KR101564581B1 - Scrubber for waste gases removing by combination of gas-liquid contact device with multi function - Google Patents

Scrubber for waste gases removing by combination of gas-liquid contact device with multi function Download PDF

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Publication number
KR101564581B1
KR101564581B1 KR1020150091188A KR20150091188A KR101564581B1 KR 101564581 B1 KR101564581 B1 KR 101564581B1 KR 1020150091188 A KR1020150091188 A KR 1020150091188A KR 20150091188 A KR20150091188 A KR 20150091188A KR 101564581 B1 KR101564581 B1 KR 101564581B1
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South Korea
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gas
liquid contact
liquid
scrubber
unit
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KR1020150091188A
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Korean (ko)
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서익환
박대연
박승철
김지영
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서익환
박대연
박승철
김지영
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Priority to KR1020150091188A priority Critical patent/KR101564581B1/en
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Publication of KR101564581B1 publication Critical patent/KR101564581B1/en
Priority to PCT/KR2016/006665 priority patent/WO2016208981A1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)

Abstract

The present invention relates to a scrubber for treating exhaust gas by a multi-layer gas-liquid contact means compound combining multiple unit gas-liquid contact means with different gas-liquid contact functions suitable to treat according to description and concentration of alkali exhaust gas emitted in a semiconductor manufacturing process. The scrubber, in a wet scrubber for absorbing and purifying exhaust gas by allowing a cleaning solution to be in contact with alkali exhaust gas, has a gas-liquid contact means which is installed inside the scrubber, and composed of a multi-layer structure of combining multiple monomers of the gas-liquid contact means with different gas-liquid contact functions.

Description

BACKGROUND OF THE INVENTION Field of the Invention [0001] The present invention relates to a scrubber for waste gas treatment,

TECHNICAL FIELD The present invention relates to a scrubber for treating waste gas, and more particularly to a waste gas treatment scrubber combined with gas-liquid contact means of a plurality of functions so as to be suitable for treatment according to properties of toxic exhaust gas discharged from a semiconductor manufacturing process.

Generally, an exhaust gas (waste gas) discharged from a process of forming a thin film on a wafer in a semiconductor manufacturing process or etching or the like includes an acidic gas such as hydrogen fluoride, sulfur oxide, nitrogen oxide, hydrogen sulfide, The exhaust gas discharged from the semiconductor manufacturing process must be purified and then discharged to the atmosphere because it is harmful to the human body and causes environmental pollution.

In order to remove toxic gas components such as hydrogen fluoride, sulfur oxides, nitrogen oxides, hydrogen sulfide, and sulfurous acid gas ammonia discharged from the semiconductor manufacturing process, a cleaning solution is sprayed on the exhaust gas (waste gas) A gas flow path device, a gas-liquid reaction device, and a dehumidifying device are installed in a housing in a Korean Patent Registration No. 10-0816822, A gas-liquid reaction device is formed by a reactor 31 having a filler layer and an injector, and an injector is installed at an upper portion and an inlet of the gas-liquid reactor, And a multiscrubber for simultaneously treating a complex pollutant, characterized in that the multigrubber No. 10-1020258 discloses a fuel cell including a housing including a waste gas inlet formed at one side and a waste gas outlet formed at the other side, the inside of which is formed in a box shape, and an acid gas formed inside one side of the housing, And a discharge dust collecting part formed inside the other side of the housing and collecting the acid mist introduced from the first spray part by corona discharge And an acidic waste gas treatment system.

Also, in relation to the gas-liquid contact device used in the scrubber, a plate-shaped body 10 having a predetermined shape is disclosed in Korean Patent Registration No. 10-1320638; The plate member 10 is formed of a polyolefin such as polyethylene or polypropylene or a polyolefin such as vinylidene chloride, A grid 12 made of a predetermined shape is formed in the plate 10, and the grid 12 is made of a metal such as aluminum, A width of 2 to 10 mm and a length of 2 to 10 mm, and the bent portion 20 has a U-shaped or V-shaped cross-sectional shape, and a gas-liquid contact device using the porous filter.

The above prior arts have a problem in the efficiency of separating and removing waste gas depending on the type of waste gas because it is a technique for separating and removing waste gas by a gas-liquid contactor uniformly regardless of the type,

The present invention relates to an exhaust gas purifying catalyst which is different in function from the exhaust gas discharged from a semiconductor manufacturing process according to the type and concentration of toxic gas components such as hydrogen fluoride, sulfur oxides, nitrogen oxides, hydrogen sulfide, It is confirmed that the exhaust gas removing efficiency is improved by applying a plurality of unit gas-liquid contact means in combination to each other to complete the present invention.

The present invention aims to provide a scrubber for removing toxic waste gas, and more particularly, to a scrubber for removing toxic waste gas by means of a multi-layered gas-liquid contact means combination in which a plurality of unit gas- And to provide a scrubber for treating gas.

More specifically, the present invention relates to a process for treating an exhaust gas by means of a multilayered gas-liquid contact means combination in which a plurality of unit gas-liquid contact means differing in gas-liquid contact function are prepared so as to be suitable for the treatment according to the concentration of the alkaline exhaust gas discharged in the semiconductor manufacturing process The present invention provides a scrubber for a gas scrubber.

Generally, in the semiconductor manufacturing process, perfluorocompounds (PFC) containing NF 3 , CF 4 , C 2 F 6 , C 3 F 8 , F 2 , OF 2 , SiO 2 , SiF 4 , NH 3 , ) Exhaust gas, acidic exhaust gas containing HF, HCl, Cl 2 and the like, alkaline exhaust gas containing NH 3 and the like, and poisonous waste gas which is a flammable exhaust gas containing SiF 4 , HF and the like are discharged, (50 to 500ppm) to low concentration (50ppm), as well as exhaust gas, PFC (exhaust gas), acidic exhaust gas, alkaline exhaust gas and flammable exhaust gas are discharged in different types according to conditions of semiconductor manufacturing process, .

The present invention relates to a waste gas treatment scrubber in which two or more gas-liquid contact means units having different gas-liquid contact functions due to the difference in geometry are optimized in order to optimize the treatment according to the type and concentration of the waste gas (G) .

Specifically, as a solution for achieving the object of the present invention, the waste gas treatment scrubber combined with gas-liquid contact means of plural functions suited to the characteristics of the waste gas is provided with an exhaust pipe 1a through which purge gas is discharged upward, A scrubber 1 in which a cleaning liquid injection nozzle 1b is provided at an upper portion thereof, a gas-liquid contact means combination MS is installed at an intermediate portion thereof and a waste liquid reservoir 1c is installed at a lower portion thereof, (MS) connected to a waste gas inlet pipe (2) connected to one side and a cleaning liquid injection nozzle (1b) installed in an upper part of the interior of the scrubber (1) Liquid contacting means (M1) having a different geometry so as to be suitable for treatment in accordance with a change in the concentration of the alkaline exhaust gas containing NH 3 or the like as an incoming waste gas (G), and a plurality of gas- Layer structure in which the sieves M2 are constantly combined.

The present invention is characterized in that a plurality of gas-liquid contact means unit M1 (M1) combined with the gas-liquid contact means combination (MS) according to the present invention for optimizing the process and increasing the process efficiency according to the concentration of the waste gas (G) ) And the gas-liquid contact unit unit (M2) have mutually different geometrical structures, and the function of the gas-liquid contact is different due to the difference in the geometrical structure.

The gas-liquid contact unit unit M1 and the gas-liquid contact unit unit M2 according to the present invention will be described in more detail. (A) The gas-liquid contact unit unit M1 comprises a two- A structure of a filter structure in which a sheet is arranged in a zigzag manner between a plurality of vertical partition walls. The filter structure induces bubbles to filter and absorb particulate matter contained in the waste gas by bubbles and particulate matter, mist, (B) the gas-liquid contact member unit M2 has a structure in which rod-like circular rods are arranged in a plurality of layers while being spaced apart in parallel with a plurality of spaced apart from each other, and spacing and circular rods are alternately arranged between the layers, And a function of promoting the absorption of gas by repeating the re-scattering and coarsening according to the flow rate of the gas.

And and a scrubber (1) the waste gas (G) that is monomer (M1), the gas-liquid contact means according to the concentration that is high concentration (50 ~ 500ppm) to a low concentration (less than 50ppm) of the alkaline exhaust gas containing such as NH 3 according to the invention Liquid contact member unit MS according to the present invention is obtained by uniformly combining the gas-liquid contact member unit M2.

The gas-liquid contact means combination MS according to the present invention is provided at the uppermost and lowermost ends of the gas-liquid contact means combination MS when the gas-liquid contact member unit M1 and the gas-liquid contact member unit M2 are uniformly combined. The dispersion body S1 having the function of evenly distributing the cleaning liquid and the dispersion body S2 having the function of distributing the cleaning liquid evenly are mounted.

The dispersion (S1) having the function of distributing the cleaning liquid uniformly has a structure in which quadrangular holes are formed continuously in four directions by partition walls and four adjacent rectangular holes are communicated at the center, and even distribution The dispersing element S2 having a function has a structure in which quadrangular holes are arranged continuously in four directions by partition walls.

The waste gas treatment scrubber combined with the gas-liquid contact means of plural functions so as to comply with the characteristics of the waste gas according to the present invention as described above is optimized in accordance with the concentration of the toxic waste gas G discharged from the semiconductor manufacturing process, that is, the alkaline exhaust gas It is possible to improve the gas treatment efficiency of the scrubber by applying the gas-liquid contact means combination.

Further, since the present invention has an advantage of being able to easily cope with the concentration change of the waste gas by the gas-liquid contact means combination suitable for the treatment, it is advantageous that the cost required for the change of the scrubber is also reduced.

1 is a front view schematically showing a scrubber of an embodiment according to the present invention;
2 is a rear view schematically showing a scrubber of an embodiment according to the present invention.
Figs. 3 to 6 schematically show a gas-liquid contact unit unit and a dispersion body according to the present invention. Fig.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings, but the present invention is not limited by the following description.

≪ Example 1 >

1 and 2 are a front view and a rear view schematically showing a scrubber for treating a waste gas G having a high concentration containing 50 to 500 ppm of an alkaline exhaust gas according to an embodiment of the present invention. The scrubber according to the present invention will be described.

The scrubber 1 of the present invention is provided with an exhaust pipe 1a through which purge gas is exhausted at the upper end thereof and a waste liquid reservoir 1c at the lower end thereof and a cleaning liquid injection nozzle 1b provided above the scrubber 1 And a gas-liquid contact means combination MS, which is combined with the waste liquid storage tank 1c so as to be optimized for the treatment of waste gas G, which is a high concentration alkaline exhaust gas flowing into the waste liquid storage tank 1c.

The gas-liquid contact member assembly (MS) comprises a dispersion (S1) having a function of uniformly distributing the cleaning liquid from the top, a foamed substance which is generated in the waste gas by bubbles, (M1) having a function of filtering and absorbing mist and the like, a gas-liquid contact unit unit (M2) having a function of repeating re-scattering and coarsening according to a flow rate of the gas to promote absorption of gas, Is dispersed in the dispersion medium (S2).

A cleaning liquid supply pipe 3 is connected to the cleaning liquid injection nozzle 1b to one side of the scrubber 1 and a waste liquid inflow pump P 1 is connected to the waste liquid storage tank 1c provided at the lower end thereof, A waste liquid discharge pipe 1d is provided on the other side and a cleaning liquid supply pump P 2 for introducing the cleaning liquid from the cleaning liquid storage tank 3 a is installed in the cleaning liquid supply pipe 3 have.

Referring to FIGS. 1 and 2, a description will be given of a process of treating a waste gas G having a high concentration containing 50 to 500 ppm of an alkaline exhaust gas by using the gas-liquid contact means MS having a plurality of functions according to the present invention ,

The waste gas G is introduced into the waste liquid in the waste liquid storage tank 1c through the waste gas inflow pipe 2 by the waste gas inflow pump P 1 and the cleaning liquid is supplied from the cleaning liquid storage tank 3a to the cleaning liquid feed pump P 2 Is supplied to the cleaning liquid injection nozzle 1b provided in the inside of the scrubber 1 through the cleaning liquid supply pipe 3 by means of the cleaning liquid supply pipe 3 and descends while spraying the cleaning liquid into the scrubber 1.

The waste gas introduced into the waste liquid in the waste liquid storage tank 1c is preliminarily treated by the waste liquid in the waste liquid storage tank 1c and is combined with the combined gas-liquid contact means combination MS The waste gas is purified and discharged to the outside through the exhaust pipe 1a installed at the upper end of the scrubber 1. [

More specifically, the process of gas-liquid contact with the cleaning liquid that descends while the waste gas passes through the gas-liquid contact means MS having a plurality of functions will be described in more detail.

The spraying and descending washing liquid firstly descends while being dispersed more widely by the dispersion S1 having the function of evenly distributing the washing liquid, and the rising waste gas is also primarily dispersed in the dispersion liquid having the function of evenly distributing the washing liquid Liquid contact member unit M1, foam particles generated in the waste gas due to bubbles and particulate matter generated during gas-liquid contact, mist And the gas-liquid contacting unit unit M2 repeats the re-scattering and coarsening according to the flow rate of the gas to promote absorption of the gas, thereby improving the gas-liquid contact so that a high concentration of the alkaline exhaust gas It is efficiently processed.

≪ Specific examples of gas-liquid contact unit and dispersion >

Liquid contact means M1 and M2 according to the present invention and dispersions S1 and S2 having the function of evenly distributing the cleaning liquid will be described in detail below with reference to FIGS. 3 to 6, (a). Liquid contact means unit M1 having a function of filtering and absorbing particulate matter, mist, or the like, which is generated when bubbles are generated by the bubbles, (B) a network structure in which network sheets 4 of a certain thickness woven together with a predetermined thickness are arranged in a staggered manner between vertically arranged partition walls 5 of a substantially Π-shape arranged at regular intervals; The gas-liquid contact member unit M2 has a function of promoting the absorption of gas by refluxing and refluxing according to the flow rate of the gas. The gas-liquid contact member unit M2 includes rod-shaped rod- Are disposed in parallel with each other and are arranged in a plurality of layers, and the spacing and the circular rods (6) are alternately arranged between the layers and the layers.

The dispersion body S1 having the function of distributing the cleaning liquid uniformly has a structure in which a rectangular through hole Ha made of barrier ribs is formed continuously in the frame F in the frame F and four adjacent rectangular through holes Ha are distributed in the center , And the dispersion body S2 has a structure in which square through holes Hb made of partition walls are arranged in a row in the frame F in a row.

≪ Example 2 >

It is preferable that the waste gas G to be treated is a low concentration exhaust gas containing less than 50 ppm of the alkaline exhaust gas and that the gas-liquid contact means combination MS is composed of the dispersion S1 having the function of evenly distributing the cleaning liquid, Liquid contacting means (M1) having a function of filtering and absorbing particulate matter, mist, and the like, which are generated in the waste gas by inducing the generation of bubbles, and particulate matter and mist generated in gas-liquid contact, Liquid contact-contacting unit (M2) having a function of promoting the absorption of gas by repetition of the conversation, filtering the particulate matter, mist, and the like, which are generated when the bubbles cause the contaminant particulate matter contained in the waste gas and the gas- Example 1> Except that the gas-liquid contact unit unit M1 having the function of absorbing the liquid and the dispersion body S2 having the function of evenly distributing the cleaning liquid were laminated, And the waste gas was treated by the scrubber 1 that was operated.

It is preferable that the gas-liquid contact unit units M1 and M2 are fabricated in the same standard so as to be assembled together, and the material of each gas-liquid contact unit unit is preferably a synthetic resin material.

The sizes and heights of the standards of the gas-liquid contact unit are not limited because they are determined according to the capacity of the scrubber 1 to be treated. If the scrubber 1 is skilled in the art, I can say that.

The waste gas treatment scrubber using the multiple function gas-liquid contact means according to the present invention described above can be applied to a gas-liquid contact member combination optimized for treatment according to the concentration of the toxic waste gas G discharged from the semiconductor manufacturing process, that is, the alkaline exhaust gas The gas treatment efficiency of the scrubber is improved, and it is possible to easily cope with the change in the properties of the waste gas by the gas-liquid contact means combination suitable for the treatment.

1: scrubber 1a: exhaust pipe
1b: injection nozzle 1c: waste liquid storage tank
2: waste gas inlet pipe 3: cleaning liquid supply pipe
3a: Cleaning liquid reservoir P1: Inflow pump
4: two-phase mesh sheet 5: vertical partition wall of 'Π' shape
6: Circular rod 10, 11: Plate,
Ms: a plurality of gas-liquid contact means assemblies M1 to M2; The gas-liquid contact means unit
S1, S2: Dispersion

Claims (3)

A cleaning liquid injection nozzle 1b is provided in an upper part of the exhaust pipe 1a and a dispersion body 1b having a function of evenly distributing the cleaning liquid from above to the lower side of the injection nozzle 1b Liquid contact means unit M1 having a function of filtering and absorbing the particulate matter and mist generated in the waste gas by inducing bubbles to generate bubbles, (MS) in which a gas-liquid contact means unit M2 having a function of accelerating the absorption of gas by repeating scattering and coarsening and a dispersing body S2 having an equal distribution function of a washing liquid are sequentially stacked A waste gas inlet pipe 2 connected to one side of the waste liquid storage tank 1c and a cleaning liquid injection nozzle 2 provided at the upper part of the inside of the scrubber 1, (1b) (1), which is an alkaline exhaust gas discharged from a semiconductor manufacturing process including a cleaning liquid supply pipe (3)
The gas-liquid contact unit unit M1 includes a gas-liquid contact member unit M1 having a predetermined thickness of mesh sheet 4, which is double-ply inside the frame F, at a predetermined interval And the gas-liquid contact means unit M2 is a structure of a filter structure arranged in a zigzag manner between the vertical partition walls 5 arranged in the shape of a circle, 6) are arranged in parallel with a predetermined distance and are arranged in a plurality of layers, and a gap and circular rods (6) are alternately arranged between the layers and the layers, and the dispersion (S1) And the four adjacent quadrangular through holes Ha are distributed from the center. The dispersing body S2 has a rectangular shape having a rectangular shape with a partition wall in the frame F, In the structure in which the through holes Hb are arranged in four successive rows The treatment of the waste gas to be suitable for the aqueous phase, characterized in that binary luer combinations into the gas-liquid contact means of the plurality of functions used gas scrubber treatment. A cleaning liquid injection nozzle 1b is provided in an upper part of the exhaust pipe 1a and a dispersion body 1b having a function of evenly distributing the cleaning liquid from above to the lower side of the injection nozzle 1b Liquid contact means unit M1 having a function of filtering and absorbing the particulate matter and mist generated in the waste gas by inducing bubbles to generate bubbles, (M1) and a dispersion body (S2) having an even distribution function of a cleaning liquid are successively stacked in this order on the substrate (1), and the gas-liquid contact member unit A waste gas inlet pipe 2 connected to one side of the waste liquid storage tank 1c and a scrubber 1 connected to one side of the waste liquid storage tank 1c, In the upper part of the inside of In the cleaning liquid injection nozzles (1b) a scrubber (1) for processing the waste gas (G) an alkaline exhaust gas discharged from a semiconductor manufacturing process including a cleaning liquid supply pipe 3 which is connected to,
The gas-liquid contact unit unit M1 includes a mesh-like sheet 4 having a certain thickness, which is double-stranded in the frame F, at a predetermined interval, and the alkaline exhaust gas is contained at a low concentration of less than 50 ppm. Liquid contacting means unit M2 is a structure of a filter structure arranged in a zigzag manner passing through the arranged Π-shaped vertical partitions 5, the rod- And a plurality of circular rods 6 are arranged alternately between the layers and between the layers and the dispersion body S1 is arranged in a frame F, Wherein a rectangular through hole Ha made of barrier ribs is formed continuously in four directions and adjacent four rectangular through holes Ha are communicated at the center, (Hb) are arranged in four successive rows Gas contact means is combined with the gas-liquid contact means of the plurality of functions so as to be suitable for the treatment of the waste gas. delete
KR1020150091188A 2015-06-26 2015-06-26 Scrubber for waste gases removing by combination of gas-liquid contact device with multi function KR101564581B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020150091188A KR101564581B1 (en) 2015-06-26 2015-06-26 Scrubber for waste gases removing by combination of gas-liquid contact device with multi function
PCT/KR2016/006665 WO2016208981A1 (en) 2015-06-26 2016-06-23 Waste gas-treating scrubber formed of combination of gas-liquid contact means having multiple functions so as to be appropriate for treating according to waste gas properties

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KR1020150091188A KR101564581B1 (en) 2015-06-26 2015-06-26 Scrubber for waste gases removing by combination of gas-liquid contact device with multi function

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180013000A (en) * 2016-07-28 2018-02-07 (주)효진아이디에스 Horizontal Type Scrubber to remove waste gases by combination of gas-liquid contact device with multi function
KR101844749B1 (en) * 2016-07-28 2018-05-18 (주)효진아이디에스 Horizontal Type Scrubber to remove waste gases by combination of gas-liquid contact device with multi function
KR20200121582A (en) 2019-04-16 2020-10-26 주식회사 효진엔지니어링 Gas-liquid contact device for Waste gas removal scrub and Waste gas removal scrub using the same
KR20220049211A (en) 2020-10-14 2022-04-21 주식회사 효진엔지니어링 Gas-liquid contact device for Waste gas removal scrub and Waste gas removal scrub using the same

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JP2006272034A (en) * 2005-03-28 2006-10-12 Kurita Water Ind Ltd Contamination gas treatment device and method using photocatalyst
KR101320638B1 (en) 2013-06-04 2013-10-23 엔텍이앤씨 주식회사 Porous filter and using the gas-liquid contact device
KR101478973B1 (en) * 2014-09-05 2015-01-05 (주)효진엔지니어링 Scrubber for removing acidic gases using multi gas-liquid contact device
KR101513682B1 (en) 2014-12-19 2015-04-21 (주)한국테크 Cleansing-type Multistage Deodorising Apparatus

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KR100816822B1 (en) * 2006-01-13 2008-03-31 신도건공 주식회사 Multi Scrubber for treat complex pollutant stimultaneously

Patent Citations (4)

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Publication number Priority date Publication date Assignee Title
JP2006272034A (en) * 2005-03-28 2006-10-12 Kurita Water Ind Ltd Contamination gas treatment device and method using photocatalyst
KR101320638B1 (en) 2013-06-04 2013-10-23 엔텍이앤씨 주식회사 Porous filter and using the gas-liquid contact device
KR101478973B1 (en) * 2014-09-05 2015-01-05 (주)효진엔지니어링 Scrubber for removing acidic gases using multi gas-liquid contact device
KR101513682B1 (en) 2014-12-19 2015-04-21 (주)한국테크 Cleansing-type Multistage Deodorising Apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180013000A (en) * 2016-07-28 2018-02-07 (주)효진아이디에스 Horizontal Type Scrubber to remove waste gases by combination of gas-liquid contact device with multi function
KR101844749B1 (en) * 2016-07-28 2018-05-18 (주)효진아이디에스 Horizontal Type Scrubber to remove waste gases by combination of gas-liquid contact device with multi function
KR101947733B1 (en) * 2016-07-28 2019-05-10 주식회사 효진엔지니어링 Horizontal Type Scrubber to remove waste gases by combination of gas-liquid contact device with multi function
KR20200121582A (en) 2019-04-16 2020-10-26 주식회사 효진엔지니어링 Gas-liquid contact device for Waste gas removal scrub and Waste gas removal scrub using the same
KR20220049211A (en) 2020-10-14 2022-04-21 주식회사 효진엔지니어링 Gas-liquid contact device for Waste gas removal scrub and Waste gas removal scrub using the same

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