KR101324289B1 - Gas distribution plate in substrate processing apparatus - Google Patents

Abstract

The present invention relates to a gas distribution plate of a substrate positioning apparatus for installing a thermal expansion receiving means that can accommodate thermal expansion and thermal contraction of the gas distribution unit, thereby preventing damage to the gas distribution unit and the connecting support, the plasma electrode; A connection support connected to the plasma electrode; And a gas distribution plate mounted on the connection support via a plurality of thermal expansion receiving means.

Gas distribution plate, thermal expansion, rolling means

Description

Gas distribution plate in substrate processing apparatus

1 is a schematic view of a substrate processing apparatus of the prior art.

2 to 4 is a state diagram of the connection between the gas distribution unit and the plasma electrode in the substrate processing apparatus of the prior art

5 is a schematic view of a substrate processing apparatus according to a first embodiment of the present invention;

6 is a cross-sectional view of the gas distribution unit according to the first embodiment of the present invention.

7 is a cross-sectional view of the gas distribution unit and the support provided with rolling means according to the first embodiment of the present invention

8 is a perspective view of a gas distribution unit provided with rolling means according to the first embodiment of the present invention;

9 is a plan view of a gas distribution unit in which rolling means is installed according to a first embodiment of the present invention;

10 is a plan view of the support on which the movement path of the rolling means according to the first embodiment of the present invention is installed;

11A and 11B are diagrams illustrating movement paths of rolling means before and after thermal expansion of the gas distribution unit according to the first embodiment of the present invention;

12 is a perspective view of a gas distribution unit according to a second embodiment of the present invention.

13 is a plan view of a gas distribution unit according to a second embodiment of the present invention.

14 is a perspective view of a gas distribution unit according to a third embodiment of the present invention.

15 is a plan view of a gas distribution unit according to a third embodiment of the present invention.

16 is a plan view of the connecting support on which the movement path of the rolling means according to the third embodiment of the present invention is installed;

17 is a perspective view of a gas distribution unit according to the fourth embodiment of the present invention.

18A to 18C are plan views of a gas distribution unit according to a fourth embodiment of the present invention.

19 is a plan view of the connecting support on which the movement path of the rolling means according to the fourth embodiment of the present invention is installed;

Description of the Related Art [0002]

10 substrate processing apparatus 11 chamber

12: substrate support 13: gas distribution

15 plasma electrode 16 buffer space

26: connection support 30: rolling means

31: blocking plate 33: movement path

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas distribution plate of a substrate processing apparatus, and more particularly, to a substrate disposition apparatus for installing a thermal expansion receiving means capable of accommodating thermal expansion and thermal contraction of a gas distribution portion, thereby preventing damage to the gas distribution portion and the connection support. It relates to a gas distribution plate of.

In general, to manufacture semiconductor and flat panel display devices, a thin film deposition process for depositing a thin film of a specific material on a substrate, a photolithography process for exposing or hiding selected areas of the thin films using a photosensitive material, and removing the thin film of the selected area Etching (patterning) process to pattern as desired, each of these processes is carried out inside the substrate processing apparatus designed to the optimum environment for the process, the gas distribution to inject the raw material into the substrate processing apparatus Gas supply is made through the unit. The flat panel display includes a liquid crystal display (LCD), a plasma display panel (PDP), and the like.

Processes such as deposition and etching can be carried out in various ways depending on the type of raw material or the characteristics of the thin film. Recently, a method using a plasma is widely used because of the advantages of low temperature process and excellent film quality. An apparatus for processing a substrate using plasma is classified into a capacitively coupled plasma (CCP) device and an inductively coupled plasma (ICP) device according to a plasma generation method. In the CCP apparatus, plasma is generated by electrons accelerated by RF electric fields formed between opposite electrodes to the neutral gas, and in ICP apparatus, plasma is generated by an induction electric field formed inside the chamber by an antenna installed outside the chamber. Occurs.

And. As semiconductors or flat panel displays pursue large areas, the area of gas distribution used in the substrate processing apparatus used in the PECVD process is also increasing. However, since the thermal expansion and thermal contraction of the gas distribution cannot be absorbed smoothly, Damage to the support occurs, acts as a factor in securing the flatness of the gas distribution unit, there is a problem that the replacement cycle of the gas distribution portion is faster to increase the production cost.

1 is a schematic diagram of a substrate processing apparatus of the prior art.

1 illustrates a schematic configuration of a plasma enhanced chemical vapor deposition (PECVD) apparatus 10 that generates plasma and deposits a predetermined material on a substrate as a CCP type plasma generator.

A substrate table 12 for holding a substrate S is provided in a chamber 11 forming a reaction space and an aluminum material having a plurality of spray holes 13a is formed on the substrate table 12 A gas distribution portion 13 is provided, and an exhaust port 21 is formed in a lower portion of the chamber 11. The upper part of the chamber 11 is sealed by the plasma electrode 15 made of aluminum, the plasma electrode 15 is connected to the RF power source 19, and the impedance between the plasma electrode 15 and the RF power source 19 A matcher 20 for matching is installed.

The gas distribution unit 13 is mounted or fixed to the connection zone 26 of the plasma electrode 15 with the buffer space 16 therebetween. When the RF power supply 19 is applied to the plasma electrode 15, the gas distribution portion 13, which is seated on the connection support 26 of the plasma electrode 15, serves as an electrode facing the substrate lower electrode 12 . A gas supply pipe 17 communicating with the buffer space 16 is connected to the center of the plasma electrode 15 and the buffer space 16 is connected to the gas supply pipe 17 through the gas distribution pipe 13 Thereby diffusing the raw material into the chamber 11 uniformly. In the buffer space 16, a baffle 18 may be installed in front of the outlet of the gas supply pipe 17 to assist the diffusion of raw materials.

2 to 4 are diagrams illustrating a connection state of the gas distribution unit and the plasma electrode in the substrate processing apparatus of the prior art, wherein the gas distribution unit 13 is mounted with the plasma electrode 15 with the buffer space 16 therebetween. In order to fix, as shown in Figure 2, the side of the gas distribution unit 13 is formed with a connecting portion 14 having a bent portion, the connecting portion 14 is inserted or fixed between the plasma electrode 15 and the support 25 Let's do it. Meanwhile, as shown in FIG. 3, the gas distribution part 13 is bolted to the connection part 24 connected to the end of the plasma electrode 15, or as shown in FIG. 4, the gas distribution part 13 is the end of the plasma electrode 15. It is connected to and is mounted on the connecting support 26 which is bent inwardly of the gas distribution part 13.

In the substrate processing apparatus 10 as described above, the process proceeds at a high temperature of about 200 to 500 ° C., and thermal expansion and thermal contraction are repeatedly generated in the aluminum gas distribution unit 13. Due to thermal expansion and thermal contraction of the gas distribution unit 13, the gas distribution unit 13 generates scratches such as scratches and foreign substances on the contact surface by friction with the connecting support 26 which fixes and mounts the gas distribution unit 13. And, unwanted arcing (arcing) occurs in the process progress, after a long time, the gas distribution unit 13 and the connecting support 26 is damaged. Therefore, the breakage of the gas distribution unit 13 and the connecting support 26 acts as a deterrent to securing the flatness of the gas distribution unit 13, and the replacement cycle of the gas distribution unit 13 is faster, thereby increasing the production cost. Is increased.

The present invention is to solve this problem, to provide a gas distribution plate of the substrate processing apparatus to prevent damage to the gas distribution unit and the connecting support by providing a thermal expansion receiving means that can absorb the thermal expansion and thermal contraction of the gas distribution unit. The purpose.

Another object of the present invention is to provide a gas distribution plate of a substrate processing apparatus which cuts a corner portion of the gas distribution part at a right angle or an inclined surface and installs thermal expansion receiving means on the cut surface so as not to occupy a separate area.

It is another object of the present invention to provide a gas distribution plate of a substrate processing apparatus which is provided with a thermal expansion receiving means at a central portion of the side surface of the gas distribution portion, and which can accommodate thermal expansion and thermal contraction smoothly.

In order to achieve the above object, the gas distribution plate of the substrate processing apparatus according to an embodiment of the present invention, the plasma electrode; A connection support connected to the plasma electrode; And a gas distribution unit mounted on the connection support via a plurality of thermal expansion receiving means.

In the gas distribution plate of the substrate processing apparatus as described above, the thermal expansion receiving means is a rolling means capable of lubricating the gas distribution portion from the connection support against thermal expansion and thermal contraction of the gas distribution portion.

In the gas distribution plate of the substrate processing apparatus as described above, the rolling means is installed on the gas distribution unit or the connecting support.

In the gas distribution plate of the substrate processing apparatus as described above, the rolling means is a point contact means or a line contact means.

In the gas distribution plate of the substrate processing apparatus as described above, the point contact means is a ball bearing, and the line contact means is a roller.

In the gas distribution plate of the substrate processing apparatus as described above, a blocking plate is interposed on the outer periphery of the connection support and the gas distribution unit.

In the gas distribution plate of the substrate processing apparatus as described above, the gas distribution portion is one of the first rectangle to maintain the circular shape of the corner, the second rectangle cut at a right angle to the corner, and the third rectangle cut to the inclined surface at the corner It is characterized by using it.

In the gas distribution plate of the substrate processing apparatus as described above, when the gas distribution unit is the first quadrangle and the second quadrangle, the rolling means is provided on each of the transverse side and the longitudinal side of the corner of the quadrangle. When the gas distribution unit is the third quadrangle, the rolling means is provided on the inclined surface.

In the gas distribution plate of the substrate processing apparatus as described above, the rolling means is provided on the central side between the corners of the gas distribution portion.

In the gas distribution plate of the substrate processing apparatus as described above, when the rolling means is installed in the gas distribution unit, a movement path for controlling the moving direction of the rolling means is provided on the connection support.

In the gas distribution plate of the substrate processing apparatus as described above, the movement path is engraved on the upper portion of the connection support.

In the gas distribution plate of the substrate processing apparatus as described above, the movement path is wider than the width of the rolling means.

In the gas distribution plate of the substrate processing apparatus as described above, the gas distribution unit is characterized in that the circular or rectangular.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings.

5 is a schematic diagram of a substrate processing apparatus according to a first embodiment of the present invention. 6 is a cross-sectional view of the gas distribution unit according to the first embodiment of the present invention, FIG. 7 is a cross-sectional view of the gas distribution unit and the support on which the rolling means according to the first embodiment of the present invention is installed, and FIG. 9 is a perspective view of a gas distribution unit in which rolling means is installed according to an embodiment, and FIG. 9 is a plan view of a gas distribution unit in which rolling means is installed according to a first embodiment of the present invention, and FIG. 10 is according to a first embodiment of the present invention. 11A and 11B are diagrams showing the movement paths of the rolling means before and after thermal expansion of the gas distribution unit according to the first embodiment of the present invention.

Hereinafter, the same parts as in FIG. 1 use the same names and symbols, and detailed description thereof will be omitted to avoid duplication.

The substrate processing apparatus 10 according to the first embodiment of the present invention is common to the prior art in that the gas distribution unit 13 is installed below the plasma electrode 15, and the method of installing the gas distribution unit 13 is described. Is similar to FIGS. 2 to 4 of the prior art. In the first embodiment of the present invention, as shown in FIG. 4, the gas distribution unit 13 is connected to the end of the plasma electrode 15 and mounted on the connection support 26 which is bent into the gas distribution unit 13. The explanation focuses on the form.

5 and 6, the gas distribution unit 13 is connected to the end of the plasma electrode 15 and rolling means as a thermal expansion receiving means on the connection support 26 that is bent inwardly of the gas distribution unit 13 It is mounted through the 30. As shown in FIG. 7, the gas distribution unit 13 and the connecting support 26 are not in direct contact with each other due to the clouding means 30 provided in the gas distribution unit 13. 13) and the connecting support 26 is spaced at regular intervals to secure a space in which the cloud means 30 can move. In addition, the process gas supplied from the gas supply pipe 17 may leak, and a blocking plate 31 is installed on the upper portion of the connection support 26 to directly contact the gas distribution unit 13. The blocking plate 31 is formed on the connection support 26 along the outer circumference of the gas distribution unit 13, and the area of the gas distribution unit 13 and the connection support 26 overlapping with the blocking plate 31. Has a width that can accommodate thermal expansion and thermal contraction. In addition, at least two clouding means 30 may be installed in a region where the thermal expansion receiving means is installed in the gas distribution part 13. In addition, the rolling means at appropriate intervals so as not to cause damage to the gas distribution portion 13 and the connection support 26 by thermal expansion and thermal contraction by direct contact with the connection support 26 due to deflection of the gas distribution part 13. Install 30.

The gas distribution unit 13 may be installed in the form of a circle or a square, if necessary, as shown in Figures 8 and 9, when the gas distribution unit 13 is installed in a square, of the gas distribution unit 13 Protruding means of rolling means 30 are installed at both ends of each side. In addition, one or two or more cloud means 30 may be installed in an area where the thermal expansion receiving means is installed. In addition, in order to secure the thermal expansion receiving region of the rolling means 30 installed in the gas distribution unit 13, as shown in FIG. 10, the movement path 33 corresponding to the rolling means 30 on the connection support 26. Install it. The movement path 33 is in the form of a recess engraved with the surface of the connection support 26. With regard to thermal expansion and thermal contraction of the gas distribution unit 13, the rolling means 30 is controlled along the movement path 33, and the departure is prevented.

Since the thermal expansion and thermal contraction of the gas distribution part 13 are not made in one direction but are made in the radiation direction from the center of the gas distribution part 13, the movement path 33 is a rolling means as shown in FIGS. 11A and 11B. When moving from the thermal contraction state 34 of 30 to the thermal expansion state 35 of the rolling means 30, the moving direction of the rolling means 30 is set to radiation, not a straight line. Therefore, the movement path 33 is formed to be wider than the width of the rolling means 30 to smoothly lubricate the thermal expansion and thermal contraction of the gas distribution unit (13). FIG. 11A shows the movement path 33 of the rolling means 30 moving in the horizontal axis direction, and FIG. 11B shows the movement path 33 of the rolling means 30 moving in the longitudinal axis direction.

In addition, the rolling means 30, which is a thermal expansion receiving means, is installed on the connection support 26 connected to the plasma electrode 15, and the movement path 33 for controlling the moving direction of the rolling means 30 includes a gas distribution unit ( 13) can be installed. In addition, the rolling means 30 may be configured as a ball bearing or a line contact roller or the like in point contact with the gas distribution unit 13 or the connecting support 26 in the movement path (33).

12 is a perspective view of a gas distribution unit according to a second embodiment of the present invention, and FIG. 13 is a plan view of a gas distribution unit according to a second embodiment of the present invention.

In the second embodiment of the present invention, in order to prevent the rolling means 30, which is a thermal expansion receiving means installed in the gas distribution part 13, from protruding and occupying a separate area, it is perpendicular to the corner of the gas distribution part 13. Install the cloud means 30 on the incision side. Although not shown in the drawing, as in the first embodiment of the present invention, at the end of the gas distribution unit 13, a blocking plate is provided in direct contact with the connection support 26, and is supplied from the gas supply pipe 17. Shut off process gas leakage.

14 is a perspective view of a gas distribution unit according to a third embodiment of the present invention, FIG. 15 is a plan view of a gas distribution unit according to a third embodiment of the present invention, and FIG. 16 is a rolling means according to a third embodiment of the present invention. Is a plan view of the connecting support on which the movement path of the is installed.

In the third embodiment of the present invention, while the semiconductor or flat panel display device pursues a large area, it is suitable when the area of the gas distribution portion used in the substrate processing apparatus also increases, and as the gas distribution portion 13 expands, In order to smoothly move the gas distribution part 13 according to thermal expansion and thermal contraction, the rolling means 30 is also provided in the center of the side surface of the gas distribution part 13. When the rolling means 30 provided at the center of the side surface is a ball bearing in point contact, it is inserted into the inside of the side center of the gas distribution unit 13, and when the rolling means 30 is a roller in line contact, The central part 36 which cut | disconnected the center of the side surface of the back part 13 is formed, and the rolling means 30 is inserted and installed. And, not shown in the drawing, as in the first embodiment of the present invention, at the end of the gas distribution unit 13, a blocking plate is provided in direct contact with the connecting support 26, from the gas supply pipe 17 Shut off the leakage of process gas. In addition, as shown in Figure 16, including the rolling means 30 is provided in the center of the side of the gas distribution unit 13, the connection support 26, the movement path for controlling the movement direction of all the rolling means (13) ( 33).

17 is a perspective view of a gas distribution unit according to a fourth embodiment of the present invention, FIGS. 18A to 18C are plan views of a gas distribution unit according to a fourth embodiment of the present invention, and FIG. 19 is a fourth embodiment of the present invention. A plan view of the connecting support is installed along the movement path of the rolling means.

In the fourth embodiment of the present invention, in order to prevent the rolling means 30, which is a thermal expansion receiving means installed in the gas distribution part 13, from protruding and occupying a separate area, an incision is made at the edge of the gas distribution part 13. The rolling means 30 is provided on one inclined surface 37. Since the thermal expansion and thermal contraction of the gas distribution part 13 are not made in one direction but are made in the radiation direction from the center of the gas distribution part 13, the rolling means is formed on the inclined surface 37 of the edge of the gas distribution part 13. By providing 30, thermal expansion and thermal contraction of the gas distribution unit 13 can be easily accommodated. Although not shown in the drawings, similarly to the first embodiment of the present invention, at the end of the gas distribution unit 13, a blocking plate is provided in direct contact with the connecting support 26, so that the process gas is supplied from the gas inlet pipe. To prevent leakage.

And as shown in FIG. 18B, one cloud means 30 is directly connected to the inclined surface 37 of the gas distribution unit 13, or as shown in FIG. 18A, two or more cloud means 30 can be installed, As shown in FIG. 18C, the rolling means support part 38 may be connected to the inclined surface 37, and two rolling means 30 may be installed on the rolling means support part 38. Meanwhile, as shown in FIG. 19, a movement path 33 corresponding to the rolling means 30 of the gas distribution unit 13 is installed on the upper portion of the connection support 26.

First, by installing thermal expansion means for absorbing the thermal expansion and thermal contraction of the gas distribution unit, to prevent damage to the gas distribution unit and the connecting support, shorten the replacement cycle of the substrate distribution unit, and easy to secure the flatness of the substrate distribution unit It's effective.

Secondly, the edge portion of the gas distribution part is cut at right angles or inclined surfaces, and thermal expansion receiving means is installed on the cut surface to form a gas distribution part of the substrate processing apparatus so as not to occupy a separate area.

Third, by installing the thermal expansion receiving means in the center of the side of the gas distribution, there is an effect that can accommodate the thermal expansion and thermal contraction smoothly.

Claims (13)

A gas distribution unit having a plurality of injection holes; A connection support for supporting the gas distribution unit; Cloud means which is installed in the gas distribution unit or the connection support, the gas distribution unit spaced apart from the connection support; Includes, the gas distribution plate of the substrate processing apparatus, characterized in that the blocking plate for blocking the gas leakage on the outer periphery of the connection support and the gas distribution unit. delete The method of claim 1, The rolling means is a gas distribution plate of the substrate processing apparatus, characterized in that installed on both ends of the gas distribution side. The method of claim 1, And each of said rolling means is a point contact means or a line contact means. 5. The method of claim 4, And said point contacting means is a ball bearing, and said line contacting means is a roller. delete The method of claim 1, The gas distribution unit may select and use one of a first quadrangle that maintains a round shape of a corner, a second quadrangle having a right angle cut at a corner, and a third quadrangle having a corner cut at a slope. Distribution plate. The method of claim 7, wherein When the gas distribution unit is the first quadrangle and the second quadrangle, the rolling means is provided on each of the transverse side and the longitudinal side of the corner, and when the gas distribution unit is the third quadrangle, the cloud on the inclined surface Gas distribution plate of the substrate processing apparatus, characterized in that the means is provided. 9. The method according to claim 7 or 8, The gas distribution plate of the substrate processing apparatus, characterized in that the rolling means is provided on the side of the center between the corners of the gas distribution unit. The method of claim 3, wherein When the rolling means is installed in the gas distribution unit, the gas distribution plate of the substrate processing apparatus, characterized in that the movement path for controlling the movement direction of the rolling means is installed on the connection support. 11. The method of claim 10, The gas distribution plate of the substrate treating apparatus, wherein the movement path is engraved on an upper portion of the connection support. 11. The method of claim 10, And the movement path is wider than the width of the rolling means. The method of claim 1, The gas distribution plate of the substrate processing apparatus, characterized in that the circular or rectangular shape.

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