KR101420431B1 - Liquid crystal display device and method for fabricating thereof - Google Patents

Abstract

The present invention relates to a liquid crystal display device with improved aperture ratio and improved light leakage, and a method of manufacturing the same. The liquid crystal display device according to the present invention comprises: a first substrate; A second substrate; A gate line, a data line, and a thin film transistor arranged to define a pixel region on the first substrate; Green, and blue color filter layers formed on the second substrate to correspond to pixel regions of the first substrate; a black matrix formed to correspond to the gate lines, the data lines, and the thin film transistors; And a common electrode alternately arranged on the pixel region of the first substrate and the common electrode, wherein the black matrix is formed on the second substrate in the boundary region of the red, green, and blue color filter layers, And blue color filter layers are formed on any two of the color filter layers and have different heights.

Liquid crystal display, black matrix, aperture ratio, color filter layer

Description

TECHNICAL FIELD [0001] The present invention relates to a liquid crystal display device and a method of manufacturing the same,

The present invention relates to a liquid crystal display device with improved aperture ratio.

Recently, in order to solve the problem of narrow viewing angle of a liquid crystal display device, various liquid crystal display devices employing various new methods have been actively developed. In this method, an in-plane switching mode (IPS) or an optically compensated birefrigence mode).

In the transverse electric field type liquid crystal display device, two electrodes are formed on the same substrate (lower substrate) in order to drive the liquid crystal molecules in a state of being kept horizontal with respect to the substrate, and a voltage is applied between the two electrodes Thereby generating an electric field in the horizontal direction with respect to the substrate.

Therefore, in such a transverse electric field system, the long axis of the liquid crystal molecules does not rise in a direction perpendicular to the substrate (twisted nematic system). Therefore, a change in the birefringence of the liquid crystal with respect to the viewing angle direction is small, and the viewing angle characteristic is superior to the conventional TN (Twist Nematic) type liquid crystal display device.

Further, on the color filter substrate of the transverse electric field type liquid crystal display device, red, green, and blue color filters and gate wirings of the TFT substrate, data wirings, and TFTs are formed in the regions corresponding to the pixel regions of TFT (Thin Film Transistor And a black matrix is formed in an area corresponding to the area.

Particularly, a light leakage defect frequently occurs between the data line of the TFT substrate and a common electrode adjacent to the data line, and the black matrix is formed by extending to both pixel regions around the data line. In addition, a black matrix corresponding to the TFT region and a black matrix corresponding to the gate wiring region are formed so as to extend to the pixel region.

However, when the black matrix is extended to improve the light leakage, as described above, there arises a problem that the aperture ratio of each pixel region is reduced.

Accordingly, there is a demand for a technique of widening the pixel aperture ratio by reducing the width of the black matrix while removing light spots occurring along the periphery of the pixel region.

Provided is a liquid crystal display device in which a black matrix formed on a color filter substrate can be formed on red, green, and blue color filters to minimize light spots generated along both sides of a data line, and a method of manufacturing the same. It has its purpose.

Another object of the present invention is to provide a liquid crystal display device in which common electrodes formed on different layers in a pixel region adjacent to a data line are completely overlapped with each other to improve defects in light leakage occurring in both sides of the data line, There is another purpose.

It is another object of the present invention to provide a liquid crystal display device and a method of manufacturing the same that reduce the black matrix width of a color filter substrate corresponding to a data line to improve the pixel aperture ratio of a liquid crystal display device.

According to an aspect of the present invention, there is provided a liquid crystal display comprising: a first substrate;

A second substrate; A gate line, a data line, and a thin film transistor arranged to define a pixel region on the first substrate; Green, and blue color filter layers formed on the second substrate to correspond to pixel regions of the first substrate; a black matrix formed to correspond to the gate lines, the data lines, and the thin film transistors; And a common electrode alternately arranged on the pixel region of the first substrate and the common electrode, wherein the black matrix is formed on the second substrate in the boundary region of the red, green, and blue color filter layers, And blue color filter layers are formed on any two of the color filter layers and have different heights.

According to another aspect of the present invention, there is provided a liquid crystal display comprising: a first substrate; A second substrate; A gate line, a data line, and a thin film transistor arranged to define a pixel region on the first substrate; Green and blue color filter layers formed on the second substrate so as to correspond to the pixel regions of the first substrate and at least two red, green and blue color filter layers corresponding to the gate wiring, A black matrix formed on the laminated color filter layer; And a common electrode alternately arranged on the pixel region of the first substrate.

According to another embodiment of the present invention, there is provided a method of manufacturing a liquid crystal display device, comprising: sequentially forming red, green, and blue color filter layers on a substrate using red, green, and blue color resins; And forming a black matrix on the border regions of the red, green, and blue color filter layers and the red, green, and blue color filter layers adjacent to the border regions.

A method of manufacturing a liquid crystal display device according to another embodiment of the present invention includes the steps of forming red, green, and blue color filter layers on a pixel region using red, green, and blue color resins on a substrate divided into a pixel region and a non- Forming at least two of the red, green and blue color filter layers on the non-display area; And forming a black matrix in a region where the color filter layer of the non-display area is laminated.

As described in detail above, the present invention enables the black matrix formed on the color filter substrate to be formed on the red, green, and blue color filters, thereby minimizing the light spots generated along both sides of the data lines have.

Further, according to the present invention, common electrodes formed on different layers in the pixel region adjacent to the data line are completely overlapped with each other, thereby improving defects in the light leakage occurring in both sides of the data line.

Further, the present invention has the effect of reducing the width of the black matrix of the color filter substrate corresponding to the data line, thereby improving the pixel aperture ratio of the liquid crystal display device.

It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. First, it should be noted that the same components or parts among the drawings denote the same reference numerals whenever possible. In describing the embodiments, specific descriptions of related known functions or configurations are omitted in order to avoid obscuring the gist of the present invention.

Also, in the description of the embodiments, it is to be understood that each layer (film), region, pattern or structure may be referred to as being "on / above / over / upper" (film), region, pad, pattern or structure is directly formed on the substrate, each layer (film), region, pad, or substrate, May be interpreted as being formed in contact with the patterns and may be interpreted as the case where another layer (film), another region, another pad, another pattern or other structure is additionally formed therebetween. Therefore, the meaning should be judged by the technical idea of the invention.

Hereinafter, a pixel structure of a transverse electric field type liquid crystal display device according to the related art will be described in detail with reference to the accompanying drawings.

1 is a diagram showing a pixel structure of a transverse electric field type liquid crystal display device according to the present invention.

Referring to Fig. 1, a unit pixel region is defined by intersecting a gate wiring 1 and a data wiring 5, and a thin film transistor (TFT) as a switching element is disposed in the intersection region.

A first common wiring 3 intersects with the data wiring 5 in a direction parallel to the gate wiring 1 and both side edges of the unit pixel region are connected to the first common wiring 3 The first common electrode 3a that is branched is formed in a direction parallel to the data line 5.

A first storage electrode 6 for forming a storage capacitance is formed at the edge of the first common electrode 3a adjacent to the gate wiring 1 so that the first common electrode 3, 3a and the first storage electrode 6 form a closed loop structure.

The gate wiring 1 adjacent to the first storage electrode 6 is formed so as to have a larger width so as to function as a gate electrode 1a of the TFT.

Over the first common wiring 3 and the first common electrode 3a are electrically connected to the first common wiring 3 and overlapped with the first common wiring 3 and the first common electrode 3a a second common wiring 13 and a third common electrode 13b overlap each other.

A slit-shaped second common electrode 13a is branched from the second common wiring 13 in the direction parallel to the data line 5 along the center of the unit pixel region.

Here, the second common wiring 13, the second common electrode 13a, and the third common electrode 13b are formed of the same transparent metal as the pixel electrode 7a, and are electrically connected to each other.

At this time, since the second common wiring 13 is electrically connected to the first common wiring 3, a common voltage signal is applied to the second common electrode 13a and the third common electrode 13b.

The pixel electrode 7a is formed on both sides of the second common electrode 13a branched from the second common wiring 13 in the unit pixel center region, And is electrically connected to the second storage electrode 7 formed to overlap with the storage electrode 6.

The second storage electrode 7 electrically connected to the pixel electrode 7a and the first storage electrode 6 electrically connected to the first common electrode 3a form a storage capacitance in the unit pixel region.

Though not shown in the figure, 23a is the first common electrode in the pixel region adjacent to the data line 5, and 33b is the third common electrode. Each pixel region is formed in the same manner as the pixel structure described in Fig.

2 is a sectional view taken along the line I-I 'of FIG. 1;

Referring to FIG. 2, a lower substrate 101 of a liquid crystal display according to the present invention includes first and second common electrodes 3a and 3b on both sides of a pixel region with a data line 5 interposed therebetween, 23a are formed. A gate insulating film 102 is formed on a first transparent substrate 100 on which the first common electrodes 3a and 23a are formed and a data line 5 including a semiconductor pattern 5a is formed on the gate insulating film 102. [ Are formed between the first common electrodes 3a and 23a. In addition, a protective film 107 is formed on the first transparent substrate 100 on which the data lines 5 are formed.

On the first common electrodes 3a and 23a, third common electrodes 13b and 33b are formed so as to overlap a predetermined region, respectively.

In addition, the upper substrate 201 corresponding to the data line 5 region includes a display region composed of color filter layers and a non-display region made up of a black matrix. A red (R) color filter layer 210a and a green (G) color filter layer 210b are formed on a second transparent substrate 200. The red (R) color filter layer 210a and the green A black matrix 250 is formed on the red (R) color filter layer 210a and the green (G) color filter layer 210b. That is, in the upper substrate 201 of the present invention, red, green, and blue color filter layers are sequentially formed on the second transparent substrate 200, and black resin Or a metal film such as chromium is used to form the black matrix 250.

2 and 4B, the black matrix 250 has a distance X ₂ from the second transparent substrate 200 in a region located above the data line 5, and the red color filter layer 210 a ) and have a distance value of X ₁ of the black matrix 250 and the second transparent substrate 200 formed on the green color filter (210b). That is, in the black matrix 250, the distance between the lower substrate 101 and the black matrix 250 in the area formed on the red color filter layer 210a and the green color filter layer 210b is smaller than the center area of the black matrix 250 It gets closer.

When the black matrix 250 is formed in the above-described manner, light spots generated in the regions of the third common electrodes 13b and 33b on the data line 5 are divided into the red color filter layer 210a and the green color filter layer 210b, The black matrix 250 formed on the filter layer 210b is blocked in advance, and the light-shielding region is much wider. Accordingly, the conventional black matrix is extended to the pixel region d 'which is a predetermined distance from the third common electrodes 13b and 33b of the lower substrate 101. However, in the present invention, The light source can be blocked even if only the upper portion of the second common electrode 13b and 33b adjacent to the second common electrode 5 is formed.

When the red (R), green (G) color filter layers 210a and 210b and the blue (B) color filter layer (not shown) and the black matrix 250 are formed on the second transparent substrate 200 as described above, 2, the planarization layer 220 is formed on the entire region of the transparent substrate 200.

As described above, in the present invention, by changing the forming structure of the black matrix, it is possible not only to effectively block the defects of the light gaps, but also to reduce the width of the black matrix, and to enlarge the pixel aperture ratio.

In the figure, the first common electrodes 3a and 23a and the third common electrodes 13b and 33b formed on the data line 5 and the adjacent region of the lower substrate 101, 250 and the color filter layers. However, the gate wiring of the lower substrate 101, the black matrix corresponding to the TFT region, and the color filter layers may be formed in the same manner as described above.

3 is a cross-sectional view of a liquid crystal display device according to another embodiment of the present invention. As shown in FIG. 3, the lower substrate 101 has the same structure as the lower substrate of FIG. 2 are denoted by the same reference numerals.

3, the red (R) color filter layer 310a is formed on the second transparent substrate 200 so as to extend to the conventional black matrix formation region. That is, the red color filter layer 310a overlaps the first and third common electrodes 3a, 23a, 13b, and 33b formed on both sides of the data line 5 and the data line 5 of the lower substrate 101, .

Then, when the blue (B) color filter layer 310b is formed, a region overlapping the data line 5 and the first and third common electrodes 3a, 23a, 13b, and 33b is formed, Is formed to overlap with the red (R) color filter layer 310a. That is, the color filter layers can be stacked on each other in a region corresponding to the data line 5 region.

In the present invention, for example, the red color filter layer 310a and the green color filter layer 310b are stacked on each other, for example, in the order of forming the red, green, and blue color filter layers, but this is only an embodiment of the present invention. If the color filter layers are formed in the order of green, blue, red or blue, green, red color filter layers, the order of stacking the color filter layers formed on the second transparent substrate 200 may be changed. For example, a cyan color filter layer and a blue-green color filter layer. In addition, although only two color filter layers are formed to be laminated to each other in FIG. 3, three color filter layers may be formed by laminating red, blue, and green color filters.

When the green color filter layers 310a and 310b are stacked as described above, the black matrix 350 is formed on the color filter layers 310a and 310b. 5B, the black matrix 350 is formed on the second transparent substrate 200, the red color filter layer 310a, and the green color filter layer 310b to form the second transparent substrate 200, Has a Y value. Therefore, the black matrix 350 is formed to be closer to the lower substrate 101, so that the generation of light spots on both sides of the data line 5 can be blocked as much as possible.

In the figure, the first common electrodes 3a and 23a and the third common electrodes 13b and 33b formed on the data line 5 and the adjacent region of the lower substrate 101, 250 and the color filter layers. However, the gate wiring of the lower substrate 101, the black matrix corresponding to the TFT region, and the color filter layers may be formed in the same manner as described above.

FIGS. 4A and 4B are views showing a manufacturing process of the color filter substrate of FIG. 2. FIG.

4A and 4B, the mask process is performed while sequentially forming red (R) color resin, green (G) color resin, and blue (B) color resin on the second transparent substrate 200 A red color filter layer 210a, a green color filter layer 210b, and a blue color filter layer (not shown) are sequentially formed.

The red (R) color filter layer 210a and the green (G) color filter layer 210b are formed on the second transparent substrate 200 corresponding to the data line 5 region of the lower substrate 101 of FIG. As shown in FIG. At this time, two color filter layers can be formed to face each other. That is, in the region corresponding to the data line 5 region of the lower substrate 101, the color filter layers are extended to the region where the conventional black matrix was formed.

When the red color filter layer 210a, the green color filter layer 210b and the blue color filter layer are formed on the second transparent substrate 200 as described above, light can be blocked on the entire region of the second transparent substrate 200 A metal film such as black resin or chromium (Cr) is formed, and then a black matrix 250 is formed using a photolithography process including a mask.

The black matrix 250 is formed so as to be divided into a region where the black matrix 250 is formed on the color filter layer and a region that is formed on the second transparent substrate 200, So that the fountain could be blocked in advance.

2, the black matrix 250 has a height of X ₂ from the second transparent substrate 200 in the region corresponding to the data line 5 region formed on the lower substrate 101, The black matrix 250 formed on the color filter layers 210a and 210b is formed to have a height of X ₁ from the second transparent substrate 200. The width of the black matrix 250 in the data line 5 region is equal to the width between the first and third common electrodes 3a, 23a, 13b and 33b adjacent to the data line 5 Or smaller.

Therefore, the distance X ₁ between the black matrix 250 and the lower substrate 101 corresponding to both sides of the data line 5 of the lower substrate 101, the black matrix 250 corresponding to the data line 5, The distance X ₂ of the lower substrate 101 has a different distance from each other. Particularly, the black matrix 250 in the area corresponding to both sides of the data line 5 has a much smaller blocking distance than the lower substrate 101 because of a short distance between the black matrix 250 and the data line 5.

Therefore, the width of the black matrix 250 can be formed to be much narrower than the conventional one, and the pixel aperture ratio of the liquid crystal display device can be improved.

5A and 5B are cross-sectional views illustrating a manufacturing process of a color filter substrate of a liquid crystal display device according to another embodiment of the present invention.

Referring to FIGS. 5A, 5B, and 3, in another embodiment of the present invention, red, green, and blue color resins are first applied on a second transparent substrate 200, To form filter layers. At this time, when the red color filter layer 310a is formed using the red color resin, the red color filter layer 310a is extended to the conventional black matrix formation region and patterned.

Then, when the green color filter layer 310b is formed using the green color resin, the green color filter layer 310b is laminated with the red color filter layer 310a in the black matrix forming region.

Although not shown in the drawing, the green color filter layer 310b and the blue color filter layer (not shown) are also laminated to each other. In addition, although two color filter layers are stacked on each other in the drawing, this is an embodiment, so that red, green, and blue color filter layers may be stacked.

When the color filter layers (red 310a and green 310b) are formed on the second transparent substrate 200 as described above, the black matrix 350 (green 310b, green 310b) ). Accordingly, the black matrix 350 is formed at a position very close to the lower substrate 101 (Y), and blocks the light spots occurring in the data wiring 5 region in a wide range. That is, the light beam spreads as the light beam progresses, but is blocked by the black matrix 350 in advance, thereby widening the light blocking area substantially. Further, since the position of the black matrix 350 is changed, the light shielding region is enlarged and the width of the black matrix 350 can be reduced.

Therefore, the width of the black matrix 350 in the data line 5 region may be equal to or smaller than the width between the data lines 5 and the adjacent first common electrodes 3a and 23a.

The gate line of the lower substrate 101 and the black matrix 350 corresponding to the TFT region may be formed in the same shape as the data line 5 in the present invention have.

As described above, the present invention has an advantage in that the formation position of the black matrix is changed to block light spots generated around the pixel region, and the intersection region between the black matrix and the pixel region is minimized, thereby improving the pixel aperture ratio.

6 is a cross-sectional view of a liquid crystal display device according to another embodiment of the present invention.

6 is a cross-sectional view corresponding to the pixel structure of FIG. 1, and the same components as those of FIG. 2 are denoted by the same reference numerals, and a detailed description thereof will be omitted.

6, first common electrodes 3a and 23a are formed on the first transparent substrate 100 in the region of the data line 5 of the lower substrate 301, and the gate insulating film 102, Third common electrodes 333 and 433 are formed so as to overlap the first common electrodes 3a and 23a with the protective film 107 therebetween.

The third common electrodes 333 and 433 use an opaque metal such as MoTi. Therefore, even if electrical interference is generated between the data line 5 and the first common electrodes 3a and 23a and the third common electrodes 333 and 433, the light emitted from the backlight unit is reflected from both sides of the data line 5 The third common electrodes 333 and 433 are shielded by the third common electrodes 333 and 433 to remove the light spots generated along the edge of the pixel region.

When the third common electrodes 333 and 433 are formed so as to completely cover the first common electrodes 3a and 23a as described above, the black matrix of the upper substrate 401 corresponding to the data lines 5 450 width Z can be reduced. That is, the width of the black matrix 450 corresponding to the data line 5 region can be reduced to be equal to or smaller than the interval between the first common electrodes 3a and 23a. Accordingly, the area where the black matrix 450 overlaps with the pixel area is reduced, and the aperture ratio can be improved.

1 is a diagram showing a pixel structure of a transverse electric field type liquid crystal display device according to the present invention.

2 is a sectional view taken along the line I-I 'of FIG. 1;

3 is a cross-sectional view of a liquid crystal display device according to another embodiment of the present invention.

4A and 4B are views showing a manufacturing process of the color filter substrate of FIG. 2. FIG.

5A and 5B are cross-sectional views illustrating a manufacturing process of a color filter substrate of a liquid crystal display device according to another embodiment of the present invention.

6 is a cross-sectional view of a liquid crystal display device according to another embodiment of the present invention.

Description of the Related Art [0002]

101: lower substrate 201: upper substrate

100: first transparent substrate 200: second transparent substrate

210a, 310a: red (R) color filter layer 210b, 310b: green (G)

5: Data wirings 3a and 23a: First common electrode

13b, 33b: a third common electrode

Claims (8)

A first substrate; A second substrate; A gate electrode, a data wiring, and a thin film transistor arranged to define a pixel region on the first substrate, and a common electrode and a pixel electrode alternately arranged in the pixel region in parallel with the data wiring, The second substrate includes red, green, and blue color filter layers corresponding to pixel regions of the one substrate, and a black matrix disposed between the red, green, and blue color filter layers, Wherein the red, green, and blue color filter layers are spaced apart from each other in a region corresponding to a data line of the first substrate, Wherein a part of the black matrix is disposed on the second substrate corresponding to the data line, and the other part of the black matrix is connected to the common electrodes disposed adjacent to both pixel areas around the data line, And the liquid crystal layer is disposed on the liquid crystal layer. The liquid crystal display device according to claim 1, wherein a portion of the black matrix disposed on the color filter layer is closer to the first substrate than a portion of the black matrix disposed on the second substrate. The liquid crystal display of claim 1, wherein the black matrix overlaps the first common electrodes adjacent to both pixel regions with the data line as a center. The liquid crystal display of claim 1, wherein a width of a black matrix corresponding to the data wiring region is equal to or smaller than a width between first common electrodes adjacent to both pixel regions with the data wiring as a center. A first substrate; A second substrate; A gate line, a data line, and a thin film transistor arranged to define a pixel region on the first substrate; Green and blue color filter layers formed on the second substrate so as to correspond to the pixel regions of the first substrate and at least two red, green and blue color filter layers corresponding to the gate wiring, A black matrix formed on the laminated color filter layer; And And a common electrode alternately arranged on the pixel region of the first substrate. delete delete Green, and blue color filter layers are formed on the substrate using red, green, and blue color resins on a substrate divided into a pixel region and a non-display region, and the red, Stacking at least two of the filter layers; And And forming a black matrix in a region where the color filter layers of the non-display region are stacked.

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