있다. 또한, 기판지지체(7)를 퇴피기구에 의하여 이동경로(RR)로부터 퇴피시키는 방향도, 상술한 실시형태와 같이 상하방향뿐만 아니라, 어떤 방향으로 어떤 경로로 퇴피시켜도 좋다.The optical alignment processing apparatus 1 according to the above-described embodiment includes the elevating device 11 as the retraction mechanism of the present invention. However, the retracting mechanism may be any mechanism as long as it is a mechanism in which the substrate supporting bodies 7 running do not collide with each other. For example, instead of the lifting device 11, the traveling mechanism 5 and the substrate support 7 are connected via a hinge, and when one substrate support 7 is staggered, It is possible to prevent the substrate supporters 7 from colliding with each other. The direction in which the substrate support 7 is retracted from the movement path RR by the retracting mechanism may be retreated not only in the vertical direction but also in any direction in some way as in the above-described embodiment.

이와 같이, 기판지지체(7)끼리가 충돌하지 않는 구조로 한다면, 광배향 처리장치(1)는 2개뿐만 아니라, 3개 이상의 기판지지체(7)를 구비하고 있어도 좋다.As described above, in the structure in which the substrate supporters 7 do not collide with each other, the photo-alignment processing apparatus 1 may include not only two but also three or more substrate supporters 7. [

상술한 실시형태에서는, 광배향 처리장치(1)의 길이방향(DL)의 한쪽 단부측에 수취위치(PR)가, 그리고 광배향 처리장치(1)의 길이방향(DL)의 다른 쪽 단부측에 배출위치(PD)가 설치되어 있는데, 수취위치(PR) 및 배출위치(PD)는 같은 위치여도 좋다.The receiving position PR is formed on one end side of the longitudinal direction DL of the optical alignment processing apparatus 1 and the other end side of the longitudinal direction DL of the optical alignment processing apparatus 1 The receiving position PR and the discharging position PD may be located at the same position.

상술한 실시형태에서는, 스테이지(7S)는 핀형의 기판지지기구를 가지고 있는데, 기판지지기구에는, 핸드, 포크형, 스테이지형 등의 다른 타입의 기판지지기구를 선택할 수도 있다. 하지만, 스테이지(7S)의 기판지지기구는, 박리대전에 의한 정전기 방지의 관점에서, 기판과의 접촉면적이 가장 작아지는 핀형이 가장 바람직하다. 또한, 상술의 실시형태와 같이, 기판(S)을 스테이지(7S) 상에 진공 흡착할 수 있으면, 기판(S)을 확실히 고정할 수 있어 바람직하다.In the above-described embodiment, the stage 7S has a pin-type substrate supporting mechanism, but other types of substrate supporting mechanisms such as a hand, fork type, and a stage type can be selected as the substrate supporting mechanism. However, the substrate supporting mechanism of the stage 7S is most preferably a pin type in which the contact area with the substrate is the smallest from the standpoint of preventing static electricity caused by peeling electrification. Further, as in the above-described embodiment, if the substrate S can be vacuum-adsorbed on the stage 7S, the substrate S can be securely fixed, which is preferable.

상술한 실시예에서는, 자외선 조사장치(9)에 3개의 자외선 조사유닛을 사용하였는데, 본 발명은 이것으로 한정되지 않는다. 본 발명에 따른 광배향 처리장치에서는, 자외선 조사장치(9)에 단일의 자외선 조사유닛을 사용하여도 좋고, 2개 또는 4개 이상의 자외선 조사유닛을 사용하여도 좋다.In the above-described embodiment, three ultraviolet irradiation units are used in the ultraviolet irradiation device 9, but the present invention is not limited to this. In the photo-alignment treatment apparatus according to the present invention, a single ultraviolet irradiation unit may be used for the ultraviolet irradiation device 9, or two or four or more ultraviolet irradiation units may be used.

1: 광배향 처리장치
5: 주행기구
7, 7', 7": 기판지지체
9: 자외선 조사장치
11: 승강장치(퇴피기구)
RR: 주행경로
S: 기판1: Optical alignment processor
5:
7, 7 ', 7 ": substrate support
9: Ultraviolet irradiator
11: lifting device (retracting device)
RR: Travel route
S: substrate

Claims (2)

액정표시소자를 구성하는 기판에 형성되어 있는 배향막에 자외선을 조사함으로써, 상기 배향막을 배향처리하는 광배향 처리장치로서,
상기 기판을 지지하는 복수의 기판지지체와,
각각의 상기 기판지지체를 동일한 주행경로를 따라서, 배향처리 전의 상기 기판을 수취하는 수취위치와 배향처리 후의 상기 기판을 배출하는 배출위치와의 사이에서, 주행시키는 주행기구와,
상기 주행경로를 따라서 주행하는 상기 기판지지체에 의하여 지지되어 있는 상기 기판에 대하여 자외선을 조사하는 자외선 조사장치와,
상기 수취위치로부터 상기 배출위치를 향해 주행하는 상기 기판지지체와, 상기 배출위치로부터 상기 수취위치를 향해 주행하는 상기 기판지지체가 충돌하지 않도록, 상기 배출위치로부터 상기 수취위치를 향해 주행하는 상기 기판지지체를, 상기 수취위치로부터 상기 배출위치를 향해 주행하는 상기 기판지지체의 상기 주행경로로부터 퇴피시키는 퇴피기구를 구비하는 광배향 처리장치.An optical alignment treatment apparatus for aligning an alignment film formed on a substrate constituting a liquid crystal display element by irradiating ultraviolet rays onto the alignment film,
A plurality of substrate supports for supporting the substrate,
A traveling mechanism that travels between the receiving position where the substrate before the alignment treatment is received and the discharge position where the substrate after the alignment treatment is discharged along the same traveling path of each of the substrate supports,
An ultraviolet irradiator for irradiating ultraviolet rays to the substrate supported by the substrate support running along the traveling path;
The substrate support body traveling from the discharge position toward the discharge position and the substrate support body traveling from the discharge position toward the reception position so as not to collide with the substrate support body running from the discharge position toward the reception position, And a retraction mechanism retracting from the traveling path of the substrate support running from the receiving position toward the discharge position. 제 1 항에 있어서,
상기 퇴피기구는, 상기 기판지지체를 승강시키는 승강장치를 구비하는 광배향 처리장치.The method according to claim 1,
Wherein the retracting mechanism has a lift device for lifting and lowering the substrate support.
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