KR101487366B1 - 현상 처리 방법, 컴퓨터 기억 매체 및 현상 처리 장치 - Google Patents

현상 처리 방법, 컴퓨터 기억 매체 및 현상 처리 장치 Download PDF

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Publication number
KR101487366B1
KR101487366B1 KR20090114604A KR20090114604A KR101487366B1 KR 101487366 B1 KR101487366 B1 KR 101487366B1 KR 20090114604 A KR20090114604 A KR 20090114604A KR 20090114604 A KR20090114604 A KR 20090114604A KR 101487366 B1 KR101487366 B1 KR 101487366B1
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KR
South Korea
Prior art keywords
substrate
developer
nozzle
wafer
pure water
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KR20090114604A
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English (en)
Korean (ko)
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KR20100066365A (ko
Inventor
히로후미 다케구치
고우스케 요시하라
Original Assignee
도쿄엘렉트론가부시키가이샤
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Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20100066365A publication Critical patent/KR20100066365A/ko
Application granted granted Critical
Publication of KR101487366B1 publication Critical patent/KR101487366B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
KR20090114604A 2008-12-08 2009-11-25 현상 처리 방법, 컴퓨터 기억 매체 및 현상 처리 장치 KR101487366B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2008-312133 2008-12-08
JP2008312133A JP4723631B2 (ja) 2008-12-08 2008-12-08 現像処理方法、プログラム、コンピュータ記憶媒体及び現像処理装置

Publications (2)

Publication Number Publication Date
KR20100066365A KR20100066365A (ko) 2010-06-17
KR101487366B1 true KR101487366B1 (ko) 2015-01-29

Family

ID=42346644

Family Applications (1)

Application Number Title Priority Date Filing Date
KR20090114604A KR101487366B1 (ko) 2008-12-08 2009-11-25 현상 처리 방법, 컴퓨터 기억 매체 및 현상 처리 장치

Country Status (2)

Country Link
JP (1) JP4723631B2 (ja)
KR (1) KR101487366B1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5315320B2 (ja) * 2010-11-09 2013-10-16 東京エレクトロン株式会社 基板処理方法、プログラム、コンピュータ記憶媒体及び基板処理装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0421389B2 (ja) * 1980-02-05 1992-04-09 Rca Licensing Corp
JP2005072333A (ja) 2003-08-26 2005-03-17 Tokyo Electron Ltd 基板の液処理方法及び基板の液処理装置
KR100595322B1 (ko) * 2004-12-29 2006-06-30 동부일렉트로닉스 주식회사 반도체 소자의 제조장치 및 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2770338B2 (ja) * 1988-08-30 1998-07-02 ソニー株式会社 現像方法
JP3652169B2 (ja) * 1999-04-30 2005-05-25 大日本スクリーン製造株式会社 基板現像装置
JP4527037B2 (ja) * 2005-09-15 2010-08-18 大日本スクリーン製造株式会社 基板の現像処理方法および基板の現像処理装置
JP4947711B2 (ja) * 2006-04-26 2012-06-06 東京エレクトロン株式会社 現像処理方法、現像処理プログラム、及びそのプログラムを記録したコンピュータ読み取り可能な記録媒体
JP2008016708A (ja) * 2006-07-07 2008-01-24 Victor Co Of Japan Ltd 処理液塗布装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0421389B2 (ja) * 1980-02-05 1992-04-09 Rca Licensing Corp
JP2005072333A (ja) 2003-08-26 2005-03-17 Tokyo Electron Ltd 基板の液処理方法及び基板の液処理装置
JP4021389B2 (ja) * 2003-08-26 2007-12-12 東京エレクトロン株式会社 基板の液処理方法及び基板の液処理装置
KR100595322B1 (ko) * 2004-12-29 2006-06-30 동부일렉트로닉스 주식회사 반도체 소자의 제조장치 및 방법

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Publication number Publication date
JP2010135674A (ja) 2010-06-17
KR20100066365A (ko) 2010-06-17
JP4723631B2 (ja) 2011-07-13

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