KR101450566B1 - Cooker and Control process of the same - Google Patents

Abstract

A cooking apparatus according to the present invention comprises: a main body; A heating source provided in the main body; Since the phosphorus phosphorus enamel helps the contaminants on the top surface of the top plate to be easily separated from the top plate when the top plate is installed on the top of the main body and includes the phosphate plate crumb coating on the top surface, There is an advantage that can be maintained.

Air conditioner, main body, heating source, phosphorous phosphorus enamel, top plate

Description

Cooker and control process of the same [

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cooking apparatus and a method of operating the same, and more particularly, to a cooking apparatus provided with a heating source at an upper portion thereof and a method of operating the same.

Generally, a cooking device is a cooking device that heats food using a heating source. The heating source is an electric heater that generates heat when electricity is applied, a burner that generates fires by fossil fuel, An induction heater for causing the cooking vessel to generate heat by inducing the heat to flow, and the like are used.

In the cooking apparatus, a cooking vessel is mounted on the upper portion of the cooking apparatus, and then a heating source is operated to heat the cooking vessel. Part of the food may be buried on the upper plate of the cooking apparatus during cooking, before and after cooking, As a contaminant.

The user pouces the washing water containing the detergent component or the hot water into the top plate, and the top plate is cleaned by the washing machine, the kitchen towel or the mop, and the cleaning operation is not easy and the cleaning is not cleaned.

SUMMARY OF THE INVENTION It is an object of the present invention to provide a cooking device which can easily and cleanly clean the top plate.

It is another object of the present invention to provide a method of operating a cooking device, in which a cooking device frictionally wipes off contaminants after being called water or steam, and automatically cleans the contaminants.

According to an aspect of the present invention, there is provided a cooking apparatus comprising: a main body; A heating source installed in the main body; And a top plate provided on the main body and coated with a phosphate-based enamel on the top surface.

The phosphate-based enamel is coated with an aluminophosphate sieve.

The upper plate is formed with a step protruding along the rim to have a receiving portion in which water is contained.

And a heater provided on the upper plate to heat the water.

And a water dispenser installed to supply water to the upper plate.

And a steam injector installed to spray steam to the upper plate.

And a cleaning member disposed on the upper plate so as to be cleaned while being in contact with the phosphate-based enamel coating layer.

And a cleaning member moving mechanism for linearly moving the cleaning member.

A drain hole through which water and contaminants are discharged is formed on the upper plate.

The upper plate is sloped down toward the drain hole.

A cooking apparatus according to the present invention comprises: a main body; A burner installed at an upper portion of the main body and heating the cooking vessel; And a top plate made of a metal material having a through hole through which the burner passes and having a phosphate-based enamel coating layer formed on the top surface thereof.

A cooking apparatus according to the present invention comprises: a main body; An induction heater installed at an upper portion of the main body to induce electricity to flow into the cooking vessel by an electromagnetic force to heat the cooking vessel; And a top plate made of a glass material, which covers the induction heater, the cooking vessel is raised, and a phosphate-based enamel coating layer is coated on the upper surface.

A method of operating a cooking device according to the present invention includes the steps of: supplying water or steam to a top plate coated with a phosphate-based enamel on an upper surface thereof and calling contaminants of the top plate; And cleaning the contamination of the upper plate by rubbing the cleaning member disposed on the upper plate after the dumping step with the phosphate-based enamel coating layer.

According to the present invention configured as above, the phosphate-based enamel coating layer is formed on the upper surface of the cookware upper plate, so that when the contaminants on the upper surface of the upper plate react with hot water or steam, they are easily separated from the upper plate and the upper plate is easily cleaned.

Further, since the water is contained in the upper plate by the step, a large amount of water is supplied to the upper plate, and the contaminants can be efficiently called and cleaned.

In addition, since the heater installed in the cooking device heats the water, there is no need for the user to directly supply the hot water to the top plate, and there is an advantage that the top plate can be safely cleaned.

In addition, since the water dispenser installed in the cooking device supplies water directly to the upper plate, there is an advantage that the upper plate can be conveniently cleaned.

Further, since steam is sprayed to the upper plate from the steam injector installed in the cooking device, the entire upper plate can be called as high temperature steam and cleaned.

Further, the cleaning member is arranged to be moved on the upper plate, so that the cooking appliance itself can clean the contaminants, which is advantageous in that convenience for the user is increased.

In addition, since the cleaning member moving mechanism linearly moves the cleaning member, there is an advantage that the cleaning member can be automatically cleaned.

In addition, since water and contaminants are discharged through the drain hole formed in the upper plate, there is an advantage that drainage on the upper surface of the upper plate is convenient and pollutant discharge is easy.

Further, since the cleaning device itself directly cleans the top plate after the cooking appliance itself calls up the top plate, there is an advantage that the entire top plate cleaning operation can be easily completed by a simple operation of the user.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

Fig. 1 is a perspective view of a first embodiment of a cooking apparatus according to the present invention, and Fig. 2 is an enlarged cross-sectional view of the top plate shown in Fig.

The cooking apparatus according to the present embodiment includes a main body 2, a heating source 10 provided in the main body 2, and a phosphorus-based (PxOx) enamel (A) And an upper plate 20.

The main body 2 can be provided on the upper side of the cooking cavity 3 such as an oven and can be integrated with the cooking cavity such as an oven or embedded in a sink or the like and can be movably mounted on a sink or the like.

The main body 2 has an outer case 4 whose upper surface is opened, an input unit 6 provided on the front or upper surface of the outer case so as to operate the cooking device, and a supply unit (Not shown).

The supply unit is a power supply unit that supplies power to the induction heater or the electrothermal heater when the heating source 10 is an induction heater or an electrothermal heater to be described later. When the heating source 10 is a burner to be described later, And a fuel supply unit.

The heating source 10 may be a kind of cook top that cooks food after it is placed on the upper surface of the cooking device. The cook top may be an induction heater that induces electricity to flow into the cooking pot by electromagnetic force to heat the cooking pot. A burner for directly heating the cooking vessel by generating a fire with fossil fuel or the like, or an electrically heated heater which generates heat when electricity is applied.

The upper plate 20 forms the upper surface of the cooking device and is disposed so as to cover the upper surface of the main body 2. [

The upper plate 20 is formed of a glass material so as to cover the induction heater 10 as the heating source 10 when the heating source 10 is an induction heating device and the heating source 10 ) Through which the burner or the electrothermal heater penetrates, and is formed of a metal material.

Hereinafter, the heating source 10 is formed of a burner, and the upper plate 20 is provided with a through hole 21 through which the burner passes, a metal body 22 formed of a metal material, And a coated phosphate-based enamel (A).

 The phosphate-based enamel (A) is excellent in the cleaning property against hot water or steam. Particularly, when the aluminophosphate enamel is coated on the upper surface of the metal body 22 and hot water or steam is brought into contact with the surface thereof, The contamination (D) adhering to the surface of the enamel (A) is changed into a state of easy cleaning.

The early apparatus further includes a wire rack 23 such as a tripod or the like on which the cooking vessel is lifted. The wire rack 23 is detachably attached to the cooking apparatus so that the upper plate 20 can be easily cleaned.

Hereinafter, the operation of the present invention will be described.

First, when a user or the like lifts and separates the wire rack 23 and then supplies hot water or steam of about 20 ° C to 100 ° C to the upper surface of the upper plate 20, (D), the hot water or steam is hydrogen bonded to the contaminant (D) to aid in the decomposition of the contaminant (D), and the contaminant (D) is gradually called.

When the upper plate 20 is covered with a separate upper plate cover covering the entire upper surface of the upper plate 20 while the hot water or steam is supplied to the upper surface of the upper plate 20 as described above, Bamboo action is further increased.

As described above, the hot water or steam is supplied to the upper surface of the upper plate 20, particularly the phosphate-based enamel (A), and the contaminants are called for a predetermined period of time (for example, 30 minutes) The contaminant D is separated from the phosphate-based sludge A and then the contaminant D separated from the phosphate-based sludge A is collected by the member 20, particularly the phosphate- The cleaning of the upper plate 20 is completed.

FIG. 3 is a graph for comparing the cleaning performance of general enamel and phosphate-based enamel according to the water temperature, and FIG. 4 is a graph for comparing the cleaning performance of the general enamel and the phosphate-based enamel according to the time required.

Referring to FIG. 3, in the case of the general enamel (B), contaminants are not completely removed even when the mop is rubbed 300 times irrespective of the temperature. However, in the case of the enamel (A) containing the phosphate- , It can be seen that the number of rubbing of the mop in order to remove contaminants is reduced.

Referring to FIG. 4, even in the case of a general enamel (B), contaminants are not completely removed even when the mop is rubbed 300 times irrespective of the time at which it is called. However, in the enamel containing the phosphate component (A) As you do so, you will notice that the number of times you rub the mop to remove contaminants decreases.

Therefore, when the enamel (A) containing a phosphate-based component is coated on the metal body 22 of the upper plate 20 as in the present embodiment, the cleaning performance can be improved.

FIG. 5 is a perspective view of a cooking apparatus according to a second embodiment of the present invention, and is a plan view of the top plate shown in FIG. 6, and FIG. 7 is a schematic sectional view of a part of the cooking apparatus according to the second embodiment of the present invention, FIG. 9 is a partial schematic sectional view of the second embodiment of the cooking apparatus according to the present invention when draining the top plate. FIG. 9 is a schematic sectional view of the cooking apparatus according to the second embodiment of the present invention.

5 to 9, when the hot water or steam is supplied to the upper plate 20, the hot water or steam does not flow to the periphery of the upper plate 20, And the accommodating portion 24 for allowing hot water or steam to be contained in the upper plate 20 so that the contaminants of the upper plate 20 can be sufficiently blown.

The receiving portion 24 is formed by a step 25 protruding upward from the upper plate 20 or the outer case 4. [

The step 25 may protrude from the outer case 4 higher than the upper plate 20 and protrude along the rim of the upper plate 20.

The upper plate 20 is coated not only on the portion where the phosphate-based enamel A is depressed downward but also on the inner surface 25a, the upper surface 25b and the outer surface 25c of the step 25.

It is also possible for the user or the like to pour hot water of 20 to 100 degrees centigrade directly into the accommodating portion 24 so that the user can pour contaminants into the accommodating portion 24, Or the heating source 10 may change the temperature of the water to 20 ° C to 100 ° C so that the water can be changed into hot water. When the water dispenser 40 installed in the cooking device supplies water to the receiving portion 24, The heater 30 and the heating source 10 provided in the main body 2 can heat water to 20 ° C to 100 ° C and change it into hot water. It is also possible to supply the water heated by the water dispenser 40 to the heater 30 at 20 to 100 캜 to the accommodating portion 24 of the upper plate 20 after heating.

Hereinafter, the cooking appliance will be described as including the heater 30 and the water dispenser 40.

The heater 30 is installed on the upper plate 20 so as to heat the water supplied to the upper plate 20, particularly the accommodating portion 24.

The heater 30 is installed by avoiding the through hole 21 so that the heating source 10 can be installed without being greatly affected by the heating source 10. [

The heater 30 is installed on the bottom surface of the accommodating portion 25 or the inner surface 25a of the step 25.

The water dispenser 40 has a water supply passage 42 for supplying water to the upper plate 20 and supplying water to the upper plate 20. [

The water supply flow path 42 is formed in a shape that passes through the upper plate 20 or rises over the step of the upper plate 20 in order to supply water to the accommodating portion 24.

It is preferable that the water supply channel 42 is formed of a water supply hose and the water supply hose is arranged to pass through the upper plate 20 inside the main body 2. [

A flow path penetration portion 27 through which the water supply flow path 42 is passed is formed in the bottom surface portion of the accommodating portion 24 which is a depression of the top plate 20 or is formed on the inner surface 25a of the step 25 .

The water dispenser 40 includes a water reservoir 44 containing water and a pump 46 for pumping the water of the water reservoir 44 so that water in the reservoir 44 flows into the pump 46 when the pump 46 is driven, And a water supply valve (not shown) to which water supplied from an external water supply source such as a water supply piping is interrupted and a water supply channel is connected to the water supply portion 24, It is also possible that the water of the external water supply source is supplied to the water receiving portion 24 through the water supply valve and the water supply flow path 42 when the water supply valve is opened.

On the other hand, the upper plate 20 is formed with a drain hole 28 through which water and contaminants are discharged to the receiving portion 25. The drain hole 28 is formed in the bottom plate portion of the receiving portion 24 so as to facilitate the discharge of water and contaminants. The top plate 20 is provided with a bottom plate portion Drain holes 28. The drain holes 28 are formed in the same manner as in the first embodiment.

A drain hose (29) for guiding water and contaminants discharged to the drain hole (28) to the outside of the main body (2) is connected to the upper plate (20).

 The cooking appliance is configured such that the drain hole 28 is closed so that water is not discharged to the drain hole 28 while water is supplied to the receiving portion 25 and the drain hole 28 (50) for opening and closing the drain hole (28) so as to open the drain hole (28).

The opening and closing mechanism 50 may be formed of a stopper for opening and closing the drain hole 28 by a hand or a tool by a user or the like and may include a discharge valve 52 ).

The discharge valve 52 may be installed on the lower side of the upper plate 20 or the inside of the main body 2 and may be provided on the bottom plate of the upper plate 20 or may be provided on the drain hose 29 Do.

The cooking apparatus further includes a top cover 60 covering the entire upper surface of the upper plate 20 while the hot water is used to clean the contaminants on the upper surface of the phosphate-based enamel (A).

  The upper plate cover 60 is connected to the upper plate 20 so as to be rotated or slidably connected to the upper plate 20 or separately from the upper plate 20 so as to cover the accommodation portion 25 while the pollutant is being called.

10 is a control block diagram of a cooking apparatus according to a second embodiment of the present invention.

The cooking apparatus includes a temperature sensing unit 70 for sensing the temperature of the upper plate 20, particularly the accommodating unit 25, a control unit 72 for controlling the overall operation of the cooking apparatus according to the input of the input unit 6, A memory unit 74 for storing operating conditions of the device, and a timer 76 for calculating time.

The input unit 6 includes various buttons for inputting operating conditions and a notification unit 78 for letting the operating state of the cooking appliance 1 be known.

The button of the input unit 6 includes a mode selection button for selecting the operation mode of the heater 30 for cleaning the top plate 20 and a start button for starting the selected mode. Of course, the input unit 6 may further include a cooking mode selection button, a cooking start button, and the like.

The operation mode of the heater 30 for cleaning the upper plate 20 may include a first mode, a second mode and a third mode, and the mode may be classified based on the degree of contamination of the upper plate 20 .

The degree of contamination of the upper plate 20 can be determined by the user, and a specific mode can be selected according to the judgment of the user. In this case, the first mode means a state in which the degree of contamination of the upper plate 20 is the lowest, and the third mode means a state in which the degree of contamination of the upper plate 20 is high.

The selection of the mode can be determined by the number of times the mode selection button is pressed. That is, when the mode selection button is pressed once, the first mode is selected, and when it is pressed again, the second mode is selected. When the mode selection button is pressed again in the second mode, the third mode is selected.

The notification unit 78 can inform the outside of the optimum cleaning timing of the upper plate 20. [ The information known in the notification unit 78 may be visual information or auditory information. As the notification unit 78, for example, a display unit, an LED, a speaker, and a vibration device can be applied. It is to be noted that there is no limitation in the kind of the signal generated in the notification unit 78 in the present embodiment.

The operating condition of the heater 30 and the optimum cleaning notification timing may be stored in the memory unit 75 according to each mode. For example, the optimum cleaning notification period may be set to 5 minutes in the first mode, 20 minutes in the second mode, and 30 minutes in the third mode. It is to be noted that the optimal cleaning notification timing in each of the above-described modes is not limited in this embodiment.

FIG. 11 is a flowchart showing the operation method of the cooking apparatus shown in FIGS. 5 to 10, FIGS. 12 to 14 are graphs showing changes in temperature with time in each mode, Fig. 13 shows the temperature change in the second mode, and Fig. 14 shows the temperature change in the third mode.

11 to 14, water for cleaning is supplied to the upper plate 20 (S1). For example, water is supplied to the upper plate 20 by the user, or the water dispenser 40 supplies water to the upper plate 20. [

The control unit 72 controls the water dispenser 40 such that the water reaches the storage unit 25 of the upper plate 20 by a predetermined amount.

 Then, the operation mode of the heater 30 for cleaning is selected by the mode selection button 32 (S2). Hereinafter, the "operating mode of the heater" means the operating mode of the heater for cleaning, which is distinguished from the operating mode of the heating source 10 for cooking.

Then, the controller 72 determines whether a start signal has been input (S3).

When the start signal is input, the control unit 72 determines whether the temperature sensed by the temperature sensing unit 70 is equal to or higher than the first reference temperature T1 (S4). In the present embodiment, the first reference temperature T1 means a temperature at which the upper plate 20 can be cleaned optimally while securing the safety of the user.

 The first reference temperature T1 may be set to be smaller than 50 占 폚.

If the detected temperature is equal to or higher than the first reference temperature T1, the user can clean the top plate 20 without heating the top plate 20 again. Accordingly, when the sensed temperature is equal to or higher than the first reference temperature T1, the control unit 72 controls the notification unit 78 to generate a signal indicating the optimal cleaning time (S21).

On the other hand, if the sensed temperature is less than the first reference temperature T1, the control unit 72 determines whether the first mode is selected (S5).

If the selected mode is the first mode, the controller 72 causes the heater 30 to operate according to the predetermined operating condition of the first mode (S6). Then, when the operation of the heater 30 is started, the timer 76 is operated to calculate the time lapse under the first mode.

Then, for example, the heater 30 may be continuously operated or repeatedly turned on / off. When the heater 30 is operated, the temperature of the upper plate 20 is raised as shown in FIG.

During the operation of the heater 30, the control unit 72 determines whether the temperature sensed by the temperature sensing unit 70 has reached the first reference temperature T1 (S7). If the sensed temperature reaches the first reference temperature T1, the control unit 72 causes the operation of the heater 30 to be terminated (S8).

The control unit 72 determines whether the time detected by the timer 76 has reached the first reference time t1 (S9). The first reference time t1 may be, for example, five minutes as described above.

When the sensed time reaches the first reference time t1, the control unit 72 controls the notification unit 78 to generate a signal for notifying the optimal cleaning time (S21).

At this time, even after the operation of the heater 30 is completed, the temperature of the top plate 20 can be raised by the heating of the heater 30, but the rising temperature is not so large as compared with the first reference temperature, There is no problem with safety.

The reason why the operation of the heater 30 is terminated and the signal indicating the optimal cleaning time is generated after the lapse of time is to prevent the moisture of the top plate 20 from being completely evaporated.

On the other hand, if it is determined in step S5 that the first mode is not selected, it is determined whether the second mode is selected (S10).

If the selected mode is the second mode, the controller 72 causes the heater 30 to operate according to the predetermined operating condition of the second mode (S11). Then, when the operation of the heater 30 is started, the timer 76 is operated and the time lapse under the second mode is calculated.

When the heater 30 is operated, the temperature of the upper plate 20 rises as shown in FIG.

During the operation of the heater 30, the control unit 72 determines whether the temperature sensed by the temperature sensing unit 70 has reached the second reference temperature T2 (S12)

If the sensed temperature reaches the second reference temperature T2, the control unit 72 causes the operation of the heater 30 to be terminated (S13). Here, the second reference temperature T2 may be the same as the first reference temperature T1.

When the predetermined time dt1 has elapsed after the operation of the heater 30 has been completed, the controller 72 controls the heater 30 so that the temperature of the upper plate 20 maintains the second reference temperature T2. (S14).

In detail, when the operation of the heater 30 is completed, the temperature of the top plate 20 can be increased and decreased by the heat of the heater 30 as shown in FIG.

The control unit 72 controls the heater 30 to repeatedly turn on and off so that the temperature of the top plate 20 maintains the second reference temperature T2.

The reason why the heater 30 is operated after a predetermined time elapses because the temperature sensed by the temperature sensing unit 70 reaches the second reference temperature T2 and the operation of the heater 30 is terminated, 20 from being completely evaporated.

Next, the control unit 72 determines whether the time detected by the timer 76 has reached the second reference time t2 (S15). The second reference time t2 may be, for example, 20 minutes as described above.

When the detected time reaches the second reference time t2, the control unit 72 controls the notification unit 78 to generate a signal for notifying the optimal cleaning time (S21).

On the other hand, if it is determined in step S10 that the second mode is not selected, the controller 72 controls the heater 30 to operate according to the preset third mode operating condition (S16). Then, when the operation of the heater 30 is started, the timer 76 is operated to calculate the time lapse under the third mode.

When the heater 30 operates, the temperature of the upper plate 20 rises as shown in Fig. During the operation of the heater 30, the control unit 72 determines whether the temperature sensed by the temperature sensing unit 70 has reached the third reference temperature T3 (S17).

Here, the third reference temperature T3 may be, for example, 100 deg.

If the sensed temperature reaches the third reference temperature T3, the control unit 72 causes the operation of the heater 30 to be terminated (S18).

Next, the control unit 72 determines whether the time detected by the timer 76 has reached the third reference time t3 (S20). The second reference time t3 may be, for example, 30 minutes as described above.

When the detected time reaches the third reference time t3, the control unit 72 controls the notification unit 78 to generate a signal for notifying the optimal cleaning time (S21).

At this time, the temperature of the top plate 20 when the optimum cleaning notification signal is generated is substantially equal to the first reference temperature.

When the sensed temperature reaches the reference temperature in the respective modes as described above, when the optimum cleaning notification timing is reached after the operation of the heater 30 is completed, a signal indicating the optimal cleaning timing is generated in the notification unit 78 do.

That is, a time difference occurs from when the temperature of the upper plate 20 reaches the reference temperature until when the optimum cleaning notification signal is generated. The reason why the time interval is set as described above is that the moisture generated by heating the water by the heater 30 is sufficiently absorbed by the contaminants of the top plate 20. [ In this embodiment, the time difference may be called a soaking time (or a delay time).

According to the present embodiment as described above, the upper panel 20 can be easily cleaned, and this state is displayed on the notification unit 78, so that the user can easily recognize the optimal cleaning time, Can be easily cleaned.

FIG. 15 is a perspective view of a third embodiment of the cooking apparatus according to the present invention, and FIG. 16 is a schematic sectional view of part of the cooking apparatus according to the third embodiment when steam is sprayed to the upper plate.

15 and 16, the cooking apparatus according to the present embodiment includes a steam injector 80 installed to spray steam to the upper plate 20, and the steam injector 70 includes a steam injector 70, The heater 30 and the water dispenser 40 are replaced.

The steam injector 80 is a device for heating the water and spraying it with an atomization or a thin water stream. The steam injector 80 includes a water reservoir 82, a water supply passage 84, a pump 86, a heater 88, .

The water storage tank 82 is a water storage tank, which is not shown, but may be detached from the cooking apparatus or connected to a separate water supply pipe in a fixed state.

The water supply flow path 84 includes a water supply hose 84a connecting the water storage tank 82 and the heater 88 and a steam hose 84b connecting the heater 88 and the spray nozzle 90.

The pump 86 is provided with a water supply pump 86A for supplying the water stored in the water storage tank 82 to the heater 88 and a steam pump for supplying the generated steam heated by the heater 88 to the injection nozzle 90. [ (86B).

The heater 88 is a heating device for heating the water supplied from the water tank 82.

The spray nozzle 90 injects the heated water from the heater 88 into the top plate 20 and particularly the receiving portion 25 and is used to spray the steam to the top plate 20, The cooking device of the invention is disposed on the bottom surface of the receiving portion 24 as the depression of the top plate 20 or on the inner surface 25a of the step 25 as in the second embodiment.

The injection nozzle 90 may be rotatably coupled to the steam hose 84b connected to the steam pump 84b.

The cooking device according to the present embodiment is configured such that the cooking device according to the present invention has other configurations and actions other than the steam injected from the steam injector 80 into the receiving portion 25 of the upper plate 20, The second embodiment is the same as or similar to the second embodiment, and thus the same reference numerals are used, and a detailed description thereof will be omitted.

FIG. 17 is a plan view of the cooking apparatus according to the fourth embodiment of the present invention, and FIG. 18 is a plan view of the cooking apparatus according to the fourth embodiment of the present invention when the upper plate is being cleaned.

17 and 18, the cooking apparatus according to the present embodiment includes a cleaning member 100 disposed to be moved to the upper plate 20 to be cleaned while being in contact with the phosphate-based enamel coating layer A, 100 and the cleaning member moving mechanism 102. Other structures and actions of the cleaning member 100 and the cleaning member moving mechanism 102 are the same as those of the first to third embodiments of the present invention The same reference numerals are used, and a detailed description thereof will be omitted.

The cleaning member moving mechanism 102 includes a driving source and a power transmitting member for transmitting the driving force of the driving source to the cleaning member.

The driving source is composed of a cleaning motor 104. The power transmitting member includes a pinion 106 provided on a cleaning motor and a rack 108 formed on the pinion 106 and extending in a direction parallel to the moving direction of the cleaning member 100, .

The cleaning member moving mechanism 102 moves the cleaning motor 104 and the pinion 106 together with the cleaning member 100 so that one of the rotation axis of the cleaning motor 104 and the pinion 106 rotates together with the cleaning member 100 And a rack 108 is fixedly mounted to the upper plate 20 or the main body 2.

That is, when the cleaning motor 104 is driven, the pinion 106 is rotated and moved along the rack 108. At this time, the cleaning motor 104 and the pinion 106 and the cleaning member 100 are moved together, The rack 108 guides their movement.

The cleaning member 100 includes a support 110 connected to the cleaning motor 104 and the pinion 106 and a cleaning or cleaning brush 112 formed on the support 110.

19 is a flowchart showing the operation method of the cooking apparatus shown in Figs. 17 and 18. Fig.

11 to 14 and 19, water or steam is supplied to the upper plate 20 to pollute the upper plate 20. (S1 to S20)

The cooking appliance according to the present embodiment does not need to separately notify the user of the optimal cleaning time as shown in FIG. 11 by automatically cleaning the called contaminants, and it is not necessary to separately inform the user of the start of cleaning Of course it is possible.

That is, as shown in FIG. 11, after the pollutants (S1 to S20) are completed, the cooking apparatus according to the present embodiment moves the cleaning member 100, which is disposed to be moved to the upper plate 20, Rubs against the enamel (25) to clean the contaminants of the top plate (20). The control unit 72 drives the cleaning member moving mechanism 102, particularly the cleaning motor 104, in the cleaning mode.

The control unit 72 drives the cleaning motor 104 forward and backward by a predetermined number of times so that the cleaning member 100 reciprocates the upper plate 20 a plurality of times, and the cleaning member 100 moves the upper plate 20 reciprocally And sweeps contaminants called by the upper plate 20 into the drain holes 28. (S21 ')

The control unit 72 drives the cleaning motor 104 such that the cleaning member 100 is positioned at the initial position after the cleaning motor 104 is driven for a plurality of times or in reverse, And notifies the completion of the cleaning of the top plate 20 through the notification unit 78. (S22)

Fig. 20 is a perspective view of a fifth embodiment of the cooking apparatus according to the present invention, and Fig. 21 is an enlarged sectional view of the top plate shown in Fig.

 The cooking apparatus according to the present embodiment is composed of an induction heater in which a heating source 10 'is installed on the upper part of the main body 2 and induces electricity to flow into the cooking vessel by electromagnetic force to heat the cooking vessel, The other components and actions of the heating source 10 'and the upper plate 20' are the same as or similar to those of the first to fourth embodiments of the present invention, And a detailed description thereof will be omitted.

The upper plate 20 'comprises a glass 22' and a phosphate-based enamel A coated on the upper surface of the glass 22 ', and the phosphate-based enamel A comprises the first and fourth embodiments of the present invention Helps to pollute and separate pollutants as in the example.

It is to be understood that the present invention is not limited to the above-described embodiments, and various changes and modifications may be made without departing from the scope of the present invention.

1 is a perspective view of a cooking apparatus according to a first embodiment of the present invention,

2 is an enlarged sectional view of the top plate shown in Fig. 1,

FIG. 3 is a graph for comparing cleaning performance of general enamel and phosphate-based enamel according to water temperature,

FIG. 4 is a graph for comparing the cleaning performance of a general enamel and a phosphate-based enamel according to the time for which they are called,

5 is a perspective view of a cooking apparatus according to a second embodiment of the present invention,

A top view of the top plate shown in Fig. 6,

FIG. 7 is a schematic sectional view of a portion of a cooking apparatus according to a second embodiment of the present invention,

FIG. 8 is a schematic sectional view of a cooking apparatus according to a second embodiment of the present invention,

FIG. 9 is a schematic sectional view of the second embodiment of the cooking apparatus according to the present invention when draining the top plate,

10 is a control block diagram of a cooking apparatus according to a second embodiment of the present invention;

11 is a flowchart showing the operation method of the cooking apparatus shown in Figs. 5 to 10. Fig.

FIGS. 12 to 14 are graphs showing temperature changes with time in each mode, FIG. 12 is a graph showing a temperature change in the first mode, FIG. 13 is a graph showing a temperature change in the second mode , FIG. 14 is a graph showing a temperature change in the third mode,

15 is a perspective view of a third embodiment of the cooking apparatus according to the present invention,

FIG. 16 is a schematic sectional view of a third embodiment of the cooking apparatus according to the present invention when steam is sprayed onto the upper plate,

17 is a plan view of the cooking apparatus according to the fourth embodiment of the present invention,

18 is a plan view of the cooking apparatus according to the fourth embodiment of the present invention when the upper plate is being cleaned,

19 is a flowchart showing the operation method of the cooking apparatus shown in Figs. 17 and 18. Fig.

20 is a perspective view of a fifth embodiment of the cooking apparatus according to the present invention,

21 is an enlarged cross-sectional view of the top plate shown in Fig.

Claims (13)

A body; A heating source installed in the main body; And an upper plate provided on the upper portion of the main body and having a through hole through which the heating source is passed, Further comprising a heater installed on the upper plate to avoid the through hole and to heat the water of the upper plate. The method according to claim 1, The phosphate-based enamel is coated with an aluminophosphate-based crumb. The method according to claim 1, Wherein the upper plate has a water receiving portion in which water is contained, and a step is protruded along the rim. delete The method of claim 3, Further comprising a water dispenser installed to supply water to the upper plate. The method according to claim 1, And a steam injector installed to spray steam onto the upper plate. The method according to claim 1, A cleaning member arranged to move linearly on the upper plate to be cleaned while being in contact with the phosphate-based enamel coating layer; And a cleaning member moving mechanism that linearly moves the cleaning member, wherein the cleaning member includes a support member connected to the cleaning member moving mechanism, and a cleaning brush formed on the support member, Wherein the cleaning member moving mechanism includes a driving source and a driving force transmitting member that transmits driving force of the driving source to the cleaning member. 8. The method of claim 7, The driving source is a cleaning motor, Wherein the power transmitting member includes a pinion installed on the cleaning motor and a rack coupled to the pinion and provided on the upper plate or the main body and formed to be elongated in a direction parallel to the moving direction of the cleaning member, Wherein one of the rotary shaft of the cleaning motor and the rotary shaft of the pinion is connected to the cleaning member. The method according to claim 1, Wherein the upper plate is provided with a drain hole through which water and contaminants are discharged. 10. The method of claim 9, Wherein the upper plate is bent downward toward the drain hole. delete delete A step in which water or steam is supplied to an upper plate coated with a phosphate-based enamel on an upper surface thereof and a contaminant of the upper plate is called; And a cleaning member disposed on the support plate to move linearly on the upper plate after the burning step and a cleaning member including a cleaning brush formed on the support plate are rubbed against the phosphate- based enamel to clean the contamination of the upper plate, And a top plate cleaning step of moving the cleaning member in a straight line.

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