KR101423586B1 - 정화 요소를 포함하는 유체 조립체 - Google Patents

정화 요소를 포함하는 유체 조립체 Download PDF

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Publication number
KR101423586B1
KR101423586B1 KR1020097003815A KR20097003815A KR101423586B1 KR 101423586 B1 KR101423586 B1 KR 101423586B1 KR 1020097003815 A KR1020097003815 A KR 1020097003815A KR 20097003815 A KR20097003815 A KR 20097003815A KR 101423586 B1 KR101423586 B1 KR 101423586B1
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South Korea
Prior art keywords
fluid
block
handling device
substrate
flow path
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Korean (ko)
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KR20090069268A (ko
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브라이언 팔러모
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폴 코포레이션
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
KR1020097003815A 2006-08-25 2007-08-17 정화 요소를 포함하는 유체 조립체 Active KR101423586B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US84002506P 2006-08-25 2006-08-25
US60/840,025 2006-08-25
PCT/US2007/076210 WO2008024683A1 (en) 2006-08-25 2007-08-17 Fluid assemblies comprising a purification element

Publications (2)

Publication Number Publication Date
KR20090069268A KR20090069268A (ko) 2009-06-30
KR101423586B1 true KR101423586B1 (ko) 2014-07-25

Family

ID=38780804

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097003815A Active KR101423586B1 (ko) 2006-08-25 2007-08-17 정화 요소를 포함하는 유체 조립체

Country Status (4)

Country Link
US (1) US20110041470A1 (enExample)
JP (1) JP2010501336A (enExample)
KR (1) KR101423586B1 (enExample)
WO (1) WO2008024683A1 (enExample)

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US5663476A (en) * 1994-04-29 1997-09-02 Motorola, Inc. Apparatus and method for decomposition of chemical compounds by increasing residence time of a chemical compound in a reaction chamber
US6514323B1 (en) * 1998-06-24 2003-02-04 Pall Corporation Purification assemblies and purification methods
WO2004041415A1 (en) * 2002-10-31 2004-05-21 Advanced Technology Materials, Inc. Semiconductor manufacturing facility and process systems utilizing exhaust recirculation

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US5605179A (en) * 1995-03-17 1997-02-25 Insync Systems, Inc. Integrated gas panel
KR100232112B1 (ko) * 1996-01-05 1999-12-01 아마노 시게루 가스공급유닛
JP4132143B2 (ja) * 1996-09-05 2008-08-13 日揮株式会社 ガス移送配管
US6302141B1 (en) * 1996-12-03 2001-10-16 Insync Systems, Inc. Building blocks for integrated gas panel
US5888259A (en) * 1997-05-22 1999-03-30 Maeda Limited Filter device for compressed air
JP4378553B2 (ja) * 1997-10-13 2009-12-09 忠弘 大見 流体制御装置
US6123340A (en) * 1998-01-09 2000-09-26 Swagelok Company Modular flow devices
US6015444A (en) * 1998-02-27 2000-01-18 Eaton Corporation Apparatus and system for venting a transmission
JP2000035148A (ja) * 1998-07-22 2000-02-02 Hitachi Metals Ltd 集積形流体制御装置
US6123752A (en) * 1998-09-03 2000-09-26 3M Innovative Properties Company High efficiency synthetic filter medium
US6149718A (en) * 1998-10-16 2000-11-21 Mott Mettallurgical Corporation Contamination control system
SE512980C2 (sv) * 1998-10-22 2000-06-12 Flaekt Ab Filteranordning för luftkanaler eller luftbehandlingsaggregat
WO2000031462A1 (en) * 1998-11-20 2000-06-02 Mykrolis Corporation System and method for integrating gas components
JP4370369B2 (ja) * 1998-12-01 2009-11-25 株式会社フジキン ガスケットフィルタ
US6283143B1 (en) * 2000-03-31 2001-09-04 Lam Research Corporation System and method for providing an integrated gas stick
JP4156184B2 (ja) * 2000-08-01 2008-09-24 株式会社キッツエスシーティー 集積化ガス制御装置
JP2002130479A (ja) * 2000-10-23 2002-05-09 Tokyo Electron Ltd 集積化流体供給装置及びこれに用いるシール材及びこれを用いた半導体製造装置
JP4435999B2 (ja) * 2001-02-26 2010-03-24 株式会社堀場エステック マスフローコントローラを用いた流体供給機構および取替基板ならびにアタプタ
US6447565B1 (en) * 2001-05-03 2002-09-10 General Motors Corporation Transmission vent assembly
US6769463B2 (en) * 2001-05-16 2004-08-03 Celerity Group, Inc. Fluid flow system
JP3969082B2 (ja) * 2001-08-10 2007-08-29 株式会社デンソー 車両用送風装置
JP3564115B2 (ja) * 2001-12-06 2004-09-08 シーケーディ株式会社 ガス供給ユニット
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JP2006038525A (ja) * 2004-07-23 2006-02-09 Fuji Photo Film Co Ltd 液体濾過器具及び乾式分析素子
JP2006046502A (ja) * 2004-08-04 2006-02-16 Ckd Corp ガス供給集積ユニット
US7410519B1 (en) * 2005-08-16 2008-08-12 Ewald Dieter H Sandwich filter block
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US7575616B2 (en) * 2006-02-10 2009-08-18 Entegris, Inc. Low-profile surface mount filter
US7879123B2 (en) * 2007-09-27 2011-02-01 Pall Corporation Inertial separator

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61108861A (ja) * 1984-11-01 1986-05-27 Honda Motor Co Ltd エアクリ−ナ
US5663476A (en) * 1994-04-29 1997-09-02 Motorola, Inc. Apparatus and method for decomposition of chemical compounds by increasing residence time of a chemical compound in a reaction chamber
US6514323B1 (en) * 1998-06-24 2003-02-04 Pall Corporation Purification assemblies and purification methods
WO2004041415A1 (en) * 2002-10-31 2004-05-21 Advanced Technology Materials, Inc. Semiconductor manufacturing facility and process systems utilizing exhaust recirculation

Also Published As

Publication number Publication date
JP2010501336A (ja) 2010-01-21
KR20090069268A (ko) 2009-06-30
WO2008024683A1 (en) 2008-02-28
US20110041470A1 (en) 2011-02-24

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