KR101374006B1 - Method of manufacturing liquid crystal panel - Google Patents

Abstract

By providing the manufacturing method of the liquid crystal panel which can perform the alignment process of a liquid crystal panel in a short time, without causing a fall of reliability, an ultraviolet-ray reaction material between two light-transmissive substrates (glass substrate) 3a, 3b. Light is irradiated from the light irradiation part 1 with the voltage applied to the liquid crystal panel 3 which filled the liquid crystal 3c containing this. As the light source 1 of the light irradiation part 1, the irradiation amount of the light whose wavelength is 320 nm or more contains the light of 320 nm or less which is the absorption edge wavelength of a liquid crystal, and the light whose wavelength is 320 nm or more, What is larger than an irradiation amount is used, and the light whose wavelength is 320 nm or less is selected so that it may exceed the irradiation amount in which all the ultraviolet-ray reactive materials generate a polymerization reaction, but the irradiation amount which does not produce the fall of the reliability by decomposition | disassembly of a liquid crystal. As the light source 1a, for example, a phosphor lamp, an oxo excimer lamp, and an oxo excimer lamp in which xenon is enclosed can be used.

Description

Manufacturing method of liquid crystal panel {METHOD OF MANUFACTURING LIQUID CRYSTAL PANEL}

BACKGROUND OF THE INVENTION Field of the Invention The present invention relates to a method for producing a liquid crystal panel of a multi-domain vertical alignment (MVA) method, and in particular, polymerizes in response to a liquid crystal having an alignment property oriented by voltage application between two glass substrates and an ultraviolet ray. The manufacturing method of the liquid crystal panel which seals the material which mixed the photoreactive substance which raise | occur | produces, and forms an alignment film on a glass plate by irradiating an ultraviolet-ray to this liquid crystal panel and polymerizing an ultraviolet-ray reactive material.

The liquid crystal panel is a structure in which liquid crystal is enclosed between two light-transmissive substrates (glass substrates), and a plurality of active elements (TFTs) and liquid crystal driving electrodes are formed on one glass plate, and an alignment film is formed thereon. Doing. On the other glass substrate, a color filter, an alignment film, and a transparent electrode (ITO) are formed. And liquid crystal is enclosed between the orientation films of both glass substrates, and the circumference is sealed with the sealing compound.

In the liquid crystal panel of such a structure, an alignment film is for controlling the liquid crystal alignment which orientates a liquid crystal by applying a voltage between electrodes.

Conventionally, the control of the alignment film has been performed by rubbing, but recently, a new orientation control technique has been tried.

It is a liquid crystal having an orientation oriented by voltage application between a first glass substrate provided with a TFT element and a second glass substrate opposed to the first glass substrate, and a photoreactive substance that reacts with ultraviolet rays to cause polymerization ( The material which mixed the ultraviolet-ray reactive material) is enclosed, and while applying a voltage to this liquid crystal panel, it irradiates an ultraviolet-ray and superpose | polymerizes an ultraviolet-ray reactive material, and fixes the direction of the liquid crystal (that is, about 1 molecular layer of a surface layer) contacting a glass substrate. This gives a pretilt angle to a liquid crystal (for example, refer patent document 1).

According to this method, since the projection which has the inclined surface which was conventionally required in order to give a pretilt angle becomes unnecessary, the manufacturing process of a liquid crystal panel can be simplified. Therefore, the manufacturing cost and manufacturing time of the liquid crystal panel can be reduced, and the shadow caused by the projections is eliminated, so that the opening ratio can be improved.

In the manufacturing technology of the liquid crystal panel which performs this new orientation control, about the processing method which irradiates an ultraviolet-ray with respect to the material (Hereinafter, it may be called liquid crystal containing an ultraviolet-ray reactive material) which mixed a liquid crystal and an ultraviolet-ray reactive material, Individual suggestions are made.

(1) In "Liquid crystal display element apparatus and its manufacturing method" described in Patent Document 2, ultraviolet irradiation of the first condition and ultraviolet irradiation of the second condition in which the polymerization rate is larger than ultraviolet irradiation of the first condition are performed in this order. The manufacturing method (refer to description of Paragraph 0012 of patent document 2, etc.) performed in combination with the above is proposed.

Specifically, ultraviolet irradiation is performed under conditions in which the irradiance and integrated intensity are larger than the first condition in the second condition. In this way, in the ultraviolet irradiation under the first conditions, the occurrence of alignment abnormality can be suppressed due to relatively slow polymerization, and thereafter, even if the polymerization rate is raised, there is no problem, and there is no problem of alignment abnormality, or a suppressed liquid crystal layer can be obtained. have. Moreover, it is said that it is preferable to increase the ratio of the low wavelength component of around 310 nm in ultraviolet irradiation of 2nd conditions (refer the description of Paragraph 0037 of patent document 2, etc.).

(2) In "liquid crystal display element apparatus and its manufacturing method" of patent document 3, it turned out that "in order not to deteriorate a liquid crystal, it is better to irradiate the ultraviolet-ray which cut short wavelength region of less than 310 nm using a filter. ... "However, if the intensity | strength in wavelength 310nm is made into zero completely, desired liquid crystal orientation will become difficult to obtain. Therefore, it is preferable to use the light source which contained the intensity | strength about 0.02-0.05 mW / cm <2> in wavelength 310nm. "(The description of Paragraph 0019 of patent document 3 etc.) is shown.

(3) In the "liquid crystal display element device and its manufacturing method" described in Patent Document 4, although shorter ultraviolet rays are advantageous in obtaining vertical alignment of the liquid crystal in a short time, promoting deterioration of liquid crystal molecules and the like. On the contrary, it is difficult to promote the deterioration of liquid crystal molecules and the like, but it is necessary to use a long time for obtaining the vertical alignment property of the liquid crystal (see description of paragraph 0031 of Patent Document 4). The range of the integration intensity of the wavelength component (UV of short wavelength) of 300 nm-350 nm, and the range of the integration intensity of the wavelength component (UV of long wavelength) of 350 nm-400 nm are proposed.

[Prior Art Literature]

[Patent Document]

(Patent Document 1) Japanese Unexamined Patent Publication No. 2003-177408

(Patent Document 2) Japanese Unexamined Patent Publication No. 2005-181582

(Patent Document 3) Japanese Unexamined Patent Publication No. 2005-338613

(Patent Document 4) Japanese Patent Application Laid-Open No. 2006-58755

As mentioned above, although several proposals have been made regarding the treatment method of irradiating ultraviolet rays to a material mixed with a liquid crystal and an ultraviolet reaction material, the following findings were also obtained as a result of our various experiments. .

That is, in the liquid crystal panel which uses a new orientation control as mentioned above, the ultraviolet-ray reaction material which superpose | polymerizes and reacts with an ultraviolet-ray to a liquid crystal is mixed, and this ultraviolet-ray reaction material superposes | polymerizes by ultraviolet irradiation. However, if the unpolymerized ultraviolet light-reactive material remains in the liquid crystal, burnout of the screen, lowering of VHR (voltage holding ratio), lowering of contrast, etc. occur in the liquid crystal panel, and reliability decreases. Hereinafter, this is called the fall of the reliability by the remainder of an ultraviolet-ray reaction material. Therefore, the ultraviolet-ray reaction material mixed with the liquid crystal must superpose | polymerize completely.

What is necessary is just to irradiate more light of the wavelength to which an ultraviolet-ray reactive material reacts in order to accelerate superposition | polymerization of an ultraviolet-ray reactive material. Generally, the reaction material superposed | polymerized by an ultraviolet-ray has high reaction sensitivity in the area | region whose wavelength is 360 nm or less. On the other hand, as described in Patent Literatures 2 and 3, when strong ultraviolet rays of short wavelengths, especially light having a wavelength of 310 nm or less, are struck, liquid crystals may be damaged and deteriorate in quality.

By the way, it is not known what damage, alteration, or deterioration of the liquid crystal specifically refers to, and how it relates to the wavelength to which it is irradiated. The specific influence which light imparts to a liquid crystal was not fully elucidated.

That is, at present, in the manufacturing method of the liquid crystal panel of the MVA system which mixes an ultraviolet-ray reactive material with a liquid crystal, irradiates an ultraviolet-ray, and performs orientation control, when a light of a certain wavelength range is irradiated by a certain ratio, It has not been made clear whether the orientation treatment can be performed in a short time without deteriorating the reliability.

This invention is made | formed based on the knowledge about the range of the wavelength of the light which is necessary to superpose | polymerize the said ultraviolet-ray-reactive material, and the specific influence which light of short wavelength gives to a liquid crystal, The objective of this invention is an ultraviolet-ray to a liquid crystal. In the method for producing a liquid crystal panel of an MVA system in which a reaction material is mixed, irradiated with ultraviolet rays, and orientation control is performed, without lowering the reliability due to the decomposition of the liquid crystal or the reliability due to the remaining of the ultraviolet reaction material. It is providing the manufacturing method of the liquid crystal panel which can perform the orientation process of a liquid crystal panel in a short time.

The inventors discovered the following as a result of earnestly examining.

First, the transmittance | permeability with respect to the wavelength of light was measured about the liquid crystal (made by Melk Corporation) which has negative dielectric constant anisotropy for VA (Vertical Alignment) currently generally used. The graph of the transmittance | permeability of the liquid crystal with respect to the wavelength which is a result in FIG. 1 is shown. In this figure, the horizontal axis represents wavelength (nm) and the vertical axis represents transmittance (%).

As shown in this figure, the liquid crystal has a transmittance of 100% and is transparent in a region having a wavelength of 330 nm or more, but it has been found that light having a wavelength of 320 nm or less is absorbed. The absorbed light decomposes the liquid crystal molecules.

That is, when irradiating light of the wavelength (shorter wavelength than 320 nm) below the wavelength which a liquid crystal absorbs light, a liquid crystal will decompose | disassemble, and this causes the fall of the reliability of a liquid crystal panel. Hereinafter, this is called the fall of the reliability by disassembly of a liquid crystal.

Herein, the wavelength (the wavelength at which light absorption starts when the wavelength of light is shortened) is the longest wavelength among the wavelengths for absorbing the light, and the liquid crystal shown in FIG. 1 has an absorption edge wavelength of 320 nm. to be.

As mentioned above, the liquid crystal which has negative dielectric anisotropy which is a liquid crystal for VA is 320 nm in the absorption end wavelength, and the transmittance | permeability falls at 320 nm.

That is, the lowering of the reliability such as the lowering of the burned-down VHR of the screen and the lowering of the contrast of the liquid crystal panel is due to the decomposition of the liquid crystal generated by irradiating light below the absorption end wavelength, It is thought to be due to the remaining.

Next, in manufacture of the liquid crystal panel of MVA system, the absorbance with respect to the wavelength of light was measured about the ultraviolet-ray reaction material currently contained in the liquid crystal currently used normally. In the region of the wavelength where light is absorbed, that is, the absorbance is high, the ultraviolet light reacting material causes a polymerization reaction. 2 shows the resulting absorbance of the ultraviolet reactive material to wavelength.

In this figure, the horizontal axis represents wavelength (nm), and the vertical axis represents absorbance (arbitrary unit) of the ultraviolet light reactive material. In addition, the measurement used the material which mixed the liquid crystal and an ultraviolet-ray reaction material, and when the density | concentration of an ultraviolet-ray reaction material is 1% or less, for example, 0.1 w% (W% refers to a weight percentage), and 0.01, It measured about two types in the case where it was set to w%. The thickness of the material is 15 μm or less.

As shown in this figure, in the state of high concentration (for example, 0.1 w%), an ultraviolet-ray reaction material absorbs light in the area | region whose wavelength is 370 nm or less. That is, the wavelength of the absorption edge of the ultraviolet light reactive material is 370 nm, and irradiation with light having a wavelength of 370 nm or less causes a polymerization reaction.

However, it was found that when the polymerization reaction proceeds and the amount of the reaction material decreases, the polymerization reaction does not proceed with light having a wavelength of 330 nm or more. This is considered to be because when the concentration of the reaction material is lowered (polymerization reaction proceeds 90% and the concentration of the reaction material becomes 0.01w%), the light having a long wavelength is almost not absorbed.

As mentioned above, even if it is the ultraviolet-ray reaction material which produces a polymerization reaction with the light whose wavelength is 370 nm or less, it turns out that it will not superpose | polymerize the remaining 10% (concentration 0.01w%) reaction material unless the light whose wavelength is 330 nm or less is irradiated. Could.

That is, in order to superpose | polymerize a ultraviolet-ray reactive material completely, it is necessary to irradiate the light below the absorption edge wavelength (wavelength 320nm) of the said liquid crystal.

Moreover, although the use of the ultraviolet-ray reaction material which produces a polymerization reaction with a longer wavelength than wavelength 370nm can also be considered, when using the ultraviolet-ray reaction material which produces a polymerization reaction with a longer wavelength than wavelength 370nm, there exists a possibility that it may superpose | polymerize in natural light, As the UV-reactive material to be included in the liquid crystal in the production of the MVA-type liquid crystal panel, the ultraviolet-ray reacting material causing the polymerization reaction with light having a wavelength of 370 nm or less is used as shown in FIG. .

The above-mentioned "the liquid crystal will decompose when the wavelength of the light irradiated to the liquid crystal is below the absorption end wavelength (320 nm)", and "if the light having a wavelength of 320 nm or less is irradiated, the remaining 10% of the reaction material can be polymerized. Not "is the opposite.

That is, in order to prevent the fall of the reliability by the remainder of the ultraviolet-ray reactive material by the said experiment, in order to superpose | polymerize all of the ultraviolet-ray reactive material contained in a liquid crystal, it is preferable to irradiate light below an absorption edge wavelength (320 nm). need. However, when irradiating light below an absorption edge wavelength (320 nm), it turned out that the fall of the reliability by disassembly of a liquid crystal arises, and it is necessary to irradiate light so that this conflicting request may be satisfied.

Therefore, all ultraviolet-ray reaction materials superpose | polymerize so that both may be established, ie, the light shorter than the absorption edge wavelength (wavelength 320nm) of the said liquid crystal may not produce the fall of the reliability by remaining of an ultraviolet-ray reaction material. It is necessary to control and irradiate so that it may exceed the irradiation amount which raise | generates, but it does not exceed the threshold value of the irradiation amount which the fall of the reliability by the decomposition of a liquid crystal produces. Even so, only light having an absorption end wavelength (wavelength of 320 nm) or less of the liquid crystal should not exceed the threshold value of the irradiation dose at which the degradation of the reliability caused by the decomposition of the liquid crystal is insufficient. And the fall of the reliability by the remainder of an ultraviolet-ray reaction material arises.

Therefore, most of the ultraviolet light-reactive materials cause a polymerization reaction using light that is at or above the absorption end wavelength (wavelength 320 nm) of the liquid crystal that is not absorbed by the liquid crystal (i.e., does not decompose the liquid crystal). Reacts the reaction material which does not react substantially with the light which is below the absorption edge wavelength (wavelength 320nm) of a liquid crystal.

Therefore, when irradiating light to the liquid crystal panel, light having a longer wavelength than the absorption edge wavelength of the liquid crystal than the irradiation amount of light having a shorter wavelength than the absorption edge wavelength of the liquid crystal (for example, light having a wavelength range of 300 nm to 320 nm) ( For example, the irradiation amount of light having a wavelength range of 320 nm to 360 nm) is increased.

For this reason, most of the ultraviolet-ray reaction material can be polymerized at high speed, and the reaction material which does not react substantially with light more than the absorption edge wavelength can be polymerized without leaving a relatively short treatment time.

In addition, the irradiation amount of light having a wavelength shorter than the absorption edge wavelength of the liquid crystal exceeds the irradiation amount in which all the UV-reactive materials cause a polymerization reaction, but does not exceed the threshold value of the irradiation amount in which a decrease in reliability due to decomposition of the liquid crystal occurs. It is preferable to control so that irradiation may become.

In order to increase the irradiation amount of the wavelength range 320 nm to 360 nm longer than the absorption wavelength of the wavelength range shorter than the absorption wavelength of the said liquid crystal, the wavelength range is 300 nm-320 nm. A light source that can be irradiated is required.

As such a light source, a fluorescent lamp and an oxo excimer lamp are mentioned. Moreover, when xenon is encapsulated in an oxo excimer lamp, the radiation intensity with a wavelength range of 300 nm-320 nm can be changed according to the amount of xenon encapsulation, and the irradiation amount can be optimally controlled.

Based on the above, in this invention, the said subject is solved as follows.

(1) Manufacturing of the liquid crystal panel which irradiates light, makes the said photoreactive substance react, and forms an alignment part in the said liquid crystal panel with respect to the MVA system liquid crystal panel which enclosed the liquid crystal containing a photoreactive substance inside. In the method, the irradiated light includes light having a longer wavelength than the absorption end wavelength of the liquid crystal and light having a shorter wavelength than the absorption end wavelength of the liquid crystal, and the irradiation amount of the long wavelength light is made larger than the irradiation amount of the light having the short wavelength.

(2) In the above (1), the wavelength range of the light having the short wavelength is 300 nm to 320 nm, and the wavelength range of the light having the long wavelength is 320 nm to 360 nm.

Herein, the liquid crystal has negative dielectric anisotropy of 320 nm (the wavelength absorbs light at a wavelength of 320 nm or less) with an absorption end wavelength, and the concentration of the photoreactive substance as the photoreactive substance is less than 1 w% and the thickness thereof is high. In the state of 15 micrometers or less, the thing of an absorption edge wavelength of 370 nm (wavelength reacts by the wavelength which is 370 nm or less) is used.

(3) The phosphor lamp or oxo excimer according to (2), wherein the light source for irradiating the light has a larger irradiance having a wavelength range of 320 nm to 360 nm than an irradiance having a wavelength range of 300 nm to 320 nm. A lamp or an oxo excimer lamp enclosed with xenon is used. These lamps can prevent the temperature rise of the substrate without emitting unnecessary light such as infrared light.

In the present invention, the following effects can be obtained.

(1) The light to be irradiated includes light having a longer wavelength than the absorption edge wavelength of the liquid crystal (for example, wavelength 320 nm) and light having a wavelength shorter than the absorption edge wavelength of the liquid crystal, and the irradiation amount of the light having the long wavelength is set to Although all ultraviolet-ray reaction materials exceed the irradiation amount which causes a polymerization reaction so that it may be larger than the irradiation amount of light, and the light below the absorption edge wavelength (for example, wavelength 320nm) of a liquid crystal does not produce the fall of the reliability by remaining of an ultraviolet-ray reaction material, By irradiating in the range which does not exceed the threshold value of the irradiation amount which the fall of the reliability by the decomposition of a liquid crystal, the ultraviolet-ray reaction material can be superposed | polymerized in a short time, and the fall of the reliability by the remainder of an ultraviolet-ray reaction material can also be The degradation of the reliability due to decomposition does not occur either.

(2) A light source for irradiating light to a liquid crystal panel, containing a phosphor lamp, an oxo excimer lamp, and xenon having a radiation intensity of 320 nm to 360 nm and a wavelength range of 300 nm to 320 nm. By using one oxo excimer lamp, this process can be surely performed in a short time.

1 is a diagram showing the transmittance of liquid crystal with respect to the wavelength of light.
Fig. 2 is a diagram showing the absorbance of the ultraviolet light reacting material with respect to the wavelength of light.
It is a figure which shows the structural example of the manufacturing apparatus of the liquid crystal panel used by the manufacturing method of the liquid crystal panel of this invention.
4 is a diagram illustrating a configuration example of a phosphor lamp.
5 is a diagram illustrating another configuration example of the phosphor lamp.
6 is a diagram showing a spectral emission spectrum of a phosphor lamp.
It is a figure which shows the structural example of an oxo excimer lamp.
8 shows the spectral emission spectrum of an oxo excimer lamp.
9 is a diagram showing a spectral emission spectrum of a xenon-containing oxo excimer lamp.
Fig. 10 shows the spectral emission spectrum of the XeCl excimer lamp.

The structural example of the manufacturing apparatus (ultraviolet ray irradiation apparatus) of the liquid crystal panel used for the manufacturing method of the liquid crystal panel of this invention is shown in FIG.

The manufacturing apparatus (ultraviolet ray irradiation apparatus) of a liquid crystal panel is provided with the work stage 2 on which the light irradiation part 1 and the liquid crystal panel 3 are mounted. The work stage 2 is provided with a mechanism 2a for applying a voltage to the mounted liquid crystal panel 3. With respect to the liquid crystal panel 3 mounted on the work stage 2, the light from the light irradiation part 1 is irradiated, applying a voltage as described in the said patent document 1.

As described above, the liquid crystal panel 3 is a structure in which a liquid crystal 3c containing an ultraviolet reaction material is enclosed between two light-transmissive substrates (glass substrates) 3a and 3b. As described above, a large number of active elements TFT, a liquid crystal drive electrode, a color filter, and a transparent electrode ITO are formed on the glass plate, and the circumference is sealed by the sealing agent 3d.

The light irradiation part 1 is provided with the light source (lamp) 1a and the mirror 1b, and as light source (lamp) 1, 320 nm or less light (wavelength shorter than wavelength 320nm) which is an absorption edge wavelength of a liquid crystal is provided. Light) and light having a wavelength of 320 nm or more (light having a longer wavelength than 320 nm), which is an absorption edge wavelength, and having an irradiation amount of light having a wavelength of 320 nm or more is larger than an irradiation amount of light having a wavelength of 320 nm or less. In addition, although the component of the light whose wavelength is 320 nm or less exceeds the irradiation amount which all ultraviolet-ray reactive materials produce a polymerization reaction as mentioned above, it irradiates in the range which does not exceed the threshold value of the irradiation amount which the fall of the reliability by decomposition | disassembly of a liquid crystal produces.

As the light source 1a, for example, a phosphor lamp, an oxo excimer lamp, and an oxo excimer lamp containing xenon can be used.

These lamps can prevent the temperature rise of the substrate and the like without emitting light unnecessary for alignment treatment such as infrared light.

Fig. 4 is a diagram showing an example of the configuration of the above-mentioned phosphor lamp, which shows a cross-sectional view cut along a plane including a tube axis.

The phosphor lamp 10 has a vessel (light emitting tube) 11 having a substantially double tube structure in which the inner tube 111 and the outer tube 112 are arranged on substantially the same axis, and both ends 11A of the vessel 11 are formed; 11B) is sealed, and the cylindrical discharge space S is formed inside. A rare gas such as xenon, argon, or krypton is sealed in the discharge space (S).

The container 11 is made of quartz glass, and a low softening point glass layer 14 is provided on the inner circumferential surface, and a phosphor layer 15 is further provided on the inner circumferential surface of the low softening point glass layer 14.

As this low softening glass layer 14, soft glass, such as borosilicate glass and aluminosilicate glass, is used, for example. As the phosphor layer 15, for example, cerium-activated magnesium lanthanum aluminate (La-Mg-Al-O: Ce) phosphor is used.

An electrode 12 is provided on an inner circumferential surface of the inner tube 111, and a mesh-shaped electrode 13 is provided on an outer circumferential surface of the outer tube 112. These electrodes 12 and 13 are arrange | positioned with the container 11 and the discharge space S interposed.

The electrodes 12 and 13 are connected to the power supply unit 16 through the lead wires W11 and W12. When a high frequency voltage is applied from the power supply device 16, a discharge (so-called dielectric barrier discharge) interposed between the dielectrics 111 and 112 is formed between the electrodes 12 and 13, and in the case of xenon gas, a person whose wavelength is 172 nm. External light occurs. The ultraviolet light obtained here is light for excitation of a fluorescent substance, and the ultraviolet light whose center wavelength is 340 nm vicinity is irradiated by irradiating a fluorescent substance layer.

The other structural example of a fluorescent lamp is shown in FIG. This figure (a) shows sectional drawing cut to the plane containing a tube axis, (b) shows sectional drawing along the A-A line of (a).

In Fig. 5, the lamp 20 has a pair of electrodes 22, 23, and the electrodes 22, 23 are provided on the outer circumferential surface of the container (light emitting tube) 21, and the electrodes 22, 23 On the outside, a protective film 24 is provided.

The ultraviolet reflecting film 25 is provided in the inner surface on the opposite side with respect to the light emission direction side of the inner peripheral surface of the container 21 (refer FIG. 5 (b)), and the low softening point glass layer 26 is provided in the inner periphery. The phosphor layer 27 is provided on the inner peripheral surface of the softening point glass layer 26.

Other configurations are the same as those shown in FIG. 4, and the same applies to the gas encapsulated in the discharge space S in the container 21 and the phosphor used for the phosphor layer 25.

When a high frequency voltage is applied to the electrodes 22 and 23, a dielectric barrier discharge is formed between the electrodes 22 and 23, and ultraviolet light is generated as described above. As a result, the phosphor is excited, and ultraviolet light with a center wavelength of around 340 nm is generated from the phosphor layer, and the light is reflected by the ultraviolet reflecting film 25 and is external from the opening portion where the ultraviolet reflecting film 25 is not provided. Is radiated to.

6 shows the spectral emission spectrum of the phosphor lamp. As shown in this figure, the phosphor lamp emits light having a wavelength of 300 nm to 360 nm or more.

It is a figure which shows the structural example of an oxo excimer lamp. This figure (a) shows the external appearance figure of the whole, (b) shows sectional drawing of the A-A line of (a).

The lamp 30 includes a discharge container 31 having a substantially rectangular cross section with a dielectric material such as quartz glass. In the container 31, the sealing member 34 is arrange | positioned in the vicinity of the both ends of a longitudinal direction. Moreover, the discharge space S and the container 31 in which the mesh-shaped electrodes 32 and 33 were formed in the inside of the container 31 in the outer surface of the upper and lower wall surfaces 35 and 36 of the container 31 are also shown. It is provided so as to oppose the dielectric material constituting the interposed therebetween.

Further, in the interior of the container 31, for example, an ultraviolet reflection film (37) containing SiO ₂ as a main component is formed on the wall surface 36 on the opposite side with respect to the wall 35 of the light exit direction-side, and the discharge space Ultraviolet rays generated within S are reflected by the ultraviolet reflecting film 37 in the light exit direction and are emitted from the wall surface 35 located on the light exit direction side.

In addition to oxo gas, argon gas and krypton gas are sealed in the container 31 as a buffer gas. The voltage is 40 to 130 kV. Among these, the concentration of oxo gas is 0.05 to 1.0%. The emission wavelength is 342 nm.

In addition, while the lamps shown in Figs. 4 and 5 have phosphors on the inner surface of the container, the lamps shown in Fig. 7 are different in that they do not have phosphors, but using a dielectric interposed discharge (dielectric barrier discharge) is used. It is common in that it is.

8 shows the spectral emission spectrum of the oxo excimer lamp. As shown in this figure, the oxo excimer lamp emits light having a wavelength of 310 nm to 350 nm.

In the xenon-containing oxo excimer lamp, a predetermined amount of xenon gas is further enclosed in the oxo lamp shown in FIG. 7 to emit light having a wavelength different from that described above.

As the enclosed gas, krypton gas is encapsulated as a buffer gas in addition to oxo gas and xenon gas. The voltage is 40 to 130 kV. Among them, the concentration of the oxo gas is 0.05 to 1.0% and the concentration of the xenon gas is about 0.05 to 2%.

Although the emission wavelength has peaks at 342 nm and 320 nm, the radiation amount of both is changed by the relative balance between the amount of the oxo gas and the xenon gas encapsulated.

9 shows the spectral emission spectrum of the xenon-containing oxo excimer lamp. As shown in this figure, the xenon-containing oxo excimer lamp emits light having a wavelength of 310 nm to 350 nm. In addition, the xenon-containing oxo excimer lamp can freely change the amount of light (size of peak) whose wavelength is around 320 nm by changing the amount of xenon encapsulated.

Therefore, by increasing the component of the light whose wavelength is 320 nm or less, the remaining ultraviolet-ray reactive material can be polymerized more quickly and the processing time can be shortened.

When the lamp is used, the amount of light (size of peak) whose wavelength is around 320 nm can be freely changed by changing the amount of xenon encapsulation.

For this reason, the ratio of the light whose wavelength range is 300 nm-320 nm and the light whose wavelength range is 320 nm-360 nm can be set freely, and all the ultraviolet-ray reaction materials superpose | polymerize the irradiation amount of the light whose wavelength is 320 nm or less. Although it exceeds the irradiation amount which produces | generates, it becomes easy to set in the range which does not exceed the threshold value of the irradiation amount which the fall of the reliability by the decomposition of a liquid crystal produces.

The xenon-containing chlorine excimer lamp (XeCl excimer lamp) described later is one in which a chlorine and a xenon gas are encapsulated in place of oxo in the lamp shown in FIG. 7, whereby light of different wavelengths can be emitted.

Specifically, chlorine gas, xenon gas, and argon number are sealed as a buffer gas. It is about 30㎪ by voltage. Among them, the concentration of chlorine gas is about 0.5 to 1.0%, the concentration of xenon gas is about 90 to 95%, and the concentration of argon gas is about 1.0 to 3.0%. The emission wavelength is 308 nm.

10 shows the spectral emission spectrum of the XeCl excimer lamp. As shown in this figure, the XeCl excimer lamp emits light having a wavelength in the range of 290 nm to 320 nm having a peak of emission at a wavelength of 308 nm.

4, 5, and 7 are common in all of the lamps provided with a discharge (so-called dielectric barrier discharge) interposed between a pair of electrodes via a dielectric.

In the lamps shown in FIGS. 4 and 5, the phosphor is coated on the inner surface of the container to obtain desired light by the phosphor, whereas the oxo excimer lamp, the xenon-containing oxo excimer lamp, and the xenon-containing chlorine excimer lamp shown in FIG. 7 are phosphors. It differs in that a desired light is obtained by light emission of these inclusions, without using.

In addition, in the lamp of the structure shown to FIG. 4, FIG. 5, if a fluorescent substance is removed, it is naturally possible to use an oxo excimer lamp, a xenon containing oxo excimer lamp, and a xenon containing chlorine excimer lamp, and also the structure shown in FIG. In the lamp of, the lamp may be constituted only by rare gases such as xenon, argon and krypton.

In order to confirm the effect of this invention, the following experiment was done and the irradiation amount with respect to the liquid crystal containing an ultraviolet-ray reaction material was verified.

First, about the liquid crystal containing an ultraviolet-ray reaction material, the experiment which confirmed that the light whose wavelength is 320 nm or less must be irradiated in the range which does not exceed the threshold of the irradiation amount which the quality deterioration by decomposition of a liquid crystal produces. The results are shown in Table 1.

Table 1 shows ultra-high pressure in a liquid crystal (MJ961213 manufactured by Melk Co., Ltd.) containing an acrylate-based ultraviolet reaction material (manufactured by DIC Corporation) at a concentration of 0.1 w% that causes a polymerization reaction upon irradiation with light having a wavelength of 370 nm or less that is currently used. About 10 J / cm <2> of irradiation with the light (light whose wavelength was mainly 350 nm-370 nm which cut wavelength 320 nm or less with a filter) from a mercury lamp was irradiated, and the residual ratio of an ultraviolet-ray reaction material was 10% (concentration 0.01). (equivalent to w%), the light from the XeCl excimer lamp is irradiated by changing the irradiation amount, and the result of the investigation about the presence or absence of decomposition of the liquid crystal to the irradiation amount and the reliability of the panel (lowering or contrast of the screen) To indicate.

The XeCl excimer lamp is an excimer lamp in which xenon gas and chlorine gas are sealed as described above, and as shown in FIG. 10, the XeCl excimer lamp emits light having a peak of emission at a wavelength of 308 nm and a wavelength in the range of 290 nm to 320 mn. .

As shown in the said Table 1, when irradiating the light from the XeCl excimer lamp whose wavelength is 320 nm or less with the irradiation amount of 10 J / cm <2>, decomposition | disassembly of a liquid crystal will arise and the fall of the reliability of the panel by this was seen.

On the other hand, when irradiation amount was 0 (no irradiation)-1J / cm <2>, decomposition | disassembly of a liquid crystal did not occur but reliability of the panel fell. This is considered to have caused a decrease in reliability due to the remaining of the ultraviolet-ray reactive material.

And when irradiated with the irradiation amount of 2J / cm <2> -5J / cm <2>, decomposition | disassembly of a liquid crystal did not occur and the reliability of the panel was also favorable. This shows that all ultraviolet-ray reaction materials generate a polymerization reaction and the ultraviolet-ray reaction material does not remain.

As mentioned above, although all the ultraviolet-ray reaction materials exceed the irradiation amount which produces a polymerization reaction so that the fall of the reliability of the light whose wavelength is 320 nm or less does not generate | occur | produce, the reduction of the reliability by the decomposition | disassembly of a liquid crystal may occur. It was found that the range not exceeding the threshold was an irradiation dose of 2J / cm 2 to 5J / cm 2.

Next, the amount of irradiation that causes all the UV-reactive materials to cause a polymerization reaction so that most of the UV-responsive material is reacted (polymerized) with light having a wavelength of 320 nm or more, and the deterioration of the reliability due to the remaining of the UV-reactive material does not occur. The following experiment was performed for the purpose of irradiating the light source lamp or light irradiation process which can irradiate light whose wavelength is 320 nm or less in the range which does not exceed the threshold of the irradiation amount which the fall of the reliability by decomposition | disassembly of a liquid crystal produces. The results are shown in Table 2.

Table 2 relates to a liquid crystal (MJ961213 manufactured by Melk Co., Ltd.) containing an acrylate-based ultraviolet reaction material (manufactured by DIC) which causes a polymerization reaction when irradiated with light having a wavelength of 370 nm or less that is currently used at a concentration of 0.1 w%. The light was irradiated on the following conditions, and it investigated about the presence or absence of the decomposition | disassembly of a liquid crystal, and the reliability (lowering of a screen, a fall of VHR, and a fall of contrast).

<Condition 1>: The light whose wavelength from a XeCl excimer lamp is 290 nm-320 nm is irradiated with the irradiation amount of 20J / cm <2>.

<Condition 2>: The light from a fluorescent lamp is irradiated with the irradiation amount of 20J / cm <2>.

In addition, the phosphor lamp emits light having a wavelength of 300 nm to 360 nm or more, as shown in FIG. 6 described above.

<Condition 3>: The light from an oxo excimer lamp is irradiated with the irradiation amount of 20 J / cm <2>.

The oxo excimer lamp emits light having a wavelength of 310 nm to 350 nm as shown in FIG. 8 described above.

<Condition 4>: The light from a xenon containing oxo excimer lamp is irradiated with the irradiation amount of 20 J / cm <2>.

The xenon-containing oxo excimer lamp emits light having a wavelength of 310 nm to 350 nm, as shown in FIG. 9 described above.

As shown above, in condition 1, although there was no residual of the ultraviolet-ray reaction material, the liquid crystal decomposition occurred and the reliability of the panel fell. In the condition 2, neither the decomposition of the liquid crystal nor the residual of the ultraviolet reaction material were found, and the reliability of the panel was good. In the condition 3, there was no decomposition of the liquid crystal, and there was 1% of the residual of the ultraviolet ray reaction material, but the reliability of the panel was good. In condition 4, neither the decomposition of liquid crystal nor the residual of an ultraviolet-ray reaction material were shown, and the panel reliability was favorable.

Thus, when a fluorescent substance lamp, an oxo excimer lamp, and a xenon containing excimer lamp are used, a liquid crystal panel can be manufactured without the fall of the reliability by the decomposition of a liquid crystal, or the fall of the reliability by the remainder of an ultraviolet-ray reactive material.

Table 3 shows the wavelengths of 300-320 nm and the wavelengths of 320-360 nm when the amount of light having a wavelength of 300 nm to 360 nm for the phosphor lamp, oxo excimer lamp, and xenon-containing excimer lamp used above was 100. Indicates the ratio of one.

As shown above, when a fluorescent lamp, an oxo excimer lamp, and a xenon containing excimer lamp are used, a liquid crystal panel can be manufactured without the fall of the reliability by the decomposition of a liquid crystal, or the fall of the reliability by the remainder of an ultraviolet-ray reactive material. In this case, the ratio between the wavelength of 300-320 nm and the wavelength of 320-360 nm is the same as described above, whereby most of the ultraviolet-reactive material is reacted (polymerized) by light having a wavelength of 320 nm or more. The wavelength is 320 in the range not exceeding the irradiation dose at which all the UV-responsive materials cause the polymerization reaction so that the degradation of the reliability due to the remaining of the ultraviolet-responsive material does not occur, but the decrease in the reliability due to decomposition of the liquid crystal. It is thought that light which is nm or less can be irradiated.

1: light irradiation unit 1a: light source (lamp)
1b Mirror 2: Work Stage
2a: mechanism for applying voltage 3: liquid crystal panel
3a, 3b: light transmissive substrate (glass substrate)
3c: liquid crystal containing ultraviolet reactive material
3d: sealant 10, 20, 30: lamp
11 container (light emitting tube) 12, 13 electrode
15, 27: phosphor layer 21: container (light emitting tube)
22, 23: electrode 31: discharge vessel
32, 33: electrode 24, 37: ultraviolet reflecting film

Claims (5)

In the manufacturing method of the liquid crystal panel which irradiates light, makes the said ultraviolet-ray-reactive material react, and forms an orientation part in the inside of the said liquid crystal panel in the liquid crystal panel of the MVA system which enclosed the liquid crystal containing an ultraviolet-ray reactive material inside. ,
The light to be irradiated includes light having a wavelength range of 320 nm to 360 nm longer than the absorption end wavelength of the liquid crystal, and light having a wavelength range of 300 nm to 320 nm shorter than the absorption end wavelength of the liquid crystal,
The light source irradiating the light is filled with a rare gas having a greater irradiance in the wavelength range of 320 nm to 360 nm than the irradiance in the wavelength range of 300 nm to 320 nm, and excites the phosphor by the ultraviolet light generated by the rare gas by the dielectric barrier discharge. It is a phosphor lamp
The light quantity of wavelength 300nm-320nm when the light quantity of wavelength 300nm-360nm is set to 100 is 20 or less, The manufacturing method of the liquid crystal panel characterized by the above-mentioned. In the manufacturing method of the liquid crystal panel which irradiates light, makes the said ultraviolet-ray-reactive material react, and forms an orientation part in the inside of the said liquid crystal panel in the liquid crystal panel of the MVA system which enclosed the liquid crystal containing an ultraviolet-ray reactive material inside. ,
The light to be irradiated includes light having a wavelength range of 320 nm to 360 nm longer than the absorption end wavelength of the liquid crystal, and light having a wavelength range of 300 nm to 320 nm shorter than the absorption end wavelength of the liquid crystal,
The light source for irradiating the light is an oxo excimer lamp having a larger irradiance in the wavelength range of 320 nm to 360 nm than the irradiance in the wavelength range of 300 nm to 320 nm,
The light quantity of wavelength 300nm-320nm when the light quantity of wavelength 300nm-360nm is set to 100 is 20 or less, The manufacturing method of the liquid crystal panel characterized by the above-mentioned. The method according to claim 2,
Xenon is enclosed in the said oxo excimer lamp, The manufacturing method of the liquid crystal panel characterized by the above-mentioned. delete delete

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